JP4590771B2 - IC compression resin rotary compression molding machine - Google Patents

IC compression resin rotary compression molding machine Download PDF

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Publication number
JP4590771B2
JP4590771B2 JP2001111567A JP2001111567A JP4590771B2 JP 4590771 B2 JP4590771 B2 JP 4590771B2 JP 2001111567 A JP2001111567 A JP 2001111567A JP 2001111567 A JP2001111567 A JP 2001111567A JP 4590771 B2 JP4590771 B2 JP 4590771B2
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Prior art keywords
sealing resin
turntable
compression molding
molding machine
flow path
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JP2002307429A (en
Inventor
邦彦 橘
義夫 川北
嘉公 結城
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B11/00Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses
    • B30B11/005Control arrangements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B11/00Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses
    • B30B11/02Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses using a ram exerting pressure on the material in a moulding space
    • B30B11/08Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses using a ram exerting pressure on the material in a moulding space co-operating with moulds carried by a turntable

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Description

【0001】
【発明の属する技術分野】
この発明は、IC封止樹脂のロータリー式圧縮成形機に関するもので、特に最低溶融粘度の低いIC封止樹脂パウダー(以下、単にパウダーと略記)を圧縮成形するロータリー式圧縮成形機に関する。
【0002】
【従来の技術】
現在、圧縮成形されたタブレットの利用分野の一翼として半導体チップの封止用が挙げられ、このタブレットの圧縮成形にロータリー式圧縮成形機が広く用いられている。近年、半導体チップはますます小型化、薄型化されてきており、半導体素子封止において求められる特性の1つに流動性の良い、溶融しやすいものが要求されてきている。
【0003】
一般的にエポキシ樹脂系IC封止樹脂は2軸混練機を使用し、70〜110℃で溶融状態にしながら混練する。ビフェニルエポキシ樹脂型IC封止樹脂の場合、一般的に粘度が低いため溶融混練時に発熱による望ましからぬエポキシ硬化反応が進行しにくい。そのため、得られたパウダーの軟化点が低く、封止樹脂の圧縮成形においては、ターンテーブルとパウダー流路制御用堰板部品の接触面による摩擦熱や、これらの隙間に入り込んだパウダーの接触により、パウダーのターンテーブルや流路制御用堰板部品への融着が起こりやすい。
【0004】
融着が発生すると、パウダーの供給が不安定となり、杵圧変動を激しくさせ、不良品を増加させたり、ターンテーブルと流路制御用堰板部品との隙間を大きくさせパウダー漏れを発生させるなど、生産歩留まりを低下させる。この融着を防止するために、金型、上、下パンチを冷却しても、ターンテーブルの回転速度を下げる、すなわち生産性を犠牲にするなどの対応をせざるを得ない状況となっている。また、パウダーの隙間への入り込みや漏れを防止するために接触面にフェルトなどを貼付するといった対応をとっていた。
