JP4588630B2 - Manufacturing method of chip-shaped solid electrolytic capacitor - Google Patents

Manufacturing method of chip-shaped solid electrolytic capacitor Download PDF

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JP4588630B2
JP4588630B2 JP2005380564A JP2005380564A JP4588630B2 JP 4588630 B2 JP4588630 B2 JP 4588630B2 JP 2005380564 A JP2005380564 A JP 2005380564A JP 2005380564 A JP2005380564 A JP 2005380564A JP 4588630 B2 JP4588630 B2 JP 4588630B2
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electrolytic capacitor
shaped solid
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村上  順一
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Nichicon Capacitor Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/008Terminals
    • H01G9/012Terminals specially adapted for solid capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G2/00Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00
    • H01G2/02Mountings
    • H01G2/06Mountings specially adapted for mounting on a printed-circuit support
    • H01G2/065Mountings specially adapted for mounting on a printed-circuit support for surface mounting, e.g. chip capacitors

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Description

本発明は、チップ状固体電解コンデンサの製造方法に関するものである。   The present invention relates to a method for manufacturing a chip-shaped solid electrolytic capacitor.

近年、電子機器の小型化に伴い、固体電解コンデンサの高密度の表面実装が必要となっているため、コンデンサの陽極および陰極が製品の下面に位置する、いわゆる下面電極タイプのチップ状固体電解コンデンサが多用されている。   In recent years, with the miniaturization of electronic equipment, it has become necessary to mount a solid electrolytic capacitor with high density, so the anode and cathode of the capacitor are located on the lower surface of the product, so-called bottom electrode type chip-shaped solid electrolytic capacitor Is frequently used.

一般に、下面電極タイプのチップ状固体電解コンデンサは図3に示すように、コンデンサ素子2、金属条材5および電極基板8を組み合わせた構造であり、コンデンサ素子2は誘電体酸化皮膜、固体電解質層および陰極引出層を順次形成したもので、導出リード1を有する。
そして、電極基板8の導電板12に錫系のメッキを施し、そのメッキ層によって陽極内部電極6a、陽極外部電極6b、陰極内部電極6cおよび陰極外部電極6dを形成する。なお、導電板12はリードフレーム状のものである。
さらに、金属条材5と陽極内部電極6aを抵抗溶接した後、導出リード1と金属条材5を抵抗溶接し、導電性接着剤9によってコンデンサ素子2の陰極と陰極内部電極6cを接続した後、外装樹脂10で封止していた。(例えば特許文献1参照)。
In general, a bottom electrode type chip-shaped solid electrolytic capacitor has a structure in which a capacitor element 2, a metal strip 5 and an electrode substrate 8 are combined as shown in FIG. 3, and the capacitor element 2 includes a dielectric oxide film, a solid electrolyte layer. And a cathode lead layer formed sequentially, and has lead-out leads 1.
Then, the conductive plate 12 of the electrode substrate 8 is subjected to tin plating, and the anode internal electrode 6a, the anode external electrode 6b, the cathode internal electrode 6c, and the cathode external electrode 6d are formed by the plating layer. The conductive plate 12 has a lead frame shape.
Furthermore, after resistance welding the metal strip 5 and the anode internal electrode 6 a, the lead lead 1 and the metal strip 5 are resistance welded, and the cathode of the capacitor element 2 and the cathode internal electrode 6 c are connected by the conductive adhesive 9. It was sealed with exterior resin 10. (For example, refer to Patent Document 1).

また、図4のように、電極基板8に絶縁層7を用い、絶縁層7に貫通孔または切欠き部を形成し、陽極および陰極導電板3を貫通孔または切欠き部に配置し、その導電層4に接続し、これに錫系のメッキを施す。さらに、導電性接着剤9によって金属条材5と陽極内部電極6aを接続し、コンデンサ素子2の陰極と陰極内部電極6cを接続し、これを外装樹脂10で封止した構造のチップ状固体電解コンデンサも開示されている(例えば特許文献2参照)。   Further, as shown in FIG. 4, the insulating layer 7 is used for the electrode substrate 8, a through hole or a notch is formed in the insulating layer 7, and the anode and the cathode conductive plate 3 are arranged in the through hole or the notch, It is connected to the conductive layer 4 and is plated with tin. Further, the metal strip 5 and the anode internal electrode 6 a are connected by the conductive adhesive 9, the cathode of the capacitor element 2 and the cathode internal electrode 6 c are connected, and this is sealed with the exterior resin 10. A capacitor is also disclosed (for example, see Patent Document 2).

