JP4321004B2 - Color filter substrate manufacturing method, electro-optical panel, and electronic apparatus - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a color filter structure suitable for use in a transflective electro-optical device.
[0002]
[Background]
2. Description of the Related Art Conventionally, a transflective liquid crystal display panel in which both a reflective display using external light and a transmissive display using illumination light such as a backlight are visible is known. This transflective liquid crystal display panel has a reflective layer for reflecting external light in the panel, and this reflective layer is configured to transmit illumination light such as a backlight. is there. As the main reflection layer, there is a layer having a pattern having a predetermined ratio of openings (slits) for each pixel of the liquid crystal display panel.
[0003]
[Problems to be solved by the invention]
In the transflective liquid crystal display panel as described above, light such as outside light passes through the color filter twice in the reflection path, whereas light from the backlight or the like passes through the color filter 1 in the transmission path. Since it passes only once, there is a problem that the saturation in the transmissive display is worse than the saturation in the reflective display. That is, in general, the brightness of the display tends to be insufficient in the reflective display, so it is necessary to ensure the brightness of the display by setting the light transmittance of the color filter high. You won't be able to get the right saturation.
[0004]
In addition, since the number of times light passes through the color filter is different between the reflective display and the transmissive display as described above, the color of the reflective display and the color of the transmissive display are greatly different. There is also the problem of giving a sense of incongruity.
[0005]
The present invention has been made in view of the above points, and in a transflective display device, a color filter substrate capable of ensuring both the brightness of a reflective display and the saturation of a transmissive display is provided. It is an object to provide a method for manufacturing such a color filter substrate.
[0006]
[Means for Solving the Problems]
  In one aspect of the invention,A color filter substrate in which a reflective display area and a transmissive display area are defined, the reflective layer disposed in the reflective display area, the translucent layer disposed on the reflective layer in the reflective display area, and A transparent layer on the light-transmitting layer in the reflective display region and a colored layer disposed in the light-transmitting display region, which is a region where the reflective layer is not disposed, and the light-transmitting layer is made of a hydrophilic resin. The photosensitive resin constituting the colored layer is oleophilic.
[0007]
According to the above color filter substrate, the reflective layer is disposed in the predetermined reflective display region on the translucent substrate such as glass. The reflective display area is an area used when performing a reflective display using external light. A translucent layer having translucency is disposed on the reflective layer. As a result, a reflective display area in which the reflective layer and the translucent layer are disposed and a transmissive display area in which they are not disposed exist on the substrate. The reflective display area includes the reflective layer and the transmissive layer. The layer thickness is larger than the transmissive display region by the layer thickness.
[0008]
And since a colored layer is arrange | positioned with respect to the whole reflective display area and a transmissive display area, the layer thickness of the colored layer in a transmissive display area becomes larger than the layer thickness of the colored layer in a reflective display area. The colored layer is formed by applying a photosensitive resin and patterning it. Here, since the light-transmitting layer has a low affinity with the photosensitive resin constituting the colored layer, the photosensitive resin applied when forming the colored layer is repelled by the light-transmitting layer and is more than the reflective display area. It is applied thicker in the transmissive display area. Therefore, it is possible to form a colored layer having a sufficient thickness in the transmissive display region.
[0009]
In one embodiment of the color filter substrate, the light-transmitting layer may be made of a hydrophilic resin, and the photosensitive resin constituting the colored layer may be oleophilic. By forming the light-transmitting layer with a hydrophilic resin such as gelatin, casein, fish mulled, polyvinyl alcohol, or polyacrylamide, the photosensitive resin constituting the colored layer stays on the hydrophilic transmitting layer. This makes it difficult to deposit on the transmissive display area.
[0010]
In another aspect of the color filter substrate, the light transmitting layer can be made of a fluororesin. Thereby, the photosensitive resin which comprises a colored layer becomes difficult to stay on the translucent layer comprised with the fluororesin, and can fully accumulate it in a transmissive display area | region.
[0011]
In still another embodiment of the color filter substrate, the light-transmitting layer is made of an oleophilic resin, and the photosensitive resin constituting the colored layer can have hydrophilicity. According to this, the photosensitive resin having hydrophilicity is less likely to stay on the oleophilic translucent layer, and the photosensitive resin can be sufficiently deposited in the transmissive display area.
[0012]
In the color filter substrate, the thickness of the colored layer in the transmissive display region is thicker than the thickness of the colored layer in the reflective display region by the thickness of the reflective layer and the light transmissive layer. Therefore, the density of the colored layer in the transmissive display area can be made higher than the density of the colored layer in the reflective display area, and the saturation shortage during transmissive display can be improved.
[0013]
  In the color filter substrate, the reflective layer may partially have an opening, and the transmissive display area may correspond to the opening.
