JP4258231B2 - Electro-optical device and electronic apparatus using the same - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an electro-optical device capable of displaying in a transmissive mode and a reflective mode, and an electronic apparatus using the same.
[0002]
[Prior art]
A liquid crystal device, which is one of typical electro-optical devices, is widely used as a display device for a mobile phone, a mobile computer, and the like because of its thinness, light weight, and low power consumption.
[0003]
In this type of electro-optical device, as shown in FIG. 9, the liquid crystal can be displayed in the transmission mode by the light emitted from the backlight device, and can also be displayed in the reflection mode using external light. A light reflecting film 33 that enables display in a reflection mode, a red (R), green (G), and blue (B) color filter layer 34 and an overcoat layer 35, a pixel electrode 36 having translucency, and an alignment film 37 are formed in this order. On the other hand, a light transmission window 330 that enables display in a transmission mode is provided in each light reflection film 33 for each pixel 11. (For example, refer patent document 1).
[0004]
In addition, when the directionality of the light reflected by the light reflecting film 33 is strong, the viewing angle dependency such as the brightness being different depending on the angle at which the image is viewed becomes remarkable. Therefore, after applying a photosensitive resin such as an acrylic resin to the surface of the substrate to a thickness, the photosensitive resin layer is left in a predetermined pattern as the lower-side concavo-convex forming layer 51a by using a photolithography technique, thereby reflecting light. Unevenness is imparted to the surface of the film 33. Further, since the edge of the lower-side unevenness forming layer 51a comes out as it is, the upper-side unevenness-forming layer made of a highly fluid photosensitive resin layer is formed on the upper layer of the lower-side unevenness forming layer 51a. By applying and forming 52a, the surface of the light reflecting film 33 is provided with an uneven pattern having a gentle shape without an edge.
[0005]
[Patent Document 1]
JP 2002-258270 (6th page, FIG. 1)
[0006]
[Problems to be solved by the invention]
However, the photosensitive resin constituting the upper-side unevenness forming layer 52a and the lower-side unevenness forming layer 51a tends to strongly absorb light in the short wavelength region as shown by the solid line L0 in FIG. When a color image is displayed in the transmissive mode, light emitted from a backlight device (not shown) is a photosensitive resin in which light in a low wavelength region constitutes the upper layer side unevenness forming layer 52a and the lower layer side unevenness forming layer 51a. After being partially absorbed, the light enters the color filter layer 54. For this reason, the conventional electro-optical device has a problem in that a yellow color image is displayed.
[0007]
In view of the above problems, an object of the present invention is to provide an electro-optical device capable of displaying a high-quality color image even when an unevenness forming layer for providing unevenness for light scattering is formed, and It is to provide an electronic device used.
[0008]
[Means for Solving the Problems]
In order to solve the above-described problems, in the present invention , a plurality of pixels are formed on a light-transmitting substrate for holding an electro-optical material, and the unevenness-forming film provided on the pixels and having light-transmitting properties is provided. When, along with are provided in a part of the pixel, disposed on the light reflective layer and the light reflection film to enable the display in the reflective mode to be disposed on the unevenness forming layer is provided in an the pixel A plurality of color filter layers, and in a region where the light reflection film of the pixel is not provided, display in a transmission mode is possible, and among the plurality of pixels, a color filter layer of a predetermined color is provided. In the formed pixel, the unevenness forming layer is formed in a region that overlaps the region where the light reflecting film is not provided, and in the pixel in which the color filter layer of another color is formed, the light reflecting layer is formed. Membrane provided Characterized in that is the unevenness forming layer in a region overlapping the area in a plan view is not is not formed.
[0009]
For example, when the color filter layer corresponding to red, green, and blue is formed on each pixel, and the unevenness forming layer is made of a photosensitive resin, red and green among the pixels. In the pixel in which the color filter layer is formed, the pixel is formed in a region overlapping with the light transmission window, whereas in the pixel in which the blue color filter layer is formed, the pixel is formed in a region overlapping with the light transmission window. It is characterized by not.
[0010]
In the present invention, when the concave / convex forming layer is made of a photosensitive resin, light is emitted from a pixel having a blue color filter layer corresponding to the spectral characteristic that the photosensitive resin absorbs light in a short wavelength region. The concave / convex forming layer is not formed in a region overlapping the transmission window in a plan view. For this reason, even when a color image is displayed in the transmission mode, the light emitted from the backlight device enters the blue color filter layer without the light in the low wavelength region being absorbed by the unevenness forming layer. Therefore, since the color image does not turn yellow, a high-quality color image can be displayed.
