JP4601230B2 - 固体コンデンサおよびそれらの製造方法 - Google Patents
固体コンデンサおよびそれらの製造方法 Download PDFInfo
- Publication number
- JP4601230B2 JP4601230B2 JP2001512599A JP2001512599A JP4601230B2 JP 4601230 B2 JP4601230 B2 JP 4601230B2 JP 2001512599 A JP2001512599 A JP 2001512599A JP 2001512599 A JP2001512599 A JP 2001512599A JP 4601230 B2 JP4601230 B2 JP 4601230B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- anode
- wick
- capacitor
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003990 capacitor Substances 0.000 title claims abstract description 115
- 239000007787 solid Substances 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title description 75
- 239000000758 substrate Substances 0.000 claims abstract description 94
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims abstract description 19
- 238000005520 cutting process Methods 0.000 claims description 22
- 238000003754 machining Methods 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 115
- 239000011347 resin Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 13
- 238000000227 grinding Methods 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 10
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000000843 powder Substances 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- 238000002048 anodisation reaction Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 238000005245 sintering Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000005538 encapsulation Methods 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000037237 body shape Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/008—Terminals
- H01G9/012—Terminals specially adapted for solid capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/0029—Processes of manufacture
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Ceramic Capacitors (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9916047.5 | 1999-07-08 | ||
| GBGB9916047.5A GB9916047D0 (en) | 1999-07-08 | 1999-07-08 | Solid state capacitors and methods of manufacturing them |
| GBGB9926894.8A GB9926894D0 (en) | 1999-11-12 | 1999-11-12 | Solid state capacitors and methods of manufacturing them |
| GB9926894.8 | 1999-11-12 | ||
| PCT/GB2000/002630 WO2001008178A1 (en) | 1999-07-08 | 2000-07-07 | Solid state capacitors and methods of manufacturing them |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003505879A JP2003505879A (ja) | 2003-02-12 |
| JP2003505879A5 JP2003505879A5 (enExample) | 2005-09-15 |
| JP4601230B2 true JP4601230B2 (ja) | 2010-12-22 |
Family
ID=26315746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001512599A Expired - Fee Related JP4601230B2 (ja) | 1999-07-08 | 2000-07-07 | 固体コンデンサおよびそれらの製造方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6751085B1 (enExample) |
| EP (1) | EP1194937B1 (enExample) |
| JP (1) | JP4601230B2 (enExample) |
| KR (1) | KR100634570B1 (enExample) |
| CN (1) | CN1226759C (enExample) |
| AT (1) | ATE279013T1 (enExample) |
| AU (1) | AU6297100A (enExample) |
| DE (1) | DE60014648T2 (enExample) |
| IL (2) | IL147463A0 (enExample) |
| WO (1) | WO2001008178A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9824442D0 (en) * | 1998-11-06 | 1999-01-06 | Avx Ltd | Manufacture of solid state capacitors |
| DE19962231A1 (de) * | 1999-12-22 | 2001-07-12 | Infineon Technologies Ag | Verfahren zur Herstellung mikromechanischer Strukturen |
| JP4706115B2 (ja) * | 2001-03-23 | 2011-06-22 | パナソニック株式会社 | 固体電解コンデンサ及びその製造方法 |
| JP2002299161A (ja) * | 2001-03-29 | 2002-10-11 | Matsushita Electric Ind Co Ltd | 複合電子部品 |
| US6950300B2 (en) * | 2003-05-06 | 2005-09-27 | Marvell World Trade Ltd. | Ultra low inductance multi layer ceramic capacitor |
| US8717777B2 (en) * | 2005-11-17 | 2014-05-06 | Avx Corporation | Electrolytic capacitor with a thin film fuse |
| US8257463B2 (en) * | 2006-01-23 | 2012-09-04 | Avx Corporation | Capacitor anode formed from flake powder |
| GB0622463D0 (en) * | 2006-11-10 | 2006-12-20 | Avx Ltd | Powder modification in the manufacture of solid state capacitor anodes |
| US20080123251A1 (en) * | 2006-11-28 | 2008-05-29 | Randall Michael S | Capacitor device |
| US7532457B2 (en) * | 2007-01-15 | 2009-05-12 | Avx Corporation | Fused electrolytic capacitor assembly |
| JP2009295634A (ja) * | 2008-06-02 | 2009-12-17 | Nippon Chemicon Corp | 固体電解コンデンサ |
| KR101009850B1 (ko) * | 2008-06-17 | 2011-01-19 | 삼성전기주식회사 | 고체 전해 콘덴서 및 그 제조방법 |
