JP4347143B2 - Circuit board and manufacturing method thereof - Google Patents

Circuit board and manufacturing method thereof Download PDF

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JP4347143B2
JP4347143B2 JP2004172958A JP2004172958A JP4347143B2 JP 4347143 B2 JP4347143 B2 JP 4347143B2 JP 2004172958 A JP2004172958 A JP 2004172958A JP 2004172958 A JP2004172958 A JP 2004172958A JP 4347143 B2 JP4347143 B2 JP 4347143B2
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circuit board
resin
metal foil
resin layer
conductive protrusions
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JP2005353841A (en
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田 文 彦 松
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Nippon Mektron KK
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Description

本発明は、回路基板の構造およびその製造方法に係り、とくに導電性突起を利用して層間接続を行う複層型回路基板およびその製造方法に関する。   The present invention relates to a structure of a circuit board and a manufacturing method thereof, and more particularly to a multilayer circuit board that performs interlayer connection using conductive protrusions and a manufacturing method thereof.

近年、電子機器の小型化および高機能化が益々促進されており、そのために回路基板に対する高密度化の要求が高まっている。そこで、回路基板を片面から両面や三層以上の多層回路基板とすることにより、回路基板の高密度化を図っている。   In recent years, downsizing and higher functionality of electronic devices have been increasingly promoted, and for this reason, there is an increasing demand for higher density of circuit boards. In view of this, the circuit board is made to be a multi-layer circuit board from one side to both sides or three or more layers to increase the density of the circuit board.

従来、これらの回路基板においては、層間接続には、レーザー、NCドリル、プラズマエッチング、化学エッチング等による開孔後、メッキ処理を行う手法が採用されている。しかし、メッキ処理工程自体の歩留まりの悪さ、絶縁樹脂層の導通を取る工程の煩雑さが問題である。   Conventionally, in these circuit boards, for interlayer connection, a technique of performing plating treatment after opening by laser, NC drill, plasma etching, chemical etching or the like has been adopted. However, the poor yield of the plating process itself and the complexity of the process of conducting the insulating resin layer are problems.

そこで、回路基板の層間接続をメッキ法によるビアホール接続から導電ペーストによる印刷バンプやメッキ、エッチングによる金属バンプなどの導電性突起に置き換える手法が開発されている。   Therefore, a method has been developed in which the interlayer connection of the circuit board is replaced with a conductive protrusion such as a printed bump by a conductive paste, plating, or a metal bump by etching instead of via hole connection by plating.

図3は、特許文献1,2に記載された、従来工法による導電性突起を用いた接続による両面可撓性回路基板の製造法を示す工程図である。まず図3(1)に示すように、銅箔21、ニッケル箔22、銅箔23の3層構造の金属基材24(特許文献2参照)を用意する。次いで、図3(2)に示すように、銅箔21をエッチングして導電性突起25を形成する(特許文献3)。そして図3(3)に示すように、導電性突起25が設けられた面に、両面に熱可塑性ポリイミドを有するポリイミドフィルム26を貼り付ける。続いて図3(4)に示すように、導電性突起25の頂部27をポリイミドフィルム26から露出させて、回路基材28を形成する。   FIG. 3 is a process diagram showing a method for manufacturing a double-sided flexible circuit board by connection using conductive protrusions according to a conventional method described in Patent Documents 1 and 2. First, as shown in FIG. 3 (1), a metal substrate 24 having a three-layer structure of a copper foil 21, a nickel foil 22, and a copper foil 23 (see Patent Document 2) is prepared. Next, as shown in FIG. 3 (2), the copper foil 21 is etched to form conductive protrusions 25 (Patent Document 3). Then, as shown in FIG. 3 (3), a polyimide film 26 having thermoplastic polyimide on both sides is attached to the surface on which the conductive protrusions 25 are provided. Subsequently, as shown in FIG. 3 (4), the top portion 27 of the conductive protrusion 25 is exposed from the polyimide film 26 to form a circuit substrate 28.

