JP2005148477A - Substrate for electrooptical device, electrooptical device, electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate for an electrooptical device with which display quality is improved by preventing mutual interference between neighboring pixels such as color mixing even when a light scattering property is imparted to a surface of a reflection film, the electrooptical device and electronic equipment. <P>SOLUTION: In the electrooptical device, regarding a projection and recession forming layer 50 to impart projections and recessions on a surface of a light reflection layer, a center region of a pixel 11 is made to be a rectangular wide diffusion region 111 having recessed parts 57 with large planar sizes formed with low density, and an outer peripheral region thereof is made to be a small diffusion region 112 having recessed parts 57 with small planar sizes formed with high density in any of the pixels 11. In the small diffusion region 112, color mixing between the pixels 11 is not produced because an angular range of directions of light reflected as scattered light is small, and in the wide diffusion region 111, a display light quantity required for a reflective mode is ensured because the region is provided with a sufficient reflectance. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a substrate for an electro-optical device used in an electro-optical device capable of displaying at least in a reflection mode, an electro-optical device using the same, and an electronic apparatus using the same.

  A liquid crystal device, which is one of typical electro-optical devices, is widely used as a display device for a mobile phone, a mobile computer, and the like because of its thinness, light weight, and low power consumption.

  Conventionally, this type of electro-optical device is configured as shown in FIGS. 14 and 15, for example. FIG. 14 is a cross-sectional view of a conventional electro-optical device, and FIG. 15 is an explanatory diagram illustrating a light scattering uneven pattern formed on each pixel on a counter substrate used in the electro-optical device. It is.

  As shown in FIG. 14, in the reflection type electro-optical device, the counter substrate 30 includes the element substrate 20 and the counter substrate 30 that hold the liquid crystal layer 12 so that display can be performed in a reflection mode using external light. , A light reflection layer 33, a color filter layer 34 of red (R), green (G), and blue (B), an overcoat layer 35, a counter electrode 36 having translucency, and an alignment film 37 are formed in this order. ing. Also, if the directionality of the light reflected by the light reflecting layer 33 is strong, the viewing angle dependency such as the brightness varies depending on the angle at which the image is viewed and the reflection of the background become prominent. After selectively exposing a photosensitive resin such as an acrylic resin applied to the substrate, development and baking are performed, and for example, the unevenness forming layer 50 having the recesses 57 as shown in FIGS. By forming on the lower layer side, minute irregularities are imparted to the surface of the light reflecting layer 33 to impart light scattering properties (see, for example, Patent Document 1).

In the reflection type electro-optical device configured as described above, external light incident from the element substrate 20 side is reflected by the light reflection layer 33 through the liquid crystal layer 12 and the color filter layer 34 as indicated by an arrow L12. The light is again emitted from the element substrate 20 through the color filter layer 34 and the liquid crystal layer 12. At that time, the display light is optically modulated by the liquid crystal layer 12 in each pixel 11 to display a color image in the reflection mode.
Japanese Patent No. 3372907

  However, when light scattering is imparted to the surface of the light reflecting layer 33, light incident from the element substrate 20 side is reflected over a predetermined angular range by the light reflecting layer 33, as indicated by an arrow L120 in FIG. Therefore, there is a problem that color mixing occurs between the pixels where the adjacent pixels 11 correspond to different colors, thereby degrading the quality of the color image. In addition, when adjacent pixels correspond to the same color, there is a problem in that a mixed image does not occur but a clear image cannot be displayed.

  Such a problem is that, when the density of the convex portions or concave portions formed in the concave-convex forming layer 50 is small and the planar size of the convex portions or concave portions is large, the scattering angle range in the light reflecting layer is wide. It is remarkable. Therefore, it is conceivable to increase the density of the convex portions or concave portions of the concave / convex forming layer 50 and reduce the planar size of the convex portions or concave portions. However, when the density of the convex portions or concave portions of the concave / convex forming layer 50 is increased. Has a problem that it becomes close to specular reflection and the viewing angle becomes narrow. Similarly, when the planar size of the convex portion or the concave portion is reduced, there is a problem that the display becomes dark.

  In view of the above problems, an object of the present invention is to improve display quality by preventing mutual interference between adjacent pixels such as color mixing even when the surface of a reflective film is provided with light scattering properties. It is an object to provide a substrate for an electro-optical device, an electro-optical device, and an electronic apparatus.

