JP2007072041A - Liquid crystal device, manufacturing method of the liquid crystal device and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal device which prevents dispersion of the thickness of alignment film due to different formation state of a layer-thickness adjusting layer and causes less display faults, to provide a manufacturing method of the liquid crystal device, and to provide electronic equipment provided with the liquid crystal device. <P>SOLUTION: The liquid crystal device has a liquid crystal layer between a pair of substrates and is provided with a display region comprising a plurality of pixels, wherein the display region has a reflection region and a transmission region, the layer thickness-adjusting layer for adjusting the thickness of a liquid crystal layer in the reflection region and the thickness of a liquid crystal layer in the transmission region is disposed, on at least one substrate between the pair of substrates and a layer, having the same shape with the layer thickness-adjusting layer, is formed outside the display region in a prescribed direction where a plurality of pixels are arranged. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a liquid crystal device, a method for manufacturing a liquid crystal device, and an electronic apparatus. In particular, the present invention relates to a liquid crystal device including a layer thickness adjusting layer for changing the thickness of a liquid crystal layer between a reflective region and a transmissive region, a method for manufacturing such a liquid crystal device, and an electronic apparatus including such a liquid crystal device.

Conventionally, as an image display device, a pair of substrates each having an electrode formed thereon are arranged opposite to each other, and a voltage applied to a plurality of pixels that are intersecting regions of the respective electrodes is selectively turned on and off, whereby the pixel 2. Description of the Related Art Liquid crystal devices that modulate light passing through a liquid crystal material in a region and display images such as images and characters are often used.
As such a liquid crystal device, there is a transflective liquid crystal device capable of reflective display and transmissive display. That is, in the transmissive region, the light emitted from the backlight disposed on the back side of the substrate enters the liquid crystal panel and passes through the liquid crystal layer and is visually recognized outside. On the other hand, in the reflection region, external light incident on the liquid crystal panel from the outside passes through the liquid crystal layer, is reflected by the light reflection film, and then passes through the liquid crystal layer again to be visually recognized outside. By enabling such transmissive display and reflective display, image display can be recognized using outside light such as sunlight in the daytime or in a bright place, thereby reducing power consumption. Image display can be recognized by the backlight even in a relatively dark place such as at night.

In such a transflective liquid crystal device, in order to optimize the retardation in each of the reflective display and the transmissive display and improve the display quality, the thickness of the liquid crystal layer in each of the reflective region and the transmissive region is made different. A liquid crystal device having a configuration has been proposed. More specifically, as shown in FIG. 12, each pixel 603 is provided with a light reflection layer 604 that defines a reflection region 631 and a transmission region 632, and the upper layer side corresponds to the transmission region 632. This is a transflective liquid crystal device in which a layer thickness adjusting layer 606 whose region is an opening is formed (see, for example, Patent Document 1).
JP 2003-262852 A (Claims, FIG. 1)

  However, in the liquid crystal device having the configuration described in Patent Document 1, since the layer thickness adjustment layer has a step at the boundary between the reflection region and the transmission region, an alignment film is formed on the substrate on which the layer thickness adjustment layer is formed. At this time, in some cases, the material flows into the opening after the material for forming the alignment film is applied and dried. In such a case, the thickness of the alignment film varies, and there is a possibility that display unevenness is visually recognized when halftone display is performed.

  Such display unevenness due to variations in the alignment film is particularly likely to occur in pixels adjacent to the boundary between the display area and the non-display area. That is, most pixels other than the pixels adjacent to the boundary between the display area and the non-display area are surrounded by other pixels, but the pixels adjacent to the boundary between the display area and the non-display area are There are no pixels on the non-display area side. Moreover, since it is not necessary to consider retardation in the non-display area, the layer thickness adjusting layer is formed over the entire surface or is not formed over the entire surface. Therefore, in the conventional liquid crystal device, as shown in FIG. 18, only the pixel G ′ adjacent to the boundary between the display area A and the non-display area Z has an alignment film as compared with most other pixels G. The flow of the forming material differs, and the film thickness state of the alignment film 445 tends to be different. For this reason, there is a problem that display unevenness in pixels adjacent to the boundary between the display area and the non-display area is relatively conspicuous.

Accordingly, the inventors of the present invention have made diligent efforts to solve such problems by forming a layer having the same shape as the layer thickness adjusting layer in the display region outside the display region along a predetermined direction. The present invention has been found and completed.
That is, according to the present invention, the formation state of the layer thickness adjusting layer is made equal in and out of the display region, thereby uniformizing the film thickness state of the alignment film in all the pixels in the display region and reducing display unevenness. An object is to provide a liquid crystal device. Another object of the present invention is to provide a method for manufacturing such a liquid crystal device and an electronic apparatus equipped with such a liquid crystal device.

According to the present invention, there is provided a liquid crystal device having a liquid crystal layer between a pair of substrates and having a display region composed of a plurality of pixels, the display region having a reflective region and a transmissive region, A layer thickness adjusting layer for adjusting the thickness of the liquid crystal layer in the reflective region and the thickness of the liquid crystal layer in the transmissive region on at least one of the substrates, and the layer outside the display region in a predetermined direction in which a plurality of pixels are arranged A liquid crystal device in which a layer having the same shape as the thickness adjusting layer is provided is provided, and the above-described problems can be solved.
In other words, by providing a layer with the same shape as the layer thickness adjustment layer outside the display area, the orientation film material flows in all pixels in the display area uniformly, and variation in the film thickness state of the alignment film is prevented. can do. Therefore, it is possible to prevent the display defect due to the variation in the thickness of the alignment film from being visually recognized at the specific portion.

