JP4392204B2 - Quartz glass and method for producing the same - Google Patents
Quartz glass and method for producing the same Download PDFInfo
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- JP4392204B2 JP4392204B2 JP2003208905A JP2003208905A JP4392204B2 JP 4392204 B2 JP4392204 B2 JP 4392204B2 JP 2003208905 A JP2003208905 A JP 2003208905A JP 2003208905 A JP2003208905 A JP 2003208905A JP 4392204 B2 JP4392204 B2 JP 4392204B2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
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- Materials Engineering (AREA)
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- Glass Melting And Manufacturing (AREA)
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Description
【０００１】
【発明の属する技術分野】
本発明は、紫外線吸収性及び可視光透過性に優れ、かつ耐失透性及び耐熱性にも優れた、照明用ランプ、高輝度放電ランプ、レーザー励起ランプ等のバルブ材としての使用に適した合成石英ガラス及びその製造方法に関するものである。
【０００２】
【従来の技術】
合成石英ガラスは、赤外から真空紫外までの広い波長範囲において透明であるばかりでなく、熱的及び化学的安定性に優れている事から、各種照明ランプ等の光源用窓材等として広く使用されている。
【０００３】
【発明が解決しようとする課題】
合成石英ガラスの高い光透過性のため光源から発生した紫外線が直接人体に悪影響を及ぼすばかりでなく、紫外線により空気中の酸素から人体に有害なオゾンが発生したり、レーザー素子が紫外線によりダメージを受け、レーザー発信効率が低下したり、光源の窓材を支持する樹脂が紫外線によりダメージを受け劣化する等の問題があった。
【０００４】
この問題を解決する方法として、石英ガラス中に遷移金属元素を含有させて、紫外線を吸収する石英ガラスが提案されている（例えば、特許文献１及び特許文献２参照）。金属元素をドープするこれらの方法では、金属元素による吸収、散乱のため、紫外線領域だけでなく、可視光領域の透過率も低下する。また、金属元素を均一にドープするのが困難であるばかりでなく、ドープした金属元素と石英ガラスが反応して石英ガラスが結晶化し透明性が低下（失透）する等の問題があった。また、高温にさらされる事で、ドープした金属元素が拡散あるいは飛散して、紫外線吸収効率が低下するばかりでなく、金属元素により周辺機器が汚染される等の問題の他、高温使用時にバルブが熱変形する等、耐熱性にも問題があった。
【０００５】
【特許文献１】
特許第２９５５４６３号（請求項１）
【特許文献２】
特許第２９９１９０１号（請求項１）
【０００６】
【課題を解決するための手段】
本発明者は上記課題を解決するため、合成石英ガラスの諸物性と、光透過特性、耐失透性及び耐熱性との関係について鋭意検討を行った結果、合成石英ガラスに金属元素をドープする事なく効率的に紫外線を吸収し、かつ耐失透性及び耐熱性にも優れた、紫外線吸収・可視光透過性石英ガラスを提供できる事を見出した。
【０００７】
すなわち本発明は、ＯＨ基含有量が１ｐｐｍ以下、Ｈ2含有量が１×１０17個／ｃｍ3以下、Ｃｌ含有量が１０ｐｐｍ以下及び金属不純物含有量の総和が１ｐｐｍ以下であり、厚さ１ｃｍあたりの透過率が、２３０ｎｍ以下の波長領域で５％以下かつ、３００ｎｍ以上の波長領域で８０％以上である石英ガラスである。
【０００８】