  In order to solve the above problems, in the present invention, each of a large number of pixels arranged in a matrix has a concavo-convex forming layer having a large number of convex portions or concave portions, and a light scattering surface on the surface by the concavo-convex forming layer. In the substrate for an electro-optical device in which the light reflecting layer having the unevenness is formed in this order, at least in the pixel, a wide scattering region having a wide scattering angle range in the light reflecting layer, and from the wide scattering region And a narrow scattering region having a narrow light reflection angle range in the light reflection layer.

  In the present invention, since the same pixel includes a wide scattering region having a wide scattering angle range in the light reflection layer and a narrow scattering region having a narrow light reflection angle range, for example, the narrow scattering regions are adjacent to each other. If it is arranged on the boundary area side with the pixels, when the display is performed in the reflection mode, the lights emitted from the adjacent pixels do not interfere with each other. The factor of decrease can be eliminated. Further, when adjacent pixels correspond to the same color, the contrast can be improved. In addition, since a wide scattering region is also formed in the pixel, it is possible to ensure scattering characteristics with a wide viewing angle in the reflection mode.

  In the present invention, the wide scattering region and the narrow scattering region have different scattering angle ranges due to differences in density or planar size of the convex portions or concave portions constituting the concave and convex portions. . For example, in the narrow scattering region, the density of convex portions or concave portions constituting the irregularities is substantially equal and the planar size of the convex portions or concave portions is smaller than that of the wide scattering region. Alternatively, in the narrow scattering region, the planar size of the convex portions or concave portions constituting the concaves and convexes is substantially equal and the density of the convex portions or concave portions is higher than that of the wide scattering region. Furthermore, the narrow scattering region may have a configuration in which the density of the convex portions or concave portions constituting the irregularities is high and the planar size of the convex portions or concave portions is small compared to the wide scattering region. .

  In the present invention, when each of the plurality of pixels corresponds to a predetermined color, each of the plurality of pixels includes at least the narrow scattering region in a region adjacent to pixels corresponding to different colors. It is preferable. With this configuration, since the color light emitted from the pixels corresponding to different colors does not mix, a high-quality color image can be displayed.

  In the present invention, each of the plurality of pixels corresponds to a predetermined color, and each of the plurality of pixels includes the wide scattering region in a central region and the narrow scattering region in an outer peripheral region. preferable. With this configuration, since light emitted from adjacent pixels does not interfere with each other, it is possible to remove a display quality deterioration factor such as color mixture between adjacent pixels.

  The present invention can be applied not only to a total reflection type electro-optical device but also to a transflective electro-optical device. In such a transflective electro-optical device, in each of the large number of pixels, the light reflection layer is formed with a light transmission portion that enables display in a transmission mode. The wide scattering region and the narrow scattering region are formed in the concave / convex formation layer in a region that overlaps each other.

  As for the substrate for an electro-optical device to which the present invention is applied, an electro-optical device can be configured by holding an electro-optical material by the substrate. For example, if a liquid crystal as an electro-optical material is held between an electro-optical device substrate to which the present invention is applied and another substrate opposed to the electro-optical device substrate, the liquid crystal as the electro-optical device A device can be configured.

  The electro-optical device to which the present invention is applied can be used as a display unit in an electronic apparatus such as a mobile phone or a mobile computer.

  Embodiments of the present invention will be described with reference to the drawings.

[Embodiment 1]
(overall structure)
FIG. 1 is a block diagram showing an electrical configuration of an electro-optical device according to Embodiment 1 of the present invention. FIG. 2 is an exploded perspective view showing the configuration of the electro-optical device according to Embodiment 1 of the present invention. FIG. 3 is a plan view showing a pixel layout in the electro-optical device shown in FIG. 4 is a cross-sectional view of the electro-optical device shown in FIG. FIG. 5 is a cross-sectional view of the TFD element shown along line AA ′ in FIG.

  The electro-optical device to which the present invention is applied is an active matrix reflective liquid crystal device using nematic liquid crystal, and a plurality of scanning lines 31 are formed in the row (X) direction as shown in FIG. Two data lines 21 are formed in the column (Y) direction. Further, a large number of pixels 11 are formed in a matrix corresponding to each intersection of the scanning line 31 and the data line 21. In each pixel 11, a liquid crystal layer 12 made of nematic liquid crystal and a TFD element 40, which is a two-terminal active element, are connected in series. In the example shown here, the liquid crystal layer 12 is connected to the scanning line 31 side and the TFD element 40 is connected to the data line 21 side, but the liquid crystal layer 12 is connected to the data line 21 side and the TFD element is connected. 40 may be connected to the scanning line 31 side. In any case, each scanning line 31 is driven by the scanning line driving circuit 350, while each data line 21 is driven by the data line driving circuit 250.

