JP2005501241A5 - - Google Patents

Download PDF

Info

Publication number
JP2005501241A5
JP2005501241A5 JP2003523930A JP2003523930A JP2005501241A5 JP 2005501241 A5 JP2005501241 A5 JP 2005501241A5 JP 2003523930 A JP2003523930 A JP 2003523930A JP 2003523930 A JP2003523930 A JP 2003523930A JP 2005501241 A5 JP2005501241 A5 JP 2005501241A5
Authority
JP
Japan
Prior art keywords
paths
path
interferometer
beams
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003523930A
Other languages
English (en)
Japanese (ja)
Other versions
JP4376624B2 (ja
JP2005501241A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2002/026931 external-priority patent/WO2003019110A1/en
Publication of JP2005501241A publication Critical patent/JP2005501241A/ja
Publication of JP2005501241A5 publication Critical patent/JP2005501241A5/ja
Application granted granted Critical
Publication of JP4376624B2 publication Critical patent/JP4376624B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003523930A 2001-08-23 2002-08-23 複数経路干渉分光法 Expired - Fee Related JP4376624B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US31456801P 2001-08-23 2001-08-23
PCT/US2002/026931 WO2003019110A1 (en) 2001-08-23 2002-08-23 Multiple-pass interferometry

Publications (3)

Publication Number Publication Date
JP2005501241A JP2005501241A (ja) 2005-01-13
JP2005501241A5 true JP2005501241A5 (enExample) 2006-01-05
JP4376624B2 JP4376624B2 (ja) 2009-12-02

Family

ID=23220457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003523930A Expired - Fee Related JP4376624B2 (ja) 2001-08-23 2002-08-23 複数経路干渉分光法

Country Status (2)

Country Link
JP (1) JP4376624B2 (enExample)
WO (1) WO2003019110A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110157595A1 (en) * 2009-12-30 2011-06-30 Yerazunis William S Rotary Interferometer
DE102010056122B3 (de) * 2010-12-20 2012-06-28 Universität Stuttgart Verfahren zur robusten, insbesondere weitskaligen Interferometrie
US8934104B2 (en) 2010-01-22 2015-01-13 Universitaet Stuttgart Method and arrangement for robust interferometry for detecting a feature of an object
DE102013210999A1 (de) * 2013-06-13 2014-12-18 Dr. Johannes Heidenhain Gmbh Messeinrichtung
WO2020076822A1 (en) * 2018-10-12 2020-04-16 Magic Leap, Inc. Staging system to verify accuracy of a motion tracking system
DE102019119790A1 (de) * 2019-07-22 2021-01-28 4Jet Microtech Gmbh Laserbearbeitungsvorrichtung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4802765A (en) * 1986-06-12 1989-02-07 Zygo Corporation Differential plane mirror having beamsplitter/beam folder assembly

Similar Documents

Publication Publication Date Title
JP4880232B2 (ja) 位置情報を取得するためのシステムおよび方法
US6762845B2 (en) Multiple-pass interferometry
US6878916B2 (en) Method for focus detection for optically detecting deviation of the image plane of a projection lens from the upper surface of a substrate, and an imaging system with a focus-detection system
US6201609B1 (en) Interferometers utilizing polarization preserving optical systems
JP5361946B2 (ja) 位置センサ及びリソグラフィ装置
EP0961914B1 (en) Interferometer system with two wavelengths, and lithographic apparatus provided with such a system
US7433048B2 (en) Interferometer systems for measuring displacement and exposure systems using the same
US7474409B2 (en) Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof
JP4668953B2 (ja) リソグラフィ装置およびデバイス製造方法
JP2005501243A5 (enExample)
JPH11504724A (ja) 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置
JP4469604B2 (ja) 光学干渉分光法
JP2003508799A (ja) 偏光保存光学系
CN101218482A (zh) 面位置检测装置、曝光装置及曝光方法
JP2005501240A5 (enExample)
US20150108337A1 (en) Encoder head designs
JP4476195B2 (ja) 偏光ビームスプリッタ装置、干渉計モジュール、リソグラフィ装置、およびデバイス製造方法
US6982796B2 (en) Wavefront splitting element for EUV light and phase measuring apparatus using the same
TWI235891B (en) Lithographic apparatus, device manufacturing method, and computer program
JP2008177561A (ja) リソグラフィ装置およびデバイス製造方法
JP2005501241A5 (enExample)
JP5477774B2 (ja) 光学ユニット、干渉装置、ステージ装置、パターン形成装置およびデバイス製造方法
JP4556954B2 (ja) マスク表面の高さ方向位置測定方法、露光装置及び露光方法
JP4376624B2 (ja) 複数経路干渉分光法
US20090310105A1 (en) Optical member, interferometer system, stage apparatus, exposure apparatus, and device manufacturing method