JP4660434B2 - Conveying mechanism and processing apparatus having the same - Google Patents

Description

  The present invention is used, for example, in a semiconductor substrate processing apparatus that performs a process such as CVD or etching on a substrate such as a semiconductor wafer, and inserts an object to be processed such as a semiconductor wafer (hereinafter referred to as a wafer) into a processing chamber. The present invention relates to an in-vacuum transfer mechanism that is carried out of a processing chamber.

  The semiconductor device manufacturing process consists of a number of processes. For example, the main processes for forming a circuit pattern on a semiconductor wafer include a wafer cleaning process, a film forming process for forming a metal film or an insulating film, and a photoresist. In general, a photolithography process for forming a wiring pattern, an etching process for etching a wafer on which a resist pattern is formed, and other impurity implantation processes are repeatedly performed many times.

  For example, when plasma is used in the etching process, or when processing is performed by, for example, a CVD apparatus in the film forming process, the wafer is carried into a vacuum chamber and processing is performed in the chamber. As such a system configuration, for example, there is a cluster apparatus in which a plurality of vacuum processing chambers are radially connected by a gate valve to a vacuum common transfer chamber formed in a polygonal shape.

However, due to the demand for higher density and higher integration of semiconductor devices, more efficient processing has been required, and the types of film formation have increased. There is also a demand for a small variety of semiconductor devices, and it is necessary to connect many vacuum processing chambers to a common transfer chamber. When the vacuum processing chambers are radially connected to the polygonal (cluster type) common transfer chamber, the space between the vacuum processing chambers becomes a dead space, and thus the space is not effectively used and the footprint is increased.
Therefore, for the purpose of improving expandability and footprint, a horizontally long common transfer chamber is provided, and a load lock chamber and a vacuum processing chamber for transferring wafers to and from the atmospheric transfer chamber are arranged on this side wall. A linear traveling type apparatus configuration has been proposed in which a robot having a transfer arm that can be linearly moved in a room and can be extended and contracted to transfer a wafer to and from a vacuum processing chamber has been proposed (for example, a patent) Reference 1 and Patent Document 2).

However, in the case of such an apparatus configuration, a mechanism for linearly moving a robot having a transfer arm, a power cable for driving the robot arm, a linear encoder necessary for detecting the position of the traveling axis and controlling the robot arm Dust and emitted gas from the sensor cable and the like become a problem.
Therefore, in Patent Document 1, in order to eliminate the movable cable, the battery is charged in a non-contact manner while stopping at a predetermined position and the robot travels and the robot arm is driven by this battery. In addition, a mechanism has been proposed in which a partition wall is provided and the transfer arm is moved in a link manner from the atmosphere side.
JP 2004-265894 A (page 7, FIG. 5) JP 2003-332404 A (page 12, FIG. 1)

  However, in Patent Document 1, replacement according to the life of the battery that supplies power to the first drive source for moving the stage and the second drive source for driving the robot, or the non-contact power supply unit of the battery There are problems such as reduction of electromagnetic noise and heat generation processing of a control unit (drive unit) that controls the position of the traveling axis and vacuum robot.

  Moreover, in patent document 2, there exists a problem that only access to the vacuum processing chamber of one direction is possible. Furthermore, since it is necessary to arrange | position the drive part of the link mechanism which forms an expansion-contraction operation | movement to the both sides of a conveyance stand in the traveling axis direction, a traveling axis becomes long. Along with this, the volume of the vacuum vessel increases, and problems such as an increase in footprint, an increase in evacuation time, and an increase in vacuum pump capacity also occur.

  Therefore, the present invention realizes the robot traveling and arm expansion / contraction function without reducing the traveling performance and the driving performance of the transfer arm, and eliminates dust generation and emission gas from the cable and provides improved maintainability. It is for the purpose.