[0014]
  In addition, an electro-optical panel can be configured by using the color filter substrate, and a liquid crystal sandwiched between a pair of substrates and a reflection disposed in a reflective display region defined by the pair of substrates. A transparent layer disposed in the reflective display region, a colored layer disposed in the transmissive display region, which is a region on which the reflective layer is not disposed, and the translucent layer in the reflective display region. An electro-optical panel characterized in that the translucent layer has low affinity with the photosensitive resin constituting the colored layer, and the electro-optical panel includes the electro-optical panel as a display unit. Can be configured.
[0015]
  In another aspect of the present invention, there is provided a method for manufacturing a color filter substrate, wherein a reflective display region provided with a reflective layer and a transmissive display region which is an opening provided in the reflective layer are defined, A step of forming a reflective layer in the reflective display region; a step of forming a translucent layer only on the reflective layer in the reflective display region; and the reflective layer on the translucent layer in the reflective display region; The transmissive display area, which is a non-arranged area, is coated with a photosensitive resin that forms a colored layer, the photosensitive resin is allowed to flow into the transmissive display area, and the photosensitive resin is patterned to further transmit the transmissive display area. Forming a colored layer in both the display area and the reflective display area, and the colored layer disposed in the transmissive display area is thicker than the colored layer disposed in the reflective display area. The light layer is hydrophilic Is composed of a resin, a photosensitive resin constituting the colored layer is characterized by being formed of a material having a lipophilic.
  According to still another aspect of the present invention, there is provided a method of manufacturing a color filter substrate in which a reflective display region provided with a reflective layer and a transmissive display region that is an opening provided in the reflective layer are defined. Forming a reflective layer in the reflective display region; forming a light transmissive layer only on the reflective layer in the reflective display region; on the light transmissive layer in the reflective display region; and the reflective layer. By applying a photosensitive resin constituting a colored layer to the transmissive display area, which is an area in which the photosensitive resin is not disposed, allowing the photosensitive resin to flow into the transmissive display area, and further patterning the photosensitive resin. Forming a colored layer in both the transmissive display region and the reflective display region, and the colored layer disposed in the transmissive display region is thicker than the colored layer disposed in the reflective display region, Translucent layer Is constituted by a resin having an oil, a photosensitive resin constituting the colored layer is characterized by being formed of a material having hydrophilic.
[0016]
According to the above method for manufacturing a color filter substrate, a reflective layer is disposed in a predetermined reflective display area on a translucent substrate such as glass, and a translucent layer having translucency is disposed thereon. The And since a colored layer is arrange | positioned with respect to the whole reflective display area and a transmissive display area, the layer thickness of the colored layer in a transmissive display area becomes larger than the layer thickness of the colored layer in a reflective display area. The colored layer is formed by applying a photosensitive resin and patterning it. Here, since the light-transmitting layer has low affinity with the photosensitive resin constituting the colored layer, the photosensitive resin applied when forming the colored layer is repelled by the light-transmitting layer and more in the transmissive display area. Will be applied. Therefore, it is possible to form a colored layer having a sufficient thickness in the transmissive display region.
[0017]
In one aspect of the method for producing a color filter substrate, the light-transmitting layer is made of a hydrophilic resin, and the photosensitive resin constituting the colored layer can be oleophilic. By forming the light-transmitting layer with a hydrophilic resin such as gelatin, casein, fish mulled, polyvinyl alcohol, or polyacrylamide, the photosensitive resin constituting the colored layer stays on the hydrophilic transmitting layer. This makes it difficult to deposit on the transmissive display area.
[0018]
In the other one aspect | mode of the manufacturing method of said color filter substrate, the said translucent layer can be comprised with a fluororesin. Thereby, the photosensitive resin which comprises a colored layer becomes difficult to stay on the translucent layer comprised with the fluororesin, and can fully accumulate it in a transmissive display area | region.
[0019]
In still another aspect of the method for manufacturing a color filter substrate, the light-transmitting layer may be made of a lipophilic resin, and the photosensitive resin that forms the colored layer may have hydrophilicity. According to this, the photosensitive resin having hydrophilicity is less likely to stay on the oleophilic translucent layer, and the photosensitive resin can be sufficiently deposited in the transmissive display area.
[0020]
  According to still another aspect of the present invention, there is provided a method of manufacturing a color filter substrate in which a reflective display region provided with a reflective layer and a transmissive display region that is an opening provided in the reflective layer are defined. Forming a reflective layer in the reflective display region; forming a light transmissive layer only on the reflective layer in the reflective display region; and irradiating the light transmissive layer with ultraviolet light to transmit the light transmissive layer. Applying a photosensitive resin constituting a colored layer to the step of hydrophilizing the layer, on the light-transmitting layer in the reflective display region, and to the transmissive display region, which is a region where the reflective layer is not disposed, Forming a colored layer in both the transmissive display area and the reflective display area by allowing the photosensitive resin to flow into the transmissive display area and further patterning the photosensitive resin, and Place in display area The colored layer thicker than the colored layer disposed on the reflective display region, the photosensitive resin constituting the colored layer is characterized by being formed of a material having a lipophilic.