[0011]
In the present invention, in the pixel, a color filter layer for reflection display is formed in a region overlapping with the light reflecting film in a plane, and in a region overlapping with the region where the light reflecting film is not provided. It is preferable that a color filter layer for transmissive display having a higher coloring property than the color filter layer for reflective display is formed. If comprised in this way, the color strength of the color image displayed by the transmission mode and the reflection mode can be match | combined.
[0012]
In the present invention, in the pixel in which the color filter layer of the predetermined color is formed, the color filter layer which overlaps in a plane with the region where the light reflection film is not provided is a pixel in which the color filter layer of the other color is formed It is preferable that the thickness is thicker than the color filter layer that overlaps the area where the light reflecting film is not provided. If comprised in this way, it can prevent that an unevenness | corrugation is formed in the surface of a color filter layer.
[0013]
In the present invention, the electro-optical material is a liquid crystal held between the substrate and another substrate disposed opposite to the substrate.
[0014]
The transflective electro-optical device according to the present invention can be used for electronic devices such as mobile phones and mobile computers.
[0015]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described with reference to the drawings.
[0016]
(overall structure)
FIG. 1 is a block diagram showing an electrical configuration of an electro-optical device to which the present invention is applied. 2 and 3 are an exploded perspective view showing the configuration of the electro-optical device shown in FIG. 1 and an enlarged cross-sectional view showing a part thereof, respectively. FIG. 4 is a plan view showing a layout for several pixels including a TFD element in the electro-optical device, and FIG. 5 is a cross-sectional view taken along the line AA ′.
[0017]
The electro-optical device to which the present invention is applied is an active matrix transflective liquid crystal device using nematic liquid crystal, and a plurality of scanning lines 31 are formed in the row (X) direction as shown in FIG. A plurality of data lines 21 are formed in the column (Y) direction. A pixel 11 is formed at each intersection of the scanning line 31 and the data line 21. In each pixel 11, a liquid crystal layer 12 made of nematic liquid crystal and a TFD element 40, which is a two-terminal active element, are connected in series. In the example shown here, the liquid crystal layer 12 is connected to the scanning line 31 side, and the TFD element 40 is connected to the data line 21 side. Each scanning line 31 is driven by a scanning line driving circuit 350, while each data line 21 is driven by a data line driving circuit 250.
[0018]
As shown in FIG. 2, the electro-optical device 1 uses a driving liquid crystal cell 10 in which a pair of translucent substrates are bonded to each other with a predetermined gap, and an upper polarizing plate 2 and a first upper polarizing plate. The phase difference plate 3, the second upper phase difference plate 4, the driving liquid crystal cell 10, the first lower phase difference plate 5, the second lower phase difference plate 6, and the backlight device 9 are arranged from above to below. They are arranged in this order.
[0019]
In the driving liquid crystal cell 10, one light-transmitting substrate is an element-side substrate 20 on which an active element is formed, and the other light-transmitting substrate is a counter substrate 30 that faces the element-side substrate 20. The element-side substrate 20 and the counter substrate 30 are bonded to each other with a predetermined gap by a sealing material 14 including a spacer (not shown), and the liquid crystal layer 12 is sealed and held in this gap. Yes.
[0020]
In the electro-optical device 1, a liquid crystal driving IC (driver) constituting the data line driving circuit 250 is directly mounted on the surface of the element side substrate 20 by the COG (Chip On Glass) technology, and the surface of the counter substrate 30 is also mounted on the surface of the counter substrate 30. A liquid crystal driving IC (driver) constituting the scanning line driving circuit 350 is directly mounted. The configuration is not limited to the COG technique, and the IC chip and the electro-optical device may be connected using other techniques. For example, a TAB (Tape Automated Bonding) technique may be used to electrically connect a TCP (Tape Carrier Package) in which an IC chip is bonded on an FPC (Flexible Printed Circuit) to an electro-optical device. Further, COB (Chip On Board) technology for bonding an IC chip to a hard substrate may be used.
[0021]
As shown in FIGS. 3 and 4, a base film 25 is formed on the inner surface of the element-side substrate 20, and a plurality of data lines 21 and their data lines are formed on the surface of the base film 25. A plurality of TFD elements 40 connected to 21 and pixel electrodes 23 connected to the TFD elements 40 in a one-to-one relationship are formed. The pixel electrode 23 is formed of a light-transmitting conductive film such as ITO (Indium Tin Oxide). Each data line 21 extends linearly, while the TFD elements 40 and the pixel electrodes 23 are arranged in a dot matrix. On the surface of the pixel electrode 23 and the like, an alignment film 24 subjected to a rubbing process is formed. The alignment film 24 is generally formed from a polyimide resin or the like.
