JP4361799B2 - 多光子光増感システム - Google Patents
多光子光増感システム Download PDFInfo
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- JP4361799B2 JP4361799B2 JP2003558597A JP2003558597A JP4361799B2 JP 4361799 B2 JP4361799 B2 JP 4361799B2 JP 2003558597 A JP2003558597 A JP 2003558597A JP 2003558597 A JP2003558597 A JP 2003558597A JP 4361799 B2 JP4361799 B2 JP 4361799B2
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- multiphoton
- photon
- photosensitizer
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- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- 239000001017 thiazole dye Substances 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- TYIZUJNEZNBXRS-UHFFFAOYSA-K trifluorogadolinium Chemical compound F[Gd](F)F TYIZUJNEZNBXRS-UHFFFAOYSA-K 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
- NTUUXNCVRZQBFX-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-5-yl)ethyl]silane Chemical compound CO[Si](OC)(OC)CCC1CCCC2OC12 NTUUXNCVRZQBFX-UHFFFAOYSA-N 0.000 description 1
- WLADIVUISABQHN-UHFFFAOYSA-N trimethyl(piperidin-1-yl)silane Chemical compound C[Si](C)(C)N1CCCCC1 WLADIVUISABQHN-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- BPLUKJNHPBNVQL-UHFFFAOYSA-N triphenylarsine Chemical class C1=CC=CC=C1[As](C=1C=CC=CC=1)C1=CC=CC=C1 BPLUKJNHPBNVQL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- XKGLSKVNOSHTAD-UHFFFAOYSA-N valerophenone Chemical compound CCCCC(=O)C1=CC=CC=C1 XKGLSKVNOSHTAD-UHFFFAOYSA-N 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical class [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229920003176 water-insoluble polymer Polymers 0.000 description 1
- AWSFICBXMUKWSK-UHFFFAOYSA-N ytterbium(3+) Chemical compound [Yb+3] AWSFICBXMUKWSK-UHFFFAOYSA-N 0.000 description 1
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Polymerisation Methods In General (AREA)
- Luminescent Compositions (AREA)
- Glass Compositions (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Optical Communication System (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/033,507 US6750266B2 (en) | 2001-12-28 | 2001-12-28 | Multiphoton photosensitization system |
| PCT/US2002/039473 WO2003058346A1 (en) | 2001-12-28 | 2002-12-09 | Multiphoton photosensitization system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005514658A JP2005514658A (ja) | 2005-05-19 |
| JP2005514658A5 JP2005514658A5 (https=) | 2006-02-02 |
| JP4361799B2 true JP4361799B2 (ja) | 2009-11-11 |
Family
ID=21870791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003558597A Expired - Fee Related JP4361799B2 (ja) | 2001-12-28 | 2002-12-09 | 多光子光増感システム |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6750266B2 (https=) |
| EP (1) | EP1459132B1 (https=) |
| JP (1) | JP4361799B2 (https=) |
| KR (1) | KR100904926B1 (https=) |
| CN (1) | CN1288498C (https=) |
| AT (1) | ATE329292T1 (https=) |
| AU (1) | AU2002363983A1 (https=) |
| CA (1) | CA2469095A1 (https=) |
| DE (1) | DE60212189T2 (https=) |
| WO (1) | WO2003058346A1 (https=) |
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| US7014988B2 (en) * | 2000-06-15 | 2006-03-21 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
| ATE433129T1 (de) * | 2000-06-15 | 2009-06-15 | 3M Innovative Properties Co | Mikroherstellungsverfahren für organische optische bauteile |
| WO2001096958A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Process for producing microfluidic articles |
| US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
| JP2004503928A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 多方向光反応吸収方法 |
| US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| AU2001270320A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
| DE60139620D1 (de) * | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
