JP4614508B2 - Coating apparatus and coating method - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a coating apparatus and a coating method for coating a coating solution on a substrate to be coated, and in particular, uniformly and efficiently a coating solution on a single wafer type coating substrate such as a large glass substrate or a plastic substrate. The present invention relates to a coating apparatus and a coating method for coating.
[0002]
[Prior art]
In general, a spin coating method is often used as a method of applying a coating solution on a large glass substrate used in a color filter for LCD (liquid crystal display).
[0003]
There are two types of spin coating methods: the open air type and the closed cup type. In either method, the use efficiency of the coating material is as low as about 10%, and the coating film thickness at the rotation center portion and peripheral portion of the substrate to be coated is low. There is a drawback that it is too thick compared to the middle part. For this reason, for example, when the coating film thickness is required to be in the range of several μm ± 3%, it is difficult to use the coating film formed by the spin coating method as it is. It is necessary to use only the intermediate portion between the peripheral portion and the peripheral portion and the portion having a relatively uniform coating film thickness. That is, the spin coating method has problems in terms of the amount of coating solution used and the effective use of the substrate to be coated.
[0004]
As a method for solving such a drawback of the spin coating method, a knife coating method, a roll coating method, and the like have been proposed. Both the knife coating method and the roll coating method are methods in which a coating clearance is provided on the substrate to be coated, and the coating film thickness is determined by the set value to obtain the smoothness of the coating surface. It is a drawback that it is difficult to obtain a uniform film thickness when the smoothness (roughness degree) of the surface of the coated substrate is lower than the coating accuracy (higher unevenness degree).
[0005]
Therefore, it is possible to eliminate the disadvantages of the respective coating methods as described above, and to form a uniform coating film in a stable state without being affected by the physical properties of the coating solution on the single-wafer type substrate to be coated. As a method, a die coating method, an extrusion coating method, and a bead coating method have been proposed (see Japanese Patent Application No. 05-146757).
[0006]
As a coating apparatus based on these coating methods, for example, by taking a certain coating clearance, discharging a coating liquid from a coating nozzle onto a substrate to be coated, and simultaneously sliding the substrate to be coated at a constant speed, One that forms a coating film on a substrate to be coated is known. At this time, the application liquid is continuously supplied to the application nozzle from the application liquid supply mechanism, and the discharge amount of the application liquid discharged from the application nozzle is kept constant. In addition, when a coating film is formed on a to-be-coated substrate, a fixed amount of beads are formed between the coating nozzle and the to-be-coated substrate, and a certain amount thereof is applied to the to-be-coated substrate.
[0007]
[Problems to be solved by the invention]
However, in the above-described conventional coating apparatus, the coating liquid is first applied onto the substrate to be coated in order to ensure that the coating liquid (bead) discharged from the coating nozzle contacts the substrate to be coated. In the state at the start of formation (see FIG. 7 (a)), a larger amount of coating liquid is required than in the steady state (see FIG. 7 (b)) in which the coating liquid is continuously applied onto the substrate to be coated. . In FIGS. 7A and 7B, reference numeral 5 denotes an application nozzle, reference numeral 5a denotes a slit through which the application liquid is discharged, reference numeral 8 denotes a substrate to be applied, and reference numeral 20 denotes an application liquid.
[0008]
For this reason, in the conventional coating apparatus, even if the sliding speed of the substrate to be coated is constant and the amount of the coating liquid discharged from the coating nozzle is constant, the coating film thickness formed on the substrate to be coated is uniform. It will not be. That is, there is a problem that the portion of the coating film formed in the transition period from the state at the start of coating film formation to the steady state becomes a defective portion whose film thickness deviates from the normal value.
[0009]
The present invention has been made in consideration of such points, and reduces defective film thickness portions formed at the start of coating film formation on a substrate to be coated, thereby reducing the number of single wafers such as large glass substrates and plastic substrates. It is an object of the present invention to provide a coating apparatus and a coating method capable of uniformly and efficiently coating a coating liquid on a type substrate to be coated.
[0010]
[Means for Solving the Problems]
As a first solution, the present invention provides a coating apparatus for coating a coating liquid on a substrate to be coated, the coating nozzle for discharging the coating liquid, and the coating with the coating nozzle facing the substrate to be coated. A coating moving mechanism for relatively moving the nozzle and the substrate to be coated, and the coating nozzle arranged in parallel with the substrate to be coated, and prior to coating the coating liquid on the substrate to be coated And a coating solution absorbing section that absorbs the coating solution discharged from the coating device.