【0005】
ここで金型、上パンチ、下パンチを冷却する方法では、上パンチおよび下パンチはターンテーブルと同期して回転動作しており、かつ金型、上パンチ、下パンチはターンテーブルに複数個設置されていることもあり、金型、上パンチ、下パンチの直接冷却は難しい。また、金型はターンテーブルに組み込まれており、金型を冷却することがターンテーブルも冷却されることとなり、その結果ターンテーブル上にあるパウダーも冷却されることになる。この場合、パウダーと成形室内の温度差から、パウダーが結露するなどの品質への影響にもつながるおそれがある。
【0006】
また、ターンテーブルの回転速度を低下させることは、上述したように生産性を低下させる方法にほかならない。さらに、接触部分においてフェルトなどの材質では摩耗性が激しく高速化にも不向きである。
【0007】
これまでタブレット形状や充填率について安定した生産を行うため、ターンテーブルと流路制御用堰板部品の接触部分を大きくしたものを使用していたが、上述したように溶融粘度の低いIC封止樹脂では融着発生頻度が高いため、発生後は生産を停機し、融着物を除去した後再生産を行う方法を繰り返すことで対応していた。また、ターンテーブルと流路制御用堰板部品の接触部分をなくした場合、融着は発生しなくなるが、パウダーの供給量によって漏れや金型への充填不具合などタブレット形状や充填率に影響を及ぼすこともあり、パウダー供給調整を頻繁に行う必要があった。
【0008】
【発明が解決しようとする課題】
本発明は、このような事情に鑑みてなされたもので、流動性の良い、溶融しやすいIC封止樹脂に対し、ターンテーブルや流路制御用堰板部品への融着を防止でき、安定した成形を可能としたロータリー式圧縮成形機を提供することを目的とする。
【0009】
【課題を解決するための手段】
上記目的を達成するため、本発明は、以下の構成を採用する。すなわち、
(1)IC封止樹脂パウダーを連続的に供給して圧縮成形するロータリー式圧縮成形機において、機器に固定したIC封止樹脂パウダー流路制御用堰板部品(不動部分)とターンテーブルとの接触面積が(3〜20)×10-32 、接触部分以外の隙間が3mm以下であり、かつ金型内での下パンチ下降最下点において流路制御用堰板部品内にある堰板が少なくとも1枚設置されており、かつターンテーブルの外周速度が0.2〜2m/秒であることを特徴とするIC封止樹脂のロータリー式圧縮成形機。
【0010】
(2)IC封止樹脂パウダーが、高化式フローテスターで測定した175℃の最低溶融粘度が5〜30Pa・sのビフェニルエポキシ樹脂組成物からなることを特徴とする前記(1)記載のIC封止樹脂のロータリー式圧縮成形機。
【0011】
(3)IC封止樹脂パウダー流路制御用堰板部品のターンテーブルとの接触部分の材質がカーボンファイバーであることを特徴とする前記(1)または(2)記載のIC封止樹脂のロータリー式圧縮成形機である。
【0012】
【発明の実施の形態】
以下、本発明に係るIC封止樹脂のロータリー式圧縮成形機の実施の形態について説明する。
【0013】
図1は本発明に係るIC封止樹脂のロータリー式圧縮成形機の構成の一例を示す縦断面図であり、図2は図1に示すIC封止樹脂のロータリー式圧縮成形機の流路制御用堰板部品周辺の平面図である。
【0014】
図1はIC封止樹脂のロータリー式圧縮成形機の構成を示すもので、ターンテーブル1に金型(臼)2が組み込まれており、この金型2に上下からパウダーを圧縮する上パンチ3および下パンチ4がそれぞれの本圧ロールカム機構(図示せず)によって一定のストロークで上下動が行えるように設置されている。ここで、ターンテーブル1、およびそれに組み込まれている金型2、さらに上パンチ3、下パンチ4は、図2に示す回転盤10と接続されており、図1では左から右方向、図2では回転盤10を中心として反時計回転方向に動いている。
【0015】
また、流路制御用堰板部品5、パウダーホッパー6は成形機本体に固定されているとともに、堰板7および擦り切り板8は流路制御用堰板部品5に固定されており、パウダーを金型2内に充填する機能となっている。
【0016】
また、パウダーホッパー6からターンテーブル1上にある流路制御用堰板部品5内に連続的に供給されるパウダーは、ターンテーブル1の回転運動により、流路制御用堰板部品5内の堰板7およびその後部に取り付けられた擦り切り板8によって堰き止められ、金型2内に案内されるようになっている。ここで、金型2内での下パンチ下降最下点において流路制御用堰板部品5内にある堰板7が少なくとも1枚(あるいは1対)設置されている構造となっており、これが充填性を高めている。その後、下パンチ4の上昇および上パンチ3の下降により圧縮成形され、下パンチ4の上昇によりターンテーブル1上にタブレットが押し出される。
