1338594 九、發明說明： 【發明所屬之技術領域】 ’ 本發明係關於利用毛細管現象將塗布液塗布於基板之 被塗布面上的塗布方法及塗布裝置，以及將此種塗布方法 應用於光罩坯料板之製造上的光罩坯料板之製造方法。 【先前技術】 以往，在使用光微影法之圖案形成中，需要有將光阻 等之塗布液塗布於基板上以形成光阻膜的製程。作爲塗布 此塗布液之塗布裝置（塗布器），已知一種所謂旋轉塗布 器。此旋轉塗布器係在將塗布液滴落於水平保持之基板（的 被塗布面）中央之後，使此基板在水平面內高速旋轉，藉由 離心力之作用，使塗布液散布於整個基板表面，而於基板 表面上形成塗布膜。 但是，在此種旋轉塗布器中，會有在基板之周緣部產 生被稱爲紋邊的光阻起紋的問題。若產生此種邊紋時，使 得光阻膜之膜厚在基板表面內變得不勻稱，在形成圖案 時，會產生CD之面內變動。尤其是此種邊紋之起紋，在 基板形狀不是旋轉對象的情況（長方形等）時，更加助長膜 厚之不句稱。又，在液晶顯示裝置、液晶顯示裝置製造用 之光罩中，基板隨著大型化及大重量化，亦會產生不易獲 得一定速度之旋轉驅動手段的問題。另外，會產生需要超 大之旋轉空間（室腔）、及塗布液之損失等的問題。 另一方面，作爲較爲適合於大型基板之塗布裝置，以 往提出有被通稱爲「CAP塗布器」之塗布裝置（例如參照日 1338594 本國特開2004 ·67 62號公報（專利.文獻1)。此種CAP塗 係使內部具有毛管狀間隙之噴嘴接近於基板的被塗布 使自盛滿塗布液之液槽通過噴嘴，而到達噴嘴前端開 的塗布液液接於基板之被塗布面，並在此狀態之下， 基板與該噴嘴相對地於被塗部面平行移動，藉以將塗 塗布於該基板之被塗布面，以形成塗布膜。此種塗布崇 可極爲有效地應用於液晶裝置製造用等存在有多種尺 大型光罩用光罩坯料板之製造上面。這是因爲使用毛 現象，不僅具有可極爲均勻地進行大面積之塗布的優 即使在尺寸混合之情況，亦不需要依每一尺寸來交 嘴，而可連續地進行塗布的緣故。 但是，此種CAP塗布器，當作用於通過噴嘴之塗 的毛細管現象，進而對毛細管現象產生影響之因子具 動時，則無法保持塗布性能之均勻性。例如，在基板 形成光阻等之塗布膜的情況，利用毛細管現象之該噴 吐液量，係因蓄積於液槽內之塗布液的液面高度而異 此，若於每一次之塗布，不將液槽中之塗布液的液面 形成一定，則會在基板間產生塗布膜厚之變動。在此 專利文獻1中’記載有由液面感測器來監視一次一次 次塗布的液面水位，並使塗布開始時之液槽的液面冰 爲一定的技術。另外’在日本國特開平8.224 5 2 8號公 利文獻2)中，記載有爲了將容器（液槽）內之流體（塗 之水位保持爲不變，而將溢流管配置於容器內之技術 布器 面， 口部 使該 布液 定置， 寸的 細管 點， 換噴 布液 有變 表面 嘴的 。因 高度 ，在 :之每 .位成 報（專 布液） 1338594 【發明內容】 在上述專利文獻1所揭示之技術中，如上述，由液面 感測器來監視一次一次之每次塗布的液面水位，並使塗布 開始時之液槽的液面水位成爲一定。這是因爲藉由使每次 之塗布開始時的液面水位成爲一定，可再現性良好地使因 毛細管現象而於噴嘴上昇之塗布液的阻力成爲一定，而在 使塗布液之膜厚成爲一定方面具有優點。然而，即使使用1338594 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a coating method and a coating apparatus for applying a coating liquid onto a coated surface of a substrate by capillary action, and applying the coating method to a mask blank A method of manufacturing a mask blank sheet for the manufacture of a board. [Prior Art] Conventionally, in the pattern formation using the photolithography method, a process of applying a coating liquid such as a photoresist onto a substrate to form a photoresist film is required. As a coating device (applicator) for applying this coating liquid, a so-called spin coater is known. The spin coater is configured to spread the coating liquid at a high speed in a horizontal plane after dropping the coating liquid on the center of the substrate (coated surface) of the horizontally held substrate, and the coating liquid is dispersed on the entire substrate surface by the action of centrifugal force. A coating film is formed on the surface of the substrate. However, in such a spin coater, there is a problem that a photoresist pattern called a ridge is formed on the peripheral portion of the substrate. When such a pattern is generated, the film thickness of the photoresist film becomes uneven in the surface of the substrate, and when the pattern is formed, the in-plane variation of the CD occurs. In particular, when the shape of the substrate is not a rotating object (such as a rectangular shape), the thickness of the film is further promoted. Further, in the liquid crystal display device or the photomask for manufacturing a liquid crystal display device, the substrate has a problem that it is difficult to obtain a rotational driving means having a constant speed in accordance with the increase in size and weight. In addition, there is a problem that an excessively large rotating space (cavity) and loss of the coating liquid are required. On the other hand, as a coating apparatus which is suitable for a large-sized substrate, a coating apparatus which is generally referred to as a "CAP applicator" has been proposed (see, for example, Japanese Patent Application Laid-Open No. Hei. No. 2004-6762 (Patent Document 1). The CAP coating system is such that a nozzle having a capillary tube gap is applied close to the substrate so that the liquid tank from the coating liquid passes through the nozzle, and the coating liquid that reaches the tip end of the nozzle is connected to the coated surface of the substrate, and In this state, the substrate is moved in parallel with the surface of the coated portion so as to be coated on the coated surface of the substrate to form a coating film. This coating is extremely effective for the production of liquid crystal devices. There are a variety of large-scale photomask blank sheets for the production of masks. This is because the use of the hair phenomenon not only has the ability to coat a large area extremely uniformly, even in the case of size mixing, it does not need to be The size is to be dispensed, and the coating can be carried out continuously. However, such a CAP applicator is used as a capillary phenomenon for coating through a nozzle, and thus for a capillary When the factor of the influence is applied, the uniformity of the coating performance cannot be maintained. For example, when a coating film such as a photoresist is formed on the substrate, the amount of the ejection liquid by the capillary phenomenon is due to the coating accumulated in the liquid tank. When the liquid level of the liquid in the liquid bath is not constant, the coating film thickness varies between the substrates, and the coating film thickness varies between the substrates. There is a technique for monitoring the level of the liquid level applied once and for all by the liquid level sensor, and making the liquid level of the liquid tank at the beginning of the coating a certain technique. In addition, the Japanese Patent Laid-Open No. 8.224 5 2 8 In the case of the fluid in the container (liquid tank) (the water level of the coating is kept constant, the overflow pipe is placed in the technical cloth surface of the container, and the liquid is fixed at the mouth, and the thin tube is inch. In the technique disclosed in the above Patent Document 1, as described above, the liquid level is as described above. Sensor to monitor The level of the liquid level applied once every time, and the level of the liquid level of the liquid tank at the start of the coating is constant. This is because the liquid level of the liquid level at the start of each application is constant, and the reproducibility is good. The resistance of the coating liquid which rises in the nozzle due to the capillary phenomenon is constant, and there is an advantage in that the film thickness of the coating liquid is made constant. However, even if it is used
如專利文獻1所揭示之液面感測器，仍不容易再現性良好 W 地且精緻地使每一次塗布所補給之塗布液的液面成爲一 定。參照第7圖說明其理由。可列舉如下諸點：第1、在 液面感測器204之檢測上產生延遲（delay)。第2、雖在連接 於收容有塗布液21之液槽200的連通管201部分裝設液面 感測器204，以檢測液面，但此連通管201部分的孔徑較 小。因此，液面之面積小，因塗布液之表面張力的影響而 容易於液面檢測中產生誤差等。 # 另外，當重複塗布時，因基板之搬入等，而無法完全 避免微小之異物9混入液槽200中。在此種異物9之中， 有比重比塗布液2 1更小，而浮遊於塗布液表面附近者（浮 遊異物）。在專利文獻1所揭示之塗布裝置中亦相同，但通 常塗布液之供給，係自裝設於液槽200之底壁的供液管線 202所進行，而塗布液之排出，同樣係自裝設於液槽200 之底壁的排液管線203所進行（參照第7圖）。液槽200中之 塗布液2 1，係於每次塗布時部分地排出且不斷地被供給。 1338594 此時，可循環利用塗布液，而在循環之過程中，可藉由過 濾器除去異物。然而，因該異物9係浮遊於蓄積至液槽200 之上方位置的塗布液表面，所以，幾乎不會有機會自液槽 200之底壁的排液管線203被排出。其結果，上述異物9 滯留於液槽中，更逐漸會被蓄積於液槽中。此種異物附著 於噴嘴上而妨礙到噴嘴內之塗布液的上昇，更且，若於塗 布時附著於基板上的話，則此部位會成爲塗布缺陷。因此， 會無法將此基板作爲光罩坯料板、甚至光罩來使用。另外， 若在光阻膜中混入有異物之狀態下進行圖案加工，則會有 例如在顯像階段，因異物脫落而最終使得此部位成爲白色 缺陷（針孔缺陷）的情況。 另一方面，在上述專利文獻2所揭示之技術中，記載 將溢流管沉沒於液槽中，當流體之水位到達溢流管之上端 時，流體會立即流出。然而，在此種裝置中，因基板等而 帶入流體（塗布液）中之浮遊異物，僅能流出溢流管之周圍 的異物部分，而噴嘴附近之異物部分則繼續被滯留，而有 無法有效減低異物所造成之塗布缺陷的問題。 在此，本發明之第1目的在於，鑒於上述習知技術之 問題點’提供一種塗布方法及塗布裝置，其可再現性良好 且正確地管理每次塗布開始時的液面水位，以提高基板間 之塗布膜厚的均勻性，同時，可有效地除去帶入液槽中之 浮遊異物’而可大幅地減低異物造成之塗布缺陷。 本發明之第2目的在於，提供一種光罩坯料板的製造 1338594 方法，其係應用本發明之塗布方法，於基板上塗布光阻而 形成光阻膜，藉此，基板間之塗布膜厚的均勻性良好，且 可減低塗布缺陷。 爲了解決上述目的，本發明具有以下之構成。 (構成1) 一種塗布方法，係使自盛滿塗布液之液槽通過噴嘴， 而到達噴嘴前端開口部之塗布液液接於基板的被塗布面， 並使該基板與該噴嘴之至少一方相對於該被塗布面平行地 移動，藉以將塗布液塗布於該被塗布面而於該被塗布面上 形成塗布膜，其特徵爲：在一次塗布結束後，對該液槽進 行塗布液之補給，而暫時使液面上昇，直到超出塗布開始 時所需之第1液面水位的第2液面水位爲止，接著，先於 下一次塗布之前，藉由使該液槽中之蓄積至該第2液面水 位的塗布液溢流，而使該塗布液的液面下降到該第1液面 水位。 根據構成1之發明，藉由溢流，可再現性良好且正確 地管理每次塗布開始時的液面水位，所以，可提高基板間 之塗布膜厚的均勻性。另外，在一次塗布結束後，對液槽 進行塗布液之補給，而暫時使液面上昇，直到超出塗布開 始時所需之第1液面水位的第2液面水位爲止，接著，先 於下一次塗布之前’藉由使液槽中之蓄積至第2液面水位 的塗布液溢流’所以，藉由溢流’可有效地除去帶入液槽 中之浮遊異物’而可大幅地減低異物造成之塗布缺陷。 -10- 1338-594 (構成2) . 如構成1所記載之塗布方法，其特徵爲：該液槽具有 限制該第1液面水位之規定高度的溢流板，藉由將蓄積達 到該第2液面水位的塗布液自該溢流板的上端溢流，而使 該塗布液的液面到達該第1液面水位。 根據構成2之發明’藉由該液槽具有限制該第1液面 水位之規定高度的溢流板，將蓄積達到該第2液面水位的 塗布液自該溢流板的上端溢流，所以，藉由溢流板之高度， 可再現性良好且正確地管理每次塗布開始時的液面水位。 (構成3) 如構成1或2所記載之塗布方法，其特徵爲：該液槽 係藉由該溢流板而被區隔成包含塗布槽及溢流槽之至少2 個部分，在該溢流時，該塗布液自該塗布槽流入該溢流槽 內。 根據構成3之發明，構成上該液槽係藉由溢流板而被 區隔成包含塗布槽及溢流槽之至少2個部分，所以，在溢 流時，塗布液可自該塗布槽流入該溢流槽內》 (構成4) 如構成3所記載之塗布方法，其特徵爲：該溢流係藉 由排出該溢流槽之至少一部分的塗布液來進行。 根據構成4之發明，藉由排出該溢流槽之至少一部分 的塗布液，來進行溢流，所以，塗布開始時的液面水位被 控制成一定，同時塗布槽中之浮遊異物流入溢流槽中而自 -11 - 1338594 塗布槽中被除去。 . (構成5) 如構成4所記載之塗布方法，其特徵爲：自該溢流槽 排出之塗布液，係在由過濾元件除去異物之後，被供給該 塗布槽。 根據構成5之發明，自該溢流槽排出之塗布液，係在 由過濾元件除去異物之後，被供給該塗布槽，所以，所排 出後之包含浮遊異物在內的塗布液，暫時完全被淨化，而 可循環利用，所以，可大幅地減低塗布缺陷。 (構成6) 如構成I至構成5中任一構成所記載之塗布方法’其 特徵爲：該塗布液之補給，係在該噴嘴浸漬於液槽中的塗 布液的狀態下進行。 根據構成6之發明，塗布液之補給，係在噴嘴浸漬於 液槽中的塗布液的狀態下進行，所以’具有可防止噴嘴之 乾燥的優點。 (構成7> 如構成4至構成6中任一構成所記載之塗布方法’其 特徵爲：在該塗布液之補給後’使該噴嘴之至少一部分自 塗布液中浮起，然後進行該溢流槽的排液。 根據構成7之發明’在塗布液之補給後’使噴嘴之至 少一部分自塗布液中浮起，然後進行溢流槽的排液’藉此’ 使噴嘴浮起於塗布液面上，並在液面之振動靜止之後’藉 -12- 1338-594 由溢流來控制液面的水位，所以.，具有可再現性良好且正 確地控制塗布開始時的液面水位的優點。 (構成8) 一種塗布裝置，其特徵爲具備：噴嘴，其具有連通於 前端開口部之間隙，以使塗布液經過該間隙而導向該前端 開口部；液槽，係收容有塗布液，藉由使該噴嘴之至少一 部分浸漬於該塗布液中而對該噴嘴供給塗布液：噴嘴離合 $ 手段，係使該噴嘴之該前端開口部靠近於基板的被塗布 面，並使導向該前端開口部之塗布液液接於該基板的被塗 布面；移動手段，係在藉由該噴嘴離合手段而使該噴嘴之 該前端開口部靠近於基板的被塗布面的狀態下，使該基板 與該噴嘴之至少一方於該基板的被塗布面平行地移動；及 控制手段，係用以控制該噴嘴離合手段及該移動手段，該 液槽具有：供液管線，係於內部補充塗布液；及溢流手段， 係在塗布液之液面超出規定的液面水位時，使塗布液溢流。 • 根據構成8之發明，可提供能實施本發明之塗布方法 的較佳塗布裝置。，藉由使用本發明之塗布裝置，對基 板上形成塗布膜，可再現性良好且正確地管理每次塗布開 始時的液面水位，並可提高基板間之塗布膜厚的均勻性， 同時可有效地除去帶入液槽中之浮遊異物，而可大幅地減 低異物造成之塗布缺陷。 (構成9) 如構成8所記載之塗布裝置，其特徵爲：該液槽具有 -13- 1338594 作爲該溢流手段之規定高度的溢流板，以限制塗布開始時 所需之第1液面水位，藉由將蓄積達到超出該第1液面水 位之第2液面水位的塗布液自該溢流板的上端溢流，而以 塗布液之液面水位依據該溢流板的高度而成爲一定的方式 進行控制。 根據構成9之發明，該液槽具有規定高度之溢流板， 以限制塗布開始時所需之第1液面水位，藉以將蓄積達到 | 超出該第1液面水位之第2液面水位的塗布液自該溢流板 的上端溢流，所以，藉由溢流板之高度，可再現性良好且 正確地管理每次塗布開始時的液面水位。 (構成10) 如構成8或9所記載之塗布裝置，其特徵爲：該液槽 係藉由該溢流板而被區隔成包含塗布槽及溢流槽之至少2 個部分，在該溢流時，該塗布液自該塗布槽流入該溢流槽 內。 # 根據構成1 0之發明，該液槽係藉由該溢流板而被區隔 成包含塗布槽及溢流槽之至少2個部分，所以，在溢流時， 塗布液可自該塗布槽流入該溢流槽內。 (構成1 1) 如構成1 0所記載之塗布裝置，其特徵爲：該溢流係藉 由排出該溢流槽之至少一部分的塗布液來進行。 根據構成1 1之發明，溢流係藉由排出該溢流槽之至少 一部分的塗布液來進行，所以，塗布開始時的液面水位被 •14- 1338594 控制成一定，同時，塗布槽中之浮遊異物流入溢流槽中而 異物被自塗布槽中除去。 (構成12) 如構成11所記載之塗布裝置，其特徵爲：具有除去自 該溢流槽排出之塗布液中的異物之過濾手段：及使除去異 物後之塗布液在該塗布槽內循環的循環手段。 根據構成1 2之發明’自該溢流槽排出之塗布液’係在 由過濾手段除去異物之後’循環於塗布槽內’所以’所排 出後之包含浮遊異物在內的塗布液’暫時完全被淨化’而 可循環利用’所以’可大幅地減低塗布缺陷。 (構成13) 一種光罩坯料板之製造方法’其特徵爲包含步驟：塗 布液係光阻’藉由構成1至構成7中任一構成所記載之塗 布方法，將該塗布液塗布於坯料板之被塗布面上，以形成 塗布膜。 根據構成1 3之發明’應用本發明之塗布方法，於基板 上塗布光阻以形成光阻膜’藉此，可獲得基板間之塗布膜 厚的均勾性良好，且塗布缺陷被減低之光罩还料板β (構成14) 一種液晶裝置製造用光罩之製造方法，其特徵爲：對 藉由構成1 3之製造方法所製成的光罩坯料板，施以規定之 圖案加工，以作成光罩。 根據構成1 4之發明’使用抑制了塗布缺陷、或未被識 -15- 1338594 別出缺陷的略有塗布不勻之光罩·坯料板，所以，可獲得圖 案形成精度極佳之光罩。 (構成15) 一種圖案轉寫方法，其特徵爲：使用依照構成14所記 載之製造方法的光罩，並藉由曝光裝置將形成於該光罩上 之圖案轉寫於被轉寫體上。 根據構成1 5之發明，使用以所需精度形成圖案之形狀 的光罩，所以可使轉寫精度變得良好。 【實施方式】 以下，參照圖式詳細說明本發明之塗布方法及塗布裝 置，以及應用本發明之塗布方法之光罩坯料板的製造方法 之較佳實施形態。 本發明之塗布方法，係使自盛滿塗布液之液槽通過噴 嘴，而到達噴嘴前端開口部之塗布液液接於基板的被塗布 面，並使該基板與該噴嘴之至少一方於該被塗布面平行地 移動，藉以將塗布液塗布於該被塗布面而於該被塗布面上 形成塗布膜，其特徵爲：在一次塗布結束後，對該液槽進 行塗布液之補給，而暫時使液面上昇，直到超出塗布開始 時所需之第1液面水位的第2液面水位爲止，接著，先於 下一次塗布之前’藉由使該液槽中之蓄積至第2液面水位 的塗布液溢流，而使該塗布液的液面下降到該第1液面水 位。 根據本發明之塗布方法，藉由溢流，可再現性良好且 -16- 1338594 正確地管理每次塗布開始時的液面水位，所以，可提高基 板間之塗布膜厚的均勻性。另外，在一次塗布結束後，對 液槽進行塗布液之補給’而暫時使液面上昇，直到第2液 面水位爲止，接著’先於下一次塗布之前，藉由使液槽中 之蓄積至第2液面水位的塗布液溢流，所以，藉由溢流， 可有效地除去帶入液槽中之浮遊異物，而可大幅地減低異 物造成之塗布缺陷。 在此’可作成如下構成：該液槽具有限制第1液面水 位之規定高度的溢流板。在該構成中，藉由將蓄積達到第 2液面水位的塗布液自該溢流板的上端溢流，而使塗布液 的液面到達該第1液面水位。亦即，將蓄積達到第2液面 水位的塗布 '液自該溢流板的上端溢流，所以，藉由溢流板 之高度’可再現性良好且正確地管理每次塗布開始時的液 面水位。 尤其是在塗布液之溢流時，朝向溢流板產生塗布液表 面附近之流動，所以’異物藉由此流動而容易被移動。 另外’可作成如下構成：液槽係藉由該溢流板而被區 隔成包含塗布槽及溢流槽之至少2個部分，在該溢流時， 該塗布液自該塗布槽流入該溢流槽內。 在此1η況時’藉由排出該溢流槽之至少一部分的塗布 液來進行溢流，所以’塗布開始時的液面水位被控制成— 定’同時塗布槽中之浮遊異物流入溢流槽中，所以可自塗 布槽中有效地除去浮遊異物。 -17- 1338594 其次，說明在實施本發明之塗布方法上較爲適合使用 的塗布裝置之一實施形態。 第1圖爲本發明之該塗布裝置的槪略側視圖，第2圖 爲其槪略前視圖。 如第1圖所示，塗布裝置1係具備：設於基架11上之 塗布手段2、設於移動架12上之吸附手段3、在基架11上 使移動架12於水平方向移動的移動手段4、可拆裝自如地 保持基板10之保持手段5、及未圖示之控制部。 ^ 塗布手段2係對被塗布面向下之狀態的基板10進行塗 布液之塗布者。此塗布手段2係設於矩形箱狀之基架11之 大致中央處。有關塗布手段2之構成，容後更爲詳細地加 以說明。 移動架1 2係一體地形成有對向之一對側板1 2 1、及連 結此側板1 2 1之頂板1 2 2。移動架1 2係具有足夠之機械強 度，以保證基板10與塗布手段2之位置精度不會產生錯 φ 亂。又，移動架12係透過線軌41而與基架11連結成可於 水平方向自由移動。另外，在移動架12內設有吸附手段3。 此吸附手段3係由例如在頂板1 22之大致中央部穿設複數 個吸附孔（未圖示）的吸附板所構成。另外，在移動架1 2之 一方的側板1 2 1，突設有形成後述之滾珠絲杠42所螺合之 螺母的移動部1 3。 移動手段4係由一面作導向一面使移動架12之一對側 板121移動的一對移動用線軌4卜螺合於移動部13之螺母 -18 - 1338594 的滾珠絲杠4 2、及使該滾珠絲杠‘4 2旋轉之馬達4 3所構成。 當藉由來自未圖示之控制部的指示而使馬達43旋轉時，滾 珠絲杠42旋轉，而使移動部1 3朝響應滾珠絲杠42之旋轉 方向的方向僅水平移動規定距離。 保持手段5係具備：與基架1 1 一體形成之保持手段用 支架51;設於該保持手段用支架51上之一對保持用線軌 53:由該一對保持用線軌53所導引而移動於該保持手段用 支架51上之底板52;使該底板52於水平方向移動之線性 馬達54;及在桿前端分別設有保持構件55之複數個汽缸（或 電磁螺線管）56。又，各汽缸56係可對應於各種之基板尺 寸而可拆裝自如地裝設於底板52之任意安裝位置。另外， 該保持構件55係由載置基板10之周緣部的載置面、及進 行基板10之定位用的卡止用階梯差所構成。保持構件55 係例如對於矩形狀之基板1 0，配設於底板5 2之四角，以保 持基板10的四個角部。當然，保持構件55之配設位置， φ 可考慮基板之形狀、位置精度等而適宜加以變更。 再者，說明上述構成之塗布裝置1之整體動作。 首先，該塗布裝置1之初期狀態，係底板52處於基板 10之設定位置，移動架12處於吸附位置，而位於底板52 上之四角的各汽缸56之桿處於下降的狀態。 其次，作業者（或機器人）係在使被塗布面向下之狀態 下，將基板10載置於保持構件55的載置面上。因在保持 構件55上設有該卡止用階梯差，所以可容易將基板10定 -19- 1338594 位》另外，藉由此卡止用階梯差·，在底板52自設定位置移 動至吸附位置而停止（後述）時，可將基板10卡止。 如此，當將基板10載置於保持構件55上時，隨後， 藉由來自控制部之指示進行如下之動作。 首先，底板52藉由線性馬達54移動至吸附位置後停 止。如此，當保持手段5被定位於吸附位置上時，處於其 四角之4個汽缸56的桿同時上昇，以使基板10抵靠或靠 近於吸附手段3。在此，因吸附手段3之吸引，而將基板 ^ 1 0吸附於吸附手段3上。然後，當各汽缸5 6之桿下降時， 移動架12逐漸朝處理位置方向移動。在移動架12通過處 理位置之途中，從下方藉由塗布手段2對被塗布面向下之 基板10的被塗布面進行塗布液之塗布。 然後，當塗布手段2之塗布結束時，使馬達4 3 (滾珠絲 杠4 2)反向旋轉，以使移動架1 2從處理位置返回到吸附位 置。在此時間點，各汽缸5 6之桿上昇，以使保持構件5 5 φ 之載置面與基板10相抵靠。此時，基板10係藉由保持構 件5 5之卡止用階梯差來進行定位。然後，在使吸附手段3 之吸附停止之後，各汽缸56之桿同時下降，而將完成塗布 之基板10載置於保持構件5 5上。接著，藉由線性馬達5 4 以使底板52自吸附位置移動至設定位置’於是’作業者（或 機器人）從保持構件55上取出完成塗布之基板1〇。又，該 移動架12之移動，除使用滾珠絲杠4 2之外’亦可使用線 性馬達等之其他手段。 -20- 1338594 如上述’完成一次之塗布作.業。又，在該構成中，係 作成在移動架12(吸附手段3)逐漸朝處理位置方向移動，而 通過處理位置之途中，從下方藉由塗布手段2對基板10的 被塗布面進行塗布液之塗布的構成。然而，例如亦可爲不 使移動架12移動（亦即，將基板1〇固定於規定位置的狀 態），而使塗布手段2於水平方向移動以進行塗布之構成。 又’亦可爲使移動架12及塗布手段2之雙方移動的構成。 再者，更爲詳細地說明該塗布手段2之構成。 第3圖爲顯示此塗布裝置之塗布手段2的構成之剖視 圖。 如第3圖所示，塗布手段2係構成爲藉由噴嘴22之毛 管狀間隙23的毛細管現象，以使蓄積於液槽20內之塗布 液（例如，液體狀之光阻液）2 1上昇，並使噴嘴22之前端部 (上端部）22a(參照第4圖）靠近於朝向下方的基板10之被塗 布面，以使上昇至噴嘴22之前端部2 2a的塗布液，透過該 噴嘴前端部22a液接於該基板10之被塗布面。 在此，該液槽20係具有比基板10之橫方向一邊的長 度、亦即與藉由該移動架12所移動之縱方向正交的方向（第 3圖中，成爲與紙面正交之方向）的一邊長度更長之橫向寬 度（參照後述之第6圖）。此液槽20係被裝設及支撐於支撐 板24之上端側，並藉由未圖示之驅動手段而可相對於支撐 板24朝上下方向作移動。 是以，支撐板24係在其下端側，透過相互正交地配置 -21 - 1338594 之支撐用線軌25,26,而支撐於基.架11之底架14上。丈 支撐板24係在底架14上，可朝正交之2個方向進行 調整。另外，在此支撐板24上，透過滑行機構27，裝 支撐收容於液槽20內之噴嘴22的支撐桿28。該滑行 27係作爲噴嘴離合手段，藉由未圖示之驅動手段，相 支撐板24而朝上下方向操作移動支撐桿28。亦即， 2〇與噴嘴22係相互獨立，且可相對於支撐板24而朝 方向操作移動。 第4圖爲顯示該塗布手段2的要部構成之剖視圖 第4圖所示，該支撐桿28係透過設於液槽20之底面 孔2 0b，而使上端側進入此液槽20內。在此支撐桿28 端部28a裝設有該噴嘴22。即，噴嘴22係由支撐桿 支撐，並收容於液槽20內。此噴嘴22構造上係至少 相當於該基板10之橫方向（在第4圖中，成爲與紙面 之方向）的長度之長度（橫向寬度）。噴嘴22係沿此方丨 度方向）具有縫隙狀之毛管狀間隙23。此噴嘴22係具 著此毛管狀間隙23，而使前端側之寬度變狹變尖之截 狀。此毛管狀間隙23之上端部23a，係在噴嘴22之前 22a’開設成橫貫此噴嘴22之大致全長（橫向寬度）的縫 開口。另外，此毛管狀間隙23亦朝向噴嘴22之下方 □。 另外，在液槽20之上面部設有通孔部20a，以供 22之前端部22a突出於此液槽20之上方側，且爲了盡 「'即， 位置 設有 機構 對於 液槽 上下 。如 的通 之上 28所 具有 正交 向（長 有夾 面形 端部 隙狀 側開 噴嘴 可能 -22- 1338594 地防止液槽20內之塗布液21接·觸至大氣，液槽20 部係具有上端側之寬度狹窄且細縮之截面形狀。又 20之底面的通孔20b之周圍與噴嘴22之底面，係 29所連接，以防止液槽20內之塗布液21自該通孔 露。 在此，參照第6圖更爲詳細地說明本實施形態 槽20的構成。第6圖爲液槽20之長度方向（從正面 之情況的橫寬方向）的剖視圖。在此液槽20之內部 貫從側面側看時之寬度方向全長的規定的第1高度1 流板6。液槽20係藉由溢流板6而被區隔成塗布槽 溢流槽20B之2個部分（區域）。此溢流板6係將塗 時之所需液面水位限制於規定的第1高度h 1者。另 液槽20中，該塗布槽20A內收容有該噴嘴22，所 布槽20A之橫向寬度係至少具有對收容整個噴嘴22 生障礙之程度的長度。另外，該溢流槽20B之橫向 φ 係任意而無特別加以限制。然而，若溢流槽20 B之 度過長時，會使液槽20整體之寬度超過需要以上之 所以，溢流槽20B之橫向寬度，係以盡量作成可充 本發明之效果的程度之短橫向寬度爲較佳。另外， 21係通過設於該塗布槽20A之底面的供液管線7而 塗布槽20A(圖中箭頭A)。而溢流槽20B內之塗布 係通過設於該溢流槽20B之底面的排液管線8而被I 中箭頭B)。另外，在本實施形態中，設置連通於塗布According to the liquid level sensor disclosed in Patent Document 1, it is still not easy to reproducibly improve the liquid level of the coating liquid supplied for each application. The reason is explained with reference to Fig. 7. The following points can be cited: First, a delay is generated in the detection of the liquid level sensor 204. Second, although the liquid level sensor 204 is attached to the portion of the communication tube 201 connected to the liquid tank 200 in which the coating liquid 21 is accommodated to detect the liquid surface, the diameter of the portion of the communication tube 201 is small. Therefore, the area of the liquid surface is small, and it is easy to cause an error or the like in the liquid level detection due to the influence of the surface tension of the coating liquid. # Further, when the coating is repeated, it is impossible to completely prevent the minute foreign matter 9 from being mixed into the liquid tank 200 due to the loading of the substrate or the like. Among such foreign matter 9, the specific gravity is smaller than that of the coating liquid 21, and floats near the surface of the coating liquid (floating foreign matter). The coating apparatus disclosed in Patent Document 1 is also the same, but the supply of the coating liquid is usually performed from the liquid supply line 202 installed in the bottom wall of the liquid tank 200, and the discharge of the coating liquid is also self-installed. The liquid discharge line 203 of the bottom wall of the liquid tank 200 is carried out (refer to Fig. 7). The coating liquid 21 in the liquid bath 200 is partially discharged and continuously supplied at each coating. 