JP4626445B2 - Manufacturing method of semiconductor package - Google Patents

Manufacturing method of semiconductor package Download PDF

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JP4626445B2
JP4626445B2 JP2005241952A JP2005241952A JP4626445B2 JP 4626445 B2 JP4626445 B2 JP 4626445B2 JP 2005241952 A JP2005241952 A JP 2005241952A JP 2005241952 A JP2005241952 A JP 2005241952A JP 4626445 B2 JP4626445 B2 JP 4626445B2
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circuit board
semiconductor package
semiconductor
mold
interposer substrate
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JP2006093679A (en
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亮 甲斐
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Sony Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Description

本発明は半導体パッケージの製造方法に関する。詳しくは、表裏面に回路基板を配置すると共に、回路基板の間隙の中心を基準として表面側と裏面側とが対称構造となる様に半導体素子を回路基板に搭載することによって、実装信頼性を向上しようとした半導体パッケージの製造方法に係るものである。 The present invention relates to a method for manufacturing a semiconductor package . Specifically, the circuit board is disposed on the front and back surfaces, and the mounting reliability is improved by mounting the semiconductor element on the circuit board so that the front side and the back side are symmetrical with respect to the center of the gap of the circuit board. The present invention relates to a semiconductor package manufacturing method to be improved.

電子機器の小型軽量化、動作の高速化、高機能化等に伴う半導体装置の微細化及び高集積化の要求に対して、単に半導体チップを多ピン化することにより対応することは物理的に困難になっており、近年、ピン型半導体パッケージに代えて、BGA(Ball Grid Array)型半導体パッケージやLGA(Land Grid Array)型半導体パッケージが提案されている(例えば、特許文献1参照。)。   Physically responding to the demands for miniaturization and high integration of semiconductor devices associated with downsizing and weight reduction of electronic equipment, high-speed operation, high functionality, etc., simply by increasing the number of semiconductor chips. In recent years, BGA (Ball Grid Array) type semiconductor packages and LGA (Land Grid Array) type semiconductor packages have been proposed in place of pin type semiconductor packages (see, for example, Patent Document 1).

図11は従来のLGA型半導体パッケージを説明するための模式図であり、ここで示すLGA型半導体パッケージ101は、外部端子105が形成されたインターポーザー基板102と、インターポーザー基板の上面にダイボンドされた半導体チップ103と、半導体チップを封止する封止樹脂104から構成されている。   FIG. 11 is a schematic diagram for explaining a conventional LGA type semiconductor package. The LGA type semiconductor package 101 shown here is die-bonded to an interposer substrate 102 on which external terminals 105 are formed and an upper surface of the interposer substrate. The semiconductor chip 103 and the sealing resin 104 that seals the semiconductor chip.

そして、上記の様に構成されたLGA型半導体パッケージを実装基板に実装する場合には、図12で示す様に、実装基板106に形成された端子107と外部端子とをはんだペースト108等の導電性材料で接着することにより行なう。   When the LGA type semiconductor package configured as described above is mounted on a mounting board, as shown in FIG. 12, the terminals 107 and external terminals formed on the mounting board 106 are electrically connected with a solder paste 108 or the like. This is done by bonding with an adhesive material.

特開平11−102988号公報JP 11-102988 A

しかしながら、上記した従来の半導体パッケージでは、実装基板への実装信頼性に問題があった。
即ち、インターポーザー基板、半導体チップ及び封止樹脂の線膨張係数が異なるために、高温環境(例えばはんだ実装に代表されるリフロー環境)において半導体パッケージが平坦になるように材料やデザインを選定した場合には、高温環境時は平坦であったとしても、高温環境から常温へと半導体パッケージの環境温度が変化した場合に反りが発生してしまう。なお、図13(a)で示す様に半導体パッケージが凹状に反った場合には、半導体パッケージの周辺領域Aのはんだ接続が破壊され、若しくは接続の破壊までは至らないまでも半導体パッケージの周辺領域を引き剥がす様な応力が生じ、図13(b)で示す様に半導体パッケージが凸状に反った場合には、半導体パッケージの中央領域Bのはんだ接続が破壊され、若しくは接続の破壊までは至らないまでも半導体パッケージの中央領域を引き剥がす様な応力が生じる。
However, the above-described conventional semiconductor package has a problem in mounting reliability on the mounting substrate.
That is, when the material and design are selected so that the semiconductor package is flat in a high-temperature environment (for example, a reflow environment typified by solder mounting) because the linear expansion coefficients of the interposer substrate, semiconductor chip, and sealing resin are different. Even if it is flat in a high temperature environment, warping occurs when the environmental temperature of the semiconductor package changes from a high temperature environment to a normal temperature. When the semiconductor package warps in a concave shape as shown in FIG. 13A, the solder connection in the peripheral region A of the semiconductor package is broken or the peripheral region of the semiconductor package is not broken until the connection is broken. When the semiconductor package warps in a convex shape as shown in FIG. 13B, the solder connection in the central region B of the semiconductor package is broken or the connection is broken. Even if not, a stress that peels off the central region of the semiconductor package is generated.

また、常温において半導体パッケージが平坦になるように材料やデザインを選定した場合には、常温時は平坦であったとしても、高温環境時に半導体パッケージに反りが発生してしまう。なお、図13(a)で示す様に半導体パッケージが凹状に反った場合には、半導体パッケージの周辺領域の実装不良が懸念され、図13(b)で示す様に半導体パッケージが凸状に反った場合には、半導体パッケージの中央領域の実装不良が懸念される。   Further, when a material or a design is selected so that the semiconductor package is flat at normal temperature, even if the semiconductor package is flat at normal temperature, the semiconductor package is warped in a high temperature environment. If the semiconductor package warps in a concave shape as shown in FIG. 13 (a), there is a concern about mounting defects in the peripheral region of the semiconductor package, and the semiconductor package warps in a convex shape as shown in FIG. 13 (b). In such a case, there is a concern about mounting defects in the central region of the semiconductor package.

こうした理由から、上記した従来の半導体パッケージでは、高温環境において半導体パッケージが平坦となる様に材料等を選定した場合、常温において半導体パッケージが平坦となる様に材料等を選定した場合のいずれの場合も電気的接続を行なう高温環境時と実際に製品を使用する常温での反りの挙動が異なるために、実装時の不良あるいは実装後の接続部の反りによる応力が発生することによって実装信頼性に問題があった。   For these reasons, in the conventional semiconductor package described above, either when the material is selected so that the semiconductor package is flat in a high temperature environment, or when the material is selected so that the semiconductor package is flat at room temperature However, since the behavior of warpage differs between the high temperature environment in which electrical connection is performed and the normal temperature at which the product is actually used, mounting reliability is increased by the occurrence of stress due to defective mounting or warping of the connected portion after mounting. There was a problem.

本発明は以上の点に鑑みて創案されたものであって、実装基板への実装信頼性が高い半導体パッケージの製造方法を提供することを目的とするものである。 The present invention has been made in view of the above points, and an object of the present invention is to provide a method for manufacturing a semiconductor package having high mounting reliability on a mounting substrate.

