JP4310469B2 - Dielectric resonator, dielectric filter, and method of manufacturing dielectric filter - Google Patents

Dielectric resonator, dielectric filter, and method of manufacturing dielectric filter Download PDF

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JP4310469B2
JP4310469B2 JP2006528381A JP2006528381A JP4310469B2 JP 4310469 B2 JP4310469 B2 JP 4310469B2 JP 2006528381 A JP2006528381 A JP 2006528381A JP 2006528381 A JP2006528381 A JP 2006528381A JP 4310469 B2 JP4310469 B2 JP 4310469B2
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floating electrode
dielectric
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JPWO2006001119A1 (en
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聡一 中村
英幸 加藤
博文 宮本
秀樹 塚本
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Murata Manufacturing Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H01P11/007Manufacturing frequency-selective devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00Auxiliary devices
    • H01P1/20Frequency-selective devices, e.g. filters
    • H01P1/201Filters for transverse electromagnetic waves
    • H01P1/205Comb or interdigital filters; Cascaded coaxial cavities
    • H01P1/2056Comb filters or interdigital filters with metallised resonator holes in a dielectric block

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Description

この発明は、高周波回路に適用される誘電体共振器、誘電体フィルタおよび誘電体フィルタの製造方法に関するものである。   The present invention relates to a dielectric resonator applied to a high frequency circuit, a dielectric filter, and a method for manufacturing the dielectric filter.

図9は誘電体ブロックを用いた従来の誘電体共振器の構造例であり、その外観斜視図である。   FIG. 9 is a structural example of a conventional dielectric resonator using a dielectric block, and is an external perspective view thereof.

図9に示すように、略直方体形状の誘電体ブロック1の内部には、内面に共振導体3を形成した共振導体形成孔2が設けられており、共振導体形成孔2の一方の端面を除く五面の外面には外導体4が形成されている。そして誘電体ブロック1の残りの一面を、前記外導体が形成されていない開放部5としている。これら外導体4と共振導体3とにより、開放部5を開放端面とする誘電体共振器17を構成している。   As shown in FIG. 9, a resonant conductor forming hole 2 in which a resonant conductor 3 is formed on the inner surface is provided inside a substantially rectangular parallelepiped dielectric block 1, excluding one end face of the resonant conductor forming hole 2. Outer conductors 4 are formed on the outer surfaces of the five surfaces. The remaining one surface of the dielectric block 1 is an open portion 5 where the outer conductor is not formed. The outer conductor 4 and the resonant conductor 3 constitute a dielectric resonator 17 having the open portion 5 as an open end face.

また、前記誘電体共振器を備えた誘電体フィルタとして、複数の共振導体形成孔と入出力電極とを持つ構造のものもある。   In addition, some dielectric filters having the dielectric resonator have a structure having a plurality of resonant conductor forming holes and input / output electrodes.

これらの誘電体共振器の共振周波数、誘電体フィルタの周波数特性、各共振器同士の結合係数、入出力電極と共振導体形成孔との間の結合係数を調整する方法に、共振導体の一部を部分削除する方法がある(例えば特許文献1参照)。   To adjust the resonance frequency of these dielectric resonators, the frequency characteristics of the dielectric filter, the coupling coefficient between the resonators, and the coupling coefficient between the input / output electrodes and the resonant conductor formation hole, There is a method of partially deleting (see, for example, Patent Document 1).

このような構成では、共振導体に削除部位を設けることにより、外導体に設けられた入出力電極や隣接する共振導体などの導体と、その導体に対向する削除部位との間で相互容量を調整して、結合係数を調整する。また、このような構成では、外導体と対向する位置に削除部位を形成することにより、等価的な共振器長を変化させて、共振周波数を調整する。   In such a configuration, the mutual capacitance is adjusted between the input / output electrodes provided on the outer conductor and the adjacent resonant conductor, etc., and the deleted part facing the conductor by providing the deleted part on the resonant conductor. Then, the coupling coefficient is adjusted. Further, in such a configuration, the resonance frequency is adjusted by changing the equivalent resonator length by forming a deletion portion at a position facing the outer conductor.

