JP4424631B2 - 化学増幅型レジスト組成物およびレジストパターン形成方法 - Google Patents

化学増幅型レジスト組成物およびレジストパターン形成方法 Download PDF

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Publication number
JP4424631B2
JP4424631B2 JP19909699A JP19909699A JP4424631B2 JP 4424631 B2 JP4424631 B2 JP 4424631B2 JP 19909699 A JP19909699 A JP 19909699A JP 19909699 A JP19909699 A JP 19909699A JP 4424631 B2 JP4424631 B2 JP 4424631B2
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Japan
Prior art keywords
meth
acrylate
resist
chemically amplified
resin
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JP19909699A
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Japanese (ja)
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JP2001027805A (ja
JP2001027805A5 (enExample
Inventor
匡之 藤原
幸也 脇阪
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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JP19909699A 1999-07-13 1999-07-13 化学増幅型レジスト組成物およびレジストパターン形成方法 Expired - Fee Related JP4424631B2 (ja)

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JP19909699A JP4424631B2 (ja) 1999-07-13 1999-07-13 化学増幅型レジスト組成物およびレジストパターン形成方法

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JP19909699A JP4424631B2 (ja) 1999-07-13 1999-07-13 化学増幅型レジスト組成物およびレジストパターン形成方法

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JP2001027805A JP2001027805A (ja) 2001-01-30
JP2001027805A5 JP2001027805A5 (enExample) 2006-08-31
JP4424631B2 true JP4424631B2 (ja) 2010-03-03

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JP19909699A Expired - Fee Related JP4424631B2 (ja) 1999-07-13 1999-07-13 化学増幅型レジスト組成物およびレジストパターン形成方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4524505B2 (ja) * 1999-09-10 2010-08-18 Ｄｉｃ株式会社 エネルギー線硬化性樹脂組成物

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