上記の目的を達成するために、本発明に係る半導体パッケージは、少なくとも1つの半導体素子が搭載された第1の回路基板と、少なくとも1つの半導体素子が搭載されると共に、前記第1の回路基板と所定の間隙を介して対面配置された第2の回路基板と、前記第1の回路基板と前記第2の回路基板との間隙に充填され、前記第1の回路基板及び前記第2の回路基板に搭載された半導体素子を封止する樹脂材料とを備える半導体パッケージであって、前記第1の回路基板と前記第2の回路基板との間隙の中心を基準として、前記第1の回路基板の半導体素子の搭載領域と前記第2の回路基板の半導体素子の搭載領域とが略線対称となる様に構成されている。   In order to achieve the above object, a semiconductor package according to the present invention includes a first circuit board on which at least one semiconductor element is mounted, at least one semiconductor element, and the first circuit board. And the second circuit board arranged facing each other with a predetermined gap, and the gap between the first circuit board and the second circuit board is filled, and the first circuit board and the second circuit A semiconductor package comprising a resin material for sealing a semiconductor element mounted on a substrate, wherein the first circuit substrate is based on a center of a gap between the first circuit substrate and the second circuit substrate. The semiconductor element mounting area and the semiconductor circuit mounting area of the second circuit board are substantially line-symmetric.

ここで、第1の回路基板と第2の回路基板との間隙の中心を基準として、第1の回路基板の半導体素子の搭載領域と第2の回路基板の半導体素子の搭載領域とが略線対称となる様に構成することによって、第1の回路基板と第2の回路基板との間隙の中心を基準として半導体パッケージの線膨張係数を第1の回路基板側と第2の回路基板側を略同一にでき、熱応力バランスがとれることにより半導体パッケージの反りを抑制することができる。   Here, on the basis of the center of the gap between the first circuit board and the second circuit board, the mounting area of the semiconductor element on the first circuit board and the mounting area of the semiconductor element on the second circuit board are substantially drawn. By configuring so as to be symmetric, the linear expansion coefficient of the semiconductor package is determined between the first circuit board side and the second circuit board side with respect to the center of the gap between the first circuit board and the second circuit board. The semiconductor package can be prevented from warping by being substantially the same and having a thermal stress balance.

なお、半導体パッケージの中心を基準として、半導体パッケージの表面側と裏面側の線膨張係数を略同一にして半導体パッケージの反りを抑制するという点を考慮すると、図14で示す様に、回路基板110の両面に半導体素子111を搭載し、回路基板の両面に搭載された半導体素子を樹脂材料112で封止するといった表裏面が樹脂材料で構成された半導体パッケージであっても良いと考えられる。   Considering that the warpage of the semiconductor package is suppressed by making the linear expansion coefficients of the front surface side and the back surface side of the semiconductor package substantially the same with respect to the center of the semiconductor package as shown in FIG. The semiconductor element 111 may be mounted on both sides of the circuit board, and the semiconductor elements mounted on both sides of the circuit board may be sealed with the resin material 112.

しかし、以下の理由によって表裏面が樹脂材料で構成された半導体パッケージでは実装基板への接続信頼性の低下が懸念される。
即ち、半導体パッケージの線膨張係数と実装基板との線膨張係数は異なるために、この線膨張係数の違いにより半導体パッケージと実装基板に変位の差が生じるのであるが、半導体パッケージの表裏面に硬質な回路基板を配置し、回路基板で半導体素子及び樹脂材料を挟み込むことで、半導体パッケージの変位量は回路基板の変位量に依存するものと考えられる。そして、一般に回路基板と実装基板の線膨張係数が近似していることから、半導体パッケージと実装基板の変位量も近似することとなる。従って、表裏面を樹脂材料で構成するのではなく、表裏面を回路基板で構成された半導体パッケージとすることによって、半導体パッケージと実装基板との変位量の差を低減でき、この変位量の差の低減を図ることにより半導体パッケージの実装基板への接続信頼性の向上が期待できる。
However, in the semiconductor package in which the front and back surfaces are made of a resin material for the following reasons, there is a concern that the connection reliability to the mounting substrate is lowered.
That is, since the linear expansion coefficient of the semiconductor package and the linear expansion coefficient of the mounting substrate are different, a difference in displacement occurs between the semiconductor package and the mounting substrate due to the difference in the linear expansion coefficient. By disposing a simple circuit board and sandwiching the semiconductor element and the resin material between the circuit boards, it is considered that the amount of displacement of the semiconductor package depends on the amount of displacement of the circuit board. In general, since the linear expansion coefficients of the circuit board and the mounting board are approximated, the displacement amounts of the semiconductor package and the mounting board are also approximated. Therefore, the difference in displacement between the semiconductor package and the mounting board can be reduced by using a semiconductor package in which the front and back surfaces are formed of a circuit board instead of the resin material on the front and back surfaces. By reducing this, it is expected that the reliability of connection of the semiconductor package to the mounting substrate is improved.

また、上記の目的を達成するために、本発明に係る半導体パッケージの製造方法は、少なくとも1つの半導体素子が搭載された第1の回路基板と、少なくとも1つの半導体素子が搭載されると共に、前記第1の回路基板と所定の間隙を介して対面配置された第2の回路基板と、前記第1の回路基板と前記第2の回路基板との間隙に充填され、前記第1の回路基板及び前記第2の回路基板に搭載された半導体素子を封止する樹脂材料とを備える半導体パッケージの製造方法であって、前記第1の回路基板と前記第2の回路基板との間隙の中心を基準として、前記第1の回路基板の半導体素子の搭載領域と前記第2の回路基板の半導体素子の搭載領域とが略線対称となる様に、上金型の上面に前記第1の回路基板を配置すると共に、下金型の下面に前記第2の回路基板を配置する工程と、前記第1の回路基板を配置した上金型及び前記第2の回路基板を配置した下金型によって形成されるキャビティ内にモールド樹脂を注入する工程とを備える。   In order to achieve the above object, a method of manufacturing a semiconductor package according to the present invention includes a first circuit board on which at least one semiconductor element is mounted, at least one semiconductor element, A second circuit board disposed opposite to the first circuit board via a predetermined gap; and a gap between the first circuit board and the second circuit board is filled; the first circuit board; A method of manufacturing a semiconductor package comprising a resin material for sealing a semiconductor element mounted on the second circuit board, wherein the center of the gap between the first circuit board and the second circuit board is used as a reference. As described above, the first circuit board is placed on the upper surface of the upper mold so that the semiconductor element mounting area of the first circuit board and the semiconductor element mounting area of the second circuit board are substantially line symmetric. Place and lower surface of lower mold Placing the second circuit board; and injecting mold resin into a cavity formed by an upper mold having the first circuit board and a lower mold having the second circuit board. With.

ここで、第1の回路基板の半導体素子の搭載領域と第2の回路基板の半導体素子の搭載領域とが略線対称となる様に、上金型の上面に第1の回路基板を配置すると共に、下金型の下面に第2の回路基板を配置することによって、第1の回路基板と第2の回路基板との間隙の中心を基準として半導体パッケージの線膨張係数を第1の回路基板側と第2の回路基板側を略同一にでき、熱応力バランスがとれることにより半導体パッケージの反りを抑制することができる。   Here, the first circuit board is disposed on the upper surface of the upper mold so that the semiconductor element mounting area of the first circuit board and the semiconductor element mounting area of the second circuit board are substantially line symmetrical. In addition, by disposing the second circuit board on the lower surface of the lower mold, the linear expansion coefficient of the semiconductor package can be determined based on the center of the gap between the first circuit board and the second circuit board. The side and the second circuit board side can be made substantially the same, and the thermal stress balance can be achieved, thereby suppressing the warpage of the semiconductor package.

また、本発明に係る半導体パッケージの製造方法は、少なくとも1つの半導体素子が搭載された第1の回路基板と、少なくとも1つの半導体素子が搭載されると共に、前記第1の回路基板と所定の間隙を介して対面配置された第2の回路基板と、前記第1の回路基板と前記第2の回路基板の間に配置され、前記第1の回路基板と前記第2の回路基板とを電気的に接続する中継基板と、前記第1の回路基板と前記第2の回路基板との間隙に充填され、前記第1の回路基板及び前記第2の回路基板に搭載された半導体素子を封止する樹脂材料とを備える半導体パッケージの製造方法であって、前記第1の回路基板と前記第2の回路基板との間隙の中心を基準として、前記第1の回路基板の半導体素子の搭載領域と前記第2の回路基板の半導体素子の搭載領域とが略線対称となる様に、上金型の上面に前記第1の回路基板を配置し、下金型の下面に前記第2の回路基板を配置すると共に、前記中継基板を前記第1の回路基板と前記第2の回路基板の間に配置する工程と、前記第1の回路基板が配置された上金型及び前記第2の回路基板が配置された下金型によって前記中継基板に圧力を印加した後に、前記第1の回路基板を配置した上金型及び前記第2の回路基板を配置した下金型によって形成されるキャビティ内にモールド樹脂を注入する工程とを備える。   In addition, a method for manufacturing a semiconductor package according to the present invention includes a first circuit board on which at least one semiconductor element is mounted, at least one semiconductor element mounted thereon, and a predetermined gap from the first circuit board. A second circuit board facing each other via the first circuit board, and the second circuit board disposed between the first circuit board and the second circuit board, and electrically connecting the first circuit board and the second circuit board to each other The semiconductor element mounted on the first circuit board and the second circuit board is sealed in the gap between the relay board connected to the first circuit board and the first circuit board and the second circuit board. A method for manufacturing a semiconductor package comprising a resin material, wherein a semiconductor element mounting region on the first circuit board and the mounting area of the semiconductor element on the first circuit board and the center of the gap between the first circuit board and the second circuit board Semiconductor element of second circuit board The first circuit board is disposed on the upper surface of the upper mold and the second circuit board is disposed on the lower surface of the lower mold so that the mounting area is substantially line symmetric. The step of arranging between the first circuit board and the second circuit board, the upper mold on which the first circuit board is arranged, and the lower mold on which the second circuit board is arranged, the relay. And a step of injecting mold resin into a cavity formed by an upper mold on which the first circuit board is arranged and a lower mold on which the second circuit board is arranged after applying pressure to the substrate.

ここで、第1の回路基板が配置された上金型及び第2の回路基板が配置された下金型によって中継基板に圧力を印加することによって、第1の回路基板と中継基板の電気的接続が確保されると共に第2の回路基板と中継基板の電気的接続が確保され、結果として第1の回路基板と第2の回路基板との電気的接続が確保される。   Here, by applying pressure to the relay board by the upper mold on which the first circuit board is arranged and the lower mold on which the second circuit board is arranged, the electrical connection between the first circuit board and the relay board is achieved. The connection is secured and the electrical connection between the second circuit board and the relay board is secured, and as a result, the electrical connection between the first circuit board and the second circuit board is secured.

上記した本発明の半導体パッケージの製造方法では、反りの発生を抑制することができ、実装基板への実装時の接続材料(はんだ等)の状態も均一になることから、実装不良の低減を図ることができる。 In the semiconductor package manufacturing method of the present invention described above, the occurrence of warpage can be suppressed, and the state of the connection material (solder or the like) when mounted on the mounting board is uniform, thereby reducing mounting defects. be able to.

また、半導体パッケージを実装した後の使用時において、接続材料にかかるストレスが軽減されるために実装基板への接続信頼性の向上を図ることができる。   Further, since the stress applied to the connection material is reduced during use after mounting the semiconductor package, the connection reliability to the mounting substrate can be improved.

以下、本発明の実施の形態について図面を参照しながら説明し、本発明の理解に供する。
図1は本発明を適用した半導体パッケージの一例を説明するための模式的な断面図であり、ここで示す半導体パッケージ1は、第1の半導体チップ2がフリップチップ接続された第1のインターポーザー基板3と、第2の半導体チップ4がフリップチップ接続された第2のインターポーザー基板5と、対向する第1のインターポーザー基板及び第2のインターポーザー基板の間に配置された放熱板6と、第1のインターポーザー基板と第2のインターポーザー基板の間隙に充填され、第1の半導体チップ及び第2の半導体チップを封止するモールド樹脂7を備える。
Hereinafter, embodiments of the present invention will be described with reference to the drawings to facilitate understanding of the present invention.
FIG. 1 is a schematic cross-sectional view for explaining an example of a semiconductor package to which the present invention is applied. A semiconductor package 1 shown here is a first interposer in which a first semiconductor chip 2 is flip-chip connected. A substrate 3, a second interposer substrate 5 to which a second semiconductor chip 4 is flip-chip connected, and a heat dissipation plate 6 disposed between the first interposer substrate and the second interposer substrate facing each other. And a mold resin 7 that fills a gap between the first interposer substrate and the second interposer substrate and seals the first semiconductor chip and the second semiconductor chip.

また、第1の半導体チップと第2の半導体チップは外形サイズが略同一であり、第1のインターポーザー基板と第2のインターポーザー基板との間隙の中心線L(以下、単に「中心線」という。)を基準として、図1中符号aで示す半導体パッケージの表面側領域(第1のインターポーザー基板側領域)と図1中符号bで示す半導体パッケージの裏面側領域(第2のインターポーザー基板側領域)とが略対称構造となる様に、第1の半導体チップ及び第2の半導体チップが第1のインターポーザー基板及び第2のインターポーザー基板に搭載されている。   The first semiconductor chip and the second semiconductor chip have substantially the same outer size, and the center line L (hereinafter simply referred to as “center line”) of the gap between the first interposer substrate and the second interposer substrate. 1) as a reference, the front surface side region (first interposer substrate side region) of the semiconductor package indicated by symbol a in FIG. 1 and the rear surface side region (second interposer) of the semiconductor package indicated by symbol b in FIG. The first semiconductor chip and the second semiconductor chip are mounted on the first interposer substrate and the second interposer substrate so that the substrate side region has a substantially symmetrical structure.