  As shown in FIG. 2, in the electro-optical device 1, a driving liquid crystal cell 10 in which a pair of translucent substrates are bonded together with a predetermined gap is used. If the electro-optical device 1 is a total reflection type, The polarizing plate 2, the first upper retardation film 3, the second upper retardation film 4, and the driving liquid crystal cell 10 are stacked in this order. If the electro-optical device 1 is a transflective type, the polarizing plate 2, the first upper phase difference plate 3, the second upper phase difference plate 4, the driving liquid crystal cell 10, the first lower phase difference. The plate 5, the second lower phase difference plate 6, and the backlight device 9 are arranged in this order.

  In the driving liquid crystal cell 10, one translucent substrate is an element substrate 20 on which an active element is formed, and the other translucent substrate is a counter substrate 30 (electro-optical device substrate) facing the element substrate 20. ). The element substrate 20 and the counter substrate 30 are bonded to each other with a predetermined gap by a sealing material 14 including a spacer (not shown), and the liquid crystal layer 12 is sealed and held in the gap. .

  In the electro-optical device 1, a liquid crystal driving IC (driver) constituting the data line driving circuit 250 is mounted directly on the surface of the element substrate 20 by the COG (Chip On Glass) technology, and directly on the surface of the counter substrate 30. A liquid crystal driving IC (driver) constituting the scanning line driving circuit 350 is mounted. The configuration is not limited to the COG technique, and the IC chip and the electro-optical device may be connected using other techniques. For example, a TAB (Tape Automated Bonding) technique may be used to electrically connect a TCP (Tape Carrier Package) in which an IC chip is bonded on an FPC (Flexible Printed Circuit) to an electro-optical device. Further, COB (Chip On Board) technology for bonding an IC chip to a hard substrate may be used.

  As shown in FIGS. 3 and 4, a base film 25 is formed on the inner surface of the element substrate 20, and a plurality of data lines 21 and the data lines 21 are formed on the surface of the base film 25. A plurality of TFD elements 40 connected to each other and pixel electrodes 23 connected to the TFD elements 40 in a one-to-one relationship are formed. The pixel electrode 23 is formed of a light-transmitting conductive film such as ITO (Indium Tin Oxide). Each data line 21 extends linearly, while the TFD elements 40 and the pixel electrodes 23 are arranged in a dot matrix. On the surface of the pixel electrode 23 and the like, an alignment film 24 subjected to a rubbing process is formed. The alignment film 24 is generally formed from a polyimide resin or the like.

  On the other hand, on the inner surface of the counter substrate 30, a light reflecting layer 33 made of a single layer film or a multilayer film of aluminum, aluminum alloy, silver, silver alloy, etc. (R), green (G), and blue (B) color filter layers 34, an overcoat layer 35, a strip-shaped counter electrode 36 made of a light-transmitting conductive film such as ITO, and an alignment film 37 made of polyimide resin or the like. And are formed. In this embodiment, an RGB stripe arrangement in which pixels 11 corresponding to the same color are aligned in the Y direction is employed. Therefore, for example, pixels 11 corresponding to green (G) or blue (B) are arranged on both sides of the pixel column corresponding to red (R), and each pixel 11 corresponds to a different color. Both sides of the pixel 11 are sandwiched.

  A black matrix 38 is formed in the gap between the color filter layers 34 to block incident light from the gap between the color filter layers 34. The overcoat layer 35 is formed on the surfaces of the color filter layer 34 and the black matrix 38 for the purpose of improving the smoothness of the color filter layer 34 and the black matrix 38 and preventing the counter electrode 36 from being disconnected. Here, the counter electrode 36 functions as the scanning line 31 and is formed in a direction orthogonal to the data line 21.

  In the electro-optical device 1 configured as described above, external light incident from the element substrate 20 side is reflected by the light reflecting layer 33 through the liquid crystal layer 12 and the color filter layer 34 as indicated by an arrow L12, and again. The light is emitted from the element substrate 20 side through the color filter layer 34 and the liquid crystal layer 12. At that time, the display light is optically modulated by the liquid crystal layer 12 in each pixel 11 to display a color image in the reflection mode.