また、ガラス形成原料を、酸水素火炎中で火炎加水分解し、生成したシリカ微粒子をターゲット上に堆積させ多孔質シリカ体（スート体）を形成し、得られたスート体を、Ｈ2ガス含有雰囲気で熱処理した後、透明ガラス化して透明石英ガラスを得る工程と、得られた石英ガラスに、Ｘ線またはγ線を照射する工程とを含む事を特徴とする石英ガラスの製造方法である。
【０００９】
以下本発明を詳細に説明する。
【００１０】
石英ガラス中に含有される、ＯＨ基、Ｈ2及び金属不純物は熱的に不安定であり、例えばランプの窓材等、高温にさらされる条件で使用した場合、これらは容易に石英ガラス内を拡散する。その際、石英ガラスの骨格構造と反応して、石英ガラスの結晶化を促進し、可視光の透過性が低下する。また、石英の骨格構造が不安定となる事で耐熱性も低下する。従って、これらの含有量は出来るだけ少なくする必要があり、本発明においては、ＯＨ基濃度が１ｐｐｍ以下、Ｈ2含有量が１×１０17個／ｃｍ3以下、好ましくは０．５×１０17個／ｃｍ3以下、Ｃｌ含有量が１０ｐｐｍ以下及び金属不純物含有量の総和を１ｐｐｍ以下、好ましくは０．１ｐｐｍ以下とする。
【００１１】
ＳｉＯ2以外の成分をドープさせる事なく、紫外線を効率よく吸収する石英ガラスを得るには、紫外線を吸収する構造を持つＳｉ元素とＯ元素だけからなる石英ガラスを製造する必要があるが、スート法で合成した石英ガラスにＸ線またはγ線を照射する事で上記目的が達成させる事を見出し、本発明を完成するに至った。
【００１２】
本発明の石英ガラスの製造方法について説明する。スート法では、例えば、多重管構造の石英ガラス製バーナーの中心から、ＳｉＣｌ4などの原料を供給し、その外側の管からＨ2およびＯ2を供給して原料を火炎加水分解してシリカ微粒子を得る。このシリカ微粒子をターゲット上に堆積させシリカ微粒子堆積体（スート体）を得る。このスート体は多量のＯＨ基を含有するため、第１の熱処理として、還元性ガス含有雰囲気で処理を行い、ＯＨ基濃度を適切な範囲まで低減させる必要がある。
【００１３】
第１の熱処理に使用する還元性ガスは、Ｈ2を使用する。Ｈ2以外の還元性ガスとして、例えばＣｌ2ガス等を使用しても、ＯＨ基濃度の低減は可能であるが、後のＸ線またはγ線照射による効果が十分得られず、紫外線吸収効果が不充分になるばかりでなく、使用したガスの一部が石英ガラス内に残留して耐失透性及び耐熱性に悪影響を及ぼす。第１の熱処理を行う温度、時間等は特に限定されるものではなく、所望のＯＨ基濃度が得られる条件であればよいが、例えば、１２００〜１４００℃で２〜１０時間熱処理を行えばよい。
【００１４】
第１の熱処理を行ったスート体を、ガラス化温度以上の温度で第２の熱処理を施して、透明な石英ガラスを得る。第２の熱処理の温度、時間等の条件も特に制限されるものではなく、透明な石英ガラスが得られる条件で行えばよいが、例えば、１４００〜１５５０℃で１〜１０時間熱処理を行えばよい。
【００１５】
なお、第１の熱処理で使用したＨ2ガスの一部は、石英ガラス中に取り込まれるが、第２の熱処理の際、容易に石英得ガラス中を拡散して石英ガラスから除去される。
【００１６】
このようにして得られた透明石英ガラスに、Ｘ線またはγ線を４×１０4Ｃ／ｋｇ以上照射する事で、紫外線吸収・可視光透過性の石英ガラスが得られる。Ｘ線及びγ線の照射条件は特に制限されるものではく、例えば、照射線量率２×１０4Ｃ／ｋｇ・ｈで２時間以上照射すればよい。
【００１７】
【実施例】
以下の実施例により本発明を具体的に説明するが、本発明はこれら実施例に何等限定されるものではない。
【００１８】
実施例１
原料にＳｉＣｌ4を使用して、スート法により合成石英ガラスインゴットを製造した。即ち、石英ガラス製バーナーの中心管から原料を供給し、バーナーの外管からＨ2およびＯ2を供給してスート体を合成した。このスート体を１００ｖｏｌ％（容積％）Ｈ2ガス雰囲気、１３００℃で５時間熱処理を行った。その後、１００ｖｏｌ％Ｈｅガス雰囲気で１５００℃、５時間熱処理して透明化し、合成石英ガラスインゴットを得た。
【００１９】
得られた石英ガラスに、Ｘ線を、照射線量率２×１０4Ｃ／ｋｇ・ｈで４時間照射して実施例１の合成石英ガラスインゴットを得た。
【００２０】
以下の各実施例・比較例において、得られたインゴットから厚さ１０ｍｍのテストピースを切り出し、評価用試料とした。
【００２１】
実施例２
Ｘ線を照射線量率１×１０4Ｃ／ｋｇ・ｈで８時間照射した以外は、実施例1と同様に行い、合成石英ガラスインゴットを得た。