In order to solve the above problem, the present invention is as follows.
The invention according to claim 1 is a transfer mechanism that moves along a path and moves to a predetermined place, and transfers a substrate such as a wafer while expanding and contracting an arm, and a guide rail laid on a substantially flat surface; A movable base guided by the guide rail and movable, a robot base rotatably mounted on the movable base, a first arm fixed to the robot base, and both ends of the first arm Two second arms that are rotatably supported, two tweezers that are rotatably supported at the tip of each of the two second arms, and on which the substrate is placed, and are arranged along the guide rail. A first and second linear motors laid so as to sandwich the moving base, a movable member of each of the first and second linear motors, and a connecting member that couples the robot base Each of the first and second linear motors moves in opposite directions to rotate the robot base via the connecting member, and the two tweezers are connected to the robot base. A transport mechanism that simultaneously expands and contracts with respect to the center is provided.

According to a second aspect of the present invention, there are provided a plurality of processing chambers for processing a substrate in a vacuum atmosphere, and a transfer mechanism connected to the plurality of processing chambers and for taking the substrate in and out of the plurality of processing chambers. A common transfer chamber, a load lock chamber connected to the common transfer chamber and capable of realizing a vacuum atmosphere and an air atmosphere, the load lock chamber, and the target substrate between the cassette storing the substrates. A substrate processing apparatus comprising: an atmospheric transport unit that transports the substrate; wherein the transport mechanism is a substrate processing apparatus that is a transport mechanism according to claim 1 .

According to a third aspect of the present invention, the common transfer chamber is formed in a substantially rectangular shape, and a pair of the plurality of processing chambers are opposed to the two long sides of the common transfer chamber with the common transfer chamber interposed therebetween. The processing apparatus according to claim 2 , wherein the guide rails of the transport mechanism are laid along the long side.

According to a fourth aspect of the present invention, there is provided the processing apparatus according to the third aspect , wherein the transport mechanism simultaneously extends and retracts the two tweezers to simultaneously take in and out the substrate with respect to the pair of processing chambers.

According to a fifth aspect of the present invention, an absolute value type linear scale is provided on each of the movers of the first and second linear motors, and the absolute value linear position detection sensor that detects the absolute value type linear scale includes A plurality of long sides of the common transfer chamber are arranged at the same interval as the length of the absolute value type linear scale, and the entire area of the long side of the common transfer chamber is based on information from the absolute value linear position detection sensor. The processing apparatus according to claim 4 , wherein position control of the first and second linear motors is performed.

According to the first aspect of the present invention, the mechanism for moving along the path and the mechanism for expanding and contracting the arm are realized by only two linear motors, and two tweezers for supporting the substrate are provided. Therefore, the number of substrates that can be transported at a time is increased while the configuration of the drive unit is simplified. In particular, if a linear motor of a movable magnet type is used as the linear motor, it is possible to eliminate drive source cables from the movable portion of the transport mechanism.
According to the second aspect of the present invention, the drive unit of the link mechanism that forms the expansion / contraction operation as in Patent Document 2 does not need to be arranged on both sides of the transport table in the traveling axis direction, and therefore the minimum linearity is required. The transfer mechanism can be configured with the motor length, and the volume of the common transfer chamber and the footprint of the apparatus are not increased.
According to the invention described in claim 3 , the configuration of the processing apparatus can be changed relatively easily by increasing or decreasing the pair of processing chambers with respect to the substantially rectangular common transfer chamber.
According to the fourth aspect of the present invention, the two linear motors of the transport mechanism can be stopped at the position of the processing chamber by synchronously operating, and the arms can be accurately expanded and contracted by controlling the positions of the two linear motors. Therefore, the substrate can be taken in and out of the pair of processing chambers at a time.
According to the fifth aspect of the present invention, since the linear scale is mounted on the mover side of the linear motor and the position detection sensor is fixedly arranged on the common transfer chamber side, the movement of the position detection sensor cable can be eliminated.
In addition, since the position information of the entire area of the common transfer chamber can be recognized from the position information of the absolute value type linear encoder, even if the device stops due to a trouble, the extension position of the travel position and the transfer arm can be recognized. The system can be restored without causing the arm of the transfer mechanism to interfere with the substrate processing chamber without returning to the origin.
In addition, since the position is detected with an absolute value, even if the position is erroneously detected temporarily due to noise or the like, only a momentary positional deviation occurs, and the accumulated positional deviation does not occur automatically. It can be automatically returned to the correct position.