この後、図3(5)に示すように、銅箔29に導電性突起25が回路基材28を積層する。そして、図3(6)に示すように、積層体における両面の銅箔に回路パターン30を形成して両面可撓性回路基板31を形成する。
特開2002-141629号公報 特開2003-129259号公報 特開平6-350258号公報 特開2003-327697号公報
Thereafter, as shown in FIG. 3 (5), the conductive protrusions 25 are laminated on the copper foil 29 with the circuit substrate 28. And as shown in FIG.3 (6), the circuit pattern 30 is formed in the copper foil of both surfaces in a laminated body, and the double-sided flexible circuit board 31 is formed.
JP 2002-141629 A JP 2003-129259 A JP-A-6-350258 JP2003-327697

ここにおいて、導電性突起は、ポリイミドフィルムを直接貫通することが難しく、貫通可能であっても導電性突起の頂部にポリイミドフィルムが残ることがある。   Here, it is difficult for the conductive protrusion to directly penetrate the polyimide film, and the polyimide film may remain on the top of the conductive protrusion even though the conductive protrusion can penetrate.

このため、機械的または化学的手法により導電性突起頂部のポリイミドフィルムを除去することが必要であり、これは更なる後処理を必要とするという問題点もある。   For this reason, it is necessary to remove the polyimide film at the top of the conductive protrusions by a mechanical or chemical method, which also has a problem that further post-treatment is required.

本発明は上述の点を考慮してなされたもので、導電性突起により層間接続を行う回路基板をより少ない工程で安定的に製造し得る構造の回路基板およびその製造方法を提供することを目的とする。   The present invention has been made in consideration of the above-described points, and an object thereof is to provide a circuit board having a structure capable of stably manufacturing a circuit board for performing interlayer connection with conductive protrusions in fewer steps, and a method for manufacturing the circuit board. And

上記目的達成のため、本発明では、
少なくとも一方の面に導電性突起が形成された金属箔、この金属箔における前記一方の面に前記導電性突起が貫通した状態で積層される絶縁樹脂層を有する回路基材が、他の回路部材または金属箔と積層されて複数の回路層を形成し、前記導電性突起により前記回路層の間の接続を行う回路基板において、
前記絶縁樹脂層は、
樹脂エッチング液耐性の低いポリイミド系樹脂により構成されるコア樹脂層と、
前記コア樹脂層よりも樹脂エッチング液耐性の高い材料により構成される接着層と、
を有し、
前記絶縁樹脂層の前記コア樹脂層の側が、前記金属箔の前記導電性突起が形成された面に対向するように積層された
ことを特徴とする回路基板、および
少なくとも一方の面に導電性突起が形成された金属箔を用意し、前記金属箔の前記一方の面に樹脂エッチング液耐性の異なる2層以上の絶縁樹脂層を、樹脂エッチング液耐性の低い層が前記金属箔に接するように積層し、樹脂エッチング工法により選択エッチングを施して前記導電性突起の頂部を露出させる回路基板の製造方法、
を提供するものである。
In order to achieve the above object, in the present invention,
A metal foil having conductive protrusions formed on at least one surface, and a circuit substrate having an insulating resin layer laminated with the conductive protrusions penetrating on one surface of the metal foil is another circuit member. Alternatively, in a circuit board that is laminated with a metal foil to form a plurality of circuit layers and that connects between the circuit layers by the conductive protrusions,
The insulating resin layer is
A core resin layer composed of a polyimide resin having low resistance to a resin etchant;
An adhesive layer made of a material having a higher resistance to a resin etching solution than the core resin layer;
I have a,
The core resin layer side of the insulating resin layer was laminated so as to face the surface of the metal foil on which the conductive protrusions were formed.
And a metal foil having conductive protrusions formed on at least one surface, and two or more insulating resin layers having different resistance to a resin etchant are provided on the one surface of the metal foil. A method of manufacturing a circuit board in which a layer having a low resistance to a resin etching solution is laminated so as to be in contact with the metal foil, and a top portion of the conductive protrusion is exposed by performing selective etching by a resin etching method,
Is to provide.

