JP4596323B2 - スペーサ付カバーガラスの洗浄方法 - Google Patents
スペーサ付カバーガラスの洗浄方法 Download PDFInfo
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- JP4596323B2 JP4596323B2 JP2005272389A JP2005272389A JP4596323B2 JP 4596323 B2 JP4596323 B2 JP 4596323B2 JP 2005272389 A JP2005272389 A JP 2005272389A JP 2005272389 A JP2005272389 A JP 2005272389A JP 4596323 B2 JP4596323 B2 JP 4596323B2
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- 238000004140 cleaning Methods 0.000 title claims description 142
- 125000006850 spacer group Chemical group 0.000 title claims description 118
- 239000006059 cover glass Substances 0.000 title claims description 92
- 238000000034 method Methods 0.000 title claims description 67
- 239000000853 adhesive Substances 0.000 claims description 66
- 230000001070 adhesive effect Effects 0.000 claims description 66
- 238000004380 ashing Methods 0.000 claims description 45
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 42
- 239000007788 liquid Substances 0.000 claims description 33
- 238000003384 imaging method Methods 0.000 claims description 28
- 239000000126 substance Substances 0.000 claims description 24
- 238000005530 etching Methods 0.000 claims description 21
- 239000011521 glass Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 18
- 238000001312 dry etching Methods 0.000 claims description 17
- 229920002120 photoresistant polymer Polymers 0.000 claims description 15
- 238000005108 dry cleaning Methods 0.000 claims description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 239000001301 oxygen Substances 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 11
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 11
- 238000005406 washing Methods 0.000 claims description 6
- 239000004744 fabric Substances 0.000 claims description 5
- 230000007613 environmental effect Effects 0.000 claims description 4
- 239000000428 dust Substances 0.000 claims description 2
- 230000010355 oscillation Effects 0.000 claims 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 25
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 20
- 230000006378 damage Effects 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 229910021529 ammonia Inorganic materials 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 230000007547 defect Effects 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000011086 high cleaning Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000013329 compounding Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- SWXQKHHHCFXQJF-UHFFFAOYSA-N azane;hydrogen peroxide Chemical compound [NH4+].[O-]O SWXQKHHHCFXQJF-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14685—Process for coatings or optical elements
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
が好ましい。これにより、スペーサ付カバーガラスの外表面側に付着している異物の大半を除去することができ、拭き取りで細分化されて残った異物は後工程のウェット洗浄で容易に除去することができる。
このアッシングは、スペーサ13上のフォトレジストRと、カバーガラス12上の接着剤13Aを除去する工程である。カバーガラス12上の接着剤13Aは、後工程(第1ウェット洗浄工程及び第2ウェット洗浄工程)で除去が困難であることより、このドライ洗浄(アッシング)において、完全に除去する必要がある。
Claims (7)
- 固体撮像装置に組み込まれる、スペーサが付いたスペーサ付カバーガラスの洗浄方法であって、
前記スペーサ付カバーガラスは、
ガラス基板にスペーサ基材を接着剤で貼付する工程と、
スペーサ基材にフォトレジストを塗布する工程と、
フォトマスクを用いてフォトレジストを露光及び現像してスペーサ基材上に前記スペーサに対応したエッチングマスクを形成する工程と、
スペーサ基材をドライエッチングしてガラス基板上にスペーサを形成する工程と、を含む工程によって製造されたものであり、
前記スペーサ付カバーガラスの洗浄方法は、
前記ドライエッチング後に行うドライ洗浄工程と、
ドライ洗浄工程の後に行う拭き取り洗浄工程と、
拭き取り洗浄工程の後に行う第1ウェット洗浄工程と、
第1ウェット洗浄工程の後に行う第2ウェット洗浄工程と、
を備え、
前記ドライ洗浄工程は、前記ドライエッチング後の前記スペーサ上のエッチングマスク及び前記ガラス基板上に露出した接着剤を酸素プラズマによりアッシングして除去する工程であり、
前記拭き取り洗浄工程は、有機溶剤を用いて前記スペーサ付カバーガラスのスペーサが形成されていない外表面側に付着している異物を拭き取り除去する工程であり、
前記第1ウェット洗浄工程は、前記酸素プラズマによるアッシングで除去しきれないドライエッチング残渣や環境異物をAPM洗浄液を用いて前記ガラス基板から浮遊させるAPM洗浄の工程であり、
前記第2ウェット洗浄工程は、純水超音波洗浄により異物を除去する工程であることを特徴とするスペーサ付カバーガラスの洗浄方法。 - 前記酸素プラズマによるアッシングは等方性アッシングとし、前記接着剤の水平方向アッシング量を5〜15μmに制御することを特徴とする請求項1に記載のスペーサ付カバーガラスの洗浄方法。
