JP4622280B2 - Resin composition, prepreg and laminate - Google Patents

Resin composition, prepreg and laminate Download PDF

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JP4622280B2
JP4622280B2 JP2004086458A JP2004086458A JP4622280B2 JP 4622280 B2 JP4622280 B2 JP 4622280B2 JP 2004086458 A JP2004086458 A JP 2004086458A JP 2004086458 A JP2004086458 A JP 2004086458A JP 4622280 B2 JP4622280 B2 JP 4622280B2
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resin
prepreg
resin composition
laminate
varnish
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JP2005272573A (en
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晃彦 飛澤
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Sumitomo Bakelite Co Ltd
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Description

本発明は、樹脂組成物、プリプレグおよび積層板に関する。   The present invention relates to a resin composition, a prepreg, and a laminate.

ノート型パーソナルコンピューターや携帯電話等の情報処理機器は、高速化が要求されておりCPUクロック周波数が高くなっている。そのため、このような情報処理機器に用いられる回路基板にも信号伝搬速度の高速化が要求されており、高速化に有利な誘電率、誘電正接の低い積層板であることが必要とされる。   Information processing devices such as notebook personal computers and mobile phones are required to be faster and have a higher CPU clock frequency. For this reason, a circuit board used in such information processing equipment is also required to have a high signal propagation speed, and is required to be a laminate having a low dielectric constant and low dielectric loss tangent, which is advantageous for the high speed.

耐熱性に優れ、誘電特性に優れた樹脂としてシアネート樹脂が用いられる。シアネート樹脂は硬化反応によって水酸基などの分極の大きい反応基が生じることがないため、誘電特性が非常に優れている(例えば特許文献1)。   Cyanate resin is used as a resin having excellent heat resistance and excellent dielectric properties. Since the cyanate resin does not generate a reactive group having a large polarization such as a hydroxyl group by a curing reaction, the dielectric property is very excellent (for example, Patent Document 1).

シアネート樹脂の硬化触媒として、アミン化合物、フェノール化合物、各種金属錯体などが用いられる。しかしこれらの硬化触媒は触媒活性が短時間で失活し、条件によっては硬化が不十分となる欠点がある。   As a curing catalyst for the cyanate resin, amine compounds, phenol compounds, various metal complexes, and the like are used. However, these curing catalysts have a drawback that their catalytic activity is deactivated in a short time and curing is insufficient depending on conditions.

特許3310426号公報Japanese Patent No. 3310426

本発明の目的は耐熱性、誘電特性に優れ、保存性に優れた樹脂組成物、プリプレグおよびプリプレグから得られた積層板を提供するものである。   An object of the present invention is to provide a resin composition, a prepreg, and a laminate obtained from the prepreg, which are excellent in heat resistance and dielectric properties and excellent in storage stability.

このような目的は、下記(1)〜()に記載の本発明により達成される。
(1)基材に含浸させてシート状のプリプレグを形成するために用いる樹脂組成物であって、ビスフェノールA型シアネート樹脂と、ヘキサアンミンコバルト(III)アセテートを含むことを特徴とする樹脂組成物。
(2)上記(1)に記載の樹脂組成物を基材に含浸させてなることを特徴とするプリプレグ。
(3)上記()に記載のプリプレグを1枚以上成形してなることを特徴とする積層板。
Such an object is achieved by the present invention described in the following (1) to ( 3 ).
(1) by impregnating the base material with a resin composition used to form a prepreg sheet, a resin wherein the bisphenol A type cyanate resin, to include f hexa ammine cobalt (III) acetate composition object.
(2) A prepreg comprising a base material impregnated with the resin composition described in (1 ) above.
(3) A laminate comprising one or more of the prepregs described in ( 2 ) above.

本発明は、シアネート樹脂と、6配位3価コバルト錯体を含む樹脂組成物、及び、これを用いたプリプレグ、積層板であり、従来のものと比較して、十分な耐熱性、誘電特性、保存性を発現できる。   The present invention is a resin composition containing a cyanate resin and a hexacoordinate trivalent cobalt complex, and a prepreg and a laminate using the resin composition. Compared to conventional ones, sufficient heat resistance, dielectric properties, Preservability can be expressed.