【0017】
ところで、本発明の特徴は、ターンテーブル1に接触している流路制御用堰板部品5ならびにその内部に設置されている堰板7の接触部分を減少させており、その接触面には具体例としてフェルトやセラミックス、ガラスファイバー、カーボンファイバーなどを貼り付けるものであるが、特にカーボンファイバーの貼付が好ましい。これらの方法により摩擦熱の低下ならびに摩耗性の低減が可能となり、パウダーの融着のみならず隙間への入り込みや漏れを防止し、金型2への充填を円滑に行うことができることから安定した圧縮成形を可能にしたものである。
【0018】
ここで、流路制御用堰板部品5および堰板7と、ターンテーブルとの接触面積は(3〜20)×10-32の範囲であり、実用上は(4〜10)×10-32の範囲が好ましい。20×10-32を越えると融着防止ができず、3×10-32未満では融着抑制は可能であるが、原料パウダーの漏れや金型への充填不具合などタブレット形状や充填率に影響を及ぼしてしまう。また、接触部分以外の隙間は3mm以下であり、これより大きいと隙間がパウダー粒子径より大きくなりすぎるため、パウダー漏れが発生したり、金型2へ充填性を高める抵抗力が低下してしまう。なお、接触面積とはターンテーブルと流路制御用堰板部品および堰板の接触部分の面積、つまりカーボンファイバーなど接触面に貼付するものの面積となる。接触部分以外の隙間とはターンテーブルと流路制御用堰板部品および堰板の非接触部分における空間寸法であり、カーボンファイバーなど接触面に貼付するものの厚み分に相当する。
【0019】
また、ターンテーブルの外周速度は0.2〜2m/秒の範囲であり、好ましくは0.4〜1.2m/秒の範囲である。0.2m/秒未満では生産性が著しく低下することとなり、2m/秒を越えると高速のためパウダー供給および金型2への充填にバラツキが発生することや、接触部分の摩擦熱の低下や摩耗性の低減につながらない。
【0020】
本発明で用いるIC封止樹脂組成物とは、エポキシ樹脂、フェノール硬化剤、硬化促進剤、シリカを主成分とする通常のエポキシ樹脂系IC封止樹脂などを意味する。本発明のエポキシ樹脂とは1分子中に2個以上のエポキシ基を有する化合物であれば特に限定されない。エポキシ樹脂の具体例としては、クレゾールノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、フェノールアラルキル型エポキシ樹脂、ジシクロペンタジエン骨格含有エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、鎖状脂肪族エポキシ樹脂、脂環式エポキシ樹脂、複素環式エポキシ樹脂、スピロ環含有エポキシ樹脂およびハロゲン化エポキシ樹脂、4,4´−ビス(2,3−エポキシプロポキシ)ビフェニル、4,4´−ビス(2,3−エポキシプロポキシ)−3,3´,5,5´−テトラメチルビフェニル、4,4´−ビス(2,3−エポキシプロポキシ)−3,3´,5,5´−テトラエチルビフェニル、4,4´−ビス(2,3−エポキシプロポキシ)−3,3´,5,5´−テトラメチル−2−クロロビフェニルなどのビフェニル型エポキシ樹脂、1,5−ジ(2,3−エポキシプロポキシ)ナフタレン、1,6−ジ(2,3−エポキシプロポキシ)ナフタレン、ナフトールアラルキル型エポキシ樹脂などが挙げられる。
【0021】
この中で特に本発明の効果を著しく発現できるエポキシ樹脂は4,4´−ビス(2,3−エポキシプロポキシ)ビフェニル、4,4´−ビス(2,3−エポキシプロポキシ)−3,3´,5,5´−テトラメチルビフェニル、4,4´−ビス(2,3−エポキシプロポキシ)−3,3´,5,5´−テトラエチルビフェニル、4,4´−ビス(2,3−エポキシプロポキシ)−3,3´,5,5´−テトラメチル−2−クロロビフェニルなどのビフェニル型エポキシ樹脂である。
【0022】
IC封止樹脂パウダーの最低溶融粘度は配合成分の組成比率、および製造条件で調整できる。高化式フローテスターで測定した175℃での最低溶融粘度が5〜30Pa・sの場合に特に本発明の効果を発現できる。最低溶融粘度が5Pa・s未満では接触部の融着発生頻度が多く、30Pa・sを越えたものでは本発明の効果がわかりにくい。
【0023】
【実施例】
以下、実施例により本発明を具体的に説明する。
【0024】
IC封止樹脂に最低溶融粘度が各々10Pa・s、25Pa・sのビフェニル型エポキシ樹脂を使用し、ターンテーブルと流路制御用堰板部品との接触面積を表1に示したもので実験を行い本発明の効果を確認した。なお、これらを評価するにあたり以下の方法で行った。
パウダー供給調整回数:タブレット生産を行っている際に、パウダー漏れや金型への充填性悪化などにより杵圧変動が激しくなり、不良品が増加することからやむなくロータリー式圧縮成形機を停機させ、パウダー供給調整を行った回数(回/8hr)を表した。