  As shown in FIG. 5, the TFD element 40 includes a first TFD element 40a and a second TFD element 40b. On the insulating film 25 formed on the surface of the element substrate 20, the first metal film 42, The oxide film 44 is an insulator formed on the surface of the first metal film 42 by anodic oxidation, and second metal films 46a and 46b formed on the surface and spaced apart from each other. Further, the second metal film 46 a becomes the data line 21 as it is, while the second metal film 46 b is connected to the pixel electrode 23.

  The first TFD element 40a becomes the second metal film 46a / oxide film 44 / first metal film 42 in order from the data line 21 side, and becomes metal (conductor) / insulator / metal (conductive). Therefore, it has diode switching characteristics in both positive and negative directions. On the other hand, when viewed from the data line 21 side, the second TFD element 40b becomes the first metal film 42 / oxide film 44 / second metal film 46b in order, which is opposite to the first TFD element 40a. The diode switching characteristics are as follows. Accordingly, since the TFD element 40 has two diodes connected in series in opposite directions, the current-voltage nonlinear characteristic is symmetric in both positive and negative directions compared to the case where one diode is used. Will be. If it is not necessary to strictly symmetrize the nonlinear characteristics as described above, only one TFD element 40 may be used.

  The TFD element 40 is an example of a diode element. In addition, an element using a zinc oxide (ZnO) varistor, an MSI (Metal Semi Insulator), etc., or these elements in a single unit or in a reverse direction in series. A connection or a parallel connection is applicable.

(Structure of unevenness forming layer)
FIG. 6 is an explanatory diagram illustrating a light scattering uneven pattern formed on each pixel on the counter substrate used in the electro-optical device according to Embodiment 1 of the present invention.

  In the reflection type electro-optical device 1, when the directionality of the light reflected by the light reflection layer 33 shown in FIG. 4 is strong, the viewing angle dependency such as the brightness varies depending on the viewing angle of the image, the background reflection, etc. Appears prominently. For this reason, in the counter substrate 30, a concavo-convex formation layer 50 made of a photosensitive resin is formed on the lower layer side of the light reflection layer 33, and the concavo-convex formation layer 50 forms minute unevenness for light scattering on the surface of the light reflection layer 33. It is attached. As will be described later, the concavo-convex forming layer 50 is formed of two or one photosensitive resin layer.

  A number of irregularities are formed on the irregularity forming layer 50, and the irregularities are reflected on the surface of the light reflecting layer 33 as an irregular pattern for light scattering. The concavo-convex portion of the concavo-convex forming layer 50 is formed from a convex portion or a concave portion having a circular or polygonal planar shape. In the following description, the concavo-convex forming layer 50 has a concave portion 57 formed of a circular hole. Explain that it is.

  Here, in the concavo-convex formation layer 50, the higher the concave portions 57 are formed, the narrower the angle range (scattering angle range) in the direction in which light is reflected as scattered light from the light reflecting layer 33, and the light reflecting layer. The viewing angle at 33 is narrow. On the other hand, in the concave / convex forming layer 50, when the concave portions 57 are formed at a low density, the scattering angle range is wide and the viewing angle at the light reflecting layer 33 is wide. Further, in the concavo-convex formation layer 50, the smaller the planar size of the concave portion 57, the narrower the scattering angle range and the narrower the viewing angle at the light reflecting layer 33. On the other hand, in the concave / convex forming layer 50, when the planar size of the concave portion 57 is small, the scattering angle range is wide and the viewing angle at the light reflecting layer 33 is wide.

  Therefore, in this embodiment, as shown in FIG. 6, in any pixel 11, the concave / convex formation layer 50 is a rectangular wide diffusion in which concave portions 57 having a large planar size are formed at a low density in the central region of the pixel 11. The region 111 is a frame-shaped outer peripheral side region surrounding the central region 111, and a narrow diffusion region 112 in which concave portions 57 having a small plane size are formed at a high density. For example, circular recesses 57 having a diameter of 10 μm are formed at a low density in the wide diffusion region 111, and circular recesses 57 having a diameter of 5 μm are formed at a high density in the narrow diffusion region 112. Note that the ratio of the product of the area per recess 57 in the wide diffusion region 111 and the number thereof to the product of the area per recess 57 in the narrow diffusion region 112 and the number thereof is, for example, 1: 3 to 1: 2.