[0022]
On the other hand, on the inner surface of the counter substrate 30, a single layer film or a multilayer film of aluminum, aluminum alloy, silver, silver alloy or the like is formed on the upper layer side of a lower layer side unevenness forming film 51 a and an upper layer side unevenness forming film 52 a described later. A light reflecting film 33 made of, a red (R), green (G), and blue (B) color filter layer 34, an overcoat layer 35, and a strip-shaped counter electrode 36 made of a light-transmitting conductive film such as ITO. An alignment film 37 is formed from polyimide resin or the like. The light reflection film 33 is for display in the reflection mode, and the light reflection film 33 is formed with a light transmission window 330 that enables display in the transmission mode.
[0023]
A black matrix 38 is formed in the gap between the color filter layers 34 to block incident light from the gap between the color filter layers 34. The overcoat layer 35 is formed on the surfaces of the color filter layer 34 and the black matrix 38 for the purpose of improving the smoothness of the color filter layer 34 and the black matrix 38 and preventing the counter electrode 36 from being disconnected. Here, the counter electrode 36 functions as the scanning line 31 and is formed in a direction orthogonal to the data line 21.
[0024]
As shown in FIGS. 4 and 5, the TFD element 40 includes a first TFD element 40 a and a second TFD element 40 b, and the first metal film is formed on the insulating film 25 formed on the surface of the element substrate 20. 42, an oxide film 44 as an insulator formed on the surface of the first metal film 42 by anodic oxidation, and second metal films 46a and 46b formed on the surface and spaced apart from each other. Further, the second metal film 46 a becomes the data line 21 as it is, while the second metal film 46 b is connected to the pixel electrode 23.
[0025]
The first TFD element 40a becomes the second metal film 46a / oxide film 44 / first metal film 42 in order from the data line 21 side, and becomes metal (conductor) / insulator / metal (conductive). Therefore, it has diode switching characteristics in both positive and negative directions. On the other hand, when viewed from the data line 21 side, the second TFD element 40b becomes the first metal film 42 / oxide film 44 / second metal film 46b in order, which is opposite to the first TFD element 40a. The diode switching characteristics are as follows. Accordingly, since the TFD element 40 has two diodes connected in series in opposite directions, the current-voltage nonlinear characteristic is symmetric in both positive and negative directions compared to the case where one diode is used. Will be. If it is not necessary to strictly symmetrize the nonlinear characteristics as described above, only one TFD element 40 may be used.
[0026]
The TFD element 40 is an example of a diode element. In addition, an element using a zinc oxide (ZnO) varistor, an MSI (Metal Semi Insulator), etc., or these elements can be used alone or in a reverse direction. Those connected in series or in parallel can be applied.
[0027]
[Detailed configuration of each pixel]
FIG. 6 is a graph showing the spectral characteristics of the color filter layer and the photosensitive resin used in the electro-optical device to which the present invention is applied.
[0028]
In the electro-optical device 1 of the present embodiment, the light emitted from the backlight device 9 enters the driving liquid crystal cell 10, and then passes from the light transmission window 330 of the light reflecting film 33 through the color filter layer 34 to the liquid crystal layer 12. Is emitted from the element substrate 20 side. At that time, the display light is optically modulated by the liquid crystal layer 12 in each pixel 11 to display a color image in the transmission mode.
[0029]
On the other hand, external light incident from the element substrate 20 side is reflected by the light reflecting film 33 through the liquid crystal layer 12 and the color filter layer 34, and again passes through the color filter layer 34 and the liquid crystal layer 12. It is emitted from the side. At that time, the display light is optically modulated by the liquid crystal layer 12 in each pixel 11 to display a color image in the reflection mode.
[0030]
As described above, the light passes through the color filter layer 34 twice in the reflection mode, but the light passes only once through the color filter layer 34 in the transmission mode. For this reason, when a color image is displayed in the transmissive mode, the color may be lighter than when a color image is displayed in the reflective mode. In this embodiment, red (R), green (G), and blue In any of the color filter layers 34 of (B), a color filter layer 341 for reflection display is formed in a region overlapping the light reflection film 33 in a plane, while overlapping the light transmission window 330 in a plane. In the region, a color filter layer 342 for transmissive display that is more colored than the color filter layer 341 for reflective display is formed.