融着発生頻度:タブレット生産中に、ロータリー式圧縮成形機を停機せざるをえない程度の融着が発生した回数(回/日)を表した。
【0025】
【表1】

Figure 0004590771
【0026】
表1に見られるように、実施例1〜4ではパウダー供給調整、融着発生もほとんどなく、生産性に非常に優れていることがわかる。
【0027】
これに対して表1の比較例1〜6では、パウダー供給調整、あるいは融着発生において著しく劣っていることがわかる。
【0028】
【発明の効果】
本発明は、以上のような構成により、ターンテーブルと流路制御用堰板部品との接触部分における摩擦熱の低下ならびに摩耗性の低減がなされており、IC封止樹脂パウダーの融着のみならず隙間への入り込みや漏れを防止し、金型への充填を円滑に行うことが可能になるという効果を有する。そのため、生産性にもすぐれ、安定した圧縮成形を可能にする。
【図面の簡単な説明】
【図1】本発明に係るIC封止樹脂のロータリー式圧縮成形機の構成の一例を示す縦断面図である。
【図2】図1に示すIC封止樹脂のロータリー式圧縮成形機の流路制御用堰板部品周辺の平面図である。
【符号の説明】
1:ターンテーブル
2:金型
3:上パンチ
4:下パンチ
5:流路制御用堰板部品
6:パウダーホッパー
7:堰板
8:擦り切り板
9:カーボンファイバー
10:回転盤[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a rotary compression molding machine for IC sealing resin, and particularly to a rotary compression molding machine for compression molding an IC sealing resin powder having a low minimum melt viscosity (hereinafter simply abbreviated as powder).
[0002]
[Prior art]
Currently, one of the fields of application of compression-molded tablets is for sealing semiconductor chips, and rotary compression molding machines are widely used for compression molding of tablets. In recent years, semiconductor chips have been increasingly reduced in size and thickness, and one of the characteristics required for sealing semiconductor elements has been required to have good fluidity and easily melt.
[0003]
Generally, an epoxy resin-based IC sealing resin is kneaded using a biaxial kneader while being melted at 70 to 110 ° C. In the case of a biphenyl epoxy resin type IC sealing resin, since the viscosity is generally low, an undesirable epoxy curing reaction due to heat generation during melt kneading hardly proceeds. Therefore, the softening point of the obtained powder is low, and in compression molding of sealing resin, it is caused by frictional heat from the contact surface between the turntable and the weir plate part for controlling the powder flow path, or contact of powder that has entered these gaps. The powder is likely to be fused to the turntable and the flow path control weir plate component.