そして、このような共振導体を削除する際には、リュータのような加工器具が用いられる。
特開平5−343903号公報
When removing such a resonant conductor, a processing tool such as a router is used.
JP-A-5-343903

ところで前記共振導体の部分削除による特性調整方法では、削除部位の位置、サイズ、個数により前記特性を調整できるが、前記リューター等の機械的加工器具による方法では、削除時に熱が発生する。そのため、熱による特性変化による調整精度の低下と、誘電体セラミックスが熱還元することによる無負荷Q値の劣化とが伴う。   By the way, in the characteristic adjusting method by partial deletion of the resonant conductor, the characteristic can be adjusted by the position, size, and number of deleted parts. However, in the method using a mechanical processing tool such as the luter, heat is generated at the time of deletion. For this reason, there is a decrease in adjustment accuracy due to a characteristic change due to heat, and a deterioration in unloaded Q value due to thermal reduction of the dielectric ceramics.

また、共振器の小型化に伴い、機械的加工器具を用いた削除部位の加工にも加工器具自体のサイズの限界により、共振導体形成孔の内部に挿入することに困難が伴う。   Further, along with the downsizing of the resonator, it is difficult to insert the inside of the resonant conductor forming hole due to the size limit of the processing tool itself in processing of the deleted portion using the mechanical processing tool.

そこで、この発明の目的は、上記の問題を解決し、特性調整の精度を向上させ、特性劣化を抑制し、小型化に対応した誘電体共振器、誘電体フィルタ、および誘電体フィルタの製造方法を提供することにある。   Accordingly, an object of the present invention is to solve the above-described problems, improve the accuracy of characteristic adjustment, suppress characteristic deterioration, and cope with miniaturization. A dielectric resonator, a dielectric filter, and a dielectric filter manufacturing method Is to provide.

(1) この発明の誘電体共振器は、内面に共振導体を形成した共振導体形成孔を誘電体ブロックに設け、該誘電体ブロックの外面に外導体を形成し、前記共振導体形成孔の少なくとも一方の開口部付近に、前記共振導体の端部に隣接して前記端部を開放端にする開放部を設けており、さらに前記共振導体から電気的に絶縁された浮き電極部と、該浮き電極部を周回して形成された浮き電極絶縁部とが、前記開放部付近の共振導体で囲まれている、または、前記共振導体と前記開放部とで囲まれている

(1) In the dielectric resonator according to the present invention, a resonant conductor forming hole in which a resonant conductor is formed on the inner surface is provided in the dielectric block, an outer conductor is formed on the outer surface of the dielectric block, and at least the resonant conductor forming hole is provided. An open portion having an open end adjacent to the end of the resonant conductor is provided near one opening, and the floating electrode is electrically insulated from the resonant conductor, and the floating A floating electrode insulating part formed around the electrode part is surrounded by a resonant conductor in the vicinity of the open part, or is surrounded by the resonant conductor and the open part .

このように、浮き電極および浮き電極絶縁部を設けることにより、これらが形成された共振器の共振導体の形状が変化して、共振器の特性が変化する。この際、削除部位を浮き電極形状にすることにより、削除面積が浮き電極絶縁部のみに抑えられる。ここで浮き電極絶縁部のみを削除した場合と、浮き電極部自体も含めて削除した場合とでは同じ調整効果が得られる。   Thus, by providing the floating electrode and the floating electrode insulating portion, the shape of the resonant conductor of the resonator in which these are formed changes, and the characteristics of the resonator change. At this time, by forming the deleted portion into a floating electrode shape, the deleted area is increased and only the floating electrode insulating portion is suppressed. Here, the same adjustment effect is obtained when only the floating electrode insulating part is deleted and when the floating electrode part itself is also deleted.

(2) また、この発明の誘電体共振器は、前記開放部と前記浮き電極絶縁部とが、それぞれの一部を共有していることを特徴としている。 (2) Moreover, the dielectric resonator according to the present invention is characterized in that the open portion and the floating electrode insulating portion share a part thereof.

この形状により、共有する部位の削除が不要となるので、削除面積を残りの浮き電極絶縁部のみに抑えられる。   With this shape, it is not necessary to delete the shared part, so that the area to be deleted can be suppressed only to the remaining floating electrode insulating parts.

(3) また、この発明の誘電体共振器は、前記開放部と前記浮き電極絶縁部とが分離形成されていることを特徴としている。 (3) Further, the dielectric resonator according to the present invention is characterized in that the open portion and the floating electrode insulating portion are separately formed.

この形状により、浮き電極部と浮き電極絶縁部の形成箇所に制約を受けない。   Due to this shape, there are no restrictions on the formation positions of the floating electrode portion and the floating electrode insulating portion.

