JP4645327B2 - Liquid crystal display device and electronic device - Google Patents

Description

The present invention, electrical and regarding the optical device about the transflective liquid crystal display device having especially a reflective display region and the transmissive display region. Also, the present invention relates to an electronic apparatus constructed using the liquid crystal display device.

  Currently, electro-optical devices are widely used in various electronic devices such as mobile phones and portable information terminals. For example, an electro-optical device is used as a display unit for visually displaying various types of information related to electronic devices. In this electro-optical device, a device using liquid crystal as an electro-optical material, that is, a liquid crystal display device is known.

  In the above liquid crystal display device, for example, an effective display area is formed by arranging a plurality of sub-pixel areas, which are the minimum unit of display, in a matrix in the vertical and horizontal directions within the plane of the liquid crystal layer. Then, by controlling the orientation of the liquid crystal molecules in the liquid crystal layer for each sub-pixel region, the light passing through the liquid crystal layer is modulated for each sub-pixel region for display.

  As the above liquid crystal display device, a so-called transflective liquid crystal display device is known. In this transflective liquid crystal display device, two sub-pixel areas are provided in each of a reflective display area and a transmissive display area, and external light such as sunlight and room light is reflected by the reflective display area. In addition, a reflective display that performs display using the reflected light and a transmissive display that performs display using the light from the lighting device through the transmissive display region and the backlight are selectively used. It can be carried out.

  A liquid crystal display device generally has a pair of substrates, each of which is provided with an electrode, and an alignment film is further provided on the electrode. This alignment film can be applied, for example, by printing polyimide or the like. In addition, various elements such as an insulating film are stacked on the surface of the substrate on which the alignment film is formed, and a step may be formed by the insulating film or the like. As such a structure, for example, a structure in which a step is formed on a substrate in order to make the thickness of a liquid crystal layer different between a reflective display region and a transmissive display region, a so-called multigap structure is known (for example, Patent Document 1).

JP 2004-354507 A (pages 6-7, FIG. 3)

  However, in the electro-optical device disclosed in Patent Document 1, the higher region in which the step is formed, that is, the material of the alignment film applied to the reflective display region is the lower region in which the step is formed, that is, the transmissive display. There is a concern that the alignment film may flow into the area more than necessary and a thick alignment film may be formed in the vicinity of the step in the transmissive display area. In this case, the thickness of the alignment film becomes non-uniform, and an alignment defect may occur at a portion where the alignment film is formed thick, which may cause unevenness in display luminance.

  The present invention has been made in view of the above problems, and in an electro-optical device having a step in the plane on which an alignment film is formed, a higher region and a lower one that form the step. An object of the present invention is to uniformly apply an alignment film between the two regions to prevent unevenness in display luminance.

  The electro-optical device according to the present invention includes a substrate, an insulating film provided on the substrate and forming a step, an alignment film disposed on the insulating film, and an electro-optic disposed on the alignment film. The surface of the insulating film on the alignment film side is higher than the surface of the substrate, and the surface of the protrusion on the alignment film side is the surface of the insulating film. It is characterized by being higher than the surface on the alignment film side.

  As an aspect in which the protrusion is provided along the step formed by the insulating film as described above, for example, as shown in FIG. 15A, the step S is formed by providing the insulating film 202A on the substrate 201, and then the step. A configuration in which the protrusion 203A is provided on the insulating film 202A along S is conceivable. In addition, as shown in FIG. 15B, an insulating film 202B is provided on the substrate 201 to form a step S, and a protrusion 203B is provided along the step S so as to contact the side surface of the insulating film 202B. Conceivable.

  Further, as shown in FIG. 15C, an insulating film 202C is provided on the substrate 201 to form a step S, and along the step S, a side surface of the insulating film 202C and an upper surface of the insulating film 202C adjacent thereto are provided. A configuration in which the protrusion 203C is provided so as to cover the portion is conceivable. Further, as shown in FIG. 15D, an insulating film 202D is provided on the substrate 201 to form a step S, and a portion indicated by 202D ′ in the insulating film 202D is removed, thereby along the step S. A configuration in which the protrusion 203D is formed integrally with the insulating film 202D is conceivable. In any of these embodiments, the surface of the insulating film on the alignment film side is provided higher than the surface of the substrate, and the surface of the protrusion on the alignment film side is provided higher than the surface of the insulating film on the alignment film side.

  Further, the alignment film is formed into a film shape by applying a solution of a material such as polyimide onto a substrate by, for example, printing, and baking the applied material after the application. In addition, the insulating film may be formed directly on the substrate, or may be formed on various elements formed on the substrate. As the insulating film for forming the step, for example, an insulating film for dividing elements and electrodes formed on the substrate into different layers, an insulating film for flattening the surface of the substrate, and the like are conceivable.

  In the conventional electro-optical device, when the alignment film material is applied, the material may flow and flow more than necessary from the higher region to the lower region of the insulating film forming the step. In this case, the film thickness of the alignment film becomes non-uniform between the higher region and the lower region where the step is formed, and the display luminance may vary.

  According to the above electro-optical device according to the present invention, the protrusions higher than the surface of the insulating film on the alignment film side are formed along the step formed by the insulating film, so the alignment film is formed on the insulating film. In this case, the protrusion can stop the material of the alignment film applied to the higher region forming the step from flowing downward. As a result, the alignment film material can be prevented from flowing more than necessary into the lower region where the step is formed. Therefore, since the alignment film can be uniformly formed between the higher region and the lower region where the step is formed, it is possible to prevent unevenness in display luminance.

  Next, the electro-optical device according to the present invention includes a sealing material provided in a frame shape surrounding the electro-optical material layer on the substrate, and an effective display area that is surrounded by the sealing material and performs display. The insulating film may form the step in the effective display area. In this case, it is preferable that the protrusion is provided along the step formed in the effective display area. When a step is formed in the effective display region, the alignment film applied to the higher region forming the step is likely to flow into the lower region. Therefore, the thickness of the alignment film is likely to be uneven. Also in such an electro-optical device, the alignment film in the effective display region is uniformly formed by forming protrusions higher than the surface of the insulating film on the alignment film side along the step formed by the insulating film. be able to. As a result, it is possible to prevent unevenness in display luminance.

  Next, in the electro-optical device according to the aspect of the invention, it may further include a peripheral region between the sealing material and the effective display region, and the insulating film may be disposed between the effective display region and the peripheral region. A step can be formed. In this case, the protrusion is preferably provided along the step formed between the effective display area and the peripheral area.

  Such a step is formed, for example, when a thick black mask is formed in the peripheral region, or when a thin reflective region is adjacent to the peripheral region. When such a step is formed between the peripheral region and the effective display region, the alignment film applied to the higher region that forms the step of the peripheral region or the effective display region is low to form the step. It becomes easy to flow into the area. Therefore, the thickness of the alignment film is likely to be uneven. Also in such an electro-optical device, a step formed by the insulating film, that is, a protrusion higher than the surface on the alignment film side of the insulating film forming the step is formed along the boundary between the peripheral region and the effective display region. By doing so, the alignment film can be formed uniformly between both the peripheral region and the effective display region.

  Next, the electro-optical device according to the aspect of the invention may include a counter substrate provided to face the substrate with the electro-optical material layer interposed therebetween. In that case, a light reflecting film that reflects light is provided on the substrate or the counter substrate, the insulating film is provided on the substrate or the counter substrate, and the effective display area is the light reflecting film. A reflective display region that performs display using light reflected by the light source, and a transmissive display region that performs display using light that is transmitted through a region where the light reflective film is not formed, and the insulating film includes the reflective film By providing the electro-optic material layer in the display area at least in the reflective display area so as to be thinner than the electro-optic material in the transmissive display area, the reflective display area and the transmissive display area Preferably, the step is formed between the protrusions, and the protrusion is provided along the step formed between the reflective display region and the transmissive display region.

  This electro-optical device is a so-called transflective type, and is an electro-optical device having a so-called multi-gap structure. In this electro-optical device, since the thickness of the insulating film in the transmissive display region is thinner than the thickness of the insulating film in the reflective display region, a step is formed between the reflective display region and the transmissive display region. . In the electro-optical device having such a structure, the reflective display region is a higher region that forms a step, and the transmissive display region is a lower region that forms a step. In the electro-optical device having a structure in which a step is formed between the reflective display region and the transmissive display region as described above, the alignment film applied to the reflective display region can easily flow into the transmissive display region. Accordingly, the thickness of the alignment film is likely to be uneven. Also for such an electro-optical device, the step formed by the insulating film, that is, by forming a protrusion higher than the surface on the alignment film side of the insulating film along the boundary between the reflective display area and the transmissive display area, An alignment film can be uniformly formed between both the display area and the transmissive display area.