[0031]
Further, in the electro-optical device 1 according to the present embodiment, when the directionality of the light reflected by the light reflecting film 33 is strong, the viewing angle dependency such that the brightness varies depending on the viewing angle of the image becomes remarkable. Therefore, in this embodiment, on the surface side of the counter substrate 30, the lower layer side unevenness forming layer 51 a made of a photosensitive resin layer is selectively formed in a predetermined pattern on the lower layer side of the light reflecting film 33, thereby light reflection. Unevenness is imparted to the surface of the film 33. Further, since the edge of the lower-side unevenness forming layer 51a comes out as it is, the upper-side unevenness-forming layer made of a highly fluid photosensitive resin layer is formed on the upper layer of the lower-side unevenness forming layer 51a. By applying and forming 52a, the surface of the light reflecting film 33 is provided with irregularities having gentle shapes without edges.
[0032]
Here, the spectral characteristics of the blue (B), green (G), and red (R) color filter layers 34 are represented by the dotted line L1, the alternate long and short dashed line L2, and the alternate long and two short dashes line L3 in FIG. The spectral characteristics of the photosensitive resin layer constituting the layer 51a and the upper layer side unevenness forming layer 52a are represented by the solid line L0 in FIG. 6, and the photosensitive resin constituting the lower layer side unevenness forming layer 51a and the upper layer side unevenness forming layer 52a. The layer has a spectral characteristic of absorbing light in a short wavelength region.
[0033]
Corresponding to such spectral characteristics, in this embodiment, in the pixel 11 in which the red (R) and green (G) color filter layers 34 are formed, a region overlapping with the light reflecting film 33 and light The lower layer side unevenness forming layer 51a and the upper layer side unevenness forming layer 52a are formed in both regions that overlap the transmission window 330 in a planar manner.
[0034]
On the other hand, in the pixel 11 in which the blue (B) color filter layer 34 is formed, the lower layer side unevenness forming layer 51a and the upper layer side unevenness forming layer 52a are formed in a region overlapping the light reflecting film 33 in a plan view. Although it is formed, neither the lower-side unevenness forming layer 51a nor the upper-side unevenness forming layer 52a is formed in the region overlapping the light transmission window 330 in a plan view.
[0035]
For this reason, when a color image is displayed in the transmission mode, in the pixel 11 in which the red (R) and green (G) color filter layers 34 are formed, the light emitted from the backlight device 9 After passing through the formation layer 51 a and the upper-side unevenness formation layer 52 a, the light enters the liquid crystal layer 12 through the color filter layer 34 from the light transmission window 330 of the light reflection film 33. On the other hand, in the pixel 11 in which the blue (B) color filter layer 34 is formed, the light emitted from the backlight device 9 does not pass through the lower layer side unevenness forming layer 51a and the upper layer side unevenness forming layer 52a. As it is, it enters the liquid crystal layer 12 through the color filter layer 34 from the light transmission window 330 of the light reflection film 33.
[0036]
For this reason, even if the photosensitive resin layer which comprises the lower side uneven | corrugated formation layer 51a and the upper layer uneven | corrugated formation layer 52a has the spectral characteristic that it absorbs the light of a short wavelength region, it is suitable also for the pixel 11 for blue. The colored light is emitted. Therefore, a high-quality color image without yellowing can be displayed in both the reflection mode and the transmission mode.
[0037]
Further, in the pixel 11 in which the red (R) or green (G) color filter layer 34 is formed, the lower layer side unevenness forming layer 51a and the upper layer side unevenness forming layer are disposed in a region overlapping the light transmission window 330 in a plane. Since 52a is left, there is an advantage that unnecessary irregularities are not formed on the surface side of the color filter layer.
[0038]
Furthermore, in the pixel 11 in which the blue (B) color filter layer 34 is formed, both the lower-side unevenness forming layer 51a and the upper-side unevenness forming layer 52a are disposed in a region overlapping the light transmission window 330 in a plan view. Therefore, the blue (B) transmissive display color filter layer 342 is formed to be thicker than the red (R) or green (G) transmissive display color filter layer 342. is there. For this reason, there is an advantage that unnecessary irregularities are not formed on the surface side of the color filter layer 34.