1338594 At this point, the coating liquid can be recycled, and during the circulation, the foreign matter can be removed by a filter. However, since the foreign matter 9 floats on the surface of the coating liquid accumulated at a position above the liquid tank 200, there is almost no chance that the liquid discharge line 203 from the bottom wall of the liquid tank 200 is discharged. As a result, the foreign matter 9 stays in the liquid tank and is gradually accumulated in the liquid tank. Such foreign matter adheres to the nozzle to prevent the rise of the coating liquid in the nozzle, and if it adheres to the substrate at the time of coating, the portion becomes a coating defect. Therefore, it is impossible to use the substrate as a mask blank or even a photomask. In addition, when the patterning process is performed in a state where foreign matter is mixed in the photoresist film, for example, in the developing stage, the foreign matter may fall off and the portion may eventually become a white defect (pinhole defect). On the other hand, in the technique disclosed in the above Patent Document 2, it is described that the overflow pipe is submerged in the liquid tank, and when the water level of the fluid reaches the upper end of the overflow pipe, the fluid immediately flows out. However, in such a device, the floating foreign matter brought into the fluid (coating liquid) by the substrate or the like can only flow out of the foreign matter portion around the overflow pipe, and the foreign matter portion near the nozzle continues to be retained, and there is no possibility Effectively reduce the problem of coating defects caused by foreign matter. Here, a first object of the present invention is to provide a coating method and a coating apparatus which are excellent in reproducibility and accurately manage the liquid level at the start of each coating to improve the substrate in view of the problems of the above-described conventional techniques. The uniformity of the thickness of the coating film and the effective removal of the floating foreign matter introduced into the liquid tank can greatly reduce the coating defects caused by the foreign matter. A second object of the present invention is to provide a method for producing a mask blank 1338594 which is coated with a photoresist on a substrate to form a photoresist film by applying the coating method of the present invention, whereby the coating film between the substrates is thick. Good uniformity and reduced coating defects. In order to solve the above object, the present invention has the following constitution. (Configuration 1) A coating method in which a liquid tank that has passed through a coating liquid passes through a nozzle, and a coating liquid that reaches an opening of a nozzle tip is attached to a coated surface of the substrate, and the substrate is opposed to at least one of the nozzles. The coated surface is moved in parallel, and a coating liquid is applied onto the coated surface to form a coating film on the coated surface, and the coating liquid is supplied to the liquid tank after the primary coating is completed. The liquid level is temporarily raised until the second liquid level of the first liquid level required for the start of coating is exceeded, and then the second liquid level is accumulated in the liquid tank before the next coating. The coating liquid at the liquid level overflows, and the liquid level of the coating liquid falls to the first liquid level. According to the invention of the first aspect, the overflow level is excellent, and the liquid level at the start of each application is accurately managed. Therefore, the uniformity of the coating film thickness between the substrates can be improved. Further, after the completion of one application, the coating liquid is supplied to the liquid tank, and the liquid level is temporarily raised until the second liquid level of the first liquid level required for the start of coating is exceeded, and then the lower "Before the application, the coating liquid accumulated in the liquid level in the liquid level is overflowed", so that the floating foreign matter can be effectively removed by the overflow ', and the foreign matter can be greatly reduced. Caused by coating defects. -10- 1338-594 (Configuration 2) The coating method according to the first aspect, wherein the liquid tank has a relief plate that limits a predetermined height of the first liquid level, and the accumulation is achieved by the accumulation. The coating liquid of the liquid level is overflowed from the upper end of the overflow plate, and the liquid level of the coating liquid reaches the first liquid level. According to the invention of the second aspect, the liquid storage tank having the predetermined height of the first liquid level is configured to overflow the coating liquid that has reached the second liquid level from the upper end of the overflow plate. By the height of the overflow plate, the liquid level of each coating start is well reproducible and correctly managed. (Configuration 3) The coating method according to the first aspect or the second aspect, wherein the liquid tank is partitioned into at least two portions including a coating tank and an overflow tank by the overflow plate. When flowing, the coating liquid flows into the overflow tank from the coating tank. According to the invention of the third aspect, the liquid tank is configured to be partitioned into at least two portions including the coating tank and the overflow tank by the overflow plate, so that the coating liquid can flow from the coating tank during the overflow. In the overflow tank, the coating method according to the third aspect is characterized in that the overflow is performed by discharging a coating liquid of at least a part of the overflow tank. According to the invention of the fourth aspect, since the coating liquid is discharged from at least a part of the overflow tank, the liquid level at the start of the coating is controlled to be constant, and the floating foreign matter in the coating tank is introduced into the overflow tank. It was removed from the -11 - 1338594 coating tank. (Configuration 5) The coating method according to the fourth aspect, characterized in that the coating liquid discharged from the overflow tank is supplied to the coating tank after the foreign matter is removed by the filter element. According to the invention of the fifth aspect, the coating liquid discharged from the overflow tank is supplied to the coating tank after the foreign matter is removed by the filter element, so that the discharged coating liquid containing the floating foreign matter is temporarily completely purified. It can be recycled, so the coating defects can be greatly reduced. (Configuration 6) The coating method described in any one of the configurations I to 5 is characterized in that the supply of the coating liquid is performed in a state where the nozzle is immersed in the coating liquid in the liquid tank. According to the invention of the sixth aspect, the supply of the coating liquid is carried out in a state where the nozzle is immersed in the coating liquid in the liquid tank, so that the nozzle can be prevented from drying. (Configuration 7) The coating method described in any one of the configurations 