  Next, in the electro-optical device according to the present invention, a spacer member that maintains a constant thickness of the electro-optical material layer in a region between the substrate and the counter substrate where the protrusion is not provided. It is desirable to be provided. By doing so, the spacer member can be stably formed on the substrate, so that the electro-optic material layer provided between the substrate and the counter substrate can be reliably held at a constant layer thickness. The spacer member is preferably a photo spacer formed by photolithography. In this case, the insulating film can be formed simultaneously with the formation of the insulating film or the protrusion on the insulating film.

  Next, in the electro-optical device according to the invention, it is preferable that the height of the protrusion is lower than the thickness of the electro-optical material layer. By doing so, it is possible to reliably prevent the protrusion and the counter substrate from coming into contact with each other, and therefore it is possible to prevent the protrusion from being damaged and the thickness of the electro-optical material layer from changing.

  Next, a method for manufacturing an electro-optical device according to the present invention includes a step of providing an insulating film on a substrate, a step of providing a protrusion on the substrate, a step of providing an alignment film on the insulating film, and the alignment film A step of providing an electro-optical material layer, and in the step of providing an alignment film, the alignment film is provided on the insulating film by applying a material of the alignment film by printing, and the protrusion is provided. In the step, the protrusion is provided so as to suppress the flow of the alignment film.

  As described above, when the alignment film material, for example, a solution of a material such as polyimide is applied on the insulating film by printing in the alignment film forming step, the lower one from the higher region where the step is formed. The material of the alignment film easily flows into the region, and the thickness of the alignment film tends to be nonuniform. However, according to the method of manufacturing the electro-optical device, since the protrusion is formed so as to suppress the flow of the alignment film in the protrusion forming step, a step is formed when the alignment film is formed on the insulating film. The protrusion can stop the material of the alignment film applied to the higher region to be formed from flowing downward. As a result, the alignment film material can be prevented from flowing more than necessary into the lower region where the step is formed. Therefore, since the alignment film can be uniformly formed between the higher region and the lower region where the step is formed, it is possible to prevent unevenness in display luminance.

  Next, an electronic apparatus according to the present invention includes the electro-optical device having the above-described configuration. In the electro-optical device according to the present invention, the projections higher than the surface on the alignment film side of the insulating film are formed along the step formed by the insulating film, so that the higher region and the lower region where the step is formed are formed. Since an alignment film can be formed uniformly between both regions, it is possible to prevent unevenness in display luminance. Therefore, even in an electronic apparatus using the electro-optical device according to the present invention, it is possible to prevent the display luminance from being uneven.

(First embodiment of electro-optical device)
Hereinafter, an electro-optical device according to the present invention and a method for manufacturing the electro-optical device will be described with reference to an embodiment thereof. Of course, the present invention is not limited to this embodiment. In the drawings used in the following description, it should be noted that the components may be illustrated with a dimensional ratio different from the actual dimensional ratio in order to show the characteristic portions in an easy-to-understand manner.

  FIG. 1 shows a cross-sectional structure along a column direction Y as viewed from a row direction X of a liquid crystal display device 1 that is an embodiment of an electro-optical device according to the invention. FIG. 2 is an enlarged view of the main part of FIG. FIG. 3 shows a cross-sectional structure along the row direction X as viewed from the column direction Y of the liquid crystal display device 1 according to the line CC in FIG. FIG. 4 is a plan view of the liquid crystal display device shown in FIG. In FIG. 4, elements and wirings are mainly shown to make the main structure easy to see, and other elements are omitted as necessary. FIG. 5 shows a case where the portion indicated by the arrow E in FIG.

  The present embodiment is an active matrix system that uses a TFT (Thin Film Diode) element, which is a three-terminal active element, as a switching element, is a transflective type, and is capable of color display. It is. There are various kinds of TFT elements such as an amorphous silicon TFT, a low-temperature polysilicon TFT, a high-temperature polysilicon TFT, etc. In this embodiment, an amorphous silicon TFT is used. Of course, the present invention can also be applied to a liquid crystal display device using other types of TFT elements.

  In FIG. 1, a liquid crystal display device 1 according to this embodiment includes a liquid crystal panel 2 as an electro-optical panel, a driving IC 3 as a semiconductor element mounted on the liquid crystal panel 2, and an illumination attached to the liquid crystal panel 2. Device 4. Regarding the liquid crystal display device 1, the side on which the arrow A is drawn is the observation side, and the illumination device 4 is disposed on the opposite side to the observation side with respect to the liquid crystal panel 2 and functions as a backlight.

  The illuminating device 4 includes a light source, specifically an LED (Light Emitting Diode) 6 as a point light source, and a light guide 7 that converts the point light emitted from the LED 6 into a planar shape and emits the light. . The light guide 7 is formed of, for example, a light transmissive resin. Each LED 6 is provided such that the light emitting surface thereof faces the light incident surface 7 a that is one side surface of the light guide 7. Light emitted from each LED 6 is introduced from the light incident surface 7 a into the light guide 7, emitted from the light exit surface 7 b of the light guide 7 as planar light, and supplied to the liquid crystal panel 2. A light diffusing film 8 is provided on the light exit surface 7b of the light guide 7 as necessary. A light reflecting film 9 is provided on the surface of the light guide 7 opposite to the light emitting surface 7b as required. The light source can also be constituted by a point light source other than the LED 6 or a linear light source such as a cold cathode tube.

  The liquid crystal panel 2 includes a pair of substrates 11 and 12 that are bonded to each other by a sealing material 13 that is formed in a frame shape when viewed from the direction of arrow A. These substrates 11 and 12 are both formed in a rectangular or square shape when viewed from the direction of arrow A. The substrate 11 is an element substrate on which switching elements are formed. The substrate 12 is a color filter substrate on which a color filter is formed.

  As shown in FIG. 4, the sealing material 13 has a liquid crystal injection port 13a in a part thereof, and as an electro-optical material between the element substrate 11 and the color filter substrate 12 of FIG. 1 through the liquid crystal injection port 13a. A liquid crystal such as TN liquid crystal is injected. Thus, the liquid crystal layer 14 as an electro-optical material layer is formed. The liquid crystal injection port 13a in FIG. 4 is sealed with resin after the liquid crystal injection is completed. In addition to the TN liquid crystal, various liquid crystals can be used as the liquid crystal mode as required. For example, a liquid crystal having negative dielectric anisotropy, that is, a liquid crystal in a vertical alignment mode may be used. Further, the liquid crystal injection method is not limited to the injection through the injection port 13a as described above, and a method of supplying liquid crystal droplets into a region surrounded by an annular sealing material having no injection port is also conceivable. .

  In FIG. 1, the element substrate 11 includes a first light-transmitting substrate 11a as a substrate or a counter substrate. The first translucent substrate 11a is formed in a rectangle or a square when viewed from the arrow A side that is the observation side, for example, with translucent glass, translucent plastic, or the like. Further, a polarizing plate 15a is attached to the outer surface of the first translucent substrate 11a by, for example, sticking. If necessary, an optical element other than the polarizing plate 15a, for example, a retardation plate can be additionally provided.

  A plurality of TFT elements 31 as active elements or switching elements are formed on the inner surface of the first translucent substrate 11a. An interlayer insulating film 25 as an insulating film is formed so as to cover these TFT elements 31. The interlayer insulating film 25 is formed, for example, by patterning a resin having translucency, photosensitivity, and insulation, such as an acrylic resin, by photolithography.

  A plurality of pixel electrodes 21 a are provided on the surface of the interlayer insulating film 25. These pixel electrodes 21a are formed by a photoetching process using a metal oxide such as ITO (Indium Tin Oxide) as a material. The plurality of pixel electrodes 21a are individually formed in a dot shape when viewed from the side where the arrow A is drawn, and they are arranged in a matrix in the vertical and horizontal directions, that is, the matrix direction, that is, the XY direction.

  As shown in FIG. 2, a light reflecting film 26 is formed between the pixel electrode 21a and the interlayer insulating film 25 by, for example, Al (aluminum), an Al alloy, or the like. In the present embodiment, the light reflecting film 26 is provided in a dot matrix form at a position corresponding to each of the plurality of pixel electrodes 21a. The individual light reflecting films 26 are provided on a part of the individual pixel electrodes 21a. That is, between each pixel electrode 21 a and the interlayer insulating film 25, a region R with the light reflecting film 26 and a region T without the light reflecting film 26 are formed. The region R where the light reflection film 26 is provided is a region where the reflective display is performed using the external light L0, that is, the reflective display region R. On the other hand, the region T without the light reflection film 26 is a region where transmissive display is performed using the light L1 from the illumination device 4, that is, the transmissive display region T.