In configuring the liquid crystal device of the present invention, it is preferable to form at least one pixel of the same shape layer outside the display region.
With this configuration, the layer thickness adjustment layer is formed in the minimum necessary range, and the film thickness state of the alignment film is also different from the pixels in the other display regions in the outermost pixel in the display region. Can be equal.

In configuring the liquid crystal device of the present invention, the layer having the same shape has the same shape as the layer thickness adjusting layer provided corresponding to the reflective region in the display region, and a predetermined direction in which a plurality of pixels are arranged, It is preferably formed outside at least one of the display areas in the direction intersecting the predetermined direction.
With this configuration, the film thickness state of the alignment film in the pixel at the end position along the predetermined direction is made equal to the film thickness state of the pixels in the other display areas, and display unevenness is hardly visible. can do.

Further, in configuring the liquid crystal device of the present invention, the layer having the same shape is formed by forming the same layer thickness adjusting layer formed in the display region outside the display region, and in the transmission region in the display region. At least one of a predetermined direction in which a plurality of pixels are arranged and a direction intersecting with the predetermined direction, which has an opening or a thin layer having the same shape as the corresponding opening or thin layer of the layer thickness adjusting layer provided Preferably, it is formed outside one of the display areas.
By configuring in this way, the film thickness state of the alignment film in the pixel at the end position in the direction intersecting the predetermined direction is made equal to the film thickness state in the pixels in the other display areas, and display unevenness is visually recognized. Can be difficult.

In configuring the liquid crystal device of the present invention, the layer having the same shape may be formed continuously with a layer thickness adjusting layer provided across a plurality of pixels in a predetermined direction in which a plurality of pixels are arranged. preferable.
With this configuration, the step of the layer thickness adjusting layer in the pixel can be reduced, and the film thickness state of the alignment film in the pixel at the end position along the predetermined direction can be changed in the pixels in other display regions. It is possible to make the display unevenness less visible by making it equal to the film thickness state.

Another embodiment of the present invention is a method for manufacturing a liquid crystal device having a liquid crystal layer between a pair of substrates and having a display region including a plurality of pixels, the method being provided on one of the pair of substrates. The photosensitive resin material is applied to the display area and the area including the outside of the display area, and the photosensitive resin material is exposed and developed to form an opening or a thin layer corresponding to the transmission area in the display area. And a step of forming an opening or a thin layer having the same shape as the layer thickness adjusting layer outside the display region in a predetermined direction in which a plurality of pixels are arranged, and a step of forming an alignment film on the substrate It is a manufacturing method of an apparatus.
That is, by controlling the patterning when forming the layer thickness adjusting layer, a layer having the same shape as the layer thickness adjusting layer having the opening or the thin layer portion can be formed outside the display region. When forming, the film thickness state of the alignment film in all the pixels in the display region can be made uniform. Therefore, it is possible to efficiently manufacture a liquid crystal device in which display unevenness in pixels adjacent to the boundary inside and outside the display region is reduced.

According to still another aspect of the present invention, there is provided a method for manufacturing a liquid crystal device having a liquid crystal layer between a pair of substrates and including a display region including a plurality of pixels, and one of the pair of substrates. A process of applying a photosensitive resin material on the display area and an area including the outside of the display area, and developing after exposing the photosensitive resin material to correspond to the reflective area in the display area, and a plurality of pixels A method for manufacturing a liquid crystal device, comprising: a step of forming a layer having the same shape as the layer thickness adjusting layer outside a display region in a predetermined direction of alignment; and a step of forming an alignment film on a substrate.
That is, by controlling the patterning when forming the layer thickness adjusting layer, a layer having the same shape as the layer thickness adjusting layer formed in the reflective region can be formed outside the display region, so that an alignment film is formed. In this case, the film thickness state of the alignment film in all the pixels in the display area can be made uniform. Therefore, it is possible to efficiently manufacture a liquid crystal device in which display unevenness in pixels adjacent to the boundary inside and outside the display region is reduced.

Still another embodiment of the present invention is an electronic apparatus including any one of the liquid crystal devices described above.
That is, a layer having the same shape as the layer thickness adjusting layer is provided outside the display region, and the liquid crystal device in which the film thickness state of the alignment film is uniform is provided. Can be provided.

  Hereinafter, embodiments of the liquid crystal device, the method for manufacturing the liquid crystal device, and the electronic apparatus including the liquid crystal device according to the present invention will be specifically described with reference to the drawings. However, this embodiment shows one aspect of the present invention and does not limit the present invention, and can be arbitrarily changed within the scope of the present invention.

[First Embodiment]
The first embodiment is a liquid crystal device that includes a liquid crystal layer between a pair of substrates and includes a display region including a plurality of pixels.
In such a liquid crystal device, the display region has a reflective region and a transmissive region, and adjusts the thickness of the liquid crystal layer in the reflective region and the thickness of the liquid crystal layer in the transmissive region on at least one of the pair of substrates. And a layer having the same shape as the layer thickness adjusting layer is formed outside the display region in a predetermined direction in which a plurality of pixels are arranged.

