JP2005170706A - Ultraviolet-absorbing synthetic quartz glass and method for producing the same - Google Patents
Ultraviolet-absorbing synthetic quartz glass and method for producing the same Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C03B2201/04—Hydroxyl ion (OH)
Abstract
Description
本発明は、紫外線吸収性及び可視光透過性に優れ、かつ耐失透性及び耐熱性にも優れた、照明用ランプ、高輝度放電ランプ、レーザー励起ランプ等のバルブ材としての使用に適した合成石英ガラス及びその製造方法に関する。 The present invention is suitable for use as a bulb material for illumination lamps, high-intensity discharge lamps, laser-excited lamps, etc., which are excellent in ultraviolet absorption and visible light transmission, and also in devitrification resistance and heat resistance. The present invention relates to synthetic quartz glass and a method for producing the same.
合成石英ガラスは、赤外から真空紫外までの広い波長範囲において透明であるばかりでなく、熱的及び化学的安定性に優れていることから、各種照明ランプ等の光源用窓材等として広く使用されている。 Synthetic quartz glass is not only transparent in a wide wavelength range from infrared to vacuum ultraviolet, but also has excellent thermal and chemical stability, so it is widely used as a light source window material for various lighting lamps. Has been.
しかし、その高い光透過性のため光源から発生した紫外線が直接人体に悪影響を及ぼすばかりでなく、紫外線により空気中の酸素から人体に有害なオゾンが発生したり、レーザー素子が紫外線によりダメージを受け、レーザー発信効率が低下したり、光源の窓材を支持する樹脂が紫外線によりダメージを受け劣化する等の問題があった。 However, due to its high light transmittance, not only the ultraviolet rays generated from the light source have a direct adverse effect on the human body but also harmful ozone is generated from oxygen in the air due to the ultraviolet rays, and the laser element is damaged by the ultraviolet rays. However, there are problems that the laser transmission efficiency is lowered and the resin supporting the window material of the light source is damaged by ultraviolet rays and deteriorated.
この問題を解決する方法として、石英ガラス中に遷移金属元素を含有させて、紫外線を吸収する石英ガラスが提案されている（例えば、特許文献１及び特許文献２参照。）。 As a method for solving this problem, there has been proposed a quartz glass that absorbs ultraviolet rays by containing a transition metal element in the quartz glass (see, for example, Patent Document 1 and Patent Document 2).
上述のように金属元素をドープする方法では、金属をドープする余分な工程が必要となるため生産効率が低下する。また、金属元素による吸収、散乱のため、紫外線領域だけでなく、可視光領域の透過率も低下する。また、金属元素を均一にドープするのが困難であるばかりでなく、ドープした金属元素と石英ガラスが反応して石英ガラスが結晶化し透明性が低下（失透）する等の問題がある。また、高温にさらされることで、ドープした金属元素が拡散あるいは飛散して、紫外線吸収効率が低下するばかりでなく、金属元素により周辺機器が汚染される等の問題の他、高温使用時にバルブが熱変形する等、耐熱性にも問題がある。 As described above, in the method of doping a metal element, an extra step of doping a metal is required, so that the production efficiency is lowered. In addition, the transmittance in the visible light region as well as the ultraviolet region is reduced due to absorption and scattering by the metal element. In addition, it is difficult to uniformly dope the metal element, and there is a problem that the doped metal element reacts with the quartz glass and the quartz glass is crystallized to lower the transparency (devitrification). Moreover, exposure to high temperatures causes the doped metal elements to diffuse or scatter, which not only lowers UV absorption efficiency, but also contaminates peripheral devices with the metal elements. There is also a problem with heat resistance such as thermal deformation.
