KR102583167B1 - Conveyance apparatus, conveyance method and conveyance system - Google Patents

Abstract

The purpose of the present invention is to improve the transport efficiency of substrates.
The transfer device according to the present invention includes a first robot, a second robot, and a movable buffer. The first robot is a robot that is fixed inside the transfer room and transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on the first side wall of the transfer chamber. The second robot is a robot that is fixed inside the transfer room and transfers substrates to a second processing chamber group in which a plurality of processing chambers are arranged horizontally on a second side wall opposite to the first side wall. The movable buffer can exchange substrates with the first robot and the second robot, and moves between the first robot and the second robot along a trajectory extending in the direction of the arrangement of the processing chamber.

Description

Conveyance device, conveyance method and conveyance system {CONVEYANCE APPARATUS, CONVEYANCE METHOD AND CONVEYANCE SYSTEM}

The disclosed embodiment relates to a conveyance device, a conveyance method, and a conveyance system.

Conventionally, a transfer device is known in which a robot having a hand for transferring substrates is placed in a transfer chamber with a reduced pressure atmosphere, and the substrates are transferred to a processing chamber installed on the side wall of the transfer chamber.

For example, a substrate processing device has been proposed that transfers substrates to a plurality of processing chambers installed on the side walls of the transfer chamber using a mobile robot that moves within the transfer chamber by being driven by a linear motor (see, for example, patent document 1).

[Patent Document 1] Japanese Patent Publication No. 2008-028179

However, in the above-described prior art, there are concerns about an increase in cost due to making the robot mobile and a decrease in availability due to the complexity of the mobile mechanism. If the solubility decreases, the transport efficiency of the substrate will eventually decrease, so there is room for improvement from the viewpoint of improving the transport efficiency of the substrate before and after processing.

One aspect of the embodiment aims to provide a transport device, a transport method, and a transport system that can improve the transport efficiency of a substrate.

A transfer device according to one aspect of the embodiment includes a first robot, a second robot, and a movable buffer. The first robot is fixed inside the transfer room and transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on the first side wall of the transfer chamber. The second robot is fixed inside the transfer room and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall. The movable buffer is capable of exchanging the substrate with the first robot and the second robot, and moves between the first robot and the second robot along an extending trajectory in the arrangement direction of the processing chamber. .

The transfer method according to one aspect of the embodiment uses a first robot, a second robot, and a movable buffer, and causes the first robot and the second robot to exchange a substrate with the movable buffer. The first robot is fixed inside the transfer room and transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on the first side wall of the transfer chamber. The second robot is fixed inside the transfer room and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall. The movable buffer is capable of exchanging the substrate with the first robot and the second robot, and moves between the first robot and the second robot along a trajectory extending in the arrangement direction of the processing chamber.

A transfer system according to one aspect of the embodiment includes a transfer room, a first robot, a second robot, and a movable buffer. The first robot is a robot that is fixed inside the transfer room and transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on the first side wall of the transfer chamber. The second robot is fixed inside the transfer room and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall. The movable buffer is capable of exchanging the substrate with the first robot and the second robot, and moves between the first robot and the second robot along a trajectory extending in the arrangement direction of the processing chamber.

A transfer device according to one aspect of the embodiment includes a first robot, a second robot, a movable buffer, and a controller. The first robot is fixed inside the transfer room and transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on the first side wall of the transfer chamber. The second robot is fixed inside the transfer room and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall. The movable buffer is capable of exchanging the substrate with the first robot and the second robot, and moves between the first robot and the second robot along a trajectory extending in the arrangement direction of the processing chamber. The controller causes the substrate to be exchanged between the mobile buffer and the processing chamber by linking the operations of the first robot and the second robot with movement of the mobile buffer.

According to one aspect of the embodiment, a transport device, a transport method, and a transport system that can improve the transport efficiency of a substrate can be provided.

1 is a top schematic diagram showing an outline of a conveyance system according to an embodiment.
Fig. 2 is a top schematic diagram showing an example of the arrangement of a transfer device in a transfer room.
Figure 3a is a side schematic diagram of the robot and mobile buffer.
Figure 3b is a side schematic diagram of a movable buffer.
Figure 3c is a schematic top view of a movable buffer.
Fig. 4 is a top schematic diagram showing a modified example of the transfer device in the transfer room.
Fig. 5A is a side schematic diagram of a conveyance device according to a modification.
Figure 5b is a side schematic diagram of a movable buffer according to a modified example.
Figure 5c is a top schematic diagram of a movable buffer according to a modified example.
Figure 6 is a schematic top view of the transfer room.
Figure 7 is a schematic top view of a transfer chamber extending in the direction of elongation of the track.
Fig. 8A is a top schematic diagram showing robot configuration example 1.
Figure 8b is a top schematic diagram showing configuration example 2 of the robot.
Fig. 8C is a top schematic diagram showing configuration example 3 of the robot.
Figure 8d is a top schematic diagram showing configuration example 4 of the robot.
Fig. 9 is a block diagram showing the configuration of the transfer device.
Fig. 10 is a flowchart showing the processing sequence executed by the transfer device.
Fig. 11 is a schematic top view of the transfer room where the two-arm robot is placed.

EMBODIMENT OF THE INVENTION Hereinafter, with reference to the accompanying drawings, embodiments of the conveyance apparatus, conveyance method, and conveyance system disclosed by this application will be described in detail. In addition, the present invention is not limited to the embodiments shown below.

Additionally, in the embodiment shown below, expressions such as “orthogonal,” “horizontal,” “perpendicular,” “parallel,” or “symmetrical” are used, but it is not necessary to strictly satisfy these conditions. That is, each of the above expressions allows for deviations in manufacturing accuracy, installation accuracy, processing accuracy, detection accuracy, etc.

First, an outline of the conveyance system 1 according to the embodiment will be described using FIG. 1. 1 is a top schematic diagram showing an outline of the conveyance system 1 according to the embodiment. 1 corresponds to a schematic diagram of the conveyance system 1 viewed from above.

In addition, in FIG. 1, in order to make the explanation easier to understand, the Z-axis is vertically upward in the positive direction, and the direction along the side wall 100sw of the transfer room 100 where a plurality of processing chambers (PCs) are installed is the It shows a three-dimensional Cartesian coordinate system with the normal direction of 100sw) as the Y axis. This orthogonal coordinate system may also be shown in other drawings used in the following description. In addition, FIG. 1 shows a center line CL corresponding to the front of the processing chamber PC. The center line CL corresponds to a line (a line along the Y axis in FIG. 1) that passes through the center of the substrate W (see the dashed circle) in the processing chamber PC, among the normal lines of the side wall 100sw.

As shown in FIG. 1, outside the transfer chamber 100, a plurality of processing chambers (PC) for processing the substrate W in a reduced pressure atmosphere are installed on the side wall 100sw. Processes that the processing chamber PC performs on the substrate W include film forming processing such as CVD (Chemical Vapor Deposition) and etching processing. Additionally, in general, an environment with a reduced pressure atmosphere is sometimes called “vacuum.” Additionally, the sides of the double lines in the processing chamber PC shown in FIG. 1 correspond to openings that can be opened and closed.

The transfer room 100, like the processing room PC, has a reduced pressure atmosphere, and a plurality of robots 10 and a movable buffer 110 are placed inside the room, and both cooperate to transfer the substrate W. The robot 10 is a substrate transfer mechanism that transfers and receives the substrate W, such as putting the substrate W into the processing chamber PC or removing the substrate W from the processing chamber PC. For example, the horizontal articulated robot ( It is a scalar robot).

The robot 10 is a “fixed robot” that is fixed inside the transfer room 100, and is different from a “mobile robot” that runs or moves inside the transfer room 100. Additionally, a plurality of robots 10 are installed along the side wall 100sw of the transfer room 100. In this way, since the robot 10 does not move within the transfer room 100, it is easy to supply power to the robot 10 and contributes to keeping the transfer room 100 clean.

On the side wall 100sw of the transfer chamber 100, a plurality of processing chambers PC are installed side by side in the horizontal direction. Here, the plurality of processing chambers (PC) installed in the first side wall (100sw1) are referred to as a first processing chamber group (PCg1), and the plurality of processing chambers (PC) installed in the second side wall (100sw2) opposite to the first side wall (100sw1) ) are each referred to as the second processing chamber group (PCg2). In addition, the plurality of robots 10 installed along the arrangement direction of the processing chambers (PC) on the first side wall 100sw1 are referred to as the first robot 10g1, and the arrangement of the processing chambers (PC) on the second side wall 100sw2 is referred to as the first robot 10g1. The plurality of robots 10 installed along the direction are each called the second robot 10g2.

The movable buffer 110 is a buffer that temporarily holds the substrate W, and moves along the direction in which the plurality of processing chambers PC are arranged on the side wall 100sw (the direction parallel to the X-axis in FIG. 1) [ See horizontal direction (D1) in Figure 1]. For example, the movable buffer 110 is fixed to the upper surface of the transfer chamber 100, hangs on a track 120 extending along the horizontal direction D1, and moves along the movement path ML. Here, the movable buffer 110 is driven non-contactly by a linear motor or the like. Additionally, since the side wall 100sw shown in FIG. 1 is straight when viewed from the top, the horizontal direction D1 and the movement path ML are also straight.

That is, the first robot 10g1, the second robot 10g2, and the movable buffer 110 are connected to the first side wall 100sw1, the first robot 10g1, and the movable buffer 110 along the Y axis shown in FIG. 1. ), the second robot 10g2, and the second side wall 100sw2. In this way, since the movable buffer 110 is disposed in a position where it is possible to exchange the substrate W with the first robot 10g1 and the second robot 10g2, the first robot 10g1 or the second robot 10g2 ) Even if any one of them has stopped, transport of the substrate W can be continued, thereby improving the availability of substrate transport.

Each robot 10 exchanges the substrate W between the mobile buffer 110 and the processing chamber PC by linking it with the movement of the mobile buffer 110 . Specifically, when the robot 10 carries out the substrate W from the transfer chamber 100 to the processing room PC, the movable buffer 110 holding the substrate W before processing is used by the robot 10. Move nearby. The robot 10 acquires the unprocessed substrate W from the movable buffer 110 and carries out the acquired unprocessed substrate W to the processing chamber PC.

Additionally, when the robot 10 carries the substrate W from the processing chamber (PC) into the transfer chamber 100, the mobile buffer 110 that is empty (not holding the substrate W) is stored in the robot 10. move to the vicinity of The robot 10 takes out the processed substrate W from the processing chamber PC and passes the taken out processed substrate W to the movable buffer 110 .

In addition, as shown in FIG. 1, when a plurality of robots 10 are each placed in front of the processing room (PC), it is preferable that the movable buffer 110 can also be stopped in the front of the processing room (PC). By doing this, the moving distance of the substrate W when exchanging the substrate W between the processing room PC and the robot 10 can be minimized, and the transfer efficiency can be improved. Additionally, since the operation of the robot 10 can be simplified, the configuration of the robot 10 can also be simplified, making it possible to reduce the cost.

In this way, by using the buffer as a movable buffer 110, the object to be moved can be made lighter and the movement mechanism can be simplified compared to the case where the robot 10 is made mobile. As a result, the operation rate of the moving mechanism is improved, so the availability of transport of the substrate W can be increased, and it becomes possible to improve the transport efficiency of the substrate W.

Recently, the processing time for the substrate W in each processing chamber (PC) tends to become longer due to the multilayering of the semiconductor formed on the substrate W, etc., and the processing time for the substrate W per one transfer chamber 100 tends to be longer. There is a need to improve the number of substrates W processed per unit time by increasing the number.

Accordingly, this request can be met by improving the transfer efficiency of the substrate W in the transfer chamber 100, as in the transfer system 1 shown in FIG. 1. Additionally, by making the robot 10 fixed, the height of the transfer room 100 can be reduced, and the volume of the transfer room 100 can be reduced. This makes it possible to reduce the operating cost of the transfer room 100.

In addition, in FIG. 1, only a part of the transfer room 100 is shown, but for an example of the arrangement of the processing room (PC), robot 10, movable buffer 110, etc. in the entire transfer room 100, see FIG. 2, etc. This will be described later using . Additionally, configuration examples of the robot 10 and the movable buffer 110 will be described later using FIG. 3A and the like.

By the way, the robot 10 shown in FIG. 1 can also access the load lock room corresponding to the entrance/exit of the substrate W in the transfer chamber 100, but the top shape of the transfer chamber 100, the load lock room or the processing chamber ( There are many variations in the layout of the PC. In addition, in the case of a robot-embedded load lock room, if the built-in robot can exchange the substrate W with the movable buffer 110, the robot 10 shown in FIG. 1 is not required to be able to access the load lock room. No. Additionally, as shown in FIG. 1, a device including the robot 10 and the movable buffer 110 is sometimes called the transfer device 5.

Next, an example of the arrangement of the transfer device 5 in the transfer room 100 will be described using FIG. 2. FIG. 2 is a top schematic diagram showing an example of the arrangement of the transfer device 5 in the transfer room 100. Additionally, the top surface of the transfer chamber 100 shown in FIG. 2 is square, but it may be a rectangular shape with either a long side along the X-axis or a long side along the Y-axis.

As shown in FIG. 2, two processing chambers (PC) are installed at opposing positions of the first side wall 100sw1 and the second side wall 100sw2. Additionally, the robot 10 is placed in front of the opening in each processing room (PC).

Specifically, regarding the first robot 10g1, the robot 10-1 is in front of the processing room PC11 in the first processing room group PCg1, and the robot 10-2 is in front of the processing room PC12. These are placed respectively. In addition, regarding the second robot 10g2, the robot 10-3 is in front of the processing room PC21 in the second processing room group PCg2, and the robot 10-4 is in front of the processing room PC22. are placed respectively.

Additionally, the track 120 extends along the horizontal direction D1 at an intermediate position where it is inserted between the first robot 10g1 and the second robot 10g2. Then, the movable buffer 110 moves along the movement path ML along the stretching direction of the orbit 120. Here, the movable buffer 110 and the orbit 120 may be collectively called the movable buffer 110. Additionally, the configuration of the movable buffer 110 and the track 120 will be described later using FIG. 3A. Additionally, if the movement path ML of the movable buffer 110 is the position shown in FIG. 2, the position of the trajectory 120 may be a different position. For example, the orbit 120 may be above the first robot 10g1 or the second robot 10g2.