Hereinafter, with reference to FIGS. 1 to 11 as appropriate, in the liquid crystal device according to the first embodiment of the present invention, a color filter substrate having a predetermined layer thickness adjusting layer and a TFT element (Thin Film Transistor) as a switching element An example of a liquid crystal device including an element substrate having the above will be described. However, the present invention can be applied to a liquid crystal device including a TFD element (Thin Film Diode) or a passive matrix liquid crystal device not including a switching element. The layer thickness adjusting layer may be provided on the element substrate, or may be provided on both substrates.
In addition, in each figure, what attached | subjected the same code | symbol has shown the same member, and abbreviate | omits description suitably.

1. Basic Configuration First, the basic configuration of the liquid crystal device according to the present embodiment will be described. Here, FIG. 1 shows a perspective view of the liquid crystal device 10 of the present embodiment, and FIG. 2 shows a partial sectional view of a liquid crystal panel used in the liquid crystal device 10 of FIG.
As shown in FIG. 1, in the liquid crystal device 10, the counter substrate 30 and the element substrate 60 are bonded to each other at the peripheral portion by the sealing material 23, and further, the counter substrate 30, the element substrate 60, and the sealing material 23 are used. A liquid crystal material (not shown) is sealed in the enclosed gap. Further, in the liquid crystal device 10, the element substrate 60 has a substrate protruding portion 60 </ b> T that protrudes outward from the outer shape of the counter substrate 30. In addition, an external connection terminal (not shown) is formed on the surface side that holds the liquid crystal material (not shown) in the substrate extension 60T, and the external connection terminal is A semiconductor element 91 and a panel driving flexible circuit board (FPC) 93 are connected.

As shown in FIG. 2, the counter substrate 30 is made of glass, plastic, or the like. On the counter substrate 30, a color filter, that is, colored layers 37r, 37g, and 37b, and the colored layers 37r, 37g, and 37b are formed. The counter electrode 33 is formed on the counter electrode 33, and the alignment film 45 is formed on the counter electrode 33. In addition, a layer thickness adjusting layer 41 for optimizing retardation is provided between the colored layers 37 r, 37 g, 37 b and the counter electrode 33 in the reflective region R.
Here, the counter electrode 33 is a planar electrode formed over the entire surface of the counter substrate 30 with ITO (indium tin oxide) or the like. In addition, the colored layers 37r, 37g, and 37b are disposed at positions facing the pixel electrode 63 on the element substrate 60 side, such as R (red), G (green), B (blue), or C (cyan), M (magenta), and Y. A color filter element of any color such as (yellow) is provided. A black mask or black matrix, that is, a light shielding film 39 is provided next to the colored layers 37 r, 37 g, and 37 b and at a position that does not face the pixel electrode 63.

The element substrate 60 facing the counter substrate 30 is formed of glass, plastic, or the like. On the element substrate 60, a TFT element 69 as an active element functioning as a switching element and a transparent insulating film 81 are sandwiched. And the pixel electrode 63 formed in the upper layer of the TFT element 69.
Here, the pixel electrode 63 is formed as a light reflection film 79 (63a) for performing reflective display in the reflective region R, and is formed as a transparent electrode 63b with ITO or the like in the transmissive region T. . The light reflection film 79 as the pixel electrode 63a is formed of a light reflective material such as Al (aluminum) or Ag (silver). An alignment film 85 made of a polyimide-based polymer resin is formed on the pixel electrode 63, and a rubbing process as an alignment process is performed on the alignment film 85.

  Further, a phase difference plate 47 is formed on the outer surface (that is, the upper side in FIG. 2) of the counter substrate 30, and a polarizing plate 49 is further formed thereon. Similarly, a retardation plate 87 is formed on the outer surface of the element substrate 60 (that is, the lower side in FIG. 2), and a polarizing plate 89 is further formed thereunder. Further, a backlight unit (not shown) is disposed below the element substrate 60.

The TFT element 69 includes a gate electrode 71 formed on the element substrate 60, a gate insulating film 72 formed on the entire area of the element substrate 60 on the gate electrode 71, and the gate insulating film 72 interposed therebetween. A semiconductor layer 70 formed above the gate electrode 71, a source electrode 73 formed on one side of the semiconductor layer 70 via a contact electrode 77, and a contact electrode 77 on the other side of the semiconductor layer 70. And a drain electrode 66 formed through the electrode.
The gate electrode 71 extends from the gate bus wiring (not shown), and the source electrode 73 extends from the source bus wiring (not shown). Further, a plurality of gate bus lines extend in the horizontal direction of the element substrate 60 and are formed in parallel in the vertical direction at equal intervals, and the source bus lines cross the gate bus lines with the gate insulating film 72 interposed therebetween. A plurality of lines extending in the vertical direction are formed in parallel in the horizontal direction at equal intervals.
Such a gate bus wiring is connected to a liquid crystal driving IC (not shown) and functions as, for example, a scanning line, while a source bus wiring is connected to another driving IC (not shown), for example, a signal line. Acts as
The pixel electrode 63 is formed in a region excluding a portion corresponding to the TFT element 69 in a rectangular region defined by the gate bus wiring and the source bus wiring intersecting each other.

  Here, the gate bus wiring and the gate electrode can be formed of chromium, tantalum, or the like, for example. The gate insulating film is formed of, for example, silicon nitride (SiNx), silicon oxide (SiOx), or the like. Further, the semiconductor layer can be formed of, for example, doped a-Si, polycrystalline silicon, CdSe, or the like. Further, the contact electrode can be formed of, for example, a-Si, and the source electrode and the source bus wiring and the drain electrode integrated therewith can be formed of, for example, titanium, molybdenum, aluminum, or the like.