  The interlayer insulating film 25 has an uneven pattern for light scattering on the surface of the portion corresponding to the reflective display region R. Therefore, an uneven pattern is also formed on the light reflecting film 26 and the pixel electrode 21a on the uneven pattern. For this reason, the light reflected by the light reflecting film 26 becomes scattered light. Thereby, it is possible to prevent specular reflection from occurring in the light reflecting film 26.

  Further, by providing the interlayer insulating film 25 under the pixel electrode 21a, the layer of the pixel electrode 21a and the layer of the TFT element 31 are separated into different layers. This structure can use the surface of the element substrate 11 more effectively than the structure in which the pixel electrode 21a and the TFT element 31 are formed in the same layer. For example, since the area of the pixel electrode 21a, that is, the pixel area can be increased, the liquid crystal display device 1 can easily display the display.

  The interlayer insulating film 25 is formed so as to cover the TFT element 31. The pixel electrode 21 a is formed on the interlayer insulating film 25. In the interlayer insulating film 25, a contact hole 24 for electrically connecting the pixel electrode 21a and the TFT element 31 is formed. The contact hole 24 is formed simultaneously with the formation of the interlayer insulating film 25 by photolithography. The contact hole 24 is formed in a position that does not overlap the TFT element 31 in a plan view as viewed from the arrow A side, that is, a position that overlaps the pixel electrode 21a.

  The TFT element 31 used in this embodiment is an amorphous silicon TFT. The TFT element 31 includes a gate electrode 33, a gate insulating film 34, a semiconductor layer 35 formed of a-Si (amorphous silicon), a source electrode 36, A drain electrode 32 is provided. The drain electrode 32 has one end connected to the semiconductor layer 35 and the other end connected to the pixel electrode 21 a through the contact hole 24. The source electrode 36 is formed as a part of the source electrode line 36 'extending in the direction perpendicular to the paper surface of FIG. Further, the gate electrode 33 extends from the gate electrode line 33 ′ extending in the direction perpendicular to the source electrode line 36 ′, that is, in the left-right direction in FIG. 2.

  In FIG. 3, which is a cross-sectional view of the cross section shown in FIG. 1 as viewed from a right angle direction, a region between the plurality of pixel electrodes 21 a, that is, a light shielding region or a black mask region. A plurality of photo spacers 22 are formed at appropriate intervals. These photo spacers 22 are formed, for example, by patterning a photosensitive resin by photolithography. The photo spacer 22 is formed in, for example, a standing cylindrical or prismatic shape, and functions so that the cell gap G maintains a uniform dimension. In addition to the photo spacer, for example, a spherical spacer can be used as the spacer member. In this case, a plurality of spherical spacers can be dispersed in the liquid crystal layer 14 to function as spacer members.

  An alignment film 23 a is formed on the pixel electrode 21 a and the photo spacer 22. The alignment film 23a is subjected to an alignment process, for example, a rubbing process, whereby the initial alignment of liquid crystal molecules in the vicinity of the alignment film 23a is determined. The alignment film 23a is formed, for example, by applying and baking a polyimide solution, or by offset printing.

  In FIG. 1, a color filter substrate 12 facing the element substrate 11 has a second light-transmitting substrate 12a as a substrate or a counter substrate. The second translucent substrate 12a is formed in a rectangle or a square when viewed from the observation side indicated by the arrow A, for example, with translucent glass, translucent plastic, or the like. Further, a polarizing plate 15b is attached to the outer surface of the second translucent substrate 12a by, for example, sticking. If necessary, an optical element other than the polarizing plate 15b, for example, a retardation plate can be additionally provided.

  A plurality of coloring elements 42 are provided on the inner surface of the second translucent substrate 12a. These coloring elements 42 are colored in one of B (blue), G (green), R (red), C (cyan), M (magenta), and Y (yellow), and are predetermined when viewed from the direction of arrow A. Arranged in an array. In this embodiment, as shown in FIG. 5, it is assumed that a stripe arrangement in which B, G, and R are arranged in one vertical column is employed. Other arrangements such as a mosaic arrangement and a delta arrangement can also be employed. As shown in FIG. 3, light shielding members 41 a are provided in stripes between the coloring elements 42 arranged in the row direction X as viewed from the direction of the arrow A. These light shielding members 41a can be formed by overlapping all the colored elements 42 having different colors, for example, the three colored elements 42 of B, G, and R, or by overlapping two of them. The light shielding member 41a can also be formed of a light shielding metal material such as Cr.

  A first overcoat film 43 a is provided on the light shielding member 41 a and the coloring element 42. A second overcoat film 43b as an insulating film is provided thereon. As shown in FIG. 1, the second overcoat film 43 b is formed only at a position corresponding to the reflective display region R in the pixel electrode 21 a formed on the opposing element substrate 11. The first overcoat film 43a and the second overcoat film 43b are formed by, for example, applying and baking an epoxy or acrylic resin material, or, if necessary, an epoxy or acrylic resin material. It is formed by subjecting to photolithography.

  The second overcoat film 43 b functions as a layer thickness adjusting film for adjusting the layer thickness of the liquid crystal layer 14 between the reflective display region R and the transmissive display region T. Specifically, in FIG. 2, a second overcoat film 43b having a predetermined layer thickness is provided in the reflective display region R where the light reflecting film 26 is provided. Thereby, the layer thickness t0 of the liquid crystal layer 14 corresponding to the reflective display region R is set thin. On the other hand, the second overcoat film 43b is not provided in the transmissive display region T where the light reflecting film 26 is not provided. That is, only the first overcoat film 43a is provided in the transmissive display region T. Accordingly, the layer thickness t1 of the liquid crystal layer 14 corresponding to the transmissive display region T is set to be thicker than t0, that is, t1> t0.

  When the reflection type display is performed, the reflected light L0 passes through the liquid crystal layer 14 twice. On the other hand, when transmissive display is performed, the transmitted light L1 passes through the liquid crystal layer 14 only once. Therefore, when the liquid crystal layer 14 is set to t1 = t0, there is a possibility that the display density is nonuniform between the reflective display and the transmissive display. On the other hand, if t1> t0 is set as in the present embodiment, the length of the optical path passing through the liquid crystal layer 14 between the reflected light L0 and the transmitted light L1 can be made equal or close, and therefore Display with uniform darkness can be performed between the reflective display and the transmissive display.

  In the embodiment shown in FIG. 2, the second overcoat film 43b is not provided in the transmissive display region T, that is, the layer thickness of the second overcoat film 43b is zero, but the layer thickness of the liquid crystal layer 14 is t1>. If it can be set to t0, the layer thickness of the second overcoat film 43b in the transmissive display region T is not necessarily limited to zero. In this embodiment, the two overcoat films, the first overcoat film 43a and the second overcoat film 43b, are provided. However, if the layer thickness of the liquid crystal layer 14 can be set to t1> t0, the overcoat film is formed. Can also be a single layer. In short, by making the layer thickness of the overcoat film thinner in the transmissive display region T than in the reflective display region R, the layer thickness of the liquid crystal layer 14 corresponding to the reflective display region R becomes thinner than in the transmissive display region T. This is what you should do.

  As described above, in the liquid crystal display device 1 of the present embodiment, the second overcoat film 43b is formed only in the reflective display region R, and therefore, between the first overcoat film 43a and the second overcoat film 43b. A step S is formed. A protrusion 49 is formed at the step S. The protrusion 49 will be described in detail later.

  A common electrode 21b is provided on the first overcoat film 43a and the second overcoat film 43b, and an alignment film 23b is further provided thereon. The common electrode 21b is formed by, for example, photoetching using ITO as a material. The common electrode 21b is a planar electrode formed with a uniform thickness on the second translucent substrate 12a. The alignment film 23b is subjected to an alignment process, such as a rubbing process, whereby the initial alignment of liquid crystal molecules in the vicinity of the alignment film 23b is determined. The alignment film 23b is formed, for example, by applying and baking a polyimide solution, or by offset printing.