[0011]
In the first solving means described above, it is preferable to further include an adjustment mechanism that adjusts the relative position of the coating liquid absorber with respect to the substrate to be coated. Moreover, it is preferable that the said coating liquid absorption part is attached so that attachment or detachment is possible with respect to the stage in which the said to-be-coated substrate is mounted. Furthermore, it is preferable that the coating liquid absorbing unit includes an absorber that absorbs the coating liquid discharged from the coating nozzle and a cleaning mechanism that cleans the absorber. Furthermore, it is preferable that the coating liquid absorbing unit further includes a cleaning moving mechanism that moves the absorber between a coating liquid application position and a cleaning position. The absorber has a plurality of absorption surfaces that absorb the coating liquid, and the cleaning moving mechanism moves the absorber so that each of the absorption surfaces is positioned at a coating liquid application position or a cleaning position. Is preferred. The cleaning mechanism preferably includes means for supplying a cleaning liquid to the absorber and means for collecting the coating liquid removed together with the cleaning liquid from the absorber.
[0012]
As a second solution, the present invention provides a coating method in which a coating liquid is applied onto a substrate to be coated by relatively moving the coating nozzle and the substrate to be coated. A step of adjusting the amount of the coating liquid by absorbing it at a coating liquid absorbing portion arranged in parallel with the substrate to be coated, and a coating nozzle on the substrate to be coated by a coating nozzle in which the amount of the coating liquid is adjusted. And an applying step. An application method is provided.
[0013]
According to the first and second solving means of the present invention, prior to applying the coating liquid on the substrate to be coated by the coating liquid absorber disposed in parallel with the substrate to be coated, Since the discharged coating liquid is absorbed, the excess coating liquid discharged for the contact of the bead with the substrate to be coated can be removed at the start of coating film formation, and the amount can be adjusted to the same amount as in the steady state. For this reason, it is possible to eliminate the change (transition period) of the amount of the coating liquid from the state at the start of coating film formation to the steady state, and a uniform thickness having a desired thickness immediately after the start of coating film formation on the substrate to be coated. A uniform coating film with a desired film thickness can be formed on a large area substrate such as a glass substrate used in a color filter for LCD. can do.
[0014]
In addition, according to the first solution of the present invention, by adjusting the relative position of the coating liquid absorbing portion with respect to the substrate to be coated by the adjusting mechanism, coating film formation is started according to the discharge amount and physical properties of the coating liquid. The amount of the coating liquid at the time can be easily adjusted to be the same amount as that in the steady state. Furthermore, by attaching the coating liquid absorption part to the stage on which the substrate to be coated is detachably attached, the coating liquid absorption part can be replaced with a coating liquid absorption part having an appropriate absorption power according to the physical properties of the coating liquid. It can be easily performed, can flexibly cope with coating liquids having various physical properties, and can easily perform maintenance and cleaning of the coating liquid absorbing section. Still further, the maintenance and cleaning of the coating liquid absorbing section can be easily performed by cleaning the absorbent body in which the coating liquid is absorbed in the coating liquid absorbing section with the cleaning mechanism. In addition, the thing which has a several absorption surface which absorbs a coating liquid is used as an absorber, and a coating liquid is moved by moving an absorber so that each absorption surface may be located in a coating position or a cleaning position by a cleaning moving mechanism. It is possible to easily and quickly clean and reuse the absorption surface where the water is absorbed.
[0015]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings. 1 and 2 are views for explaining an embodiment of a coating apparatus according to the present invention.
[0016]
As shown in FIG. 1, the coating apparatus according to the present embodiment applies a coating liquid onto a substrate 8 to be coated, and includes a coating nozzle 5 that discharges the coating liquid.
[0017]
The coating nozzle 5 has a belt-like slit 5a extending in a direction (direction perpendicular to the paper surface in FIG. 1) perpendicular to the slide (moving) direction (left-right direction in FIG. 1) of the stage 3 on which the substrate 8 to be coated is placed. The coating liquid supplied from a coating liquid supply mechanism (not shown) can be discharged downward through the slit 5a.