First, a typical overall configuration of a wafer processing apparatus in which a wafer transfer apparatus according to the present invention is used will be described with reference to FIG.
In FIG. 1, a common transfer chamber 1 is a substantially rectangular vacuum chamber having a long side in the Y direction in the drawing. Wafers are transferred to and from the atmospheric transfer enclosure (EFEM) 6 on the left and right long sides of the common transfer chamber 1, and the load lock chamber 3 and the CVD processing unit, which are alternately repeated in the atmosphere and vacuum state, A plurality of processing chambers 4 such as an etching processing section are arranged. The processing chamber 4 is normally in a vacuum state as described above. Reference numeral 5 denotes a gate valve that isolates the load lock chamber 3 and the processing chamber 4 from the common transfer chamber 1 and opens and closes the same. In the common transfer chamber 1, a transfer mechanism 2 for transferring the wafer W is provided. The transport mechanism 2 is movable along a transport path laid in the common transport chamber 1 in the Y direction in the figure. The transfer mechanism 2 travels along the transfer path to the front of each processing chamber 4, and expands and contracts an arm, which will be described later, to load and unload the wafer W into and from each processing chamber 4.
The wafer flow of the wafer processing apparatus in FIG. 1 will be described above. Each processing chamber 4 and the common transfer chamber 1 are decompressed by a pump or the like (not shown) and are in a vacuum state. The load lock chamber 3 is in an atmospheric state. First, the wafer W is acquired from the cassette placed on the wafer cassette opener 6a by the hand provided to the atmospheric robot 6b installed in the atmospheric transfer enclosure 6. The atmospheric robot 6 b opens the gate valve 7 (which has the same function as the gate valve 5) that separates the load lock chamber 3 from the atmospheric transfer enclosure 6, and then passes the wafer W through the load lock chamber 3. Placed on. After the gate valve 7 is closed, the load lock chamber 3 is decompressed by a pump (not shown), and the gate valve 5 that separates the common transfer chamber 1 and the load lock chamber 3 is opened. The transfer mechanism 2 moves along the transfer path between the two load lock chambers 3 (between 3A and 3B in the figure), and an arm described later is extended to acquire the wafer W. Then, the gate valve 5 that isolates the common transfer chamber 1 and the load lock chamber 3 is closed. In the load lock chamber 3, nitrogen or the like is introduced into the inside through a nitrogen introduction path (not shown), and the atmosphere is returned to the atmospheric state again, and the exchange of the wafer with the atmospheric transfer enclosure 6 is repeated.
On the other hand, when the transport mechanism 2 moves again along the transport path and stops in front of the target processing chamber 4, the gate valve 5 that separates the target processing chamber 4 and the common transport chamber 1 is opened.
Then, the transfer mechanism 2 places the held wafer W in the target processing chamber 4 with an arm extended. After the arm is contracted, the gate valve 5 is closed, and a predetermined process is performed on the wafer W in the processing chamber 4. Then, the wafer W processed in the reverse process is returned to the atmospheric transfer enclosure 6 again.

Hereinafter, the transport mechanism 2 described above will be described.
FIGS. 2A and 2B are plan views of the wafer transfer mechanism 2 according to the first embodiment of the present invention as viewed from above, in which the arm extends in the common transfer chamber 1 (A in the drawing) and in the contracted state (in the drawing) B) shows a different travel location. FIG. 3 is a sectional side view as seen from the traveling direction (Y direction in FIG. 1). However, a support plate 29 and tweezers 30 which will be described later are not shown. FIG. 4 is a diagram showing the configuration of the arm portion of the transport mechanism 2 and power transmission. FIG. 5 is a graph showing the expansion / contraction characteristics of the arm portion of the transport mechanism 2. FIG. 6 is a diagram showing an arrangement relationship between the absolute value linear scale and the position detection sensor.