【００２２】
実施例３
Ｘ線を照射線量率２×１０4Ｃ／ｋｇ・ｈで３時間照射した以外は、実施例1と同様に行い、合成石英ガラスインゴットを得た。
【００２３】
実施例４
Ｘ線を照射線量率２×１０4Ｃ／ｋｇ・ｈで２時間照射した以外は、実施例1と同様に行い、合成石英ガラスインゴットを得た。
【００２４】
実施例５
γ線を照射線量率２×１０4Ｃ／ｋｇ・ｈで４時間照射した以外は、実施例1と同様に行い、合成石英ガラスインゴットを得た。
【００２５】
実施例１〜５の製造条件を表１にまとめて示し、各試料の定量結果の一覧を表２に示す。
【００２６】
なお、各試料の含有成分の定量方法は以下の通りである。
【００２７】
ＯＨ基含有量は約２．７μｍの吸収からＩＲ測定法により定量した。
【００２８】
Ｈ2含有量は、ラマン分光測定法で定量した。Ｈ2に対応するピークは約４１５０ｃｍ-1あらわれる。このピークの面積強度と石英ガラスの基本構造による約８００ｃｍ-1のピークの面積強度との比からＨ2含有量を算出した。
【００２９】
Ｃｌ含有量は検量線法により蛍光Ｘ線測定法で定量した。金属不純物含有量はＩＣＰ質量分析法で求めた。
【００３０】
耐失透性及び耐熱性は、大気中、１１００℃で２４時間熱処理を行い、目視により失透の有無及び変形の有無を観察して評価した。
【００３１】
比較例１
Ｘ線の照射時間を１時間とした以外は、実施例１と同様の条件で、石英ガラスインゴットを得た。比較例１の試料は２３０ｎｍの透過率が８％で、紫外線吸収性に劣っていた。
【００３２】
比較例２
Ｈ2ガス雰囲気における熱処理時間を１時間とした以外は、実施例１と同様の条件で石英ガラスインゴットを得た。比較例２の試料はＯＨ基濃度が５ｐｐｍであり、２３０ｎｍの透過率が１０％で、紫外線吸収性に劣っており、耐失透性及び耐熱性に劣っていた。
【００３３】
比較例３
実施例１と同様の条件で得た、Ｈｅガス雰囲気下で熱処理することによって透明化した石英ガラスインゴットを、１００％Ｈ2、５００℃で５時間処理してＨ2を含浸させた。続いて、実施例１と同様の条件でＸ線を照射して石英ガラスインゴットを得た。比較例３の試料はＨ2を３×１０17個／ｃｍ3含有しており、２３０ｎｍの透過率が１３％で、紫外線吸収効果が不充分であると共に、耐失透性及び耐熱性に劣っていた。
【００３４】
比較例４
Ｈ2ガス雰囲気における熱処理を１００％Ｃｌ2ガスを用いて１３００℃で５時間行った以外は、実施例１と同様な条件で石英ガラスインゴットを得た。比較例４の試料はＣｌを４０ｐｐｍ含有しており、２３０ｎｍの透過率が３５％と紫外線吸収性が非常に悪く、耐失透性及び耐熱性も劣っていた。
【００３５】
比較例５
ＳｉＣｌ4にＴｉの塩化物を０．１重量％混合した原料を用い、熱処理を１３００℃で５時間行った以外は、実施例１と同様の条件で石英ガラスインゴットを得た。比較例５の試料にはＴｉが２０ｐｐｍ含有されており、３００ｎｍの透過率が７０％と低く、可視域の透過性、耐失透性及び耐熱性に劣っていた。
【００３６】
【表１】
本発明によれば、合成石英ガラスに金属元素をドープする事なく効率的に紫外線を吸収し、かつ耐失透性及び耐熱性にも優れた紫外線吸収・可視光透過性石英ガラス及びその製造方法を提供することが可能となり、この石英ガラスは、照明用ランプ、高輝度放電ランプ、レーザー励起ランプ等のバルブ材として有用である。[0001]
BACKGROUND OF THE INVENTION
The present invention is suitable for use as a bulb material for illumination lamps, high-intensity discharge lamps, laser-excited lamps, etc., which have excellent ultraviolet absorption and visible light transmission properties and excellent devitrification resistance and heat resistance. The present invention relates to synthetic quartz glass and a method for producing the same.
[0002]
[Prior art]
Synthetic quartz glass is not only transparent in a wide wavelength range from infrared to vacuum ultraviolet, but also has excellent thermal and chemical stability, so it is widely used as a light source window material for various lighting lamps. Has been.
[0003]
[Problems to be solved by the invention]
Due to the high light transmittance of synthetic quartz glass, not only the ultraviolet rays generated from the light source directly affect the human body but also harmful ozone is generated from the oxygen in the air by the ultraviolet rays, and the laser element is damaged by the ultraviolet rays. However, there are problems that the laser transmission efficiency is lowered, and the resin supporting the window material of the light source is damaged by ultraviolet rays and deteriorated.
[0004]
As a method for solving this problem, a quartz glass that absorbs ultraviolet rays by incorporating a transition metal element in the quartz glass has been proposed (see, for example, Patent Document 1 and Patent Document 2). In these methods of doping a metal element, the transmittance in the visible light region as well as the ultraviolet region is reduced due to absorption and scattering by the metal element. In addition, it is difficult to uniformly dope the metal element, and the doped metal element and the quartz glass react to cause crystallization of the quartz glass, resulting in a decrease in transparency (devitrification). Also, exposure to high temperatures causes the doped metal elements to diffuse or scatter, which not only reduces UV absorption efficiency, but also contaminates peripheral devices with the metal elements. There was also a problem with heat resistance, such as thermal deformation.
[0005]
[Patent Document 1]
Japanese Patent No. 2955463 (Claim 1)
[Patent Document 2]
Japanese Patent No. 2991901 (Claim 1)
[0006]
[Means for Solving the Problems]
In order to solve the above problems, the present inventor has conducted intensive studies on the relationship between various physical properties of synthetic quartz glass, light transmission characteristics, devitrification resistance, and heat resistance. As a result, the synthetic quartz glass is doped with a metal element. It has been found that it is possible to provide an ultraviolet-absorbing / visible-light transmissive quartz glass that efficiently absorbs ultraviolet rays and has excellent devitrification resistance and heat resistance.
[0007]
That is, the present invention has an OH group content of 1 ppm or less, an H 2 content of 1 × 10 17 atoms / cm 3 or less, a Cl content of 10 ppm or less, and a total of metal impurity contents of 1 ppm or less, and a thickness of 1 cm The quartz glass has a permeation transmittance of 5% or less in a wavelength region of 230 nm or less and 80% or more in a wavelength region of 300 nm or more.
[0008]
Moreover, the glass forming raw material is flame-hydrolyzed in an oxyhydrogen flame, and the generated silica fine particles are deposited on a target to form a porous silica body (soot body). The obtained soot body contains H 2 gas. A method for producing quartz glass, comprising: a step of heat-treating in an atmosphere and then obtaining transparent quartz glass to obtain transparent quartz glass; and a step of irradiating the obtained quartz glass with X-rays or γ-rays.
[0009]
The present invention will be described in detail below.
[0010]
OH groups, H 2 and metal impurities contained in quartz glass are thermally unstable. For example, when used under conditions exposed to high temperatures, such as lamp window materials, these easily enter the quartz glass. Spread. At that time, it reacts with the skeleton structure of the quartz glass to promote the crystallization of the quartz glass and the visible light transmittance is lowered. In addition, the heat resistance is reduced due to the unstable structure of the quartz. Accordingly, it is necessary to reduce these contents as much as possible. In the present invention, the OH group concentration is 1 ppm or less, and the H 2 content is 1 × 10 17 atoms / cm 3 or less, preferably 0.5 × 10 17. Pieces / cm 3 or less, the Cl content is 10 ppm or less, and the total content of metal impurities is 1 ppm or less, preferably 0.1 ppm or less.