The organic insulating film 81 is formed over the entire area of the element substrate 60 so as to cover the gate bus lines, the source bus lines, and the TFT elements. However, a contact hole 83 is formed in a portion corresponding to the drain electrode 66 of the organic insulating film 81, and the pixel electrode 63 and the drain electrode 66 of the TFT element 69 are electrically connected at the contact hole 83.
In addition, in the organic insulating film 81, a resin film having a concavo-convex pattern composed of a regular or irregular repetitive pattern of peaks and valleys is formed as a scattering shape in a region corresponding to the reflective region R. Has been. As a result, the light reflection film 79 (63a) laminated on the organic insulating film 81 also has a light reflection pattern composed of an uneven pattern. However, this uneven pattern is not formed in the transmission region T.

  In the liquid crystal panel 20 having the structure as described above, the intersecting regions of the planar electrodes on the counter substrate and the pixel electrodes on the element substrate constitute pixels, respectively, and these pixels gather to constitute a display region. Has been. In addition, the area outside the display area is a non-display area that does not affect the image display, and so that the transmitted light from the backlight and the reflected light do not come out so as to surround the display area on any substrate. Has a light shielding area.

In such a liquid crystal device 10, during reflective display, external light such as sunlight or room illumination light enters the liquid crystal device 10 from the counter substrate 30 side, and the colored layers 37 r, 37 g, 37 b and the liquid crystal material 21 passes through the liquid crystal material 21 and the colored layers 37r, 37g, 37b, etc., and passes through the liquid crystal device 10 and exits from the liquid crystal device 10 to perform reflection display. .
On the other hand, in the transmissive display, the illumination device 11 is turned on, and the light emitted from the illumination device 11 passes through the transparent electrode 63b portion, and the colored layers 37r, 37g, 37b, and the liquid crystal material 21. , And the like, and is transmitted to the outside of the liquid crystal device 10, whereby transmissive display is performed.

2. Reflective region and transmissive region Further, the liquid crystal device according to the present invention is a transflective liquid crystal device, and includes a reflective region and a transmissive region in each pixel or corresponding to each pixel. Yes.
For example, FIG. 3A includes a transmission region T in the upper half and a reflection region R in the lower half in each pixel G. In FIG. 3B, in each pixel G, a reflection region R is provided at the upper and lower portions, and a transmission region T is provided at the central portion sandwiched between the reflection regions R. Further, in FIG. 4A, in each pixel G, a transmission region T is provided at the center, and a reflection region R is provided at the periphery so as to surround the transmission region T.
Further, as illustrated in FIG. 4B, each of the pixels themselves can be divided into a reflection pixel or a transmission pixel, and the reflection region R or the transmission region T can be arranged.

However, in both the transmissive display and the reflective display, the brightness on the entire display surface can be made uniform, and the length of the boundary portion between the reflective region and the transmissive region, which is likely to cause display defects, can be reduced. As shown in FIG. 3A, it is preferable to arrange the reflective region R and the transmissive region T separately in the upper and lower portions in the pixel G.
As shown in FIGS. 5A to 5C, the reflection region R and the transmission region T are provided with an opening 35a corresponding to the transmission region T in either the color filter substrate or the element substrate. By providing the light reflecting film 35, it can be arranged in a desired region. The liquid crystal device described in this embodiment is a liquid crystal device in which a light reflecting film is formed on the color filter substrate side.

3. Layer Thickness Adjustment Layer Next, the layer thickness adjustment layer 41 provided on the counter substrate 30 in the liquid crystal device 10 of the present embodiment will be described in more detail with reference to FIGS. 6 to 11 as appropriate.
The layer thickness adjusting layer is made of an organic photosensitive resin material such as an acrylic resin or an epoxy resin, or an inorganic material such as SiN or SiO ₂ , in order to optimize the retardation and improve the display quality. This is a layer for adjusting the thickness of the liquid crystal layer and the thickness of the liquid crystal layer in the transmission region. That is, in the reflective display, external light is viewed through the liquid crystal layer twice, whereas in the transmissive display, the light emitted from the backlight is viewed through the liquid crystal layer only once, When the thicknesses of the liquid crystal layers in the reflective region and the transmissive region are the same, the lengths (light path lengths) of light passing through the liquid crystal layer in each display are different. Further, the display quality of the visually recognized image greatly depends on the retardation which is the product of the refractive index of the liquid crystal material and the optical path length. Therefore, the thickness of the liquid crystal layer in each of the reflective region and the transmissive region is adjusted by the layer thickness adjusting layer, and the retardation is optimized in both the reflective display and the transmissive display.

  For example, in the case of a liquid crystal device in which a reflective region R and a transmissive region T are arranged in the vertical direction for each pixel G as shown in FIG. 3A, as shown in FIG. Corresponding to the region R, the layer thickness adjustment layer 41 has a stripe shape extending over a plurality of pixels G, or as shown in FIG. 6B, the layer G extends over a plurality of pixels G corresponding to the transmissive region T. The opening or the thin layer portion 41a can be the layer thickness adjusting layer 41 provided in a stripe shape. Moreover, as shown in FIG.6 (c), it is set as the island-shaped layer thickness adjustment layer 41 provided corresponding to the reflective area | region R for every pixel G, or as shown in FIG.6 (d), For each pixel G, the layer thickness adjusting layer 41 having an opening or a thin layer portion 41a provided corresponding to the transmission region T can be used.

