JP4618552B2 - 紫外光学装置および光源装置 - Google Patents

紫外光学装置および光源装置 Download PDF

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Publication number
JP4618552B2
JP4618552B2 JP2005121096A JP2005121096A JP4618552B2 JP 4618552 B2 JP4618552 B2 JP 4618552B2 JP 2005121096 A JP2005121096 A JP 2005121096A JP 2005121096 A JP2005121096 A JP 2005121096A JP 4618552 B2 JP4618552 B2 JP 4618552B2
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Japan
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window member
ultraviolet
light
silicon dioxide
optical
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Japanese (ja)
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JP2006303094A5 (enExample
JP2006303094A (ja
Inventor
康晴 中島
健雄 大森
秀男 広瀬
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Nikon Corp
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Nikon Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005121096A 2005-04-19 2005-04-19 紫外光学装置および光源装置 Expired - Lifetime JP4618552B2 (ja)

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JP2005121096A JP4618552B2 (ja) 2005-04-19 2005-04-19 紫外光学装置および光源装置

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JP2005121096A JP4618552B2 (ja) 2005-04-19 2005-04-19 紫外光学装置および光源装置

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JP2006303094A JP2006303094A (ja) 2006-11-02
JP2006303094A5 JP2006303094A5 (enExample) 2008-04-03
JP4618552B2 true JP4618552B2 (ja) 2011-01-26

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JP2005121096A Expired - Lifetime JP4618552B2 (ja) 2005-04-19 2005-04-19 紫外光学装置および光源装置

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101657038B1 (ko) * 2013-09-13 2016-09-12 우시오덴키 가부시키가이샤 광조사 장치
CN112768341B (zh) * 2021-01-27 2025-07-01 北京华泰诺安探测技术有限公司 一种多窗口紫外灯及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083447B2 (ja) * 1987-05-27 1996-01-17 工業技術院長 光学測定装置
JPH0729804A (ja) * 1993-07-14 1995-01-31 Canon Inc 光源装置及び該光源装置を備える紫外線照射装置
JPH1154852A (ja) * 1997-08-06 1999-02-26 Nikon Corp 紫外線レーザ用光学装置
JP2001281050A (ja) * 2000-03-30 2001-10-10 Canon Inc 光検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP4004895B2 (ja) * 2002-08-29 2007-11-07 株式会社フジクラ 光学装置

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