本発明の樹脂組成物は、基材に含浸させてシート状のプリプレグを形成するために用いる樹脂組成物であって、シアネート樹脂と、6配位3価コバルト錯体を含むことを特徴とするものである。
また、本発明のプリプレグは、上述の樹脂組成物を基材に含浸させてなることを特徴とするものである。
また、本発明の積層板は、上述のプリプレグを1枚以上成形してなることを特徴とするものである。
まず、本発明の樹脂組成物について説明する。
The resin composition of the present invention is a resin composition used for forming a sheet-like prepreg by impregnating a base material, comprising a cyanate resin and a hexacoordinate trivalent cobalt complex It is.
Moreover, the prepreg of the present invention is characterized in that a base material is impregnated with the above-mentioned resin composition.
Moreover, the laminated board of the present invention is formed by molding one or more of the above-described prepregs.
First, the resin composition of the present invention will be described.

本発明の樹脂組成物では、シアネート樹脂を含む。これにより、樹脂組成物等の耐熱性と誘電特性を向上させることができる。   The resin composition of the present invention contains a cyanate resin. Thereby, the heat resistance and dielectric properties of the resin composition and the like can be improved.

本発明の樹脂組成物で用いられるシアネート樹脂としては特に限定されないが、例えば、ノボラック型シアネート樹脂、ビスフェノールA型シアネート樹脂、ビスフェノールE型シアネート樹脂、テトラメチルビスフェノールF型シアネート樹脂等を挙げることができる。
これらの中でも、ビスフェノールA型シアネート樹脂が汎用性や密着性の面から好ましく、ノボラック型シアネート樹脂が耐熱性の面から好ましい。
Although it does not specifically limit as cyanate resin used by the resin composition of this invention, For example, a novolak-type cyanate resin, bisphenol A type cyanate resin, bisphenol E type cyanate resin, tetramethylbisphenol F type cyanate resin etc. can be mentioned. .
Among these, bisphenol A type cyanate resin is preferable from the viewpoint of versatility and adhesion, and novolak type cyanate resin is preferable from the viewpoint of heat resistance.

前記シアネート樹脂の含有量は特に限定されないが、樹脂組成物全体の60重量%以上が好ましい。含有量が前記下限値未満であると、耐熱性と誘電特性が十分でない場合がある。   Although content of the said cyanate resin is not specifically limited, 60 weight% or more of the whole resin composition is preferable. If the content is less than the lower limit, heat resistance and dielectric properties may not be sufficient.

本発明の樹脂組成物では、6配位3価コバルト錯体化合物を含む。これにより、樹脂組成物の保存性を向上できる。   The resin composition of the present invention contains a hexacoordinate trivalent cobalt complex compound. Thereby, the preservability of the resin composition can be improved.

従来知られているシアネート樹脂の触媒として、アミン化合物、フェノール化合物が挙げられる。しかしこれらの化合物は、シアネートの環化反応以外の副反応も引き起こすため、十分な誘電特性を発現できないことがある。
また、マンガンや亜鉛などの金属錯体化合物も触媒として用いられるが、ワニス中で容易に配位子交換反応を引き起こし、ワニス保存性が劣る欠点があった。
Examples of conventionally known cyanate resin catalysts include amine compounds and phenol compounds. However, these compounds also cause side reactions other than the cyclization reaction of cyanate, and thus may not exhibit sufficient dielectric properties.
Moreover, although metal complex compounds, such as manganese and zinc, are also used as a catalyst, there was a defect that the ligand exchange reaction was easily caused in the varnish, and the varnish storage stability was poor.

これに対して、本発明者は、シアネート樹脂の触媒として6配位3価コバルト錯体を使用するとこれら問題が解決されることを見いだした。
その理由としては、6配位3価コバルト錯体の安定性が高く、水や空気で酸化されず、また室温での配位子の交換反応が遅いため樹脂組成物の保存性に優れる。そして、高温では十分に配位子交換反応が起こるため、十分な触媒活性を有することが挙げられる。
In contrast, the present inventors have found that these problems can be solved by using a hexacoordinate trivalent cobalt complex as a catalyst for the cyanate resin.
The reason is that the hexacoordinate trivalent cobalt complex has high stability, is not oxidized with water or air, and has a low ligand exchange reaction at room temperature, so that the preservability of the resin composition is excellent. And since a ligand exchange reaction fully occurs at high temperature, it has sufficient catalytic activity.