4 to 6, wherein after the application of the coating liquid, at least a part of the nozzle is floated from the coating liquid, and then the overflow is performed. According to the invention of the configuration 7, after the replenishment of the coating liquid, at least a part of the nozzle is floated from the coating liquid, and then the drainage of the overflow tank is performed, thereby causing the nozzle to float on the coating liquid surface. On the other hand, after the vibration of the liquid surface is at rest, 'By -12- 1338-594 controls the water level of the liquid surface by overflow, so that it has the advantage of good reproducibility and correct control of the liquid level at the start of coating. (Configuration 8) A coating apparatus comprising: a nozzle having a gap communicating with a front end opening so that a coating liquid passes through the gap to be guided to the front end opening; and the liquid tank receives the coating liquid by At least a part of the nozzle is immersed in the coating liquid to supply a coating liquid to the nozzle: the nozzle clutching means is such that the front end opening of the nozzle is close to the coated surface of the substrate, and is guided to the front end opening The coating liquid is connected to the coated surface of the substrate; and the moving means is such that the front end opening of the nozzle is brought close to the coated surface of the substrate by the nozzle clutching means, and the substrate and the nozzle are placed. At least one of the substrates is moved in parallel with the coated surface of the substrate; and the control means is for controlling the nozzle clutching means and the moving means, the liquid tank having: a liquid supply line for replenishing the coating liquid inside; and overflowing In the method, when the liquid level of the coating liquid exceeds a predetermined liquid level, the coating liquid overflows. • According to the invention of the configuration 8, a coating apparatus capable of carrying out the coating method of the present invention can be provided. According to the coating apparatus of the invention, the coating film is formed on the substrate, the reproducibility is good, and the liquid level at the start of each coating is accurately managed, and the uniformity of the coating film thickness between the substrates can be improved, and the introduction can be effectively removed. The floating foreign matter in the liquid tank can greatly reduce the coating defect caused by the foreign matter. (Configuration 9) The coating device according to the eighth aspect, characterized in that the liquid tank has -13 - 1338594 The overflow plate having a predetermined height as the overflow means restricts the first liquid level water level required at the start of coating, and the coating liquid which has accumulated the second liquid level water level exceeding the first liquid level water level The upper end of the overflow plate overflows, and the liquid level of the coating liquid is controlled in accordance with the height of the overflow plate. According to the invention of the configuration 9, the liquid tank has a relief plate of a predetermined height to limit The first liquid level required for the start of the coating, whereby the coating liquid that has accumulated to reach the second liquid level of the first liquid level is overflowed from the upper end of the overflow plate, so that the overflow plate is used. The height is reproducible and the level of the liquid level at the start of each application is correctly controlled. (Configuration 10) The coating device according to the eighth or ninth aspect, characterized in that the liquid tank is provided by the overflow plate Further, it is partitioned into at least two portions including a coating tank and an overflow tank, and the coating liquid flows into the overflow tank from the coating tank at the time of overflow. According to the invention of the configuration 10, the liquid tank is partitioned into at least two portions including the coating tank and the overflow tank by the overflow plate, so that the coating liquid can be supplied from the coating tank during overflow. Flow into the overflow tank. (Configuration 1 1) The coating apparatus according to the configuration 10, wherein the overflow is performed by discharging a coating liquid of at least a part of the overflow tank. According to the invention of the configuration 11, the overflow system is performed by discharging the coating liquid of at least a part of the overflow tank, so that the liquid level at the start of coating is controlled to be constant by 14-1338594, and at the same time, in the coating tank The floating foreign matter flows into the overflow tank and the foreign matter is removed from the coating tank. (Attachment 12) The coating device according to the eleventh aspect, characterized in that the filtering means for removing foreign matter in the coating liquid discharged from the overflow tank is: and the coating liquid after removing the foreign matter is circulated in the coating tank Recycling means. According to the invention of the configuration of the invention, the coating liquid discharged from the overflow tank is "circulated in the coating tank" after the foreign matter is removed by the filtering means, so that the coating liquid containing the floating foreign matter after being discharged is temporarily completely Purification 'can be recycled 'so' can greatly reduce coating defects. (Construction 13) A method for producing a mask blank sheet is characterized in that it includes a step of coating a liquid photoresist. The coating liquid is applied to a blank sheet by a coating method described in any one of the structures 1 to 7. The coated surface is formed to form a coating film. According to the invention of the first aspect of the invention, by applying the coating method of the present invention, a photoresist is applied onto the substrate to form a photoresist film, whereby a uniform coating film thickness between the substrates can be obtained, and the coating defect is reduced. Cover material returning plate β (Configuration 14) A method of manufacturing a photomask for manufacturing a liquid crystal device, characterized in that a mask blank plate produced by the manufacturing method of the constituent 13 is subjected to a predetermined pattern processing. Make a mask. According to the invention of the constitution 14, the mask and the blank sheet which are slightly unevenly coated with the coating defects or the defects which are not recognized by the -15-1338594 are used, so that a mask having excellent pattern formation precision can be obtained. (Configuration 15) A pattern transfer method characterized in that a mask formed in accordance with the manufacturing method described in the configuration 14 is used, and a pattern formed on the mask is transferred to the to-be-transferred body by an exposure device. According to the invention of the configuration 15, the photomask having the shape of the pattern formed with the required precision is used, so that the transfer accuracy can be improved. [Embodiment] Hereinafter, a preferred embodiment of a coating method and a coating apparatus of the present invention, and a method of producing a mask blank using the coating method of the present invention will be described in detail with reference to the drawings. In the coating method of the present invention, the liquid to be filled from the coating liquid passes through the nozzle, and the coating liquid reaching the opening of the nozzle tip is connected to the coated surface of the substrate, and at least one of the substrate and the nozzle is placed thereon. The coated surface is moved in parallel, and a coating liquid is applied to the coated surface to form a coating film on the coated surface, and the coating liquid is replenished to the liquid tank after the