JP4685161B2 - 均一圧でパターン形成可能なインプリント装置 - Google Patents
均一圧でパターン形成可能なインプリント装置 Download PDFInfo
- Publication number
- JP4685161B2 JP4685161B2 JP2008516743A JP2008516743A JP4685161B2 JP 4685161 B2 JP4685161 B2 JP 4685161B2 JP 2008516743 A JP2008516743 A JP 2008516743A JP 2008516743 A JP2008516743 A JP 2008516743A JP 4685161 B2 JP4685161 B2 JP 4685161B2
- Authority
- JP
- Japan
- Prior art keywords
- tube
- imprint
- pattern
- fluid
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000007261 regionalization Effects 0.000 title description 2
- 239000012530 fluid Substances 0.000 claims description 44
- 238000003860 storage Methods 0.000 claims description 26
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 description 10
- 238000005192 partition Methods 0.000 description 4
- 210000000078 claw Anatomy 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005493 welding type Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Description
2 インプリントヘッド
3 ウエハチャック
21 モールド
42a 保管室
43 チューブ
W インプリント対象物
Claims (2)
- パターンが形成され柔軟なヒンジばねに取付けられたモールドを有するインプリントヘッドと、前記インプリントヘッドと対向する位置に設けられてその上面にインプリント対象物を搭載するウエハチャックとを備え、前記インプリントヘッドまたは前記ウエハチャックが移動することで前記モールドのパターンが前記インプリント対象物に形成されるインプリント装置において、
前記ウエハチャックに取り付けられる支持装置を備え、
前記支持装置は、内部に収納空間を有し前記ウエハチャックに取付けられたベースプレートと、
流体の供給の有無に応じて膨張と初期状態への復元を繰り返し、膨張するときにインプリント対象物を支持するチューブと、
前記モールドのパターンが前記インプリント対象物の表面に形成されるときに流体を前記チューブに供給するために当該チューブと連結された流体コントローラと、
前記ベースプレートの収納空間に収容され、前記チューブが膨張するときに当該チューブが前記パターンの形成される形成面と対向するインプリント対象物の裏面に接触して支持するようにこのチューブが配置される少なくとも1つ以上の保管室が形成され、前記チューブが膨張する間に前記保管室から外部へ流体を排出するために前記保管室の開口側端部に流体排出通路が形成される支持台と、を有することを特徴とする均一圧でパターン形成可能なインプリント装置。 - 前記チューブは弾性体膜で形成される請求項1に記載の均一圧でパターン形成可能なインプリント装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20050050328 | 2005-06-13 | ||
PCT/KR2006/002230 WO2006135170A1 (en) | 2005-06-13 | 2006-06-12 | Imprinting apparatus for forming pattern at uniform contact by additional constant pressure |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009508707A JP2009508707A (ja) | 2009-03-05 |
JP4685161B2 true JP4685161B2 (ja) | 2011-05-18 |
Family
ID=37532490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008516743A Active JP4685161B2 (ja) | 2005-06-13 | 2006-06-12 | 均一圧でパターン形成可能なインプリント装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080202360A1 (ja) |
EP (1) | EP1891662A4 (ja) |
JP (1) | JP4685161B2 (ja) |
KR (1) | KR100903097B1 (ja) |
WO (1) | WO2006135170A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070138699A1 (en) * | 2005-12-21 | 2007-06-21 | Asml Netherlands B.V. | Imprint lithography |
KR100988647B1 (ko) | 2008-09-25 | 2010-10-18 | 한국기계연구원 | 순차적 가압을 통한 미세 패턴 임프린팅 방법 |
EP2194428A1 (en) * | 2008-12-08 | 2010-06-09 | Jung-Chung Hung | Uniform pressing apparatus for use in a micro-nano imprint process |
KR101071308B1 (ko) * | 2010-08-19 | 2011-10-07 | (주)휴넷플러스 | 임프린팅용 가압 장치, 이를 포함하는 임프린팅 장치 및 이를 이용한 임프린팅 방법 |
WO2014037044A1 (de) * | 2012-09-06 | 2014-03-13 | Ev Group E. Thallner Gmbh | Strukturstempel, vorrichtung und verfahren zum prägen |
CN104648022B (zh) * | 2015-02-11 | 2017-01-18 | 无锡惠发特精密机械有限公司 | 一种刻字机 |
JP2017130678A (ja) * | 2017-03-09 | 2017-07-27 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 型押し加工のための構造体スタンプ、装置および方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02126434A (ja) * | 1988-11-05 | 1990-05-15 | Mitsubishi Electric Corp | 光デイスク基板成形方法 |
JP2002289560A (ja) * | 2001-03-23 | 2002-10-04 | Nippon Telegr & Teleph Corp <Ntt> | インプリント方法およびインプリント装置 |
JP2004504714A (ja) * | 2000-07-17 | 2004-02-12 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 転写リソグラフィ・プロセスのための自動液体ディスペンス方法およびシステム |
JP2004523906A (ja) * | 2000-10-12 | 2004-08-05 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート |
JP2004330680A (ja) * | 2003-05-09 | 2004-11-25 | Tdk Corp | インプリント装置およびインプリント方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4975152A (en) * | 1989-07-06 | 1990-12-04 | Beloit Corporation | Enclosed extended nip press apparatus with inflatable seals and barbs |
US5461976A (en) * | 1994-03-28 | 1995-10-31 | Forehand; Michael E. | Power driven seal device |
US6482742B1 (en) * | 2000-07-18 | 2002-11-19 | Stephen Y. Chou | Fluid pressure imprint lithography |
US5901646A (en) * | 1997-10-21 | 1999-05-11 | Preco Industries, Inc. | Screen printing machine having three axes screen registration with shiftable support vacuum table for web |
US5947027A (en) * | 1998-09-08 | 1999-09-07 | Motorola, Inc. | Printing apparatus with inflatable means for advancing a substrate towards the stamping surface |
JP2001168008A (ja) | 1999-12-09 | 2001-06-22 | Canon Inc | 基板ステージ装置および該基板ステージ装置を用いた半導体露光装置 |
SE515607C2 (sv) * | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
US20050092621A1 (en) * | 2000-02-17 | 2005-05-05 | Yongqi Hu | Composite pad assembly for electrochemical mechanical processing (ECMP) |
US7322287B2 (en) * | 2000-07-18 | 2008-01-29 | Nanonex Corporation | Apparatus for fluid pressure imprint lithography |
JP3588633B2 (ja) | 2001-09-04 | 2004-11-17 | 独立行政法人産業技術総合研究所 | インプリントリソグラフィー用移動ステージ |
US6862989B2 (en) * | 2001-09-19 | 2005-03-08 | Goss International Americas, Inc. | Blanket cylinder with integrated compressible layer |
US7144539B2 (en) * | 2002-04-04 | 2006-12-05 | Obducat Ab | Imprint method and device |
US7296519B2 (en) * | 2002-05-27 | 2007-11-20 | Koninklijke Philips Electronics N.V. | Method and device for transferring a pattern from stamp to a substrate |
US7070405B2 (en) * | 2002-08-01 | 2006-07-04 | Molecular Imprints, Inc. | Alignment systems for imprint lithography |
KR100488049B1 (ko) * | 2003-01-16 | 2005-05-06 | 엘지전자 주식회사 | 나노 임프린트 제조 방법 |
EP1606834B1 (en) * | 2003-03-27 | 2013-06-05 | Korea Institute Of Machinery & Materials | Uv nanoimprint lithography process using elementwise embossed stamp |
TW568349U (en) * | 2003-05-02 | 2003-12-21 | Ind Tech Res Inst | Parallelism adjusting device for nano-transferring |
KR100582781B1 (ko) * | 2003-10-20 | 2006-05-23 | 엘지전자 주식회사 | 임프린트 리소그라피용 스탬퍼 제조 방법 |
US8377361B2 (en) * | 2006-11-28 | 2013-02-19 | Wei Zhang | Imprint lithography with improved substrate/mold separation |
-
2006
- 2006-06-12 EP EP06768828A patent/EP1891662A4/en not_active Withdrawn
- 2006-06-12 KR KR1020077024431A patent/KR100903097B1/ko not_active IP Right Cessation
- 2006-06-12 US US11/917,102 patent/US20080202360A1/en not_active Abandoned
- 2006-06-12 WO PCT/KR2006/002230 patent/WO2006135170A1/en active Application Filing
- 2006-06-12 JP JP2008516743A patent/JP4685161B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02126434A (ja) * | 1988-11-05 | 1990-05-15 | Mitsubishi Electric Corp | 光デイスク基板成形方法 |
JP2004504714A (ja) * | 2000-07-17 | 2004-02-12 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 転写リソグラフィ・プロセスのための自動液体ディスペンス方法およびシステム |
JP2004523906A (ja) * | 2000-10-12 | 2004-08-05 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート |
JP2002289560A (ja) * | 2001-03-23 | 2002-10-04 | Nippon Telegr & Teleph Corp <Ntt> | インプリント方法およびインプリント装置 |
JP2004330680A (ja) * | 2003-05-09 | 2004-11-25 | Tdk Corp | インプリント装置およびインプリント方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2006135170A1 (en) | 2006-12-21 |
JP2009508707A (ja) | 2009-03-05 |
EP1891662A1 (en) | 2008-02-27 |
US20080202360A1 (en) | 2008-08-28 |
KR20080004509A (ko) | 2008-01-09 |
KR100903097B1 (ko) | 2009-06-15 |
EP1891662A4 (en) | 2008-12-10 |
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