The liquid crystal device according to the present invention is characterized in that a layer having the same shape as the layer thickness adjusting layer in the display region is formed outside the display region in a predetermined direction in which a plurality of pixels are arranged. That is, by forming a layer having the same shape as the layer thickness adjusting layer even outside the display region, the thickness state of the alignment film formed on the layer thickness adjusting layer can be made uniform in all pixels. .
More specifically, when forming the alignment film on the substrate on which the layer thickness adjustment layer is formed, depending on the unevenness state of the layer thickness adjustment layer, after applying the alignment film forming material and drying it, There is a phenomenon that the forming material of the alignment film flows and flows into the transmission region side having a low height. Therefore, in the liquid crystal device of the present embodiment, a layer having the same shape as the layer thickness adjusting layer in the display region is provided on the outer side of the pixel adjacent to the boundary between the display region and the non-display region. The inflow state of the alignment film can be made equal in all the pixels in the display area including the pixels adjacent to the boundary between the display area and the non-display area. Therefore, since the film thickness state of the alignment film in all the pixels in the display area can be made uniform, display unevenness in the pixels adjacent to the boundary between the display area and the non-display area can be effectively prevented. .

For example, in the case of the layer thickness adjusting layer 41 as shown in FIG. 6A, as shown in FIG. 7, the layer thickness along the length direction (X direction) in which the layer thickness adjusting layer 41 is disposed. The end of the adjustment layer 41 is extended to the outside of the display area A, or the display area A is also outside the display area A in the direction (Y direction) intersecting the length direction in which the layer thickness adjustment layer 41 is disposed. The layer 42 having the same shape as that of the layer thickness adjusting layer 41 formed inside can be provided.
Further, in the case of the layer thickness adjusting layer 41 as shown in FIG. 6B, as shown in FIG. 8, the length direction (X direction) in which the opening or the layer thin portion 41a in the layer thickness adjusting layer 41 is disposed. ), The end of the opening or the layer thin portion 41a is extended to the outside of the display area A, or intersects the length direction of the layer thickness adjusting layer 41 where the opening or the layer thin portion 41a is disposed. An opening or thin layer 42a having the same shape as the opening or thin layer 41a formed inside the display region A can also be provided outside the display region A in the direction (Y direction).
Furthermore, in the case of the layer thickness adjusting layer 41 as shown in FIGS. 6C and 6D, as shown in FIG. 9A, along the predetermined direction in which the pixels G are arranged, that is, The layer 42 or the opening 42a having the same shape as the layer thickness adjusting layer 41 or the opening 41a provided inside the display area A may be provided outside the display area A along the direction and the Y direction. it can.

At this time, as shown in FIG. 10, when the layer 42 having the same shape as the layer thickness adjusting layer 41 is also provided outside the display area A along the predetermined direction, the layer 42 having the same shape is displayed for at least one pixel. It is preferable to form it outside the region.
This is because the formation state of the layer thickness adjusting layer around the pixel adjacent to the boundary between the display region and the non-display region can be matched with most other pixels. Further, this is because the flow of the alignment film material in all the pixels in the display region can be made equal without excessively widening the formation range of the layer thickness adjusting layer.
Therefore, the film thickness state of the alignment film in all the pixels in the display region can be made uniform, and display unevenness can be prevented from being visually recognized near the boundary between the display region and the non-display region.

11A and 11B, when the layer thickness adjusting layer 41 corresponding to the reflective region R is provided, the layer 42 having the same shape as the layer thickness adjusting layer formed outside the display region A is used. The film thickness and the width along the predetermined direction may not necessarily coincide with the film thickness or width of the layer thickness adjusting layer 41 inside the display area A.
That is, as shown in FIG. 11C, the material 45 is formed by the layer thickness adjusting layer 41 provided outside the display area A after applying the material 45 for forming the alignment film and before drying. If it is possible to prevent the fluid from flowing excessively, the effect of the present invention can be obtained.

Similarly, when a layer thickness adjustment layer 41 having an opening or a thin layer portion 41a corresponding to the transmission region T as shown in FIGS. 12A and 12B is provided, it is formed outside the display region A. The film thickness and the width in the extending direction of the layer 42 having the same shape as the opening or the thin layer of the layer thickness adjustment layer do not necessarily match the film thickness and the width of the layer thickness adjustment layer 41 inside the display area A. It doesn't matter.
That is, as shown in FIG. 12C, an appropriate amount is poured into the opening 41a provided outside the display area A and the like after the material 45 for forming the alignment film is applied and dried. If it can be made, the effect of this invention can be acquired.

Regarding the step wall of the step portion in the layer thickness adjusting layer, it is preferable that the angle formed between the substrate surface and the step wall be a value within the range of 70 to 90 °.
The reason for this is that, as shown in FIGS. 13A to 13B, the area of the region W corresponding to the step wall 11 that is visible when viewed from the direction perpendicular to the substrate surface is relatively small. This is because it is possible to reduce the area of the region W in which display defects are likely to occur when a tone is displayed.
The angle formed between the substrate surface and the step wall is determined within a range of 0 to 90 ° out of two angles θA and θB formed between the substrate surface 13 and the step wall 11 shown in FIG. An angle.