[0004]
When fusing occurs, the powder supply becomes unstable, causing drastic fluctuations, increasing the number of defective products, and increasing the gap between the turntable and the flow path control weir plate parts, causing powder leakage, etc. , Reduce production yield. In order to prevent this fusion, even if the mold, upper and lower punches are cooled, it is necessary to take measures such as reducing the rotation speed of the turntable, that is, sacrificing productivity. Yes. In addition, in order to prevent the powder from entering the gap or leaking, a measure such as attaching felt to the contact surface has been taken.
[0005]
Here, in the method of cooling the mold, the upper punch, and the lower punch, the upper punch and the lower punch rotate in synchronization with the turntable, and a plurality of molds, upper punches, and lower punches are installed on the turntable. In some cases, direct cooling of the mold, upper punch, and lower punch is difficult. In addition, since the mold is incorporated in the turntable, cooling the mold also cools the turntable, and as a result, the powder on the turntable is also cooled. In this case, the temperature difference between the powder and the molding chamber may lead to an influence on quality such as powder condensation.
[0006]
Moreover, reducing the rotation speed of the turntable is nothing but a method for reducing productivity as described above. Furthermore, a material such as felt at the contact portion is extremely wearable and unsuitable for speeding up.
[0007]
Until now, in order to perform stable production with regard to tablet shape and filling rate, we used a larger contact part between the turntable and the flow path control weir plate part. As mentioned above, IC sealing with a low melt viscosity is used. Since the frequency of occurrence of fusion is high in the resin, it has been dealt with by repeating the method of stopping the production after the occurrence and removing the fusion product and then performing the reproduction. Also, if the contact area between the turntable and the flow path control weir plate component is eliminated, fusion will not occur, but the amount of powder supplied will affect the tablet shape and filling rate, such as leakage and filling defects in the mold. It was necessary to adjust the powder supply frequently.
[0008]
[Problems to be solved by the invention]
The present invention has been made in view of such circumstances, and is capable of preventing fusion to a turntable or a flow path control dam plate component with respect to an IC sealing resin having good fluidity and easy to melt, and is stable. An object of the present invention is to provide a rotary compression molding machine that can perform the above molding.
[0009]
[Means for Solving the Problems]
In order to achieve the above object, the present invention adopts the following configuration. That is,
(1) In a rotary compression molding machine that continuously supplies IC sealing resin powder and performs compression molding, the IC sealing resin powder flow path control weir plate part (non-moving part) fixed to the device and the turntable The contact area is (3-20) × 10 −3 m 2 , the gap other than the contact part is 3 mm or less, and the weir in the flow path control weir plate component at the lowest point of the lower punch in the mold A rotary compression molding machine for IC sealing resin, wherein at least one plate is installed and the outer peripheral speed of the turntable is 0.2 to 2 m / sec.
[0010]
(2) The IC as described in (1) above, wherein the IC sealing resin powder is composed of a biphenyl epoxy resin composition having a minimum melt viscosity of 175 ° C. of 5 to 30 Pa · s measured with a Koka flow tester. Rotary compression molding machine for sealing resin.
[0011]
(3) The IC sealing resin rotary according to (1) or (2) above, wherein the material of the contact portion with the turntable of the IC sealing resin powder flow path control weir plate component is carbon fiber This is a compression compression molding machine.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of a rotary compression molding machine for IC sealing resin according to the present invention will be described below.
[0013]
FIG. 1 is a longitudinal sectional view showing an example of the configuration of an IC sealing resin rotary compression molding machine according to the present invention, and FIG. 2 is a flow path control of the IC sealing resin rotary compression molding machine shown in FIG. It is a top view around a dam plate component.
[0014]
FIG. 1 shows a configuration of a rotary compression molding machine for IC sealing resin. A mold (mortar) 2 is incorporated in a turntable 1 and an upper punch 3 for compressing powder from above and below in the mold 2. And the lower punch 4 is installed so that it can move up and down with a fixed stroke by each main pressure roll cam mechanism (not shown). Here, the turntable 1, the mold 2 incorporated therein, and the upper punch 3 and the lower punch 4 are connected to the turntable 10 shown in FIG. 2, and in FIG. 1, from left to right, FIG. Then, it is moving in the counterclockwise direction around the rotating disk 10.