[0018]
The application nozzle 5 is supported by a die holder 4 that can adjust the horizontal state of the application nozzle 5 with respect to the substrate 8 to be applied. The die holder 4 is attached to the support column 16 via an elevating mechanism 15 so that the height of the coating nozzle 5 relative to the substrate to be coated 8 can be arbitrarily adjusted. The support column 16 is fixed on the base 1.
[0019]
On the other hand, the substrate 8 to be coated is placed on the stage 3 through the substrate holder 6 and is held by vacuum suction on the upper surface of the substrate holder 6. On the stage 3, a coating liquid absorber 7 is disposed in parallel with the substrate holder 6 (substrate 8 to be coated), and prior to coating the coating liquid on the substrate 8 to be coated, the coating nozzle 5. The coating liquid discharged from the liquid can be absorbed. The coating liquid absorption unit 7 is disposed on the stage 3 via an adjustment table (adjustment mechanism) 9, and the relative position of the coating liquid absorption unit 7 with respect to the substrate to be coated 8 (distance from the substrate to be coated 8). , Height and parallelism) can be adjusted.
[0020]
Here, the stage 3 is slidably (moved) on the base 1 via an air slide linear motor (application moving mechanism) 2, and the slit 5 a of the application nozzle 5 is provided on the substrate 8 to be applied. The coating nozzle 5 and the substrate to be coated 8 can be moved relative to each other while facing each other. In addition, the air slide linear motor 2 controls the movement of the stage 3 so that the coating nozzle 5 is opposed to the coating liquid absorber 7 before coating the coating liquid on the substrate 8 to be coated. The coating liquid discharged from the nozzle 5 can be absorbed.
[0021]
Next, the details of the coating liquid absorbing section 7 shown in FIG. 1 will be described with reference to FIG.
[0022]
As shown in FIG. 2, the coating liquid absorbing unit 7 includes an absorber 10 that absorbs the coating liquid discharged from the coating nozzle 5 and a cleaning mechanism 17 that cleans the absorber 10. The absorber 10 has a quadrangular prism shape having a plurality of absorption surfaces that absorb the coating liquid. The absorber 10 is disposed in the cleaning tank 11 of the cleaning mechanism 17 via the rotating shaft 10a, and the absorber 10 is rotated and moved in the direction of the arrow in FIG. 2 by a driving unit (cleaning moving mechanism) (not shown). Can be done. Thereby, each absorption surface of the absorber 10 is located in the application position (position facing the application nozzle 5) or the cleaning position (position facing the cleaning liquid supply nozzle 12) of the application liquid. The cleaning mechanism 17 includes a cleaning liquid supply nozzle 12 that supplies a cleaning liquid to the absorber 10 so as to clean each absorption surface of the absorber 10, and a cleaning tank that collects the coating liquid removed together with the cleaning liquid from the absorber 10. 11. The cleaning liquid supply nozzle 12 is attached to the cleaning tank 11. Further, the cleaning tank 11 is provided with a cleaning liquid drain 13 for removing the cleaning liquid and the coating liquid, and an exhaust port 14 for drying each absorption surface after cleaning the absorber 10 by circulation of air or the like. Yes.
[0023]
The absorber 10 has an appropriate absorption depending on parameters such as a coating speed, a coating liquid supply rate, and a coating clearance by a coating process according to a target film thickness of a coating film formed on the substrate 8 to be coated. One with a rate can be selected. Examples of the absorber 10 having such an appropriate absorption rate include a polymer porous body and a polymer filter made of polyethylene, polyvinyl alcohol, cellulose, polypropylene, and the like, and combinations thereof, Al ₂ O ₃ and the like. It is possible to select an inorganic porous body mainly composed of SiO ₂ , MgO, CaO, ZrO ₂ or the like, or a metal mesh structure such as aluminum, copper, stainless steel, iron, various corrosion resistant alloys, or the like having an appropriate porosity. it can. Note that a laminate or a combination of the above may be used.
[0024]
Further, as the substrate 8 to be coated, any substrate such as a glass substrate used in a color filter for LCD can be used. Moreover, as a coating liquid discharged from the coating nozzle 5, arbitrary things, such as a coloring liquid for color filters, can be used. Specifically, for example, a solvent-based photosensitive resin, a water-based photosensitive resin, or a colored photosensitive resin in which a coloring material such as a pigment is dispersed in these photosensitive resins, various adhesives, a protective film, etc. Resins and various inks can be used.