(4) また、この発明の誘電体共振器は、1つの前記共振導体形成孔に設けられた前記開放部またはその付近に、2以上の前記浮き電極部を備えたことを特徴としている。 (4) Further, the dielectric resonator according to the present invention is characterized in that two or more floating electrode portions are provided in or near the open portion provided in one of the resonance conductor forming holes.

この形状により、複数回での調整による削除面積の増加においても、削除面積を最小限に抑えられる。   With this shape, even when the deleted area is increased by multiple adjustments, the deleted area can be minimized.

(5) また、この発明の誘電体フィルタは、前述のいずれかの誘電体共振器と該誘電体共振器に結合する入出力手段とを備えたことを特徴としている。 (5) The dielectric filter of the present invention is characterized by including any one of the above-described dielectric resonators and input / output means coupled to the dielectric resonator.

この構成により、前述のように浮き電極部および浮き電極絶縁部が形成された共振器と、入出力電極との結合係数や、共振器間の結合係数や、共振器長に基づく各共振器の周波数を調整する場合に、削除部位を浮き電極形状にすることにより、削除面積が浮き電極絶縁部のみに抑えられ、この場合にも、前述の誘電体共振器と同様に、浮き電極部自体も含めて削除したときと同じ調整効果が得られる。   With this configuration, the resonator having the floating electrode portion and the floating electrode insulating portion formed as described above and the coupling coefficient between the input / output electrodes, the coupling coefficient between the resonators, and the resonator length based on the resonator length When adjusting the frequency, the deleted area is made the floating electrode shape, so that the deleted area is suppressed only to the floating electrode insulating part, and in this case as well, the floating electrode part itself is the same as the dielectric resonator described above. The same adjustment effect can be obtained as when including and deleting.

(6) また、この発明の誘電体フィルタの製造方法は、前記共振導体の形成領域内に前記浮き電極絶縁部を形成することにより、前記共振導体から分離して前記浮き電極部を設ける共振導体除去工程によって、フィルタ特性を定めることを特徴としている。 (6) In the dielectric filter manufacturing method according to the present invention, the floating electrode insulating portion is formed in a region where the resonant conductor is formed, thereby providing the floating electrode portion separated from the resonant conductor. The filter characteristic is determined by the removing step.

この共振導体除去工程により、共振器間の結合係数や、共振器と入出力電極との外部結合の強さや、共振器長に基づく各共振器の共振周波数を調整する。この際、削除部位を浮き電極形状にすることにより、削除面積を浮き電極絶縁部のみに抑えることで、削除面積を抑制しながら、浮き電極部と浮き電極絶縁部を共に削除したときと同じ調整効果を実現する。   By this resonance conductor removing step, the resonance frequency of each resonator is adjusted based on the coupling coefficient between the resonators, the strength of external coupling between the resonator and the input / output electrodes, and the resonator length. At this time, the same adjustment as when both the floating electrode part and the floating electrode insulating part were deleted while suppressing the deleted area by limiting the deleted area to the floating electrode insulating part by making the deleted part into a floating electrode shape. Realize the effect.

(7) またこの発明の誘電体フィルタの製造方法は、共振導体除去工程が、前記浮き電極絶縁部のレーザー加工による導体の除去工程であることを特徴としている。 (7) Further, the dielectric filter manufacturing method of the present invention is characterized in that the resonant conductor removing step is a conductor removing step by laser processing of the floating electrode insulating portion.

この加工法による工程により、共振導体形成孔のサイズにかかわらず、共振導体形成孔の外部からの照射によって加工を行う。   By this process, a process is performed by irradiation from the outside of the resonant conductor forming hole regardless of the size of the resonant conductor forming hole.

(1) この発明によれば、削除面積を浮き電極絶縁部のみに抑制できるために、加工時に発生する熱による無負荷Qの劣化と特性変化を抑制でき、誘電体共振器の調整精度を向上させることができる。 (1) According to the present invention, since the deleted area can be suppressed only to the floating electrode insulating portion, it is possible to suppress deterioration of the no-load Q and characteristic change due to heat generated during processing, and improve the adjustment accuracy of the dielectric resonator. Can be made.

(2) また、この発明によれば、削除面積を共有部位以外の浮き電極絶縁部のみにできるために、加工時に発生する熱がさらに抑制でき、無負荷Qの劣化と特性変化量の変化が抑制でき、誘電体共振器の調整精度を向上させることができる。 (2) Further, according to the present invention, since the deleted area can be made only for the floating electrode insulating portion other than the shared portion, the heat generated during processing can be further suppressed, and the deterioration of the unloaded Q and the change in the characteristic change amount can be achieved. Therefore, the adjustment accuracy of the dielectric resonator can be improved.