primary coating is completed, and temporarily The liquid level rises until the second liquid level of the first liquid level required for the start of coating is exceeded, and then, before the next coating, 'by accumulating the liquid level in the liquid level to the second liquid level The coating liquid overflows, and the liquid level of the coating liquid is lowered to the first liquid level. According to the coating method of the present invention, the reproducibility is excellent by overflow, and -16 - 1338594 correctly manages the liquid level at the start of each coating, so that the uniformity of the coating film thickness between the substrates can be improved. Further, after the completion of one application, the coating liquid is supplied to the liquid tank, and the liquid level is temporarily raised until the second liquid level is reached, and then the liquid tank is accumulated until the next coating. Since the coating liquid of the second liquid level overflows, the floating foreign matter can be effectively removed by the overflow, and the coating defects caused by the foreign matter can be greatly reduced. Here, the liquid tank may have a damper that restricts a predetermined height of the first liquid level. In this configuration, the coating liquid that has accumulated the water level at the second liquid level overflows from the upper end of the overflow plate, and the liquid level of the coating liquid reaches the first liquid level. In other words, since the coating liquid that has accumulated the water level of the second liquid level overflows from the upper end of the overflow plate, the liquid of the overflow plate has good reproducibility and accurately manages the liquid at the start of each coating. Surface water level. In particular, when the coating liquid overflows, the flow near the surface of the coating liquid is generated toward the overflow plate, so that the foreign matter is easily moved by the flow. Further, the liquid tank may be partitioned into at least two portions including a coating tank and an overflow tank by the overflow plate, and the coating liquid flows into the overflow from the coating tank during the overflow. Inside the flow cell. In the case of the 1N state, the overflow is performed by discharging at least a part of the coating liquid of the overflow tank, so that the liquid level at the start of coating is controlled to be set to "the same time" and the floating flow in the coating tank is introduced into the overflow tank. Therefore, the floating foreign matter can be effectively removed from the coating tank. -17- 1338594 Next, an embodiment of a coating apparatus which is suitably used in carrying out the coating method of the present invention will be described. Fig. 1 is a schematic side view of the coating apparatus of the present invention, and Fig. 2 is a schematic front view thereof. As shown in Fig. 1, the coating apparatus 1 includes a coating means 2 provided on the base frame 11, an adsorption means 3 provided on the moving frame 12, and a movement for moving the movable frame 12 in the horizontal direction on the base frame 11. The means 4 is a detachable holding means 5 for holding the substrate 10 and a control unit (not shown). The coating means 2 applies a coating liquid to the substrate 10 coated with the surface facing downward. This coating means 2 is provided at substantially the center of the rectangular frame-shaped base frame 11. The composition of the coating means 2 will be described later in more detail. The movable frame 1 2 is integrally formed with a pair of side plates 1 2 1 and a top plate 1 2 2 to which the side plates 1 2 1 are joined. The moving frame 12 has sufficient mechanical strength to ensure that the positional accuracy of the substrate 10 and the coating means 2 is not disturbed. Further, the moving frame 12 is coupled to the base frame 11 via the wire rail 41 so as to be freely movable in the horizontal direction. Further, an adsorption means 3 is provided in the moving frame 12. The adsorption means 3 is constituted by, for example, an adsorption plate through which a plurality of adsorption holes (not shown) are formed in a substantially central portion of the top plate 1 22 . Further, a moving portion 13 that forms a nut to which the ball screw 42 to be described later is screwed is protruded from the side plate 1 2 1 of one of the moving frames 1 2 . The moving means 4 is a ball screw 4 2 which is screwed to the nut -18 - 1338594 of the moving part 13 by a pair of moving wire rails 4 which move one of the moving frames 12 to the side plates 121 while being guided by one side, and The ball screw '4 2 is rotated by a motor 4 3 . When the motor 43 is rotated by an instruction from a control unit (not shown), the ball screw 42 rotates, and the moving portion 13 is horizontally moved by a predetermined distance in a direction in response to the rotation direction of the ball screw 42. The holding means 5 includes: a holding means bracket 51 integrally formed with the base frame 1 1; and a pair of holding rails 53 provided on the holding means bracket 51: guided by the pair of holding rails 53 The bottom plate 52 is moved to the holding means bracket 51; the linear motor 54 for moving the bottom plate 52 in the horizontal direction; and a plurality of cylinders (or electromagnetic solenoids) 56 for holding the holding member 55 at the front end of the rod. Further, each of the cylinders 56 can be detachably attached to any of the mounting positions of the bottom plate 52 in accordance with various substrate sizes. Further, the holding member 55 is composed of a mounting surface on the peripheral edge portion of the substrate 10 and a stepping step for positioning the substrate 10. The holding member 55 is disposed, for example, on the rectangular substrate 10 at the four corners of the bottom plate 52 to hold the four corners of the substrate 10. Of course, the arrangement position of the holding member 55, φ can be appropriately changed in consideration of the shape of the substrate, the positional accuracy, and the like. Furthermore, the overall operation of the coating apparatus 1 having the above configuration will be described. First, in the initial state of the coating apparatus 1, the bottom plate 52 is at the set position of the substrate 10, the moving frame 12 is at the suction position, and the rods of the cylinders 56 located at the four corners of the bottom plate 52 are lowered. Next, the operator (or the robot) mounts the substrate 10 on the mounting surface of the holding member 55 while the coated surface faces downward. Since the locking step is provided in the holding member 55, the substrate 10 can be easily set to -19 - 1338594. In addition, by the stepping degree for the locking, the bottom plate 52 is moved from the set position to the suction position. When the stop (described later) is stopped, the substrate 10 can be locked. Thus, when the substrate 10 is placed on the holding member 55, the following operation is performed by an instruction from the control unit. First, the bottom plate 52 is stopped by the linear motor 54 moving to the suction position. Thus, when the holding means 5 is positioned at the suction position, the rods of the four cylinders 56 at the four corners thereof are simultaneously raised to bring the substrate 10 against or close to the adsorption means 3. Here, the substrate ^10 is adsorbed to the adsorption means 3 by the suction of the adsorption means 3. Then, when the rod of each cylinder 56 is lowered, the moving frame 12 is gradually moved toward the processing position. While the moving frame 12 is passing through the processing position, the coating surface of the substrate 10 to be coated facing downward is applied by coating means 2 from below. Then, when the application of the coating means 2 is completed, the motor 4 3 (ball screw 4 2) is reversely rotated to return the moving frame 