[0021]
According to the above method for manufacturing a color filter substrate, a reflective layer is disposed in a predetermined reflective display area on a translucent substrate such as glass, and a translucent layer having translucency is disposed thereon. The And since a colored layer is arrange | positioned with respect to the whole reflective display area and a transmissive display area, the layer thickness of the colored layer in a transmissive display area becomes larger than the layer thickness of the colored layer in a reflective display area. And the translucent layer is hydrophilized by irradiating with ultraviolet rays. The colored layer is formed by applying a photosensitive resin and patterning it, but the light-transmitting layer has a low affinity with the photosensitive resin that constitutes the colored layer by hydrophilization, so the colored layer is formed. The photosensitive resin applied at that time is repelled by the light-transmitting layer and more is applied to the transmissive display area. Therefore, it is possible to form a colored layer having a sufficient thickness in the transmissive display region.
[0022]
  In one aspect of the method for producing a color filter substrate, the step of hydrophilizing the light transmissive layer may irradiate the ultraviolet light at an angle at which the ultraviolet light is not irradiated to the transmissive display region. In another aspect, the step of hydrophilizing the light transmissive layer may be performed by irradiating the ultraviolet light in a state where the transmissive display region is masked. Thus, only the reflective display region can be made hydrophilic by irradiation with ultraviolet rays.
[0023]
DETAILED DESCRIPTION OF THE INVENTION
Preferred embodiments of the present invention will be described below with reference to the drawings.
[0024]
[Configuration of LCD panel]
FIG. 1 is a schematic cross-sectional view schematically showing a liquid crystal display panel 200 which is an embodiment of an electro-optical device to which the color filter substrate of the present invention is applied.
[0025]
In the liquid crystal display panel 200, a substrate 201 made of glass, plastic, or the like is bonded to a substrate 202 via a sealant 203, and a liquid crystal 204 is sealed inside. On the inner surface of the substrate 201, a reflective layer 211 having an opening 211a for each pixel and having a thickness of about 50 nm to 250 nm is formed. The reflective layer 211 can be formed of a thin film such as aluminum, an aluminum alloy, or a silver alloy. The opening 211a has a predetermined opening ratio (for example, 10 to 30%) with respect to the entire area of the pixel G for each pixel G arranged and set in a matrix in the vertical and horizontal directions along the inner surface of the substrate 210. It is configured. As shown in FIG. 2 which is a plan view of the substrate 201 as viewed from above, the opening 211a may be formed in each pixel G, but a plurality of openings are provided for each pixel. It doesn't matter.
[0026]
On the reflective layer 211, a translucent layer 214 having a thickness of about 0.5 μm to 2.5 μm is partially formed so as to avoid the opening 211a. The translucent layer 214 has translucency in the visible light region, but is particularly transparent to visible light. For example, in the visible light region, the average transmittance is 70% or more and the wavelength dispersion is small (for example, the transmittance). Is preferably 10% or less). A material for forming the light transmitting layer 214 will be described later.
[0027]
On the translucent layer 214, for example, in the case of a primary color filter, a thickness of about 0.5 μm to 2.0 μm consisting of three colors of R (red), R (green) and B (blue) is provided. The colored layers 212r, 212g, and 212b are arranged for each pixel G in an appropriate arrangement mode (a color filter having a stripe arrangement is shown in FIG. 2) such as a known stripe arrangement, delta (triangle) arrangement, and diagonal arrangement. Yes. Here, between the pixels G, the colored layers 212r, 212g, and 212b are overlapped with each other to form an overlapping light shielding portion 212BM that exhibits light shielding properties. Each of the colored layers 212r, 212g, and 212b basically has a substantially flat surface except for the overlapping light shielding portion 212BM.
[0028]
A protective layer 212p made of a transparent resin or the like is formed on the colored layers 212r, 212g, and 212b and the overlapping light shielding portion 212BM. The protective layer 212p is for protecting the colored layer from corrosion and contamination by chemicals in the process and for flattening the surface of the color filter 212.
[0029]
On the color filter 212, a transparent electrode 213 made of a transparent conductor such as ITO (indium tin oxide) is formed. The transparent electrode 213 extends in a direction orthogonal to the transparent electrodes 221 formed in a plurality of parallel stripes in the present embodiment, and the transparent electrode 213 and the transparent electrode 221 (shown by a one-dot chain line in FIG. 2) The components of the liquid crystal display panel 200 included in the intersection region (the portions in the intersection region of the reflective layer 211, the color filter 212, the transparent electrode 213, the liquid crystal 204, and the transparent electrode 221) form the pixel G. ing.