さらに、ESR特性を改善するため、図5のように、導電性接着剤9によって金属条材5と陽極内部電極6aを接続する下面電極タイプのチップ状固体電解コンデンサにおいて、導出リード1および金属条材5の端面の一部または全部を外装樹脂10から露出させ、該露出部と陽極導電板をメッキで接続する構造のチップ状固体電解コンデンサも開示されている(例えば特許文献3参照)。
特開2001−6978号公報 特開2002−110459号公報 特願2003−071135号
Further, in order to improve the ESR characteristics, as shown in FIG. 5, in the bottom electrode type chip-shaped solid electrolytic capacitor in which the metal strip 5 and the anode internal electrode 6a are connected by the conductive adhesive 9, the lead 1 and the metal strip are connected. A chip-shaped solid electrolytic capacitor having a structure in which a part or all of the end face of the material 5 is exposed from the exterior resin 10 and the exposed portion and the anode conductive plate are connected by plating is also disclosed (see, for example, Patent Document 3).
JP 2001-6978 A JP 2002-110459 A Japanese Patent Application No. 2003-071135

しかしながら、従来の下面電極タイプチップ状固体電解コンデンサにおいては、次のような問題があった。   However, the conventional bottom electrode type chip-shaped solid electrolytic capacitor has the following problems.

図3のように、リードフレーム状の導電板12を用いた電極基板8に金属条材5を抵抗溶接した後、コンデンサ素子2の導出リード1と該金属条材5とを抵抗溶接し、コンデンサ素子2の陰極を導電性接着剤9を介して電極基板8の陰極内部電極6cと接続する構造においては、コンデンサ素子2の姿勢制御に精度を要し、また、コンデンサ素子2の厚さバラツキにより電極基板8の陽極および陰極とコンデンサ素子2との接続が不安定になる、また機械ストレスの影響を受けやすくなるという問題があった。 As shown in FIG. 3, after the metal strip 5 is resistance-welded to the electrode substrate 8 using the lead frame-like conductive plate 12, the lead 1 of the capacitor element 2 and the metal strip 5 are resistance-welded, and the capacitor In the structure in which the cathode of the element 2 is connected to the cathode internal electrode 6c of the electrode substrate 8 through the conductive adhesive 9, accuracy is required for the attitude control of the capacitor element 2, and due to the thickness variation of the capacitor element 2 There is a problem that the connection between the anode and the cathode of the electrode substrate 8 and the capacitor element 2 becomes unstable and is easily affected by mechanical stress.

また、図4のように、コンデンサ素子2の導出リード1と金属条材5とを抵抗溶接した後、該金属条材5と陽極内部電極6a、およびコンデンサ素子2の陰極と陰極内部電極6cを導電性接着剤9を介して接続する構造では、コンデンサ素子2の姿勢制御が容易となり、機械ストレスの影響は小さくなるが、コンデンサ素子2の陽極と電極基板8の陽極内部電極6aとの接合に使用する導電性接着剤9の接続抵抗がチップ状固体電解コンデンサのESR特性を悪化させるという問題があった。 Further, as shown in FIG. 4, after the lead-out lead 1 of the capacitor element 2 and the metal strip 5 are resistance welded, the metal strip 5 and the anode internal electrode 6a, and the cathode and cathode internal electrode 6c of the capacitor element 2 are connected. In the structure in which the conductive adhesive 9 is connected, the attitude of the capacitor element 2 can be easily controlled, and the influence of mechanical stress is reduced. However, the connection between the anode of the capacitor element 2 and the anode internal electrode 6a of the electrode substrate 8 is effective. There was a problem that the connection resistance of the conductive adhesive 9 used deteriorated the ESR characteristics of the chip-shaped solid electrolytic capacitor.

