JP4318241B2 - Substrate exposure method and apparatus - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate exposure method and apparatus, and more particularly to a substrate exposure method and apparatus for performing exposure from the front side and the back side of a substrate with one exposure unit.
[0002]
[Prior art]
For color filters used in LCD monitors, red (R), green (G), and blue (B) color pixel patterns are arranged on a transparent glass substrate to form a black (K) black matrix. Has been. As a method for producing such a color filter, a spinner method, a film transfer method, or the like is generally known. In the film transfer method, first, a photosensitive colored layer formed on a film is transferred (laminated) onto a transparent glass substrate by a transfer device (laminator). Next, light is irradiated through a mask in which a predetermined pattern is formed to expose the photosensitive colored layer, thereby forming a desired pixel pattern and a black matrix.
[0003]
A conventional substrate exposure apparatus exposes a photosensitive colored layer by placing a glass substrate horizontally on a sample stage with the surface on which the photosensitive colored layer is laminated facing up. When exposing each photosensitive coloring layer of R, G, and B, it exposes from the surface side of a glass substrate with the mask and exposure unit which are arrange | positioned above the glass substrate. Further, only the side edge portion of the glass substrate is supported by the sample stage, and when exposing the photosensitive coloring layer of K, a mask and an exposure unit arranged below the glass substrate. To expose from the back side of the glass substrate.
[0004]
However, in recent years, color filters have become larger with the increase in size of liquid crystal panels, and in a conventional horizontal exposure apparatus in which a glass substrate is placed horizontally on a sample stage as in the prior art, the substrate size is about 550 mm × 650 mm. Even with a substrate, it is difficult to ensure comprehensive flatness due to the influence of deflection due to its own weight. In addition, it is difficult to secure comprehensive planarity for the mask for the same reason. Furthermore, the horizontal exposure apparatus becomes larger in the height direction in order to secure an optical path space, and it has become difficult to store it in a normal clean room. Therefore, the glass substrate and mask are held vertically to reduce the influence of deflection due to their own weight, and by performing exposure from the horizontal direction, the optical path space of the exposure machine can be arranged in the horizontal direction to clear the restrictions in the height direction. Such a vertical exposure apparatus has been devised.
[0005]
[Problems to be solved by the invention]
However, in the substrate exposure method and apparatus as described above, since exposure is performed using separate exposure machines from the front surface side and the back surface side of the glass substrate as in the prior art, the installation space increases due to the increase in the size of the substrate exposure apparatus. Inevitable. Further, since even two exposure units or one optical path switching device is necessary, there is a problem that the manufacturing cost, running cost, etc. are increased. Further, since the back exposure mask used for exposing the K photosensitive colored layer is generally made of a metal material, it is difficult to ensure the manufacturing accuracy, and the glass substrate is m square due to thermal deformation and insufficient rigidity. There is a problem that sufficient exposure accuracy cannot be obtained when the size is increased.
[0006]
The present invention has been made to solve the above-described problem, and can be accurately exposed from the front side and the back side of a glass substrate with a single exposure unit, and has a large m-square size glass substrate. It is an object of the present invention to provide a substrate exposure method and apparatus that can cope with the above.
[0007]
[Means for Solving the Problems]
In order to achieve the above object, a substrate exposure method of the present invention comprises a transparent substrate having a photosensitive resin layer provided on the surface thereof, and a mask corresponding to the photosensitive resin layer by one exposure portion. A substrate exposure method in which the photosensitive resin layer is exposed from the front surface side or the back surface side of the substrate through the substrate, the front and back surfaces of the substrate being held in a reversible manner, and the substrate being transferred to the exposure unit with the front side or the back side And holding the portion of the surface of the substrate that has been transferred to the exposure unit, where the photosensitive resin layer is not formed, or the back surface of the substrate, positioning the substrate to the exposure unit, The mask is exchanged according to the front and back surfaces, and the exposure unit exposes the photosensitive resin layer from the front side to the surface side exposure and the back side exposure to the photosensitive resin layer from the back side to the substrate. What to do selectively It is.