[0030]
In the present embodiment, since the light-transmitting layer 214 is formed, in each of the colored layers 212r, 212g, and 212b, a non-formation region where the light-transmitting layer 214 is not formed, that is, the opening 211a and the plane of the reflective layer 211 are planar. In this way, a part of the colored layer enters the overlapping area, and thereby, a thick part 212TH formed thicker than the other part is provided.
[0031]
On the other hand, a transparent electrode 221 is formed on the inner surface of the substrate 202 and is configured to intersect with the transparent electrode 213 on the opposite substrate 201. Note that an alignment film, a hard transparent film, or the like is appropriately formed on the transparent electrode 213 on the substrate 201 and the transparent electrode 221 on the substrate 202 as necessary.
[0032]
A retardation plate (¼ wavelength plate) 205 and a polarizing plate 206 are sequentially arranged on the outer surface of the substrate 202, and a retardation plate (¼ wavelength plate) 207 and a polarizing plate are arranged on the outer surface of the substrate 201. 208 are sequentially arranged.
[0033]
When the liquid crystal display panel 200 configured as described above is installed in an electronic device such as a mobile phone or a portable information terminal, the liquid crystal display panel 200 is attached with a backlight 209 disposed behind it. In the liquid crystal display panel 200, when reflective display is performed, external light passes along the reflection path R and is visually recognized by the user. When transmissive display is performed, illumination from the backlight 209 is performed. The light passes along the transmission path T and is visually recognized by the user. At this time, in the reflection path R, light passes through the colored layers 212r, 212g, and 212b of the color filter 212 twice. On the other hand, in the transmission path T, light passes through the opening 211 a of the reflective layer 211. Therefore, the transmitted light passes through the thick portions 212TH of the colored layers 212r, 212g, and 212b. As a result, the saturation in the transmissive display can be improved.
[0034]
That is, by forming the thick portion 212TH at a position that overlaps the opening 211a of the reflective layer 211 in the color filter 212, the saturation of the transmissive display can be increased without impairing the brightness of the reflective display. It becomes possible to improve. In particular, the difference in color between the reflective display and the transmissive display can be reduced as compared with the related art.
[0035]
Here, when the colored layer is formed almost uniformly, the thickness of the thick portion 212TH is approximately twice the thickness of the portion overlapping the reflective layer 211 in a plane, that is, the other portions. Is preferred. More specifically, it is preferably in the range of 1.4 times to 3.0 times, and preferably in the range of 1.7 times to 2.5 times. In this way, the difference between the saturation of the reflective display and the saturation of the transmissive display can be further reduced to further reduce the color difference between the two displays.
[0036]
Further, since the thick portion 212TH is provided in the color filter 212 by partially forming the light transmitting layer 214, the surfaces (upper surfaces in the drawing) of the colored layers 212r, 212g, and 212b of the color filter 212 are formed flat. And the display quality of the liquid crystal display panel can be improved.
[0037]
[Formation of thick part]
Next, a configuration and a forming method of the above thick part 212TH will be described. As shown in FIG. 1, the thick portion 212TH is formed in a region corresponding to the opening 211a of the reflective layer 211. Actually, the thick portion 212TH is simultaneously formed by the process of forming the colored layers 212r, 212g, and 212b of each color of the color filter 212. More specifically, a colored photosensitive resin (photosensitive resist) obtained by dispersing a pigment or dye exhibiting a predetermined hue is applied onto the substrate 101 after the formation of the reflective layer 211 and the light transmitting layer 214, and Each of the colored layers 212r, 212g, and 212g is formed in order by performing patterning by performing exposure and development in a predetermined pattern.
[0038]
However, after the reflective layer 211 and the light transmissive layer 214 are formed, the region where the reflective layer 211 and the light transmissive layer 214 are formed (that is, the reflective display region for performing the reflective display) and those are not formed. The layer thickness is different from the region (that is, the region corresponding to the opening 211 a and the transmissive display region for performing transmissive display), and small irregularities are formed on the substrate 101. Therefore, when the photosensitive resist used for forming the color filter is applied thereon, the photosensitive resist is formed in the concave portion (corresponding to the transmissive display area) where the reflective layer 211 and the light transmissive layer 214 are not formed. Tend to be hard to get into. As a result, there is a problem that the thick layer 212TH is not actually formed to a sufficient thickness, and the saturation in the transmissive display is still insufficient.
[0039]
Therefore, in the present invention, the thick portion 212TH can be formed to a sufficient thickness by the following three methods.