ここで、本実施例では、第1の半導体チップをフリップチップ接続により第1のインターポーザー基板に接続しているが、第1の半導体チップと第1のインターポーザー基板の電気的接続を確保することができるのであれば、必ずしもフリップチップ接続によって第1の半導体チップと第1のインターポーザー基板を接続する必要は無く、例えばワイヤーボンディング接続によって電気的接続を確保しても良い。なお、第2の半導体チップと第2のインターポーザー基板の電気的接続に関しても同様である。   Here, in this embodiment, the first semiconductor chip is connected to the first interposer substrate by flip-chip connection, but electrical connection between the first semiconductor chip and the first interposer substrate is ensured. If possible, it is not always necessary to connect the first semiconductor chip and the first interposer substrate by flip chip connection. For example, electrical connection may be ensured by wire bonding connection. The same applies to the electrical connection between the second semiconductor chip and the second interposer substrate.

また、本実施例では、第1のインターポーザー基板及び第2のインターポーザー基板に各々1つの半導体チップを搭載しているが、中心線を基準として半導体パッケージの表面側領域と裏面側領域とが構成的に略対称構造をなせば充分であり、即ち、中心線を基準として第1のインターポーザー基板の半導体チップの搭載領域と第2のインターポーザー基板の半導体チップの搭載領域が略対称構造をなせば充分であり、インターポーザー基板に搭載される半導体チップは必ずしも1つに限定されるものではなく、例えば図2(a)で示す様に、第1のインターポーザー基板に大サイズの半導体チップを1つ搭載し、第2のインターポーザー基板に中サイズの半導体チップを2つ搭載したり、図2(b)で示す様に、第1のインターポーザー基板に中サイズの半導体チップを2つ搭載し、第2のインターポーザー基板に小サイズの半導体チップを3つ搭載したりしても良い。   Further, in this embodiment, one semiconductor chip is mounted on each of the first interposer substrate and the second interposer substrate, but the surface side region and the back surface region of the semiconductor package are divided with respect to the center line. It is sufficient if the structure is substantially symmetrical. That is, the mounting area of the semiconductor chip on the first interposer substrate and the mounting area of the semiconductor chip on the second interposer substrate are substantially symmetrical with respect to the center line. This is sufficient, and the number of semiconductor chips mounted on the interposer substrate is not necessarily limited to one. For example, as shown in FIG. 2A, a large-sized semiconductor chip is provided on the first interposer substrate. 1 and two medium-sized semiconductor chips are mounted on the second interposer substrate, or as shown in FIG. The medium size of the semiconductor chip 2 is mounted, may be or three mounting small size of the semiconductor chip to the second interposer substrate.

また、本実施例では、第1のインターポーザー基板と第2のインターポーザー基板の間に放熱板を配置して、回路の駆動に伴って第1の半導体チップ及び第2の半導体チップから発生した熱を逃がすことができる様に構成されているが、第1の半導体チップ及び第2の半導体チップから発生する熱を逃がす必要が無い場合には必ずしも放熱板が配置される必要は無い。   Further, in this embodiment, a heat radiating plate is arranged between the first interposer substrate and the second interposer substrate and generated from the first semiconductor chip and the second semiconductor chip as the circuit is driven. Although it is configured so that heat can be released, if it is not necessary to release heat generated from the first semiconductor chip and the second semiconductor chip, it is not always necessary to dispose a heat sink.

ここで、半導体パッケージ内の半導体チップは、半導体パッケージを実装する実装基板と電気的に接続する必要があるが、第1の半導体チップ及び第2の半導体チップと実装基板の接続方法としては、例えば、(1)図3(a)で示す様に、フレキシブル回路基板8(例えば、TABテープ、配線形成PIテープ等)によって第1の半導体チップと電気的に接続された第1のインターポーザー基板の端子9と第2の半導体チップと電気的に接続された第2のインターポーザー基板の端子10とを接続し、第2のインターポーザー基板の端子を実装基板24の端子11とはんだ材12により電気的に接続することによって第1の半導体チップ及び第2の半導体チップと実装基板を電気的に接続する方法や、(2)図3(b)で示す様に、第1のインターポーザー基板及び第2のインターポーザー基板に中心線を基準として半導体パッケージの表面側領域と裏面側領域とが構成的に略対称構造となる様に第1のインターポーザー基板に第1の半導体チップと電気的に接続される中継基板13aを搭載すると共に、第2のインターポーザー基板に第2のインターポーザー基板の端子と電気的に接続される中継基板13bを搭載し、中継基板13aと中継基板13bとを例えばバンプ圧接により電気的に接続し、第2のインターポーザー基板の端子を実装基板の端子とはんだ材により電気的に接続することによって第1の半導体チップ及び第2の半導体チップを実装基板と電気的に接続する方法がある。なお、図3は説明の便宜のために放熱板の図示を省略している。   Here, the semiconductor chip in the semiconductor package needs to be electrically connected to the mounting substrate on which the semiconductor package is mounted. As a method for connecting the first semiconductor chip and the second semiconductor chip to the mounting substrate, for example, (1) As shown in FIG. 3A, the first interposer substrate electrically connected to the first semiconductor chip by the flexible circuit board 8 (for example, TAB tape, wiring formation PI tape, etc.) The terminal 9 and the terminal 10 of the second interposer substrate electrically connected to the second semiconductor chip are connected, and the terminal of the second interposer substrate is electrically connected by the terminal 11 of the mounting substrate 24 and the solder material 12. A method of electrically connecting the first semiconductor chip and the second semiconductor chip and the mounting substrate by connecting them together, or (2) as shown in FIG. The first interposer substrate and the second interposer substrate have the first semiconductor chip on the first interposer substrate so that the front side region and the rear side region of the semiconductor package have a substantially symmetrical structure with respect to the center line. And the relay board 13a electrically connected to the terminal of the second interposer board is mounted on the second interposer board, and the relay board 13a and the relay board are mounted. For example, the first semiconductor chip and the second semiconductor chip are mounted by electrically connecting the terminals of the second interposer substrate to the terminals of the mounting substrate using a solder material. There is a method of electrically connecting to a substrate. In FIG. 3, the heat sink is not shown for convenience of explanation.

以下、上記の様に構成された半導体パッケージの製造方法について説明する。なお、以下では説明の便宜のために放熱板を搭載していない半導体パッケージを例に挙げて説明を行う。   Hereinafter, a method for manufacturing the semiconductor package configured as described above will be described. In the following description, for convenience of explanation, a semiconductor package without a heat sink is taken as an example.

