JP4376624B2 - 複数経路干渉分光法 - Google Patents

複数経路干渉分光法 Download PDF

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Publication number
JP4376624B2
JP4376624B2 JP2003523930A JP2003523930A JP4376624B2 JP 4376624 B2 JP4376624 B2 JP 4376624B2 JP 2003523930 A JP2003523930 A JP 2003523930A JP 2003523930 A JP2003523930 A JP 2003523930A JP 4376624 B2 JP4376624 B2 JP 4376624B2
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JP
Japan
Prior art keywords
path
paths
interferometer
beams
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003523930A
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English (en)
Japanese (ja)
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JP2005501241A5 (enExample
JP2005501241A (ja
Inventor
エイ． ヒル、ヘンリー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Publication of JP2005501241A publication Critical patent/JP2005501241A/ja
Publication of JP2005501241A5 publication Critical patent/JP2005501241A5/ja
Application granted granted Critical
Publication of JP4376624B2 publication Critical patent/JP4376624B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02058—Passive reduction of errors by particular optical compensation or alignment elements, e.g. dispersion compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2003523930A 2001-08-23 2002-08-23 複数経路干渉分光法 Expired - Fee Related JP4376624B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US31456801P 2001-08-23 2001-08-23
PCT/US2002/026931 WO2003019110A1 (en) 2001-08-23 2002-08-23 Multiple-pass interferometry

Publications (3)

Publication Number Publication Date
JP2005501241A JP2005501241A (ja) 2005-01-13
JP2005501241A5 JP2005501241A5 (enExample) 2006-01-05
JP4376624B2 true JP4376624B2 (ja) 2009-12-02

Family

ID=23220457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003523930A Expired - Fee Related JP4376624B2 (ja) 2001-08-23 2002-08-23 複数経路干渉分光法

Country Status (2)

Country Link
JP (1) JP4376624B2 (enExample)
WO (1) WO2003019110A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110157595A1 (en) * 2009-12-30 2011-06-30 Yerazunis William S Rotary Interferometer
DE102010056122B3 (de) * 2010-12-20 2012-06-28 Universität Stuttgart Verfahren zur robusten, insbesondere weitskaligen Interferometrie
US8934104B2 (en) 2010-01-22 2015-01-13 Universitaet Stuttgart Method and arrangement for robust interferometry for detecting a feature of an object
DE102013210999A1 (de) * 2013-06-13 2014-12-18 Dr. Johannes Heidenhain Gmbh Messeinrichtung
WO2020076822A1 (en) * 2018-10-12 2020-04-16 Magic Leap, Inc. Staging system to verify accuracy of a motion tracking system
DE102019119790A1 (de) * 2019-07-22 2021-01-28 4Jet Microtech Gmbh Laserbearbeitungsvorrichtung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4802765A (en) * 1986-06-12 1989-02-07 Zygo Corporation Differential plane mirror having beamsplitter/beam folder assembly

Also Published As

Publication number Publication date
JP2005501241A (ja) 2005-01-13
WO2003019110A1 (en) 2003-03-06

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