  In FIG. 1, the plurality of pixel electrodes 21a formed on the element substrate 11 are arranged in a dot matrix as viewed from the direction of the arrow A. These pixel electrodes 21a overlap with the common electrode 21b when viewed from the direction of the arrow A. Thus, the region where the pixel electrode 21a and the common electrode 21b overlap constitutes a sub-pixel region D which is the minimum region for display. Each coloring element 42 on the color filter substrate 12 is provided corresponding to the sub-pixel region D. In the case of monochrome display that does not use the coloring elements 42, one pixel is formed by one sub-pixel region D. However, in the case of a structure that performs color display using the three colored elements 42 as in the present embodiment. , One pixel is formed by a collection of three colored elements 42 of B, G, R or C, M, Y. As shown in FIG. 5, on the surface of the color filter substrate 12, one side in the longitudinal direction of the sub-pixel region D (that is, the vertical direction in FIG. 5) is defined by the light reflecting film 26 (see FIG. 2) on the counter substrate side. The remaining one side is a transmissive display region T in which the light reflection film 26 is not formed.

  In FIG. 1, the element substrate 11 projects to the outside of the color filter substrate 12 to form a projecting portion 16. The driving IC 3 is mounted on the surface of the overhang portion 16. In the present embodiment, as shown in FIG. 4, one driving IC 3 a and two driving ICs 3 b are mounted as the driving IC 3. This mounting can be performed using, for example, a COG technique using an ACF (Anisotropic Conductive Film) 46.

  A plurality of wirings 47 and 48 and a plurality of external connection terminals 44 are formed on the surface of the overhang portion 16 by a photoetching process. The plurality of wirings 47 are formed to extend in the Y direction toward the region surrounded by the sealing material 13. These wirings 47 are directly connected to the gate electrode line 33 ′ (see FIG. 2) on the element substrate 11 and function as scanning lines. The plurality of wirings 48 are formed so as to extend in the Y direction along the side edge 11b of the element substrate 11 in a region surrounded by the sealing material 13, and are further bent to extend in the X direction. Yes. These wirings 48 are directly connected to the source electrode line 36 ′ (see FIG. 2) on the element substrate 11 and function as data lines.

  On the element substrate 11, the sub-pixel region D is formed at the intersection of the scanning line 47 and the data line 48. When each sub-pixel region D is represented by an electrical equivalent circuit, the TFT element 31 and the pixel electrode 21a are connected in series as shown by an enlarged arrow F in FIG. A scanning line 47 and a data line 48 are connected to the TFT element 31. Each scanning line 47 is connected to a scanning line driving circuit constituted by the driving IC 3a. On the other hand, each data line 48 is connected to a data line driving circuit constituted by the driving IC 3b. Note that the scanning line driving circuit and the data line driving circuit may be configured as a common driving IC.

  For example, an FPC (Flexible Printed Circuit) substrate 17 that is a flexible wiring substrate is connected to the side edge of the overhang portion 16 using, for example, an ACF 46. A plurality of electronic components (not shown) necessary for driving the liquid crystal panel 2 are mounted on the FPC board 17. As this electronic component, for example, a resistor, a coil, a capacitor, a power supply IC, and the like can be considered. On the FPC board 17, an external input device (for example, a control circuit for an electronic device such as a mobile phone), an external power source, or the like is connected. Then, a signal and power for driving the liquid crystal panel 2 are supplied from an input device and an external power source through the FPC board 17.

  A plurality of sub-pixel regions D are arranged in a matrix. Thus, the effective display area Vi is formed by arranging the plurality of sub-pixel areas D, and an image is displayed in the effective display area Vi. The area around the effective display area Vi and the area inside the sealing material 13 is the peripheral area Vc. The peripheral area Vc is an area where the wiring 48 is disposed and an image is not displayed. The peripheral area Vc is formed all around the effective display area Vi, that is, above and below and right and left of the effective display area Vi shown in FIG.

  In FIG. 1, which is a cross section according to the line BB of FIG. 4, a light shielding member 41b is provided over the entire peripheral region Vc on the second light transmitting substrate 12a. The peripheral region Vc shown here is the upper and lower peripheral regions Vc in FIG. The light shielding member 41b is colored with different colored elements 42, for example, three colors B, G, and R, similarly to the light shielding member 41a provided in a stripe shape extending in the column direction Y between the colored elements 42 in FIG. It can be formed by overlapping all the elements 42 or by overlapping two of them. Further, it may be formed of a light shielding metal material such as Cr.

  In FIG. 1, a second overcoat film 43b is provided on the first overcoat film 43a formed in the peripheral area Vc, as in the reflective display area R in the effective display area Vi. That is, the layer thickness of the laminated structure formed on the inner surface of the color filter substrate 12 is the same in the peripheral region Vc and the reflective display region R. Note that the second overcoat film 43b formed in the reflective display region R and the second overcoat film 43b formed in the peripheral region Vc can be simultaneously formed using the same material.

  According to the liquid crystal display device 1 configured as described above, in FIG. 1, when the liquid crystal display device 1 is placed in a bright outdoor room or a bright indoor room, a reflective display using external light such as sunlight or indoor light is used. Is done. On the other hand, when the liquid crystal display device 1 is placed outside a dark room or in a dark room, transmissive display is performed using the illumination device 4 as a backlight.

  In the case of performing the reflection type display, the external light L0 incident on the liquid crystal panel 2 through the color filter substrate 12 from the direction of arrow A on the observation side passes through the liquid crystal layer 14 and enters the element substrate 11 in FIG. After that, the light is reflected by the light reflection film 26 in the reflective display region R and supplied to the liquid crystal layer 14 again. On the other hand, when performing the transmissive display described above, the LED 6 of the illumination device 4 is turned on, and light from the LED 6 is introduced from the light incident surface 7a of the light guide 7 to the light guide 7, and further from the light exit surface 7b to the surface. Is emitted as a light beam. The emitted light passes through the color filter substrate 12 in the transmissive display region T as indicated by reference numeral L1 and is supplied to the liquid crystal layer.

  While light is supplied to the liquid crystal layer 14 as described above, a predetermined signal specified by the scanning signal and the data signal is provided between the pixel electrode 21a on the element substrate 11 side and the common electrode 21b on the color filter substrate 12 side. As a result, the orientation of the liquid crystal molecules in the liquid crystal layer 14 is controlled for each sub-pixel region D, and as a result, the light supplied to the liquid crystal layer 14 is modulated for each sub-pixel region D. When this modulated light passes through the polarizing plate 15b on the color filter substrate 12 side, the passage is allowed or prevented from passing for each sub-pixel region D according to the polarization characteristics of the polarizing plate 15b. Images such as letters, numbers, figures and the like are displayed on the surface of 12, and are visually recognized from the direction of arrow A.

  Hereinafter, the protrusion 49 will be described in detail. First, in FIG. 2, the protrusion 49 is provided on the corner of the second overcoat film 43 b on the color filter substrate 12 and adjacent to the transmissive display region T. The protrusions 49 extend along the step S formed between the reflective display region R and the transmissive display region T in the direction perpendicular to the plane of FIG. 2, that is, in the horizontal direction of the plane of FIG. It is formed as a wall that is a member that partitions the transmissive display region T.

  Further, as shown in FIG. 2, the surface of the protrusion 49 on the alignment film 23b side is higher than the surface of the second overcoat film 43b on the alignment film 23b side, and preferably the alignment film provided on the second overcoat film 43b. It is formed higher than the film thickness of 23b. The protrusion 49 is preferably formed to be lower than the thickness of the liquid crystal layer 14 so that the protrusion 49 and the element substrate 11 facing the protrusion 49 do not come into contact with each other. Such protrusions 49 can be formed by patterning a photosensitive resin having an insulating property like the first overcoat film 43a and the second overcoat film 43b by photolithography.

  The width W1 of the protrusion 49 is such that when the material of the alignment film 23b is applied onto the common electrode 21b, the transmissive display region T, which is the lower region from the reflective display region R, which is the higher region where the step S is formed. It can be determined by the amount of the alignment film 23b flowing in. Specifically, if the alignment film 23b in the region defined by the width W0 on the reflective display region R flows into the transmissive display region T, the width W1 of the protrusion 49 is W1 <W0. It is desirable. This is due to the following reason. That is, if W1 ≧ W0, the alignment film 23b is applied on the protrusion 49 in the same amount or larger than that flowing into the transmissive display area T when the protrusion 49 is not provided. . In this case, from the surface of the protrusion 49, the same or larger amount of the material of the alignment film 23b as that in the case where the protrusion 49 is not provided flows into the transmissive display region T. This is because the result is contrary to the object of the present invention, in which the alignment film is uniformly formed by preventing the lower region where S is formed from flowing more than necessary.