前記6配位3価コバルト錯体としては様々なものが挙げられるが、例えば、トリスアセチルアセトナートコバルト(III)、ヘキサアンミンコバルト(III)アセテート、トリスエチレンジアミンコバルト(III)アセテート、ペンタアンミンニトロシルコバルト(III)アセテートなどがある。
これらの中でも、配位子に2座以上の配位子を含むものが好ましく、特にすべての配位子が2座以上の配位子である6配位3価コバルト錯体が好ましい。特にトリスアセチルアセトナートコバルト(III)が溶剤への溶解性から好ましい。
Various examples of the hexacoordinate trivalent cobalt complex include trisacetylacetonate cobalt (III), hexaamminecobalt (III) acetate, trisethylenediaminecobalt (III) acetate, pentaamminenitrosylcobalt ( III) acetate and the like.
Among these, a ligand containing a bidentate or higher ligand is preferable, and a hexacoordinate trivalent cobalt complex in which all ligands are bidentate or higher ligands is particularly preferable. In particular, trisacetylacetonate cobalt (III) is preferable from the viewpoint of solubility in a solvent.

前記6配位3価コバルト錯体の含有量は特に限定されないが、樹脂全体100重量部に対して、0.05〜0.20重量部であることが好ましい。
6配位3価コバルト錯体の含有量が前記下限値未満であると硬化が不十分となり耐熱性
が悪化する場合があり、前記上限値を超えると成形性が低下する場合がある。
Although content of the said hexacoordinate trivalent cobalt complex is not specifically limited, It is preferable that it is 0.05-0.20 weight part with respect to 100 weight part of whole resin.
If the content of the hexacoordinate trivalent cobalt complex is less than the lower limit, curing may be insufficient and heat resistance may deteriorate, and if it exceeds the upper limit, moldability may be reduced.

本発明の樹脂組成物は、上述したシアネート樹脂と、6配位3価コバルト錯体とを必須成分として含有するが、本発明の目的に反しない範囲において、その他の樹脂、カップリング剤、その他の成分を添加することは差し支えない。例えば、エポキシ樹脂を併用すると密着性、低吸水性が向上し好ましい。   The resin composition of the present invention contains the above-described cyanate resin and a hexacoordinate trivalent cobalt complex as essential components. However, other resins, coupling agents, other Ingredients can be added. For example, when an epoxy resin is used in combination, adhesion and low water absorption are improved.

次に、プリプレグについて説明する。
本発明のプリプレグは、上述の樹脂組成物を基材に含浸させてなるものである。これにより、耐熱性等の各種特性に優れたプリプレグを得ることができる。
本発明のプリプレグで用いる基材としては、例えばガラス繊布、ガラス不繊布等のガラス繊維基材、あるいはガラス以外の無機化合物を成分とする繊布又は不繊布等の無機繊維基材、芳香族ポリアミド樹脂、ポリアミド樹脂、芳香族ポリエステル樹脂、ポリエステル樹脂、ポリイミド樹脂、フッ素樹脂等の有機繊維で構成される有機繊維基材等が挙げられる。これら基材の中でも強度、吸水率の点でガラス織布に代表されるガラス繊維基材が好ましい。
Next, the prepreg will be described.
The prepreg of the present invention is obtained by impregnating a base material with the above resin composition. Thereby, the prepreg excellent in various characteristics, such as heat resistance, can be obtained.
Examples of the base material used in the prepreg of the present invention include glass fiber base materials such as glass fiber cloth and glass non-woven cloth, inorganic fiber base materials such as fiber cloth and non-fiber cloth containing inorganic compounds other than glass, and aromatic polyamide resins. And organic fiber base materials composed of organic fibers such as polyamide resin, aromatic polyester resin, polyester resin, polyimide resin, and fluororesin. Among these base materials, glass fiber base materials represented by glass woven fabric are preferable in terms of strength and water absorption.

