JP4332094B2 - Manufacturing method of molded circuit components - Google Patents

Manufacturing method of molded circuit components Download PDF

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JP4332094B2
JP4332094B2 JP2004284997A JP2004284997A JP4332094B2 JP 4332094 B2 JP4332094 B2 JP 4332094B2 JP 2004284997 A JP2004284997 A JP 2004284997A JP 2004284997 A JP2004284997 A JP 2004284997A JP 4332094 B2 JP4332094 B2 JP 4332094B2
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plating
substrate
aqueous solution
covering material
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JP2006100576A (en
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哲男 湯本
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Sankyo Kasei Co Ltd
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本発明は、例えば内部アンテナ等において表面の一部や貫通している穴の内周面めっきを施して回路が形成してある成形回路部品(Molded Interconnect Devices)の製造方法に関する。   The present invention relates to a method for manufacturing a molded circuit device (Molded Interconnect Devices) in which a circuit is formed by plating a part of the surface of an internal antenna or the like and plating an inner peripheral surface of a through hole.

従来の成形回路部品の製造方法として、本願出願人は、先に回路部品の外形形状に合致する形状のキャビティ内にめっきグレードの液晶ポリマーを射出して一次成形品を成形する工程と、この一次成形品の表面を粗化する工程と、この一次成形品の粗化された面をオキシアルキレン基含有ポリビニルアルコール系樹脂からなる被覆材で、形成すべき回路部分を除き、部分的に被覆する工程と、上記被覆された面以外の表面にめっき用触媒を附与する工程と、上記被覆材を除去する工程と、上記触媒附与面にめっきする工程とからなるものを提案した。(特許文献1)。そして、この製造方法における被覆材のオキシアルキレン基含有ポリビニルアルコール系樹脂は、水溶性であるので湯内での溶出が容易であり、生分解性であるので環境を汚染することなく自然に還元できるものであった。   As a conventional method of manufacturing a molded circuit component, the applicant of the present application firstly forms a primary molded product by injecting a plating grade liquid crystal polymer into a cavity having a shape that matches the outer shape of the circuit component. A step of roughening the surface of the molded product, and a step of partially covering the roughened surface of the primary molded product with a coating material made of an oxyalkylene group-containing polyvinyl alcohol resin, excluding the circuit portion to be formed And a step of applying a plating catalyst to a surface other than the coated surface, a step of removing the coating material, and a step of plating the surface of the catalyst. (Patent Document 1). The oxyalkylene group-containing polyvinyl alcohol resin of the coating material in this production method is water-soluble, so it can be easily eluted in hot water, and biodegradable, so it can be reduced naturally without polluting the environment. It was a thing.

他の従来例として、前記従来例と製造工程は同じであるが、被覆材としてポリ乳酸又はポリ乳酸を主体とする脂肪族ポリエステルとの混合体又は共重合体であるものがある。(特許文献2)。
特開平11−145583号公報 特開2001−240975号公報の請求項6
As another conventional example, although the manufacturing process is the same as that of the conventional example, there is one that is a mixture or copolymer of polylactic acid or aliphatic polyester mainly composed of polylactic acid as a coating material. (Patent Document 2).
JP-A-11-145583 Claim 6 of JP 2001-240975 A

ところで、近年になり高分子材料として酵素分解性並びにアルカリ分解性高分子よりなる群から選択されたもの、例えばポリブチレンサクシネートラクテート樹脂(PBSL)が提案されており、本願出願人はこれを成形回路部品の製造方法において被覆材として適用できないか研究した結果、適用可能であることが判明し、特に、このPBSLはポリ乳酸よりも柔軟性の高いものであるため、回路パターンの輪郭の再現が実現できる被覆材として極めて有効であることが判明し、本発明を完成したものである。
そして本発明の目的は、二次成形品との密着性に優れ、二次成形品の被覆材として溶融成形性に優れ射出成形に有利で、この被覆材を簡単かつ容易に除去でき、環境を汚染することなく、正確な回路パターンの輪郭の再現が実現できる成形回路部品の製造方法を提供することにある。
Recently, materials selected from the group consisting of enzyme-degradable and alkali-degradable polymers, such as polybutylene succinate lactate resin (PBSL), have been proposed as a polymer material. As a result of studying whether it can be applied as a coating material in a method of manufacturing circuit components, it was found that it can be applied. In particular, since this PBSL is more flexible than polylactic acid, it is possible to reproduce the contour of a circuit pattern. It was proved to be extremely effective as a covering material that can be realized, and the present invention has been completed.
The object of the present invention is excellent in adhesion to the secondary molded product, excellent in melt moldability as a coating material for the secondary molded product, advantageous for injection molding, and can easily and easily remove this coating material, An object of the present invention is to provide a method of manufacturing a molded circuit component that can realize accurate reproduction of the contour of a circuit pattern without contamination.