[Second Embodiment]
The second embodiment of the present invention is a method of manufacturing the liquid crystal device of the first embodiment,
Applying a photosensitive resin material to one of the pair of substrates in a region including the display region and the outside of the display region;
By developing after exposing the photosensitive resin material, the layer thickness adjusting layer has an opening or a thin layer corresponding to the transmissive region in the display region, and outside the display region in a predetermined direction in which a plurality of pixels are arranged. Forming an opening or a thin layer of the same shape;
Forming an alignment film on the substrate;
It is characterized by including.
Hereinafter, a method for manufacturing a liquid crystal device having an active matrix structure including a TFT element as an example of a method for manufacturing a liquid crystal device according to the second embodiment will be described with reference to FIGS.

1. Color Filter Substrate Manufacturing Process (1) Formation of Light Reflecting Film First, as shown in FIG. 14A, light reflection for forming a reflective region on a glass substrate 31 as a base material of a first substrate. A film 35 is formed. The light reflecting film 35 is a light reflecting film 35 having an opening 35a that forms a transmission region. Such a reflective film can be formed by depositing a metal material such as aluminum on a mother substrate by vapor deposition or sputtering, and then patterning using a photolithography method.

(2) Formation of Colored Layer Next, as shown in FIG. 14B, a colored layer 37 of any one color of R, G, and B is formed corresponding to each pixel. Such a colored layer is formed by applying a photosensitive resin made of a transparent resin or the like in which a coloring material such as pigment or dye is dispersed on a mother substrate, and sequentially performing pattern exposure and development processing on the photosensitive resin. can do. Such exposure and development processing is repeated for each of R, G, and B colors.

(3) Formation of light shielding film Next, as shown in FIG. 14C, a light shielding film 39 is formed in each inter-pixel region. As such a light-shielding film, for example, a metal film such as chromium (Cr) or molybdenum (Mo) is used as the light-shielding film, or three colors of R (red), G (green), and B (blue) are colored. A material in which both materials are dispersed in a resin or other substrate, or a material in which a coloring material such as a black pigment or dye is dispersed in a resin or other substrate can be used.
For example, when forming a light-shielding film using a metal film, a metal material such as chromium (Cr) is deposited on a glass substrate by a vapor deposition method or the like, and is then etched according to a predetermined pattern. be able to.

(4) Formation of Layer Thickness Adjustment Layer Next, as shown in FIG. 14 (d), a photosensitive resin material is uniformly applied on the substrate using a coating device such as a spin coater, for example. A material layer 41 ′ is formed. At this time, for example, when a spin coater is used, a photosensitive resin material layer having a thickness of 1 to 10 μm can be formed at a rotation speed of 600 to 2,000 rpm and a coating time of 5 to 20 seconds.
Here, the type of the photosensitive resin material is not particularly limited. For example, one kind of acrylic resin, epoxy resin, silicone resin, phenol resin, oxetane resin, or a combination of two or more kinds is used. Is mentioned. In addition, an inorganic filler such as silica particles, titanium oxide, zirconia oxide, or aluminum oxide can be added to the photosensitive resin material so that the uneven pattern can be formed with high accuracy.
Moreover, as the photosensitive resin material, the positive type that is photodegraded and solubilized in the developer by the portion irradiated with the light transmitted through the light transmitting portion and the light transmitted through the light transmitting portion are irradiated. Although there is a negative type in which the portion is cured and insolubilized in the developer, any of them can be suitably used.
In the present embodiment, a case where a positive photosensitive resin material is used will be described as an example.

Next, as shown in FIGS. 15A to 15B, the photosensitive resin material 41 ′ is exposed and developed, so that an opening or a thin layer portion 41 a corresponding to the transmissive region inside the display region A is formed. And an opening or a thin layer 42a having the same shape as the layer thickness adjusting layer 41 is formed outside the display area A in a predetermined direction in which a plurality of pixels are arranged.
More specifically, for example, a substrate is placed on a stepper stage, and as shown in FIG. 15A, an energy beam such as i-line indicated by symbol L is irradiated after the photomask 111 is arranged. Then, pattern exposure is performed on the uniformly coated photosensitive resin material layer 41 '. Thereafter, as shown in FIG. 15 (b), the photosensitive resin material layer 41 'on the substrate 31 is developed with a developer so that light transmitted through the light transmitting portion of the photomask is irradiated. The layer thickness adjusting layer 41 having the opening or the thin layer portion 41a corresponding to the transmissive region can be formed.
At this time, the same opening or layer as the layer thickness adjusting layer is used outside the display area by using a photomask in which the mask pattern in the display area extends outside the display area along a predetermined direction. A layer having a thin portion can be formed.

(5) Formation of planar electrode and alignment film Next, as shown in FIG. 15 (c), an ITO (indium tin oxide) is entirely formed on the layer thickness adjusting layer 41 including the opening or the thin layer portion 41a. After forming a transparent conductive layer made of a transparent conductive material such as, for example, by a sputtering method, patterning is performed using a photolithography method to form the planar electrode 33.
Next, as shown in FIG. 15D, an alignment film 45 made of polyimide resin or the like is formed for each cell region on the substrate on which the planar electrode 33 is formed, whereby the color filter substrate 30 is formed. Can be manufactured.
At this time, since the layer having the same shape as the layer thickness adjusting layer in the display region is formed even outside the display region, before the alignment film material is dried, the alignment film is formed in the opening or the thin layer portion. Even when the material flows in, the flow in all pixels in the display region becomes uniform, and the film thickness of the alignment film can be made uniform.