In this way, the same number of first robots 10g1 as the processing chambers PC are installed at positions opposite to the loading/unloading ports of each processing chamber PC in the first processing chamber group PCg1, and each robot 10 ) exchanges the substrate W between the opposing processing chamber (PC) and the movable buffer 110. The second robot 10g2 is installed in the same number as the processing chamber PC at a position opposite to the loading/unloading port of each processing chamber PC in the second processing chamber group PCg2, and each robot 10 faces the processing chamber PC. The substrate W is exchanged between the processing chamber (PC) and the mobile buffer 110.

In addition, in FIG. 2, the number of processing chambers (PC) in the first processing chamber group (PCg1) and the second processing chamber group (PCg2) is 2, respectively, and the number of processing chambers (PC) in the first robot 10g1 and the second robot 10g2 is 10) shows a case where there are two of the same number. However, it is not limited to this, and the number of processing rooms (PC) in the first processing room group (PCg1) and the second processing room group (PCg2), and the robots ( The number of 10) may be set to 3 or more.

However, as shown in FIG. 2, two load lock chambers LL and two processing chambers PC are installed at opposing positions of the third side wall 100sw3 and the fourth side wall 100sw4, respectively. Additionally, the robot 10 is disposed in front of the opening in each load lock room (LL) or each processing room (PC). Here, the load lock chamber LL can vary its internal pressure between a reduced-pressure atmosphere and an atmospheric pressure atmosphere, and corresponds to the entrance/exit of the substrate W in the transfer chamber 100 in a reduced-pressure atmosphere. In addition, a plurality of processing chambers (PC) installed in the fourth side wall 100sw4 are referred to as a fourth processing chamber group (PCg4).

Specifically, for the first robot 10g1, the robot 10-1 is in front of the load lock room LL1, and the robot 10-2 is in front of the processing chamber PC31 in the fourth processing room group PCg4. ) are placed respectively. Additionally, regarding the second robot 10g2, the robot 10-3 is located in front of the load lock room LL2, and the robot 10-4 is located in front of the processing chamber PC32 in the fourth processing room group PCg4. , are placed respectively.

As shown in FIG. 2, the substrate W being loaded into and out of the transfer room 100 via the load lock room LL1 is moved by the first robot 10g1 operating in conjunction with the movable buffer 110. It is returned to each processing room (PC). In addition, the substrates W, which are loaded into and out of the transfer room 100 via the load lock room LL2, are transferred to each processing room (PC) by the second robot 10g2 operating in conjunction with the movable buffer 110. It is sent back. That is, according to the robot 10 and the mobile buffer 110 shown in FIG. 2 (refer to the transfer device 5 shown in FIG. 1), the transfer path of the substrate W can be divided into two systems, so that the substrate It becomes possible to increase the availability of returns.

In addition, as shown in FIG. 2, the robots 10-1 and 10-3, which are the robots 10 closest to the third side wall 100sw3, apply the substrate W to the load lock room LL. I decided to send it back. By doing this, it becomes unnecessary to install a built-in robot inside the load lock room LL, making it possible to miniaturize the load lock room LL. Additionally, the load lock chamber LL of the third side wall 100sw3 may be one, and one of the robots 10-1 and 10-3 may access the load lock chamber LL.

In addition, as shown in FIG. 2, the robots 10-2 and 10-4, which are the robots 10 closest to the fourth side wall 100sw4, also use the substrate W for the fourth processing chamber group PCg4. ) was to be returned. By doing this, it becomes possible to process the substrate W in parallel, thereby increasing the throughput of substrate processing in the transfer chamber 100. Additionally, the processing chamber (PC) of the fourth side wall 100sw4 may be made into one, and one of the robots 10-2 and 10-4 may access the processing chamber (PC) of the fourth side wall 100sw4. .

In addition, as shown in FIG. 2, the trajectory 120 is set at a position and length that allows the movable buffer 110 to exchange the substrate W with all robots 10 indoors in the transfer room 100. It is installed. By doing this, all the robots 10 (robots 10-1 to 4) can transport the substrate W in conjunction with the movable buffer 110.

Additionally, as shown in FIG. 2, there is only one orbit 120, and the movable buffer 110 exchanges the substrate W with the robot 10 on both sides of the orbit 120. By doing this, the footprint of the transfer chamber 100 can be reduced, and it becomes possible to miniaturize the volume of the transfer chamber 100.

Next, a configuration example of the robot 10 and the mobile buffer 110 shown in FIG. 2 will be described using FIGS. 3A to 3C. FIG. 3A is a schematic side view of the robot 10 and the movable buffer 110, FIG. 3B is a schematic side view of the movable buffer 110, and FIG. 3C is a schematic top view of the movable buffer 110. In addition, FIG. 3A corresponds to a side schematic diagram of the robot 10 and the movable buffer 110 shown in FIG. 2 as seen from the positive It corresponds to the model diagram. 3C corresponds to a top schematic diagram of the movable buffer 110 as seen from the top side (Z-axis positive direction side).

As shown in FIG. 3A, the movable buffer 110 hangs from the upper surface 100ci of the upper wall 100c in the transfer chamber 100. Additionally, the first robot 10g1 and the second robot 10g2 are fixed to the bottom surface 100fi of the bottom wall 100f in the transfer room 100. Additionally, the movable buffer 110 exchanges the substrate W with both the first robot 10g1 and the second robot 10g2. In this way, by using the movable buffer 110 as a ceiling-suspended type, interference with the robot 10 is less likely to occur compared to the case where the movable buffer 110 is used as a floor-placed type.

Additionally, an exhaust mechanism is installed on the upper wall 100c of the transfer chamber 100 to exhaust gas inside the room to the outdoors. By installing a discharge mechanism on the upper wall 100c, even if particles are generated due to the movement of the movable buffer 110, it becomes possible to prevent the particles from spreading or immediately discharge them outdoors.

In addition, as shown in FIG. 3A, the movable buffer 110 is a multi-stage type, and the first robot 10g1 and the second robot 10g2 place a substrate W on each stage of the movable buffer 110. Practice giving and receiving. In this way, by using the movable buffer 110 in a multi-stage manner, it becomes possible to hold a plurality of substrates W, thereby improving the efficiency of substrate transportation.

First, a configuration example of the robot 10 will be described. As shown in FIG. 3A, the robot 10 includes a first arm 11, a second arm 12, a hand 13, a lifting mechanism 15, a flange F, and a base. Part (B) is provided.

Additionally, the base portion B of the robot 10 penetrates the bottom wall 100f of the transfer chamber 100 and protrudes out of the transfer chamber 100. Additionally, the flange F supports the robot 10 on the bottom surface 100fi, which is the upper surface of the bottom wall 100f, and maintains the airtightness of the transfer chamber 100. In this way, by protruding the base portion B of the robot 10 from the transfer chamber 100, the volume of the transfer chamber 100 can be reduced. Additionally, it is possible to easily access the robot 10 from outside the transfer room 100 for power supply, maintenance, etc.

The lifting mechanism 15 supports the proximal end side of the first arm 11 so that it can rotate around the first rotation axis AH1 and moves up and down along the lifting axis AV. Additionally, the lifting mechanism 15 itself may be rotated around the first rotation axis AH1. The first arm 11 supports the proximal end of the second arm 12 at its distal end so that it can rotate around the second rotation axis AH2. The second arm 12 supports the proximal end of the hand 13 at its distal end so that it can rotate around the third rotation axis AH3. As shown in Fig. 1 or Fig. 2, for example, the hand 13 has a fork portion whose distal end is forked, and supports the substrate W on the upper surface side. Additionally, the hand 13 may hold a plurality of substrates W in multiple stages, or, for example, a plurality of hands 13 each rotating coaxially may be provided.

Here, the first arm 11, the second arm 12, and the hand 13, which correspond to horizontal arms, are formed around the first rotation axis AH1, the second rotation axis AH2, and the third rotation axis AH3, respectively. You can also turn it independently. Additionally, the second arm 12 and the hand 13 may rotate in response to the rotation of the first arm 11 around the first rotation axis AH1.

There are three drive sources (actuators) when turning independently, and there are one or two drive sources when turning in a driven manner. Additionally, the robot 10 requires another drive source for lifting and lowering the lifting mechanism 15. Here, there are variations in the axis configuration of the robot 10, but details will be described later using FIGS. 8A, 8B, 8C, and 8D.

Next, a configuration example of the movable buffer 110 will be described. The movable buffer 110 includes a holding module 111 that holds the substrate W, and a driving module 112. Here, the driving module 112 shown in FIG. 3A corresponds to a mover in a moving magnet linear motor.

For this reason, hereinafter, the “drive module 112” may be referred to as the “mover 112.” Here, the linear motor is not limited to the moving magnet type, but may be an induction type (dielectric type). In this embodiment, the moving magnet method, that is, the case where the mover 112 includes a permanent magnet, is described, but the mover 112 may be formed of a material that moves when a dielectric current flows.

Additionally, the track 120 is provided with a stator 120a and a guide 120b corresponding to the stator in a linear motor. In addition, in this embodiment, the case where the movable buffer 110 moves with respect to the track 120 by the driving force by the linear motor is explained, but it may be a contact type or a non-contact type such as a magnetic levitation type or an air levitation type. good night. The guide 120b is a support member that guides linear motion or curved motion within a plane such as a horizontal plane. In the case shown in FIG. 3A, the guide 120b guides the movable buffer 110 to move in a straight line along the X-axis.

In this way, the driving module 112 of the movable buffer 110 is driven non-contactly by the stator 120a included in the track 120. For example, the stator 120a is formed by molding the windings with resin or the like and covering the surface of the mold with a film-like metal. This metal film is also called a can and traps gas generated from resin etc. inside.

Non-contact driving of the movable buffer 110 using a moving magnet contributes to cleaning the transfer room 100. Additionally, since power to the stator 120a can be supplied via the upper wall 100c of the transfer chamber 100, this can also contribute to cleaning the transfer chamber 100.

Next, the shape of the movable buffer 110 will be described in more detail. As shown in FIG. 3A, the movable buffer 110 is provided with a cover 115 to prevent particle diffusion. The cover 115 extends along the track 120 and cantilevers from one side of the track 120 (the negative Y-axis direction side in FIG. 3A) to the upper surface 100ci of the transfer chamber 100. , passes through the lower surface of the track 120 and bends upward along the other side (the side on the positive Y-axis direction in FIG. 3A). By installing the cover 115, even if particles are generated from the track 120, the particles can be prevented from spreading into the interior of the transfer chamber 100.

Additionally, as shown in FIG. 3A, the holding module 111 in the movable buffer 110 includes a support portion 111a that supports the buffer and a holding portion 111b corresponding to the buffer. The support portion 111a extends toward the other side of the track 120 (the side in the positive direction of the Y axis in Fig. 3a) and is bent to avoid the portion where the cover 115 is bent upward to form the track. A buffer (holding portion 111b) is supported below 120.

Specifically, the support portion 111a is stretched upward to avoid the portion where the cover 115 is bent upward, and is stretched along the upper surface 100ci of the transfer chamber 100, so that the cover 115 is stretched upward. It is stretched downward along the curved portion and further stretched in a direction approaching the track 120 to support the holding portion 111b below the track 120. In this way, by making the support portion 111a that supports the buffer into a so-called labyrinth structure, the gap between the cover 115 and the upper surface 100ci of the transfer chamber 100 can be narrowed, and thus the particle Spread can be prevented.

Here, the movable buffer 110 is capable of exchanging the substrate W with both the first robot 10g1 and the second robot 10g2. For example, the second robot 10g2 can acquire the substrate W placed in the movable buffer 110 by the first robot 10g1. 3A illustrates a case where the movable buffer 110 includes a four-stage buffer (holding unit 111b), but the number of buffer stages may be any stage greater than one stage.

As shown in FIG. 3A, when the substrate W is held by the movable buffer 110, the robot 10 inserts the hand 13 between each stage of the movable buffer 110. Afterwards, the hand 13 is raised to lift and receive the substrate W. Conversely, when the substrate W is held by the hand 13, the robot 10 causes the hand 13 to penetrate between each stage of the movable buffer 110 and then moves the hand 13. By lowering, the substrate W is passed to the movable buffer 110.

Next, the case where the holding module 111 shown in FIG. 3A is viewed from the second robot 10g2 will be described using FIG. 3B. In addition, in FIG. 3B, in order to make the explanation easier to understand, description of the stator 120a, mover 112, and cover 115 shown in FIG. 3A is omitted.

As shown in Figure 3b, orbit 120 extends along the X-axis. Additionally, the holding module 111 of the movable buffer 110 moves relative to the orbit 120 in the horizontal direction D1 shown in FIG. 1 and the like. The support portion 111a of the holding module 111 supports a plurality of sets of opposing holding portions 111b, and the gap between a pair of holding portions 111b is larger than the width of the hand 13. Therefore, even if the hand 13 inserted into the movable buffer 110 while holding the substrate W is lowered, it does not interfere with the holding portion 111b on the other stage.

The first robot 10g1 and the second robot 10g2 move the hand 13 in the direction along the Y-axis or raise and lower it in the direction along the Z-axis, thereby moving the hand 13 to each end of the movable buffer 110 and the substrate (W). ) can be exchanged. Additionally, the movable buffer 110 can slide in the horizontal direction D1 and move to the front of each robot 10. Therefore, each robot 10 can exchange the substrate W with each stage of the movable buffer 110 by lifting the hand 13 and then moving it in the direction along the Y axis.

Next, a case where the holding module 111 shown in FIG. 3B is viewed from above will be described using FIG. 3C. Additionally, in FIG. 3C, description of the mover 112 and cover 115 is omitted. In addition, in FIG. 3C, the pad installed on the upper surface side of the holding portion 111b is also shown. A plurality of pads are installed to support the outer peripheral portion of the substrate W. Additionally, Figure 3c shows four pads, but the number is not limited.

As shown in FIG. 3C, the pair of holding portions 111b are supported by a supporting portion 111a that is H-shaped when viewed from the top. And the pair of holding portions 111b each hold one substrate W. Additionally, in Fig. 3C, only the holding portion 111b corresponding to the uppermost stage is visible, and the holding portions 111b in the second and subsequent stages are hidden in the background.

The first robot 10g1 accesses the holding module 111 from the positive Y-axis direction, and the second robot 10g2 accesses the holding module 111 from the negative Y-axis direction. The movable buffer 110 can slide in the horizontal direction D1 and move to the front of each robot 10. Accordingly, each robot 10 can exchange the movable buffer 110 and the substrate W by moving the hand 13 in the direction along the Y axis.

Next, the case where two sets of the movable buffer 110 and track 120 shown in FIG. 2 are installed will be described using FIGS. 4 to 5C. FIG. 4 is a schematic side view of the transfer device 5 according to a modification, FIG. 5A is a schematic side view of the transfer device 5 according to a modification, and FIG. 5B is a schematic side view of the movable buffer 110 according to a modification. . Additionally, Figure 5C is a top schematic diagram of the movable buffer 110 according to a modified example. Additionally, FIG. 4 corresponds to FIG. 2, FIG. 5A corresponds to FIG. 3A, FIG. 5B corresponds to FIG. 3B, and FIG. 5C corresponds to FIG. 3C. In addition, in the following, content already explained using FIGS. 2, 3A, 3B, and 3C will be omitted or limited to a simple description.

The conveyance system 1 shown in FIG. 4 is similar to the conveyance system 1 shown in FIG. 2 in that two sets of movable buffers 110 and orbits 120 are installed to arrange two orbits 120. It is different from As shown in FIG. 4, the movable buffer 110 and the track 120 on the side closer to the first side wall 100sw1 are referred to as the movable buffer 110-1 and the track 120-1. In addition, the movable buffer 110 and the track 120 on the side closer to the second side wall 100sw2 are referred to as the movable buffer 110-2 and the track 120-2.

Here, the movable buffer 110-1 is capable of exchanging the substrate W with the first robot 10g1, and the movable buffer 110-2 is capable of exchanging the substrate W with the second robot 10g2. Giving and receiving is possible. Additionally, the movable buffer 110-1 and movable buffer 110-2 can each be moved independently. Therefore, in the transfer system 1 shown in FIG. 4, the transfer device 5 (see FIG. 1) in the transfer chamber 100 is completely moved to the first side wall 100sw1 side and the second side wall 100sw2 side. Since it can be separated into two systems, the availability of substrate transport can be further increased.

Specifically, the first robot 10g1 exchanges the substrate W with the load lock chamber LL1, the processing chamber PC11, the processing chamber PC12, the processing chamber PC31, and the movable buffer 110-1. . In addition, the second robot 10g2 exchanges the substrate W with the load lock chamber LL2, the processing chamber PC21, the processing chamber PC22, the processing chamber PC32, and the movable buffer 110-2. Additionally, since the conveyance system 1 shown in FIG. 2 has only one track 120, it is easy to make the footprint of the conveyance chamber 100 smaller than the conveyance system 1 shown in FIG. 4.

The movable buffer 110 and track 120 shown in FIG. 5A are similar to the movable buffer 110 and track 120 shown in FIG. 3A in that two sets of the movable buffer 110 and track 120 shown in FIG. 3A are arranged back to back. It is different from the buffer 110 and the orbit 120. Additionally, the movable buffer 110 and orbit 120 on the side of the first robot 10g1 are described as movable buffer 110-1 and orbit 120-1. Additionally, the movable buffer 110 and orbit 120 on the second robot 10g2 side are described as movable buffer 110-2 and orbit 120-2.

Here, the cover 115 is shared by the mobile buffer 110-1 and the mobile buffer 110-2. That is, the covers 115 shown in FIG. 3A are integrated back to back. Additionally, the cover 115 may be separated into one for the movable buffer 110-1 and another for the movable buffer 110-2 and fixed to the upper wall 100c, respectively.

The movable buffer 110-1 and the movable buffer 110-2 can each independently move in a direction along the X-axis. Accordingly, the movable buffer 110-1 can move to the front of each robot 10 in the first robot 10g1. Additionally, the movable buffer 110-2 can move to the front of each robot 10 in the second robot 10g2.

FIG. 5B shows a state in which the movable buffer 110-1 and the movable buffer 110-2 have moved to different positions along the horizontal direction D1. Here, the first robot 10g1 exchanges the substrate W with the movable buffer 110-1. Additionally, the second robot 10g2 exchanges the substrate W with the movable buffer 110-2.

FIG. 5C shows a state in which the mobile buffer 110-1 and the mobile buffer 110-2 have moved to the same X coordinate. The first robot 10g1 accesses the movable buffer 110-1 from the Y-axis positive direction side, and the second robot 10g2 accesses the movable buffer 110-2 from the Y-axis negative direction side.

Next, the upper wall 100c of the transfer chamber 100 will be described using FIG. 6. Figure 6 is a schematic top view of the transfer chamber 100. As shown in FIG. 6, a long through hole 100ch is formed in the upper wall 100c in the extending direction (direction along the X-axis) of the track 120. Then, the cover 120B on which the track 120 is fixed to the lower surface side is fixed so as to block the through hole 100ch. In this way, the track 120 can be attached to the transfer chamber 100 from the outside of the transfer chamber 100.

Next, the conveyance system 1 having the conveyance chamber 100 extending in the extending direction of the track 120 will be described using FIG. 7. FIG. 7 is a schematic top view of the transfer chamber 100 extending in the extending direction of the track 120. In addition, FIG. 7 shows a first processing chamber group (PCg1) and a second processing chamber group in which the first side wall 100sw1 and the second side wall 100sw2 shown in FIG. 4 are doubled in length in the stretching direction of the track 120. A case is shown where the number of processing rooms (PCs) in (PCg2) is doubled to 4 each, and the number of robots 10 is doubled to 8. In addition, the first side wall 100sw1 and the second side wall 100sw2 are installed so that the number of processing chambers (PC) and the number of robots 10 in the first processing chamber group (PCg1) and the second processing chamber group (PCg2) are greater than twice. ) may be extended.

In addition, FIG. 7 shows a case where the conveyance system 1 with two orbits 120 shown in FIG. 4 is extended in the stretching direction of the orbits 120, but only one orbit 120 shown in FIG. 2 is shown. The phosphorus conveying system 1 may be extended in the extending direction of the track 120.

As shown in FIG. 7, the first robot 10g1 operates in the load lock room LL1, each processing chamber (PC) of the first processing chamber group (PCg1), the processing chamber (PC31) of the fourth processing chamber group (PCg4), and the movable buffer. The substrate W is exchanged with (110-1). In addition, the second robot 10g2 is connected to the load lock room LL2, each processing chamber (PC) of the second processing chamber group (PCg2), the processing chamber (PC32) of the fourth processing chamber group (PCg4), and the movable buffer 110-2. The substrate W is exchanged between them.

In this way, even when the transfer chamber 100 is extended along the extending direction of the track 120, the substrate W can be transferred in a two-system transfer process system. Accordingly, substrate processing can be continued even when any one of the first robot 10g1, the second robot 10g2, the movable buffer 110-1, and the movable buffer 110-2 stops, and the availability of substrate processing It becomes possible to increase . Additionally, by extending the transfer chamber 100 along the stretching direction of the track 120, the number of processing chambers (PC) can be increased, and thus the processing capacity per one transfer chamber 100 can be improved.

Next, a configuration example of the robot 10 will be described using FIGS. 8A to 8D. FIGS. 8A, 8B, 8C, and 8D are top schematic diagrams showing configuration examples 1, 2, 3, and 4 of the robot 10.

The robot 10 shown in FIG. 8A is a RθZ robot 10A, which is a robot with three degrees of freedom: one degree of freedom in the vertical direction and two degrees of freedom in the horizontal direction. Additionally, in FIG. 8A, the elevation axis AV and the first rotation axis AH1 are shown as coaxial, but they may not be coaxial. The first arm 11, the second arm 12, and the hand 13, which are horizontal arms, move the center of the substrate CW in the radial direction of the first rotation axis AH1 while maintaining the posture of the hand 13. Work cooperatively to do so.

That is, by the driving force and transmission mechanism that rotates the first arm 11 around the first rotation axis AH1, the second arm 12 rotates around the second rotation axis AH2, and the hand 13 rotates around the third rotation axis. (AH3) Around each other, they follow each other and turn. Additionally, transmission mechanisms include belts, gears, link mechanisms, and the like. In addition, “substrate center (CW)” refers to the center position of the substrate W when the hand 13 holds the substrate W in a normal position.

In this way, the RθZ robot 10A maintains the angle θ of the straight line passing through the first rotation axis AH1, the third rotation axis AH3, and the substrate center CW, while maintaining the first rotation axis AH1 constant. ) changes the distance (r) from the center of the substrate (CW). Here, the angle θ can be any arbitrary angle. In this way, the RθZ robot 10A is a robot 10 with three degrees of freedom, one degree of freedom in the vertical direction and two degrees of freedom in the horizontal direction. In addition, hereinafter, the RθZ robot 10A may be simply referred to as “RθZ robot.”

By using the RθZ robot 10A as the robot 10, the cost of the robot 10 can be reduced compared to the case where the robot 10 has four degrees of freedom or more. Additionally, when using the RθZ robot 10A as the robot 10, the RθZ robot 10A is placed in front of the processing room PC or the load lock room LL. In other words, by arranging the robot 10 in front of the processing room (PC) or the load lock room (LL), the robot 10 can be made into an RθZ robot with three degrees of freedom.

The robot 10 shown in FIG. 8B is a multi-degree-of-freedom robot 10B, which is a robot with 4 or more degrees of freedom, with 1 degree of freedom in the vertical direction and 3 or more degrees of freedom in the horizontal direction. Additionally, in FIG. 8B, the elevation axis AV and the first rotation axis AH1 are shown as coaxial, but they may not be coaxial. The first arm 11, the second arm 12, and the hand 13, which are horizontal arms, have a first rotation axis AH1 and a second rotation axis AH2, unlike the RθZ robot 10A shown in FIG. 8A. and each independently rotates around the third rotation axis (AH3).

In this way, since the multi-degree-of-freedom robot 10B has at least one redundant axis in the horizontal direction, the center of the substrate CW can be moved in an arbitrary path. Therefore, when using the multiple degrees of freedom robot 10B as the robot 10, the multiple degrees of freedom robot 10B does not need to be placed in front of the processing room PC or the load lock room LL. In other words, even if the robot 10 is not placed in front of the processing chamber (PC) or the load lock room (LL), the substrate W can be exchanged between the plurality of processing chambers (PC) or the plurality of load lock chambers (LL). You can.

That is, assuming that the multi-degree-of-freedom robot 10B is included in the robot 10, the number of first robots 10g1 (see FIG. 1) is increased to the number of processing rooms (see FIG. 1) in the first processing room group PCg1 (see FIG. 1). PC), or the number of second robots 10g2 (see FIG. 1) can be made smaller than the number of processing rooms (PC) in the second processing room group PCg2 (see FIG. 1).

The robot 10 shown in FIG. 8C is a double-armed robot 10C whose arms are the horizontal arms of the RθZ robot 10A shown in FIG. 8A. That is, the double-armed robot 10C has arms with two degrees of freedom in the horizontal direction as both arms, and also has one degree of freedom in the vertical direction.

Specifically, the proximal ends of the two first arms 11 are supported by a pedestal P, and the pedestal P moves up and down along the elevation axis AV and rotates around the rotation axis AH0. In addition, FIG. 8C shows a case where the horizontal arms of the RθZ robot 10A shown in FIG. 8A are used as both arms, but the horizontal arms of the multi-degree-of-freedom robot 10B shown in FIG. 8B may be used as both arms. .

Here, the hands 13 of each arm overlap when viewed in the direction along the Z axis. Each arm maintains constant the angle θ of the straight line passing through the rotation axis AH0, the third rotation axis AH3, and the substrate center CW, and the distance from the rotation axis AH0 to the substrate center CW. Change (r). Additionally, the vertical relationship between the arms shown in Fig. 8C may be reversed.

The two-armed robot 10D shown in FIG. 8D is a modified example of the two-armed robot 10C shown in FIG. 8C. The two-arm robot 10D shown in FIG. 8D is shown in FIG. 8C in that the lifting axis AV and the two first rotation axes AH1 in both arms are coaxial, and the pedestal P is omitted. It is different from the two-armed robot (10C).

Here, each arm of both arms rotates the substrate from the rotation axis AH0 while maintaining the angle θ of the straight line passing through the first rotation axis AH1, the third rotation axis AH3, and the substrate center CW. Change the distance (r) to the center (CW). In this way, by making the two first rotation axes AH1 coaxial and omitting the pedestal P, the double-armed robot 10D can be made more compact, and the volume of the transfer chamber 100 can be reduced. It becomes. Additionally, the vertical relationship between the arms shown in Fig. 8D may be reversed.

Next, the configuration of the transfer device 5 shown in FIG. 1 will be explained using FIG. 9. Fig. 9 is a block diagram showing the configuration of the transfer device 5. As shown in FIG. 9, the transfer device 5 includes a robot 10, a movable buffer 110, and a controller 20. Additionally, the robot 10 and the movable buffer 110 are connected to the controller 20. Additionally, the load lock room (LL) and the processing room (PC) are also connected to the controller 20, allowing exchange of information.

The controller 20 includes a control unit 21 and a storage unit 22. The control unit 21 includes an acquisition unit 21a and an operation control unit 21b. The memory unit 22 stores teaching information 22a. In addition, in Fig. 9, to simplify the explanation, one controller 20 is shown, but a plurality of controllers 20 may be used. In this case, it may be sufficient to install a higher-level controller that oversees each controller. For example, the controller to which the robot 10 is connected and the controller to which the movable buffer 110 is connected may be separated, and a higher-level controller that manages each controller may be installed.

Here, the controller 20 includes, for example, a computer or various circuits having a CPU (Central Processing Unit), ROM (Read Only Memory), RAM (Random Access Memory), HDD (Hard Disk Drive), input/output ports, etc. . The CPU of the computer functions as the acquisition unit 21a and the operation control unit 21b of the control unit 21 by, for example, reading and executing the program stored in the ROM.

Additionally, at least one or all of the acquisition unit 21a and the operation control unit 21b may be configured with hardware such as an Application Specific Integrated Circuit (ASIC) or a Field Programmable Gate Array (FPGA).

Additionally, the storage unit 22 corresponds to RAM or HDD, for example. RAM or HDD can store teaching information 22a. Additionally, the controller 20 may acquire the above-described programs and various types of information through another computer connected to a wired or wireless network or a portable recording medium. Additionally, as described above, the controller 20 may be configured as a plurality of devices that can communicate with each other, or as a hierarchical device that can communicate with upper or lower devices.

The control unit 21 acquires trigger information such as an access request from the load lock room (LL) or the processing room (PC), and controls the operations of the robot 10 and the movable buffer 110. In addition, when the controller 20 is configured as a plurality, the control unit 21 may simultaneously perform processing for obtaining synchronization between the plurality of controllers 20.

The acquisition unit 21a acquires trigger information such as an access request from the load lock room (LL) or the processing room (PC). Then, the acquisition unit 21a determines the operation timing and operation contents of the robot 10 and the mobile buffer 110 based on the acquired information, and notifies the operation control unit 21b of the determined operation timing and operation contents. .

For example, the acquisition unit 21a acquires the timing at which the substrate W is brought into the load lock chamber LL from the outside, and causes the robot 10 and the movable buffer 110 to cooperatively operate based on the acquired timing. Instructs the operation control unit 21b. Additionally, the acquisition unit 21a acquires the timing at which processing on the substrate W is completed from the processing room (PC), and causes the robot 10 and the movable buffer 110 to cooperatively operate based on the acquired timing. Instructs the operation control unit 21b.

The operation control unit 21b operates the robot 10 and the movable buffer 110 based on the instructions and teaching information 22a from the acquisition unit 21a. In addition, the motion control unit 21b performs feedback control while using the encoder value from an actuator such as a rotary motor or linear motor that is the power source of the robot 10 and the movable buffer 110. Improves the operation precision of (110).

The teaching information 22a is information created in the teaching step of teaching the robot 10 and the movable buffer 110 to operate, and includes a program that defines the motion path of the robot, etc. Additionally, as shown in Figure 2, etc., when each robot is arranged in a regular position such as line symmetry, it becomes possible to share teaching data or use it in reverse. Therefore, according to the conveyance device 5, the effort and cost of generating teaching information 22a including such teaching data can be reduced.

Next, an example of the processing sequence performed by the transfer device 5 shown in FIG. 1 will be described using FIG. 10. FIG. 10 is a flowchart showing the processing sequence executed by the transfer device 5. In addition, in the flowchart shown below, the movable buffer 110 already holds the substrate W before processing, and by cooperating with the robot 10, replacement of the substrate W between the processing chamber PC and Describe the case in which this is done.

As shown in FIG. 10, when the acquisition unit 21a of the controller 20 acquires a notification of completion of processing for the substrate W in the processing chamber (PC) (step S101), the operation control unit of the controller 20 The robot 10 whose operation is controlled by 21b carries the processed substrate W from the processing chamber PC to the transfer chamber 100 (step S102).

Additionally, the movable buffer 110 whose operation is controlled by the operation control unit 21b of the controller 20 moves near the robot 10 to receive the processed substrate W (step S103). Additionally, when the robot 10 is placed in front of the processing room (PC), the movable buffer 110 is preferably moved to the front of the processing room (PC) (the front of the robot 10).

When the robot 10 places the processed substrate W brought into the transfer chamber 100 from the processing chamber (PC) into the movable buffer 110 (step S104), the robot 10 moves the hand 13 (Figure 3a) is moved to another end of the movable buffer 110 (a stage that holds the substrate W before processing). Then, when the robot 10 acquires the substrate W before processing from the movable buffer 110 (step S105), the movable buffer 110 moves to the retraction position (step S106). Additionally, the retreat position is sufficient as a position to avoid interference with the robot 10 accessing the processing room (PC).

Then, the robot 10 transfers the unprocessed substrate W received from the movable buffer 110 from the transfer chamber 100 to the processing chamber PC (step S107), and the processing ends.

In addition, in FIG. 10, in order to make the explanation easier to understand, the case where each process is executed serially is shown, but each process can be performed in parallel as long as interference between the robot 10 and the movable buffer 110 does not occur. It may be done as follows. In addition, in FIG. 10, exchanging the substrate W with the processing chamber PC is illustrated, but exchanging the substrate W with the load lock chamber LL can be performed in the same order. Additionally, exchanging the load lock chamber LL and the substrate W and exchanging the substrate W with the processing chamber PC may be performed in parallel.

Next, the case where each robot 10 placed in the transfer room 100 shown in FIG. 2 is a double-arm robot will be described using FIG. 11. Fig. 11 is a schematic top view of the transfer room 100 in which the two-arm robot is placed. In addition, in FIG. 11, the same reference numerals are given to components common to those in FIG. 2, and descriptions of matters already described are omitted or limited to simple descriptions.

As shown in FIG. 11, each robot 10 is a two-armed robot 10D shown in FIG. 8D. The two-arm robot 10D can exchange two substrates W to each load lock room LL, each processing room PC, and the movable buffer 110.

For example, the robot 10-1 or the robot 10-4 acquires the substrate W from the load lock chamber LL with one arm and places the substrate W into the load lock chamber LL with the other arm. I can hand it over. Additionally, each robot 10 can acquire the processed substrate W from the processing chamber PC with one arm of both arms and hand the unprocessed substrate W to the processing chamber PC with the other arm. Additionally, each robot 10 can acquire the substrate W from the movable buffer 110 with one arm of both arms and pass the substrate W to the movable buffer 110 with the other arm.

In addition, in Figure 11, the case where all four robots 10 are double-armed robots 10D is shown, but even if at least one of the four robots is used as a double-armed robot 10D and the rest are single-armed robots, good night. Additionally, the robots 10-1 and 10-3 accessing the load lock room LL are set as double-armed robots 10D, and the robots 10-2 and 10-4 are set as single-armed robots. You can do it as well.

As described above, the transfer device 5 according to the embodiment includes a first robot 10g1, a second robot 10g2, and a movable buffer 110. The first robot 10g1 is fixed inside the transfer chamber 100, and a first processing chamber group (PCg1) in which a plurality of processing chambers (PC) are arranged horizontally on the first side wall 100sw1 of the transfer chamber 100 ) is a robot 10 that transports a substrate W. The second robot 10g2 is fixed inside the transfer room 100 and transfers the substrate W to the second processing chamber group PCg2 on the second side wall 100sw2 opposite the first side wall 100sw1. It is a robot (10) that does. The movable buffer 110 is capable of exchanging a substrate W with the first robot 10g1 and the second robot 10g2, and is capable of transmitting and receiving a substrate W between the first robot 10g1 and the second robot 10g2 in the processing room (PC). ) moves along the orbit 120 extending in the arrangement direction.

In this way, in the transfer device, the robot is fixed and the buffer, which is the place where the substrate is placed, is mobile, and the substrate is transferred by the coordinated operation of the robot and the movable buffer, so that the weight of the moving object can be reduced. As a result, it becomes possible to simplify the moving mechanism and the operation rate of the moving mechanism is improved, thereby improving the availability of substrate transportation. Therefore, it becomes possible to improve the transport efficiency of the substrate.