本発明で得られる樹脂組成物を基材に含浸させる方法には、例えば、樹脂組成物を溶媒に溶解して樹脂ワニスを調製し、基材を樹脂ワニスに浸漬する方法、各種コーター装置により樹脂ワニスを基材に塗布する方法、樹脂ワニスをスプレー装置により基材に吹き付ける方法等が挙げられる。これらの中でも、基材を樹脂ワニスに浸漬する方法が好ましい。これにより、基材に対する樹脂組成物の含浸性を向上させることができる。なお、基材を樹脂ワニスに浸漬する場合、通常の含浸塗布装置を使用することができる。   Examples of the method of impregnating the substrate with the resin composition obtained in the present invention include, for example, a method in which a resin varnish is prepared by dissolving the resin composition in a solvent, and the substrate is immersed in the resin varnish. The method of apply | coating a varnish to a base material, the method of spraying a resin varnish on a base material with a spray apparatus, etc. are mentioned. Among these, the method of immersing the base material in the resin varnish is preferable. Thereby, the impregnation property of the resin composition with respect to a base material can be improved. In addition, when a base material is immersed in a resin varnish, a normal impregnation coating device can be used.

前記樹脂ワニスに用いられる溶媒は、前記樹脂組成物に対して良好な溶解性を示すことが望ましいが、悪影響を及ぼさない範囲で貧溶媒を使用しても構わない。良好な溶解性を示す溶媒としては、例えばメチルエチルケトン、ジメチルホルムアミド等が挙げられる。
前記樹脂ワニス中の固形分は、特に限定されないが、前記樹脂組成物の固形分40〜80重量%が好ましく、特に50〜65重量%が好ましい。これにより、樹脂ワニスの基材への含浸性を更に向上できる。
前記基材に前記樹脂組成物を含浸させ、所定温度、例えば80〜200℃で乾燥させることによりプリプレグを得ることができる。
The solvent used for the resin varnish desirably has good solubility in the resin composition, but a poor solvent may be used as long as it does not adversely affect the resin varnish. Examples of the solvent exhibiting good solubility include methyl ethyl ketone and dimethylformamide.
Although the solid content in the resin varnish is not particularly limited, the solid content of the resin composition is preferably 40 to 80% by weight, and particularly preferably 50 to 65% by weight. Thereby, the impregnation property to the base material of the resin varnish can further be improved.
A prepreg can be obtained by impregnating the base material with the resin composition and drying at a predetermined temperature, for example, 80 to 200 ° C.

次に、積層板について説明する。
本発明の積層板は、上述のプリプレグを少なくとも1枚成形してなるものである。これにより、
優れた誘電特性と耐熱性を有する積層板を得ることができる。
プリプレグ1枚のときは、その上下両面もしくは片面に金属箔あるいはフィルムを重ねる。
また、プリプレグを2枚以上積層することもできる。プリプレグを2枚以上積層するときは、積層したプリプレグの最も外側の上下両面もしくは片面に金属箔あるいはフィルムを重ねる。
次に、プリプレグと金属箔等とを重ねたものを加熱、加圧することで積層板を得ることができる。
前記加熱する温度は、特に限定されないが、120〜220℃が好ましく、特に150〜200℃が好ましい。
また、前記加圧する圧力は、特に限定されないが、2〜5MPaが好ましく、特に2.5〜4MPaが好ましい。
Next, a laminated board is demonstrated.
The laminate of the present invention is formed by molding at least one prepreg described above. This
A laminate having excellent dielectric properties and heat resistance can be obtained.
In the case of a single prepreg, a metal foil or film is stacked on both upper and lower surfaces or one surface.
Two or more prepregs can be laminated. When two or more prepregs are laminated, a metal foil or film is laminated on the outermost upper and lower surfaces or one surface of the laminated prepregs.
Next, a laminate can be obtained by heating and pressurizing a laminate of a prepreg and a metal foil.
Although the temperature to heat is not specifically limited, 120-220 degreeC is preferable and especially 150-200 degreeC is preferable.
Moreover, the pressure to pressurize is not particularly limited, but is preferably 2 to 5 MPa, and particularly preferably 2.5 to 4 MPa.