2 and 3, reference numeral 1 denotes a common transfer chamber in FIG. The following are arranged in the common transfer chamber 1.
In the common transfer chamber 1, two guide guides 18 (also referred to as guide rails) are laid along the center of the bottom surface along the long side of the transfer chamber. Each guide guide 18 includes a guide portion 18a and a movable block 18b, and the movable block 18b is movable along the straight bar-shaped guide portion 18a. Several movable blocks 18b are prepared, and a moving base 21 to be described later is placed thereon. Outside the guide guide 18, stators 11 and 13 of movable magnet type first and second linear motors are arranged along the guide guide 18. Reference numeral 12 denotes a mover of the first linear motor, and reference numeral 14 denotes a mover of the second linear motor. Needless to say, the mover of the linear motor moves linearly with respect to the stator. A movable base 21 is placed on the movable block 18b of the guide guide 18 and is movable along the rail portion 18a. On the moving base 21, there is provided a robot base 20 that is rotatably supported by a rotating bearing (not shown) with respect to the moving base 21. A first arm 27 described later is fixed to the robot base 20. Reference numerals 16 and 17 denote connecting members for connecting the movers 12 and 14 of the first and second linear motors to the robot base 20. Since the connecting members 16 and 17 have the same configuration, the configuration of the connecting member 16 will be described here. The connecting member 16 is composed of two long members 16a and 16b. The long member 16a is vertically fixed on the movable element 12, and a convex portion 16a1 is formed at the upper end thereof. Protrusions 20a and 20b are also formed near the both ends of the diameter on the upper part, and bearings (not shown) are provided around the respective projecting parts so as to be rotatable.
On the other hand, an opening hole 16b1 into which the convex part 16a1 is inserted and an opening hole 16b2 into which the convex part 20a is inserted are respectively opened in both ends of the long member 16b, and the convex part 16a1 is formed in the opening hole 16b1. By inserting and inserting the convex portion 20a into the opening hole 16b2, one end of the long member 16b can rotate around the bearing of the convex portion 16a1, and the other end can rotate around the bearing of the convex portion 20a. It is like that. Similarly, the long member 17b of the connecting member 17 is also configured such that one end of the long member 17b rotates about the bearing of the convex portion 17a1 and the other end rotates about the bearing of the convex portion 20b. Therefore, when the movers 12 and 14 of the first and second linear motors move in directions opposite to each other, this operation is transmitted to the robot base 20 via the connecting members 16 and 17, and the first linear motor of the first linear motor is moved. When the mover 12 and the mover 14 of the second linear motor move closer to the moving base 21, the robot base 20 rotates counterclockwise in FIG. 2, and the first linear motor moves. When the child 12 and the mover 14 of the second linear motor move away from each other with respect to the moving base 21, the robot base 20 rotates clockwise.
A particle prevention cover 35 is provided on the side surface of the guide guide 18 in order to prevent scattering of particles from the guide guide. The particle prevention cover 35 is a plate-like member for suppressing dust that is scattered when the movable block 18b of the guide guide 18 travels with respect to the guide portion 18a, and is fixed so as to hang down from the moving base 21. The movable block 18a is concealed with a gap that does not contact the surface on which the portion 18b and the guide portion 18b are laid. In FIG. 3, it is provided over the entire area of the side surface of the moving base 21 (the surface facing the first and second linear motors), but of course, the entire side surface of the moving base 21 (the front surface in FIG. Also, the guide portion 18a and the laying surface of the guide portion 18a may be provided so as not to contact the surface. Thereby, even if particles are scattered from the movable block 18b, the particles are prevented from being scattered by the particle prevention cover 35, so that it is possible to prevent the particles from adhering to the wafer W on the tweezers 30 described later.