[0015]
Further, the flow path control dam plate component 5 and the powder hopper 6 are fixed to the molding machine body, and the dam plate 7 and the scraping plate 8 are fixed to the flow path control dam plate component 5 so that the powder is made of gold. The function is to fill the mold 2.
[0016]
Further, the powder continuously supplied from the powder hopper 6 into the flow path control dam plate component 5 on the turntable 1 is damped in the flow path control dam plate component 5 by the rotational movement of the turntable 1. The plate 7 and a scraping plate 8 attached to the rear portion of the plate 7 are dammed up and guided into the mold 2. Here, at least one dam plate 7 in the flow path control dam plate component 5 is installed at the lowest point where the lower punch descends in the mold 2. Improves fillability. Thereafter, compression molding is performed by raising the lower punch 4 and lowering the upper punch 3, and the tablet is pushed onto the turntable 1 by raising the lower punch 4.
[0017]
By the way, the feature of the present invention is that the flow rate control weir plate component 5 in contact with the turntable 1 and the contact portion of the weir plate 7 installed in the inside are reduced. For example, felt, ceramics, glass fiber, carbon fiber or the like is pasted, and carbon fiber is particularly preferred. By these methods, it is possible to reduce frictional heat and wear resistance, prevent not only powder fusion but also entry into the gap and leakage, and stable filling from the mold 2 It enables compression molding.
[0018]
Here, the contact area between the flow path control dam plate component 5 and the dam plate 7 and the turntable is in the range of (3 to 20) × 10 −3 m 2 , and practically (4 to 10) × 10. A range of −3 m 2 is preferred. If it exceeds 20 × 10 −3 m 2 , the fusion cannot be prevented, and if it is less than 3 × 10 −3 m 2 , the fusion can be suppressed. This will affect the filling rate. Further, the gap other than the contact portion is 3 mm or less, and if it is larger than this, the gap becomes too larger than the powder particle diameter, so that powder leakage occurs or the resistance force to improve the filling property to the mold 2 is reduced. . The contact area is the area of the contact portion between the turntable, the flow path control dam plate component and the dam plate, that is, the area of what is attached to the contact surface such as carbon fiber. The gap other than the contact portion is a space dimension in the non-contact portion of the turntable, the flow path control dam plate component, and the dam plate, and corresponds to the thickness of what is attached to the contact surface such as carbon fiber.
[0019]
Moreover, the outer peripheral speed of the turntable is in the range of 0.2 to 2 m / sec, preferably in the range of 0.4 to 1.2 m / sec. If the speed is less than 0.2 m / sec, the productivity is remarkably reduced. If the speed exceeds 2 m / sec, the powder supply and filling into the mold 2 may vary due to the high speed, and the frictional heat at the contact portion may decrease. Does not lead to reduced wear.
[0020]
The IC sealing resin composition used in the present invention means an epoxy resin, a phenol curing agent, a curing accelerator, a normal epoxy resin-based IC sealing resin mainly composed of silica, and the like. The epoxy resin of the present invention is not particularly limited as long as it is a compound having two or more epoxy groups in one molecule. Specific examples of the epoxy resin include a cresol novolak type epoxy resin, a phenol novolak type epoxy resin, a phenol aralkyl type epoxy resin, a dicyclopentadiene skeleton-containing epoxy resin, a triphenylmethane type epoxy resin, a bisphenol A type epoxy resin, and a bisphenol F type. Epoxy resin, chain aliphatic epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin, spiro ring-containing epoxy resin and halogenated epoxy resin, 4,4'-bis (2,3-epoxypropoxy) biphenyl, 4 , 4'-bis (2,3-epoxypropoxy) -3,3 ', 5,5'-tetramethylbiphenyl, 4,4'-bis (2,3-epoxypropoxy) -3,3', 5 5'-tetraethylbiphenyl, 4,4'-bis (2,3-epoxy propo Xy) -3,3 ′, 5,5′-tetramethyl-2-chlorobiphenyl and the like, 1,5-di (2,3-epoxypropoxy) naphthalene, 1,6-di (2, 3-epoxypropoxy) naphthalene, naphthol aralkyl type epoxy resin and the like.
