JP4598416B2 - プラズマ処理方法 - Google Patents

プラズマ処理方法 Download PDF

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Publication number
JP4598416B2
JP4598416B2 JP2004069155A JP2004069155A JP4598416B2 JP 4598416 B2 JP4598416 B2 JP 4598416B2 JP 2004069155 A JP2004069155 A JP 2004069155A JP 2004069155 A JP2004069155 A JP 2004069155A JP 4598416 B2 JP4598416 B2 JP 4598416B2
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Japan
Prior art keywords
substrate
processed
plasma processing
plasma
container
Prior art date
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Expired - Fee Related
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JP2004069155A
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English (en)
Japanese (ja)
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JP2004304169A5 (enExample
JP2004304169A (ja
Inventor
義弘 柳
一郎 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2004069155A priority Critical patent/JP4598416B2/ja
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Publication of JP2004304169A5 publication Critical patent/JP2004304169A5/ja
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JP2004069155A 2003-03-18 2004-03-11 プラズマ処理方法 Expired - Fee Related JP4598416B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004069155A JP4598416B2 (ja) 2003-03-18 2004-03-11 プラズマ処理方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003073861 2003-03-18
JP2004069155A JP4598416B2 (ja) 2003-03-18 2004-03-11 プラズマ処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009033349A Division JP4697315B2 (ja) 2003-03-18 2009-02-17 プラズマ処理方法

Publications (3)

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JP2004304169A JP2004304169A (ja) 2004-10-28
JP2004304169A5 JP2004304169A5 (enExample) 2007-04-05
JP4598416B2 true JP4598416B2 (ja) 2010-12-15

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JP2004069155A Expired - Fee Related JP4598416B2 (ja) 2003-03-18 2004-03-11 プラズマ処理方法

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JP (1) JP4598416B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100683110B1 (ko) 2005-06-13 2007-02-15 삼성전자주식회사 플라즈마 형성 방법 및 이를 이용한 막 형성 방법
JP6333302B2 (ja) * 2016-03-30 2018-05-30 株式会社日立国際電気 半導体装置の製造方法、基板処理装置およびプログラム

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JP2004304169A (ja) 2004-10-28

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