2. Element Substrate Manufacturing Process An element substrate constituting such a liquid crystal panel is obtained by laminating various members on a glass substrate or the like as a substrate of the element substrate, thereby to provide a TFT element, a predetermined pattern scanning line, and a predetermined pattern data line. External connection terminals and the like are appropriately formed. Next, after laminating a transparent conductive film such as ITO by sputtering or the like, pixel electrodes are formed in a matrix in the display region by photolithography and etching. Further, an alignment film made of polyimide is formed on the substrate surface on which the pixel electrode is formed. In this way, an element substrate on which various resin films and conductive films are formed is manufactured.

3. Step of forming liquid crystal panel Next, although not shown, a color filter substrate or an element substrate is laminated with a sealing material so as to surround the display region, and then the other substrate is overlaid and heat-pressed to form a color filter. The cell structure is formed by bonding the substrate and the element substrate.
Next, a liquid crystal panel can be formed by injecting a liquid crystal material into the cell from an injection port provided in a part of the sealing material and then sealing with a sealing material or the like.
Note that the liquid crystal material is not limited to the vacuum injection method described above, but after a frame-shaped sealing material is formed on one of the substrates, the liquid crystal material is dropped into the frame and bonded to the other substrate. Can also be placed between the substrates.

4). Assembling process, etc. Next, a retardation plate (1 / 4λ plate) and a polarizing plate are arranged on the outer surface of each of the color filter substrate and the element substrate, and a driver is mounted, and it is incorporated in a casing together with a backlight and the like. Thus, a liquid crystal device can be manufactured.

[Third Embodiment]
3rd Embodiment of this invention is a manufacturing method of the liquid crystal device of 1st Embodiment, Comprising:
Applying a photosensitive resin material to one of the pair of substrates in a region including the display region and the outside of the display region;
A step of forming a layer having the same shape as the layer thickness adjusting layer outside the display region in a predetermined direction in which a plurality of pixels are arranged, by developing after exposing the photosensitive resin material to correspond to the reflection region in the display region When,
Forming an alignment film on the substrate;
A method for manufacturing a liquid crystal device.
Hereinafter, as an example of the manufacturing method of the liquid crystal device according to the third embodiment, the manufacturing method of the active matrix type liquid crystal device including the TFT element is different from the second embodiment in the layer thickness adjustment layer. The formation process will be mainly described.

That is, in the step of forming the layer thickness adjusting layer in the present embodiment, the photosensitive resin material is applied on the substrate under the same conditions as in the second embodiment, and is then made to correspond to the reflective region in the display region and a plurality of pixels. A layer having the same shape as the layer thickness adjusting layer is formed outside the display region in a predetermined direction in which the layers are arranged.
More specifically, for example, similar to the step of forming the layer thickness adjusting layer in the second embodiment, the substrate is placed on the stepper stage and the photomask is placed, and then the i line indicated by the symbol L, etc. The pattern exposure is carried out on the uniformly coated photosensitive resin material layer.

Next, for example, by developing the photosensitive resin material layer on the substrate using a developer, the portion irradiated with the light transmitted through the light transmitting portion of the photomask is developed and arranged corresponding to the reflective region. The layer thickness adjusting layer thus formed can be formed.
At this time, even outside the display area, by using a photomask that extends the mask pattern in the display area to the outside of the display area along a predetermined direction, the layer thickness adjusting layer in the display area can be Layers of the same shape can be formed.

  In the case of the layer thickness adjusting layer formed in this way, since the formation state of the layer thickness adjusting layer is equalized inside and outside the display region, the alignment layer is aligned before the alignment film material is dried. Even when the film forming material flows, the flow in all the pixels in the display region becomes uniform, and the film thickness of the alignment film can be made uniform.

[Fourth Embodiment]
As a fourth embodiment according to the present invention, an electronic apparatus including the liquid crystal device according to the first embodiment will be specifically described.

FIG. 16 is a schematic configuration diagram showing the overall configuration of the electronic apparatus of the present embodiment. The electronic apparatus includes a liquid crystal panel 20 provided in the liquid crystal device and a control unit 200 for controlling the liquid crystal panel 20. In FIG. 16, the liquid crystal panel 20 is conceptually divided into a panel structure 20a and a drive circuit 20b composed of a semiconductor element (IC) or the like. The control means 200 preferably includes a display information output source 201, a display processing circuit 202, a power supply circuit 203, and a timing generator 204.
The display information output source 201 includes a memory composed of a ROM (Read Only Memory), a RAM (Random Access Memory), etc., a storage unit composed of a magnetic recording disk, an optical recording disk, etc., and a tuning that outputs a digital image signal in a synchronized manner. It is preferable that the display information is supplied to the display processing circuit 202 in the form of an image signal or the like of a predetermined format based on various clock signals generated by the timing generator 204.

The display processing circuit 202 includes various well-known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and executes processing of input display information to display the image. Information is preferably supplied to the drive circuit 20b together with the clock signal CLK. Furthermore, the drive circuit 20b preferably includes a first electrode drive circuit, a second electrode drive circuit, and an inspection circuit. Further, the power supply circuit 203 has a function of supplying a predetermined voltage to each of the above-described components.
In the electronic device of this embodiment, in order to provide a liquid crystal device in which the formation state of the layer thickness adjusting layer for adjusting the thickness of the liquid crystal layer is made equal in the display area, the thickness of the alignment film An electronic device in which display defects due to variation are few can be obtained.