本発明者らは、上記課題を解決するため合成石英ガラスの諸物性と、光透過特性、耐失透性及び耐熱性との関係について鋭意検討を行った結果、合成石英ガラスに金属元素をドープすることなく効率的に紫外線を吸収し、かつ耐失透性及び耐熱性にも優れた、紫外線吸収合成石英ガラスを提供できることを見出した。 In order to solve the above-mentioned problems, the present inventors have conducted intensive studies on the relationship between various physical properties of synthetic quartz glass, light transmission characteristics, devitrification resistance, and heat resistance. As a result, the synthetic quartz glass is doped with a metal element. It was found that an ultraviolet-absorbing synthetic quartz glass that efficiently absorbs ultraviolet rays and has excellent devitrification resistance and heat resistance can be provided.
すなわち本発明は、ＯＨ基含有量が２０ｐｐｍ以下、Ｈ２分子の含有量が１×１０１７個／ｃｍ３以下、Ｃｌ含有量が１０ｐｐｍ以下及び金属不純物含有量の総和が１ｐｐｍ以下であり、厚さ１０ｍｍあたりの透過率が、１８０ｎｍ以下の波長領域で５％以下かつ、２２０ｎｍ以上の波長領域で８０％以上である紫外線吸収合成石英ガラスである。 That is, the present invention has an OH group content of 20 ppm or less, an H 2 molecule content of 1 × 10 17 molecules / cm 3 or less, a Cl content of 10 ppm or less, and a total of metal impurity contents of 1 ppm or less. The ultraviolet-absorbing synthetic quartz glass has a transmittance per 10 mm of 5% or less in a wavelength region of 180 nm or less and 80% or more in a wavelength region of 220 nm or more.
また、ガラス形成原料を、酸水素火炎中で火炎加水分解し、生成したシリカ微粒子をターゲット上に堆積させ多孔質シリカ体（スート体）を形成し、得られたスート体を、第１の熱処理としてＮＨ３ガス含有雰囲気で熱処理した後、第２の熱処理をして透明石英ガラスを得る工程から成ることを特徴とする、紫外線吸収石英ガラスの製造方法である。 Further, the glass forming raw material is flame-hydrolyzed in an oxyhydrogen flame, and the generated silica fine particles are deposited on a target to form a porous silica body (soot body). The obtained soot body is subjected to a first heat treatment. As a method for producing an ultraviolet-absorbing quartz glass, the method includes a step of obtaining a transparent quartz glass by performing a second heat treatment after heat treatment in an atmosphere containing NH 3 gas.
以下本発明を詳細に説明する。 The present invention will be described in detail below.
石英ガラス中に含有される、ＯＨ基、Ｈ２、Ｃｌ及び金属不純物は熱的に不安定であり、例えばランプの窓材等、高温にさらされる条件で使用した場合、これらは容易に石英ガラス内を拡散する。その際、石英ガラスの骨格構造と反応して、石英ガラスの結晶化を促進し、可視光の透過性が低下する。また、石英の骨格構造が不安定となる事で耐熱性も低下する。従って、これらの含有量は出来るだけ少なくする必要がある。すなわち、ＯＨ基濃度が２０ｐｐｍ以下、好ましくは１０ｐｐｍ以下、Ｈ２分子の含有量が１×１０１７個／ｃｍ３以下、好ましくは５×１０１６個／ｃｍ３以下、Ｃｌ含有量が１０ｐｐｍ以下及び金属不純物含有量の総和が１ｐｐｍ以下であることが重要である。ＳｉＯ２以外の成分をドープさせることなく、紫外線を効率よく吸収する石英ガラスを得るには、紫外線を吸収する構造を持つＳｉ元素とＯ元素だけからなる石英ガラスを製造する必要があるが、スート体をＮＨ３ガス雰囲気で熱処理した後透明ガラス化する製造方法で上記目的が達成されることを見出し、本発明を完成するに至った。 The OH group, H 2 , Cl and metal impurities contained in the quartz glass are thermally unstable, and when used under conditions exposed to high temperatures, such as lamp window materials, these are easily incorporated into the quartz glass. Spread inside. At that time, it reacts with the skeleton structure of the quartz glass to promote the crystallization of the quartz glass and the visible light transmittance is lowered. In addition, the heat resistance is reduced due to the unstable structure of the quartz. Therefore, it is necessary to reduce these contents as much as possible. That is, the OH group concentration is 20 ppm or less, preferably 10 ppm or less, the H 2 molecule content is 1 × 10 17 molecules / cm 3 or less, preferably 5 × 10 16 molecules / cm 3 or less, the Cl content is 10 ppm or less, and It is important that the total content of metal impurities is 1 ppm or less. In order to obtain quartz glass that efficiently absorbs ultraviolet rays without doping components other than SiO 2 , it is necessary to produce quartz glass consisting of only Si and O elements having a structure that absorbs ultraviolet rays. It has been found that the above object can be achieved by a production method in which a body is heat-treated in an NH 3 gas atmosphere and then transparent vitrified, and the present invention has been completed.
