JP4673612B2 - Ｃｏ２存在下での電気めっき - Google Patents

Ｃｏ２存在下での電気めっき Download PDF

Info

Publication number
JP4673612B2
JP4673612B2 JP2004349651A JP2004349651A JP4673612B2 JP 4673612 B2 JP4673612 B2 JP 4673612B2 JP 2004349651 A JP2004349651 A JP 2004349651A JP 2004349651 A JP2004349651 A JP 2004349651A JP 4673612 B2 JP4673612 B2 JP 4673612B2
Authority
JP
Japan
Prior art keywords
ocf
plating
group
nonionic compound
aqueous solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004349651A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005256162A (ja
Inventor
隆文 永井
和久 藤井
英明 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Priority to JP2004349651A priority Critical patent/JP4673612B2/ja
Priority to US10/589,263 priority patent/US20070175763A1/en
Priority to EP05710181A priority patent/EP1722013A4/fr
Priority to PCT/JP2005/002179 priority patent/WO2005078161A1/fr
Priority to KR1020067018505A priority patent/KR20070001174A/ko
Publication of JP2005256162A publication Critical patent/JP2005256162A/ja
Application granted granted Critical
Publication of JP4673612B2 publication Critical patent/JP4673612B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2004349651A 2004-02-12 2004-12-02 Ｃｏ２存在下での電気めっき Expired - Fee Related JP4673612B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004349651A JP4673612B2 (ja) 2004-02-12 2004-12-02 Ｃｏ２存在下での電気めっき
US10/589,263 US20070175763A1 (en) 2004-02-12 2005-02-14 Electroplating in presence of co2
EP05710181A EP1722013A4 (fr) 2004-02-12 2005-02-14 Galvanoplastie en presence de co2
PCT/JP2005/002179 WO2005078161A1 (fr) 2004-02-12 2005-02-14 Galvanoplastie en présence de co2
KR1020067018505A KR20070001174A (ko) 2004-02-12 2005-02-14 Ｃｏ2 존재하에서의 전기 도금

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004035281 2004-02-12
JP2004349651A JP4673612B2 (ja) 2004-02-12 2004-12-02 Ｃｏ２存在下での電気めっき

Publications (2)

Publication Number Publication Date
JP2005256162A JP2005256162A (ja) 2005-09-22
JP4673612B2 true JP4673612B2 (ja) 2011-04-20

Family

ID=34863449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004349651A Expired - Fee Related JP4673612B2 (ja) 2004-02-12 2004-12-02 Ｃｏ２存在下での電気めっき

Country Status (5)

Country Link
US (1) US20070175763A1 (fr)
EP (1) EP1722013A4 (fr)
JP (1) JP4673612B2 (fr)
KR (1) KR20070001174A (fr)
WO (1) WO2005078161A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007063598A (ja) * 2005-08-30 2007-03-15 Tokyo Univ Of Agriculture & Technology 多孔性金属薄膜およびその製造方法
JP4919262B2 (ja) 2006-06-02 2012-04-18 日立マクセル株式会社 貯蔵容器、樹脂の成形方法及びメッキ膜の形成方法
JP5324191B2 (ja) * 2008-11-07 2013-10-23 ルネサスエレクトロニクス株式会社 半導体装置
US20120245019A1 (en) * 2011-03-23 2012-09-27 Brookhaven Science Associates, Llc Method and Electrochemical Cell for Synthesis of Electrocatalysts by Growing Metal Monolayers, or Bilayers and Treatment of Metal, Carbon, Oxide and Core-Shell Nanoparticles
CN106087008B (zh) * 2014-08-20 2017-11-21 江苏理工学院 效果较好的基于移动阳极的超临界复合电镀加工钻头方法
US10011918B2 (en) * 2014-12-23 2018-07-03 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and process of electro-chemical plating

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6793793B2 (en) * 2000-08-24 2004-09-21 Hideo Yoshida Electrochemical treating method such as electroplating and electrochemical reaction device therefor

Also Published As

Publication number Publication date
EP1722013A4 (fr) 2007-08-08
KR20070001174A (ko) 2007-01-03
US20070175763A1 (en) 2007-08-02
EP1722013A1 (fr) 2006-11-15
WO2005078161A1 (fr) 2005-08-25
JP2005256162A (ja) 2005-09-22

Similar Documents

Publication Publication Date Title
WO2005078161A1 (fr) Galvanoplastie en présence de co2
JP6026965B2 (ja) 鋼板用アルカリ洗浄剤組成物の製造方法
EP2900797B1 (fr) Procede de couper de matieres dures et cassantes
Yoshida et al. Electroplating of nanostructured nickel in emulsion of supercritical carbon dioxide in electrolyte solution
CN104105818B (zh) 用于化学镀镍或化学镀镍合金的预处理液、以及镀膜方法
JP2015536379A5 (fr)
CN107075309A (zh) 浆料组合物、漂洗组合物、基板抛光方法以及漂洗方法
Eastoe et al. Self-assembly in green solvents
EP4249647A1 (fr) Milieu électrolytique, procédé d'électropolissage faisant appel à cet milieu électrolytique et dispositif pour sa mise en oeuvre
EP2812422B1 (fr) Composition de nettoyage de type post-polissage mécano-chimique (post-cmp) comprenant un composé spécifique contenant du soufre et un alcool de sucre
KR20000053456A (ko) 무전해 복합 도금액 및 무전해 복합 도금방법
JP2004315675A (ja) 二酸化炭素溶媒用界面活性剤
JPH08246184A (ja) 高電流密度硫酸亜鉛電気亜鉛メッキ方法及び組成物
WO2006118006A1 (fr) Procede de reaction electrochimique et procede de formation d'un materiau composite
JP2006291008A (ja) フッ素系洗浄溶媒
WO2007007617A1 (fr) Traitement de surface en présence d’un solvant organique
KR100734342B1 (ko) 아세틸렌계 디올 및/또는 알콜을 포함하는 고밀도 유체를사용한 기판의 처리
JP4422550B2 (ja) 親水性フッ素樹脂粒子の製造方法
CN110079855B (zh) 一种电解除油剂专用表面活性剂及其制备方法
JP2007063675A (ja) 有機溶媒存在下での表面処理
JP2004143489A (ja) 電気複合めっき浴及び電気複合めっき方法
JP4531714B2 (ja) バッチ式焼鈍鋼帯用洗浄剤組成物
JP2007039805A (ja) 有機溶媒存在下での表面処理
JP5377058B2 (ja) ハードディスク用基板用の洗浄剤組成物
JP4398675B2 (ja) 親水性フッ素樹脂粒子及びその製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051025

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081029

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081219

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20090121

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090317

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20090708

A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20090731

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101124

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110121

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140128

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees