JP4658540B2 - 磁場による精密配向体の製造方法 - Google Patents
磁場による精密配向体の製造方法 Download PDFInfo
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- JP4658540B2 JP4658540B2 JP2004242818A JP2004242818A JP4658540B2 JP 4658540 B2 JP4658540 B2 JP 4658540B2 JP 2004242818 A JP2004242818 A JP 2004242818A JP 2004242818 A JP2004242818 A JP 2004242818A JP 4658540 B2 JP4658540 B2 JP 4658540B2
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Claims (5)
- 3つの磁化率χ1、χ2、χ3が異なっており、媒体に懸濁されている物体の集合体に、該物体の静磁場下での配向時間τの逆数より大きい角速度ωで楕円的に回転する磁場(高速回転楕円磁場)を印加することにより、該物体の3つの磁化率χ1、χ2、χ3の配向方向が、該集合体を構成する各々の物体について全て同じになるようにする(精密配向)ことを特徴とする磁場による精密配向体の製造方法。
- 前記高速回転楕円磁場が、N極、S極が向かい合う一対の磁石を平面内で回転し、且つ回転に同期して磁極間距離を変化させることにより発生されることを特徴とする、請求項 1記載の磁場による精密配向体の製造方法。
- 前記高速回転楕円磁場が、強度が各々B・a・cos(ωt)及びB・b・sin(ωt)で時間的に変化するところの、互いに直交する2対の電磁石により発生されることを特徴とする、請求項1記載の磁場による精密配向体の製造方法。
ここでωは角速度、tは時間(秒)、Bは磁場強度(テスラ)、a及びbは互いに異なる正の定数。 - 前記a、bの値が、b/a=(χ3−χ2)/(χ3−χ1)(但しχ1<χ2<χ3)であるような定数であることを特徴とする、請求項3記載の磁場による精密配向体の製造方法。
- 前記懸濁媒体を固化または除去することにより、前記被懸濁体の配向が固定されることを特徴とする、請求項1記載の磁場による精密配向体の製造方法。
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JP2006057055A JP2006057055A (ja) | 2006-03-02 |
JP4658540B2 true JP4658540B2 (ja) | 2011-03-23 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4972802B2 (ja) * | 2008-06-30 | 2012-07-11 | 独立行政法人物質・材料研究機構 | 酸化物超伝導焼結体の製造方法 |
JP5834422B2 (ja) * | 2011-02-18 | 2015-12-24 | 国立大学法人京都大学 | 微粒子配向装置及び微粒子配向方法 |
CN104105959B (zh) * | 2012-02-06 | 2016-06-29 | 国立大学法人京都大学 | 微晶结构分析装置、微晶结构分析方法和x射线遮蔽装置 |
JP5994382B2 (ja) * | 2012-05-17 | 2016-09-21 | スズキ株式会社 | 樹脂成形体およびその製造方法 |
JP7193107B2 (ja) * | 2018-04-18 | 2022-12-20 | 国立大学法人京都大学 | 配向体製造装置及び配向体製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS60206123A (ja) * | 1984-03-30 | 1985-10-17 | Anelva Corp | 軟磁性薄膜の真空熱処理装置 |
JPS6159713A (ja) * | 1984-08-30 | 1986-03-27 | Seiko Epson Corp | 非晶質軟磁性合金膜の熱処理方法 |
JP2001253962A (ja) * | 2000-03-10 | 2001-09-18 | Japan Society For The Promotion Of Science | 配向した結晶性高分子材料の製造方法 |
JP2003129220A (ja) * | 2001-10-26 | 2003-05-08 | Japan Science & Technology Corp | トリアジンチオール誘導体の薄膜形成方法 |
JP2004149723A (ja) * | 2002-10-31 | 2004-05-27 | Polymatech Co Ltd | 異方熱伝導性高分子成形体 |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206123A (ja) * | 1984-03-30 | 1985-10-17 | Anelva Corp | 軟磁性薄膜の真空熱処理装置 |
JPS6159713A (ja) * | 1984-08-30 | 1986-03-27 | Seiko Epson Corp | 非晶質軟磁性合金膜の熱処理方法 |
JP2001253962A (ja) * | 2000-03-10 | 2001-09-18 | Japan Society For The Promotion Of Science | 配向した結晶性高分子材料の製造方法 |
JP2003129220A (ja) * | 2001-10-26 | 2003-05-08 | Japan Science & Technology Corp | トリアジンチオール誘導体の薄膜形成方法 |
JP2004149723A (ja) * | 2002-10-31 | 2004-05-27 | Polymatech Co Ltd | 異方熱伝導性高分子成形体 |
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