- 前記有機溶剤を用いた拭き取り洗浄工程では、無塵布に有機溶剤を染みこませ、前記スペーサ付カバーガラスの外表面側を少なくとも5回拭き取ることを特徴とする請求項1又は請求項2に記載のスペーサ付カバーガラスの洗浄方法。
- 前記APM洗浄の工程では、薬液温度を20〜45℃とし、950KHz以上の超音波振動の印加を併用することを特徴とする請求項1から3のうちいずれか1項に記載のスペーサ付カバーガラスの洗浄方法。
- 前記APM洗浄の薬液成分であるNH4OH、H2O2、H2Oの容積配合比を、1/20≦H2O2/H2O≦1/3、かつ1/10≦NH4OH/H2O2≦1/3とすることを特徴とする請求項1から4のうちいずれか1項に記載のスペーサ付カバーガラスの洗浄方法。
- 前記純水超音波洗浄により異物を除去する工程では、50KHz以下の低周波振動を印加し、純水温度を20〜35℃とすることを特徴とする請求項1から5のうちいずれか1項に記載のスペーサ付カバーガラスの洗浄方法。
- 前記第2ウェット洗浄工程の後に、温水引き上げ乾燥工程を設け、乾燥槽の水温を20〜35℃とすることを特徴とする請求項1から6のうちいずれか1項に記載のスペーサ付カバーガラスの洗浄方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005272389A JP4596323B2 (ja) | 2005-09-20 | 2005-09-20 | スペーサ付カバーガラスの洗浄方法 |
US11/523,502 US7501304B2 (en) | 2005-09-20 | 2006-09-20 | Method of cleaning cover glass having spacer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005272389A JP4596323B2 (ja) | 2005-09-20 | 2005-09-20 | スペーサ付カバーガラスの洗浄方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007083119A JP2007083119A (ja) | 2007-04-05 |
JP4596323B2 true JP4596323B2 (ja) | 2010-12-08 |
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JP2005272389A Expired - Fee Related JP4596323B2 (ja) | 2005-09-20 | 2005-09-20 | スペーサ付カバーガラスの洗浄方法 |
Country Status (2)
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US (1) | US7501304B2 (ja) |
JP (1) | JP4596323B2 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006100763A (ja) * | 2004-09-06 | 2006-04-13 | Fuji Photo Film Co Ltd | 固体撮像装置の製造方法及び接合装置 |
US20070157791A1 (en) * | 2005-12-21 | 2007-07-12 | Kenneth Mazursky | Methods for infusing matter with vibration |
US8716850B2 (en) * | 2007-05-18 | 2014-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
WO2011018110A1 (en) * | 2009-08-12 | 2011-02-17 | X-Fab Semiconductor Foundries Ag | Method of manufacturing an organic light emitting diode by lift-off |
JP2013004126A (ja) * | 2011-06-14 | 2013-01-07 | Alphana Technology Co Ltd | ディスク駆動装置の製造方法及びその製造方法により生産されたディスク駆動装置 |
US10131574B2 (en) * | 2013-06-17 | 2018-11-20 | Corning Incorporated | Antimicrobial glass articles and methods of making and using same |
KR102374310B1 (ko) * | 2017-11-09 | 2022-03-15 | 후지필름 가부시키가이샤 | 장치, 유기층 형성용 조성물 |
CN115650595B (zh) * | 2022-10-20 | 2024-04-26 | 济宁海富光学科技有限公司 | 玻璃盖板成型方法、成型设备及可存储介质 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002082211A (ja) * | 2000-06-08 | 2002-03-22 | Canon Inc | 光学素子の製造方法 |
JP2004296740A (ja) * | 2003-03-26 | 2004-10-21 | Fuji Photo Film Co Ltd | 固体撮像装置及び固体撮像装置の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07202152A (ja) | 1993-12-28 | 1995-08-04 | Olympus Optical Co Ltd | 固体撮像装置 |
JP2002231921A (ja) | 2001-02-06 | 2002-08-16 | Olympus Optical Co Ltd | 固体撮像装置及びその製造方法 |
KR100506816B1 (ko) * | 2003-01-06 | 2005-08-09 | 삼성전자주식회사 | 반도체 장치 커패시터의 하부 전극 및 이를 형성하기 위한방법 |
JP2005159295A (ja) * | 2003-09-18 | 2005-06-16 | Nec Kagoshima Ltd | 基板処理装置及び処理方法 |
KR100606187B1 (ko) * | 2004-07-14 | 2006-08-01 | 테크노세미켐 주식회사 | 반도체 기판 세정용 조성물, 이를 이용한 반도체 기판세정방법 및 반도체 장치 제조 방법 |
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2005
- 2005-09-20 JP JP2005272389A patent/JP4596323B2/ja not_active Expired - Fee Related
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2006
- 2006-09-20 US US11/523,502 patent/US7501304B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002082211A (ja) * | 2000-06-08 | 2002-03-22 | Canon Inc | 光学素子の製造方法 |
JP2004296740A (ja) * | 2003-03-26 | 2004-10-21 | Fuji Photo Film Co Ltd | 固体撮像装置及び固体撮像装置の製造方法 |
Also Published As
Publication number | Publication date |
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US7501304B2 (en) | 2009-03-10 |
JP2007083119A (ja) | 2007-04-05 |
US20070072392A1 (en) | 2007-03-29 |
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