(3) また、この発明によれば、浮き電極部と浮き電極絶縁部の形成箇所の決定に制約を受けないので、誘電体共振器の設計の自由度を高くすることができる。 (3) Moreover, according to this invention, since determination of the formation location of a floating electrode part and a floating electrode insulation part is not restricted, the freedom degree of design of a dielectric resonator can be made high.

(4) また、この発明によれば、複数回での調整による削除面積の増加においても、削除面積を最小限に抑えることができ、加工時に発生する熱による無負荷Qの劣化と特性変化が抑制でき、誘電体共振器の調整精度を向上させることができる。 (4) Further, according to the present invention, even when the deleted area is increased by multiple adjustments, the deleted area can be minimized, and deterioration of the unloaded Q due to heat generated during processing and characteristic changes Therefore, the adjustment accuracy of the dielectric resonator can be improved.

(5) また、この発明によれば、削除面積を浮き電極絶縁部のみに抑制できるために、加工時に発生する熱による無負荷Qの劣化と特性変化が抑制でき、誘電体フィルタの調整精度を向上させることができる。 (5) Further, according to the present invention, since the deleted area can be suppressed only to the floating electrode insulating portion, it is possible to suppress deterioration of the no-load Q and characteristic change due to heat generated during processing, and to improve the adjustment accuracy of the dielectric filter. Can be improved.

(6) また、この発明によれば、削除面積を浮き電極絶縁部のみに抑制できるために、加工時に発生する熱と加工時間が抑制でき、誘電体フィルタの無負荷Qの劣化と特性変化が抑制でき、特性調整精度を向上させることができる。 (6) Further, according to the present invention, since the deleted area can be suppressed only to the floating electrode insulating portion, heat and processing time generated during processing can be suppressed, and deterioration of the unloaded Q of the dielectric filter and characteristic change can be prevented. This can be suppressed and the characteristic adjustment accuracy can be improved.

(7) また、この発明によれば、レーザー加工により削除部位を削除することにより、加工器具を共振導体形成孔内部に挿入することなく誘電体フィルタの特性調整用の加工を行うことができる。
また、誘電体をレーザー加工すると、リューター等の機械的加工器具による加工時以上の熱が発生し、機械的加工器具による加工に比べ無負荷Qの劣化量や特性変化量は大きくなってしまう場合がある。しかし、この発明によれば削除面積を浮き電極絶縁部の面積のみに抑制するために、熱の発生も抑制できる。これにより、無負荷Qの劣化量や特性変化量を大幅に抑制することができる。
また、無負荷Qの劣化を回復させる処理を行う場合の処理前後での特性変化量も、この発明の製造方法を採用することで小さくすることができる。これにより、無負荷Qの回復処理後の特性調整精度を改善することができる。
(7) Further, according to the present invention, by deleting the deleted portion by laser processing, it is possible to perform processing for adjusting the characteristics of the dielectric filter without inserting a processing tool into the resonance conductor forming hole.
In addition, when laser processing dielectrics, more heat is generated than when processing with a machine tool such as a leuter, and the amount of deterioration of the unloaded Q and the amount of change in characteristics increase compared to processing with a mechanical tool. There is. However, according to the present invention, since the deleted area is limited only to the area of the floating electrode insulating portion, generation of heat can also be suppressed. Thereby, the deterioration amount and characteristic change amount of the no-load Q can be significantly suppressed.
Further, the amount of change in characteristics before and after the process when the process of recovering the deterioration of the no-load Q can be reduced by adopting the manufacturing method of the present invention. As a result, it is possible to improve the characteristic adjustment accuracy after the unloaded Q recovery process.

〈第1の実施形態〉
図1は誘電体フィルタ16の外観斜視図である。図2(A)は図1におけるB−B部分の断面図である。図2(B)は図1に記した誘電体フィルタの上面図である。
<First Embodiment>
FIG. 1 is an external perspective view of the dielectric filter 16. 2A is a cross-sectional view taken along the line BB in FIG. FIG. 2B is a top view of the dielectric filter shown in FIG.