| US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
| US8119041B2 (en) * | 2001-09-05 | 2012-02-21 | Fujifilm Corporation | Non-resonant two-photon absorption induction method and process for emitting light thereby |
| EP1470449A1 (en) * | 2002-01-31 | 2004-10-27 | Scandinavian Micro Biodevices A/S | Method of joining a workpiece and a microstructure by light exposure |
| US7232650B2 (en) | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
| US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
| US20040198857A1 (en) * | 2003-04-01 | 2004-10-07 | Dejneka Matthew J. | Photochemical reactions using multi-photon upconverting fluorescent inorganic materials |
| US20060246375A1 (en) * | 2003-05-28 | 2006-11-02 | Matsushita Electric Industrial Co., Ltd | Information recording medium and its manufacturing method,recording/preproducing method, and optical information recording/reproducing device |
| US20040259030A1 (en) * | 2003-06-23 | 2004-12-23 | Hayden Joseph S. | Resonantly enhanced photosensitivity |
| JP2005092177A (ja) * | 2003-09-12 | 2005-04-07 | Rohm & Haas Electronic Materials Llc | 光学部品形成方法 |
| JP2005305735A (ja) * | 2004-04-20 | 2005-11-04 | Fuji Photo Film Co Ltd | 平版印刷版原版および平版印刷方法 |
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| AU2005319365B2 (en) | 2004-12-20 | 2011-02-03 | Performance Indicator L.L.C. | High-intensity, persistent photoluminescent formulations and objects, and methods for creating the same |
| US7910022B2 (en) | 2006-09-15 | 2011-03-22 | Performance Indicator, Llc | Phosphorescent compositions for identification |
| US7297374B1 (en) * | 2004-12-29 | 2007-11-20 | 3M Innovative Properties Company | Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
| US20060154180A1 (en) * | 2005-01-07 | 2006-07-13 | Kannurpatti Anandkumar R | Imaging element for use as a recording element and process of using the imaging element |
| US7583444B1 (en) * | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
| US7846639B2 (en) * | 2006-06-30 | 2010-12-07 | E. I. Du Pont De Nemours And Company | Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element |
| US7551359B2 (en) * | 2006-09-14 | 2009-06-23 | 3M Innovative Properties Company | Beam splitter apparatus and system |
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-
2001
- 2001-12-28 US US10/033,507 patent/US6750266B2/en not_active Expired - Lifetime
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2002
- 2002-12-09 CN CNB028262530A patent/CN1288498C/zh not_active Expired - Fee Related
- 2002-12-09 EP EP02798501A patent/EP1459132B1/en not_active Expired - Lifetime
- 2002-12-09 DE DE60212189T patent/DE60212189T2/de not_active Expired - Lifetime
- 2002-12-09 JP JP2003558597A patent/JP4361799B2/ja not_active Expired - Fee Related
- 2002-12-09 KR KR1020047010070A patent/KR100904926B1/ko not_active Expired - Fee Related
- 2002-12-09 AU AU2002363983A patent/AU2002363983A1/en not_active Abandoned
- 2002-12-09 WO PCT/US2002/039473 patent/WO2003058346A1/en not_active Ceased
- 2002-12-09 CA CA002469095A patent/CA2469095A1/en not_active Abandoned
- 2002-12-09 AT AT02798501T patent/ATE329292T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US20030139484A1 (en) | 2003-07-24 |
| WO2003058346A1 (en) | 2003-07-17 |
| US6750266B2 (en) | 2004-06-15 |
| CN1288498C (zh) | 2006-12-06 |
| JP2005514658A (ja) | 2005-05-19 |
| AU2002363983A1 (en) | 2003-07-24 |
| KR20040076267A (ko) | 2004-08-31 |
| CA2469095A1 (en) | 2003-07-17 |
| CN1608230A (zh) | 2005-04-20 |
| ATE329292T1 (de) | 2006-06-15 |
| EP1459132A1 (en) | 2004-09-22 |
| KR100904926B1 (ko) | 2009-06-29 |
| DE60212189D1 (de) | 2006-07-20 |
| DE60212189T2 (de) | 2007-04-12 |
| EP1459132B1 (en) | 2006-06-07 |
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