  Since the protrusion 49 protrudes from the second overcoat film 43b, strictly speaking, the layer thickness of the liquid crystal layer 14 may change at the protrusion 49 portion. However, the height T1 and width W1 of the protrusion 49 are very small compared to the height and width of other elements. Accordingly, in the portion where the protrusion 49 is provided, the influence on the display due to the change in the thickness of the liquid crystal layer 14 or the disorder of the alignment of the liquid crystal can be ignored.

  As described above, the photo spacer 22 shown in FIG. 3 is provided on the interlayer insulating film 25 in the region between the plurality of pixel electrodes 21a on the element substrate 11, that is, the light shielding region or the black mask region. It is. However, since the projections 49 are formed on the color filter substrate 12 facing each other in the reflective display region R, the photo spacer 22 is formed in a region in the reflective display region R where the projections 49 are not formed. Specifically, the photo spacer 22 is provided on the light shielding member 41a at a position that does not overlap the protrusion 49 as shown by a broken line in FIG. 5 when viewed in plan from the arrow I side in FIG. . In this way, the photo spacer 22 can reliably hold the cell gap G without contacting the protrusion 49. Note that the photo spacer 22 may be provided in the reflective display region R as long as it is a region where the protrusion 49 is not provided. The photo spacer 22 can also be provided in the peripheral region Vc.

  By the way, when considering the conventional liquid crystal display device having no protrusion 49 shown in FIG. 2, when forming an alignment film on the color filter substrate, it is applied in the reflective display region, which is the higher region where the step is formed. In some cases, the material of the aligned alignment film flows into the transmissive display region, which is the lower region forming the step. As a result, the alignment film may be formed thick in the vicinity of the step in the transmissive display region. In this case, the thickness of the alignment film becomes non-uniform in the effective display area, and an alignment defect may occur in a portion where the alignment film is formed thick, resulting in uneven display luminance.

  On the other hand, according to the liquid crystal display device 1 of the present embodiment in which the protrusions 49 are formed along the steps, the alignment film 23b of FIG. 2 was applied to the reflective display region R when applied to the color filter substrate 12. The flow of the material of the alignment film 23 b can be stopped by the protrusion 49. As a result, the material of the alignment film 23b can be prevented from flowing into the transmissive display region T more than necessary. Therefore, the alignment film 23b can be uniformly formed between the reflective display region R, which is the higher region where the step is formed, and the transmissive display region T, which is the lower region. Unevenness can be prevented from occurring.

(Second embodiment of electro-optical device)
Next, a liquid crystal display device which is another embodiment of the electro-optical device according to the invention will be described with reference to FIGS. 6, 7, 8 and 9. FIG. 6 shows a cross-sectional structure along the column direction Y of a liquid crystal display device 51 which is another embodiment of the electro-optical device according to the invention. FIG. 7 shows a cross section along the row direction X of the liquid crystal display device 51 according to the line CC in FIG. FIG. 8 shows an enlarged main part of FIG. FIG. 9 shows a case where the portion indicated by the arrow H in FIG. 7 is viewed in plan view from the side on which the arrow A is drawn.

  The difference between the liquid crystal panel 2 shown in FIG. 1 in the previous embodiment and the liquid crystal panel 52 shown in FIG. 6 in the present embodiment is as follows. That is, in the liquid crystal panel 2 of FIG. 1, the second overcoat film 43b is formed on the first overcoat film 43a of the color filter substrate 12, and the layer thickness of the liquid crystal layer 14 is varied by the second overcoat film 43b. I did it. In addition, a protrusion 49 was formed on the second overcoat film on the color filter substrate 12 at the step portion formed by the reflective display region R and the transmissive display region T. On the other hand, in the liquid crystal panel 52 of FIG. 6, the second interlayer insulating film 75b is formed on the first interlayer insulating film 75a of the element substrate 61, and the layer thickness of the liquid crystal layer 14 is increased by the second interlayer insulating film 75b. It is different. That is, in the present embodiment, the adjustment of the liquid crystal layer thickness is not performed on the color filter substrate 62 side, but the adjustment is performed on the element substrate 61 side. Further, a protrusion 99 was formed on the second interlayer insulating film 75 b on the element substrate 61 at the step portion formed by the reflective display region R and the transmissive display region T.

  Hereinafter, the present embodiment will be described focusing on differences from the first embodiment. In this embodiment, the same components as those of the previous embodiment are denoted by the same reference numerals, and the description thereof will be omitted.

  In FIG. 7 showing a cross section along the row direction X, the coloring elements 42 and the light shielding members 41a and 41b are formed on the inner surface of the second light-transmissive substrate 62a constituting the color filter substrate 62, and the first portion is formed thereon. One overcoat film 43a is formed, the common electrode 21b is formed thereon, and the alignment film 23b is formed thereon. These components are the same as those in the embodiment of FIG. 1 except that only the first overcoat film 43a is formed without forming the second overcoat film 43b of FIG. It is.

  A plurality of TFT elements 31 are formed on the inner surface of the first translucent substrate 61 a constituting the element substrate 61. A first interlayer insulating film 75 a is formed so as to cover these TFT elements 31. On top of that, a second interlayer insulating film 75b as an insulating film is formed in a predetermined pattern, that is, at a position corresponding to the reflective display region R as shown in FIG. As shown in FIG. 8, the light reflecting film 26 is formed on the second interlayer insulating film 75b, and the pixel electrode 21a is formed on the light reflecting film 26 and the first interlayer insulating film 75a. An uneven pattern for light scattering is formed on the surface of the second interlayer insulating film 75b. Therefore, an uneven pattern is also formed on the light reflecting film 26 and the pixel electrode 21a on the uneven pattern. For this reason, the light reflected by the light reflecting film 26 becomes scattered light.

  The second interlayer insulating film 75 b functions as a layer thickness adjusting film for adjusting the layer thickness of the liquid crystal layer 14 between the reflective display region R and the transmissive display region T. Specifically, a second interlayer insulating film 75b having a predetermined film thickness is provided in the reflective display region R where the light reflecting film 26 is provided. Thereby, the layer thickness t0 of the liquid crystal layer 14 corresponding to the reflective display region R is set thin. On the other hand, the second interlayer insulating film 75b is not provided in the transmissive display region T where the light reflecting film 26 is not provided. That is, only the first interlayer insulating film 75a is provided in the transmissive display region T. Accordingly, the layer thickness t1 of the liquid crystal layer 14 corresponding to the transmissive display region T is set to be thicker than t0, that is, t1> t0. As a result, the length of the optical path passing through the liquid crystal layer 14 between the reflected light L0 and the transmitted light L1 can be made equal or close to each other. Therefore, the darkness is uniform between the reflective display and the transmissive display. Display can be performed.

  In FIG. 7, a plurality of photo spacers 22 as spacer members are arranged at appropriate intervals on the second interlayer insulating film 75b, which is a region between adjacent pixel electrodes 21a (that is, a light shielding region or a black mask region). It is formed with. An alignment film 23 a is formed on the pixel electrode 21 a and the photo spacer 22. The alignment film 23a is subjected to an alignment process, for example, a rubbing process, whereby the initial alignment of liquid crystal molecules in the vicinity of the alignment film 23a is determined.

  Hereinafter, the protrusion 99 will be described in detail. First, in FIG. 8, which is a cross section along the column direction Y, the protrusion 99 is provided on the corner portion of the second interlayer insulating film 75 b adjacent to the transmissive display region T on the element substrate 61. The protrusion 99 extends along the step S formed between the reflective display region R and the transmissive display region T in the vertical direction in FIG. 8, that is, in the horizontal direction in FIG. It is formed as a wall that is a member that partitions the transmissive display region T.

  Further, as shown in FIG. 8, the surface of the protrusion 99 on the alignment film 23a side is higher than the surface of the second interlayer insulating film 75b on the alignment film 23a side, and preferably the alignment film provided on the second interlayer insulating film 75b. It is formed higher than the thickness of 23b. The protrusion 99 is preferably formed to be lower than the thickness of the liquid crystal layer 14 so that the protrusion 99 and the color filter substrate 62 facing the protrusion 99 do not contact each other. Such protrusions 99 can be formed by patterning a photosensitive resin having insulation properties similar to the first interlayer insulating film 75a and the second interlayer insulating film 75b by photolithography.