以下、本発明を実施例及び比較例により説明するが、本発明はこれに限定されるものでは無い。   Hereinafter, although an example and a comparative example explain the present invention, the present invention is not limited to this.

比較例5
(1)樹脂ワニスの調製
ビスフェノールA型シアネート樹脂(チバガイギー社製B-40S)100重量部、トリスアセチルアセトナートコバルト(III)0.16重量部にジメチルホルムアミドを加え、不揮発分濃度55重量%となるように樹脂ワニスを調製した。
( Comparative Example 5 )
(1) Preparation of resin varnish Dimethylformamide was added to 100 parts by weight of bisphenol A type cyanate resin (B-40S manufactured by Ciba Geigy Co.) and 0.16 part by weight of trisacetylacetonate cobalt (III), and the nonvolatile content concentration was 55% by weight. A resin varnish was prepared as follows.

(2)プリプレグの製造
上述の樹脂ワニスを用いて、ガラス繊布(厚さ0.18mm、日東紡績(株)製)100重量部に対して、樹脂ワニスを固形分で80重量部含浸させて、150℃の乾燥炉で5分間乾燥させ、樹脂含有量44.4重量%のプリプレグを得た。
(2) Production of prepreg Using the above resin varnish, 100 parts by weight of glass fiber cloth (thickness 0.18 mm, manufactured by Nitto Boseki Co., Ltd.) was impregnated with 80 parts by weight of the resin varnish as a solid content. It was dried in a drying furnace at 150 ° C. for 5 minutes to obtain a prepreg having a resin content of 44.4 wt%.

(3)積層板の製造
上記プリプレグを6枚重ね、上下に厚さ35μmの電解銅箔を重ねて、圧力4MPa、温度200℃で120分間、220℃で60分間加熱加圧成形を行い、厚さ1.2mmの両面銅張積層板を得た。
(3) Manufacture of laminated plate Six prepregs are stacked, and an electrolytic copper foil having a thickness of 35 μm is stacked on the top and bottom, and pressure and pressure molding is performed at a pressure of 4 MPa, a temperature of 200 ° C. for 120 minutes, and a temperature of 220 ° C. for 60 minutes. A double-sided copper clad laminate having a thickness of 1.2 mm was obtained.

(実施例
参考例1
ビスフェノールA型シアネート樹脂の配合量を80.0重量部、臭素化ビスフェノールA型エポキシ樹脂(大日本インキ化学工業社製153)の配合量を20重量部、トリスアセチルアセトナートコバルト(III)の配合量を0.06重量部とした以外は、実施例1と同様にして樹脂ワニスを調製し、プリプレグ及び積層板を得た。
(Example 2 )
( Reference Example 1 )
80.0 parts by weight of bisphenol A-type cyanate resin, 20 parts by weight of brominated bisphenol A-type epoxy resin (153 manufactured by Dainippon Ink & Chemicals, Inc.), trisacetylacetonate cobalt (III) A resin varnish was prepared in the same manner as in Example 1 except that the amount was 0.06 part by weight, and a prepreg and a laminate were obtained.

参考例2
フェノールノボラック型シアネート樹脂(ロンザ社製PT-60)の配合量を100重量部、トリスアセチルアセトナートコバルト(III)の配合量を0.08重量部とした以外は、実施例1と同様にして樹脂ワニスを調製し、プリプレグ及び積層板を得た。
( Reference Example 2 )
The same procedure as in Example 1 was conducted except that the amount of phenol novolac cyanate resin (PT-60 manufactured by Lonza) was 100 parts by weight and the amount of trisacetylacetonate cobalt (III) was 0.08 parts by weight. A resin varnish was prepared to obtain a prepreg and a laminate.

(実施例4)
ビスフェノールA型シアネート樹脂の配合量を100重量部、ヘキサアンミンコバルト(III)アセテートの配合量を0.08重量部とした以外は、実施例1と同様にして樹脂ワニスを調製し、プリプレグ及び積層板を得た。
Example 4
A resin varnish was prepared in the same manner as in Example 1 except that the amount of bisphenol A-type cyanate resin was 100 parts by weight and the amount of hexaamminecobalt (III) acetate was 0.08 parts by weight. I got a plate.