[0008]
Further, the substrate exposure apparatus of the present invention is a substrate exposure apparatus that holds a transparent substrate having a photosensitive resin layer provided on the surface substantially vertically and exposes from the front surface or the back surface. One exposure part to be exposed, a part of the surface of the substrate where the photosensitive resin layer is not formed, or a substrate stage that holds the back surface of the substrate and positions the substrate to the exposure part, and the front and back of the substrate can be reversed. And a substrate reversal transfer unit that transfers the substrate to the substrate stage with the front side or the back side, and a mask exchange unit that exchanges the mask according to the front and back sides of the substrate.
[0009]
The substrate stage is provided so as to be movable between a substrate transfer position with the substrate reverse transfer unit and an exposure position at which the substrate is exposed by the exposure unit. The substrate reverse transfer unit has a substrate transfer position and the substrate transfer position. The substrate is moved between the substrate reversing position and the substrate reversing position, and it is preferable to supply the substrate before exposure and discharge the exposed substrate at the substrate reversing position. In addition, it is preferable in terms of tact to provide a plurality of substrate reversal transfer units and alternately set the substrates on the substrate stage. The substrate stage holds the portion of the front surface or back surface of the substrate where the photosensitive resin layer is not formed. It is preferable to detachably attach the attachment. Furthermore, it is preferable that the mask used for exposure from the back side of the substrate is made of glass. In addition, various glass, such as soda glass, low expansion glass, low alkali glass, quartz glass, can be considered for this glass.
[0010]
The photosensitive resin layer is any one of a photosensitive red colored layer, a photosensitive green colored layer, a photosensitive blue colored layer, and a photosensitive black colored layer. The photosensitive red colored layer, the photosensitive green colored layer, and the photosensitive blue colored layer. It is preferable that exposure is performed from the front side when the colored layer is used, and exposure is performed from the back side when the photosensitive black colored layer is used.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 schematically shows a substrate exposure apparatus according to the present invention. The substrate exposure apparatus 10 includes an exposure unit 11, a substrate reversal transfer unit 12, and a casing 13 that stores these in a light-shielded, constant temperature, and clean state. A substrate entrance / exit 15 is formed on the side surface of the casing 13, and the glass substrate 16 is inserted / removed through the substrate entrance / exit 15 by a robot hand (not shown). The robot hand is disposed near the substrate entrance 15 outside the substrate exposure apparatus 10. This robot hand is configured to be capable of operating in three dimensions, and the hand body includes a suction pad. In the previous step, the photosensitive colored layer 16a is transferred to one surface (front surface) of the glass substrate 16 by a laminator, and is stored in the substrate cassette with the surface facing up. The robot hand sucks the back surface to which the photosensitive colored layer 16a has not been transferred with the suction pad to hold the glass substrate 16, supplies the glass substrate 16 to the substrate exposure apparatus 10, and has been exposed by the substrate exposure apparatus 10. The glass substrate 16 is discharged.
[0012]
Inside the casing 13, the substrate reversal transfer unit 12 is disposed near the substrate entrance 15, and the exposure unit 11 is disposed adjacent thereto. The substrate reversal transfer unit 12 includes a first arm 18, a second arm 19, a first moving table 20, a second moving table 21, and driving units 22 and 23 for these arms and moving table. The substrate reversal transfer unit 12 rotates the glass substrate 16 received from the robot hand in a horizontal state by 90 degrees to make it vertical, and puts the glass substrate 16 in and out of the exposure unit 11.
[0013]
As shown in FIG. 2, the first arm 18 is formed in a U shape having a size and shape so as not to interfere with the robot hand, and is arranged one by one at positions corresponding to both side edges of the glass substrate 16. Has been. The first arm 18 includes a suction pad 18a and sucks and holds the back surface of the glass substrate 16. The first arm 18 is attached to the first moving base 20 via the rotation shaft 24. Further, the first moving table 20 rotatably holds the first arm 18 so that the glass substrate 16 adsorbed by the first arm 18 is in a horizontal state or a vertical state.