In FIG. 4, the structure of the arm part of the conveyance mechanism 2 and power transmission will be described in detail.
The first arm 27 is supported by the robot base 20 at a substantially central portion thereof, and the rotation center of the robot base 20 and the substantially central portion of the first arm 27 coincide with each other. The first arm 27 rotates integrally with the rotation of the robot base 20. Two second arms 28 are supported at both ends of the first arm 27 so as to be rotatable with respect to the first arm 27. In addition, tweezers 30 are attached to the respective distal ends of the second arms 28 via support plates 29. A wafer (substrate) W can be placed on the tweezers 30. The tweezers 30 is provided with a plurality of support pads (not shown) for holding the wafer W, for example.
Inside the first arm 27, a pulley A connected to the moving base 21 by a member (not shown) is provided. A belt 31 is wound around the pulley A. The belt 31 is also wound around two pulleys B inside both ends of the first arm 27. The pulley B is connected to the second arm 28 by a member (not shown). A pulley C is built in the second arm 28 coaxially with the pulley B. The pulley C is connected to the first arm 27 by a member (not shown). A belt 32 is wound around the pulley C. The belt 32 is also wound around the pulley D. The pulley D is rotatably supported inside the tip of the second arm 28. A support plate 29 is fixed to the pulley D. Further, tweezers 30 are fixed to the support plate 29. The pulley A: B ratio is 2: 1 and the pulley C: D ratio is 1: 2.
In addition, the arm support | pillar 36 shown in FIG. This is a member for making the second mechanisms different from each other so that the second arms and the tweezers 30 do not interfere with each other when the transport mechanism 2 is in a state as shown in FIG. The arm support 36 is cylindrical and is connected and fixed to one of the second arms 28 and is also fixed to the pulley B. The second arm 28 and the tweezers 30 can exist in the gap between the first arm 27 and the one second arm 28 and the tweezers 30 obtained by the height dimension of the arm column 36. ing.
With the above configuration, when the robot base 20 rotates, the two tweezers 30 move linearly (in the X direction in the figure) toward the center of the transport mechanism 2 in the arm portion of the transport mechanism 2.

The transport mechanism 2 combining the configuration of the linear mechanism described above and the configuration of the arm portion moves the connecting members 16 and 17 when the movers of the first and second linear motors are moved simultaneously and in opposite directions. Since the robot base 20 rotates, the two tweezers 30 simultaneously expand and contract in opposite directions. If the transfer mechanism 2 is installed in the common transfer chamber 1 as shown in FIG. 1, the two tweezers 30 are simultaneously advanced and retracted into a pair of load lock chambers or processing chambers arranged on the long side of the common transfer chamber 1. Will be able to.
Needless to say, if the movers of the first and second linear motors are moved simultaneously and in the same direction, the moving base 21 and the entire arm portion of the transport mechanism 2 can be moved in that direction. . By this operation, a desired wafer W can be taken in and out by moving the arm portion of the transfer mechanism 2 with respect to each of a pair of load lock chambers or processing chambers connected to the common transfer chamber 1.

Here, the configuration of the first and second linear motors and the operation of the transport mechanism will be described in more detail. As described above, in this embodiment, a movable magnet type linear motor is used. Since the movers 12 and 14 of the movable magnet type linear motor are movable in a non-contact manner with the electromagnetic force with respect to the stators 11 and 13, a guide member for restricting the linear movement of the mover is necessary. . This guide member is shown as a mover guide 19. The mover guide 19 is the same as the guide guide 18. Accordingly, the mover guide 19 is also composed of the rail portion 19a and the movable block 19b. Here, the mover guide 19 can be moved with respect to the rail portion by laying the rail on the inner wall or the like in the common transfer chamber 1 as shown by another installation location 50 (shown by a broken line) of the mover guide. The movable block may be attached to the movable elements 12 and 14 via a member. However, in this case, the rail portion of the mover guide must be laid over the entire moving range of the transport mechanism 2, which is disadvantageous in terms of cost, straightness retention, and the like.
Therefore, in this embodiment, the mover guide 19 is installed at the position of the solid line in the figure. The rail portion 19a of the mover guide 19 is fixed on the movers 12 and 14 of the first and second linear motors. The rail portion 19a is placed on the movers 12 and 14, and when the movers 12 and 14 move the distance for rotating the robot base 20 to expand and contract the arm portion, the movable block moves the rail portion. It needs only to be long enough to prevent it from coming off. The movable block 19b and the moving base 21 are connected by a regulating member 23. Thereby, the linear movement of the movers 12 and 14 is restricted together with the moving base 21 whose traveling direction is restricted by the guide guide 18.
An operation of moving the transport mechanism 2 from the state A to the state B in FIG. 2 when the mover guide 19 has the above configuration will be described. First, when the movers 12 and 14 move from the state of FIG. 2A so as to be close to each other, the robot base 20 rotates counterclockwise through the connecting members 16 and 17. Then, the two tweezers 30 contract so as to be close to the robot base 20. At this time, the rail portion 19a of the mover guide 19 placed on the movers 12 and 14 also moves together with the mover, but the movable block 19b slides with respect to the rail portion 19a, so the moving base 21 does not move. At this time, if the movable block has a necessary and sufficient length as described above, the movable block cannot be removed from the rail. Therefore, only the operation of contracting the arm is achieved. And if the needle | mover 12 and 14 moves to the right direction of FIG. 2 simultaneously, the movement base 21 will move to the direction of FIG. 2B via the connection members 16 and 17. FIG.

