JP4460843B2 - 感刺激性組成物及び化合物 - Google Patents

感刺激性組成物及び化合物 Download PDF

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Publication number
JP4460843B2
JP4460843B2 JP2003106524A JP2003106524A JP4460843B2 JP 4460843 B2 JP4460843 B2 JP 4460843B2 JP 2003106524 A JP2003106524 A JP 2003106524A JP 2003106524 A JP2003106524 A JP 2003106524A JP 4460843 B2 JP4460843 B2 JP 4460843B2
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Japan
Prior art keywords
group
general formula
alkyl group
acid
carbon atoms
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JP2003106524A
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Japanese (ja)
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JP2004139014A5 (enExample
JP2004139014A (ja
Inventor
邦彦 児玉
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2003106524A priority Critical patent/JP4460843B2/ja
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Publication of JP2004139014A5 publication Critical patent/JP2004139014A5/ja
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Publication of JP4460843B2 publication Critical patent/JP4460843B2/ja
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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
JP2003106524A 2002-04-10 2003-04-10 感刺激性組成物及び化合物 Expired - Fee Related JP4460843B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003106524A JP4460843B2 (ja) 2002-04-10 2003-04-10 感刺激性組成物及び化合物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002108104 2002-04-10
JP2002240661 2002-08-21
JP2003106524A JP4460843B2 (ja) 2002-04-10 2003-04-10 感刺激性組成物及び化合物

Publications (3)

Publication Number Publication Date
JP2004139014A JP2004139014A (ja) 2004-05-13
JP2004139014A5 JP2004139014A5 (enExample) 2006-06-08
JP4460843B2 true JP4460843B2 (ja) 2010-05-12

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JP2003106524A Expired - Fee Related JP4460843B2 (ja) 2002-04-10 2003-04-10 感刺激性組成物及び化合物

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JP (1) JP4460843B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4610280B2 (ja) * 2004-09-29 2011-01-12 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP5827788B2 (ja) * 2010-03-09 2015-12-02 富士フイルム株式会社 パターン形成方法、化学増幅型レジスト組成物及びレジスト膜
JP6571177B2 (ja) * 2015-05-14 2019-09-04 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、感活性光線性又は感放射線性樹脂組成物
JP6655628B2 (ja) * 2015-11-05 2020-02-26 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び、電子デバイスの製造方法

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JP2004139014A (ja) 2004-05-13

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