JP4361495B2 - プラズマ表面処理装置の電極構造 - Google Patents

プラズマ表面処理装置の電極構造 Download PDF

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Publication number
JP4361495B2
JP4361495B2 JP2005000826A JP2005000826A JP4361495B2 JP 4361495 B2 JP4361495 B2 JP 4361495B2 JP 2005000826 A JP2005000826 A JP 2005000826A JP 2005000826 A JP2005000826 A JP 2005000826A JP 4361495 B2 JP4361495 B2 JP 4361495B2
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electrode
gas
plasma
electric field
case
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JP2005000826A
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Japanese (ja)
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JP2005184019A (ja
JP2005184019A5 (https=
Inventor
裕也 北畠
勇司 江口
節男 中嶋
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Sekisui Chemical Co Ltd
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Sekisui Chemical Co Ltd
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  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2005000826A 2005-01-05 2005-01-05 プラズマ表面処理装置の電極構造 Expired - Fee Related JP4361495B2 (ja)

Priority Applications (1)

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JP2005000826A JP4361495B2 (ja) 2005-01-05 2005-01-05 プラズマ表面処理装置の電極構造

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005000826A JP4361495B2 (ja) 2005-01-05 2005-01-05 プラズマ表面処理装置の電極構造

Related Parent Applications (1)

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JP2002294125A Division JP3686647B2 (ja) 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造

Publications (3)

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JP2005184019A JP2005184019A (ja) 2005-07-07
JP2005184019A5 JP2005184019A5 (https=) 2005-11-10
JP4361495B2 true JP4361495B2 (ja) 2009-11-11

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JP2005000826A Expired - Fee Related JP4361495B2 (ja) 2005-01-05 2005-01-05 プラズマ表面処理装置の電極構造

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112009000131T5 (de) * 2008-01-18 2010-12-09 Kyocera Corporation Plasma-Generator und Entladungsvorrichtung und Reaktor, der einen Plasma-Generator verwendet

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JP2005184019A (ja) 2005-07-07

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