[0040]
(First method)
The first method is a method of forming the light-transmitting layer 214 with a hydrophilic material as schematically shown in FIG. Since the photosensitive resist used for forming the color filter has an oleophilic property, if the light-transmitting layer 214 is formed of a hydrophilic material, the photosensitive resist repels the light-transmitting layer 214 when applied on the substrate 201. It becomes difficult to stay on the translucent layer 214. As a result, the photosensitive resist is repelled from above the light transmissive layer 214 and easily flows into the transmissive display region where the light transmissive layer 214 is not formed. Since the surface of the transmissive display area is not covered with the light transmissive layer 214 and the upper surface of the substrate 201 is exposed as it is, the photosensitive resist repelled by the light transmissive layer 214 flows into the transmissive display area and accumulates there. As a result, a sufficient amount of the photosensitive resist can be applied to the transmissive display area. Thus, the thick part 212TH can be formed with a sufficient thickness. Examples of the hydrophilic resin for constituting the light transmissive layer 214 include gelatin, casein, fish mulled, polyvinyl alcohol, and polyacrylamide.
[0041]
In addition, even if the resin does not have hydrophilicity, the light-transmitting layer 214 is formed of a resin that has a low affinity with other substances and has a characteristic that the resin resists and stays on the light-transmitting layer 214. If it does, the same effect can be acquired. Examples of such a resin include a fluororesin.
[0042]
(Second method)
The second method is the same as the first method in that the light-transmitting layer 214 is made hydrophilic. However, the light-transmitting layer 214 is not formed by a hydrophilic resin, but is transmitted by ultraviolet (UV) irradiation. This is a method of making the layer 214 hydrophilic.
[0043]
Substances can be hydrophilized by UV irradiation, as is known from microfabrication of electronic device manufacturing and UV cleaning of thin film formation processes. The principle of hydrophilization by UV irradiation is as follows.
[0044]
The energy per mole that a substance receives from electromagnetic waves is 113 kcal / mol and 155 kcal / mol at 254 nm and 185 nm, respectively, while the chemical bond energy of most organic substances is smaller than this. The bond can be broken. The organic matter on the irradiated surface changes to free radicals of organic compounds or excited molecules. Ultraviolet rays 185 nm are absorbed by oxygen in the atmosphere and ozone (O_Three), And when ozone absorbs 254 nm of ultraviolet rays, excited oxygen atoms are generated. Excited oxygen atoms have a strong oxidizing power and react with free radicals and excited molecules of the previous organic compound to react with CO.₂And H₂It becomes a substance such as O and is volatilized and removed, and has hydrophilicity such as = CO (carbonyl group) and -COOH (carboxyl group) on the sea surface of the substrate.
[0045]
In the present invention, as schematically shown in FIG. 3B, UV light is irradiated onto the substrate 201 after the reflective layer 211 and the translucent layer 214 are formed. At that time, since the region to be hydrophilized is only the reflective display region where the translucent layer 214 is formed, it is necessary to irradiate only the reflective display region with UV light and not to irradiate the transmissive display region with UV light. There is. This one method is a method of irradiating the substrate 201 with UV light at a predetermined incident angle θ as shown in FIG. When the total layer thickness of the reflective layer 211 and the light transmitting layer 214 formed on the substrate 201 is h, and the width of the region where the light transmitting layer 214 is formed is a, the incident angle θ is
tan θ> h / a
If UV light is irradiated under the conditions, UV light is not irradiated on the transmissive display area, and only the portion of the light-transmitting layer 214 in the reflective display area can be irradiated with UV light to make it hydrophilic. Further, as another method of applying UV light only to the portion of the light-transmitting layer 214, there is a method of irradiating the entire region of the substrate 201 with UV light while masking the transmissive display region.
[0046]
(Third method)
On the other hand, the third method is a method in which the concept is reversed from the first and second methods, and the photosensitive resist used in forming the color filter is a hydrophilic material. When a lipophilic resin such as an acrylic resin or an epoxy resin is used as the resin constituting the light-transmitting layer 214, if a hydrophilic dye is used for the photosensitive resist used in the color filter formation, the photosensitive resist As a result, the photosensitive resist flows into the transmissive display area and a colored layer having a sufficient thickness can be formed in the transmissive display area.
[0047]
In the present invention, the photosensitive resist used in the color filter formation is applied to the transmissive display region with a sufficient thickness by any of the above methods, thereby forming the thick portion 212TH with a sufficient thickness. Make it possible.
[0048]
[Color filter substrate manufacturing method]
Next, a method for manufacturing a color filter substrate according to the present invention will be described.
[0049]
(First method)
First, a method for manufacturing a color filter substrate when using the first method described above will be described with reference to FIG.