[0014]
A first drive unit 22 is connected to the first arm 18 and the first moving base 20. The first drive unit 22 translates the first moving base 20 in the axial direction of the rotation shaft 24 (arrow A direction), and further rotates the first arm 18 by 90 degrees in the arrow B direction or the arrow C direction. The glass substrate 16 delivered from the robot hand in a horizontal state by the 90-degree rotation in the direction of arrow B by the first driving unit 22 is a surface exposure vertical state in which the photosensitive colored layer 16a faces the exposure unit described later. To be. Further, by the 90 ° rotation in the direction of arrow C by the first driving unit 22, the glass substrate 16 is brought into a back exposure vertical state in which the photosensitive colored layer 16a is located on the side opposite to the exposure unit. Further, as shown in FIG. 1, the first moving table 20 reciprocates between the substrate delivery position 26 and the exposure unit 11 by the movement in the direction of arrow A by the first driving unit 22.
[0015]
The second arm 19, the second moving table 21, and the second driving unit 23 are configured in the same manner as the first arm 18, the first moving table 20, and the first driving unit 22, and are arranged side by side on the first moving table 20. ing. In addition, since these 1st and 2nd moving bases 20 and 21 are arranged in parallel, when each moving base 20 and 21 moves to the arrow A direction, the glass substrate 16 hold | maintained by each arm 18 and 19 is the other. In order not to interfere with the glass substrate or the arm, the vertical state is always set.
[0016]
The glass substrate 16 held by the first arm 18 or the second arm 19 is selectively set in the exposure unit 11. For example, when the glass substrate 16 held by one arm is set in the exposure unit 11 and exposed, the exposed glass substrate 16 is discharged and the unexposed glass substrate 16 is supplied by the other arm. Is called.
[0017]
The exposure unit 11 includes an exposure unit 30, a mask exchange unit 31, a substrate stage 32, and a stage drive unit 33. The exposure unit 30 is composed of a light source and a mirror (not shown), and irradiates the glass substrate 16 with a uniform amount of light through the photomask 35 to expose the mask pattern onto the photosensitive colored layer 16a.
[0018]
The mask exchange unit 31 includes a mask holder 36 and a holder moving unit 37. The mask holder 36 is movable between an exposure position and a mask exchange position by a holder moving unit 37. A photomask 35 is set in the mask holder 36. The photomask 35 is prepared for front surface exposure and back surface exposure. The photomask for surface exposure is selectively set when exposing each of the R, G, and B photosensitive colored layers. In these photomasks, a pattern corresponding to the pixel pattern formed on the glass substrate 16 is formed. The back exposure photomask is set when the K photosensitive colored layer is exposed, and is used to create a black matrix by exposing the glass substrate 16 from the back. This photomask for backside exposure is configured in a frame shape covering the peripheral edge of the glass substrate 16, and is made of glass.
[0019]
If the photomask 35 is made of a metal material, it is difficult to ensure the manufacturing accuracy for the large glass substrate 16 and the cost is increased. In addition, sufficient exposure accuracy is obtained due to problems such as thermal deformation and insufficient rigidity during use. I can't. In the case of glass, it is excellent in manufacturing accuracy and it is easy to ensure exposure accuracy. In particular, when the K photosensitive colored layer is exposed, it is exposed to the back surface, and unlike other surface-exposed masks for each of the R, G, and B photosensitive colored layers, it has a frame shape and is structurally rigid. Since it becomes insufficient, the accuracy can be further ensured by using glass.
[0020]
The substrate stage 32 sucks and holds the glass substrate 16 transferred to the exposure unit 11 by the arms 18 and 19 and is attached to the stage drive unit 33 via the stage support base 38. The substrate stage 32 is configured in a rectangular shape larger than the glass substrate 16, and a suction pad (not shown) is provided on the surface. In the substrate stage 32, notches are formed at positions corresponding to the arms 18 and 19. This notch allows the arms 18 and 19 to pass when the glass substrate 16 is received from the arms 18 and 19 during surface exposure.