本発明に係る成形回路部品の製造方法の第1の特徴は、めっき適合性熱可塑性プラスチック、例えばめっきグレードの液晶ポリマーにより一次成形品の基体を成形する工程と、この基体の全表面を粗化する工程と、この粗化された面を被覆材で、形成すべき回路部分を除き、部分的に被覆する工程と、上記被覆された面以外の表面にめっき用触媒を附与する工程と、上記被覆材を除去する工程と、上記触媒附与面にめっきする工程とからなるものであって、上記被覆材は酵素分解性並びにアルカリ分解性高分子よりなる群から選択されたものであるところにある。   The first feature of the method for producing a molded circuit component according to the present invention is a step of molding a base body of a primary molded product with a plating-compatible thermoplastic plastic, for example, a plating grade liquid crystal polymer, and roughening the entire surface of the base body. A step of covering the roughened surface with a coating material, except for a circuit portion to be formed, partially covering the surface, and a step of applying a plating catalyst to a surface other than the coated surface; The method comprises a step of removing the coating material and a step of plating the catalyst-providing surface, wherein the coating material is selected from the group consisting of an enzyme-degradable polymer and an alkali-degradable polymer. It is in.

本発明の第2の特徴は、前記第1の特徴における被覆材の酵素分解性並びにアルカリ分解性高分子とは、コハク酸、1.4ブタンジオール、乳酸で重合され、その内、乳酸の比率が40%以下であるポリブチレンサクシネートラクテート樹脂(PBSL)を主体とし、アジピン酸、ポリエチレングリコール、グリセリンから選択された少なくとも1つの酵素分解性促進剤、アルカリ分解性促進剤との混合体又は共重合体であるところにある。   The second feature of the present invention is that the enzymolytic and alkali-degradable polymer of the coating material in the first feature is polymerized with succinic acid, 1.4 butanediol, and lactic acid, of which the ratio of lactic acid A mixture or co-polymer of polybutylene succinate lactate resin (PBSL) having a content of 40% or less, at least one enzyme-degrading accelerator selected from adipic acid, polyethylene glycol, and glycerin, and an alkali-degrading accelerator. There is a polymer.

本発明の第3の特徴は、前記PBSLによる酵素分解は、酵素1〜10重量%の水溶液で、温度25〜80℃の水溶液中に1〜240分浸漬して除去されるところにある。また、本発明の第4の特徴は、PBSLによるアルカリ分解は、苛性ソーダ(NaOH)、又は苛性カリ(KOH)2〜15重量%の水溶液で、温度25〜80℃の水溶液中に1〜240分浸漬して除去されるところにある。   The third feature of the present invention is that the enzymatic degradation by PBSL is removed by immersing in an aqueous solution of 1 to 10% by weight of the enzyme and immersed in an aqueous solution at a temperature of 25 to 80 ° C. for 1 to 240 minutes. The fourth feature of the present invention is that alkaline decomposition by PBSL is performed by immersing in an aqueous solution of 2 to 15% by weight of caustic soda (NaOH) or caustic potash (KOH) for 1 to 240 minutes in an aqueous solution at a temperature of 25 to 80 ° C. And is being removed.