Next, operation control of the arm portion of the transport mechanism 2 will be described.
FIG. 5A is a graph showing the operating characteristics of the transport mechanism 2. (B) is the simplified view which looked at the conveyance mechanism 2 from the upper surface. One of the robot base 20 and the two tweezers 30 is not shown. The rotation direction at the rotation center of the robot base 20 is θ, the movement direction of the mover of the first and second linear motors is L, and the distance from the rotation center of the transfer mechanism 2 to the center of the wafer W is R.
In advance, the movers of the first and second linear motors are moved so that the center of the wafer W placed on the tweezers 30 is the center of the transfer mechanism 2, the arms are contracted, and the state is set to the origin posture, for example. . Then, as in the operation characteristics shown in FIG. 5A, the movement amounts of the first and second linear motors from the origin posture, the operation rotation angle amount of the first arm at that time, The relationship with the movement amount of the center position is grasped in advance. Here, in FIG. 5A, the horizontal axis is the linear axis movement amount, and shows the movement amount of the mover of the first and second linear motors from the origin posture. The vertical axis indicates the operation rotation amount θ (deg) of the first arm and the movement amount R of the center position of the wafer placed on the tweezers. Thus, since the linear axis movement amount and the movement amount of the center position of the wafer are not in a completely linear relationship, the arm extension / contraction amount command is issued based on this relationship, and the first and second linear motors The position is controlled.

Next, position control of the first and second linear motors will be described. In order to recognize the position of the linear motor, an absolute value type linear encoder described below is used. As in the present invention, in the case of a mechanism that converts the linear motion of the linear motor into the rotation of the arm unit, it is necessary to be able to immediately recognize the arm posture and the running position when the system is started up. When the home position return operation is performed in a state where the arm posture and the current position cannot be recognized, the arm portion interferes with the inner wall of the common transfer chamber 1, the processing chamber 4 and the load lock chamber 3, and the tweezers 30 transfers the wafer W. If it is inside, the wafer W is dropped and damaged. For this purpose, in the transport mechanism of the present invention, it is essential to install an absolute value type linear encoder of vacuum specification.
For example, the linear absolute value encoder of the vacuum specification is obtained by extending the slit of the rotary disk shown in Japanese Patent Application Laid-Open No. 2003-185472 (absolute encoder and its absolute value signal generation processing method) previously filed by the present applicant. Can be realized. Since this encoder scale is formed by etching the magnetic slit, an arbitrary scale length can be easily produced. In addition, since it is magnetic, it is not easily affected by dirt on the scale like the optical system, and is highly reliable.
FIG. 6 shows the first and second linear motors on the absolute value type linear scales 40 and 41 attached to the movers 12 and 14 of the first and second linear motors, the side walls in the common transfer chamber 1 and the like. It is a figure which shows the arrangement | sequence relationship with the absolute value linear position detection sensors 42 and 43 arrange | positioned along. The linear scales 40 and 41 and the position detection sensors 42 and 43 may be arranged at intervals of the length of the linear scales 40 and 41. For example, the load lock chamber 3A and the processing chamber 4A, and the load lock chamber 3B and the processing chamber. It arrange | positions at equal intervals in each 4B center part. The signals of the position detection sensors 42 and 43 are input to an absolute value encoder processing unit 45 in the electric control unit, and from the position information of the position detection sensors 42 and 43, the movers of the first and second linear motors are obtained. The current position in the common transfer chamber 1 is recognized. A power drive unit 46 is a driver for driving the first and second linear motors. Based on the positional information from the absolute value type encoder processing unit 45 and the relationship between the linear shaft operation amount and the arm operation amount shown in FIG. 5, the first and second linear motors are controlled based on the thrust command from the controller 44. The arm expansion / contraction amount (wafer center position) of the transfer mechanism 2 is controlled.
In the present invention, the scale length and the position detection sensor interval can be made the same length by limiting to the adoption of the absolute value type linear. As the scale length increases, the chamber length (volume) of the common transfer chamber increases, but this can be suppressed. In addition, the current position can be easily recognized, and the system can be started up without performing the return to origin operation. It is possible to start up the system when an emergency stop occurs due to an abnormal stop, etc., without opening the common transfer chamber to the atmosphere, and without human work, minimizing downtime.