[0021]
The stage drive unit 33 moves the substrate stage 32 back and forth in the direction of arrow D to selectively set the glass substrate 16 at the delivery position and the exposure position. In the delivery position, the glass substrate 16 is received from each of the arms 18 and 19. At the exposure position, the glass substrate 16 is positioned close to the photomask 35. The stage drive unit 33 is provided with an adjustment mechanism. The adjustment mechanism adjusts the position of the substrate stage 32 in the X, Y, Z, and θ directions, and adjusts the relative position and alignment between the photomask 35 and the glass substrate 16.
[0022]
At the time of backside exposure, the frame-shaped attachment 39 is attached to the substrate stage 32, and the glass substrate 16 is attached by adsorbing the peripheral portion of the surface of the glass substrate 16 to which the photosensitive colored layer 16a has not been transferred. Retained. In the case of this back exposure, the arms 18 and 19 are positioned on the exposure unit 30 side with respect to the glass substrate 16, so that when the glass substrate 16 is set at the exposure position, the arms 18 and 19 interfere. Resulting in. For this reason, after returning each arm 18 and 19 to the board | substrate delivery position 26 and retracting, the substrate stage 32 is advanced and the glass substrate 16 is set to an exposure position. After the back surface exposure is completed, the arm that has been retracted after returning the substrate stage 32 to the delivery position is returned to the delivery position, and the glass substrate 16 is delivered to the arm. Note that the frame-shaped attachment 39 may be an individual suction part that does not interfere with the photosensitive colored layer 16a as long as there is no problem in suction holding of the glass substrate 16.
[0023]
Next, the operation of the above configuration will be described with reference to FIGS. Here, in FIGS. 3 and 4, reference numeral 16 b indicates a glass substrate held by the first arm 18, and reference numeral 16 c indicates a glass substrate held by the second arm 19. A shaded portion 16a indicates a photosensitive colored layer laminated on the surface of each glass substrate 16b, 16c.
[0024]
The exposure of each photosensitive colored layer of R, G, and B exposed from the surface side of the glass substrate will be described. When performing the surface exposure, the mask replacement unit 31 replaces the photomask 35 for surface exposure on which a predetermined pattern is formed according to the photosensitive colored layer to be exposed. The glass substrate 16b having the photosensitive colored layer 16a laminated on the surface is supplied by a robot hand (not shown). At this time, the glass substrate 16b is conveyed in a horizontal state with the surface on which the photosensitive colored layer 16a is laminated facing up, being sucked and held by the robot hand.
[0025]
As shown in FIG. 3 (1), the robot hand inserts the glass substrate 16b into the casing 13 from the substrate entrance 15 and delivers the glass substrate 16b to the first arm 18 waiting in a horizontal state. The delivery of the glass substrate 16b is completed by confirming that the glass substrate 16b is sucked and held by the first arm 18, and then the robot hand is lowered from the first arm 18 and pulled out. In addition, the glass substrate 16 c previously put and held by the second arm 19 is exposed in the exposure unit 11.
[0026]
The first arm 18 rotates 90 degrees in the direction of arrow B after receiving the glass substrate 16b. As a result, as shown in FIG. 3B, the surface of the photosensitive colored layer 16a is directed to the exposure unit side and the surface exposure vertical state is obtained.
[0027]
Thereafter, as shown in FIG. 3 (3), the first arm 18 and the second arm 19 are moved by the respective moving bases 20 and 21, and their positions are changed. As a result, as shown in FIG. 3 (4), the second arm 19 holding the exposed glass substrate 16c is set at the substrate delivery position 26, and the first arm 18 holding the unexposed glass substrate 16b is exposed. Set in part 11.
[0028]
Thereafter, the second arm 19 rotates 90 degrees in the direction of arrow C, and changes from the surface exposure vertical state of FIG. 3 (4) to the horizontal state of FIG. 3 (5). Next, a robot hand is inserted from the substrate entrance 15, and the exposed glass substrate 16 c is discharged by this robot hand.
[0029]
As shown in FIG. 1, the glass substrate 16c set in the exposure unit 11 in FIG. 3 (1) is transferred from the second arm 19 to the substrate stage 32 by the forward movement of the substrate stage 32, and is set at the exposure position. Is done. At this time, since the substrate stage 32 and the second arm 19 move relative to each other so that the second arm 19 comes out of the notch formed in the substrate stage 32, the second arm 19 and the substrate stage 32 do not interfere with each other. Absent.
