JP4469604B2 - 光学干渉分光法 - Google Patents

光学干渉分光法 Download PDF

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Publication number
JP4469604B2
JP4469604B2 JP2003523932A JP2003523932A JP4469604B2 JP 4469604 B2 JP4469604 B2 JP 4469604B2 JP 2003523932 A JP2003523932 A JP 2003523932A JP 2003523932 A JP2003523932 A JP 2003523932A JP 4469604 B2 JP4469604 B2 JP 4469604B2
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JP
Japan
Prior art keywords
measurement
path
measurement beam
passage
reflective surface
Prior art date
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Expired - Fee Related
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JP2003523932A
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English (en)
Japanese (ja)
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JP2005501243A5 (enExample
JP2005501243A (ja
Inventor
エイ． ヒル、ヘンリー
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Zygo Corp
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Zygo Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2003523932A 2001-08-23 2002-08-23 光学干渉分光法 Expired - Fee Related JP4469604B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31456901P 2001-08-23 2001-08-23
US40451102P 2002-08-19 2002-08-19
PCT/US2002/027053 WO2003019112A1 (en) 2001-08-23 2002-08-23 Optical interferometry

Publications (3)

Publication Number Publication Date
JP2005501243A JP2005501243A (ja) 2005-01-13
JP2005501243A5 JP2005501243A5 (enExample) 2006-01-05
JP4469604B2 true JP4469604B2 (ja) 2010-05-26

Family

ID=26979433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003523932A Expired - Fee Related JP4469604B2 (ja) 2001-08-23 2002-08-23 光学干渉分光法

Country Status (3)

Country Link
US (1) US7193726B2 (enExample)
JP (1) JP4469604B2 (enExample)
WO (1) WO2003019112A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7030993B2 (en) * 2002-04-24 2006-04-18 Zygo Corporation Athermal zero-shear interferometer
US7046370B2 (en) * 2002-06-24 2006-05-16 Zygo Corporation Interferometer with reduced shear
US7106457B1 (en) 2003-05-29 2006-09-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Achromatic shearing phase sensor for generating images indicative of measure(s) of alignment between segments of a segmented telescope's mirrors
US7025498B2 (en) * 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
US7180603B2 (en) 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
US7130056B2 (en) * 2004-02-20 2006-10-31 Agilent Technologies, Inc. System and method of using a side-mounted interferometer to acquire position information
US20060017933A1 (en) * 2004-07-23 2006-01-26 Schluchter W C Heterodyne laser interferometer with porro prisms for measuring stage displacement
US7317539B2 (en) * 2004-08-23 2008-01-08 Asml Netherlands B.V. Polarizing beam splitter device, interferometer module, lithographic apparatus, and device manufacturing method
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
JP5340730B2 (ja) * 2005-06-29 2013-11-13 ザイゴ コーポレーション 干渉分光法における非周期性の非線形誤差を軽減するための装置および方法
US7359057B2 (en) * 2005-08-26 2008-04-15 Ball Aerospace & Technologies Corp. Method and apparatus for measuring small shifts in optical wavelengths
US7511826B2 (en) * 2006-02-27 2009-03-31 Asml Holding N.V. Symmetrical illumination forming system and method
WO2008136404A1 (ja) * 2007-04-27 2008-11-13 Nikon Corporation 光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法
US8934104B2 (en) * 2010-01-22 2015-01-13 Universitaet Stuttgart Method and arrangement for robust interferometry for detecting a feature of an object
JP5933190B2 (ja) * 2010-06-30 2016-06-08 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングＤｒ． Ｊｏｈａｎｎｅｓ Ｈｅｉｄｅｎｈａｉｎ Ｇｅｓｅｌｌｓｃｈａｆｔ Ｍｉｔ Ｂｅｓｃｈｒａｎｋｔｅｒ Ｈａｆｔｕｎｇ 光学式距離測定機器
US9194694B2 (en) * 2012-01-31 2015-11-24 Nikon Corporation Interferometer devices for determining initial position of a stage or the like
CN102853771B (zh) * 2012-09-19 2015-07-29 哈尔滨工业大学 小型化高速超精密激光外差干涉测量方法及装置
RU2660623C1 (ru) * 2017-01-10 2018-07-06 федеральное государственное автономное образовательное учреждение высшего образования "Самарский национальный исследовательский университет имени академика С.П. Королёва" Мультисенсорный преобразователь информации
TWI641805B (zh) * 2018-04-02 2018-11-21 國立雲林科技大學 Laser interference calibrator

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4802765A (en) * 1986-06-12 1989-02-07 Zygo Corporation Differential plane mirror having beamsplitter/beam folder assembly
US4784490A (en) * 1987-03-02 1988-11-15 Hewlett-Packard Company High thermal stability plane mirror interferometer
US4881816A (en) * 1988-07-08 1989-11-21 Zygo, Corporation Linear and angular displacement measuring interferometer
US4881815A (en) * 1988-07-08 1989-11-21 Zygo, Corporation Linear and angular displacement measuring interferometer
US5200797A (en) * 1988-08-01 1993-04-06 Deutsche Forschungsanstalt Fur Luft- Und Raumfahrt E.V. Device for measuring the angle of rotation or of the angular position of a rotating object
US5064289A (en) * 1989-02-23 1991-11-12 Hewlett-Packard Company Linear-and-angular measuring plane mirror interferometer
US4883357A (en) * 1989-03-01 1989-11-28 Zygo Corporation Dual high stability interferometer
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
JP3219349B2 (ja) * 1993-06-30 2001-10-15 キヤノン株式会社 波長コンペンセータ、該波長コンペンセータを用いたレーザ干渉測定装置、該レーザ干渉測定装置を有するステージ装置、該ステージ装置を有する露光システム、および該露光システムを用いたデバイスの製造方法
US5471304A (en) * 1994-03-21 1995-11-28 Wang; Charles P. Laser positioning method and appartus for rotary actuator arms, and the like
DE19522263C2 (de) * 1995-06-20 1998-07-09 Zeiss Carl Jena Gmbh Referenzinterferometer (RI) mit variabler Wellenlänge
US5675412A (en) * 1995-11-24 1997-10-07 On-Line Technologies, Inc. System including unified beamsplitter and parallel reflecting element, and retroreflecting component
JP4075966B2 (ja) * 1996-03-06 2008-04-16 エーエスエムエル ネザーランズ ビー．ブイ． 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置
US5757491A (en) * 1996-08-19 1998-05-26 The Hong Kong University Of Science & Technology Laser interferometer system for straightness measurements
US5757160A (en) * 1996-12-23 1998-05-26 Svg Lithography Systems, Inc. Moving interferometer wafer stage
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6252667B1 (en) * 1998-09-18 2001-06-26 Zygo Corporation Interferometer having a dynamic beam steering assembly
US6313918B1 (en) * 1998-09-18 2001-11-06 Zygo Corporation Single-pass and multi-pass interferometery systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion
US6271923B1 (en) * 1999-05-05 2001-08-07 Zygo Corporation Interferometry system having a dynamic beam steering assembly for measuring angle and distance
WO2001088468A1 (en) * 2000-05-17 2001-11-22 Zygo Corporation Interferometric apparatus and method
US6762845B2 (en) * 2001-08-23 2004-07-13 Zygo Corporation Multiple-pass interferometry

Also Published As

Publication number Publication date
US20030053079A1 (en) 2003-03-20
US7193726B2 (en) 2007-03-20
JP2005501243A (ja) 2005-01-13
WO2003019112A1 (en) 2003-03-06

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