12 from the processing position to the suction position. At this point of time, the rod of each cylinder 56 is raised so that the mounting surface of the holding member 5 5 φ abuts against the substrate 10. At this time, the substrate 10 is positioned by the step of locking the holding member 55. Then, after the adsorption of the adsorption means 3 is stopped, the rods of the respective cylinders 56 are simultaneously lowered, and the substrate 10 to be coated is placed on the holding member 55. Next, the bottom plate 52 is moved from the suction position to the set position by the linear motor 5 4, and then the operator (or robot) takes out the coated substrate 1 from the holding member 55. Further, in addition to the use of the ball screw 4 2, the moving of the moving frame 12 may be carried out by other means such as a linear motor. -20- 1338594 As described above, the coating process was completed once. Further, in this configuration, the moving frame 12 (adsorption means 3) is gradually moved in the processing position direction, and the coating surface of the substrate 10 is applied to the coated surface by the coating means 2 from the lower side while the processing position is being passed. The composition of the coating. However, for example, the movable frame 12 may not be moved (i.e., the substrate 1 is fixed to a predetermined position), and the coating means 2 may be moved in the horizontal direction to be coated. Further, it may be configured to move both the moving frame 12 and the coating means 2. Furthermore, the configuration of the coating means 2 will be described in more detail. Fig. 3 is a cross-sectional view showing the configuration of the coating means 2 of the coating apparatus. As shown in Fig. 3, the coating means 2 is configured such that the coating liquid (for example, liquid photoresist) 2 1 accumulated in the liquid tank 20 rises by the capillary phenomenon of the capillary tube gap 23 of the nozzle 22. The front end portion (upper end portion) 22a (see FIG. 4) of the nozzle 22 is brought close to the coated surface of the substrate 10 facing downward, so that the coating liquid rising to the front end portion 22a of the nozzle 22 passes through the nozzle tip end. The portion 22a is fluidly connected to the coated surface of the substrate 10. Here, the liquid tank 20 has a length that is longer than the lateral direction of the substrate 10, that is, a direction orthogonal to the longitudinal direction in which the moving frame 12 moves (in FIG. 3, the direction perpendicular to the paper surface) The lateral width of one side is longer (refer to Fig. 6 which will be described later). The liquid tank 20 is attached and supported on the upper end side of the support plate 24, and is movable in the vertical direction with respect to the support plate 24 by a driving means (not shown). Therefore, the support plate 24 is supported on the chassis 14 of the base frame 11 by being disposed on the lower end side thereof through the support rails 25, 26 of -21 - 1338594 which are orthogonal to each other. The support plate 24 is attached to the chassis 14 and can be adjusted in two orthogonal directions. Further, on the support plate 24, a support rod 28 for supporting the nozzle 22 accommodated in the liquid tank 20 is supported by the slide mechanism 27. This slide 27 is used as a nozzle clutching means, and the support bar 28 is moved in the vertical direction by the support plate 24 by a driving means (not shown). That is, the nozzles 22 are independent of each other and are movable in the upward direction with respect to the support plate 24. Fig. 4 is a cross-sectional view showing the configuration of the main part of the coating means 2. As shown in Fig. 4, the support rod 28 is passed through the bottom hole 20b provided in the liquid tank 20, and the upper end side enters the liquid tank 20. The nozzle 22 is mounted on the end 28a of the support rod 28. That is, the nozzle 22 is supported by the support rod and housed in the liquid tank 20. The nozzle 22 is structurally at least corresponding to the length (transverse width) of the length of the substrate 10 in the lateral direction (in the fourth drawing, in the direction from the paper surface). The nozzle 22 has a slit-like tubular tubular gap 23 along this square direction. This nozzle 22 has this capillary tubular gap 23, and the width of the front end side is narrowed and pointed. The upper end portion 23a of the capillary tubular gap 23 is formed in a slit opening 22a' before the nozzle 22 so as to traverse the substantially full length (lateral width) of the nozzle 22. In addition, the capillary tubular gap 23 also faces the lower side of the nozzle 22. Further, a through hole portion 20a is provided in the upper surface portion of the liquid tank 20 so that the front end portion 22a of the 22 protrudes above the liquid tank 20, and in order to "is a positional mechanism" for the liquid tank. The upper 28 of the passage has an orthogonal direction (the long slit-shaped end gap-shaped side opening nozzle may be -22- 1338594 to prevent the coating liquid 21 in the liquid tank 20 from coming into contact with the atmosphere, and the liquid tank 20 has The upper end side has a narrow and narrow cross-sectional shape, and the periphery of the through hole 20b on the bottom surface of the bottom surface 20 is connected to the bottom surface of the nozzle 22 to prevent the coating liquid 21 in the liquid tank 20 from being exposed from the through hole. Here, the configuration of the groove 20 of the present embodiment will be described in more detail with reference to Fig. 6. Fig. 6 is a cross-sectional view showing the longitudinal direction of the liquid tank 20 (in the lateral direction from the front side). The predetermined first height 1 flow plate 6 in the width direction as viewed from the side surface side. The liquid tank 20 is partitioned into two portions (regions) of the coating tank overflow groove 20B by the overflow plate 6. The overflow plate 6 is configured to limit the required liquid level at the time of coating to a predetermined first height h 1 . The nozzle 22 is accommodated in the coating tank 20A, and the lateral width of the groove 20A has at least a length that hinders the entire nozzle 22. The lateral φ of the overflow groove 20B is arbitrary and has no special However, if the degree of the overflow tank 20 B is too long, the width of the entire tank 20 is more than necessary, and the lateral width of the overflow tank 20B is made as much as possible to complement the effect of the present invention. It is preferable that the lateral width is short, and the groove 20A (arrow A in the figure) is applied through the liquid supply line 7 provided on the bottom surface of the coating tank 20A. The coating system in the overflow tank 20B is provided by The drain line 8 on the bottom surface of the overflow tank 20B is indicated by an arrow B) in Fig. 1. In addition, in the present embodiment, it is provided to communicate with the coating.