[0030]
When the glass substrate 16 c is exposed by the exposure unit 30, the glass substrate 16 c is transferred from the substrate stage 32 to the second arm 19 when the substrate stage 32 moves backward and intersects the second arm 19. The glass substrate 16b set in the exposure unit 11 in FIG. 3 (4) is also transferred to the substrate stage 32 by the same operation as described above and subjected to surface exposure. Thereafter, the glass substrate is alternately sent to the exposure unit 11 and subjected to surface exposure using the first arm 18 and the second arm 19 by the same operation as in FIGS.
[0031]
Next, exposure of the K photosensitive colored layer exposed from the back side of the glass substrate will be described. When performing this backside exposure, a frame-shaped attachment 39 is attached to the substrate stage 32 as shown by a two-dot chain line in FIG. By this attachment 39, only the peripheral portion on the surface side of the glass substrate is sucked and held. At the time of backside exposure, the mask replacement unit 31 replaces the photomask 35 with a frame-like backside mask.
[0032]
As shown in FIG. 4 (1), the glass substrate 16b is transferred from the left side in the drawing to the first arm 18 waiting at the substrate transfer position 26 through the substrate entrance 15 by the robot hand in the same manner as described above. Retained. When the delivery is completed and it is confirmed that the robot hand is pulled out to the left in the figure, the first arm 18 rotates 90 degrees in the direction of arrow C. As a result, as shown in FIG. 4B, the glass substrate 16b is in the back exposure vertical state, and waits at the substrate delivery position 26 until the exposure of the glass substrate 16c is completed. At this time, the second arm 19 is also waiting at the substrate delivery position 26.
[0033]
The standby state of the second arm 19 is that the second arm 19 is positioned on the exposure unit 30 side with respect to the glass substrate 16c in the back surface exposure vertical state. Because it becomes. For this reason, since the glass substrate 16c cannot be delivered between the substrate stage 32 and the second arm 19 as in the case of surface exposure, after the glass substrate 16c is delivered to the substrate stage 32, the second arm 19 is Retreat to the board delivery position 26. The same applies to the delivery of the glass substrate 16b held by the first arm 18.
[0034]
When the exposure unit 11 receives the glass substrate 16c from the second arm 19, after confirming that the second arm 19 has been retracted to the substrate delivery position 26, the substrate stage 32 moves forward and sets the glass substrate 16c to the exposure position. To do. A photomask 35 for back exposure is set at the exposure position, and back exposure is performed. After the exposure, the substrate stage 32 moves back to the delivery position. Thereafter, the waiting second arm 19 enters the exposure unit 11 and receives the exposed glass substrate 16 c from the substrate stage 32.
[0035]
Thereafter, as shown in FIG. 4 (3), the first arm 18 and the second arm 19 are moved by the respective moving bases 20 and 21, and their positions are changed. As a result, as shown in FIG. 4 (4), the second arm 19 holding the exposed glass substrate 16c is set at the substrate delivery position 26, and the first arm 18 holding the unexposed glass substrate 16b is exposed. Set in part 11.
[0036]
Thereafter, the second arm 19 rotates 90 degrees in the direction of arrow B, and changes from the back-surface exposure vertical state of FIG. 4 (4) to the horizontal state of FIG. Next, a robot hand is inserted from the substrate entrance 15, and the exposed glass substrate 16 c is discharged by this robot hand. Thereafter, the glass substrate is alternately sent to the exposure unit 11 and exposed on the back surface by using the first arm 18 and the second arm 19 by the same operation as in FIGS.
[0037]
In the above-described embodiment, the photomask is exchanged for each of the photosensitive colored layers of R, G, and B. However, the photomask is replaced with a single photomask at a predetermined pitch according to each photosensitive colored layer. You may make it move.