(比較例1)
トリスアセチルアセトナートコバルト(III)の代わりに、ナフテン酸コバルトを用い、表1の配合量とした以外は実施例1と同様にして樹脂ワニスを調製し、プリプレグ及び積層板を得た。
(Comparative Example 1)
A resin varnish was prepared in the same manner as in Example 1 except that cobalt naphthenate was used instead of trisacetylacetonatocobalt (III) and the blending amounts shown in Table 1 were used, and a prepreg and a laminate were obtained.

(比較例2)
トリスアセチルアセトナートコバルト(III)の代わりに、ナフテン酸亜鉛を用い、表1の配合量とした以外は実施例1と同様にして樹脂ワニスを調製し、プリプレグ及び積層板を得た。
(Comparative Example 2)
A resin varnish was prepared in the same manner as in Example 1 except that zinc naphthenate was used instead of trisacetylacetonatocobalt (III) and the blending amounts shown in Table 1 were used, and a prepreg and a laminate were obtained.

(比較例3)
トリスアセチルアセトナートコバルト(III)の代わりに、2−メチルイミダゾールを用い、表1の配合量とした以外は実施例1と同様にして樹脂ワニスを調製し、プリプレグ及び積層板を得た。
(Comparative Example 3)
A resin varnish was prepared in the same manner as in Example 1 except that 2-methylimidazole was used in place of trisacetylacetonate cobalt (III) and the blending amounts shown in Table 1 were used, and a prepreg and a laminate were obtained.

(比較例4)
トリスアセチルアセトナートコバルト(III)の代わりに、ナフテン酸コバルトを用い、表1の配合量とした以外は実施例3と同様にして樹脂ワニスを調製し、プリプレグ及び積層板を得た。
(Comparative Example 4)
A resin varnish was prepared in the same manner as in Example 3 except that cobalt naphthenate was used instead of trisacetylacetonatocobalt (III) and the blending amounts shown in Table 1 were used, and a prepreg and a laminate were obtained.

各実施例および比較例により得られた積層板について、次の各評価を行った。各評価を、評価方法と共に以下に示す。得られた結果を表1に示す。   The following evaluation was performed about the laminated board obtained by each Example and the comparative example. Each evaluation is shown below together with the evaluation method. The obtained results are shown in Table 1.

(1)ガラス転移温度
ガラス転移温度は粘弾性法によりtanδのピーク温度から求めた。
(1) Glass transition temperature The glass transition temperature was determined from the peak temperature of tan δ by a viscoelastic method.

(2)誘電特性
誘電率、誘電正接の測定はJIS C 6481に準拠して行い、周波数1MHzの静電容量を測定して求めた。
(2) Dielectric properties The dielectric constant and dielectric loss tangent were measured in accordance with JIS C 6481 and measured by measuring the capacitance at a frequency of 1 MHz.

(3)半田耐熱性
半田耐熱性は、JIS C 6481に準拠して測定した。測定は、煮沸2時間の吸湿処理を行った後、260℃の半田槽に120秒間浸漬した後で外観の異常の有無を調べた。
(3) Solder heat resistance The solder heat resistance was measured in accordance with JIS C 6481. The measurement was performed after boiling for 2 hours and then immersed in a solder bath at 260 ° C. for 120 seconds, and then examined for abnormal appearance.

(4)樹脂ワニスのゲルタイム変化率
樹脂ワニスのゲルタイム変化率は、樹脂ワニス調整直後の170℃でのゲルタイム(t)と樹脂ワニスを25℃で24時間放置した後の、170℃でのゲルタイム(t)とから、下記式により算出した。
ゲルタイム変化率(%)=100×[(t−t)/t
(4) Gel time change rate of resin varnish The gel time change rate of resin varnish is the gel time at 170 ° C. immediately after adjustment of the resin varnish (t 1 ) and the gel time at 170 ° C. after leaving the resin varnish at 25 ° C. for 24 hours. From (t 2 ), the following formula was used.
Gel time change rate (%) = 100 × [(t 1 −t 2 ) / t 1 ]