[0021]
Among these, the epoxy resins that can remarkably exhibit the effects of the present invention are 4,4′-bis (2,3-epoxypropoxy) biphenyl and 4,4′-bis (2,3-epoxypropoxy) -3,3 ′. , 5,5'-tetramethylbiphenyl, 4,4'-bis (2,3-epoxypropoxy) -3,3 ', 5,5'-tetraethylbiphenyl, 4,4'-bis (2,3-epoxy (Propoxy) -3,3 ', 5,5'-tetramethyl-2-chlorobiphenyl and other biphenyl type epoxy resins.
[0022]
The minimum melt viscosity of the IC sealing resin powder can be adjusted by the composition ratio of the blending components and the production conditions. The effect of the present invention can be exhibited particularly when the minimum melt viscosity at 175 ° C. measured with a Koka flow tester is 5 to 30 Pa · s. When the minimum melt viscosity is less than 5 Pa · s, the frequency of occurrence of fusion at the contact portion is high, and when it exceeds 30 Pa · s, the effect of the present invention is difficult to understand.
[0023]
【Example】
Hereinafter, the present invention will be described specifically by way of examples.
[0024]
Using biphenyl type epoxy resin with a minimum melt viscosity of 10 Pa · s and 25 Pa · s respectively for the IC sealing resin, the contact area between the turntable and the flow path control weir plate component is shown in Table 1 for experiments. The effect of the present invention was confirmed. In evaluating these, the following method was used.
Number of powder supply adjustments: During tablet production, the pressure fluctuation fluctuates severely due to powder leakage and deterioration of mold filling properties, etc., and the number of defective products increases. The number of times powder supply adjustment was performed (times / 8 hr) was shown.
Frequency of fusion occurrence: This represents the number of times (times / day) that fusion occurred so that the rotary compression molding machine had to be stopped during tablet production.
[0025]
[Table 1]
Figure 0004590771
[0026]
As can be seen from Table 1, in Examples 1 to 4, there is almost no powder supply adjustment and no fusing, and it is understood that the productivity is very excellent.
[0027]
On the other hand, in Comparative Examples 1-6 of Table 1, it turns out that it is remarkably inferior in powder supply adjustment or fusion | melting generation | occurrence | production.
[0028]
【The invention's effect】
According to the present invention, with the above configuration, the frictional heat is reduced and the wear resistance is reduced at the contact portion between the turntable and the flow path control dam plate component. Therefore, it is possible to prevent entry into the gap and leakage, and to fill the mold smoothly. Therefore, it is excellent in productivity and enables stable compression molding.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view showing an example of the configuration of a rotary compression molding machine for IC sealing resin according to the present invention.