  The width W2 of the protrusion 99 is such that when the material of the alignment film 23a is applied onto the pixel electrode 21a, the transmissive display region T, which is the lower region from the reflective display region R, which is the higher region where the step S is formed. It can be determined by the amount of the alignment film 23a flowing in. Specifically, if the alignment film 23a existing in the region defined by the width W0 on the reflective display region R flows into the transmissive display region T, the width W2 of the protrusion 99 is W2 <W0. It is desirable. This is due to the following reason. That is, if W2 ≧ W0, the alignment film 23a is applied on the protrusion 99 in the same amount or larger than that flowing into the transmissive display area T when the protrusion 99 is not provided. . In this case, from the surface of the protrusion 99, the same or larger amount of the material of the alignment film 23a as that in the case where the protrusion 99 is not provided flows into the transmissive display region T. This is because the result is contrary to the object of the present invention, in which the alignment film is uniformly formed by preventing the lower region where S is formed from flowing more than necessary.

  Note that, since the protrusion 99 protrudes from the second interlayer insulating film 75b, strictly speaking, the layer thickness of the liquid crystal layer 14 may change in the portion of the protrusion 99. However, the height T2 and width W2 of the protrusion 99 are very small compared to the height and width of other elements. Therefore, in the portion where the protrusion 99 is provided, the influence on the display due to the change in the thickness of the liquid crystal layer 14 or the disorder of the alignment of the liquid crystal can be ignored.

  The photo spacer 22 shown in FIG. 7 is already provided on the second interlayer insulating film 75b in the region between the pixel electrodes 21a adjacent to each other on the element substrate 61, that is, the light shielding region or the black mask region. As explained. Further, the photo spacer 22 is formed on the same element substrate 61 in a region where the protrusion 99 in the reflective display region R is not formed. Specifically, the photospacer 22 is a region where the projection 99 is not provided as shown in FIG. 9 when the portion indicated by the arrow H in the element substrate 61 is viewed in plan from the arrow A side. It is provided in the light shielding area. In this way, the photo spacer 22 can stably and reliably hold the cell gap G. Note that the photo spacer 22 may be provided in the reflective display region R as long as it is a region where the protrusion 99 is not provided. The photo spacer 22 can also be provided in the peripheral region Vc.

  In FIG. 6, in the liquid crystal display device 51 of the present embodiment, a protrusion 99 is formed at the step S as shown in FIG. 8. Thereby, when the alignment film 23a of FIG. 8 is applied on the element substrate 61, the protrusion 99 can stop the material of the alignment film 23a applied to the reflective display region R from flowing. As a result, the material of the alignment film 23a can be prevented from flowing into the transmissive display region T more than necessary. Therefore, the alignment film 23a can be uniformly formed between the reflective display region R, which is the higher region where the step is formed, and the transmissive display region T, which is the lower region. Unevenness can be prevented from occurring.

(Third embodiment of electro-optical device)
Next, still another embodiment of the electro-optical device according to the invention will be described. FIG. 10 shows a main part of a liquid crystal display device according to still another embodiment. FIG. 10A is a view of the color filter substrate 12 shown by an arrow J in FIG. 4 as viewed from the back side of the drawing. In the first embodiment, as shown in FIGS. 2 and 5, the protrusion 49 is provided on the corner portion of the second overcoat film 43 b on the color filter substrate 12 and adjacent to the transmissive display region T. . The protrusions 49 extend in the vertical direction (X direction) in FIG. 2 along the step S formed between the reflective display region R and the transmissive display region T, that is, in the horizontal direction (X direction) in FIG. It extends as a wall that is a member that partitions the reflective display region R and the transmissive display region T. In the present embodiment, the components of the liquid crystal display device other than the protrusions 49 can be the same as those in the first embodiment shown in FIGS.

  On the other hand, in the present embodiment, as shown in FIG. 10A, a projection 49 is formed between the effective display area Vi and the peripheral area Vc. 10A shows the protrusions 49 provided between the left and right peripheral areas Vc and the effective display area Vi in FIG. 4, the protrusions 49 are the upper and lower peripheral areas Vc and the effective display area Vi in FIG. 4. Are also provided in between. That is, the protrusion 49 is provided in an endless annular shape in plan view over the entire circumference of the boundary between the peripheral region Vc and the effective display region Vi. Further, the cross section of the protrusion 49 stands up at a right angle or a shape close thereto, and has a shape effective for stopping the flow of the alignment film material.

  In the cross section according to the P1-P1 line of FIG. 10A, that is, the cross section of the portion where the peripheral area Vc and the reflective display area R are adjacent, as shown in FIG. No step is formed at the boundary of the region Vc, and the second overcoat film 43b having the same height is formed over both. On the other hand, in the cross section according to the line P2-P2 in FIG. 10A, that is, in the cross section of the portion where the peripheral region Vc and the transmissive display region T are adjacent to each other, as shown in FIG. Since the second overcoat film 43b is not formed, a step S is formed at the boundary between the effective display region Vi and the peripheral region Vc.

  In this embodiment, as shown in FIG. 10A, since the protrusion 49 is formed between the peripheral region Vc and the effective display region Vi, the alignment film 23b is applied on the color filter substrate 12 in FIG. In this case, the protrusion 49 can stop the flow of the material of the alignment film 23b applied to the peripheral region Vc. As a result, the material of the alignment film 23b can be prevented from flowing more than necessary into the effective display area Vi, particularly the transmissive display area T. Therefore, the alignment film 23b can be formed uniformly between the peripheral region Vc, which is the higher region where the step is formed, and the transmissive display region T, which is the lower region. Can be prevented.

(Embodiment 4 of electro-optical device)
Next, still another embodiment of the electro-optical device according to the invention will be described. FIG. 11 shows a main part of a liquid crystal display device according to still another embodiment. FIG. 11A is a view of the element substrate 61 indicated by the arrow J in FIG. 4 as viewed from the front side of the figure. In the second embodiment, as shown in FIGS. 8 and 9, the protrusions 99 are provided on the corners of the second interlayer insulating film 75 b on the element substrate 61 and adjacent to the transmissive display region T. The protrusions 99 extend in the vertical direction (X direction) in FIG. 8 along the step S formed between the reflective display region R and the transmissive display region T, that is, in the horizontal direction (X direction) in FIG. It extends as a wall that is a member that partitions the reflective display region R and the transmissive display region T. In this embodiment, the components of the liquid crystal display device other than the protrusion 99 can be the same as those in the second embodiment shown in FIGS.

  On the other hand, in the present embodiment, as shown in FIG. 11A, a protrusion 99 is formed between the effective display area Vi and the peripheral area Vc. 11A shows the protrusions 99 provided between the left and right peripheral areas Vc and the effective display area Vi in FIG. 4, the protrusions 99 correspond to the upper and lower peripheral areas Vc and the effective display area Vi in FIG. 4. Are also provided in between. That is, the protrusion 99 is provided with an endless annular shape in plan view over the entire circumference of the boundary between the peripheral area Vc and the effective display area Vi. Further, the cross section of the protrusion 99 stands up at a right angle or a shape close thereto, and has a shape effective for stopping the flow of the alignment film material.

  In the cross section according to the line P3-P3 of FIG. 11A, that is, in the cross section of the portion where the peripheral area Vc and the reflective display area R are adjacent to each other, as shown in FIG. A step is not formed at the boundary of the region Vc, and a second interlayer insulating film 75b having the same height is formed over both of them. On the other hand, in the cross section according to the line P4-P4 in FIG. 11A, that is, in the cross section of the portion where the peripheral area Vc and the transmissive display area T are adjacent to each other, as shown in FIG. Since the second interlayer insulating film 75b is not formed, a step S is formed at the boundary between the effective display region Vi and the peripheral region Vc.

  In this embodiment, as shown in FIG. 11A, since the protrusion 99 is formed between the peripheral region Vc and the effective display region Vi, the alignment film 23a is applied on the element substrate 61 in FIG. At this time, the protrusion 99 can stop the material of the alignment film 23a applied to the peripheral region Vc from flowing. As a result, the material of the alignment film 23a can be prevented from flowing more than necessary into the effective display area Vi, particularly the transmissive display area T. Therefore, the alignment film 23a can be uniformly formed between the peripheral region Vc, which is the higher region where the level difference is formed, and the transmissive display region T, which is the lower region. Can be prevented.

(Fifth embodiment of electro-optical device)
Next, still another embodiment of the electro-optical device according to the invention will be described. FIG. 12 shows a main part of a liquid crystal display device according to still another embodiment. FIG. 12A is a view of the element substrate 61 at the portion indicated by the arrow K in FIG. 4 as viewed from the front side of the figure. The overall configuration of this embodiment can be the same as the configuration shown in FIG. 6 differs from the embodiment of FIG. 6 in the structure of the reflective display region R and the transmissive display region T, that is, the structure of the second interlayer insulating film 75b and the protrusion 99 formed on the inner surface of the element substrate 61. Hereinafter, the present embodiment will be described focusing on differences from the second embodiment. In this embodiment, the same components as those of the previous embodiment are denoted by the same reference numerals, and the description thereof will be omitted.