表の注
(1)ビスフェノールA型シアネート樹脂(商品名:チバガイギー社製B−40S)
(2)フェノールノボラック型シアネート樹脂(商品名:ロンザ社製PT−60)
(3)臭素化エポキシ樹脂(商品名:大日本インキ化学工業社製153)
(4)トリスアセチルアセトナートコバルト(III)
(5)ヘキサアンミンコバルト(III)アセテート
Notes to table (1) Bisphenol A type cyanate resin (Brand name: B-40S manufactured by Ciba Geigy)
(2) Phenol novolac type cyanate resin (trade name: PT-60 manufactured by Lonza)
(3) Brominated epoxy resin (trade name: 153 manufactured by Dainippon Ink & Chemicals, Inc.)
(4) Trisacetylacetonate cobalt (III)
(5) Hexaamminecobalt (III) acetate

表から明らかなように、実施例4は、耐熱性、誘電特性に優れ、保存性に優れていた。これに対して比較例1〜4は6配位3価コバルト錯体を用いなかったので、ワニスの保存性が劣る結果となった。 As is apparent from the table, Example 4 was excellent in heat resistance, dielectric properties, and storage stability. On the other hand, since Comparative Examples 1-4 did not use a hexacoordinate trivalent cobalt complex, it resulted in inferior varnish preservability.

本発明の樹脂組成物、プリプレグ、積層板は、小型軽量化に対応でき、高度な耐熱性、誘電特性の要求されるプリント配線板に適する。   The resin composition, prepreg, and laminate of the present invention are suitable for printed wiring boards that can cope with a reduction in size and weight and require high heat resistance and dielectric properties.

Claims (3)

基材に含浸させてシート状のプリプレグを形成するために用いる樹脂組成物であって、ビスフェノールA型シアネート樹脂と、ヘキサアンミンコバルト(III)アセテートを含むことを特徴とする樹脂組成物。 By impregnating a base material a resin composition used to form a prepreg-like sheet, the resin composition comprising a bisphenol A type cyanate resin, to include f hexa ammine cobalt (III) acetate. 請求項1に記載の樹脂組成物を基材に含浸させてなることを特徴とするプリプレグ。 A prepreg comprising a substrate impregnated with the resin composition according to claim 1 . 請求項に記載のプリプレグを1枚以上成形してなることを特徴とする積層板。 A laminate obtained by molding one or more prepregs according to claim 2 .
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5618615A (en) * 1979-07-23 1981-02-21 Mitsubishi Electric Corp Heat-resistant resin composition for carbon fiber composite material
JP2003506514A (en) * 1999-08-02 2003-02-18 ゼネラル・エレクトリック・カンパニイ Cyanate ester-based thermosetting composition
JP2003221457A (en) * 2002-02-01 2003-08-05 Sumitomo Bakelite Co Ltd Resin composition, prepreg and laminate
JP2003238767A (en) * 2002-02-19 2003-08-27 Sumitomo Bakelite Co Ltd Resin composition, resin-clad metal foil, and multilayer printed circuit board
JP2003238681A (en) * 2002-02-19 2003-08-27 Sumitomo Bakelite Co Ltd Resin composition, prepreg, and laminate
JP2004018615A (en) * 2002-06-14 2004-01-22 Sumitomo Bakelite Co Ltd Resin composition, prepreg and laminate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5618615A (en) * 1979-07-23 1981-02-21 Mitsubishi Electric Corp Heat-resistant resin composition for carbon fiber composite material
JP2003506514A (en) * 1999-08-02 2003-02-18 ゼネラル・エレクトリック・カンパニイ Cyanate ester-based thermosetting composition
JP2003221457A (en) * 2002-02-01 2003-08-05 Sumitomo Bakelite Co Ltd Resin composition, prepreg and laminate
JP2003238767A (en) * 2002-02-19 2003-08-27 Sumitomo Bakelite Co Ltd Resin composition, resin-clad metal foil, and multilayer printed circuit board
JP2003238681A (en) * 2002-02-19 2003-08-27 Sumitomo Bakelite Co Ltd Resin composition, prepreg, and laminate
JP2004018615A (en) * 2002-06-14 2004-01-22 Sumitomo Bakelite Co Ltd Resin composition, prepreg and laminate

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