本発明の効果として、基体にめっき適合性熱可塑性プラスチックを用いるので、表面が粗化されるため二次成形品との密着性に優れ、二次成形品の被覆材として酵素分解性並びにアルカリ分解性高分子よりなる群から選択された材料を使用するので、溶融成形性に優れているので射出成形に有利でありさらに、この被覆材は酵素水溶液又はアルカリ水溶液により簡単かつ容易に除去でき、さらに、生分解性であるため環境を汚染することなく自然に還元できる。このように、二次成形品の被覆材は酵素水溶液、又はアルカリ水溶液で加水分解により完全に除去できるので最終製品である成形回路部品に残存せず、正確な回路パターンの輪郭の再現が実現でき、この部品を必要最小限の大きさに成形できる。さらに、触媒は被覆材で被覆されていない部分、つまり回路成形に必要な範囲にのみ附与することができるので、触媒の材料に無駄を生じない。   As an effect of the present invention, since a plating-compatible thermoplastic is used for the substrate, the surface is roughened, so that it has excellent adhesion to the secondary molded product, and as a covering material for the secondary molded product, enzymatic decomposability and alkaline decomposition. Since a material selected from the group consisting of functional polymers is used, it is advantageous for injection molding because of its excellent melt moldability. Further, this coating material can be easily and easily removed with an aqueous enzyme solution or an aqueous alkaline solution. Because it is biodegradable, it can be reduced naturally without polluting the environment. As described above, the covering material of the secondary molded product can be completely removed by hydrolysis with an aqueous enzyme solution or an alkaline aqueous solution, so that it does not remain in the molded circuit component that is the final product, and an accurate circuit pattern contour reproduction can be realized. This part can be molded to the minimum required size. Further, since the catalyst can be applied only to a portion not covered with the coating material, that is, a range necessary for circuit molding, the catalyst material is not wasted.

特に、被覆材のポリブチレンサクシネートラクテート樹脂(PBSL)は植物由来の原料により製造されたものであるから、生分解性であり、バクテリア微生物による生分解の場合でも、焼却廃棄の場合でも大気中の二酸化炭素を高めることがなく、いわゆるカーボンニュートラルである。   In particular, the coating material polybutylene succinate lactate resin (PBSL) is manufactured from plant-derived raw materials and is therefore biodegradable, and it can be used in the atmosphere whether it is biodegraded by bacterial microorganisms or incinerated. It is so-called carbon neutral without increasing carbon dioxide.

以下、図1(A)〜(F)の各図を参照して本発明に係る最良の実施の形態を説明すると、図1(A)は一次成形工程において成形される一次成形品である基体1を示しており、この外形形状は最終製品である成形回路部品(図1(F))に合致するもので、本発明ではこの基体の表面を部分的にめっきする方法である。図示していないが、金型の対向面に形成してあるキャビティ内に、金型を閉じた状態でめっき適合性熱可塑性プラスチックを射出して成形する。   Hereinafter, the best embodiment according to the present invention will be described with reference to FIGS. 1A to 1F. FIG. 1A is a base body which is a primary molded product molded in a primary molding step. 1, the outer shape matches the molded circuit component (FIG. 1 (F)), which is the final product. In the present invention, the surface of the substrate is partially plated. Although not shown, a plating-compatible thermoplastic is injected and molded in a cavity formed on the opposite surface of the mold with the mold closed.

めっき適合性熱可塑性プラスチック、例えばめっきグレードの液晶ポリマーを使用した事例について説明する。
この液晶ポリマーは、芳香族ポリエステル系のもので、例えば「ベクトラ」(ポリプラスチック株式会社の商品名)のめっきグレードC810である。
基体1の成形工程の射出成形条件の一例を示すと、
材料 「ベクトラ」のめっきグレードC810
シリンダー温度 320℃
金型温度 110℃
射出圧力 1200Kg/cm
冷却時間 20秒
An example using a plating compatible thermoplastic, for example, a plating grade liquid crystal polymer will be described.
This liquid crystal polymer is of an aromatic polyester type, and is, for example, plating grade C810 of “Vectra” (trade name of Polyplastics Co., Ltd.).
An example of injection molding conditions in the molding process of the substrate 1 is as follows:
Material "Vectra" plating grade C810
Cylinder temperature 320 ° C
Mold temperature 110 ℃
Injection pressure 1200Kg / cm 2
Cooling time 20 seconds

図1(B)は基体1の全表面を粗化する工程を示すもので、基体の外周面、貫通穴がある場合にはこの貫通穴の内周面など全ての表面を粗面11とするものである。このために、基体1を脱脂し、表面を粗化(エッチング)処理する。このエッチング処理の例としては、苛性ソーダまたは苛性カリを所定濃度、例えば45wt%に溶解したアルカリ性水溶液を所定温度、例えば50〜90℃に加熱し、基体1を所定時間、例えば30分浸漬して行う。このエッチング処理によって、基体1の全ての表面が粗面化する。   FIG. 1B shows the process of roughening the entire surface of the substrate 1. When there are outer peripheral surfaces of the substrate and through holes, all surfaces such as the inner peripheral surface of the through holes are rough surfaces 11. Is. For this purpose, the substrate 1 is degreased and the surface is roughened (etched). As an example of this etching process, an alkaline aqueous solution in which caustic soda or caustic potash is dissolved at a predetermined concentration, for example, 45 wt% is heated to a predetermined temperature, for example, 50 to 90 ° C., and the substrate 1 is immersed for a predetermined time, for example, 30 minutes. By this etching process, the entire surface of the substrate 1 is roughened.