  Accordingly, in the electro-optical device 1 of the present embodiment, the pixels 11 are adjacent to each other in the narrow diffusion region 112, and light is scattered from the light reflection layer 33 in the narrow diffusion region 112 as indicated by an arrow L122 in FIG. The angle range (scattering angle range) in the direction of reflection as light is narrow. Therefore, when the display is performed in the reflection mode, the light emitted from the adjacent pixels 11 does not interfere with each other. Therefore, since the color lights emitted from the pixels 11 corresponding to different colors are not mixed, a high-quality color image can be displayed.

  Each pixel 11 corresponds to the same color in the Y direction, but such pixels 11 are adjacent to each other in the narrow diffusion region 112. For this reason, the light emitted from the adjacent pixels 11 does not interfere with each other. Therefore, a sharp color image can be displayed.

  Furthermore, in this embodiment, the wide scattering region 11 is formed in any pixel 11, and light is reflected as scattered light from the light reflection layer 33 in the wide scattering region 11 as indicated by an arrow L 121 in FIG. Since the angle range in a certain direction is wide, the user can see a bright image in a wide angle range even when the electro-optical device 1 is used in an inclined state. In addition, since the wide scattering region 11 has a sufficient reflectance, it is possible to secure a display light amount in the reflection mode.

(Electro-optical device manufacturing method 1)
With reference to FIG. 7, the process of forming the unevenness forming layer 50 on the counter substrate 30 in the manufacturing process of the electro-optical device 1 of the present embodiment will be mainly described. The manufacturing method described here can be employed when any one of batch exposure and stepper exposure is used.

  7A to 7D are process cross-sectional views schematically showing a process of forming the unevenness forming layer 50 on the counter substrate 30 used in the electro-optical device 1 of the present embodiment.

  First, as shown in FIG. 7A, a thick photosensitive resin 51 is applied to the surface of a light-transmitting counter substrate 30 made of glass or the like, and then the photosensitive resin 51 is exposed through an exposure mask 510. . Here, either the negative type or the positive type may be used as the photosensitive resin 51, but FIG. 7A illustrates the case of the positive type as the photosensitive resin 51, and it is desired to remove the photosensitive resin 51. The portion is irradiated with ultraviolet rays through the light transmitting portion 511 of the exposure mask 510.

  Next, the exposed photosensitive resin 51 is developed to form a lower side unevenness forming layer 51a as shown in FIG. 7B. Here, the exposure mask 510 shown in FIG. 7A includes the mask pattern capable of forming the unevenness described with reference to FIG. 6. In the exposure mask 510, the region corresponding to the wide diffusion region 111 is not formed. The circular translucent portion 511 for forming the large concave portion 57 is formed sparsely, and the circular translucent portion 511 for forming the small concave portion 57 is densely formed in the region corresponding to the narrow diffusion region 112. Is formed.

  Next, as shown in FIG. 7 (C), a photosensitive resin 52 is applied on the upper layer side of the lower layer side unevenness forming layer 51a and then cured, and as shown in FIG. 52a is formed. In this way, the two-layered concavo-convex forming layer 50 including the lower-side concavo-convex forming layer 51a and the upper-layer concavo-convex forming layer 52a is formed. Since the upper layer side unevenness forming layer 52a made of a photosensitive resin layer having a high fluidity is applied and formed, the unevenness forming layer 50 having smooth edges without edges can be formed.

  Thereafter, a film forming process and a patterning process are performed to form a light reflecting layer 33 as shown in FIG. 4, and then the black matrix 38 and red ( The color filter layers 34 of R, green (G), and blue (B) are formed. Next, after forming the overcoat layer 35 by a spin coating method or the like, a film forming step and a patterning step are performed to form a counter electrode 36, and then an alignment film is formed by using flexographic printing or a spin coating method. 37 is formed. As a result, the counter substrate 30 is completed.

(Electro-optical device manufacturing method 2)
With reference to FIG. 8, another method of forming the unevenness forming layer 50 on the counter substrate 30 in the manufacturing process of the electro-optical device 1 of the present embodiment will be described. The manufacturing method described here can be adopted when any one of batch exposure and stepper exposure is used.

  8A to 8C are process cross-sectional views schematically showing another process of forming the unevenness forming layer 50 on the counter substrate 30 used in the electro-optical device 1 of the present embodiment.

  First, as shown in FIG. 8A, after a photosensitive resin 53 is applied thickly on the surface of a light-transmitting counter substrate 30 made of glass or the like, the photosensitive resin 53 is exposed through an exposure mask 530. . Here, either the negative type or the positive type may be used as the photosensitive resin 53, but FIG. 8A illustrates the case of the positive type as the photosensitive resin 53, and it is desired to remove the photosensitive resin 53. The portion is irradiated with ultraviolet rays through the light transmitting portion 531 of the exposure mask 530.