本発明の紫外線吸収石英ガラスの製造方法について説明する。スート法では、例えば、多重管構造の石英ガラス製バーナーの中心から、ＳｉＣｌ４などの原料を供給し、その外側の管からＨ２およびＯ２を供給して原料を火炎加水分解してシリカ微粒子を得る。このシリカ微粒子をターゲット上に堆積させシリカ微粒子堆積体（スート体）を得る。このスート体は多量のＯＨ基を含有するため、第１の熱処理として、還元性ガス含有雰囲気で処理を行い、ＯＨ基濃度を適切な範囲まで低減させる必要がある。 A method for producing the ultraviolet absorbing quartz glass of the present invention will be described. In the soot method, for example, a raw material such as SiCl 4 is supplied from the center of a quartz glass burner having a multi-tube structure, and H 2 and O 2 are supplied from the outer tube to flame-hydrolyze the raw material to produce silica fine particles. Get. The silica fine particles are deposited on the target to obtain a silica fine particle deposit (soot body). Since this soot contains a large amount of OH groups, it is necessary to perform the treatment in a reducing gas-containing atmosphere as the first heat treatment to reduce the OH group concentration to an appropriate range.
第１の熱処理に使用する還元性ガスは、ＮＨ３を使用する。ＮＨ３以外の還元性ガスとして、例えばＣｌ２ガス等を使用しても、ＯＨ基濃度の低減は可能であるが、紫外線吸収効果が不充分であるばかりでなく、使用したガスの一部が石英ガラス内に残留して耐失透性及び耐熱性に悪影響を及ぼす。第１の熱処理を行う際の、ＮＨ３ガス濃度、処理温度及び処理時間等の条件は特に限定されるものではなく、所望のＯＨ基濃度が得られる条件であればよい。 The reducing gas used for the first heat treatment uses NH 3 . Even if Cl 2 gas or the like is used as a reducing gas other than NH 3 , the OH group concentration can be reduced, but not only the ultraviolet absorption effect is insufficient, but a part of the used gas is also present. Residue in quartz glass adversely affects devitrification resistance and heat resistance. Conditions such as NH 3 gas concentration, processing temperature, and processing time when performing the first heat treatment are not particularly limited, as long as a desired OH group concentration can be obtained.
工業的生産性を考慮すれば、例えば、１〜２０ｖｏｌ％（体積％）ＮＨ３雰囲気（残部はＨｅ等の不活性ガス）、温度１０００〜１３００℃で１〜１０時間処理すればよい。 In consideration of industrial productivity, for example, the treatment may be performed at 1 to 20 vol% (volume%) NH 3 atmosphere (the balance is an inert gas such as He) at a temperature of 1000 to 1300 ° C. for 1 to 10 hours.
このようにして得られた第１の熱処理を行ったスート体を、ガラス化温度以上の温度で第２の熱処理を行って、透明な石英ガラスを得る。第２の熱処理の雰囲気、温度、時間等の条件も特に制限されるものではなく、透明な石英ガラスが得られる条件で行えばよい。例えば、不活性ガス雰囲気下、温度１３５０〜１５００℃で１〜１０時間処理を行えばよい。不活性ガスとしては、例えば、１００ｖｏｌ％又は希釈したヘリウム等を用いればよい。 The soot body that has been subjected to the first heat treatment thus obtained is subjected to a second heat treatment at a temperature equal to or higher than the vitrification temperature to obtain transparent quartz glass. The conditions of the atmosphere, temperature, time, etc. of the second heat treatment are not particularly limited, and may be performed under conditions that provide transparent quartz glass. For example, the treatment may be performed at 1350 to 1500 ° C. for 1 to 10 hours in an inert gas atmosphere. As the inert gas, for example, 100 vol% or diluted helium may be used.