[0039]
[Method of manufacturing electro-optical device]
With reference to FIGS. 7A and 7B, the process of forming the lower-side unevenness forming layer 51 a and the upper-side unevenness forming layer 52 a on the counter substrate 30 in the manufacturing process of the electro-optical device 1 according to the present embodiment will be mainly described.
[0040]
7A to 7D are process cross-sectional views illustrating a process of forming the lower layer side unevenness forming layer 51a and the upper layer side unevenness forming layer 52a on the counter substrate 30 used in the electro-optical device 1 of the present embodiment.
[0041]
First, as shown in FIG. 7A, a thick photosensitive resin 51 is applied to the surface of a light-transmitting counter substrate 30 made of glass or the like, and then the photosensitive resin 51 is exposed through an exposure mask 510. . Here, either the negative type or the positive type may be used as the photosensitive resin 51, but FIG. 7A illustrates the case of the positive type as the photosensitive resin 51, and it is desired to remove the photosensitive resin 51. The portion is irradiated with ultraviolet rays through the light transmitting portion 511 of the exposure mask 510.
[0042]
Next, the exposed photosensitive resin 51 is developed to form a columnar lower side unevenness forming film 51a as shown in FIG. 7B. At that time, in the pixel 11 in which the blue (B) color filter layer 34 is formed, the lower side unevenness formation layer 51a is formed in a region overlapping the light reflection film 33 in a plane, but the light transmission window 330 and the plane are formed. In the overlapping region, the lower side unevenness forming layer 51a is not formed.
[0043]
Next, as shown in FIG. 7C, after the photosensitive resin 52 is applied on the upper layer side of the lower-side unevenness forming layer 51a, the photosensitive resin 52 is exposed through an exposure mask 520. Here, either the negative type or the positive type may be used as the photosensitive resin 52, but FIG. 7C illustrates the case of the positive type as the photosensitive resin 52, and it is desired to remove the photosensitive resin 52. The part is irradiated with ultraviolet rays through the light transmitting part 521 of the exposure mask 520.
[0044]
Next, the exposed photosensitive resin 52 is developed to form an upper layer side unevenness forming film 52a as shown in FIG. 7D. At this time, in the pixel 11 in which the blue (B) color filter layer 34 is formed, the upper layer side unevenness formation layer 52a is formed in a region overlapping the light reflection film 33 in a plane, but the light transmission window 330 and the plane are formed. In the overlapping region, the upper layer side unevenness forming layer 52a is not formed.
[0045]
After that, as shown in FIG. 3, after performing a film forming process and a patterning process to form a light reflecting film 33 having a light transmission window 330, using a photolithography technique, a flexographic printing, or an inkjet method, A black matrix 38 and red (R), green (G), and blue (B) color filter layers 34 (a color filter layer 341 for reflection display and a color filter layer 342 for transmission display) are formed. Next, after forming the overcoat layer 35 by a spin coating method or the like, a film forming step and a patterning step are performed to form a counter electrode 36, and then an alignment film is formed by using flexographic printing or a spin coating method. 37 is formed.
[0046]
As a result, the counter substrate 30 is completed.
[0047]
[Other embodiments]
In the above embodiment, the TFD element 40 is used as an active element. However, the present invention may be applied to an electro-optical device using a TFT as an active element, and further to a passive matrix electro-optical device.
[0048]
Moreover, in the said form, although the lower side uneven | corrugated formation layer 51a and the upper layer side uneven | corrugated formation layer 52a were formed as an uneven | corrugated formation layer, after apply | coating photosensitive resin, with respect to this photosensitive resin through an exposure mask Half-exposure, development, and heating may be performed to form only one concavo-convex forming layer. In this method, since the photosensitive resin is exposed to a middle position in the thickness direction, a thick portion and a thin portion are formed in the photosensitive resin after development. Therefore, when the heat treatment is performed, a concavo-convex forming layer having a smooth concavo-convex shape on the surface having no angular portions on the surface and having no edges can be formed. Even when the unevenness forming layer is formed by such a method, in the pixel 11 in which the red (R) and green (G) color filter layers 34 are formed, a region overlapping with the light reflecting film 33 and light In the pixel 11 on which the blue (B) color filter layer 34 is formed, the unevenness is not formed in the region overlapping the light reflection film 33 in the pixel 11 where the blue / B color filter layer 34 is formed. The formation layer is left, but the uneven formation layer is not left in the region overlapping the light transmission window 330 in a plan view.
[0049]
[Example of mounting on electronic equipment]
FIG. 8 is a perspective view illustrating a configuration of a mobile phone as an example of an electronic apparatus in which the electro-optical device 1 according to this embodiment is mounted.