[0025]
Next, the operation of the present embodiment having such a configuration will be described with reference to FIGS.
[0026]
First, as shown in FIG. 1, the substrate to be coated 8 is held by vacuum suction on a substrate holder 6 disposed on the stage 3, and above the coating liquid absorbing portion 7 disposed on the stage 3. The position of the stage 3 in the left-right direction is adjusted so that the slit 5a of the coating nozzle 5 comes to the position. At this time, the parallelism and height of the coating nozzle 5 with respect to the substrate 8 to be coated are adjusted by the die holder 4 and the lifting mechanism 15, respectively. Further, the relative position (distance, height and parallelism with the substrate to be coated 8) of the coating liquid absorber 7 (absorbed surface of the absorber 10) with respect to the substrate to be coated 8 is adjusted by the adjusting table 9.
[0027]
In this state, the coating liquid is continuously supplied from the coating liquid supply mechanism (not shown) to the coating nozzle 5, and the coating liquid is discharged downward from the slit 5 a of the coating nozzle 5.
[0028]
At the same time, after the stage 3 is slid rightward from the position shown in FIG. 1 by the air slide linear motor 2, the coating liquid discharged from the coating nozzle 5 is absorbed by the coating liquid absorber 7 and the amount of the coating liquid is adjusted. Then, a coating solution is applied onto the substrate 8 to be coated.
[0029]
Then, after applying the coating liquid over the entire surface of the substrate 8 to be coated, the stage 3 is slid leftward in FIG. 1 by the air slide linear motor 2 and returned to the position in FIG.
[0030]
In addition, after apply | coating a coating liquid with respect to the predetermined number of to-be-coated substrates 8 as mentioned above, the absorption surface in which the coating liquid was absorbed among the absorbers 10 is wash | cleaned. Specifically, as shown in FIG. 2, the absorber 10 is rotated and moved by a drive unit (cleaning moving mechanism) (not shown), and the absorbing surface disposed at a position facing the coating nozzle 5 is moved to the cleaning liquid supply nozzle 12. The absorbing surface is cleaned with the cleaning liquid supplied from the cleaning liquid supply nozzle 12. The coating liquid removed from the absorber 10 together with the cleaning liquid is removed by the cleaning liquid drain 13 through the cleaning tank 11. Further, the absorption surface after cleaning of the absorber 10 is dried by circulating air or the like through the exhaust port 14.
[0031]
As described above, according to the present embodiment, prior to applying the coating liquid onto the substrate 8 to be coated by the coating liquid absorber 7 arranged in parallel with the substrate 8 to be coated, the coating nozzle 5 Since the discharged coating liquid is absorbed, excess coating liquid discharged for contact of the beads with the substrate to be coated 8 can be removed at the start of coating film formation, and the amount can be adjusted to the same level as in the steady state. . For this reason, the change (transient period) of the amount of the coating liquid from the state at the start of coating film formation to the steady state can be eliminated, and a desired film thickness is obtained immediately after the start of coating film formation on the substrate 8 to be coated. A uniform coating film can be formed on the substrate 8 to be coated, and a uniform coating film having a desired film thickness even on a large area substrate such as a glass substrate used in a color filter for LCD. Can be formed.
[0032]
Further, according to the present embodiment, the coating liquid absorber 7 is mounted on the stage 3 via the adjustment base 9, and the relative position of the coating liquid absorber 7 with respect to the substrate 8 to be coated (distance from the substrate 8 to be coated). Height and parallelism) can be adjusted, so that the amount of coating solution at the start of coating film formation can be easily adjusted to the same level as in the steady state, depending on the discharge rate and physical properties of the coating solution. can do.
[0033]
Furthermore, according to the present embodiment, since the absorber 10 of the coating liquid absorbing portion 7 is detachably attached to the stage 3 (cleaning tank 11), appropriate absorption is performed according to the physical properties of the coating liquid. It is possible to easily replace the absorbent body with a strong force, to flexibly deal with coating liquids having various physical properties, and to easily perform maintenance and cleaning of the coating liquid absorbing section 7.