本発明は上述のように、樹脂エッチング工法により樹脂を除去して導電性突起の頂部を露出させることとし、樹脂エッチング耐性の異なる2層以上の絶縁樹脂層を樹脂エッチング耐性の低いものを金属箔に接するように積層しておき、樹脂エッチングを施すようにしたため、少ない工程で回路基板を製造することができる。   In the present invention, as described above, the resin is removed by the resin etching method to expose the tops of the conductive protrusions, and two or more insulating resin layers having different resin etching resistance are made of a metal foil having low resin etching resistance. Since the substrate is laminated so as to be in contact with the resin, and the resin etching is performed, the circuit board can be manufactured with few steps.

以下、図1および図2を参照して本発明の一実施例を説明する。   Hereinafter, an embodiment of the present invention will be described with reference to FIGS.

図1(1)ないし(6)は、本発明に係る回路基板の製造工程を示したものである。   1 (1) to 1 (6) show a process for manufacturing a circuit board according to the present invention.

まず図1(1)に示すように、厚み100μmの銅箔1、厚み2μmのニッケル箔2および厚さ18μmの銅箔3からなる金属基材4を用意する。 First, as shown in FIG. 1 (1), a metal substrate 4 comprising a copper foil 1 having a thickness of 100 μm, a nickel foil 2 having a thickness of 2 μm, and a copper foil 3 having a thickness of 18 μm is prepared.

続いて図1(2)に示すように、銅箔1をエッチングして導電性突起5を形成する。このときのエッチング液としては、例えば塩化第2銅を用いる。   Subsequently, as shown in FIG. 1 (2), the copper foil 1 is etched to form conductive protrusions 5. As an etching solution at this time, for example, cupric chloride is used.

この後、図1(3)に示すように、金属基材4の導電性突起5のある面に、樹脂エッチング液耐性の異なる2層以上により構成された絶縁樹脂層6を形成する。   Thereafter, as shown in FIG. 1 (3), an insulating resin layer 6 composed of two or more layers having different resistance to the resin etching solution is formed on the surface of the metal base 4 where the conductive protrusions 5 are provided.

絶縁樹脂層6は、キャスト法、ラミネート法等を樹脂の性質に応じて選択すればよい。 The insulating resin layer 6 may be selected from a cast method, a laminate method, and the like according to the properties of the resin.

このとき絶縁樹脂層6は、導電性突起5のある面全体に形成されるが、図1(3)に示すように、導電性突起5の頂部にも形成される。そして、絶縁樹脂層6は2層、すなわち樹脂エッチング液耐性の低い絶縁樹脂層8と樹脂エッチング液耐性が高く接着性の絶縁樹脂層9とからなる。樹脂エッチング液耐性の低い絶縁樹脂層8は、銅箔3に接するように設け、樹脂エッチング液耐性の高い絶縁樹脂層9は、その上に設ける。   At this time, the insulating resin layer 6 is formed on the entire surface where the conductive protrusions 5 are provided, but is also formed on the top of the conductive protrusions 5 as shown in FIG. The insulating resin layer 6 is composed of two layers, that is, an insulating resin layer 8 having low resin etching solution resistance and an insulating resin layer 9 having high resin etching solution resistance and adhesiveness. The insulating resin layer 8 having a low resistance to resin etching solution is provided so as to be in contact with the copper foil 3, and the insulating resin layer 9 having a high resistance to resin etching solution is provided thereon.

樹脂エッチング液耐性の低い絶縁樹脂層8としては、ポリイミド系樹脂を利用し、樹脂エッチング液耐性の高い絶縁樹脂層9としては、アクリル系、エポキシ系、熱可塑性ポリイミド等の接着性樹脂を利用する。   A polyimide resin is used as the insulating resin layer 8 having a low resistance to resin etching solution, and an adhesive resin such as acrylic, epoxy, or thermoplastic polyimide is used as the insulating resin layer 9 having a high resistance to resin etching solution. .