Next, a second embodiment of the transport mechanism 2 will be described.
FIGS. 7A and 7B are plan views from above showing the transport mechanism 2 according to the second embodiment of the present invention, with the arm extending in the common transport chamber 1 (A in the drawing) and in the contracted state (B in the drawing). Shown with different driving locations. FIG. 8 is a side cross-sectional view seen from the traveling direction (Y direction in FIG. 1).

7 and 8, only the parts different from those in FIGS. 2 and 3 will be described.
33 is a stator of the third linear motor, and 34 is a mover of the third linear motor. The third linear motor is laid on the bottom surface in the common transfer chamber 1 so as to be sandwiched between the two guide guides 18. That is, it is arranged at the lower part of the moving base 21. The movable element 34 of the third linear motor and the moving base 21 are connected, and the moving base 21 moves according to the guide guide 18 by the third linear motor. The mover 12 of the first linear motor is connected to the robot base 20 by a connecting member 16, and this configuration is the same as that of the first embodiment. There is no second linear motor in the first embodiment. Further, the arm portion above the robot base 20 is the same as that in the first embodiment.
Therefore, in the second embodiment, the expansion / contraction operation of the arm portion of the transport mechanism 2 is performed by controlling the relative positions of the third and first linear motor movable elements 32 and 14. For example, when the arm is contracted to run, the first linear motor mover 12 is moved in the left direction in FIG. 7 with the third linear motor mover 34 stopped in FIG. After shrinking (tweezers), the movers of the first and third linear motors are made to travel in the same direction in synchronization. Then, the wafer W is stopped in front of the processing chamber 4 for loading / unloading the wafer W, the gate valve 5 for isolating the processing chamber 4 and the common transfer chamber 1 is opened, and only the movable element 12 of the first linear motor is again opened at this position. 7, the arm (tweezers) is extended by running in the right direction, and the wafer W is loaded into the processing chamber 4.
As described above, in the second embodiment, the third linear motor directly drives the moving base 21. In the present invention, since the moving base 21 and the arm portion are large and heavy, they can be driven stably by directly driving them. In particular, if the third linear motor is arranged below the moving base 21 as in the second embodiment, the third linear motor can drive the center of gravity of the moving base 21 and the arm portion, so that these can be more stably performed. Can be driven.

  The present invention is useful not only as a wafer transfer device of a processing apparatus for semiconductor manufacturing but also as a transfer device of a glass substrate or the like used in a liquid crystal manufacturing apparatus.