図1において、略直方体形状の誘電体ブロック1には、それぞれの内面に共振導体3A、3B、3Cを備えた複数の共振導体形成孔2A、2B、2Cを設けている。誘電体ブロック1の上端面を除く五面は外導体4を設けている。共振導体形成孔2A、2B、2Cは、図1上端面側と下端面側とに貫通するように設け、図1下端面側では共振導体3A、3B、3Cと外導体4を導通させている。また、入出力電極6A、6Bを形成している。また、共振導体形成孔2A、2B、2Cの上端部には、それぞれ浮き電極部7A、7B、7Cと浮き電極絶縁部15A、15B、15Cとを形成している。このような構成により誘電体フィルタ16は、4分の1波長フィルタとなっている。   In FIG. 1, a substantially rectangular parallelepiped-shaped dielectric block 1 is provided with a plurality of resonance conductor forming holes 2A, 2B, 2C provided with resonance conductors 3A, 3B, 3C on the inner surfaces thereof. The outer conductor 4 is provided on the five surfaces except the upper end surface of the dielectric block 1. The resonant conductor forming holes 2A, 2B, and 2C are provided so as to penetrate the upper end surface side and the lower end surface side in FIG. 1, and the resonant conductors 3A, 3B, and 3C and the outer conductor 4 are electrically connected on the lower end surface side in FIG. . In addition, input / output electrodes 6A and 6B are formed. Floating electrode portions 7A, 7B, and 7C and floating electrode insulating portions 15A, 15B, and 15C are formed at the upper ends of the resonant conductor forming holes 2A, 2B, and 2C, respectively. With this configuration, the dielectric filter 16 is a quarter wavelength filter.

図2において、図1と同一部分には同一符号を付している。Cabは共振導体3A−3B間の開放部付近に生じる容量を表している。また、Cbcは共振導体3B−3C間の開放部付近に生じる容量を表している。Ceは共振導体3Cと入出力電極6Bとの間に生じる容量を表している。Caは共振導体3Aと外導体4の間に生じる自己容量を表している。   In FIG. 2, the same parts as those in FIG. Cab represents a capacitance generated in the vicinity of the open portion between the resonant conductors 3A and 3B. Cbc represents a capacitance generated near the open portion between the resonant conductors 3B-3C. Ce represents a capacitance generated between the resonant conductor 3C and the input / output electrode 6B. Ca represents a self-capacitance generated between the resonant conductor 3 </ b> A and the outer conductor 4.

図1において、浮き電極部7Aと浮き電極絶縁部15Aとを、外導体4に対向する部位に形成している。この構造により、共振導体3Aから成る共振器の等価的な共振器長を短くするとともに、共振導体3Aと外導体4との対向する面積を減らし、自己容量(図2中のCa)を小さくする。共振器長と自己容量の変化により、共振導体3Aによる共振器の共振周波数は、相乗的に高くなる。   In FIG. 1, the floating electrode portion 7 </ b> A and the floating electrode insulating portion 15 </ b> A are formed in a portion facing the outer conductor 4. With this structure, the equivalent resonator length of the resonator composed of the resonant conductor 3A is shortened, the area where the resonant conductor 3A and the outer conductor 4 face each other is reduced, and the self-capacitance (Ca in FIG. 2) is reduced. . Due to the change in the resonator length and the self-capacitance, the resonance frequency of the resonator by the resonance conductor 3A is synergistically increased.

また、浮き電極部7Bと浮き電極絶縁部15Bとを、隣り合う共振導体形成孔2Aに対向する部位に形成している。この構造により、共振導体3Bから成る共振器の等価的な共振器長を短くし、共振周波数を高く調整している。また、該構造により共振導体3A,3Bそれぞれの開放部側の対向する面積を減らし、共振器間の容量(図2中のCab)を小さくすることによって結合係数を調整している。   Further, the floating electrode portion 7B and the floating electrode insulating portion 15B are formed in a portion facing the adjacent resonance conductor forming hole 2A. With this structure, the equivalent resonator length of the resonator composed of the resonance conductor 3B is shortened, and the resonance frequency is adjusted high. In addition, the coupling coefficient is adjusted by reducing the opposing area on the open side of each of the resonant conductors 3A and 3B and reducing the capacitance between the resonators (Cab in FIG. 2).

この周波数調整と結合係数調整は、浮き電極部7Bおよび浮き電極絶縁部15Bが軸方向に長く幅方向に短い場合には、共振器間の結合係数と当該共振器の共振周波数を同時的に行うことができる。また、浮き電極部7Bおよび浮き電極絶縁部15Bが軸方向に短く幅方向に長い場合には、共振器間の結合係数のみを略独立的に行うことができる。   When the floating electrode portion 7B and the floating electrode insulating portion 15B are long in the axial direction and short in the width direction, the frequency adjustment and the coupling coefficient adjustment are performed simultaneously with the coupling coefficient between the resonators and the resonance frequency of the resonator. be able to. Further, when the floating electrode portion 7B and the floating electrode insulating portion 15B are short in the axial direction and long in the width direction, only the coupling coefficient between the resonators can be performed substantially independently.