  Next, the exposed photosensitive resin 53 is developed to form an unevenness forming layer 53a as shown in FIG. Here, the exposure mask 510 shown in FIG. 8A includes the mask pattern capable of forming the unevenness described with reference to FIG. 6. In the exposure mask 510, the region corresponding to the wide diffusion region 111 is not formed. The circular translucent portion 511 for forming the large concave portion 57 is formed sparsely, and the circular translucent portion 511 for forming the small concave portion 57 is densely formed in the region corresponding to the narrow diffusion region 112. Is formed.

  Next, the concavo-convex formation layer 53a is heated and melted to form the concavo-convex formation layer 50 having smooth edges with no edges as shown in FIG. 8C.

  After that, a film forming process and a patterning process are performed to form a light reflecting layer 33 as shown in FIGS. 4A and 4B, and then, using a photolithography technique, a flexographic printing, or an inkjet method, A matrix 38 and a color filter layer 34 of red (R), green (G), and blue (B) are formed, and then an overcoat layer 35 is formed by a spin coat method or the like, and then a film forming process and a patterning process. Then, the counter electrode 36 is formed, and then the alignment film 37 is formed by using flexographic printing or spin coating method, so that the counter substrate 30 is completed.

  In addition, when forming the uneven | corrugated formation layer 50 from such one photosensitive resin layer, you may utilize half exposure. That is, after the photosensitive resin 53 is applied, the photosensitive resin 53 is subjected to half exposure through the exposure mask 530, development, and heating. In this method, since the photosensitive resin 53 is exposed to a middle position in the thickness direction, a thick portion and a thin portion are formed in the photosensitive resin 53 after development. Therefore, when the heat treatment is performed, the concavo-convex forming layer 50 having a smooth concavo-convex shape on the surface having no angular portions on the surface and no edges can be formed.

[Embodiment 2]
FIG. 9 is an explanatory diagram illustrating a light scattering uneven pattern formed on each pixel on the counter substrate used in the electro-optical device according to Embodiment 2 of the present invention. Since the basic configuration of the present embodiment and the third embodiment described below is the same as that of the first embodiment, common portions are denoted by the same reference numerals and description thereof is omitted. .

  As shown in FIG. 9, in this embodiment, as in the first embodiment, in any pixel 11, in the unevenness forming layer 50, the central region of the pixel 11 is formed with a recess 57 having a large planar size at a low density. A rectangular wide diffusion region 111 is formed, and a frame-shaped outer peripheral side region surrounding the central region 111 is formed as a narrow diffusion region 112 in which concave portions 57 having a small plane size are formed at high density.

  Here, in this embodiment, the red (R), green (G), and blue (B) color filter layers 34 described with reference to FIG. 4 are RGB in which the color filters 34 of the same color are arranged obliquely. A mosaic arrangement is employed. For this reason, any pixel 11 is surrounded by pixels 11 corresponding to different colors. Still, in the electro-optical device 1 of this embodiment, the outer peripheral side region of each pixel 11 is the narrow diffusion region 112, and light is reflected from the light reflection layer 33 as scattered light in the narrow diffusion region 112. The range of angles in the direction (scattering angle range) is narrow. Therefore, since the color lights emitted from the pixels 11 corresponding to different colors are not mixed, a high-quality color image can be displayed. Moreover, since the wide scattering area | region 11 is formed in any pixel 11, since it has sufficient reflectance, the light quantity of display in reflection mode can be ensured.

[Embodiment 3]
FIG. 10 is an explanatory diagram showing in plan view the light scattering unevenness pattern formed on each pixel in the counter substrate used in the electro-optical device according to Embodiment 3 of the present invention.

  As shown in FIG. 10, in this embodiment, as in the first embodiment, the red (R), green (G), and blue (B) color filter layers 34 described with reference to FIG. An RGB stripe arrangement in which the color filters 34 are linearly arranged in the Y direction is employed.