[0034]
Furthermore, according to the present embodiment, the absorber 10 in which the coating liquid is absorbed in the coating liquid absorbing section 7 is cleaned with the cleaning liquid by the cleaning mechanism 17, so that the maintenance and cleaning of the coating liquid absorbing section 7 are performed. It can be done easily. The absorber 10 has a plurality of absorbing surfaces that absorb the coating liquid, and each absorbing surface faces the coating nozzle 5 or the cleaning liquid supply nozzle 12 by a driving unit (cleaning moving mechanism) (not shown). Since the absorber 10 is rotationally moved so as to be positioned at the position where the coating liquid is to be absorbed, the absorption surface on which the coating liquid has been absorbed can be easily and quickly cleaned and reused.
[0035]
In the above-described embodiment, the absorbent body 10 having a plurality of absorption surfaces is used as the coating liquid absorbing portion 7, and the positions where each of the absorption surfaces faces the coating nozzle 5 and the position facing the cleaning liquid supply nozzle 12. However, the present invention is not limited to this, and as shown in FIG. 3, the absorbent body 10 having only one absorbent surface is used, and this absorbent surface is applied to the coating liquid. The position is such that the absorbent body 10 is moved between the coating position and the cleaning position, or as shown in FIG. And the absorbent body 10 may be appropriately reversed so that the position can be switched between the position facing the cleaning liquid supply nozzle 12. 3 and 4, members having the same functions as those of the coating liquid absorber 7 shown in FIG. 2 are denoted by the same reference numerals.
[0036]
In the above-described embodiment, the coating nozzle 5 is fixed in a state where the slit 5a is opened downward, and the stage 3 is slid with respect to the fixed coating nozzle 5 to apply the substrate 8 to be coated. However, the present invention is not limited to this. (1) The application nozzle 5 is fixed in a state where the slit 5a is opened upward, and the stage 3 is attached to the fixed application nozzle 5. (2) The coating nozzle 5 with the slits 5a opened downward is slid with respect to the fixed stage 3 to slide the coating substrate 8. (3) The application nozzle 5 with the slit 5a opened upward is slid with respect to the fixed stage 3, and the application to the application substrate 8 is performed. May be.
[0037]
Furthermore, in embodiment mentioned above, although the absorber 10 of the coating liquid absorption part 7 is attached to the washing tank 11 so that attachment or detachment is possible, not only this but the coating liquid absorption part 7 whole with respect to the stage 3 is attached. It may be attached detachably.
[0038]
【Example】
Next, specific examples of the coating apparatus shown in FIGS. 1 and 2 will be described.
[0039]
In this example, a glass substrate used in a color filter for LCD was used as the substrate 8 to be coated. The dimensions of the glass substrate are 670 mm in the width direction (application direction) and 550 mm in the horizontal direction. Moreover, as a coating liquid discharged from the coating nozzle 5, Fujifilm Olin Co., Ltd. color mosaic CR-7001 was used as a coloring liquid for color filters.
[0040]
On the other hand, the moving speed (application speed) of the air slide linear motor 2 was 50 mm / sec, and the application liquid supply rate from the application nozzle 5 was 0.2 ml / sec. Further, the coating clearance between the coating nozzle 5 and the substrate to be coated 8 was 75 μm.
[0041]
Further, the substrate to be coated 8 and the coating liquid absorber 7 (absorber 10) were installed in the following relationship. That is, the separation distance between the end of the substrate to be coated 8 and the end of the absorption surface for absorption of the absorber 10 is 2 mm, and the application surface of the substrate 8 to be coated is more than the absorption surface for absorption of the absorber 10. It was installed 25 μm high. The application surface of the substrate 8 to be coated and the absorption surface for absorption of the absorber 10 were installed so as to be parallel to each other.
[0042]
The absorber 10 is a laminated metal mesh filter “Fujiplate” (filtering accuracy 0.5 μm) manufactured by Fuji Filter Industry Co., Ltd., and absorbs the coating liquid before applying the coating liquid on the substrate 8 to be coated. With the body 10 moved at the same speed as the coating speed, the coating nozzle 5 was brought into contact over the absorber 10 over a distance of 20 mm.
[0043]
As a result of applying the coating liquid on the substrate 8 to be coated under the above conditions, the film thickness of the coating film formed on the substrate 8 to be coated is as shown in FIG. The film was substantially uniform (film thickness: 1.5 μm). That is, even with a large-area substrate used in a color filter for LCD, a uniform coating film could be formed immediately after the coating film formation on the coated substrate 8 was started. FIG. 6 shows the result of a comparative example in which the coating liquid was applied under the same conditions as the above-described example without using the preliminary application unit 7.
