JP4479911B2 - 駆動方法、露光方法及び露光装置、並びにデバイス製造方法 - Google Patents

駆動方法、露光方法及び露光装置、並びにデバイス製造方法 Download PDF

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Publication number
JP4479911B2
JP4479911B2 JP2005518009A JP2005518009A JP4479911B2 JP 4479911 B2 JP4479911 B2 JP 4479911B2 JP 2005518009 A JP2005518009 A JP 2005518009A JP 2005518009 A JP2005518009 A JP 2005518009A JP 4479911 B2 JP4479911 B2 JP 4479911B2
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JP
Japan
Prior art keywords
stage
movement information
wafer
moving body
movement
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Expired - Fee Related
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JP2005518009A
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English (en)
Japanese (ja)
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JPWO2005078777A1 (ja
Inventor
剛之 水谷
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2005518009A 2004-02-18 2005-02-15 駆動方法、露光方法及び露光装置、並びにデバイス製造方法 Expired - Fee Related JP4479911B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004040683 2004-02-18
JP2004040683 2004-02-18
PCT/JP2005/002216 WO2005078777A1 (fr) 2004-02-18 2005-02-15 Méthode de conduite, méthode d'exposition, dispositif d'exposition, et méthode de fabrication du dispositif

Publications (2)

Publication Number Publication Date
JPWO2005078777A1 JPWO2005078777A1 (ja) 2007-10-18
JP4479911B2 true JP4479911B2 (ja) 2010-06-09

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ID=34857899

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JP2005518009A Expired - Fee Related JP4479911B2 (ja) 2004-02-18 2005-02-15 駆動方法、露光方法及び露光装置、並びにデバイス製造方法

Country Status (2)

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JP (1) JP4479911B2 (fr)
WO (1) WO2005078777A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3870207B2 (ja) * 2004-08-05 2007-01-17 キヤノン株式会社 液浸露光装置及びデバイス製造方法
EP1879217A4 (fr) * 2005-03-18 2010-06-09 Nikon Corp Procede d' exposition, appareil d' exposition, procede de fabrication de dispositif et procede d' evaluation d' appareil d' exposition
US7839485B2 (en) * 2006-01-19 2010-11-23 Nikon Corporation Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method
US7230676B1 (en) * 2006-03-13 2007-06-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101862528B1 (ko) 2006-08-31 2018-05-29 가부시키가이샤 니콘 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법
EP2221669A3 (fr) 2009-02-19 2011-02-09 ASML Netherlands B.V. Appareil lithographique, procédé de commande de l'appareil et procédé de fabrication d'un dispositif

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP2000058436A (ja) * 1998-08-11 2000-02-25 Nikon Corp 投影露光装置及び露光方法

Also Published As

Publication number Publication date
JPWO2005078777A1 (ja) 2007-10-18
WO2005078777A1 (fr) 2005-08-25

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