  In the second embodiment, as shown in a plan view in FIG. 9, the reflective display region R is formed on the upper side in the drawing of one subpixel region D, and the transmissive display region T is formed on the lower side in the drawing. Then, the protrusion 99 is formed along the step S formed between the reflective display region R and the transmissive display region T in the left-right direction (X direction) in FIG. 9, that is, the vertical direction (X direction) in FIG. And is formed as a wall that is a member that partitions the reflective display region R and the transmissive display region T.

  On the other hand, in the present embodiment, as shown in a plan view in FIG. 12A, a transmissive display region T is formed by providing an opening 103 at the approximate center of one subpixel region D, and the transmissive display region T is formed. A reflective display region R is formed around the display region T. The opening 103 can be provided by removing the second interlayer insulating film 75b or by reducing the thickness of the second interlayer insulating film 75b as compared with other portions. The protrusion 99 is formed in an endless frame shape surrounding the opening 103 around the entire periphery of the opening 103.

  FIG. 12B shows a cross-sectional structure according to the line P5-P5 in FIG. FIG. 12C shows a cross-sectional structure according to the line P6-P6 in FIG. As shown in FIGS. 12B and 12C, in the element substrate 61, the TFT element 31 and the wirings 47 and 48 are formed on the translucent substrate 61a, and the first interlayer insulating film 75a is formed thereon. Is the same as the embodiment shown in FIG. In the present embodiment, the second interlayer insulating film 75b is formed on the first interlayer insulating film 75a and in a region other than the opening 103, whereby the opening 103 and its peripheral region, that is, the reflective display region R, A step S is formed between them.

  In the present embodiment, since the protrusion 99 is formed in an endless frame shape surrounding the opening 103 at the step S formed by the opening 103 and the second interlayer insulating film 75b forming the peripheral region thereof, the alignment film 23a is formed. Can be stopped by the protrusion 99 when the material of the alignment film 23a applied to the reflective display region R flows to the lower side. As a result, the material of the alignment film 23a can be prevented from flowing into the transmissive display region T more than necessary. Therefore, the alignment film 23a can be uniformly formed between the reflective display region R, which is the higher region where the step is formed, and the transmissive display region T, which is the lower region. Unevenness can be prevented from occurring.

(Other embodiments of electro-optical device)
The present invention has been described with reference to the preferred embodiments. However, the present invention is not limited to the embodiments, and various modifications can be made within the scope of the invention described in the claims.

  For example, in the above embodiment, the protrusion 49 is provided on the surface of the second overcoat film 43b in FIG. However, the protrusion 49 can be provided by other configurations. For example, as shown in FIG. 15B, an insulating film 202B may be provided on the substrate 201 to form a step S, and a protrusion 203B may be provided along the step S so as to contact the side surface of the insulating film 202B. it can. Further, as shown in FIG. 15C, an insulating film 202C is provided on the substrate 201 to form a step S, and along the step S, a side surface of the insulating film 202C and an upper surface of the insulating film 202C adjacent thereto are provided. A protrusion 203C may be provided so as to cover the portion. Further, as shown in FIG. 15D, an insulating film 202D is provided on the substrate 201 to form a step S, and a portion indicated by 202D ′ in the insulating film 202D is removed, thereby along the step S. The protrusion 203D can be formed integrally with the insulating film 202D. In any of these cases, the surface of the insulating film on the alignment film side is higher than the surface of the substrate, and the surface of the protrusion on the alignment film side is higher than the surface of the insulating film on the alignment film side.

  In the first embodiment, as shown in FIG. 5, the protrusion 49 is provided between the reflective display region R and the transmissive display region T. However, the protrusion 49 can be provided between the peripheral display region Rc and the transmissive display region T in addition to the reflective display region R and the transmissive display region T. That is, the protrusion 49 can be provided so as to surround the transmissive display region T.

  In the above embodiment, an amorphous silicon TFT which is a three-terminal element is used as the switching element. However, other three-terminal elements such as a low-temperature polysilicon TFT and a high-temperature polysilicon TFT can also be used. A two-terminal element can also be used as the switching element. As the two-terminal element, for example, a TFD (Thin Film Diode) element can be used. The present invention can also be applied to a simple matrix liquid crystal display device that does not use a switching element.

(Embodiment of manufacturing method of electro-optical device)
Hereinafter, the method for manufacturing the electro-optical device according to the present invention will be described by taking the case of manufacturing the liquid crystal display device 1 of FIGS. 2 and 3 as an example. In addition, this embodiment shows an example of this invention and this invention is not limited to this embodiment.

  In FIG. 3, first, the coloring elements 42 on the second light-transmitting substrate 12a, for example, a coloring material obtained by dispersing pigments and dyes of B, G, and R colors in a photosensitive resin are predetermined by photolithography. Form into an array. At the same time, the light shielding members 41a are formed in a predetermined pattern between the colored elements 42 of the respective colors by stacking the two colored elements 42 adjacent to each other or by stacking the three colored elements 42. . In the case of this embodiment, the stripe pattern is formed so as to fill the space between the sub-pixel regions D between the coloring elements 42 of different colors. The light shielding member 41a can be formed into a predetermined pattern by a photo-etching process using a light-shielding metal such as Cr.

  Next, the first overcoat film 43a is formed on the light shielding member 41a and the coloring element 42 of FIG. 3 by using a photosensitive resin such as an acrylic resin or a polyimide resin by a photolithography process. Next, a second overcoat film 43b, which is an insulating film, is formed on the first overcoat film 43a in FIG. The second overcoat film 43b is formed in a predetermined pattern at a position corresponding to the reflective display region R in the sub-pixel region D by photolithography using a photosensitive resin such as acrylic resin or polyimide resin as a material. A step S is formed between the reflective display region R and the transmissive display region T by forming the second overcoat film 43b.

  Next, the protrusion 49 is formed on the second overcoat film 43b. The projection 49 extends in the direction perpendicular to the paper surface of FIG. 2 along the step S by performing a photolithography process using a photosensitive resin such as acrylic resin or polyimide resin as a material, so that the reflective display region R and the transmissive display region T are formed. It is formed as a wall which is a member that divides Next, the common electrode 21b is formed on the first overcoat film 43a, the second overcoat film 43b, and the protrusion 49 by a photoetching process using ITO as a material. Next, an alignment film 23b is formed on the common electrode 21b. The alignment film 23b is formed in a film shape by applying a solution of a material such as polyimide, for example, by printing, and baking the applied material after the application. Further, a rubbing process as an alignment process is performed on the surface of the alignment film 23b.

  As described above, in this embodiment, the material of the alignment film 23b is applied by printing. In this case, the material of the alignment film 23b easily flows from the reflective display region R, which is the higher region where the step S is formed, to the transmissive display region T, which is the lower region, and the thickness of the alignment film 23b is low. It tends to be uniform. However, according to the manufacturing method of the present invention, since the protrusion 49 is formed along the step S so as to suppress the flow of the alignment film 23b, the alignment film 23b is formed on the second overcoat film 43b. At this time, the protrusion 49 can stop the material of the alignment film 23b applied to the reflective display region R from flowing into the transmissive display region T. As a result, the material of the alignment film 23b can be prevented from flowing into the transmissive display region T more than necessary. Therefore, since the alignment film 23b can be formed uniformly between both the reflective display region R and the transmissive display region T, it is possible to prevent unevenness in display luminance.

(Embodiment of electronic device)
Hereinafter, an electronic device according to the present invention will be described with reference to embodiments. In addition, this embodiment shows an example of this invention and this invention is not limited to this embodiment.

  FIG. 13 shows an embodiment of an electronic apparatus according to the invention. The electronic apparatus shown here includes a liquid crystal display device 151 and a control circuit 150 that controls the liquid crystal display device 151. The control circuit 150 includes a display information output source 154, a display information processing circuit 155, a power supply circuit 156, and a timing generator 157. The liquid crystal display device 151 includes a liquid crystal panel 152 and a drive circuit 153.

  The display information output source 154 includes a memory such as a RAM (Random Access Memory), a storage unit such as various disks, a tuning circuit that tunes and outputs a digital image signal, and various clock signals generated by the timing generator 107. The display information processing circuit 155 is supplied with display information such as an image signal in a predetermined format.

  Next, the display information processing circuit 155 includes a number of well-known circuits such as an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, a clamp circuit, and the like, executes processing of input display information, and outputs an image signal. It is supplied to the drive circuit 153 together with the clock signal CLK. Here, the drive circuit 153 is a generic term for an inspection circuit and the like together with the scanning line drive circuit and the data line drive circuit. The power supply circuit 156 supplies a predetermined power supply voltage to each of the above components.