It is the whole top view of the typical processing apparatus in which the conveyance mechanism of this invention is used. It is a top view which shows the conveyance mechanism of 1st Example of this invention. In FIG. 2, it is the sectional side view seen from the running direction of the conveyance mechanism. It is a top view which shows the detail of the arm part of the conveyance mechanism of this invention. It is a graph which shows the relationship between the operation amount of the linear motor movable element of the conveyance mechanism of this invention, the operation rotation amount of the 1st arm at that time, and the movement amount of the center of a wafer. It is a figure which shows the structure of the linear scale of 1st Example of this invention, and the structure of a control system. It is a top view which shows the conveyance mechanism of 2nd Example of this invention. In FIG. 7, it is the sectional side view seen from the running direction of the conveyance mechanism. It is a figure which shows the structure of the linear scale of this invention 2 Example, and the structure of a control system.

Explanation of symbols

W Object to be processed (semiconductor wafer)
DESCRIPTION OF SYMBOLS 1 Common transfer chamber 2 Transfer mechanism 3 Load lock chamber 4 Processing chamber 5 Gate valve 6 Atmospheric transfer enclosure (EFEM)
6a Wafer cassette opener 6b Atmospheric robot 7 Gate valve 11 First linear motor stator 12 First linear motor mover 13 Second linear motor stator 14 Second linear motor mover 16, 17 Member 18 Guide guide 18a Rail portion 18b Movable block 19 Movable child guide 19a Rail portion 19b Movable block 20 Robot base 21 Moving base 23 Restricting member 27 First arm 28 Second arm 29 Support plates A, B, C, D Pulley 30 Tweezers 31, 32 Belt 33 Third linear motor stator 34 Third linear motor mover 35 Particle prevention cover 36 Arm struts 40, 41 Absolute value type linear scale 42, 43 Absolute value type linear position detection sensor 44 Controller 45 Absolute encoder processing unit 46 Another of the installation location of the word live section 50 the armature guide

Claims (5)

In a transfer mechanism that moves along a path, moves to a predetermined location, and transfers a substrate such as a wafer while expanding and contracting an arm,
A guide rail laid on a substantially flat surface;
A movable base guided by the guide rail and movable;
A robot base rotatably mounted on the moving base;
One first arm fixed to the robot base;
Two second arms rotatably supported at both ends of the first arm;
Two tweezers which are rotatably supported at the tip of each of the two second arms and place the substrate;
First and second linear motors arranged along the guide rail and laid so as to sandwich the moving base;
A mover for each of the first and second linear motors and a connecting member for coupling the robot base;
The movers of the first and second linear motors move in opposite directions to rotate the robot base via the connecting member, and the two tweezers are moved relative to the center of the robot base. A transport mechanism characterized by simultaneously expanding and contracting. A plurality of processing chambers for processing substrates in a vacuum atmosphere;
A common transfer chamber that is connected to the plurality of processing chambers and includes a transfer mechanism for taking the substrate in and out of the plurality of processing chambers;
A load lock chamber connected to the common transfer chamber and capable of realizing a vacuum atmosphere and an air atmosphere;
In the substrate processing apparatus comprising: the load lock chamber; and an atmospheric transfer unit that transfers the target substrate between the cassette that stores the substrate.
The substrate transport apparatus according to claim 1, wherein the transport mechanism is the transport mechanism according to claim 1 . The common transfer chamber is formed in a substantially rectangular shape, and a pair of the plurality of processing chambers are connected to two long sides of the common transfer chamber so as to face each other across the common transfer chamber. The processing apparatus according to claim 2 , wherein the guide rail is laid along the long side . The processing apparatus according to claim 3 , wherein the transport mechanism simultaneously moves the two tweezers in and out to extend and retract the substrate simultaneously with respect to the pair of processing chambers . Each of the movers of the first and second linear motors is provided with an absolute value type linear scale,
A plurality of absolute value linear position detection sensors for detecting the absolute value type linear scale are arranged on the long side in the common transfer chamber at the same interval as the length of the absolute value type linear scale,
Based on the information from the absolute value linear position sensor, according to claim 2, wherein said position control of the the whole area of the long side of the common transfer chamber first and second linear motors is carried out Processing equipment.

Images