[0050]
In FIG. 8, a mobile phone 1400 includes the electro-optical device 1 together with a plurality of operation buttons 1402, an earpiece 1404 and a mouthpiece 1406. The electro-optical device 1 is also provided with a backlight device on the back as necessary.
[0051]
The electronic apparatus on which the electro-optical device 1 of this embodiment can be mounted includes a mobile computer, a liquid crystal television, a viewfinder type, a monitor direct-view type video tape recorder, a car navigation device, an electronic notebook, a calculator in addition to a mobile phone. , Word processors, workstations, videophones, POS terminals, devices with touch panels, and the like.
[Brief description of the drawings]
FIG. 1 is a block diagram showing an electrical configuration of an electro-optical device to which the present invention is applied.
2 is an exploded perspective view showing a configuration of the electro-optical device shown in FIG. 1. FIG.
FIG. 3 is an enlarged cross-sectional view showing a part of the electro-optical device shown in FIG. 1 in an enlarged manner.
4 is a plan view showing a layout for several pixels including a TFD element in the electro-optical device shown in FIG. 1; FIG.
5 is a cross-sectional view taken along line AA ′ of FIG. 4. FIG.
6 is a graph showing spectral characteristics of a color filter layer and a photosensitive resin used in the electro-optical device shown in FIG.
7A to 7D are process cross-sectional views illustrating a process of forming a lower layer side unevenness forming layer and an upper layer side unevenness forming layer on a counter substrate used in the electro-optical device according to the invention.
FIG. 8 is a perspective view illustrating a configuration of a mobile phone as an example of an electronic apparatus equipped with an electro-optical device to which the invention is applied.
FIG. 9 is an enlarged cross-sectional view showing a part of a conventional electro-optical device in an enlarged manner.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Electro-optical device, 9 Backlight device, 10 Drive liquid crystal cell, 11 Pixel, 12 Liquid crystal layer, 20 Element side substrate, 21 Data line, 23 Pixel electrode, 30 Opposite substrate, 31 Scan line, 33 Light reflection film, 34 Color filter layer, 36 counter electrode, 40 TFD element (active element), 51a lower side unevenness forming layer, 52b upper layer side unevenness forming layer, 330 light transmission window, 341 color filter layer for reflection display, 342 color for transmission display Filter layer

Claims (6)

A plurality of pixels are formed on the translucent substrate for holding the electro-optic material ,
An uneven forming film provided on the pixel and having translucency,
A light reflection film that is provided in a part of the pixel and that enables display in a reflection mode disposed on the unevenness formation film ;
A plurality of color filter layers provided on the pixel and disposed on the light reflecting film ;
In a region where the light reflecting film of the pixel is not provided, display in a transmission mode is possible,
Among the plurality of pixels, in a pixel in which a color filter layer of a predetermined color is formed, the unevenness forming layer is formed in a region overlapping the region where the light reflecting film is not provided,
An electro-optical device, wherein a pixel in which a color filter layer of another color is formed does not have the unevenness forming layer formed in a region overlapping with a region where the light reflection film is not provided. In claim 1, color filter layers corresponding to red, green, and blue are formed, and the unevenness forming layer is made of a photosensitive resin,
Among the plurality of pixels, in the pixel in which the red and green color filter layers are formed, the concavo-convex forming layer is formed in a region overlapping with the region where the light reflecting film is not provided, and the blue color filter An electro-optical device, wherein the uneven layer is not formed in a region overlapping with a region where the light reflecting film is not provided in a pixel in which a layer is formed.   3. The pixel according to claim 1, wherein a color filter layer for reflection display is formed in a region overlapping with the light reflecting film in a plane, and overlapping with a region where the light reflecting film is not provided. An electro-optical device, wherein a color filter layer for transmissive display that is more colored than the color filter layer for reflective display is formed in the region.   4. The color filter layer according to claim 1, wherein the color filter layer that overlaps in a plane where the light reflection film is not provided in the pixel in which the color filter layer of the predetermined color is formed is the color filter of the other color. An electro-optical device characterized in that it is thicker than a color filter layer that planarly overlaps a region where the light reflecting film is not provided in a pixel in which the layer is formed.   5. The electro-optical device according to claim 1, wherein the electro-optical material is a liquid crystal held between the substrate and another substrate disposed opposite to the substrate.   An electronic apparatus comprising the electro-optical device defined in any one of claims 1 to 5.

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