之上面 ，液槽 由蛇管 20b洩 之該液 側所見 具有橫 1 1的溢 20A及 布開始 外，在 以，塗 不會產 寬度， 橫向寬 長度， 分發揮 塗布液 供給於 夜21， 非出（圖 槽20A -23- 1338594 之側壁的連通管100。並可於此連通管100裝設液面感測器 (未圖示），用以進行將塗布液21供給塗布槽20A時之供給 量的控制。 第5圖爲顯示該塗布手段2進行塗布之狀態的剖視圖。 亦即，如第5圖所示，藉由噴嘴2 2之縫隙狀的毛管狀 間隙23(間隙間隔T)的毛細管現象，以使蓄積於液槽20內 之塗布液21上昇。並使噴嘴22之前端部（上端部）22a，相 隔規定之塗布間隙G，靠近於朝向下方的基板1 〇之被塗布 面10a»並一面使上昇至噴嘴前端部22a的塗布液21，透 過該噴嘴前端部22a液接於該基板10之被塗布面l〇a，一 面使基板1 0與噴嘴22相對地對於被塗布面1 0a平行地移 動。藉此，將塗布液21塗布於基板10之被塗布面10a而 形成塗布膜2U。此時之基板1〇與噴嘴22的相對移動方 向’如第5圖中之箭頭V所示，係與在噴嘴22之前端部 22a形成有毛管狀間隙23之縫隙狀開口正交的方向。 φ 再者’更爲詳細地說明該塗布裝置之塗布手段2的動 作’同時亦詳細說明使用此塗布裝置來實施之本發明的塗 布方法。 (1)在一次塗布結束後，使液槽20下降至規定位置。 另外’使噴嘴22浸漬於液槽20(塗布槽20A)中的塗布液21 內（是第4圖所示狀態，是所謂液槽2〇與噴嘴22之位置的 初期狀態）。 又’在此時間點，塗布槽20A中之塗布液21的液面水 -24- 1338594 位，係比溢流板6之第1高度h 1.更降低。其理由是因爲被 前次之塗布所消耗而致。另外，溢流槽20B內之塗布液， 係自排液管線8而被排出。 (2) 其次，在關閉排液管線8之狀態，自供液管線7將 塗布液供給（補給）於塗布槽20A。塗布槽20A中之塗布液的 液面水位，首先到達溢流板6之第1高度h 1。又，若持續 供給塗布液時，則塗布液自溢流板6之上端6a溢出而流入 溢流槽20B內。因爲排液管線8被關閉，所以，溢流槽20B 內之塗布液的液面水位上昇而到達溢流板6之第1高度 h 1。又，在液槽20內之所有塗布液2 1的液面水位到達規 定之第2高度h2(h2> hi)的時間點，即停止塗布液之供給 (第6(a)圖之狀態）。又，此時之塗布液的供給量，亦可藉由 於前述之連通管1 00設置液面感測器以監視液面高度來進 行控制。 (3) 其次，打開排液管線8，將溢流槽20B內之塗布液 排出。此時，塗布槽20A中之塗布液的至少一部分係自溢 流板6溢流而流入溢流槽20B內（第6(b)圖之狀態）。此時， 至少在塗布液之表面附近，朝向溢流槽產生單方向之塗布 液的流動（移動）。藉由此溢流，被帶入塗布槽20A中而浮 遊於塗布液表面之異物9，亦有效地流入溢流槽20B內。 因此，可從塗布槽20A中的塗布液中除去異物9。 於是，塗布槽20A之液面水位，成爲與溢流板6之第 1高度h 1相同高度，即，對塗布開始時之所需液面水位固 -25- 1338594 定進行管理（第6(c)圖之狀態）》. 如此，在本發明中，在一次塗布結束後，對塗布槽20A 進行塗布液之補給，而暫時使液面上昇，直到超出塗布開 始時所需之第1液面水位h 1的第2液面水位h 2爲止。接 著，先於下一次塗布之前，藉由使蓄積至第2液面水位h2 的塗布液自該溢流板6之上端6a溢流，而使塗布槽20A之 液面水位到達第1液面水位h 1。 又，即使該溢流槽20B內之塗布液未被完全排出，仍 可獲得將本發明之液面水位再現性良好地保持一定的效 果。然而，爲了更爲有效地發揮除去帶入塗布液中之浮遊 異物的效果，以將該溢流槽20B內之塗布液完全排出，並 在後述之步驟加以淨化爲較佳。因此，排液管線8係如本 實施形態，以設置於溢流槽2 Ο B之底面爲較佳。另外，暫 時使液面上昇至第2液面水位h2。此時之第2液面水位h2, 係以設定成可有效獲得藉由溢流而除去帶入塗布槽20A中 之浮遊異物的效果爲較佳。例如，該第2液面水位h2，係 以成爲被帶入塗布槽20 A中而主要浮遊於塗布液表面之異 物9來到比溢流板6之第1高度h1更上方之高度（液面水 位）爲較佳。 (4)如上述，在塗布槽20A之液面水位成爲一定的時間 點，在將噴嘴22浸漬於塗布槽20A之塗布液內的狀態下， 使噴嘴22及液槽20上昇至規定位置。然後，僅使噴嘴22 突出，將噴嘴前端部22 a之塗布液液接於被塗布面。然後， -26- 1338594 在維持液接之狀態下，使噴嘴22·(及/或液槽20)依所需之塗 布膜厚而下降一規定量。藉此，適宜地調整噴嘴22與被塗 布面之塗布間隙G。然後，藉由基板（被塗布面）與噴嘴22 作相對移動（在本實施形態中僅使基板移動），可開始塗布 液21之塗布。 (5)如此，當一次塗布結束時，再度自該（1)之步驟起來 實施。 又，在該（3)之步驟中，自排液管線8回收之塗布液， 係在途中透過過濾手段除去異物之後，自供液管線7再度 供給於塗布槽20A。藉此，所排出後之包含浮遊異物在內 的塗布液，暫時完全被淨化，而可循環利用，所以，可大 幅地減低塗布缺陷。 又，在該（3)之步驟中，藉由溢流而對液面水位之控 制，如上述，可在噴嘴22浸漬於塗布槽20A中的塗布液的 狀態下進行。另外，亦可在塗布液之補給後，爲了下一塗 布步驟，而使噴嘴22之至少前端部22a自塗布液中浮起 後，藉由溢流而對液面水位進行控制。根據前者，塗布液 之補給，係在噴嘴22浸漬於塗布槽20A中的塗布液的狀態 下進行，所以，具有可防止噴嘴22之乾燥的優點。另外， 根據後者，在使噴嘴22浮起於塗布液面上，並在液面之振 動靜止之後，藉由溢流來控制液面的水位，所以，具有可 再現性良好且正確地控制塗布開始時的液面水位的優點。 如以上之說明，藉由使用本發明之塗布裝置，對基板 -27- 1338594 上形成塗布膜，可藉由溢流而再現性良好且正確地 次塗布開始時的液面水位，並可提高基板間之塗布 均勻性。而且’在一次塗布結束後，對液槽（塗布ϋ 塗布液之補給，而暫時使液面上昇，直到超出塗布 所需之第1液面水位的第2液面水位爲止，接著， 一次塗布之前，藉由使液槽中之蓄積至第2液面水 布液溢流，所以，藉由溢流，可有效地除去帶入塗 之浮遊異物，而可大幅地減低異物造成之塗布缺陷。 藉由具有限制第1液面水位之規定高度的溢流扳， 達到第2液面水位的塗布液自溢流板的上端溢流， 藉由溢流板之高度，可再現性良好且正確地管理每 開始時的液面水位。 又’作爲溢流之手段，並不限定於上述手段。 可將液槽作成內側槽（塗布槽）與外側槽（溢流槽）之 造，並使來自內側槽之溢流液流出到外側槽。另外 利用機械手段等先將可上下移動之溢流板，上昇至 1液面水位的規定部位，對液槽供給塗布液而達到 位後，使溢流板下降至規定高度（第丨液面水位）。 另外’本發明係一種光罩坯料板之製造方法， 步驟：塗布液係光阻，藉由本發明之塗布方法，將 液塗布於基板之被塗布面上，以形成塗布膜。 亦即’應用本發明之塗布方法，於基板上塗布 形成光阻膜’藉此’可獲得基板間之塗布膜厚的均 管理每 膜厚的 I)進行 開始時 先於下 位的塗 布槽中 另外， 將蓄積 所以， 次塗布 例如亦 雙重構 ，亦可 超過第 規定部 其包含 該塗布 光阻以 勻性良 -28- 1338594 好，且塗布缺陷被減低之光罩述.料板。尤其是在液晶顯示 裝置或液晶顯示裝置製造用之光罩中，例如可使用一邊爲 3 00mm以上之大型基板。根據本發明，可獲得在此種大型 基板全表面形成無膜厚變動之均勻的光阻膜之光罩坯料 板，故而本發明特別適合。 【圖式簡單說明】 第1圖爲實施本發明之塗布方法的塗布裝置之槪略側 視圖。 第2圖爲該塗布裝置之槪略前視圖。 第3圖爲顯示該塗布裝置之塗布手段的構成之剖視 圖。 第4圖爲顯示該塗布裝置之塗布手段的要部構成之剖 視圖。 第5圖爲顯示該塗布裝置之塗布手段進行塗布之狀態 的剖視圖。 第6圖爲顯示說明本發明之塗布方法用的該塗布手段 的液槽構成之正面剖視圖。 第7圖爲顯示說明習知技術用的習知塗布裝置之液槽 構成之正面剖視圖。 【主要元件符號說明】 1 塗布裝置 2 塗布手段 3 吸附手段 -29- 1338594On the upper side, the liquid tank is discharged from the coil 20b, and the overflow 20A having the horizontal 1 1 and the cloth are seen outside, and the coating is not produced in the width, the lateral width is long, and the coating liquid is supplied to the night 21, which is not (The communication tube 100 on the side wall of the groove 20A-23-1338594. A liquid level sensor (not shown) may be provided in the communication tube 100 for supplying the coating liquid 21 to the coating tank 20A. Fig. 5 is a cross-sectional view showing a state in which the coating means 2 is applied. That is, as shown in Fig. 5, capillary phenomenon by a slit-like capillary-shaped gap 23 (gap interval T) of the nozzle 2 2 The coating liquid 21 accumulated in the liquid tank 20 is raised, and the front end portion (upper end portion) 22a of the nozzle 22 is spaced apart from the predetermined coating gap G so as to be close to the coated surface 10a of the substrate 1 facing downward. The coating liquid 21 that has risen to the nozzle tip end portion 22a is immersed in the coated surface 11a of the substrate 10 through the nozzle tip end portion 22a, and the substrate 10 and the nozzle 22 are opposed to the coated surface 10a. Move the ground. Thereby, the coating liquid 21 is applied to the substrate 1 The coating film 2U is formed on the coated surface 10a of 0. At this time, the relative movement direction of the substrate 1A and the nozzle 22 is as shown by an arrow V in Fig. 5, and a capillary tube is formed at the end portion 22a before the nozzle 22. The slit-shaped opening of the gap 23 is orthogonal to each other. φ In addition, the operation of the coating device 2 of the coating device will be described in more detail. The coating method of the present invention which is carried out using the coating device will also be described in detail. After the completion of one application, the liquid tank 20 is lowered to a predetermined position. Further, the nozzle 22 is immersed in the coating liquid 21 in the liquid tank 20 (coating tank 20A) (in the state shown in Fig. 4, the liquid tank 2 is called The initial state of the position of the nozzle 22 and the nozzle 22. At this point in time, the liquid level of the coating liquid 21 in the coating tank 20A is -24,338,594, which is higher than the first height h1 of the overflow plate 6. The reason is that it is consumed by the previous coating. Further, the coating liquid in the overflow tank 20B is discharged from the drain line 8. (2) Next, the state in which the drain line 8 is closed The coating liquid is supplied (replenished) to the coating tank 20A from the liquid supply line 7. The coating tank 20A The liquid level of the coating liquid first reaches the first height h 1 of the overflow plate 6. Further, when the coating liquid is continuously supplied, the coating liquid overflows from the upper end 6a of the overflow plate 6 and flows into the overflow tank 20B. Since the drain line 8 is closed, the liquid level of the coating liquid in the overflow tank 20B rises to reach the first height h 1 of the overflow plate 6. Further, all the coating liquids 2 in the liquid tank 20 When the liquid level reaches the predetermined second height h2 (h2 > hi), the supply of the coating liquid is stopped (the state of Fig. 6(a)). Further, the supply amount of the coating liquid at this time may be controlled by providing a liquid level sensor to monitor the liquid level by the communication tube 100 described above. (3) Next, the drain line 8 is opened, and the coating liquid in the overflow tank 20B is discharged. At this time, at least a part of the coating liquid in the coating tank 20A overflows from the overflow plate 6 and flows into the overflow tank 20B (state of Fig. 6(b)). At this time, at least in the vicinity of the surface of the coating liquid, the flow (movement) of the coating liquid in one direction is generated toward the overflow tank. By this overflow, the foreign matter 9 which is carried into the coating tank 20A and floats on the surface of the coating liquid is also efficiently flowed into the overflow tank 20B. Therefore, the foreign matter 9 can be removed from the coating liquid in the coating tank 20A. Then, the liquid level of the coating tank 20A is at the same height as the first height h 1 of the overflow plate 6, that is, the required liquid level of the liquid level at the start of coating is fixed - 25 - 1338594 (6th (c In the present invention, after the application is completed, the coating tank 20A is replenished with the coating liquid, and the liquid level is temporarily raised until the first liquid level required for the coating start is exceeded. The second liquid level h 2 of h 1 is as follows. Then, before the next coating, the coating liquid accumulated in the second liquid level water level h2 overflows from the upper end 6a of the overflow plate 6, so that the liquid level of the coating tank 20A reaches the first liquid level. h 1. Further, even if the coating liquid in the overflow tank 20B is not completely discharged, the effect of maintaining the liquid level reproducibility of the present invention in a satisfactory manner can be obtained. However, in order to more effectively exert the effect of removing the floating foreign matter introduced into the coating liquid, it is preferable to completely discharge the coating liquid in the overflow