[0044]
【The invention's effect】
As described above, according to the present invention, the defective film thickness portion formed at the start of coating film formation on the substrate to be coated is reduced, and on a single wafer type substrate to be coated such as a large glass substrate or a plastic substrate. The coating solution can be applied uniformly and efficiently.
[Brief description of the drawings]
FIG. 1 is an overall configuration diagram showing an embodiment of a coating apparatus according to the present invention.
FIG. 2 is an enlarged view showing details of a II portion of the coating apparatus shown in FIG.
FIG. 3 is a view showing a modification of the coating liquid absorbing section shown in FIG. 2;
FIG. 4 is a view showing another modification of the coating liquid absorbing section shown in FIG.
5 is a view showing a film thickness distribution of a substrate to be coated when a coating liquid is applied by the coating apparatus shown in FIG.
6 is a diagram showing a result of a comparative example corresponding to the embodiment shown in FIG.
FIG. 7 is a view for explaining a state of a coating liquid (bead) between a coating nozzle and a substrate to be coated.
[Explanation of symbols]
1 Base 2 Air slide linear motor (moving mechanism for application)
3 Stage 4 Die holder 5 Coating nozzle 5a Slit 6 Substrate holder 7 Coating liquid absorption part 8 Substrate 9 Adjustment stand (adjustment mechanism)
DESCRIPTION OF SYMBOLS 10 Absorber 10a Rotating shaft 11 Cleaning tank 12 Cleaning liquid supply nozzle 13 Cleaning liquid drain 14 Exhaust port 15 Lifting mechanism 16 Strut 17 Cleaning mechanism

Claims (10)

In a coating apparatus for coating a coating solution on a substrate to be coated,
An application nozzle for discharging the application liquid;
A movement mechanism for coating that relatively moves the coating nozzle and the substrate to be coated with the coating nozzle facing the substrate to be coated;
Wherein are arranged in parallel to the substrate to be coated, said prior to applying the coating solution to be coated on the substrate, is applied to said coated substrate by absorbing a coating liquid discharged from the coating nozzle A coating apparatus comprising: a coating liquid absorber that adjusts the amount of coating liquid to be applied .   The coating apparatus according to claim 1, further comprising an adjustment mechanism that adjusts a relative position of the coating liquid absorption unit with respect to the substrate to be coated.   The coating apparatus according to claim 1, wherein the coating liquid absorbing section is detachably attached to a stage on which the substrate to be coated is placed. The coating liquid absorbing section absorbs the coating liquid discharged from the coating nozzle, and
The coating apparatus according to claim 1, further comprising a cleaning mechanism for cleaning the absorber.   The coating apparatus according to claim 4, wherein the coating liquid absorption unit further includes a cleaning moving mechanism that moves the absorber between a coating liquid coating position and a cleaning position. The absorber has a plurality of absorbing surfaces that absorb the coating liquid,
6. The coating apparatus according to claim 5, wherein the cleaning moving mechanism moves the absorber so that each of the absorption surfaces is positioned at a coating liquid coating position or a cleaning position.   The said washing | cleaning mechanism has a means to supply the washing | cleaning liquid with respect to the said absorber, and a means to collect | recover the coating liquid removed with the washing | cleaning liquid from the said absorber, The any one of Claim 4 thru | or 6 characterized by the above-mentioned. Coating device.   8. The coating apparatus according to claim 1, wherein a substrate for a color filter is used as the substrate to be coated, and a coloring liquid for a color filter is used as the coating liquid. In the coating method of coating the coating liquid on the substrate to be coated by relatively moving the coating nozzle and the substrate to be coated,
A step of absorbing the coating liquid discharged from the coating nozzle by a coating liquid absorbing portion disposed in parallel with the substrate to be coated and adjusting the amount of the coating liquid;
Applying the coating liquid onto the substrate to be coated with a coating nozzle in which the amount of the coating liquid is adjusted.   The coating method according to claim 9, wherein a substrate for a color filter is used as the substrate to be coated, and a coloring liquid for a color filter is used as the coating liquid.

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