上記した半導体パッケージの製造方法の一例では、先ず、図4(a)で示す様に、第1の半導体チップがフリップチップ接続された第1のインターポーザー基板を上金型14の上面に真空吸着あるいは機械的にクランプすることによって配置すると共に、第2の半導体チップがフリップチップ接続された第2のインターポーザー基板を下金型15の下面に真空吸着あるいは機械的にクランプすることによって配置する。この時に、中心線を基準として第1のインターポーザー基板側領域と第2のインターポーザー基板側領域とが略対称構造となる様に、金型内に第1のインターポーザー基板及び第2のインターポーザー基板を配置する。   In an example of the semiconductor package manufacturing method described above, first, as shown in FIG. 4A, the first interposer substrate to which the first semiconductor chip is flip-chip connected is vacuum-adsorbed to the upper surface of the upper mold 14. Alternatively, the second interposer substrate to which the second semiconductor chip is flip-chip connected is placed on the lower surface of the lower mold 15 by vacuum suction or mechanically clamped. At this time, the first interposer substrate and the second interposer substrate side region and the second interposer substrate side region have a substantially symmetrical structure with respect to the center line as a reference. Place the Poser board.

次に、図4(b)で示す様に、トランスファーモールド技術により金型内にモールド樹脂を充填し、第1の半導体チップ及び第2の半導体チップを樹脂封止することによって、図4(c)で示す様な半導体パッケージの結合体16を得ることができる。   Next, as shown in FIG. 4B, the mold resin is filled in the mold by the transfer molding technique, and the first semiconductor chip and the second semiconductor chip are sealed with the resin. The combined body 16 of the semiconductor package as shown in FIG.

その後、半導体パッケージの結合体をダイシングテープ17に貼り合わせ、図4(d)で示す様にダイシングブレード18により個片化することによって、図4(e)で示す様な半導体パッケージを得ることができる。   Thereafter, the combined body of the semiconductor packages is bonded to the dicing tape 17 and separated into pieces by the dicing blade 18 as shown in FIG. 4D, whereby a semiconductor package as shown in FIG. 4E can be obtained. it can.

なお、本実施例では、トランスファーモールド技術によって金型内にモールド樹脂を充填する場合を例に挙げて説明を行ったが、金型内にモールド樹脂を充填することができるのであれば、いかなる方法であっても良く、例えば、(1)図5(a)で示す様に、第2のインターポーザー基板上にポッティング法によりモールド樹脂を塗布した後に、図5(b)で示す様に、上下金型によってモールド樹脂を挟み込むことによって金型内にモールド樹脂を充填する方法や、(2)図6(a)で示す様に、上金型と下金型の間に樹脂フィルム19を配置し、上下金型で樹脂フィルムを挟み込むことによって図6(b)で示す様に金型内にモールド樹脂を充填する方法であっても良い。   In this embodiment, the case where the mold resin is filled in the mold by the transfer molding technique has been described as an example. However, any method can be used as long as the mold resin can be filled in the mold. For example, (1) as shown in FIG. 5 (a), after applying the mold resin on the second interposer substrate by the potting method, as shown in FIG. 5 (b) A method of filling the mold resin with the mold resin sandwiched between the molds, or (2) placing a resin film 19 between the upper mold and the lower mold as shown in FIG. Alternatively, a method may be used in which the mold resin is filled in the mold as shown in FIG. 6B by sandwiching the resin film between the upper and lower molds.

また、上記した半導体パッケージの製造方法の他の一例では、先ず、図7(a)で示す様に、第1の半導体チップがフリップチップ接続された第1のインターポーザー基板を真空吸着或いは機械的にクランプすることにより下金型の下面に配置した後、図7(b)で示す様に、トランスファーモールド技術により金型内にモールド樹脂を充填することによって、図7(c)で示す様な、第1の半導体チップが搭載された第1のインターポーザー基板をモールド樹脂で封止した第1の半導体パッケージの結合体20を得ることができる。その後、第1の半導体パッケージの結合体をダイシングテープに貼り合わせ、ダイシングブレードにより個片化することによって、図7(d)で示す様な第1の半導体パッケージ21を得ることができる。   In another example of the semiconductor package manufacturing method described above, first, as shown in FIG. 7A, the first interposer substrate to which the first semiconductor chip is flip-chip connected is vacuum-sucked or mechanically. After being placed on the lower surface of the lower mold by clamping to the mold, as shown in FIG. 7B, the mold resin is filled into the mold by the transfer molding technique, as shown in FIG. 7C. The first semiconductor package assembly 20 in which the first interposer substrate on which the first semiconductor chip is mounted is sealed with the mold resin can be obtained. After that, the first semiconductor package 21 as shown in FIG. 7D can be obtained by bonding the first semiconductor package assembly to the dicing tape and separating it with a dicing blade.

同様に、図7(e)で示す様に、第2の半導体チップがフリップチップ接続された第2のインターポーザー基板を真空吸着或いは機械的にクランプすることにより下金型の下面に配置した後、図7(f)で示す様に、トランスファーモールド技術により金型内にモールド樹脂を充填することによって、図7(g)で示す様な、第2の半導体チップが搭載された第2のインターポーザー基板をモールド樹脂で封止した第2の半導体パッケージの結合体22を得ることができる。その後、第2の半導体パッケージの結合体をダイシングテープに貼り合わせ、ダイシングブレードにより個片化することによって、図7(h)で示す様な第2の半導体パッケージ23を得ることができる。   Similarly, as shown in FIG. 7E, after the second interposer substrate to which the second semiconductor chip is flip-chip connected is placed on the lower surface of the lower mold by vacuum suction or mechanical clamping. As shown in FIG. 7 (f), a mold resin is filled in the mold by the transfer molding technique, whereby the second interface on which the second semiconductor chip is mounted as shown in FIG. 7 (g). As a result, it is possible to obtain the second semiconductor package assembly 22 in which the poser substrate is sealed with the mold resin. Thereafter, the second semiconductor package 23 as shown in FIG. 7H can be obtained by bonding the combined body of the second semiconductor packages to a dicing tape and separating them with a dicing blade.

なお、本実施例ではトランスファーモールド技術によって金型内にモールド樹脂を充填して第1の半導体パッケージを製造しているが、第1のインターポーザー基板に搭載された第1の半導体チップを封止することができるのであれば、いかなる方法であっても良く、ポッティング技術等によって封止を行なっても良いのは勿論である。また、第2の半導体パッケージについても同様である。   In this embodiment, the mold resin is filled in the mold by the transfer molding technique to manufacture the first semiconductor package, but the first semiconductor chip mounted on the first interposer substrate is sealed. Of course, any method may be used as long as it can be performed, and sealing may be performed by a potting technique or the like. The same applies to the second semiconductor package.

次に、第1の半導体パッケージのモールド樹脂面と第2の半導体パッケージのモールド樹脂面とを、中心線を基準として第1の半導体パッケージ領域側と第2の半導体パッケージ領域側とが略対称構造となる様に貼り合わせることによって、図7(i)で示す様な半導体パッケージを得ることができる。   Next, the mold resin surface of the first semiconductor package and the mold resin surface of the second semiconductor package are structured so that the first semiconductor package region side and the second semiconductor package region side are substantially symmetrical with respect to the center line. A semiconductor package as shown in FIG. 7 (i) can be obtained by pasting together.