  According to the present invention, in order to provide a liquid crystal device in which the formation state of the layer thickness adjusting layer for adjusting the thickness of the liquid crystal layer is made equal in and out of the display region, display defects occur due to variations in the thickness of the alignment film. The liquid crystal device can be reduced. Therefore, various liquid crystal devices and electronic devices such as mobile phones and personal computers, liquid crystal televisions, viewfinder type / monitor direct view type video tape recorders, car navigation devices, pagers, electronic notebooks, calculators, word processors, The present invention can be applied to workstations, videophones, POS terminals, electronic devices equipped with touch panels, and the like.

1 is a schematic perspective view of a liquid crystal device according to a first embodiment. It is a fragmentary sectional view of the liquid crystal device of a 1st embodiment. It is a figure which is provided in order to demonstrate arrangement | positioning of a reflective area | region, respectively (the 1). It is a figure with which it uses in order to demonstrate arrangement | positioning of a reflective area | region, respectively (the 2). It is a figure which shows the example of arrangement | positioning of a light reflection film. It is a figure provided in order to demonstrate the formation state of a layer thickness adjustment layer. It is a figure provided in order to demonstrate the layer thickness adjustment layer which extended the formation state in the display area outside the display area (the 1). It is a figure provided in order to demonstrate the layer thickness adjustment layer which extended the formation state in the display area outside the display area (the 2). It is a figure provided in order to demonstrate the layer thickness adjustment layer which extended the formation state in the display area outside the display area (the 3). It is a figure which shows the layer thickness adjustment layer which extended the formation state in the display area by 1 pixel out of the display area. It is a figure provided in order to demonstrate the layer thickness adjustment layer which extended the formation state in the display area outside the display area (the 4). It is a figure provided in order to demonstrate the layer thickness adjustment layer which extended the formation state in the display area outside the display area (the 5). It is a figure provided in order to demonstrate the angle which each board | substrate surface and a level | step difference wall make. It is a figure which shows the manufacturing process of the color filter board | substrate provided with the layer thickness adjustment layer (the 1). It is a figure which shows the manufacturing process of the color filter board | substrate provided with the layer thickness adjustment layer (the 2). It is a block diagram for demonstrating schematic structure of the electronic device of 4th Embodiment. It is a figure provided in order to demonstrate the structure of the conventional layer thickness adjustment layer. It is a figure provided in order to demonstrate the dispersion | variation in the film thickness of the alignment film resulting from the layer thickness adjustment layer.

Explanation of symbols

10: Liquid crystal device, 11: Step wall, 13: Substrate surface, 30: Color filter substrate, 31: Glass substrate, 33: Planar electrode, 35: Light reflection film, 35a: Opening, 37: Colored layer, 39: Light-shielding film, 41: layer thickness adjusting layer, 41a: opening or thin layer, 42: layer of the same shape, 42a: opening or thin layer, 45: alignment film, 60: element substrate

Claims (8)

In a liquid crystal device having a liquid crystal layer between a pair of substrates and having a display region composed of a plurality of pixels,
The display area has a reflection area and a transmission area,
A layer thickness adjusting layer for adjusting the thickness of the liquid crystal layer in the reflective region and the thickness of the liquid crystal layer in the transmissive region on at least one of the pair of substrates;
A liquid crystal device, wherein a layer having the same shape as the layer thickness adjusting layer is formed outside a display region in a predetermined direction in which the plurality of pixels are arranged.   2. The liquid crystal device according to claim 1, wherein the layer having the same shape is formed for at least one pixel outside the display area.   The layer having the same shape has the same shape as the layer thickness adjusting layer provided corresponding to the reflective region in the display region, and has a predetermined direction in which the plurality of pixels are arranged and a direction intersecting the predetermined direction. The liquid crystal device according to claim 1, wherein the liquid crystal device is formed outside at least one of the display areas.   The layer having the same shape is formed by forming the same layer as the layer thickness adjusting layer formed in the display region outside the display region and corresponding to the transmission region in the display region. The opening or layer thin part having the same shape as the opening or layer thin part of the layer thickness adjusting layer, and at least one of the predetermined direction in which the plurality of pixels are arranged and the direction intersecting the predetermined direction The liquid crystal device according to claim 1, wherein the liquid crystal device is formed outside the display area.   The layer having the same shape is formed continuously with the layer thickness adjusting layer provided across a plurality of pixels in a predetermined direction in which the plurality of pixels are arranged. The liquid crystal device according to any one of the above. In a method for manufacturing a liquid crystal device having a liquid crystal layer between a pair of substrates and having a display region composed of a plurality of pixels,
Applying a photosensitive resin material on one of the pair of substrates to a region including the display region and outside the display region;
The photosensitive resin material is exposed and then developed to have an opening or a thin layer corresponding to the transmission region in the display region, and the outside of the display region in a predetermined direction in which the plurality of pixels are arranged. Forming an opening or a layer thin part having the same shape as the layer thickness adjusting layer;
Forming an alignment film on the substrate;
A method for manufacturing a liquid crystal device, comprising: In a method for manufacturing a liquid crystal device having a liquid crystal layer between a pair of substrates and having a display region composed of a plurality of pixels,
Applying a photosensitive resin material on one of the pair of substrates to a region including the display region and outside the display region;
By developing after exposing the photosensitive resin material, it corresponds to the reflective area in the display area, and has the same shape as the layer thickness adjusting layer outside the display area in a predetermined direction in which the plurality of pixels are arranged. Forming a layer;
Forming an alignment film on the substrate;
A method for manufacturing a liquid crystal device, comprising:   An electronic apparatus comprising the liquid crystal device according to claim 1.

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