さらに、図5のように、コンデンサ素子2の導出リード1と金属条材5とを抵抗溶接した後、導出リード1および金属条材5の端面の一部を外装樹脂10から露出させ、該露出部と陽極電極基板をメッキで接続する構造では、金型を用いた樹脂封止方法で露出させる場合、金型からの樹脂漏れが起きる問題があり、また、一括封止後ダイシングすることで露出させる場合、カットストレスが加わり漏れ電流が上昇する問題があった。 Further, as shown in FIG. 5, after the lead-out lead 1 of the capacitor element 2 and the metal strip 5 are resistance-welded, a part of the end surface of the lead-out lead 1 and the metal strip 5 is exposed from the exterior resin 10, and the exposure is performed. In the structure where the part and the anode electrode substrate are connected by plating, there is a problem of resin leakage from the mold when exposed by a resin sealing method using a mold, and it is exposed by dicing after batch sealing In this case, there is a problem that a cutting stress is applied and a leakage current is increased.

本発明は、以上の従来技術における問題を解決するためになされたものであり、コンデンサ素子と電極基板との接続安定性に優れ、かつESRおよび漏れ電流特性に優れた下面電極タイプのチップ状固体電解コンデンサを提供することを目的とする。   The present invention has been made in order to solve the above-described problems in the prior art, and is a bottom electrode type chip-like solid excellent in connection stability between a capacitor element and an electrode substrate, and excellent in ESR and leakage current characteristics. An object is to provide an electrolytic capacitor.

本発明は、陽極導出リードを有するコンデンサ素子と、金属条材と内部電極と外部電極とを有し、前記導出リードと金属条材とを抵抗溶接した後、前記金属条材と陽極内部電極とをレーザー溶接することを特徴とするチップ状固体電解コンデンサの製造方法である。   The present invention includes a capacitor element having an anode lead, a metal strip, an internal electrode, and an external electrode, and after resistance welding the lead lead and the metal strip, the metal strip and the anode internal electrode, Is a method for manufacturing a chip-shaped solid electrolytic capacitor, characterized by laser welding.

また、前記陽極内部電極が、金メッキにより形成されたものであることを特徴とする請求項1に記載のチップ状固体電解コンデンサの製造方法である。 2. The method for manufacturing a chip-shaped solid electrolytic capacitor according to claim 1, wherein the anode internal electrode is formed by gold plating.

上記の構成のように、金属条材が抵抗溶接された導出リードと電極基板の陽極内部電極とをレーザー溶接することで、非接触で接合することができ、コンデンサ素子の姿勢制御が容易となり、素子姿勢を保持するためのストレスが加わることがない。即ち、機械ストレスの少ない下面電極タイプのチップ状固体電解コンデンサの製造が可能となる。
さらに、陽極接合界面に導電性接着剤を使用しないため接続抵抗の悪化がなく、また、導出リードおよび金属条材の露出にともなう機械ストレスの問題がないため、ESRおよび漏れ電流特性に優れた下面電極タイプのチップ状固体電解コンデンサの製造が可能となる。
As in the above configuration, by conducting laser welding of the lead lead to which the metal strip is resistance-welded and the anode internal electrode of the electrode substrate, non-contact bonding is possible, and the posture control of the capacitor element becomes easy. No stress is applied to maintain the element posture. That is, it is possible to manufacture a bottom electrode type chip-shaped solid electrolytic capacitor with less mechanical stress.
Furthermore, since no conductive adhesive is used at the anodic bonding interface, there is no deterioration in connection resistance, and there is no problem of mechanical stress associated with exposure of the lead and the metal strip, so that the bottom surface has excellent ESR and leakage current characteristics. An electrode-type chip-shaped solid electrolytic capacitor can be manufactured.

また、電極基板の少なくとも陽極内部電極を、電気伝導率が高く表面が酸化されにくい金とすることで、接続安定性およびESR特性に優れた下面電極タイプのチップ状固体電解コンデンサの製造が可能となる。   Also, by making at least the anode internal electrode of the electrode substrate gold with high electrical conductivity and a surface that is difficult to oxidize, it is possible to manufacture a bottom electrode type chip-shaped solid electrolytic capacitor with excellent connection stability and ESR characteristics Become.