  The liquid crystal display device 151 can be configured using, for example, the liquid crystal display device 1 shown in FIG. 1 or the liquid crystal display device 51 shown in FIG. In the liquid crystal display device 1 of FIG. 1, along the step formed by the second overcoat 43b between the reflective display region R and the transmissive display region T, the second overcoat film 43b on the alignment film 23b side is formed. By forming the protrusions 49 protruding from the surface, the alignment film 23b is uniformly formed between the reflective display region R, which is the higher region where the step is formed, and the transmissive display region T, which is the lower region. Therefore, unevenness in display luminance can be prevented. In the liquid crystal display device 51 of FIG. 6, the alignment film of the second interlayer insulating film 75b is formed along the step formed by the second interlayer insulating film 75b between the reflective display region R and the transmissive display region T. By forming the protrusions 99 projecting from the surface on the 23a side, the alignment film 23a can be formed uniformly between both the reflective display region R and the transmissive display region T, resulting in uneven display luminance. Can be prevented. Therefore, even in an electronic apparatus using these liquid crystal display devices 1 and 51, it is possible to prevent unevenness in display luminance.

  FIG. 14 shows a mobile phone which is another embodiment of the electronic apparatus according to the invention. A cellular phone 160 shown here includes a main body 161 and a display body 162 that can be opened and closed. A display device 163 constituted by an electro-optical device such as a liquid crystal display device is disposed inside the display body portion 162, and various displays related to telephone communication can be visually recognized on the display body portion 162 on the display screen 164. Operation buttons 165 are arranged on the main body 161.

  An antenna 166 is attached to one end portion of the display body portion 162 so as to be extendable. A speaker (not shown) is arranged inside the receiver 167 provided on the upper part of the display body 162. Further, a microphone (not shown) is built in the transmitter 168 provided at the lower end of the main body 161. A control unit for controlling the operation of the display device 163 is stored in the main body unit 161 or the display unit unit 162 as a part of the control unit that controls the entire mobile phone or separately from the control unit. The

  The display device 163 can be configured using, for example, the liquid crystal display device 1 shown in FIG. 1 or the liquid crystal display device 51 shown in FIG. In the liquid crystal display device 1 of FIG. 1, along the step formed by the second overcoat 43b between the reflective display region R and the transmissive display region T, the second overcoat film 43b on the alignment film 23b side is formed. By forming the protrusions 49 higher than the surface, the alignment film 23b is uniformly formed between both the reflective display region R, which is the higher region where the step is formed, and the transmissive display region T, which is the lower region. Therefore, unevenness in display luminance can be prevented. In the liquid crystal display device 51 of FIG. 6, the alignment film of the second interlayer insulating film 75b is formed along the step formed by the second interlayer insulating film 75b between the reflective display region R and the transmissive display region T. By forming the protrusion 99 higher than the surface on the 23a side, the alignment film 23a can be uniformly formed between both the reflective display region R and the transmissive display region T, and thus unevenness in display luminance occurs. Can be prevented. Therefore, even in an electronic apparatus using these liquid crystal display devices 1 and 51, it is possible to prevent unevenness in display luminance.

(Modification)
In addition to the mobile phone described above, the electronic device includes a personal computer, a liquid crystal television, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, a pager, an electronic notebook, a calculator, a word processor, Examples include workstations, video phones, and POS terminals.

1 is a cross-sectional view showing an embodiment of an electro-optical device according to the invention. It is sectional drawing which expands and shows the principal part of FIG. It is sectional drawing according to CC line of FIG. It is a top view of the liquid crystal display device according to the arrow A of FIG. It is a top view which shows the part shown by the arrow E of FIG. 3 from the arrow I direction. FIG. 6 is a cross-sectional view showing another embodiment of the electro-optical device according to the invention. It is sectional drawing according to CC line of FIG. It is sectional drawing which expands and shows the principal part of FIG. It is a top view which shows the part shown by the arrow H of FIG. 7 from the arrow I direction. It is a figure which shows the principal part of other embodiment which concerns on this invention. It is a figure which shows the principal part of other embodiment which concerns on this invention. It is a figure which shows the principal part of other embodiment which concerns on this invention. It is a block diagram which shows one Embodiment of the electronic device which concerns on this invention. It is a perspective view which shows other embodiment of the electronic device which concerns on this invention. It is sectional drawing which shows the example of a structure of protrusion.

Explanation of symbols

1,51. Liquid crystal display devices (electro-optical devices),
2,52. 2. liquid crystal panel (electro-optic panel), Driving IC, 4. Lighting equipment,
6). LED, 7. Light guide 11, 61. Element substrate,
11a, 61a. First translucent substrate, 12,62. Color filter substrate,
12a, 62a. 12. a second translucent substrate; Sealing material, 14. Liquid crystal layer,
15a, 15b. Polarizing plate, 16. 16. Overhang part, FPC board,
21a. Pixel electrode, 21b. Common electrodes, 22a, 22b. Photo spacer,
23a, 23b. Alignment film, 24. Contact hole, 25. Interlayer insulation film (insulation film),
26. Light reflecting film, 31. TFT element, 32. Drain electrode, 33. Gate electrode,
33 '. Gate electrode line, 34. Gate insulating film, 35. Semiconductor layer,
36. Source electrode, 36 '. Source electrode lines, 41a, 41b. Light shielding member,
42. Coloring elements, 43a. First overcoat film, 43b. A second overcoat film,
47, 48. Wiring, 49,99. Protrusion, 75a. A first interlayer insulating film,
75b. Second interlayer insulating film (insulating film), 103. Opening, 150. Control circuit,
151. 152. liquid crystal display device (electro-optical device) LCD panel (electro-optical panel),
153. Driving circuit, 160. Mobile phones (electronic devices),
163. 201. Display device (electro-optical device) substrate,
202A, 202B, 202C, 202D. Insulating film, 202D ′. Removal part,
203A, 203B, 203C, 203D. Protrusion, D. Sub-pixel area,
R. Reflective display area; Step, T. Transparent display area, Vi. Effective display area,
Vc. Surrounding area

Claims (8)

A substrate,
An insulating film provided et the on the substrate,
An alignment film disposed on the insulating film;
A liquid crystal layer disposed on the alignment film;
A light reflecting film that reflects light incident from the substrate side ;
The insulating film has a step formed by raising the surface on the alignment film side of the portion corresponding to the light reflecting film , and a protrusion is provided around the step .
The surface of the alignment layer side of the protrusions the insulating film liquid crystal display device wherein a high Kushida transreflective than the surface of the orientation film side of the. The liquid crystal display device according to claim 1.
A sealing material provided in a frame shape surrounding the liquid crystal layer on the substrate;
An effective display area that is surrounded by the sealing material to display,
The insulating film forms the step in the effective display area,
The liquid crystal display device wherein the protrusion Ru Tei provided along the step formed in the effective display area. The liquid crystal display device according to claim 1 or 2,
Further comprising a peripheral region between the sealing material and the effective display region,
The insulating film forms the step between the effective display area and the peripheral area,
The liquid crystal display device wherein the protrusion Ru Tei provided along the step formed between the said effective display region peripheral region. The liquid crystal display device according to claim 2 or claim 3,
Having a counter substrate provided facing the substrate with the liquid crystal layer in between,
Provided the light-reflecting film before Symbol counter substrate,
Before Symbol effective display region, transmissive display region for performing display using a light transmitted through the reflective display region for performing display using a light reflecting, the light reflecting film is not formed region by the light reflecting layer And
The insulating layer, by which is provided the thickness of the liquid crystal layer in the reflective display area to at least the reflective display area to thinner than a thickness of the liquid crystal layer in the transmissive display region, wherein the reflective display region Forming the step between the transmissive display areas,
The projection Ru Tei provided along the step formed between the transmissive display region and the reflective display region liquid crystal display device. In the liquid crystal display device according to claim 4, in a region where the protrusion is not provided a between the substrate and the counter substrate, Ru Tei spacer member is provided for holding the layer thickness of the liquid crystal layer constant Liquid crystal display device . The liquid crystal display device in a liquid crystal display device according to claim 5, wherein the spacer member is a photo-spacer formed by photolithography. In the liquid crystal display device according to any one of claims 1 to 6, wherein the height of the protrusion is the liquid crystal layer lower liquid crystal display device than the thickness of.   An electronic apparatus comprising the liquid crystal display device according to claim 1.

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