JP4422843B2 - スキャン露光装置 - Google Patents

スキャン露光装置 Download PDF

Info

Publication number
JP4422843B2
JP4422843B2 JP2000023784A JP2000023784A JP4422843B2 JP 4422843 B2 JP4422843 B2 JP 4422843B2 JP 2000023784 A JP2000023784 A JP 2000023784A JP 2000023784 A JP2000023784 A JP 2000023784A JP 4422843 B2 JP4422843 B2 JP 4422843B2
Authority
JP
Japan
Prior art keywords
master
slave
speed
exposure
switching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000023784A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001217176A5 (enExample
JP2001217176A (ja
Inventor
慎一 渡邉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000023784A priority Critical patent/JP4422843B2/ja
Publication of JP2001217176A publication Critical patent/JP2001217176A/ja
Publication of JP2001217176A5 publication Critical patent/JP2001217176A5/ja
Application granted granted Critical
Publication of JP4422843B2 publication Critical patent/JP4422843B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000023784A 2000-02-01 2000-02-01 スキャン露光装置 Expired - Fee Related JP4422843B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000023784A JP4422843B2 (ja) 2000-02-01 2000-02-01 スキャン露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000023784A JP4422843B2 (ja) 2000-02-01 2000-02-01 スキャン露光装置

Publications (3)

Publication Number Publication Date
JP2001217176A JP2001217176A (ja) 2001-08-10
JP2001217176A5 JP2001217176A5 (enExample) 2007-03-15
JP4422843B2 true JP4422843B2 (ja) 2010-02-24

Family

ID=18549894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000023784A Expired - Fee Related JP4422843B2 (ja) 2000-02-01 2000-02-01 スキャン露光装置

Country Status (1)

Country Link
JP (1) JP4422843B2 (enExample)

Also Published As

Publication number Publication date
JP2001217176A (ja) 2001-08-10

Similar Documents

Publication Publication Date Title
US6359677B2 (en) Stage apparatus, exposure apparatus using the same, and a device manufacturing method
US20050156552A1 (en) Driving apparatus, exposure apparatus, and device manufacturing method
US7586218B2 (en) Moving apparatus, exposure apparatus, and device manufacturing method
US7016049B2 (en) Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
JPWO2005036620A1 (ja) 露光方法及び露光装置、並びにデバイス製造方法
US20090002659A1 (en) Stage apparatus, exposure apparatus, and method of manufacturing device
TW200307181A (en) Driving apparatus, exposure apparatus, and device manufacturing method
JP4422843B2 (ja) スキャン露光装置
KR102890198B1 (ko) 노광 장치, 및 물품의 제조 방법
US6630986B2 (en) Scanning type exposure apparatus and a device manufacturing method using the same
US5838443A (en) Exposure apparatus implementing priority speed setting arrangement
JP3722330B2 (ja) 露光装置およびデバイス製造方法
JP3227089B2 (ja) 位置決めステージ装置およびこれを用いた露光装置ならびにディバイス製造方法
JP3244872B2 (ja) 露光装置とこれを用いたデバイス製造方法
CN114326319B (zh) 载置台装置、光刻装置以及物品的制造方法
JP2000164506A (ja) 露光方法および装置
JPH09251955A (ja) 露光方法および装置、ならびにデバイス製造方法
JP7022527B2 (ja) ステージ装置、リソグラフィ装置、および物品製造方法
JP3244871B2 (ja) 露光装置とこれを用いたデバイス製造方法
JP2000294479A (ja) 走査型露光装置およびデバイス製造方法
JP2000260690A (ja) Ｘ線露光装置
KR20240036452A (ko) 스테이지 장치, 패턴 형성장치, 및 물품의 제조방법
JPH1097978A (ja) マスク補正方法及びデバイス生産方法
JP2000124119A (ja) 露光装置およびデバイス製造方法
JPH10312955A (ja) 走査露光方法及び走査型露光装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070129

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070129

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20090406

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20091001

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20091201

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20091207

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121211

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131211

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees