JP4594114B2 - 画像処理装置および屈折率分布測定装置 - Google Patents

画像処理装置および屈折率分布測定装置 Download PDF

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Publication number
JP4594114B2
JP4594114B2 JP2005012174A JP2005012174A JP4594114B2 JP 4594114 B2 JP4594114 B2 JP 4594114B2 JP 2005012174 A JP2005012174 A JP 2005012174A JP 2005012174 A JP2005012174 A JP 2005012174A JP 4594114 B2 JP4594114 B2 JP 4594114B2
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Japan
Prior art keywords
refractive index
index distribution
distribution data
image
image processing
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Japanese (ja)
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JP2006200999A (ja
JP2006200999A5 (enExample
Inventor
保宏 沢田
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Canon Inc
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Canon Inc
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Priority to JP2005012174A priority Critical patent/JP4594114B2/ja
Priority to US11/335,393 priority patent/US7388676B2/en
Publication of JP2006200999A publication Critical patent/JP2006200999A/ja
Publication of JP2006200999A5 publication Critical patent/JP2006200999A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0228—Testing optical properties by measuring refractive power
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2005012174A 2005-01-19 2005-01-19 画像処理装置および屈折率分布測定装置 Expired - Fee Related JP4594114B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005012174A JP4594114B2 (ja) 2005-01-19 2005-01-19 画像処理装置および屈折率分布測定装置
US11/335,393 US7388676B2 (en) 2005-01-19 2006-01-18 Image processing apparatus and refractive index distribution measuring apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005012174A JP4594114B2 (ja) 2005-01-19 2005-01-19 画像処理装置および屈折率分布測定装置

Publications (3)

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JP2006200999A JP2006200999A (ja) 2006-08-03
JP2006200999A5 JP2006200999A5 (enExample) 2008-03-06
JP4594114B2 true JP4594114B2 (ja) 2010-12-08

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JP2005012174A Expired - Fee Related JP4594114B2 (ja) 2005-01-19 2005-01-19 画像処理装置および屈折率分布測定装置

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US (1) US7388676B2 (enExample)
JP (1) JP4594114B2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5008650B2 (ja) * 2008-12-25 2012-08-22 キヤノン株式会社 屈折率分布計測方法及び屈折率分布計測装置
JP5328437B2 (ja) 2009-03-25 2013-10-30 キヤノン株式会社 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置
JP4968965B2 (ja) 2009-11-18 2012-07-04 キヤノン株式会社 屈折率分布の計測方法および計測装置
JP4968966B2 (ja) 2009-12-07 2012-07-04 キヤノン株式会社 屈折率分布の計測方法および計測装置
JP4895409B2 (ja) * 2010-05-25 2012-03-14 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5021054B2 (ja) 2010-05-25 2012-09-05 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5594834B2 (ja) * 2010-09-30 2014-09-24 パナソニック デバイスＳｕｎｘ株式会社 分光分析装置
JP5008763B2 (ja) 2010-12-03 2012-08-22 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置および光学素子の製造方法
US8687204B2 (en) * 2011-03-24 2014-04-01 Canon Kabushiki Kaisha Method and apparatus for measuring refractive index based on a ratio between a number of second fringes divided by a difference of the number of second fringes minus a number of first fringes
US9297702B2 (en) * 2011-05-10 2016-03-29 Phase Sensitive Innovations, Inc. Coherence switching
JP5871601B2 (ja) * 2011-12-15 2016-03-01 キヤノン株式会社 被検光学系の収差を算出する装置、方法およびトールボット干渉計
JP5575161B2 (ja) * 2012-02-10 2014-08-20 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP6157240B2 (ja) * 2013-06-28 2017-07-05 キヤノン株式会社 屈折率計測方法、屈折率計測装置および光学素子の製造方法
JP6207383B2 (ja) * 2013-12-25 2017-10-04 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置、及び光学素子の製造方法
JP6320093B2 (ja) * 2014-03-14 2018-05-09 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置、光学素子の製造方法、プログラム、および、記憶媒体
JP2017003434A (ja) * 2015-06-10 2017-01-05 キヤノン株式会社 屈折率の計測方法、計測装置、光学素子の製造方法
CN114270177B (zh) * 2019-12-12 2024-03-15 仪景通株式会社 试样结构测量装置及试样结构测量方法
WO2022195731A1 (ja) * 2021-03-16 2022-09-22 株式会社エビデント 推定装置、推定システム、推定方法、及び記録媒体
CN117789041B (zh) * 2024-02-28 2024-05-10 浙江华是科技股份有限公司 一种基于大气散射先验扩散模型的船舶去雾方法及系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3264469B2 (ja) * 1993-12-07 2002-03-11 富士写真フイルム株式会社 光散乱媒体の屈折率分布情報の計測装置
JP3423486B2 (ja) * 1994-08-29 2003-07-07 株式会社リコー 光学素子の屈折率分布の測定方法および装置
JPH08304229A (ja) * 1995-05-09 1996-11-22 Ricoh Co Ltd 光学素子の屈折率分布の測定方法および装置
JP3617916B2 (ja) * 1997-12-02 2005-02-09 株式会社リコー シアリング干渉計
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
US7896916B2 (en) * 2002-11-29 2011-03-01 Amo Groningen B.V. Multifocal ophthalmic lens

Also Published As

Publication number Publication date
JP2006200999A (ja) 2006-08-03
US20060159332A1 (en) 2006-07-20
US7388676B2 (en) 2008-06-17

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