ここで、本実施例では、個片化した第1の半導体パッケージと個片化した第2の半導体パッケージを貼り合わせて半導体パッケージを製造しているが、第1の半導体パッケージの結合体に個片化した第2の半導体パッケージを貼り合わせた後に第1の半導体パッケージの結合体を個片化しても良いし、第2の半導体パッケージの結合体に個片化した第1の半導体パッケージを貼り合せた後に第2の半導体パッケージの結合体を個片化しても良いし、第1の半導体パッケージの結合体と第2の半導体パッケージの結合体を貼り合せた後に、第1の半導体パッケージの結合体及び第2の半導体パッケージの結合体を個片化しても良い。   Here, in this embodiment, the semiconductor package is manufactured by laminating the separated first semiconductor package and the separated second semiconductor package. After bonding the separated second semiconductor package, the combination of the first semiconductor packages may be divided into pieces, or the separated first semiconductor package may be attached to the combination of the second semiconductor packages. After combining, the combined body of the second semiconductor package may be separated into pieces, or after the combined body of the first semiconductor package and the combined body of the second semiconductor package are bonded together, the combined body of the first semiconductor package The combined body of the body and the second semiconductor package may be singulated.

また、上記した半導体パッケージの製造方法の更に他の一例では、先ず、図8(a)で示す様に、第1の半導体チップ2がワイヤーボンディング接続された第1のインターポーザー基板3を上金型14の上面に真空吸着あるいは機械的にクランプすることによって配置し、第2の半導体チップ4がワイヤーボンディング接続された第2のインターポーザー基板5を下金型15の下面に真空吸着あるいは機械的にクランプすることによって配置すると共に、第1のインターポーザー基板と第2のインターポーザー基板の間に中継基板30を配置する。この時に、中心線を基準として第1のインターポーザー基板側領域と第2のインターポーザー基板側領域とが略対称構造となる様に、金型内に第1のインターポーザー基板、第2のインターポーザー基板及び中継基板を配置する。
なお、本実施例では、各々が個片化された中継基板を例に挙げて説明を行っているが、各中継基板を連結部材によって一体化することによって、中継基板の取り扱いが容易になると共に金型内への中継基板の配置精度(搭載精度)の向上が実現する。なお、連結部材が製品パッケージに悪影響を与えないようにするためには、連結部材を後述するモールド樹脂の充填時に焼失する材料により構成する方法や、製品パッケージ領域外に連結部材を形成する方法等が考えられる。
In still another example of the semiconductor package manufacturing method described above, first, as shown in FIG. 8A, the first interposer substrate 3 to which the first semiconductor chip 2 is connected by wire bonding is used as the upper metal plate. The second interposer substrate 5 is disposed on the upper surface of the mold 14 by vacuum suction or mechanically clamped, and the second semiconductor chip 4 is connected to the lower die 15 by vacuum suction or mechanically. And the relay substrate 30 is disposed between the first interposer substrate and the second interposer substrate. At this time, the first interposer substrate and the second interposer substrate are disposed in the mold so that the first interposer substrate side region and the second interposer substrate side region have a substantially symmetrical structure with respect to the center line. A poser board and a relay board are arranged.
In this embodiment, each relay board is described as an example. However, by integrating each relay board with a connecting member, the handling of the relay board becomes easy. Improves the placement accuracy (mounting accuracy) of the relay board in the mold. In order to prevent the connecting member from adversely affecting the product package, a method of forming the connecting member with a material that burns out when filling with a mold resin described later, a method of forming the connecting member outside the product package area, etc. Can be considered.

ここで、中継基板の一方の面(第1のインターポーザー基板側の面)には第1のインターポーザー基板と電気的に接続される第1の金属バンプ31(Auバンプ、半田バンプ等)が形成され、中継基板の他方の面(第2のインターポーザー基板側の面)には第2のインターポーザー基板と電気的に接続される第2の金属バンプ32(Auバンプ、半田バンプ等)が形成されており、中継基板の表面には、第1の金属バンプ及び第2の金属バンプを被覆する様に保護フィルム33が貼り合わせられている。   Here, the first metal bumps 31 (Au bumps, solder bumps, etc.) electrically connected to the first interposer substrate are provided on one surface of the relay substrate (the surface on the first interposer substrate side). A second metal bump 32 (Au bump, solder bump, etc.) that is formed and electrically connected to the second interposer substrate is formed on the other surface of the relay substrate (the surface on the second interposer substrate side). The protective film 33 is bonded to the surface of the relay substrate so as to cover the first metal bump and the second metal bump.

次に、図8(b)で示す様に、上下金型で第1のインターポーザー基板及び第2のインターポーザー基板に圧力を印加することによって、第1のインターポーザー基板と第1の金属バンプを電気的に接続すると共に、第2のインターポーザー基板と第2の金属バンプを電気的に接続して、第1のインターポーザー基板と第2のインターポーザー基板とを中継基板を介して電気的に接続する。
この際、印加される圧力と上下金型からの熱量によって、保護フィルムは流動し、中継基板の横側にはみ出し部分34を形成することとなる。
Next, as shown in FIG. 8B, by applying pressure to the first interposer substrate and the second interposer substrate with the upper and lower molds, the first interposer substrate and the first metal bumps are applied. The second interposer substrate and the second metal bump are electrically connected, and the first interposer substrate and the second interposer substrate are electrically connected via the relay substrate. Connect to.
At this time, the protective film flows due to the applied pressure and the amount of heat from the upper and lower molds, and the protruding portion 34 is formed on the lateral side of the relay substrate.

続いて、図8(c)で示す様に、トランスファーモールド技術によって金型内にモールド樹脂を充填し、第1の半導体チップ及び第2の半導体チップを樹脂封止することによって、図8(d)で示す様な半導体パッケージの結合体を得ることができる。
この際、中継基板の横側に形成されたはみ出し部分が第1のインターポーザー基板と中継基板の間及び第2のインターポーザー基板と中継基板の間へのモールド樹脂の浸入を防ぐために、金型内にモールド樹脂を充填する際の圧力によって第1のインターポーザー基板と第1の金属バンプとの接続及び第2のインターポーザー基板と第2の金属バンプとの接続が破壊されることは無い。
Subsequently, as shown in FIG. 8C, the mold resin is filled in the mold by the transfer molding technique, and the first semiconductor chip and the second semiconductor chip are resin-sealed, so that FIG. A combined body of semiconductor packages as shown in FIG.
At this time, the protruding portion formed on the side of the relay substrate prevents the mold resin from entering between the first interposer substrate and the relay substrate and between the second interposer substrate and the relay substrate. The connection between the first interposer substrate and the first metal bump and the connection between the second interposer substrate and the second metal bump are not broken by the pressure when the mold resin is filled therein.