FIG. 2 is a plan view of the periphery of a flow path control weir plate component of the IC compression resin rotary compression molding machine shown in FIG. 1;
[Explanation of symbols]
1: Turntable 2: Mold 3: Upper punch 4: Lower punch 5: Flow path control weir plate part 6: Powder hopper 7: Weir plate 8: Fraying plate 9: Carbon fiber 10: Turntable

Claims (3)

IC封止樹脂パウダーを連続的に供給して圧縮成形するロータリー式圧縮成形機において、機器に固定したIC封止樹脂パウダー流路制御用堰板部品とターンテーブルとの接触面積が(3〜20)×10-32 、接触部分以外の隙間が3mm以下であり、かつ金型内での下パンチ下降最下点において流路制御用堰板部品内にある堰板が少なくとも1枚設置されており、かつターンテーブルの外周速度が0.2〜2m/秒であることを特徴とするIC封止樹脂のロータリー式圧縮成形機。In a rotary compression molding machine that continuously compresses and molds IC sealing resin powder, the contact area between the IC sealing resin powder flow path control weir plate component fixed to the device and the turntable is (3 to 20). ) × 10 −3 m 2 , the gap other than the contact part is 3 mm or less, and at least one dam plate in the flow path control dam plate component is installed at the lowest point of lowering the lower punch in the mold. A rotary compression molding machine for IC sealing resin, characterized in that the outer peripheral speed of the turntable is 0.2 to 2 m / sec. IC封止樹脂パウダーが、高化式フローテスターで測定した175℃の最低溶融粘度が5〜30Pa・sのビフェニルエポキシ樹脂組成物からなることを特徴とする請求項1に記載のIC封止樹脂のロータリー式圧縮成形機。2. The IC sealing resin according to claim 1, wherein the IC sealing resin powder is composed of a biphenyl epoxy resin composition having a minimum melt viscosity at 175 ° C. of 5 to 30 Pa · s measured with a Koka flow tester. Rotary compression molding machine. IC封止樹脂パウダー流路制御用堰板部品のターンテーブルとの接触部分の材質がカーボンファイバーであることを特徴とする請求項1または2に記載のIC封止樹脂のロータリー式圧縮成形機。The rotary compression molding machine for IC sealing resin according to claim 1 or 2, wherein the material of the contact portion of the IC sealing resin powder flow path control weir plate part with the turntable is carbon fiber.
JP2001111567A 2001-04-10 2001-04-10 IC compression resin rotary compression molding machine Expired - Lifetime JP4590771B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51123286U (en) * 1975-04-01 1976-10-06
JPS63130298A (en) * 1986-11-18 1988-06-02 Teikoku Hormone Mfg Co Ltd Feed shoe for tablet making machine
JPH0498398U (en) * 1991-01-25 1992-08-25
JPH0623694U (en) * 1991-08-28 1994-03-29 株式会社菊水製作所 Rotary powder compression molding machine
JPH06297199A (en) * 1993-04-14 1994-10-25 Hata Tekkosho:Kk Rotary type powder compacting machine
JPH0947900A (en) * 1995-06-01 1997-02-18 Hitachi Chem Co Ltd Rotary type granule compacting machine
JPH09122990A (en) * 1995-10-31 1997-05-13 Mitsubishi Chem Corp Tableting machine
JPH09290420A (en) * 1996-04-26 1997-11-11 Toshiba Chem Corp Epoxy resin composition tablet and its manufacture
JP2000280096A (en) * 1999-03-30 2000-10-10 Sumitomo Heavy Ind Ltd Powder supply device for rotary power compression molding machine

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51123286U (en) * 1975-04-01 1976-10-06
JPS63130298A (en) * 1986-11-18 1988-06-02 Teikoku Hormone Mfg Co Ltd Feed shoe for tablet making machine
JPH0498398U (en) * 1991-01-25 1992-08-25
JPH0623694U (en) * 1991-08-28 1994-03-29 株式会社菊水製作所 Rotary powder compression molding machine
JPH06297199A (en) * 1993-04-14 1994-10-25 Hata Tekkosho:Kk Rotary type powder compacting machine
JPH0947900A (en) * 1995-06-01 1997-02-18 Hitachi Chem Co Ltd Rotary type granule compacting machine
JPH09122990A (en) * 1995-10-31 1997-05-13 Mitsubishi Chem Corp Tableting machine
JPH09290420A (en) * 1996-04-26 1997-11-11 Toshiba Chem Corp Epoxy resin composition tablet and its manufacture
JP2000280096A (en) * 1999-03-30 2000-10-10 Sumitomo Heavy Ind Ltd Powder supply device for rotary power compression molding machine

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