| US20100085685A1 (en) * | 2008-10-06 | 2010-04-08 | Avx Corporation | Capacitor Anode Formed From a Powder Containing Coarse Agglomerates and Fine Agglomerates |
| US8199461B2 (en) * | 2009-05-29 | 2012-06-12 | Avx Corporation | Refractory metal paste for solid electrolytic capacitors |
| US8441777B2 (en) * | 2009-05-29 | 2013-05-14 | Avx Corporation | Solid electrolytic capacitor with facedown terminations |
| US8279583B2 (en) * | 2009-05-29 | 2012-10-02 | Avx Corporation | Anode for an electrolytic capacitor that contains individual components connected by a refractory metal paste |
| US8218292B2 (en) * | 2009-07-31 | 2012-07-10 | Avx Corporation | Dry powder stencil printing of solid electrolytic capacitor components |
| US9409767B2 (en) | 2011-11-03 | 2016-08-09 | Intel Corporation | Energy storage structure, method of manufacturing a support structure for same, and microelectronic assembly and system containing same |
| US9299505B2 (en) | 2011-12-14 | 2016-03-29 | Intel Corporation | Overcoming variance in stacked capacitors |
| GB2505566A (en) | 2012-08-31 | 2014-03-05 | Avx Corp | Iterative screening method for electrolytic capacitors |
| US8816465B1 (en) | 2013-02-22 | 2014-08-26 | Intel Corporation | Energy conversion and storage device and mobile electronic device containing same |
| US9966196B2 (en) | 2015-03-23 | 2018-05-08 | Avx Corporation | Tantalum embedded microchip |
| WO2019156995A1 (en) | 2018-02-12 | 2019-08-15 | Avx Corporation | Solid electrolytic capacitor for a tantalum embedded microchip |
| WO2020106406A1 (en) | 2018-11-19 | 2020-05-28 | Avx Corporation | Solid electrolytic capacitor for a tantalum embedded microchip |
| US11448680B2 (en) | 2020-03-31 | 2022-09-20 | KYOCERA AVX Components Corporation | Screening method for electrolytic capacitors that maintains individual capacitor unit identity |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4164005A (en) * | 1977-09-02 | 1979-08-07 | Sprague Electric Company | Solid electrolyte capacitor, solderable terminations therefor and method for making |
| DE3636100A1 (de) * | 1986-10-23 | 1988-05-05 | Roederstein Kondensatoren | Festkoerperkondensator mit einem elektrisch leitfaehigen polymeren als bestandteil des festelektrolyten |
| JP2728099B2 (ja) * | 1989-05-15 | 1998-03-18 | 日本ケミコン株式会社 | 固体電解コンデンサ及びその製造方法 |
| JPH02301118A (ja) * | 1989-05-15 | 1990-12-13 | Nippon Chemicon Corp | 固体電解コンデンサの製造方法 |
| JPH04367212A (ja) * | 1991-06-14 | 1992-12-18 | Nec Corp | チップ型固体電解コンデンサの製造方法 |
| US5357399A (en) | 1992-09-25 | 1994-10-18 | Avx Corporation | Mass production method for the manufacture of surface mount solid state capacitor and resulting capacitor |
| JP3088907B2 (ja) * | 1994-07-05 | 2000-09-18 | エイ ブイ エックス コーポレイション | 固体コンデンサとその製作方法 |
| KR100244159B1 (ko) * | 1995-03-03 | 2000-02-01 | 사토 게니치로 | 고체전해콘덴서 및 그 제조방법 |
| JP3696341B2 (ja) * | 1996-08-30 | 2005-09-14 | ローム株式会社 | アレイ型固体電解コンデンサの構造及びその製造方法 |
| GB9824442D0 (en) | 1998-11-06 | 1999-01-06 | Avx Ltd | Manufacture of solid state capacitors |
-
2000
- 2000-07-07 EP EP00949695A patent/EP1194937B1/en not_active Expired - Lifetime
- 2000-07-07 JP JP2001512599A patent/JP4601230B2/ja not_active Expired - Fee Related
- 2000-07-07 KR KR1020027000276A patent/KR100634570B1/ko not_active Expired - Fee Related
- 2000-07-07 IL IL14746300A patent/IL147463A0/xx active IP Right Grant
- 2000-07-07 WO PCT/GB2000/002630 patent/WO2001008178A1/en not_active Ceased
- 2000-07-07 DE DE60014648T patent/DE60014648T2/de not_active Expired - Fee Related
- 2000-07-07 AU AU62971/00A patent/AU6297100A/en not_active Abandoned
- 2000-07-07 US US10/030,458 patent/US6751085B1/en not_active Expired - Fee Related
- 2000-07-07 CN CNB008100519A patent/CN1226759C/zh not_active Expired - Fee Related
- 2000-07-07 AT AT00949695T patent/ATE279013T1/de not_active IP Right Cessation
-
2002
- 2002-01-03 IL IL147463A patent/IL147463A/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR100634570B1 (ko) | 2006-10-17 |
| CN1360728A (zh) | 2002-07-24 |
| EP1194937A1 (en) | 2002-04-10 |
| EP1194937B1 (en) | 2004-10-06 |
| ATE279013T1 (de) | 2004-10-15 |
| WO2001008178A1 (en) | 2001-02-01 |
| DE60014648D1 (de) | 2004-11-11 |
| US6751085B1 (en) | 2004-06-15 |
| DE60014648T2 (de) | 2005-11-10 |
| KR20020038678A (ko) | 2002-05-23 |
| JP2003505879A (ja) | 2003-02-12 |
| AU6297100A (en) | 2001-02-13 |
| CN1226759C (zh) | 2005-11-09 |
| IL147463A0 (en) | 2002-08-14 |
| IL147463A (en) | 2006-08-01 |
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