次いで図1(4)に示すように、導電性突起5の頂部に形成された絶縁樹脂層8,9を除去して導電性突起5の頂部を露出させるために、樹脂エッチングを行う。樹脂エッチング液としては、オキシアルキルアミン及びアルカリ金属化合物を含むものを使用することができる。   Next, as shown in FIG. 1 (4), resin etching is performed to remove the insulating resin layers 8 and 9 formed on the top of the conductive protrusion 5 and expose the top of the conductive protrusion 5. As the resin etching solution, one containing oxyalkylamine and an alkali metal compound can be used.

この樹脂エッチングにより、樹脂エッチング耐性の低い層8が選択的にエッチングされ、導電性突起5の頂部7に形成されている絶縁樹脂層6が除去される。このとき、銅箔3に接した絶縁樹脂層8およびその上の絶縁樹脂層9は、絶縁樹脂層9の樹脂エッチング液耐性が高いため、樹脂エッチングに対してストッパ層となり、下の層を保護する。そして、導電性突起5が絶縁樹脂層6、つまり絶縁樹脂層8および同9を貫通した回路基材10が得られる。   By this resin etching, the layer 8 having low resin etching resistance is selectively etched, and the insulating resin layer 6 formed on the top 7 of the conductive protrusion 5 is removed. At this time, since the insulating resin layer 8 in contact with the copper foil 3 and the insulating resin layer 9 thereabove are highly resistant to the resin etching solution of the insulating resin layer 9, it serves as a stopper layer against the resin etching and protects the lower layer. To do. And the circuit base material 10 which the electroconductive protrusion 5 penetrated the insulating resin layer 6, ie, the insulating resin layers 8 and 9, is obtained.

続いて図1(5)に示すように、回路基材10の導電性突起5が露出した面に銅箔11を積層して、絶縁樹脂層8,9を挟む2つの銅箔3,11が導電性突起5により接続された両面基板を形成する。   Subsequently, as shown in FIG. 1 (5), the copper foil 11 is laminated on the surface of the circuit substrate 10 where the conductive protrusions 5 are exposed, and the two copper foils 3, 11 sandwiching the insulating resin layers 8, 9 are formed. A double-sided substrate connected by the conductive protrusions 5 is formed.

そして、図1(6)に示すように、両面基板における銅箔3,11に回路パターンを形成した上で、カバーフィルム、ソルダーレジスト層、無電解ニッケルメッキ、金メッキ等を施して可撓性両面回路基板13を形成する。   Then, as shown in FIG. 1 (6), after forming a circuit pattern on the copper foils 3 and 11 on the double-sided substrate, a cover film, a solder resist layer, electroless nickel plating, gold plating, etc. A circuit board 13 is formed.

図2(1)および(2)は、図1に示した工程で作成された可撓性両面回路基板13を用いてケーブル部を持った可撓性多層回路基板を形成する工程を示している。   2 (1) and 2 (2) show a process of forming a flexible multilayer circuit board having a cable portion by using the flexible double-sided circuit board 13 produced in the process shown in FIG. .

図2(1)に示すように、可撓性両面回路基板13に別途作成した多層コア基材14と積層プレスし、次いで図2(2)に示すように、外層の両面に回路パターン15を形成する。これにより、ケーブル部16を有する可撓性多層回路基板17を作成することができる。   As shown in FIG. 2 (1), a multilayer core substrate 14 separately formed on a flexible double-sided circuit board 13 is laminated and pressed, and then a circuit pattern 15 is formed on both sides of the outer layer as shown in FIG. 2 (2). Form. Thereby, the flexible multilayer circuit board 17 having the cable portion 16 can be formed.

図1(1)ないし(6)は、本発明の一実施例の製作工程を示す工程図。1 (1) to (6) are process diagrams showing a manufacturing process according to an embodiment of the present invention. 図2(1),(2)は、図1の工程で作成された可撓性回路基板を用いてケーブルを持つ可撓性多層回路基板を作成する工程を示す工程図。FIGS. 2A and 2B are process diagrams showing a process of creating a flexible multilayer circuit board having a cable using the flexible circuit board created in the process of FIG. 従来の可撓性両面型回路基板の作成工程を示す工程図。The process figure which shows the creation process of the conventional flexible double-sided circuit board.