また、浮き電極部7Cと浮き電極絶縁部15Cとを、入出力電極6Bに対向する部位に形成している。この構造により、共振導体3Cから成る共振器の等価的な共振器長を短くし、共振周波数を高くなるように定めている。また、該構造により共振導体3Cによる共振器と入出力電極6Bとの間の容量(図2中の容量Ce)を減少させ、その共振器と入出力電極6Bとの間の外部結合の強さを、浮き電極7Cと浮き電極絶縁部15Cが無い場合に比べて小さくなるように定めている。   Further, the floating electrode portion 7C and the floating electrode insulating portion 15C are formed in a portion facing the input / output electrode 6B. With this structure, the equivalent resonator length of the resonator composed of the resonant conductor 3C is shortened and the resonance frequency is increased. In addition, the structure reduces the capacitance (capacitance Ce in FIG. 2) between the resonator by the resonant conductor 3C and the input / output electrode 6B, and the strength of external coupling between the resonator and the input / output electrode 6B. Is determined to be smaller than when there is no floating electrode 7C and floating electrode insulating portion 15C.

また、図3(A)は第1の実施形態における浮き電極部7Aと浮き電極絶縁部15Aの拡大図である。図3(B)は図3(A)におけるY−Y断面における断面拡大図である。   FIG. 3A is an enlarged view of the floating electrode portion 7A and the floating electrode insulating portion 15A in the first embodiment. FIG. 3B is an enlarged cross-sectional view of the YY cross section in FIG.

図3(A)において、9A、9B、9C、9Dは浮き電極絶縁部の共振導体と接する角であり、8A、8B、8C、8Dは浮き電極絶縁部の浮き電極部と接する角である。   In FIG. 3A, 9A, 9B, 9C, and 9D are angles in contact with the resonant conductor of the floating electrode insulating portion, and 8A, 8B, 8C, and 8D are angles in contact with the floating electrode portion of the floating electrode insulating portion.

当該実施形態においては共振導体に形成した浮き電極部7Aと浮き電極絶縁部15Aとを、辺9A−9Dにおいて一部共有させている。また、浮き電極絶縁部15Aの各辺の幅を0.05mm、長さを辺8A−8Bは0.45mm、9B−9Cは0.5mmとしている。また、図3(B)において浮き電極絶縁部15Aを深さ5μmの溝形状として、外導体4と浮き電極部7Aとを絶縁をしている。   In this embodiment, the floating electrode portion 7A and the floating electrode insulating portion 15A formed on the resonant conductor are partially shared by the sides 9A-9D. Further, the width of each side of the floating electrode insulating portion 15A is 0.05 mm, and the length is 0.45 mm for the sides 8A-8B and 0.5 mm for 9B-9C. Further, in FIG. 3B, the floating electrode insulating portion 15A has a groove shape with a depth of 5 μm, and the outer conductor 4 and the floating electrode portion 7A are insulated.

ここで、浮き電極部7Aおよび浮き電極絶縁部15Aがある場合と、浮き電極部7Aが除去された場合とで、導体削除工程における削除面積を比べる。図2(A)において、浮き電極部7A及び浮き電極絶縁部15Aがある場合は、導体削除面積は0.07平方mmである。一方、浮き電極部7Aも除去された場合には導体削除面積は、0.25平方mmである。浮き電極部7Aを除去する場合に比べ当該実施形態は、削除面積を3.5分の1以下に抑制している。この削除面積の抑制により、加工熱の発生を低減し、誘電体共振器における無負荷Qの劣化と特性変化を抑えている。   Here, the removal area in the conductor removal step is compared between the case where the floating electrode portion 7A and the floating electrode insulating portion 15A are present and the case where the floating electrode portion 7A is removed. In FIG. 2A, when there is a floating electrode portion 7A and a floating electrode insulating portion 15A, the conductor removal area is 0.07 square mm. On the other hand, when the floating electrode portion 7A is also removed, the conductor removal area is 0.25 square mm. Compared with the case where the floating electrode portion 7A is removed, this embodiment suppresses the deleted area to 1 / 3.5 or less. By suppressing the deleted area, generation of processing heat is reduced, and deterioration of no-load Q and a change in characteristics in the dielectric resonator are suppressed.