[0011]
In order to obtain quartz glass that efficiently absorbs ultraviolet rays without doping components other than SiO 2 , it is necessary to produce quartz glass consisting of only Si and O elements having a structure that absorbs ultraviolet rays. The present inventors have found that the above object can be achieved by irradiating quartz glass synthesized by the method with X-rays or γ-rays, and have completed the present invention.
[0012]
The method for producing quartz glass of the present invention will be described. In the soot method, for example, a raw material such as SiCl 4 is supplied from the center of a quartz glass burner having a multi-tube structure, and H 2 and O 2 are supplied from the outer tube to flame-hydrolyze the raw material to produce silica fine particles. Get. The silica fine particles are deposited on the target to obtain a silica fine particle deposit (soot body). Since this soot contains a large amount of OH groups, it is necessary to perform the treatment in a reducing gas-containing atmosphere as the first heat treatment to reduce the OH group concentration to an appropriate range.
[0013]
The reducing gas used for the first heat treatment uses H 2 . Even if, for example, Cl 2 gas or the like is used as a reducing gas other than H 2 , the OH group concentration can be reduced, but the effect of the subsequent X-ray or γ-ray irradiation cannot be sufficiently obtained, and the ultraviolet absorption effect Not only becomes insufficient, but part of the used gas remains in the quartz glass, which adversely affects devitrification resistance and heat resistance. The temperature and time for performing the first heat treatment are not particularly limited as long as the desired OH group concentration can be obtained. For example, the heat treatment may be performed at 1200 to 1400 ° C. for 2 to 10 hours. .
[0014]
The soot body subjected to the first heat treatment is subjected to a second heat treatment at a temperature equal to or higher than the vitrification temperature to obtain transparent quartz glass. The conditions such as the temperature and time of the second heat treatment are not particularly limited, and may be performed under the conditions for obtaining transparent quartz glass. For example, the heat treatment may be performed at 1400 to 1550 ° C. for 1 to 10 hours. .
[0015]
Part of the H 2 gas used in the first heat treatment is taken into the quartz glass, but is easily diffused in the quartz glass and removed from the quartz glass during the second heat treatment.
[0016]
By irradiating the transparent quartz glass thus obtained with 4 × 10 4 C / kg or more of X-rays or γ-rays, an ultraviolet absorbing / visible light transmissive quartz glass can be obtained. The irradiation conditions of X-rays and γ-rays are not particularly limited. For example, the irradiation may be performed at an irradiation dose rate of 2 × 10 4 C / kg · h for 2 hours or more.
[0017]
【Example】
The present invention will be specifically described by the following examples, but the present invention is not limited to these examples.
[0018]
Example 1
A synthetic quartz glass ingot was produced by the soot method using SiCl 4 as a raw material. That is, the soot body was synthesized by supplying the raw material from the central tube of the quartz glass burner and supplying H 2 and O 2 from the outer tube of the burner. The soot body was heat-treated at 100 vol% (volume%) H 2 gas atmosphere at 1300 ° C. for 5 hours. Thereafter, it was heat treated at 1500 ° C. for 5 hours in a 100 vol% He gas atmosphere to make it transparent, and a synthetic quartz glass ingot was obtained.
[0019]
The obtained quartz glass was irradiated with X-rays at an irradiation dose rate of 2 × 10 4 C / kg · h for 4 hours to obtain a synthetic quartz glass ingot of Example 1.
[0020]
In each of the following Examples and Comparative Examples, a test piece having a thickness of 10 mm was cut out from the obtained ingot and used as an evaluation sample.
[0021]
Example 2
A synthetic quartz glass ingot was obtained in the same manner as in Example 1 except that X-rays were irradiated for 8 hours at an irradiation dose rate of 1 × 10 4 C / kg · h.