[0050]
On the surface of the substrate 201, a metal such as aluminum, an aluminum alloy, a silver alloy, or chromium is first formed into a thin film by a vapor deposition method or a sputtering method, and this is patterned by using a photolithography method. As shown in FIG. 4A, a reflective layer 211 having an opening 211a and a thickness of about 50 nm to 250 nm is formed.
[0051]
Next, as shown in FIG. 4B, a light-transmitting layer 214 having a thickness of about 0.5 μm to 2.5 μm is formed in a portion excluding the region immediately above the opening 211 a of the reflective layer 211. The translucent layer 214 is formed over the entire surface of the substrate 201 and the reflective layer 211, for example, and then selectively removed from the portion corresponding to the opening 211a (transmission display region) by a photolithography method or the like. Can be formed.
[0052]
Next, as shown in FIG. 4 (c), a colored photosensitive resin (photosensitive resist) in which a pigment exhibiting a predetermined hue is dispersed is applied, and exposure and development are performed in a predetermined pattern for patterning. In this way, colored layers 212r, 212g, and 212b having a thickness of about 0.5 μm to 2.0 μm are sequentially formed. Here, the colored layers are patterned so as to overlap each other in the inter-pixel region, and an overlapping light shielding layer 212BM in which a plurality of (three in the illustrated example) colored layers are overlapped is formed.
[0053]
In the colored layer forming step, a highly leveling material is used as the photosensitive resist, and this is applied by a method that facilitates flatness such as spin coating. At this time, the resin for forming the light-transmitting layer 214 has a low affinity with the photosensitive resist used when forming the color filter layer, such as the hydrophilic resin or the fluorine resin as described above, and repels the photosensitive resist. By using the resin having the property, the photosensitive resist sufficiently enters the transmissive display area where the transmissive layer 214 is not formed. In each colored layer formed in this way, since the light transmitting layer 214 is formed, the thick portion 212TH is formed in the transmissive display region (corresponding to the opening 211a) which is a region where the light transmitting layer 214 is not formed in each pixel. It is formed with an appropriate layer thickness.
[0054]
A protective layer 212p shown in FIG. 1 is formed on the color filter substrate thus formed, and the surface thereof is made almost flat.
[0055]
(Second method)
Next, a method for manufacturing a color filter substrate when the second method is used will be described with reference to FIG.
[0056]
In the second method, until the reflective layer is formed on the substrate 201 as shown in FIG. 5A and the light transmitting layer 214 is further formed thereon as shown in FIG. This is the same as the first method described with reference to FIG. However, as the translucent layer 214, a hydrophilic resin may be used as in the first method, but it is not always necessary, and an acrylic resin, an epoxy resin, or the like can also be used.
[0057]
Then, the surface of the light-transmitting layer 214 is hydrophilized by irradiating the light-transmitting layer 214 thus formed with UV light as shown in FIG. At this time, the method of irradiating only the surface of the translucent layer 214 with UV light includes the method of adjusting the irradiation angle of the UV light so that the transmissive display region is not irradiated with UV light as described above, or the masking of the transmissive display region. Then, there is a method of irradiating with UV light.
[0058]
When the translucent layer 214 is hydrophilized by irradiation with UV light, thereafter, as in the first method, a photosensitive resist containing a pigment exhibiting a predetermined hue is applied to the entire transmissive display area and the reflective display area. Application and patterning are performed to form colored layers 212r, 212g, and 212b of the color filter and an overlapping light shielding layer 212BM (FIG. 5D). Since the photosensitive resist is applied after the light-transmitting layer 214 is hydrophilized by irradiation with UV light, the photosensitive resist is less likely to stay on the light-transmitting layer 214 and flows into the transmissive display region to have a sufficient thickness. A portion 212TH is formed. Further, the protective layer 212p shown in FIG. 1 is formed thereon, and the surface thereof is made almost flat. Thus, a color filter substrate is formed using the second method.
[0059]
(Third method)
Next, a method for manufacturing a color filter substrate when using the third method will be described with reference to FIG.
[0060]
The third method is a method in which a hydrophilic dye is used for the photosensitive resist to be used in the step of forming the colored layer of the color filter, and is otherwise basically the same as the first method.
[0061]
That is, as shown in FIG. 4A, the reflective layer 211 is formed on the substrate 201, and then the light transmitting layer 214 is formed on the reflective layer 211 as shown in FIG. 4B. At this time, the light-transmitting layer uses an oleophilic acrylic resin or epoxy resin.