図1(C)は二次成形工程によって成形された二次成形品2を示しており、これは図示していないが、通常の上下の金型の対向面に、基体1の外周に所定の空隙を有する形状に合致する形状のキャビティが形成されており、このキャビティ内には、後で説明する成形回路部品に形成される回路部分4を空隙として残さないようになっているもので、キャビティ内に基体1を挿置した後で、この金型を閉じた状態でキャビティ内に被覆材21を射出して成形する。そのため、粗化された面11を被覆材21で、形成すべき回路部分4(図1(F)参照)である凹部21aを除き、部分的に被覆される。これが二次成形品2である。   FIG. 1 (C) shows a secondary molded product 2 molded by the secondary molding process, which is not shown in the figure, but on the opposing surface of the normal upper and lower molds, on the outer periphery of the base 1, A cavity having a shape matching the shape having a gap is formed, and in this cavity, a circuit portion 4 formed in a molded circuit component described later is not left as a gap. After the base body 1 is inserted into the inside, the covering material 21 is injected into the cavity and molded while the mold is closed. Therefore, the roughened surface 11 is partially covered with the covering material 21 except for the concave portion 21a which is the circuit portion 4 to be formed (see FIG. 1F). This is the secondary molded product 2.

この被覆材21は酵素分解性並びにアルカリ分解性高分子からなる群から選択されたもので、この酵素分解性並びにアルカリ分解性高分子とは、例えば、酵素分解性であり、且つアルカリ分解性のポリブチレンサクシネートラクテート(Poly Butylene Succinate Lactate,PBSL)で、その構成は、コハク酸と1.4ブタンジオール、乳酸で重合され、この内、乳酸の比率が40%以下であるもので、このようなPBSLを主体としアジピン酸、ポリエチレングリコール、グリセリンから選択された少なくとも1つの酵素分解促進剤、アルカリ分解促進剤との混合体又は共重合体である。このPBSLは、前記したようにコハク酸と1.4ブタンジオール及び乳酸を直接脱水重縮合したもので、このコハク酸は澱粉などの植物由来原料から製造されるもので、このPBSLは生分解性を有し、これは植物由来の樹脂として知られているポリ乳酸と比較して柔軟性の高い物性を有している。   The covering material 21 is selected from the group consisting of enzyme-decomposable and alkali-degradable polymers. Examples of the enzyme-degradable and alkali-degradable polymers include enzyme-degradable and alkali-degradable polymers. Polybutylene succinate lactate (Poly Butylene Succinate Lactate, PBSL), the composition of which is polymerized with succinic acid, 1.4 butanediol, and lactic acid, of which the ratio of lactic acid is 40% or less. It is a mixture or copolymer of at least one enzyme degradation accelerator selected from adipic acid, polyethylene glycol, and glycerin, mainly composed of PBSL, and an alkali degradation accelerator. This PBSL is obtained by direct dehydration polycondensation of succinic acid, 1.4 butanediol and lactic acid as described above. This succinic acid is produced from plant-derived raw materials such as starch, and this PBSL is biodegradable. This has higher physical properties than polylactic acid known as a plant-derived resin.

被覆材21を形成した二次成形品2の成形工程の射出成形条件の一例を示すと、
材料 PBSL
シリンダー温度 220℃
金型温度 90℃
射出圧力 800Kg/cm
冷却時間 30秒
An example of the injection molding conditions of the molding process of the secondary molded product 2 on which the covering material 21 is formed is as follows:
Material PBSL
Cylinder temperature 220 ° C
Mold temperature 90 ℃
Injection pressure 800Kg / cm 2
Cooling time 30 seconds

