JP4610308B2 - 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体 - Google Patents

基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体 Download PDF

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JP4610308B2
JP4610308B2 JP2004332080A JP2004332080A JP4610308B2 JP 4610308 B2 JP4610308 B2 JP 4610308B2 JP 2004332080 A JP2004332080 A JP 2004332080A JP 2004332080 A JP2004332080 A JP 2004332080A JP 4610308 B2 JP4610308 B2 JP 4610308B2
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substrate
back surface
vicinity
wafer
cleaning
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JP2004332080A
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Japanese (ja)
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JP2006147654A (ja
JP2006147654A5 (enrdf_load_stackoverflow
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剛 守屋
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2004332080A priority Critical patent/JP4610308B2/ja
Priority to US11/274,117 priority patent/US7648581B2/en
Publication of JP2006147654A publication Critical patent/JP2006147654A/ja
Publication of JP2006147654A5 publication Critical patent/JP2006147654A5/ja
Priority to US12/627,685 priority patent/US7913702B2/en
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JP2004332080A 2004-11-16 2004-11-16 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体 Expired - Fee Related JP4610308B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004332080A JP4610308B2 (ja) 2004-11-16 2004-11-16 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体
US11/274,117 US7648581B2 (en) 2004-11-16 2005-11-16 Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium
US12/627,685 US7913702B2 (en) 2004-11-16 2009-11-30 Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004332080A JP4610308B2 (ja) 2004-11-16 2004-11-16 基板洗浄方法、基板洗浄装置、基板処理システム、基板洗浄プログラム及び記憶媒体

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JP2006147654A JP2006147654A (ja) 2006-06-08
JP2006147654A5 JP2006147654A5 (enrdf_load_stackoverflow) 2007-12-27
JP4610308B2 true JP4610308B2 (ja) 2011-01-12

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Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5016351B2 (ja) * 2007-03-29 2012-09-05 東京エレクトロン株式会社 基板処理システム及び基板洗浄装置
JP2009267005A (ja) * 2008-04-24 2009-11-12 Tokyo Electron Ltd 基板洗浄方法及び基板洗浄装置並びに基板処理装置
JP5395405B2 (ja) 2008-10-27 2014-01-22 東京エレクトロン株式会社 基板洗浄方法及び装置
JP4950247B2 (ja) 2009-05-12 2012-06-13 東京エレクトロン株式会社 洗浄装置、基板処理システム、洗浄方法、プログラムおよび記憶媒体
JP2013033963A (ja) * 2011-07-29 2013-02-14 Semes Co Ltd 基板処理装置及び基板処理方法
KR101874901B1 (ko) 2011-12-07 2018-07-06 삼성전자주식회사 기판 건조 장치 및 방법
US20150325792A1 (en) * 2012-06-25 2015-11-12 The Regents Of The University Of Michigan Large area organic photovoltaics
JP6153110B2 (ja) * 2013-06-13 2017-06-28 国立大学法人東北大学 一成分極低温微細固体粒子連続生成装置、および、その一成分極低温微細固体粒子連続生成方法
KR20160065226A (ko) 2014-11-07 2016-06-09 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR101934984B1 (ko) * 2016-11-25 2019-01-03 세메스 주식회사 기판 처리 장치 및 방법
KR102037902B1 (ko) * 2018-11-26 2019-10-29 세메스 주식회사 기판 처리 장치 및 방법
CN113161259B (zh) 2020-01-23 2025-08-12 东京毅力科创株式会社 基板处理装置、基板处理方法和化学溶液
KR102606621B1 (ko) * 2020-11-03 2023-11-28 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW252211B (enrdf_load_stackoverflow) * 1993-04-12 1995-07-21 Cauldron Ltd Parthership
US5967156A (en) * 1994-11-07 1999-10-19 Krytek Corporation Processing a surface
JP3183214B2 (ja) * 1997-05-26 2001-07-09 日本電気株式会社 洗浄方法および洗浄装置
US6726777B1 (en) * 1999-06-24 2004-04-27 Sumitomo Heavy Industries Ltd. Cleaning method and apparatus using fluid spraying
JP2003059883A (ja) * 2001-08-17 2003-02-28 Nec Corp 裏面洗浄方法および装置、動作制御方法および装置、コンピュータプログラム
JP4026750B2 (ja) * 2002-04-24 2007-12-26 東京エレクトロン株式会社 基板処理装置
JP2004186530A (ja) * 2002-12-05 2004-07-02 Sony Corp 洗浄装置及び洗浄方法

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