tank 20B and purify it in a later-described step. Therefore, the drain line 8 is preferably provided on the bottom surface of the overflow tank 2 Ο B as in the present embodiment. Further, the liquid level is temporarily raised to the second liquid level water level h2. In this case, the second liquid level water level h2 is preferably set so as to effectively obtain the effect of removing the floating foreign matter introduced into the coating tank 20A by overflow. For example, the second liquid level h2 is a height that is brought into the coating tank 20A and mainly floats on the surface of the coating liquid to a level higher than the first height h1 of the overflow plate 6 (liquid level) Water level) is preferred. (4) As described above, when the liquid level of the coating tank 20A is constant, the nozzle 22 and the liquid tank 20 are raised to a predetermined position while the nozzle 22 is immersed in the coating liquid of the coating tank 20A. Then, only the nozzle 22 is protruded, and the coating liquid of the nozzle tip end portion 22a is brought into contact with the coated surface. Then, -26- 1338594 lowers the nozzle 22·(and/or the liquid tank 20) by a predetermined amount in accordance with the required coating thickness while maintaining the liquid connection. Thereby, the coating gap G between the nozzle 22 and the coated surface is appropriately adjusted. Then, by the relative movement of the substrate (coated surface) and the nozzle 22 (in the present embodiment, only the substrate is moved), the application of the coating liquid 21 can be started. (5) Thus, when the coating is completed once, it is again carried out from the step (1). Further, in the step (3), the coating liquid recovered from the liquid discharge line 8 is again supplied to the coating tank 20A from the liquid supply line 7 after the foreign matter is removed by the filtering means in the middle. As a result, the discharged coating liquid containing the floating foreign matter is completely purified and can be recycled, so that the coating defect can be greatly reduced. Further, in the step (3), the control of the liquid level by the overflow can be carried out in a state where the nozzle 22 is immersed in the coating liquid in the coating tank 20A as described above. Further, after the application of the coating liquid, at least the tip end portion 22a of the nozzle 22 may be floated from the coating liquid for the next coating step, and then the liquid level may be controlled by overflow. According to the former, the supply of the coating liquid is performed in a state where the nozzle 22 is immersed in the coating liquid in the coating tank 20A, so that the nozzle 22 can be prevented from drying. Further, according to the latter, the nozzle 22 is floated on the surface of the coating liquid, and after the vibration of the liquid surface is at rest, the water level of the liquid surface is controlled by the overflow, so that the reproducibility is good and the coating start is accurately controlled. The advantage of the liquid level at the time. As described above, by using the coating apparatus of the present invention, a coating film is formed on the substrate 270-1338594, the reproducibility by overflow and the liquid level at the start of the coating can be accurately applied, and the substrate can be improved. Uniform coating between applications. Further, 'after the completion of one application, the liquid tank (coating of the coating liquid is applied, and the liquid level is temporarily raised until the second liquid level of the first liquid level required for coating is exceeded), and then, one coating is performed. By accumulating the liquid in the liquid tank to the second liquid surface water cloth overflow, the floating foreign matter can be effectively removed by the overflow, and the coating defects caused by the foreign matter can be greatly reduced. The coating liquid that reaches the second liquid level is overflowed from the upper end of the overflow plate by the overflow plate having the predetermined height of the first liquid level, and the reproducibility is good and managed accurately by the height of the overflow plate. The liquid level at the beginning of each step. The method of overflow is not limited to the above means. The liquid tank can be made into an inner tank (coating tank) and an outer tank (overflow tank), and the inner tank can be made from the inner tank. The overflow liquid flows out to the outer tank, and the overflow plate that can be moved up and down is raised to a predetermined portion of the liquid level by the mechanical means, and the coating liquid is supplied to the liquid tank to reach the position, and the overflow plate is lowered. To the specified height (Dijon Further, the present invention relates to a method for producing a photomask blank sheet, which comprises the steps of: coating a liquid photoresist, and applying a liquid to a coated surface of a substrate by the coating method of the present invention to form a coating film. That is, 'the coating method of the present invention is applied to form a photoresist film on the substrate, whereby the coating film thickness between the substrates can be obtained, and the thickness of each film is controlled. I) is started before the lower coating tank. Therefore, the secondary coating may be double-reconstituted, for example, and may exceed the predetermined portion of the coating which contains the coating photoresist to have a good uniformity of -28 to 1338,594, and the coating defect is reduced. In particular, in a photomask for manufacturing a liquid crystal display device or a liquid crystal display device, for example, a large substrate having a side of 300 mm or more can be used. According to the present invention, it is possible to obtain a mask blank having a uniform photoresist film having no film thickness variation on the entire surface of such a large substrate, and thus the present invention is particularly suitable. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic side view of a coating apparatus for carrying out the coating method of the present invention. Figure 2 is a schematic front view of the coating apparatus. Fig. 3 is a cross-sectional view showing the configuration of a coating means of the coating device. Fig. 4 is a cross-sectional view showing the configuration of a main part of a coating means of the coating apparatus. Fig. 5 is a cross-sectional view showing a state in which the coating means of the coating device is applied. Fig. 6 is a front cross-sectional view showing the configuration of a liquid tank for explaining the coating means for the coating method of the present invention. Fig. 7 is a front cross-sectional view showing the configuration of a liquid tank of a conventional coating apparatus for the prior art. [Explanation of main component symbols] 1 Coating device 2 Coating method 3 Adsorption means -29- 1338594
4 移動手段 5 保持手段 6 溢流板 7 供液管線 8 排液管線 10 基板 10a 被塗布面 11 基架 12 移動架 13 移動部 14 底架 20 液槽 20a 通孔部 20b 通孔 20A 塗布槽 20B 溢流槽 2 1 塗布液 21a 塗布膜 22 噴嘴 22a 噴嘴前端部 23 毛管狀間隙 23a 上端部 24 支撐板 -30 13385944 Moving means 5 Holding means 6 Overflow plate 7 Supply line 8 Drain line 10 Substrate 10a Coated surface 11 Base frame 12 Moving frame 13 Moving part 14 Chassis 20 Liquid tank 20a Through hole portion 20b Through hole 20A Coating groove 20B Overflow tank 2 1 coating liquid 21a coating film 22 nozzle 22a nozzle front end portion 23 capillary tubular gap 23a upper end portion 24 support plate -30 1338594
25,26 支撐用線軌 27 滑行機構 28 支撐桿 28a 支撐桿上端部 29 蛇管 4 1 線軌 42 滾珠絲杠 43 馬達 5 1 保持手段用支架 52 底板 53 線軌 54 線性馬達 55 保持構件 56 汽缸 12 1 側板 122 頂板 G 塗布間隙 -31 -25,26 Support rail 27 Sliding mechanism 28 Support rod 28a Support rod upper end 29 Snake tube 4 1 Line rail 42 Ball screw 43 Motor 5 1 Hold means bracket 52 Base plate 53 Line rail 54 Linear motor 55 Holding member 56 Cylinder 12 1 side plate 122 top plate G coating gap -31 -