[0038]
【The invention's effect】
According to the substrate exposure method of the present invention, the front and back sides of the substrate are reversed and the mask is exchanged according to the photosensitive resin layer, and the substrate is exposed from the front side and the back side by one exposure unit. A single exposure unit or the like is sufficient, which reduces equipment costs, saves space, and simplifies the process. Further, since the mask used for exposure from the back side of the substrate is made of glass, the back side exposure with high accuracy is possible.
[Brief description of the drawings]
FIG. 1 is a plan view schematically showing a substrate exposure apparatus of the present invention.
FIG. 2 is a perspective view showing an outline of a substrate reversal transfer unit.
FIG. 3 is a schematic view showing the movement of the glass substrate in the substrate exposure apparatus during surface exposure.
FIG. 4 is a schematic view showing the movement of a glass substrate in a substrate exposure apparatus during backside exposure.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 Substrate exposure apparatus 11 Exposure part 12 Substrate inversion transfer part 13 Casing 15 Substrate entrance / exit 16 Glass substrate 18 1st arm 19 2nd arm 20 1st moving table 21 2nd moving table 22 1st drive part 23 2nd drive part 24 times Moving shaft 26 Substrate delivery position 30 Exposure unit 31 Mask exchange unit 32 Substrate stage 33 Stage drive unit 35 Photomask 36 Mask holder 37 Holder moving unit 38 Stage support base 39 Attachment

Claims (8)

A transparent substrate having a photosensitive resin layer provided on the surface is held substantially vertically, and the photosensitive resin layer is exposed from the front surface side or the back surface side of the substrate through a mask corresponding to the photosensitive resin layer by one exposure unit. A substrate exposure method for exposing
Reversibly hold the front and back of the substrate, and transfer the substrate to the exposure unit on the front or back side,
The surface of the substrate transferred to the exposure unit and the portion where the photosensitive resin layer is not formed, or holding the back surface of the substrate, positioning the substrate to the exposure unit,
Replace the mask according to the front and back of the substrate ,
The exposure unit selectively performs front side exposure for exposing the photosensitive resin layer from the front side and back side exposure for exposing the photosensitive resin layer from the back side to the substrate. Substrate exposure method. A substrate exposure apparatus that holds a transparent substrate with a photosensitive resin layer provided on the surface substantially vertically and exposes from the front or back surface,
One exposure part for exposing the photosensitive resin layer of the substrate;
A portion of the surface of the substrate where the photosensitive resin layer is not formed, or a substrate stage that holds the back surface of the substrate and positions the substrate to the exposure unit;
A substrate reversal transfer unit that holds the front and back of the substrate in a reversible manner and delivers the substrate to the substrate stage with the front side or the back side,
A substrate photosensitive device comprising: a mask exchanging unit for exchanging the mask according to the front and back sides of the substrate. The substrate stage is provided movably between a substrate transfer position with the substrate reversal transfer unit and an exposure position at which the substrate is exposed by the exposure unit,
The substrate exposure apparatus according to claim 2, wherein the substrate reversal transfer unit moves the substrate between the substrate delivery position and a substrate reversal position retracted from the substrate delivery position.   4. The substrate exposure apparatus according to claim 3, wherein at the substrate reversal position, supply of the substrate before exposure and discharge of the exposed substrate are performed.   4. The substrate exposure apparatus according to claim 2, wherein a plurality of the substrate inversion transfer units are provided, and the substrates are alternately set on the substrate stage.   The said substrate stage is equipped with the attachment for hold | maintaining the part in which the said photosensitive resin layer is not formed in the surface or back surface of the said board | substrate so that attachment or detachment is possible. The substrate exposure apparatus described.   The substrate exposure apparatus according to any one of claims 2 to 6, wherein the mask used for exposure from the back side of the substrate is made of glass.   The photosensitive resin layer is any one of a photosensitive red colored layer, a photosensitive green colored layer, a photosensitive blue colored layer, and a photosensitive black colored layer, a photosensitive red colored layer, a photosensitive green colored layer, and a photosensitive material. 8. The substrate exposure apparatus according to claim 2, wherein exposure is performed from the front side in the case of a blue colored layer, and exposure is performed from the back side in the case of a photosensitive black colored layer.

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