以下に本発明の実施例について添付図面を参照しつつ説明する。   Embodiments of the present invention will be described below with reference to the accompanying drawings.

[実施例1]
実施例1を図1に示す。これは下面電極タイプのチップ状固体電解コンデンサであり、コンデンサ素子2、金属条材5および電極基板8を組み合わせた構造であることは図3の従来例1と同様である。
導出リード1を設けたタンタル焼結体に公知の方法で誘電体酸化皮膜、固体電解質層および陰極引出層を形成し、コンデンサ素子2を作製した。
さらに、絶縁層7に貫通孔または切欠き部を形成し、陽極および陰極導電板3を貫通孔または切欠き部に配置した後、該貫通孔または切欠き部に銅からなる導電層4を形成した。なお、絶縁層7にはポリイミドを用いた。
続いて、導電板3および導電層4上にニッケルまたは胴を下地メッキとして金メッキを施し、金メッキ層によって陽極内部電極6a、陽極外部電極6b、陰極内部電極6cおよび陰極外部電極6dを形成し、電極基板7を作製した。
次に、導出リード1と金属条材5とを抵抗溶接した後、コンデンサ素子2の陰極と陰極内部電極6cとを導電性接着剤9で接続した。さらに、該金属条材5と陽極内部電極6aとをレーザー溶接により接合した。金属条材5は鉄とニッケルの合金からなる。レーザー溶接にはYAGレーザーを用い、1.0〜3.0kWの出力で0.4〜0.6ms、0.1〜0.3mmφの照射径で溶接した。このレーザーを照射する部位は金属条材5の陽極内部電極6aに接続する面に接する4面、とりわけコンデンサ素子対抗面以外の3面が望ましい。また、照射する範囲は陽極内部電極6aより上方0.03〜0.20mmが望ましい。この範囲外では溶接不十分(ナゲット形成不良)となり、また0.03mm未満では、陽極内部電極6aが熱損傷し充分な溶接強度が得られないため、好ましくない。
その後、外装樹脂10で封止し、陽極外部電極6b、陰極外部電極6dにニッケルと錫のメッキを施し、そのメッキ層によって最終電極層11を形成し、1608サイズ(1.6×0.8×0.8mm)下面電極タイプのチップ状固体電解コンデンサを作製した。
[Example 1]
Example 1 is shown in FIG. This is a bottom electrode type chip-shaped solid electrolytic capacitor, and has a structure in which the capacitor element 2, the metal strip 5 and the electrode substrate 8 are combined as in the conventional example 1 of FIG.
A dielectric oxide film, a solid electrolyte layer, and a cathode lead layer were formed on the tantalum sintered body provided with the lead-out lead 1 by a known method to produce a capacitor element 2.
Further, a through hole or notch is formed in the insulating layer 7, and after the anode and cathode conductive plate 3 is disposed in the through hole or notch, the conductive layer 4 made of copper is formed in the through hole or notch. did. Note that polyimide was used for the insulating layer 7.
Subsequently, gold is plated on the conductive plate 3 and the conductive layer 4 using nickel or a cylinder as a base plating, and an anode internal electrode 6a, an anode external electrode 6b, a cathode internal electrode 6c, and a cathode external electrode 6d are formed by the gold plating layer. A substrate 7 was produced.
Next, after the lead-out lead 1 and the metal strip 5 were resistance-welded, the cathode of the capacitor element 2 and the cathode internal electrode 6 c were connected by the conductive adhesive 9. Further, the metal strip 5 and the anode internal electrode 6a were joined by laser welding. The metal strip 5 is made of an alloy of iron and nickel. A YAG laser was used for laser welding, and welding was performed with an output diameter of 1.0 to 3.0 kW and an irradiation diameter of 0.4 to 0.6 ms and 0.1 to 0.3 mmφ. The laser irradiation part is desirably four surfaces in contact with the surface connected to the anode internal electrode 6a of the metal strip 5, particularly three surfaces other than the capacitor element facing surface. The irradiation range is preferably 0.03 to 0.20 mm above the anode internal electrode 6a. Outside this range, welding is insufficient (nugget formation failure), and when it is less than 0.03 mm, the anode internal electrode 6a is thermally damaged and sufficient welding strength cannot be obtained, which is not preferable.
After that, it is sealed with the exterior resin 10, and the anode external electrode 6b and the cathode external electrode 6d are plated with nickel and tin, and the final electrode layer 11 is formed by the plating layer, and the 1608 size (1.6 × 0.8) × 0.8 mm) A bottom electrode type chip-shaped solid electrolytic capacitor was produced.

