JP4667797B2 - 水晶振動子の露光用マスク - Google Patents
水晶振動子の露光用マスク Download PDFInfo
- Publication number
- JP4667797B2 JP4667797B2 JP2004253654A JP2004253654A JP4667797B2 JP 4667797 B2 JP4667797 B2 JP 4667797B2 JP 2004253654 A JP2004253654 A JP 2004253654A JP 2004253654 A JP2004253654 A JP 2004253654A JP 4667797 B2 JP4667797 B2 JP 4667797B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure mask
- plate
- alignment mark
- rotating
- quartz substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
w
なお、各図においての同一の符号は同じ対象を示すものとする。
2 回転Y板の上面
3 回転Y板の下面
4 保護膜
5 露光マスク
6 受け側合わせマーク
7 格子幅
8 ずらし側合わせマーク
Claims (1)
- Y板をX軸のまわりにθ°(シータ度)回転して得られる回転Y板の、
上面と下面に保護膜を施して行われる水晶振動子の、エッチング加工のエッチング加工領域を決める為に用いられる露光マスクにおいて、
該露光マスク上の受け側合わせマークが格子状パターンであり、該格子状パターンの複数の隣接する格子幅が、それぞれ露光される水晶基板の板厚tのt/tanθであることを特徴とする露光マスク。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004253654A JP4667797B2 (ja) | 2004-08-31 | 2004-08-31 | 水晶振動子の露光用マスク |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004253654A JP4667797B2 (ja) | 2004-08-31 | 2004-08-31 | 水晶振動子の露光用マスク |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006074297A JP2006074297A (ja) | 2006-03-16 |
JP4667797B2 true JP4667797B2 (ja) | 2011-04-13 |
Family
ID=36154453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004253654A Expired - Fee Related JP4667797B2 (ja) | 2004-08-31 | 2004-08-31 | 水晶振動子の露光用マスク |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4667797B2 (ja) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6146021A (ja) * | 1984-08-10 | 1986-03-06 | Hitachi Ltd | アライメント用マ−ク |
JPH0411404A (ja) * | 1990-04-27 | 1992-01-16 | Seiko Epson Corp | Atカット水晶振動片のエッチング加工方法及びatカット水晶振動片 |
JPH10270967A (ja) * | 1997-03-26 | 1998-10-09 | Seiko Epson Corp | 水晶振動子の製造方法 |
JP2000171966A (ja) * | 1998-12-03 | 2000-06-23 | Nec Corp | レチクル及び半導体装置の製造方法 |
JP2000231185A (ja) * | 1999-02-12 | 2000-08-22 | Asahi Kasei Microsystems Kk | レチクル及びその位置決め方法 |
JP2001033941A (ja) * | 1999-07-16 | 2001-02-09 | Toshiba Corp | パターン形成方法及び露光装置 |
JP2002261557A (ja) * | 2001-02-28 | 2002-09-13 | Seiko Epson Corp | 圧電振動片の製造方法 |
-
2004
- 2004-08-31 JP JP2004253654A patent/JP4667797B2/ja not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6146021A (ja) * | 1984-08-10 | 1986-03-06 | Hitachi Ltd | アライメント用マ−ク |
JPH0411404A (ja) * | 1990-04-27 | 1992-01-16 | Seiko Epson Corp | Atカット水晶振動片のエッチング加工方法及びatカット水晶振動片 |
JPH10270967A (ja) * | 1997-03-26 | 1998-10-09 | Seiko Epson Corp | 水晶振動子の製造方法 |
JP2000171966A (ja) * | 1998-12-03 | 2000-06-23 | Nec Corp | レチクル及び半導体装置の製造方法 |
JP2000231185A (ja) * | 1999-02-12 | 2000-08-22 | Asahi Kasei Microsystems Kk | レチクル及びその位置決め方法 |
JP2001033941A (ja) * | 1999-07-16 | 2001-02-09 | Toshiba Corp | パターン形成方法及び露光装置 |
JP2002261557A (ja) * | 2001-02-28 | 2002-09-13 | Seiko Epson Corp | 圧電振動片の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2006074297A (ja) | 2006-03-16 |
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