[0022]
Example 3
A synthetic quartz glass ingot was obtained in the same manner as in Example 1 except that X-rays were irradiated for 3 hours at an irradiation dose rate of 2 × 10 4 C / kg · h.
[0023]
Example 4
A synthetic quartz glass ingot was obtained in the same manner as in Example 1 except that X-rays were irradiated for 2 hours at an irradiation dose rate of 2 × 10 4 C / kg · h.
[0024]
Example 5
A synthetic quartz glass ingot was obtained in the same manner as in Example 1 except that γ rays were irradiated for 4 hours at an irradiation dose rate of 2 × 10 4 C / kg · h.
[0025]
The production conditions of Examples 1 to 5 are summarized in Table 1, and a list of quantitative results for each sample is shown in Table 2.
[0026]
In addition, the determination method of the content component of each sample is as follows.
[0027]
The OH group content was quantified by IR measurement from the absorption of about 2.7 μm.
[0028]
The H 2 content was quantified by Raman spectroscopy. A peak corresponding to H 2 appears at about 4150 cm −1 . The H 2 content was calculated from the ratio between the peak area intensity and the peak area intensity of about 800 cm −1 due to the basic structure of quartz glass.
[0029]
The Cl content was quantified by a fluorescent X-ray measurement method using a calibration curve method. The metal impurity content was determined by ICP mass spectrometry.
[0030]
The devitrification resistance and heat resistance were evaluated by performing heat treatment at 1100 ° C. for 24 hours in the air, and visually observing the presence or absence of devitrification and the presence or absence of deformation.
[0031]
Comparative Example 1
A quartz glass ingot was obtained under the same conditions as in Example 1 except that the X-ray irradiation time was 1 hour. The sample of Comparative Example 1 had a transmittance of 230 nm of 8% and was inferior in ultraviolet absorption.
[0032]
Comparative Example 2
A quartz glass ingot was obtained under the same conditions as in Example 1 except that the heat treatment time in the H 2 gas atmosphere was 1 hour. The sample of Comparative Example 2 had an OH group concentration of 5 ppm, a transmittance of 230 nm of 10%, inferior in ultraviolet absorption, and inferior in devitrification resistance and heat resistance.
[0033]
Comparative Example 3
A quartz glass ingot obtained by heat treatment in a He gas atmosphere obtained under the same conditions as in Example 1 was treated with 100% H 2 at 500 ° C. for 5 hours to impregnate H 2 . Subsequently, a quartz glass ingot was obtained by irradiation with X-rays under the same conditions as in Example 1. The sample of Comparative Example 3 contains 3 × 10 17 H 2 / cm 3 , the transmittance at 230 nm is 13%, the ultraviolet absorption effect is insufficient, and the devitrification resistance and heat resistance are inferior. It was.
[0034]
Comparative Example 4
Except that for 5 hours to a heat treatment in a H 2 gas atmosphere at 1300 ° C. with 100% Cl 2 gas, to obtain a quartz glass ingot under the same conditions as in Example 1. The sample of Comparative Example 4 contained 40 ppm of Cl, the transmittance at 230 nm was 35%, the ultraviolet absorptivity was very poor, and the devitrification resistance and heat resistance were also inferior.
[0035]
Comparative Example 5
A quartz glass ingot was obtained under the same conditions as in Example 1 except that a raw material in which 0.1% by weight of Ti chloride was mixed with SiCl 4 was subjected to heat treatment at 1300 ° C. for 5 hours. The sample of Comparative Example 5 contained 20 ppm of Ti, the transmittance at 300 nm was as low as 70%, and the transparency in the visible region, devitrification resistance and heat resistance were poor.
[0036]
[Table 1]
According to the present invention, an ultraviolet-absorbing / visible-light-transmitting quartz glass that efficiently absorbs ultraviolet rays without being doped with a metal element in the synthetic quartz glass and has excellent devitrification resistance and heat resistance, and a method for producing the same This quartz glass is useful as a bulb material for illumination lamps, high-intensity discharge lamps, laser excitation lamps, and the like.
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| JP5171605B2 (en) * | 2008-12-26 | 2013-03-27 | 信越石英株式会社 | Synthetic silica glass for discharge lamp and method for producing the same |
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