本発明の製造方法によれば、金属元素等の不純物を含有せず、耐失透性及び耐熱性に優れた、紫外線吸収合成石英ガラスを提供することができる。 According to the production method of the present invention, it is possible to provide an ultraviolet-absorbing synthetic quartz glass which does not contain impurities such as metal elements and has excellent devitrification resistance and heat resistance.
実施例１
原料にＳｉＣｌ４を使用して、スート法により合成石英ガラスインゴットを製造した。石英ガラス製バーナーの中心管から原料を供給し、バーナーの外管からＨ２およびＯ２を供給してスート体を合成した。このスート体を１ｖｏｌ％（残部Ｈｅ）ＮＨ３ガス雰囲気、１２００℃で５時間熱処理を行った。その後、１００％Ｈｅガス雰囲気で１５００℃、５時間熱処理して透明な合成石英ガラスインゴットを得た。このインゴットから厚さ１０ｍｍのテストピースを切り出し、実施例１の評価用試料とした。
Example 1
A synthetic quartz glass ingot was manufactured by the soot method using SiCl 4 as a raw material. The raw material was supplied from the central tube of the quartz glass burner, and H 2 and O 2 were supplied from the outer tube of the burner to synthesize the soot body. This soot body was heat-treated at 1200 ° C. for 5 hours in a 1 vol% (remaining He) NH 3 gas atmosphere. Thereafter, heat treatment was performed at 1500 ° C. for 5 hours in a 100% He gas atmosphere to obtain a transparent synthetic quartz glass ingot. A test piece having a thickness of 10 mm was cut out from the ingot and used as an evaluation sample of Example 1.
実施例２
実施例２の試料は、１０ｖｏｌ％ＮＨ３ガス雰囲気、１０００℃で５時間熱処理を行い、実施例１に記載の方法で透明ガラス化して製造した。
Example 2
The sample of Example 2 was manufactured by heat-treating at 1000 ° C. for 5 hours in a 10 vol% NH 3 gas atmosphere and forming a transparent glass by the method described in Example 1.
実施例３
実施例３の試料は、１ｖｏｌ％ＮＨ３ガス雰囲気、１３００℃で３時間熱処理い、実施例１に記載の方法で透明ガラス化して製造した。表１に各試料の製造条件を示す。
Example 3
The sample of Example 3 was manufactured by heat-treating in a 1 vol% NH 3 gas atmosphere at 1300 ° C. for 3 hours and forming a transparent glass by the method described in Example 1. Table 1 shows the manufacturing conditions of each sample.
ＯＨ基含有量はＩＲ測定法で求めた約２．７μｍの吸光度から、Ｇ．Ｈｅｔｈｅｒｉｎｇｔｏｎ ａｎｄ Ｋ．Ｈ．Ｊａｃｋ， Ｐｈｙｓｉｃｓ ａｎｄ Ｃｈｅｍｉｓｔｒｙ Ｇｌａｓｓｅｓ，３（１９６２）１２９−１３３に記載の方法により定量した。 The OH group content was determined from the absorbance of about 2.7 μm determined by the IR measurement method. Heatherington and K.C. H. Quantification was performed by the method described in Jack, Physics and Chemistry Glasses, 3 (1962) 129-133.
Ｈ２分子含有量は、ラマン分光測定法で求めたＨ２分子に対応する約４１５０ｃｍ−１のピークと、石英ガラスの基本振動に対応する約８００ｃｍ−１のピークの面積強度比から、Ｖ．Ｓ．Ｋｈｏｔｉｍｃｈｅｎｋｏ， Ｇ．Ｍ．Ｓｏｃｈｉｖｋｉｎ， Ｉ．Ｉ．Ｎｏｖａｋ ａｎｄ Ｋ．Ｎ．Ｋｕｓｅｎｋｏ，Ｊｏｕｒｎａｌ ｏｆ Ａｐｐｌｉｅｄ Ｓｐｅｃｔｒｏｓｃｏｐｙ，４６（６）（１９８７）６３２−６３５に記載の方法により定量した。 The content of H 2 molecule is determined from the area intensity ratio of the peak at about 4150 cm −1 corresponding to the H 2 molecule obtained by Raman spectroscopy and the peak at about 800 cm −1 corresponding to the fundamental vibration of quartz glass. S. Khotimchenko, G.M. M.M. Sochivkin, I.D. I. Novak and K.K. N. Quantification was performed by the method described in Kusenko, Journal of Applied Spectroscopy, 46 (6) (1987) 632-635.
Ｃｌ含有量は検量線法により蛍光Ｘ線測定法で定量した。金属不純物含有量はＩＣＰ質量分析法で求めた。 The Cl content was quantified by a fluorescent X-ray measurement method using a calibration curve method. The metal impurity content was determined by ICP mass spectrometry.
耐失透性及び耐熱性は、大気中、１２００℃で２４時間熱処理を行い、目視により失透の有無及び変形の有無を観察して評価した。 The devitrification resistance and heat resistance were evaluated by performing heat treatment at 1200 ° C. for 24 hours in the air, and visually observing the presence or absence of devitrification and the presence or absence of deformation.
表２に各試料の評価結果の一覧を示す。 Table 2 shows a list of evaluation results for each sample.
表２に示すように、本発明の範囲の合成石英ガラスである実施例の試料は、紫外線吸収石英ガラスとして優れた性能を持つ合成石英ガラスである。 As shown in Table 2, a sample of an example which is a synthetic quartz glass within the scope of the present invention is a synthetic quartz glass having excellent performance as an ultraviolet absorbing quartz glass.
第１の熱処理を２０％ＣＯガス雰囲気で行った以外は、実施例１と同等な条件で合成した石英ガラスインゴットからテストピースを切り出し、比較例１の試料とした。比較例１の試料は、１８０ｎｍの透過率が８０％と高く紫外線の吸収が不充分であった。また、ＯＨ基濃度が６０ｐｐｍと高く、耐熱性に劣っていた。
A test piece was cut out from a quartz glass ingot synthesized under the same conditions as in Example 1 except that the first heat treatment was performed in a 20% CO gas atmosphere to obtain a sample of Comparative Example 1. The sample of Comparative Example 1 had a high transmittance of 180% at 80% and insufficient UV absorption. Moreover, the OH group concentration was as high as 60 ppm and the heat resistance was poor.
比較例２
実施例１と同等の条件で石英ガラスインゴットを合成後、１００％Ｈ２、５００℃で５時間処理してＨ２を含浸して比較例２の試料とした。比較例２の試料はＨ２分子を３×１０１７個／ｃｍ３含有しており、１８０ｎｍの透過率が８％で、紫外線吸収効果が不充分であると共に、耐失透性及び耐熱性に劣っていた。
Comparative Example 2
A quartz glass ingot was synthesized under the same conditions as in Example 1 and then treated with 100% H 2 at 500 ° C. for 5 hours to impregnate H 2 to obtain a sample of Comparative Example 2. The sample of Comparative Example 2 contains 3 × 10 17 H 2 molecules / cm 3 , the transmittance at 180 nm is 8%, the ultraviolet absorption effect is insufficient, and the devitrification resistance and heat resistance are improved. It was inferior.
比較例３
第１の熱処理を１０％Ｃｌ２ガス雰囲気で行った以外は、実施例１と同等な条件で合成し比較例３の試料とした。この試料はＣｌを６０ｐｐｍ含有していた。比較例３の試料は、１８０ｎｍの透過率が３５％と紫外線吸収性が悪く、また耐失透性及び耐熱性も劣っていた。
Comparative Example 3
A sample of Comparative Example 3 was synthesized under the same conditions as in Example 1 except that the first heat treatment was performed in a 10% Cl 2 gas atmosphere. This sample contained 60 ppm Cl. The sample of Comparative Example 3 had a transmittance of 180 nm of 35% and a poor ultraviolet absorptivity, and was also inferior in devitrification resistance and heat resistance.
比較例４
ＳｉＣｌ４にＴｉの塩化物を混合した原料を用いて石英インゴットを合成した以外は、実施例１と同等の条件で合成して比較例４の試料とした。この試料にはＴｉが２０ｐｐｍ含有されており、２２０ｎｍの透過率が６５％と低く、可視域の透過性、耐失透性及び耐熱性に劣っていた。
Comparative Example 4
A sample of Comparative Example 4 was synthesized under the same conditions as in Example 1 except that a quartz ingot was synthesized using a raw material in which TiCl 4 was mixed with SiCl 4 . This sample contained 20 ppm of Ti, the transmittance at 220 nm was as low as 65%, and the transparency in the visible range, devitrification resistance and heat resistance were poor.
Claims (2)
The glass forming raw material is flame-hydrolyzed in an oxyhydrogen flame, and the generated silica fine particles are deposited on a target to form a porous silica body (soot body). The obtained soot body is NH as a first heat treatment. The method for producing an ultraviolet-absorbing synthetic quartz glass according to claim 1, wherein the transparent quartz glass is obtained by performing a second heat treatment after heat treatment in an atmosphere containing three gases.
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| JP2003410258A JP2005170706A (en) | 2003-12-09 | 2003-12-09 | Ultraviolet-absorbing synthetic quartz glass and method for producing the same |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009106134A1 (en) * | 2008-02-27 | 2009-09-03 | Heraeus Quarzglas Gmbh & Co. Kg | Method for producing an optical component of quartz glass |
| JP2009298686A (en) * | 2008-05-12 | 2009-12-24 | Shinetsu Quartz Prod Co Ltd | Synthetic silica glass, method for producing the same, and device provided with lamp for electric-discharge lamp or synthetic silica soot firing furnace core tube using the synthetic silica glass |
| JP2014218417A (en) * | 2013-05-10 | 2014-11-20 | 信越石英株式会社 | Molding method of synthetic quartz glass, and synthetic quartz glass |
| JP2019503961A (en) * | 2015-12-18 | 2019-02-14 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | Ammonia treatment of silicon dioxide powder in the preparation of quartz glass |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| US11236002B2 (en) | 2015-12-18 | 2022-02-01 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of an opaque quartz glass body |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| US11492285B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies from silicon dioxide granulate |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11708290B2 (en) | 2015-12-18 | 2023-07-25 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
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2003
- 2003-12-09 JP JP2003410258A patent/JP2005170706A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009106134A1 (en) * | 2008-02-27 | 2009-09-03 | Heraeus Quarzglas Gmbh & Co. Kg | Method for producing an optical component of quartz glass |
| JP2009298686A (en) * | 2008-05-12 | 2009-12-24 | Shinetsu Quartz Prod Co Ltd | Synthetic silica glass, method for producing the same, and device provided with lamp for electric-discharge lamp or synthetic silica soot firing furnace core tube using the synthetic silica glass |
| JP2014218417A (en) * | 2013-05-10 | 2014-11-20 | 信越石英株式会社 | Molding method of synthetic quartz glass, and synthetic quartz glass |
| JP2019503961A (en) * | 2015-12-18 | 2019-02-14 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | Ammonia treatment of silicon dioxide powder in the preparation of quartz glass |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| US11236002B2 (en) | 2015-12-18 | 2022-02-01 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of an opaque quartz glass body |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| US11492285B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies from silicon dioxide granulate |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11708290B2 (en) | 2015-12-18 | 2023-07-25 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
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