符号の説明Explanation of symbols

1 銅箔、2 ニッケル箔、3 銅箔、4 金属基材、5 導電性突起、
6 絶縁樹脂層、7 導電性突起の頂部、8,9 絶縁樹脂層、
10 回路基材、11 銅箔、12 回路パターン、13 可撓性回路基板、
14 多層コア基材、15 回路パターン、16 ケーブル部、
17 可撓性多層回路基板。
1 copper foil, 2 nickel foil, 3 copper foil, 4 metal substrate, 5 conductive protrusion,
6 insulating resin layer, 7 top of conductive protrusion, 8, 9 insulating resin layer,
10 circuit base, 11 copper foil, 12 circuit pattern, 13 flexible circuit board,
14 multilayer core substrate, 15 circuit pattern, 16 cable part,
17 Flexible multilayer circuit board.

Claims (3)

少なくとも一方の面に導電性突起が形成された金属箔、この金属箔における前記一方の面に前記導電性突起が貫通した状態で積層される絶縁樹脂層を有する回路基材が、他の回路部材または金属箔と積層されて複数の回路層を形成し、前記導電性突起により前記回路層の間の接続を行う回路基板において、
前記絶縁樹脂層は、
樹脂エッチング液耐性の低いポリイミド系樹脂により構成されるコア樹脂層と、
前記コア樹脂層よりも樹脂エッチング液耐性の高い材料により構成される接着層と、
を有し、
前記絶縁樹脂層の前記コア樹脂層の側が、前記金属箔の前記導電性突起が形成された面に対向するように積層された
ことを特徴とする回路基板。
A metal foil having conductive protrusions formed on at least one surface, and a circuit substrate having an insulating resin layer laminated with the conductive protrusions penetrating on one surface of the metal foil is another circuit member. Alternatively, in a circuit board that is laminated with a metal foil to form a plurality of circuit layers and that connects between the circuit layers by the conductive protrusions,
The insulating resin layer is
A core resin layer composed of a polyimide resin having low resistance to a resin etchant;
An adhesive layer made of a material having a higher resistance to a resin etching solution than the core resin layer;
I have a,
The core resin layer side of the insulating resin layer was laminated so as to face the surface of the metal foil on which the conductive protrusions were formed.
A circuit board characterized by that .
請求項1記載の回路基板において、
前記接着層は、ポリイミド系樹脂により構成される回路基板。
In the circuit board according to claim 1,
The adhesive layer is a circuit board made of polyimide resin.
少なくとも一方の面に導電性突起が形成された金属箔を用意し、
前記金属箔の前記一方の面に樹脂エッチング液耐性の異なる2層以上の絶縁樹脂層を、樹脂エッチング液耐性の低い層が前記金属箔に接するように積層し、
樹脂エッチング工法により選択エッチングを施して前記導電性突起の頂部を露出させる
回路基板の製造方法。
Prepare a metal foil with conductive protrusions formed on at least one surface,
Laminating two or more insulating resin layers having different resin etchant resistance on the one surface of the metal foil such that a layer having low resin etchant resistance is in contact with the metal foil,
A method for manufacturing a circuit board, wherein selective etching is performed by a resin etching method to expose a top portion of the conductive protrusion.
JP2004172958A 2004-06-10 2004-06-10 Circuit board and manufacturing method thereof Expired - Fee Related JP4347143B2 (en)

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JP5335971B2 (en) * 2012-05-31 2013-11-06 日本メクトロン株式会社 Mounting electronic components on flexible printed wiring boards
CN117881112B (en) * 2024-03-12 2024-05-07 四川英创力电子科技股份有限公司 28-Layer 8-order Ultra HDI and manufacturing method thereof

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