In addition, in the above-described embodiment, the case where the movable buffer is ceiling-suspended has been mainly explained, but the movable buffer may be of a floor-placed type.

Further effects and modifications can be easily derived by those skilled in the art. For this reason, the broader aspects of the present invention are not limited to the specific details and representative embodiments shown and described above. Accordingly, various changes are possible without departing from the spirit or scope of the overall inventive concept defined by the appended claims and their equivalents.

1: Conveyance system 5: Conveyance device
10: robot 11: first arm
12: second arm 13: hand
15: Lifting mechanism 10g1: First robot
10g2: Second robot 10A: RθZ robot
10B: Multi-degree-of-freedom robot 10C: Double-arm robot
20: Controller 21: Control unit
21a: acquisition unit 21b: operation control unit
22: memory unit 22a: teaching information
100: Return room 100c: Upper wall
100ci: top 100f: bottom wall
100fi: Bottom 100sw: Sidewall
100sw1: first side wall 100sw2: second side wall
100sw3: third side wall 100sw4: fourth side wall
110: movable buffer 111: maintenance module
111a: support part 111b: holding part (buffer)
112: Drive module (mover) 115: Cover
120: Orbit 120a: Stator
120b: Guide AH1: First rotation axis
AH2: Second rotation axis AH3: Third rotation axis
AV: Elevating axis B: Base part
CL: center line CW: center of board
F: Flange LL: Load lock seal
ML: Path of movement PC: Processing room
PCg1: 1st treatment room group PCg2: 2nd treatment room group
PCg4: Fourth processing chamber group W: Substrate

Claims (17)

A first robot, which is fixed inside the transfer room and is a robot that transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on a first side wall of the transfer chamber;
a second robot that is fixed inside the transfer chamber and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall;
A movable buffer capable of exchanging the substrate with the first robot and the second robot, and moving along a trajectory extending between the first robot and the second robot in the arrangement direction of the processing chamber.
Equipped with
The first robot and the second robot include a robot with 4 degrees of freedom or more, with 1 degree of freedom in the vertical direction and 3 or more degrees of freedom in the horizontal direction,
The first robot is installed in a number smaller than the number of processing chambers in the first processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The second robot is installed in a number smaller than the number of processing chambers in the second processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The transfer chamber has a rectangular shape in plan view, and a load lock chamber is installed on the third side wall,
A transfer device wherein at least one of the first robot and the second robot, the robot closest to the third side wall, transfers the substrate also to the load lock chamber. delete The method according to claim 1, wherein the transfer chamber includes a fourth processing chamber group in which a plurality of processing chambers are arranged horizontally on a fourth side wall opposite the third side wall,
A transfer device characterized in that at least one of the first robot and the second robot, the robot closest to the fourth side wall, transfers the substrate also to the processing chamber of the fourth processing chamber group. The method of claim 1, wherein the movable buffer is suspended from the track fixed to the upper surface of the transfer chamber,
The transfer device is characterized in that the first robot and the second robot are fixed to the floor of the transfer chamber. The transfer device according to claim 1, wherein the orbit is set at a position and length that allows the movable buffer to exchange the substrate with all the robots indoors in the transfer room. The method of claim 5, wherein the movable buffer is multi-stage,
A transfer device characterized in that the first robot and the second robot transfer the substrate to and from each stage of the movable buffer. The method of claim 1, wherein the orbit is one,
A transfer device characterized in that the movable buffer transfers the substrate to and from the robots on both sides of the orbit. The cover according to claim 1, which extends along the track, cantilevers on the upper surface of the transfer chamber on one side of the track, passes through the lower side of the track, and bends upward along the other side. A conveyance device comprising: The method of claim 8, wherein the movable buffer has a support portion that extends toward the other side of the track and is bent to avoid an upwardly curved portion of the cover to support the buffer below the track. A conveyance device comprising: The method according to claim 1, wherein the transfer chamber is provided with two processing chambers, so that the opposing sets of the first side wall and the second side wall and the four robots are repeated at least two sets along the extending direction of the orbit. A conveying device characterized in that it is stretched. A first robot, which is fixed inside the transfer room and is a robot that transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on a first side wall of the transfer chamber;
a second robot that is fixed inside the transfer chamber and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall;
A movable buffer capable of exchanging the substrate with the first robot and the second robot, and moving along a trajectory extending between the first robot and the second robot in the arrangement direction of the processing chamber.
providing a conveyance device comprising,
causing the first robot and the second robot to exchange the mobile buffer and the substrate.
Including,
The first robot and the second robot include a robot with 4 degrees of freedom or more, with 1 degree of freedom in the vertical direction and 3 or more degrees of freedom in the horizontal direction,
The first robot is installed in a number smaller than the number of processing chambers in the first processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The second robot is installed in a number smaller than the number of processing chambers in the second processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The transfer chamber has a rectangular shape in plan view, and a load lock chamber is installed on the third side wall,
A transfer method wherein at least one of the first robot and the second robot, the robot closest to the third side wall, transfers the substrate also to the load lock chamber. Return room,
a first robot that is fixed inside the transfer chamber and is a robot that transfers substrates to a first processing chamber group in which a plurality of processing chambers are horizontally arranged on a first side wall of the transfer chamber;
a second robot that is fixed inside the transfer chamber and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall;
A movable buffer capable of exchanging the substrate with the first robot and the second robot, and moving along a trajectory extending between the first robot and the second robot in the arrangement direction of the processing chamber.
Equipped with
The first robot and the second robot include a robot with 4 degrees of freedom or more, with 1 degree of freedom in the vertical direction and 3 or more degrees of freedom in the horizontal direction,
The first robot is installed in a number smaller than the number of processing chambers in the first processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The second robot is installed in a number smaller than the number of processing chambers in the second processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The transfer chamber has a rectangular shape in plan view, and a load lock chamber is installed on the third side wall,
A transport system wherein at least one of the first robot and the second robot, the robot closest to the third side wall, transports the substrate also to the load lock chamber. A first robot, which is fixed inside the transfer room and is a robot that transfers substrates to a first processing chamber group in which a plurality of processing chambers are arranged horizontally on a first side wall of the transfer chamber;
a second robot that is fixed inside the transfer chamber and transfers the substrate to a second processing chamber group in which a plurality of processing chambers are horizontally arranged on a second side wall opposite to the first side wall;
a movable buffer capable of exchanging the substrate with the first robot and the second robot, and moving between the first robot and the second robot along a trajectory extending in the arrangement direction of the processing chamber;
A controller that exchanges the substrate between the mobile buffer and the processing chamber by linking the operations of the first robot and the second robot with the movement of the mobile buffer.
Equipped with
The first robot and the second robot include a robot with 4 degrees of freedom or more, with 1 degree of freedom in the vertical direction and 3 or more degrees of freedom in the horizontal direction,
The first robot is installed in a number smaller than the number of processing chambers in the first processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The second robot is installed in a number smaller than the number of processing chambers in the second processing chamber group, and exchanges the substrate between the plurality of processing chambers and the mobile buffer,
The transfer chamber has a rectangular shape in plan view, and a load lock chamber is installed on the third side wall,
A transfer device wherein at least one of the first robot and the second robot, the robot closest to the third side wall, transfers the substrate also to the load lock chamber. delete delete delete delete