図1(D)は被覆材21により被覆された面以外、つまり凹部21aの底部に露出している基体1の粗面化した表面に、パラジウム、金などによるめっき用触媒3を附与する工程を示すもので、この触媒附与方法は公知のように、例えば、錫、パラジウム系の混合触媒液に二次成形品2を浸漬した後、塩酸、硫酸などの酸で活性化し、表面にパラジウムを析出させる。または、塩化第1錫等の比較的強い還元剤を表面に吸着させ、金等の貴金属イオンを含む触媒溶液に浸漬し、表面に金を析出させる。触媒液の温度は15〜23℃で5分間浸漬すればよい。   FIG. 1D shows a step of applying a plating catalyst 3 made of palladium, gold or the like to the roughened surface of the substrate 1 exposed at the bottom of the recess 21a other than the surface covered with the coating material 21. As is well known, for example, this catalyst application method is performed by immersing the secondary molded product 2 in a mixed catalyst solution of tin and palladium, and then activating with an acid such as hydrochloric acid or sulfuric acid, To precipitate. Alternatively, a relatively strong reducing agent such as stannous chloride is adsorbed on the surface and immersed in a catalyst solution containing a noble metal ion such as gold to deposit gold on the surface. What is necessary is just to immerse the temperature of a catalyst liquid at 15-23 degreeC for 5 minutes.

図1(E)は被覆材21を除去する工程を示すもので、触媒附与後の二次成形品2に成形された被覆材21を酵素分解またはアルカリ分解により除去する。この酵素分解は、酵素1〜10重量%の水溶液で、温度25〜80℃の水溶液中に1〜240分程度浸漬して除去する。また、アルカリ水溶液で加水分解により除去する作業は、苛性アルカリ(苛性ソーダNaOH,苛性カリKOHなど)の濃度2〜15重量%程度で、温度25〜80℃程度の水溶液中に1〜240分程度浸漬して除去する。   FIG. 1 (E) shows a step of removing the covering material 21, and the covering material 21 formed on the secondary molded article 2 after the application of the catalyst is removed by enzymatic decomposition or alkaline decomposition. This enzymatic degradation is removed by immersing in an aqueous solution of 1 to 10% by weight of the enzyme in an aqueous solution at a temperature of 25 to 80 ° C. for about 1 to 240 minutes. In addition, the removal by hydrolysis with an alkaline aqueous solution is performed by immersing in an aqueous solution having a concentration of caustic alkali (caustic soda NaOH, caustic potassium KOH, etc.) of about 2 to 15% by weight and a temperature of about 25 to 80 ° C. To remove.

その後水洗する。これによって、図1(B)に示す表面11が粗化された基体1の回路を形成すべき部分に、触媒3が附与された状態となる。   Then wash with water. As a result, the catalyst 3 is applied to the portion of the substrate 1 on which the surface 11 shown in FIG.

図1(F)は、触媒附与面3にめっきした回路4を形成する工程を示すもので、このめっき手段として、化学銅めっき、または化学ニッケルめっきなどが適宜採用される。回路が形成された後、最後に熱処理を施して内部の水分を除去して導電性回路を形成し、最終製品である成形回路部品が完成する。   FIG. 1 (F) shows a process of forming the circuit 4 plated on the catalyst-providing surface 3, and chemical copper plating, chemical nickel plating, or the like is appropriately employed as the plating means. After the circuit is formed, a heat treatment is finally performed to remove moisture in the interior to form a conductive circuit, thereby completing a molded circuit component as a final product.

発明の活用例として、携帯電話などの内部アンテナにおいて表面の一部や貫通している穴の内周面にめっきを施して回路を形成する。   As an application example of the invention, a circuit is formed by plating a part of the surface or the inner peripheral surface of a through hole in an internal antenna such as a mobile phone.

(A)第1の工程を示し、一次成形品の基体の断面図。(B)第2の工程を示し、基体の表面が粗化されている状態の断面図。(C)第3の工程を示し、基体の一部が被覆材で被覆されている二次成形品の断面図。(D)第4の工程を示し、被覆材から露出した基体の表面に触媒を附与した状態の断面図。(E)第5の工程を示し、二次成形品から被覆材を除去した状態の断面図。(F)第6の工程を示し、基体の触媒附与面にめっきして回路を形成した状態の断面図。(A) Sectional drawing of the base | substrate of a primary molded article which shows a 1st process. (B) Sectional drawing of the state which shows the 2nd process and the surface of the base | substrate is roughened. (C) Sectional drawing of the secondary molded product which shows a 3rd process and in which a part of base | substrate is coat | covered with the coating | covering material. (D) Sectional view showing the fourth step, with the catalyst applied to the surface of the substrate exposed from the coating material. (E) Sectional drawing of the state which showed the 5th process and removed the coating | covering material from the secondary molded article. (F) Sectional view of the state in which a circuit is formed by plating the catalyst-providing surface of the substrate, showing the sixth step.