[0062]
Then, a photosensitive resist using a hydrophilic dye is applied to the entire transmissive display area and the reflective display area and patterned to form the color filter colored layers 212r, 212g, and 212b and the overlapping light shielding layer 212BM (FIG. 4). (C)). Since the photosensitive resist has hydrophilicity, the photosensitive resist does not easily stay on the light transmitting layer 214 formed of acrylic resin, epoxy resin, or the like, and flows into the transmissive display region to have a sufficient thickness 212TH. Is formed. Further, the protective layer 212p shown in FIG. 1 is formed thereon, and the surface thereof is made almost flat. Thus, a color filter substrate is formed using the third method.
[0063]
[Method of manufacturing liquid crystal display panel]
Next, a method of manufacturing the liquid crystal display panel 200 shown in FIG. 1 using the color filter substrate thus obtained will be described with reference to FIG. FIG. 6 is a flowchart showing the manufacturing process of the display panel 200.
[0064]
First, the substrate 201 on which a color filter including the thick part 212TH having an appropriate thickness is formed is manufactured by the above method (step S1), and a transparent conductor is applied to the protective layer 212p by a sputtering method. The transparent electrode 213 is formed by patterning by a photolithography method (step S2). Thereafter, an alignment film made of polyimide resin or the like is formed on the transparent electrode 213, and a rubbing process or the like is performed (step S3).
[0065]
On the other hand, a substrate 202 on the opposite side is manufactured (step S4), a transparent electrode 221 is formed by the same method (step S5), an alignment film is formed on the transparent electrode 221, and a rubbing process is performed (step S6). ).
[0066]
And said board | substrate 201 and the board | substrate 202 are bonded together through the sealing material 203, and a panel structure is comprised (process S7). The substrate 201 and the substrate 202 are bonded to each other with a substantially prescribed substrate interval by a spacer (not shown) distributed between the substrates.
[0067]
Thereafter, liquid crystal 204 is injected from an opening (not shown) of the sealing material 203, and the opening of the sealing material 203 is sealed with a sealing material such as an ultraviolet curable resin (step S8). After the main panel structure is completed in this way, the above-described retardation plate, polarizing plate, and the like are attached to the outer surface of the panel structure as needed by a method such as sticking (step S9), and the liquid crystal display panel 200 shown in FIG. Is completed.
[0068]
[Electronics]
Next, an embodiment in which a liquid crystal device including the liquid crystal display panel is used as a display device of an electronic device will be described. FIG. 7 is a schematic configuration diagram showing the overall configuration of the present embodiment. The electronic apparatus shown here includes the liquid crystal display panel 200 and a control unit 1200 that controls the liquid crystal display panel 200. Here, the liquid crystal display panel 200 is conceptually divided into a panel structure 200A and a drive circuit 200B composed of a semiconductor IC or the like. The control unit 1200 includes a display information output source 1210, a display processing circuit 1220, a power supply circuit 1230, and a timing generator 1240.
[0069]
The display information output source 1210 includes a memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory), a storage unit such as a magnetic recording disk or an optical recording disk, and a tuning circuit that tunes and outputs a digital image signal. The display information is supplied to the display information processing circuit 1220 in the form of an image signal of a predetermined format based on various clock signals generated by the timing generator 1240.
[0070]
The display information processing circuit 1220 includes various known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and executes processing of input display information to obtain image information. Are supplied to the drive circuit 200B together with the clock signal CLK. The drive circuit 200B includes a scanning line drive circuit, a data line drive circuit, and an inspection circuit. The power supply circuit 1230 supplies a predetermined voltage to each of the above-described components.
[0071]
Next, specific examples of electronic devices to which the liquid crystal display panel according to the present invention can be applied will be described with reference to FIG.
[0072]
First, an example in which the liquid crystal display panel according to the present invention is applied to a display unit of a portable personal computer (so-called notebook personal computer) will be described. FIG. 8A is a perspective view showing the configuration of this personal computer. As shown in the figure, the personal computer 41 includes a main body portion 412 having a keyboard 411 and a display portion 413 to which the liquid crystal display panel according to the present invention is applied.
[0073]
Next, an example in which the liquid crystal display panel according to the present invention is applied to a display unit of a mobile phone will be described. FIG. 8B is a perspective view showing the configuration of this mobile phone. As shown in the figure, the mobile phone 42 includes a plurality of operation buttons 421, a reception unit 422, a transmission port 423, and a display unit 424 to which the liquid crystal display panel according to the present invention is applied.
[0074]
Note that as an electronic device to which the liquid crystal display panel according to the present invention can be applied, in addition to the personal computer shown in FIG. 8A and the mobile phone shown in FIG. Monitor direct-view video tape recorders, car navigation devices, pagers, electronic notebooks, calculators, word processors, workstations, videophones, POS terminals, digital still cameras, etc.