その後、上記した半導体パッケージの製造方法の一例と同様に、半導体パッケージの結合体をダイシングブレードにより個片化することよって、図8(e)で示す様な半導体パッケージを得ることができる。   Thereafter, similarly to the above-described method for manufacturing a semiconductor package, a semiconductor package as shown in FIG. 8E can be obtained by separating the combined body of semiconductor packages with a dicing blade.

本発明を適用した半導体パッケージでは、中心線を基準として半導体パッケージの表面側領域と裏面側領域が略対称構造となる様に構成されており、中心線を基準として半導体パッケージの線膨張係数を半導体パッケージの表面側領域と裏面側領域とで略同一とすることができるために、反りの発生を抑制することができ、実装基板への実装時の接続状態も均一になることから、実装不良の低減を図ることができる。   The semiconductor package to which the present invention is applied is configured such that the front side region and the back side region of the semiconductor package have a substantially symmetrical structure with respect to the center line, and the linear expansion coefficient of the semiconductor package with respect to the center line is set as the semiconductor. Since the front surface area and the back surface area of the package can be substantially the same, the occurrence of warpage can be suppressed, and the connection state when mounted on the mounting board is uniform, so that mounting defects Reduction can be achieved.

また、半導体パッケージを実装基板に実装した後の使用時において、半導体パッケージの端子と実装基板の端子との接続部にかかるストレスが軽減されるために、実装基板への接続信頼性の向上を図ることができる。   In addition, since the stress applied to the connection portion between the terminal of the semiconductor package and the terminal of the mounting substrate is reduced during use after the semiconductor package is mounted on the mounting substrate, the connection reliability to the mounting substrate is improved. be able to.

なお、表1に示す様な材料定数を有する各材料によって、(1)図9(a)で示す様な、シリコンチップ(□6.5mm、厚さ0.15mm)が搭載された6mm×6mm×0.4mmのインターポーザー基板をモールド樹脂で封止した6mm×6mm×1.2mmの半導体パッケージ(従来の半導体パッケージ構造)と、(2)図9(b)で示す様な、シリコンチップ(□6.5mm、厚さ0.15mm)が搭載された6mm×6mm×0.4mmのインターポーザー基板を対面配置させ、インターポーザー基板間をモールド樹脂で封止した6mm×6mm×1.6mmの半導体パッケージ(本発明の半導体パッケージ構造(1))と、(3)図9(c)で示す様な、シリコンチップ(□6.5mm、厚さ0.15mm)が搭載された6mm×6mm×0.2mmのインターポーザー基板を対面配置させ、インターポーザー基板間をモールド樹脂で封止した6mm×6mm×1.2mmの半導体パッケージ(本発明の半導体パッケージ構造(2))を構成し、各々の半導体パッケージについての温度と反りの関係を図10に示す。なお、図10に示す反り量については、半導体パッケージが凹状に反った場合(図13(a)で示す様に反った場合)の反り量を正の反り量とし、半導体パッケージが凸状に反った場合(図13(b)で示す様に反った場合)の反り量を負の反り量として表している。   In addition, by each material having the material constants shown in Table 1, (1) 6 mm × 6 mm on which a silicon chip (□ 6.5 mm, thickness 0.15 mm) as shown in FIG. A 6 mm × 6 mm × 1.2 mm semiconductor package (conventional semiconductor package structure) in which a 0.4 mm interposer substrate is sealed with a mold resin, and (2) a silicon chip (as shown in FIG. 9B) 6 mm x 6 mm x 1.6 mm interposer substrates with 6 mm x 6 mm x 0.4 mm mounted with a thickness of 6.5 mm and a thickness of 0.15 mm are placed facing each other and the interposer substrates are sealed with mold resin. A semiconductor package (semiconductor package structure (1) of the present invention) and (3) 6 mm × 6 mounted with a silicon chip (□ 6.5 mm, thickness 0.15 mm) as shown in FIG. 9C. A 6 mm × 6 mm × 1.2 mm semiconductor package (semiconductor package structure (2) of the present invention) in which an m × 0.2 mm interposer substrate is placed facing each other and the interposer substrates are sealed with a mold resin is formed. FIG. 10 shows the relationship between temperature and warpage for each semiconductor package. Note that the warpage amount shown in FIG. 10 is a positive warpage amount when the semiconductor package warps in a concave shape (when warped as shown in FIG. 13A), and the semiconductor package warps in a convex shape. The amount of warping (when warped as shown in FIG. 13B) is expressed as a negative amount of warping.

Figure 0004626445
Figure 0004626445

図10から、従来の半導体パッケージ構造では、最大で140μm程度の反り挙動が見られるのに比べて、本発明の半導体パッケージ(1)及び本発明の半導体パッケージ(2)では、反り量は約1μmにまで低減できているのが分かる。   As shown in FIG. 10, in the conventional semiconductor package structure, the warpage behavior of about 140 μm at the maximum is observed, and in the semiconductor package (1) of the present invention and the semiconductor package (2) of the present invention, the warpage amount is about 1 μm. It can be seen that it is reduced to.

本発明を適用した半導体パッケージの一例を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating an example of the semiconductor package to which this invention is applied. 本発明を適用した半導体パッケージの変形例を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the modification of the semiconductor package to which this invention is applied. 半導体チップと実装基板との電気的な接続を説明するための模式的な断面図及び平面図である。It is typical sectional drawing and a top view for explaining electrical connection with a semiconductor chip and a mounting board. 本発明を適用した半導体パッケージの製造方法の一例を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating an example of the manufacturing method of the semiconductor package to which this invention is applied. 本発明を適用した半導体パッケージの製造方法の一例の変形例を説明するための模式的な断面図(1)である。It is typical sectional drawing (1) for demonstrating the modification of an example of the manufacturing method of the semiconductor package to which this invention is applied. 本発明を適用した半導体パッケージの製造方法の一例の変形例を説明するための模式的な断面図(2)である。It is typical sectional drawing (2) for demonstrating the modification of an example of the manufacturing method of the semiconductor package to which this invention is applied. 本発明を適用した半導体パッケージの製造方法の他の一例を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating another example of the manufacturing method of the semiconductor package to which this invention is applied. 本発明を適用した半導体パッケージの製造方法の更に他の一例を説明するための模式的な断面図である。It is typical sectional drawing for demonstrating another example of the manufacturing method of the semiconductor package to which this invention is applied. 半導体パッケージのサイズを説明するための模式的な図である。It is a schematic diagram for demonstrating the size of a semiconductor package. 半導体パッケージの温度と反りの関係を示すグラフである。It is a graph which shows the relationship between the temperature of a semiconductor package, and curvature. 従来のLGA型半導体パッケージを説明するための模式図である。It is a schematic diagram for demonstrating the conventional LGA type semiconductor package. 従来のLGA型半導体パッケージの実装状態を説明するための模式図である。It is a schematic diagram for demonstrating the mounting state of the conventional LGA type semiconductor package. 半導体パッケージの反りを説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the curvature of a semiconductor package. 表裏面が樹脂材料で構成された半導体パッケージを説明するための模式的な断面図である。It is typical sectional drawing for demonstrating the semiconductor package by which the front and back were comprised with the resin material.