次に、図1〜図3に示した誘電体フィルタの特性調整方法について、図4〜図6を基に説明する。これらの図において、図1・図2に示したものと同一部分には同一符号を付している。   Next, a method for adjusting the characteristics of the dielectric filter shown in FIGS. 1 to 3 will be described with reference to FIGS. In these figures, the same parts as those shown in FIGS. 1 and 2 are denoted by the same reference numerals.

図4〜図6はいずれも誘電体フィルタの特性調整工程における図である。図5は、図1に示した状態で誘電体フィルタを左側面から見た図であり、誘電体フィルタ部分は、図1に示したA−A部分の断面図として示している。同様に図6は、図1に示した状態で誘電体フィルタを手前側面から見た図であり、誘電体フィルタ部分は、図1に示したB−B部分の断面図として示している。図4は、図1に示した状態で誘電体フィルタを上側から見た図である。   4 to 6 are diagrams in the characteristic adjustment process of the dielectric filter. 5 is a view of the dielectric filter as viewed from the left side in the state shown in FIG. 1, and the dielectric filter portion is shown as a cross-sectional view of the AA portion shown in FIG. Similarly, FIG. 6 is a view of the dielectric filter viewed from the front side surface in the state shown in FIG. 1, and the dielectric filter portion is shown as a cross-sectional view of the BB portion shown in FIG. FIG. 4 is a view of the dielectric filter as viewed from above in the state shown in FIG.

図4において、レーザー発生装置13のレーザー出射口に、水平面での2次元動作をさせる。レーザー出射口から水平面と鉛直に出射させたレーザーを、反射鏡11A〜11Dの反射点10A〜10Dで反射させる。反射鏡でレーザーの軌道を水平面から鉛直面に座標変換することで、レーザーに、加工点12A〜12Dでの鉛直面での2次元軌道を描かせる。   In FIG. 4, the laser emission port of the laser generator 13 is caused to perform a two-dimensional operation on a horizontal plane. The laser emitted from the laser emission port vertically to the horizontal plane is reflected by the reflection points 10A to 10D of the reflecting mirrors 11A to 11D. The laser trajectory is coordinate-converted from the horizontal plane to the vertical plane by the reflecting mirror, thereby causing the laser to draw a two-dimensional trajectory on the vertical plane at the processing points 12A to 12D.

例えば、図5において、レーザーをレーザー反射鏡11Aで反射するように出射させて、加工点12Aを加工する場合、図4において、レーザーに反射点10Aで矢印のような軌道を描かせる。反射点10Aで反射させたレーザーに、加工点12Aで反射点10Aの矢印と相似の軌道を描かせて、共振導体を除去する。その際、レーザー加工点12Aでは、レーザーに図3の角9Aから角9Bに進み、次いで角9C、角9Dへと進む軌道を描かせる。このレーザーの軌道に沿って、浮き電極絶縁部15Aを除去し、浮き電極部7Aを形成する。   For example, in FIG. 5, when the laser beam is emitted so as to be reflected by the laser reflecting mirror 11A and the processing point 12A is processed, in FIG. 4, the laser is caused to draw an orbit like an arrow at the reflection point 10A. The laser reflected at the reflection point 10A is made to draw a trajectory similar to the arrow of the reflection point 10A at the processing point 12A, and the resonant conductor is removed. At that time, at the laser processing point 12A, the laser is caused to draw a trajectory that proceeds from the corner 9A to the corner 9B in FIG. 3 and then proceeds to the corners 9C and 9D. Along the laser trajectory, the floating electrode insulating portion 15A is removed to form the floating electrode portion 7A.

また、同様にレーザーをレーザー反射鏡11Bで反射するように出射させて、加工点12Bを加工する場合、加工点12Bで反射点10Bの矢印と相似の軌道を描かせて浮き電極絶縁部15Bを除去して、浮き電極部7Bを形成する。   Similarly, when processing the processing point 12B by emitting the laser so as to be reflected by the laser reflecting mirror 11B, the floating electrode insulating portion 15B is drawn by drawing a trajectory similar to the arrow of the reflection point 10B at the processing point 12B. The floating electrode part 7B is formed by removing.