  Accordingly, any pixel 11 is sandwiched between pixels 11 corresponding to different colors. Therefore, in this embodiment, in any pixel, the concavo-convex formation layer 50 has a low-density recess 57 having a large planar size in a portion extending in the Y direction through the central region in the width direction (X direction) of the pixel 11. A rectangular wide diffusion region 111 is formed, and a region sandwiching the central region 111 on both the left and right sides is a narrow diffusion region 112 in which concave portions 57 having a small planar size are formed at high density. Therefore, in any pixel 11, the side adjacent to the pixel 11 corresponding to a different color is a narrow diffusion region 112, and light is reflected from the light reflection layer 33 as scattered light in the narrow diffusion region 112. The range of angles in the direction (scattering angle range) is narrow. Therefore, since the color lights emitted from the pixels 11 corresponding to different colors are not mixed, a high-quality color image can be displayed. Moreover, since the wide scattering area | region 11 is formed in any pixel 11, since it has sufficient reflectance, the light quantity of display in reflection mode can be ensured.

[Other embodiments]
In the electro-optical device of the above embodiment, in any pixel 11, the wide diffusion region 111 is formed with the large concave portions 57 having a small planar size, and the narrow diffusion region 112 is formed with the small circular planar recess 57. As shown in FIG. 11A, the concave portions 57 are formed in the wide diffusion region 111 at a low density, and the concave portions 57 of the wide diffusion region 111 and the planar size are formed in the narrow diffusion region 112, as shown in FIG. May be formed with a high density. Further, as shown in FIG. 11B, the wide diffusion region 111 is formed with a concave portion 57 having a large planar size, the narrow diffusion region 112 is formed with a circular concave portion 57 having a small planar size, and the concave portion of the wide diffusion region 111. You may form with the density equivalent to 57.

  Further, as shown in FIG. 12, the layout of the wide diffusion region 111 and the narrow diffusion region 112 is not limited to the configuration described with reference to FIGS. Alternatively, one pixel 11 may be divided in the Y direction, one of which may be a wide diffusion region 111 and the other a narrow diffusion region 112.

  Further, in the above embodiment, the size and density of the concave portion 57 are controlled. However, when a large number of convex portions are formed on the concave / convex forming layer 50, the size and density of the convex portions are controlled to set the diffusion angle range. Also good.

  In the above embodiment, the electro-optical device 1 is a total reflection type in which display is performed only in the reflection mode. However, a light transmission portion is formed in the light reflection layer 33 to display in either the reflection mode or the transmission mode. The present invention may be applied to a transflective electro-optical device 1 that can perform the above.

  In the above embodiment, the TFD element 40 is used as an active element. However, the present invention may be applied to an electro-optical device using a TFT as an active element, and further to a passive matrix electro-optical device.

  Furthermore, the present invention may be applied to an electro-optical device such as an electroluminescence display device, a display device using electron-emitting devices such as a plasma display and a field emission display.

[Example of mounting on electronic devices]
FIG. 13 is a perspective view illustrating a configuration of a mobile phone as an example of an electronic apparatus in which the electro-optical device 1 according to this embodiment is mounted.

  In FIG. 13, a mobile phone 1400 includes the electro-optical device 1 along with a plurality of operation buttons 1402, an earpiece 1404 and a mouthpiece 1406. The electro-optical device 1 is a transflective type, and a backlight device is provided on the back surface thereof as necessary.

  Electronic devices that can be mounted with the electro-optical device 1 according to the present embodiment include mobile phones, liquid crystal televisions, viewfinder type, monitor direct-view type video tape recorders, car navigation devices, electronic notebooks, calculators as well as mobile phones. , Word processors, workstations, videophones, POS terminals, devices with touch panels, and the like.

  In the present invention, the pixel includes a wide scattering region having a wide scattering angle range in the light reflection layer and a narrow scattering region having a narrow light reflection angle range. When the display is performed in the reflection mode, the light emitted from the adjacent pixels does not interfere with each other, so that the display quality such as color mixing between the adjacent pixels is deteriorated. Factors can be removed. In addition, since a wide scattering region is also formed in the pixel, it is possible to prevent a significant decrease in reflectance, and thus it is possible to secure a display light amount in the reflection mode.