符号の説明Explanation of symbols

1 基体(一次成形品)
11 基体の粗化した面
2 二次成形品
21 被覆材
21a 凹部
3 触媒附与面
4 めっきした回路
1 Base (Primary molded product)
DESCRIPTION OF SYMBOLS 11 Rough surface of base | substrate 2 Secondary molded product 21 Coating | covering material 21a Recessed part 3 Catalyst providing surface 4 Plated circuit

Claims (4)

基体の表面を部分的にめっきする方法であって、
めっき適合性熱可塑性プラスチックにより基体を成形する工程と、
上記基体の全表面を粗化する工程と、
上記粗化された面を被覆材で、形成すべき回路部分を除き、部分的に被覆する工程と、
上記被覆された面以外の表面にめっき用触媒を附与する工程と、
上記被覆材を除去する工程と、
上記触媒附与面にめっきする工程とからなり、
上記被覆材は酵素分解性高分子よりなる群から選択されたものである
ことを特徴とする成形回路部品の製造方法。
A method of partially plating the surface of a substrate,
Forming a substrate from a plating compatible thermoplastic;
Roughening the entire surface of the substrate;
A step of partially covering the roughened surface with a covering material except for a circuit portion to be formed; and
Providing a plating catalyst on a surface other than the coated surface;
Removing the covering material;
Comprising the step of plating the above-mentioned catalyst-attached surface,
The method for manufacturing a molded circuit component, wherein the coating material is selected from the group consisting of enzyme-degradable polymers .
基体の表面を部分的にめっきする方法であって、
めっき適合性熱可塑性プラスチックにより基体を成形する工程と、
上記基体の全表面を粗化する工程と、
上記粗化された面を被覆材で、形成すべき回路部分を除き、部分的に被覆する工程と、
上記被覆された面以外の表面にめっき用触媒を附与する工程と、
上記被覆材を除去する工程と、
上記触媒附与面にめっきする工程とからなり、
上記被覆材は、コハク酸、1.4ブタンジオール、および乳酸で重合され、その内、乳酸の比率が40%以下であるポリブチレンサクシネートラクテート樹脂(PBSL)を主体とし、アジピン酸、ポリエチレングリコール、またはグリセリンから選択された少なくとも1つの酵素分解性促進剤、並びにアルカリ分解性促進剤の混合体又は共重合体であることを特徴とする成形回路部品の製造方法。
A method of partially plating the surface of a substrate,
Forming a substrate from a plating compatible thermoplastic;
Roughening the entire surface of the substrate;
A step of partially covering the roughened surface with a covering material except for a circuit portion to be formed; and
Providing a plating catalyst on a surface other than the coated surface;
Removing the covering material;
Comprising the step of plating the above-mentioned catalyst-attached surface,
The coating material is mainly composed of polybutylene succinate lactate resin (PBSL), which is polymerized with succinic acid, 1.4 butanediol, and lactic acid, and the ratio of lactic acid is 40% or less. Adipic acid, polyethylene glycol method for producing a molded circuit component, wherein, or at least one enzyme degradable promoter selected from glycerin, and mixtures or copolymers of alkali-decomposable promoter.
請求項2において、上記被覆材は、酵素1〜10重量%の水溶液で、温度25〜80℃の水溶液中に1〜240分浸漬して除去されることを特徴とする成形回路部品の製造方法。 3. The method for producing a molded circuit component according to claim 2, wherein the coating material is an aqueous solution of 1 to 10% by weight of an enzyme and is removed by immersion in an aqueous solution at a temperature of 25 to 80 ° C. for 1 to 240 minutes. . 請求項2において、上記被覆材は、苛性ソーダ(NaOH)、又は苛性カリ(KOH)2〜15重量%の水溶液で、温度25〜80℃の水溶液中に1〜240分浸漬して除去されることを特徴とする成形回路部品の製造方法。 In Claim 2, the said coating | covering material is caustic soda (NaOH) or the caustic potash (KOH) 2-15 weight% aqueous solution, It is immersed for 1 to 240 minutes in the aqueous solution of temperature 25-80 degreeC, and is removed. A method for producing a molded circuit component.
JP2004284997A 2004-09-29 2004-09-29 Manufacturing method of molded circuit components Expired - Fee Related JP4332094B2 (en)

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JP4332094B2 true JP4332094B2 (en) 2009-09-16

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