[0075]
  Without being limited to the above embodiments, the electro-optical device of the present invention includes a liquid crystal display panel having a passive matrix type or an active matrix type liquid crystal display panel (for example, TFT (thin film transistor) or TFD (thin film diode)) as a switching element. The present invention can be similarly applied to a display panel. Further, the present invention can be similarly applied not only to a liquid crystal display panel but also to an electro-optical device such as an electrophoretic display device.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing a structure of a liquid crystal display panel according to an embodiment of the present invention.
2 is a plan view showing a structure of a color filter layer of the liquid crystal display panel shown in FIG.
FIG. 3 is a diagram illustrating an example of a method for forming a color filter layer having a thick portion according to the present invention.
FIG. 4 is a cross-sectional view showing a method for manufacturing a color filter substrate of the present invention.
FIG. 5 is a cross-sectional view showing another method of manufacturing the color filter substrate of the present invention.
FIG. 6 is a process diagram of a method for manufacturing a liquid crystal display panel according to an embodiment of the present invention.
FIG. 7 is a schematic configuration diagram showing a configuration block in the embodiment of the electronic apparatus according to the invention.
FIG. 8 is a diagram illustrating an example of an electronic apparatus to which the liquid crystal display panel according to the embodiment of the invention is applied.
[Explanation of symbols]
200 LCD panel
201, 202 substrate
203 Sealing material
209 Backlight
211 reflective layer
214 Translucent layer
212 Color filter layer
212BM Overlapping shading layer
212TH Thick part
212p protective layer

Claims (8)

A color filter substrate manufacturing method in which a reflective display region provided with a reflective layer and a transmissive display region which is an opening provided in the reflective layer are defined,
Forming a reflective layer in the reflective display region;
Forming a light transmitting layer on only the reflective layer of the reflective display region,
A photosensitive resin constituting a colored layer is applied on the light-transmitting layer in the reflective display region and the transmissive display region where the reflective layer is not disposed, and the photosensitive resin is displayed on the transmissive display. Forming a colored layer in both the transmissive display area and the reflective display area by flowing into the area and further patterning the photosensitive resin,
The colored layer disposed in the transmissive display region is thicker than the colored layer disposed in the reflective display region,
The method for producing a color filter substrate, wherein the light transmissive layer is made of a hydrophilic resin, and the photosensitive resin constituting the colored layer is made of a lipophilic material. A color filter substrate manufacturing method in which a reflective display region provided with a reflective layer and a transmissive display region which is an opening provided in the reflective layer are defined,
Forming a reflective layer in the reflective display region;
Forming a light transmitting layer on only the reflective layer of the reflective display region,
A photosensitive resin constituting a colored layer is applied on the light-transmitting layer in the reflective display region and the transmissive display region where the reflective layer is not disposed, and the photosensitive resin is displayed on the transmissive display. Forming a colored layer in both the transmissive display area and the reflective display area by flowing into the area and further patterning the photosensitive resin,
The colored layer disposed in the transmissive display region is thicker than the colored layer disposed in the reflective display region,
The method for producing a color filter substrate, wherein the light-transmitting layer is made of an oleophilic resin, and the photosensitive resin forming the colored layer is made of a hydrophilic material. A color filter substrate manufacturing method in which a reflective display region provided with a reflective layer and a transmissive display region which is an opening provided in the reflective layer are defined,
Forming a reflective layer in the reflective display region;
Forming a light transmitting layer on only the reflective layer of the reflective display region,
Hydrophilizing the light transmissive layer by irradiating the light transmissive layer with ultraviolet rays;
A photosensitive resin constituting a colored layer is applied on the light-transmitting layer in the reflective display region and the transmissive display region where the reflective layer is not disposed, and the photosensitive resin is displayed on the transmissive display. Forming a colored layer in both the transmissive display area and the reflective display area by flowing into the area and further patterning the photosensitive resin,
The colored layer disposed in the transmissive display region is thicker than the colored layer disposed in the reflective display region,
A method for producing a color filter substrate, wherein the photosensitive resin constituting the colored layer is formed of a lipophilic material.   The method for manufacturing a color filter substrate according to claim 3, wherein the step of hydrophilizing the light transmissive layer irradiates the ultraviolet light at an angle at which the ultraviolet light is not irradiated on the transmissive display region.   The method for producing a color filter substrate according to claim 3, wherein in the step of hydrophilizing the light-transmitting layer, the ultraviolet light is irradiated in a state where the transmission display region is masked.   6. The thickness of the colored layer in the transmissive display region is thicker than the thickness of the colored layer in the reflective display region by the thickness of the reflective layer and the light transmissive layer. The manufacturing method of the color filter board | substrate as described in any one of these.   An electro-optical panel comprising a color filter substrate manufactured by the manufacturing method according to claim 1.   An electronic apparatus comprising the electro-optical panel according to claim 7 as a display unit.

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