1 is a block diagram showing an electrical configuration of an electro-optical device according to Embodiment 1 of the present invention. FIG. 1 is an exploded perspective view illustrating a configuration of an electro-optical device according to Embodiment 1 of the invention. FIG. FIG. 3 is a plan view showing a layout of pixels in the electro-optical device shown in FIG. 2. FIG. 3 is a cross-sectional view of the electro-optical device shown in FIG. 2. It is sectional drawing of the TFD element shown along the A-A 'line of FIG. FIG. 3 is an explanatory diagram illustrating a light scattering uneven pattern formed on each pixel in a plane in the counter substrate used in the electro-optical device according to Embodiment 1 of the present invention. (A)-(D) are process sectional drawings which show the process of forming an unevenness | corrugation formation layer in the counter substrate used for the electro-optical apparatus which concerns on this invention. (A)-(C) are process sectional drawings which show another process of forming an uneven | corrugated formation layer in the opposing board | substrate used for the electro-optical apparatus which concerns on this invention. FIG. 6 is an explanatory diagram illustrating a light scattering uneven pattern formed on each pixel in a plane in the counter substrate used in the electro-optical device according to Embodiment 2 of the present invention. FIG. 10 is an explanatory diagram illustrating a light scattering unevenness pattern formed on each pixel in a plane in the counter substrate used in the electro-optical device according to Embodiment 3 of the present invention. (A) and (B) both explain planarly the uneven pattern for light scattering formed on each pixel in the counter substrate used in the electro-optical device according to another embodiment of the present invention. FIG. FIG. 6 is an explanatory diagram illustrating a light scattering uneven pattern formed on each pixel in a plane in a counter substrate used in an electro-optical device according to still another embodiment of the present invention. FIG. 11 is a perspective view illustrating a configuration of a mobile phone as an example of an electronic apparatus equipped with an electro-optical device to which the invention is applied. It is a top view which shows the layout of the pixel in the conventional electro-optical apparatus. It is explanatory drawing which shows the uneven | corrugated pattern for light scattering currently formed in each pixel planarly in the opposing board | substrate used for the conventional electro-optical apparatus.

Explanation of symbols

Reference Signs List 1 electro-optical device, 10 driving liquid crystal cell, 11 pixels, 12 liquid crystal layer, 20 element substrate, 21 data line, 23 pixel electrode, 30 counter substrate (substrate for electro-optical device), 31 scanning line, 33 light reflecting layer, 34 Color filter layer, 36 Counter electrode, 40 TFD element (active element), 50 Concavity and convexity formation layer, 57 Concavity, 111 Wide diffusion area, 112 Wide diffusion area

Claims (10)

In each of a large number of pixels arranged in a matrix, a concavo-convex forming layer having a large number of convex portions or concave portions, and a light reflecting layer in which concave and convex portions for light scattering are formed on the surface by the concavo-convex forming layer are formed in this order. In the electro-optic device substrate,
Each of the plurality of pixels includes at least a wide scattering region having a wide scattering angle range in the light reflection layer and a narrow scattering region having a light reflection angle range in the light reflection layer narrower than the wide scattering region. A substrate for an electro-optical device.   2. The scattering angle range according to claim 1, wherein the wide scattering region and the narrow scattering region have different scattering angle ranges due to a difference in density or planar size of convex portions or concave portions constituting the concave and convex portions. A substrate for an electro-optical device.   3. The narrow scattering region according to claim 2, wherein the density of convex portions or concave portions constituting the concave and convex portions is substantially equal and the planar size of the convex portions or concave portions is smaller than that of the wide scattering region. Electro-optic device substrate.   3. The narrow scattering region according to claim 2, wherein the projections or recesses constituting the unevenness have substantially the same plane size and the density of the projections or recesses is higher than that of the wide scattering region. Electro-optic device substrate.   3. The narrow scattering region according to claim 2, wherein the density of convex portions or concave portions constituting the concave and convex portions is higher than that of the wide scattering region, and the planar size of the convex portions or concave portions is small. A substrate for an electro-optical device. 6. The method according to claim 1, wherein each of the plurality of pixels corresponds to a predetermined color.
The electro-optical device substrate according to claim 1, wherein each of the plurality of pixels includes the narrow scattering region in a region adjacent to pixels corresponding to different colors.   6. The electro-optical device substrate according to claim 1, wherein each of the plurality of pixels includes the wide scattering region in a central region and the narrow scattering region in an outer peripheral region. . In any one of Claims 1 thru | or 6, in the said many pixels, the light transmissive part which enables the display in a transmissive mode is formed in the said light reflection layer,
The substrate for an electro-optical device, wherein the wide scattering region and the narrow scattering region are formed in the concavo-convex forming layer in a region overlapping with the light reflecting layer in a planar manner.   An electro-optical device, wherein an electro-optical material is held by the substrate for an electro-optical device defined in any one of claims 1 to 8.   An electronic apparatus comprising the electro-optical device defined in claim 9.

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