JP4366152B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4366152B2
JP4366152B2 JP2003317326A JP2003317326A JP4366152B2 JP 4366152 B2 JP4366152 B2 JP 4366152B2 JP 2003317326 A JP2003317326 A JP 2003317326A JP 2003317326 A JP2003317326 A JP 2003317326A JP 4366152 B2 JP4366152 B2 JP 4366152B2
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Japan
Prior art keywords
mirror
stage
wavefront aberration
exposure apparatus
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003317326A
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English (en)
Japanese (ja)
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JP2005086031A (ja
JP2005086031A5 (enExample
Inventor
義一 宮島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003317326A priority Critical patent/JP4366152B2/ja
Publication of JP2005086031A publication Critical patent/JP2005086031A/ja
Publication of JP2005086031A5 publication Critical patent/JP2005086031A5/ja
Application granted granted Critical
Publication of JP4366152B2 publication Critical patent/JP4366152B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2003317326A 2003-09-09 2003-09-09 露光装置 Expired - Fee Related JP4366152B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003317326A JP4366152B2 (ja) 2003-09-09 2003-09-09 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003317326A JP4366152B2 (ja) 2003-09-09 2003-09-09 露光装置

Publications (3)

Publication Number Publication Date
JP2005086031A JP2005086031A (ja) 2005-03-31
JP2005086031A5 JP2005086031A5 (enExample) 2006-10-26
JP4366152B2 true JP4366152B2 (ja) 2009-11-18

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ID=34416941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003317326A Expired - Fee Related JP4366152B2 (ja) 2003-09-09 2003-09-09 露光装置

Country Status (1)

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JP (1) JP4366152B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006128713A2 (en) * 2005-06-02 2006-12-07 Carl Zeiss Smt Ag Optical imaging arrangement
JP2007027226A (ja) * 2005-07-13 2007-02-01 Nikon Corp 反射光学系、照明光学装置及び露光装置
JP5206132B2 (ja) * 2008-06-05 2013-06-12 株式会社ニコン 光学素子保持装置、光学系、露光装置、デバイスの製造方法
DE102008030664A1 (de) * 2008-07-01 2010-01-21 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit Bestimmung von Abbildungsfehlern
JP5294804B2 (ja) * 2008-10-31 2013-09-18 三菱電機株式会社 光学調整装置
CN104977710B (zh) * 2014-04-09 2018-04-27 上海微电子装备（集团）股份有限公司 一种光学系统像质补偿装置
CN113310902B (zh) * 2021-05-26 2023-10-03 中国科学院光电技术研究所 一种光腔衰荡自适应光学主动横模匹配方法

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Publication number Publication date
JP2005086031A (ja) 2005-03-31

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