符号の説明Explanation of symbols

1 半導体パッケージ
2 第1の半導体チップ
3 第1のインターポーザー基板
4 第2の半導体チップ
5 第2のインターポーザー基板
6 放熱板
7 モールド樹脂
8 フレキシブル回路基板
9 第1のインターポーザー基板の端子
10 第2のインターポーザー基板の端子
11 実装基板の端子
12 はんだ材
13a 中継基板
13b 中継基板
14 上金型
15 下金型
16 半導体パッケージの結合体
17 ダイシングテープ
18 ダイシングブレード
19 樹脂フィルム
20 第1の半導体パッケージの結合体
21 第1の半導体パッケージ
22 第2の半導体パッケージの結合体
23 第2の半導体パッケージ
24 実装基板
30 中継基板
31 第1の金属バンプ
32 第2の金属バンプ
33 保護フィルム
34 はみ出し部分
DESCRIPTION OF SYMBOLS 1 Semiconductor package 2 1st semiconductor chip 3 1st interposer board 4 2nd semiconductor chip 5 2nd interposer board 6 Heat sink 7 Mold resin 8 Flexible circuit board 9 Terminal of 1st interposer board 10 1st 2 Interposer board terminal 11 Mounting board terminal 12 Solder material 13a Relay board 13b Relay board 14 Upper mold 15 Lower mold 16 Combined semiconductor package 17 Dicing tape 18 Dicing blade 19 Resin film 20 First semiconductor package 21 first semiconductor package 22 second semiconductor package combination 23 second semiconductor package 24 mounting substrate 30 relay substrate 31 first metal bump 32 second metal bump 33 protective film 34 protruding portion

Claims (3)

少なくとも1つの半導体素子が搭載された第1の回路基板と、
少なくとも1つの半導体素子が搭載されると共に、前記第1の回路基板と所定の間隙を介して対面配置された第2の回路基板と、
前記第1の回路基板と前記第2の回路基板との間隙に充填され、前記第1の回路基板及び前記第2の回路基板に搭載された半導体素子を封止する樹脂材料とを備える半導体パッケージの製造方法であって、
前記第1の回路基板と前記第2の回路基板との間隙の中心を基準として、前記第1の回路基板の半導体素子の搭載領域と前記第2の回路基板の半導体素子の搭載領域とが線対称となる様に、上金型の上面に前記第1の回路基板を配置すると共に、下金型の下面に前記第2の回路基板を配置する工程と、
前記第1の回路基板を配置した上金型及び前記第2の回路基板を配置した下金型によって形成されるキャビティ内にモールド樹脂を注入する工程とを備える
半導体パッケージの製造方法。
A first circuit board on which at least one semiconductor element is mounted;
A second circuit board on which at least one semiconductor element is mounted and which is disposed to face the first circuit board with a predetermined gap;
A semiconductor package comprising: a resin material that fills a gap between the first circuit board and the second circuit board and seals the first circuit board and a semiconductor element mounted on the second circuit board. A manufacturing method of
With reference to the center of the gap between the first circuit board and the second circuit board, a semiconductor element mounting area on the first circuit board and a semiconductor element mounting area on the second circuit board are lined up. Disposing the first circuit board on the upper surface of the upper mold so as to be symmetric, and disposing the second circuit board on the lower surface of the lower mold;
And a step of injecting a mold resin into a cavity formed by an upper mold having the first circuit board and a lower mold having the second circuit board. A method for manufacturing a semiconductor package.
少なくとも1つの半導体素子が搭載された第1の回路基板と、
少なくとも1つの半導体素子が搭載されると共に、前記第1の回路基板と所定の間隙を介して対面配置された第2の回路基板と、
前記第1の回路基板と前記第2の回路基板の間に配置され、前記第1の回路基板と前記第2の回路基板とを電気的に接続する中継基板と、
前記第1の回路基板と前記第2の回路基板との間隙に充填され、前記第1の回路基板及び前記第2の回路基板に搭載された半導体素子を封止する樹脂材料とを備える半導体パッケージの製造方法であって、
前記第1の回路基板と前記第2の回路基板との間隙の中心を基準として、前記第1の回路基板の半導体素子の搭載領域と前記第2の回路基板の半導体素子の搭載領域とが線対称となる様に、上金型の上面に前記第1の回路基板を配置し、下金型の下面に前記第2の回路基板を配置すると共に、前記中継基板を前記第1の回路基板と前記第2の回路基板の間に配置する工程と、
前記第1の回路基板が配置された上金型及び前記第2の回路基板が配置された下金型によって前記中継基板に圧力を印加した後に、前記第1の回路基板を配置した上金型及び前記第2の回路基板を配置した下金型によって形成されるキャビティ内にモールド樹脂を注入する工程とを備える
半導体パッケージの製造方法。
A first circuit board on which at least one semiconductor element is mounted;
A second circuit board on which at least one semiconductor element is mounted and which is disposed to face the first circuit board with a predetermined gap;
A relay board that is disposed between the first circuit board and the second circuit board and electrically connects the first circuit board and the second circuit board;
A semiconductor package comprising: a resin material that fills a gap between the first circuit board and the second circuit board and seals the first circuit board and a semiconductor element mounted on the second circuit board. A manufacturing method of
With reference to the center of the gap between the first circuit board and the second circuit board, a semiconductor element mounting area on the first circuit board and a semiconductor element mounting area on the second circuit board are lined up. The first circuit board is disposed on the upper surface of the upper mold and the second circuit board is disposed on the lower surface of the lower mold so as to be symmetric, and the relay board is connected to the first circuit board. Placing between the second circuit boards;
An upper mold in which the first circuit board is disposed after pressure is applied to the relay board by an upper mold in which the first circuit board is disposed and a lower mold in which the second circuit board is disposed. And a step of injecting a mold resin into a cavity formed by a lower mold on which the second circuit board is disposed. A method for manufacturing a semiconductor package.
前記中継基板は、第1の回路基板と接続するための第1のバンプと、
第2の回路基板と接続するための第2のバンプと、
前記第1のバンプ及び前記第2のバンプを被覆する保護フィルムとを備え、
前記保護フィルムは、前記上金型及び前記下金型による前記中継基板への圧力の印加時に中継基板の側面にはみ出し部を形成する
請求項に記載の半導体パッケージの製造方法。
The relay board includes a first bump for connecting to a first circuit board;
A second bump for connecting to a second circuit board;
A protective film covering the first bump and the second bump;
The method of manufacturing a semiconductor package according to claim 2 , wherein the protective film forms a protruding portion on a side surface of the relay substrate when pressure is applied to the relay substrate by the upper mold and the lower mold.
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KR100758229B1 (en) 2006-04-11 2007-09-12 삼성전기주식회사 Electronic components embedded pcb and the method for manufacturing thereof
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