[実施例2]
図2に示すように、実施例1と同様にコンデンサ素子2を作製し、絶縁層を有する電極基板の代わりにリードフレーム状の電極基板12に金メッキを施し、そのメッキ層によって陽極内部電極6a、陽極外部電極6b、陰極内部電極6cおよび陰極外部電極6dを形成した以外は、実施例1と同様の方法で1608サイズ下面電極タイプのチップ状固体電解コンデンサを作製した。
[Example 2]
As shown in FIG. 2, the capacitor element 2 is manufactured in the same manner as in Example 1, and the lead frame-like electrode substrate 12 is gold-plated instead of the electrode substrate having the insulating layer, and the anode internal electrode 6a, A 1608 size bottom electrode type chip-shaped solid electrolytic capacitor was produced in the same manner as in Example 1 except that the anode external electrode 6b, the cathode internal electrode 6c, and the cathode external electrode 6d were formed.

[従来例1]
従来例1として、図3に示すように、実施例1と同様にコンデンサ素子2を作製し、絶縁層を有する電極基板の代わりにリードフレーム状の電極基板12を用い、陽極内部電極6a、陽極外部電極6b、陰極内部電極6cおよび陰極外部電極6dを錫メッキとし、陽極内部電極6aと金属条材5とを抵抗溶接した後、陽極リード1と金属条材5とを抵抗溶接した以外は、実施例1と同様の方法で1608サイズ下面電極タイプのチップ状固体電解コンデンサを作製した。
実施例1および実施例2と従来例1のチップ状固体電解コンデンサにおいて、コンデンサ素子2の搭載後の、電極基板8に対する傾斜角度を調査した。その結果を図6に示す。
[Conventional example 1]
As shown in FIG. 3, a capacitor element 2 is manufactured as in Conventional Example 1 as in Conventional Example 1, and a lead frame-like electrode substrate 12 is used instead of an electrode substrate having an insulating layer. The external electrode 6b, the cathode internal electrode 6c, and the cathode external electrode 6d are tin-plated, and after the anode internal electrode 6a and the metal strip 5 are resistance welded, the anode lead 1 and the metal strip 5 are resistance welded. A 1608 size bottom electrode type chip-shaped solid electrolytic capacitor was produced in the same manner as in Example 1.
In the chip-shaped solid electrolytic capacitors of Examples 1 and 2 and Conventional Example 1, the inclination angle with respect to the electrode substrate 8 after the capacitor element 2 was mounted was investigated. The result is shown in FIG.

[従来例2]
また、従来例2として図4に示すように実施例1と同様にコンデンサ素子2を作製し、金属条材5と陽極内部電極6aとを導電性接着剤9により接合した以外は、実施例1と同様の方法で1608サイズ下面電極タイプのチップ状固体電解コンデンサを得た。
実施例1および実施例2と従来例2とのESR特性を比較し、図7に示した。
[Conventional example 2]
Further, as shown in FIG. 4 as the conventional example 2, the capacitor element 2 is produced in the same manner as in the example 1, and the metal strip 5 and the anode internal electrode 6a are joined by the conductive adhesive 9 as in the example 1. In the same manner as above, a 1608 size bottom electrode type chip-shaped solid electrolytic capacitor was obtained.
The ESR characteristics of Examples 1 and 2 and Conventional Example 2 were compared and shown in FIG.

[従来例3]
また、従来例3として図5に示すように金属条材5と陽極内部電極6aを導電性接着剤9により接合し、導出リード1および金属条材5の端面の一部が外装樹脂10から露出するようにダイシングした以外は実施例1と同様の方法で1608サイズ下面電極タイプのチップ状固体電解コンデンサを作製した。
同一定格での、実施例1および実施例2と従来例3との漏れ電流特性を比較し、図8に示した。
[Conventional Example 3]
Further, as shown in FIG. 5 as the conventional example 3, the metal strip 5 and the anode internal electrode 6a are joined by the conductive adhesive 9, and the lead 1 and a part of the end face of the metal strip 5 are exposed from the exterior resin 10. A 1608 size bottom electrode type chip-shaped solid electrolytic capacitor was produced in the same manner as in Example 1 except that dicing was performed.
FIG. 8 shows a comparison of leakage current characteristics between Example 1 and Example 2 and Conventional Example 3 at the same rating.

図6より明らかなように、本発明による実施例1および実施例2は従来例1と比較して、コンデンサ素子2の素子傾斜角度が小さく、素子姿勢の制御を容易に行えることが分かる。
即ち、機械ストレスが小さく、コンデンサ素子2と電極基板との接続安定性に優れた下面電極タイプチップ状固体電解コンデンサの製造が可能となる。
As is apparent from FIG. 6, the first and second embodiments of the present invention have a smaller element inclination angle of the capacitor element 2 than the conventional example 1, and the element attitude can be easily controlled.
That is, it is possible to manufacture a bottom electrode type chip-shaped solid electrolytic capacitor that has low mechanical stress and excellent connection stability between the capacitor element 2 and the electrode substrate.

また、図7より明らかなように、実施例1および実施例2は従来例2と比較し、ESR特性が優れていることが分かる。これは、陽極接合界面に導電性接着剤9を使用せず、また導電板3,12に金メッキを施したことによる効果であると考えられる。   Further, as is apparent from FIG. 7, it can be seen that Example 1 and Example 2 are superior in ESR characteristics as compared with Conventional Example 2. This is considered to be due to the fact that the conductive adhesive 9 is not used at the anodic bonding interface and the conductive plates 3 and 12 are plated with gold.

さらに、図8より明らかなように、実施例1および実施例2は従来例3と比較し、漏れ電流特性が優れていることが分かる。これは、導出リード1および金属条材5を露出する必要がなく、ダイシングによる組立ストレスが軽減された効果であると考えられる。 Further, as apparent from FIG. 8, it can be seen that Example 1 and Example 2 are superior in leakage current characteristics as compared with Conventional Example 3. This is considered to be the effect of reducing the assembly stress due to dicing without exposing the lead 1 and the metal strip 5.

尚、陽極および陰極電極のメッキは銀や銅等のメッキを用いてもよいが、連続安定性およびESR特性に優れた金メッキとすることが望ましい。   In addition, although plating of silver, copper, or the like may be used for the plating of the anode and the cathode electrode, it is desirable to use a gold plating excellent in continuous stability and ESR characteristics.

以上の通り、本発明によれば、コンデンサ素子と製品電極との接続安定性に優れ、かつESRおよび漏れ電流特性に優れた下面電極タイプチップ状固体電解コンデンサの提供が可能となる。   As described above, according to the present invention, it is possible to provide a bottom electrode type chip-shaped solid electrolytic capacitor having excellent connection stability between a capacitor element and a product electrode, and excellent in ESR and leakage current characteristics.

本発明の実施例1による下面電極タイプのチップ状固体電解コンデンサの断面図である。It is sectional drawing of the chip-shaped solid electrolytic capacitor of a lower surface electrode type by Example 1 of this invention. 本発明の実施例2による下面電極タイプのチップ状固体電解コンデンサの断面図である。It is sectional drawing of the bottom electrode type chip-shaped solid electrolytic capacitor by Example 2 of this invention. 従来例1による下面電極タイプのチップ状固体電解コンデンサの断面図である。6 is a cross-sectional view of a bottom electrode type chip-shaped solid electrolytic capacitor according to Conventional Example 1. FIG. 従来例2による下面電極タイプのチップ状固体電解コンデンサの断面図である。6 is a cross-sectional view of a bottom electrode type chip-shaped solid electrolytic capacitor according to Conventional Example 2. FIG. 従来例3による下面電極タイプのチップ状固体電解コンデンサの断面図である。It is sectional drawing of the chip-shaped solid electrolytic capacitor of the lower surface electrode type by the prior art example 3. 実施例1および実施例2と従来例1との、素子傾斜角度の比較図である。It is a comparison figure of element inclination angle of Example 1 and Example 2, and conventional example 1. FIG. 実施例1および実施例2と従来例2との、ESRの比較図である。It is a comparison figure of ESR of Example 1, Example 2, and the prior art example 2. FIG. 実施例1および実施例2と従来例3との、漏れ電流の比較図である。It is a comparison figure of the leakage current of Example 1, Example 2, and Conventional Example 3.

符号の説明Explanation of symbols

1 導出リード
2 コンデンサ素子
3,12 導電板
4 導電層
5 金属条材
6a メッキ層(陽極内部電極)
6b メッキ層(陽極外部電極)
6c メッキ層(陰極内部電極)
6d メッキ層(陰極外部電極)
7 絶縁層
8 電極基板
9 導電性接着剤
10 外装樹脂
11 最終電極層
DESCRIPTION OF SYMBOLS 1 Derived lead 2 Capacitor element 3,12 Conductive plate 4 Conductive layer 5 Metal strip 6a Plating layer (anode internal electrode)
6b Plating layer (Anode external electrode)
6c Plating layer (cathode internal electrode)
6d Plating layer (cathode external electrode)
7 Insulating layer 8 Electrode substrate 9 Conductive adhesive 10 Exterior resin 11 Final electrode layer

Claims (2)

陽極導出リードを有するコンデンサ素子と、金属条材と内部電極と外部電極とを有し、
前記導出リードと金属条材とを抵抗溶接した後、前記金属条材と陽極内部電極とをレーザー溶接することを特徴とするチップ状固体電解コンデンサの製造方法。
A capacitor element having an anode lead, a metal strip, an internal electrode, and an external electrode;
A chip-shaped solid electrolytic capacitor manufacturing method, wherein the lead wire and the metal strip are resistance welded, and then the metal strip and the anode internal electrode are laser welded.
前記陽極内部電極が、金メッキにより形成されたものであることを特徴とする請求項1に記載のチップ状固体電解コンデンサの製造方法。   2. The method for manufacturing a chip-shaped solid electrolytic capacitor according to claim 1, wherein the anode internal electrode is formed by gold plating.
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JP4958694B2 (en) * 2007-09-04 2012-06-20 三洋電機株式会社 Solid electrolytic capacitor
JP5009122B2 (en) * 2007-10-24 2012-08-22 Necトーキン株式会社 Chip-type solid electrolytic capacitor and manufacturing method thereof
JP2009260235A (en) 2008-03-25 2009-11-05 Nec Tokin Corp Solid electrolytic capacitor device and method of manufacturing the same
JP4912371B2 (en) * 2008-08-08 2012-04-11 三洋電機株式会社 Solid electrolytic capacitor
JP5474441B2 (en) * 2009-08-06 2014-04-16 三洋電機株式会社 Solid electrolytic capacitor and manufacturing method thereof
KR20220040022A (en) 2020-09-23 2022-03-30 삼성전기주식회사 Tantalum capacitor and manufacturing method thereof
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JP2002203748A (en) * 2000-12-28 2002-07-19 Nippon Chemicon Corp Chip type solid-state electrolytic capacitor and method of manufacturing the same
JP2004104048A (en) * 2002-09-13 2004-04-02 Nec Tokin Corp Chip type solid electrolytic capacitor
JP2005064238A (en) * 2003-08-12 2005-03-10 Elna Co Ltd Chip type solid electrolytic capacitor
JP2005158903A (en) * 2003-11-21 2005-06-16 Nippon Chemicon Corp Solid electrolytic capacitor

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