また、同様にレーザーをレーザー反射鏡11Cで反射するように出射させて、加工点12Cを加工する場合、加工点12Cで反射点10Cの矢印と相似の軌道を描かせて浮き電極絶縁部15Cを除去する。そして同様に、レーザーをレーザー反射鏡11Dで反射するように出射させて、加工点12Dで反射点10Dの矢印と相似の軌道を描かせて浮き電極絶縁部15Dを除去する。この浮き電極絶縁部15Cの加工と浮き電極絶縁部15Dの加工とによって浮き電極部7を形成する。   Similarly, when the laser beam is emitted so as to be reflected by the laser reflecting mirror 11C and the processing point 12C is processed, the floating electrode insulating portion 15C is formed by drawing a trajectory similar to the arrow of the reflection point 10C at the processing point 12C. Remove. Similarly, the laser is emitted so as to be reflected by the laser reflecting mirror 11D, and the floating electrode insulating portion 15D is removed by drawing a trajectory similar to the arrow of the reflecting point 10D at the processing point 12D. The floating electrode portion 7 is formed by processing the floating electrode insulating portion 15C and processing the floating electrode insulating portion 15D.

このように、レーザーにより加工を行うが、電極の削除面積は浮き電極絶縁部の面積のみであるため、熱の発生を大きく抑え、電極や誘電体セラミックスが還元されたり半導体化されたりすることを防ぐことができる。これにより無負荷Qの劣化量や特性変化量が大幅に抑制できる。
このように、無負荷Qの劣化を抑制できるため、以後に無負荷Qを回復させる処理を行う場合の処理前後での特性変化量を抑制でき、これにより、無負荷Qの回復処理後の特性調整精度も改善できる。
In this way, processing is performed with a laser, but since the area of the electrode to be deleted is only the area of the floating electrode insulating part, the generation of heat is greatly suppressed, and the electrode and dielectric ceramics are reduced or made semiconductor. Can be prevented. Thereby, the deterioration amount and characteristic change amount of the no-load Q can be significantly suppressed.
In this way, since the deterioration of the no-load Q can be suppressed, the amount of change in characteristics before and after the process when the process for recovering the no-load Q can be suppressed thereafter. Adjustment accuracy can also be improved.

〈第2の実施形態〉
図7は、共振導体形成孔2A〜2Cの両端面を開放部5A、5Bとした、誘電体フィルタ16の外観斜視図であり、誘電体フィルタ16は、2分の1波長フィルタとなっている。
<Second Embodiment>
FIG. 7 is an external perspective view of the dielectric filter 16 in which both end surfaces of the resonant conductor forming holes 2A to 2C are open portions 5A and 5B. The dielectric filter 16 is a half-wave filter. .

この実施形態においては開放部5A、5Bに結合用電極14A〜14Fを設けている。共振導体形成孔2Aには、共振導体形成孔2Aと結合用電極14Aとにまたがる形状である浮き電極部7Aの一部、および共振導体形成孔2Aと結合用電極14Dとにまたがる形状である浮き電極7Eの一部を設けている。また共振導体形成孔2Bには、共振導体形成孔2Aと結合用電極14Aとにまたがる形状である浮き電極部7Bを設けている。そして、共振導体形成孔2Cには、開放部と浮き電極絶縁部が分離形成された形状の浮き電極部7Cを設けている。   In this embodiment, coupling electrodes 14A to 14F are provided in the open portions 5A and 5B. In the resonant conductor forming hole 2A, a part of the floating electrode portion 7A having a shape extending over the resonant conductor forming hole 2A and the coupling electrode 14A, and a floating extending in a shape extending over the resonant conductor forming hole 2A and the coupling electrode 14D are provided. A part of the electrode 7E is provided. The resonant conductor forming hole 2B is provided with a floating electrode portion 7B having a shape extending over the resonant conductor forming hole 2A and the coupling electrode 14A. The resonant conductor forming hole 2C is provided with a floating electrode portion 7C having a shape in which an open portion and a floating electrode insulating portion are separately formed.

また結合用電極14Aには、共振導体形成孔2Aと結合用電極14Aとにまたがる形状である浮き電極部7Aの一部を設けている。この結合用電極14A側の一部と前記共振導体形成孔2A側の一部とで、浮き電極部7Aを構成している。   The coupling electrode 14A is provided with a part of the floating electrode portion 7A having a shape extending over the resonance conductor forming hole 2A and the coupling electrode 14A. The part on the coupling electrode 14A side and the part on the resonance conductor forming hole 2A side constitute a floating electrode part 7A.

また結合用電極14Bには、共振導体形成孔2Bと結合用電極14Bとにまたがる形状である浮き電極部7Bの一部を設けている。この結合用電極14B側の一部と前記共振導体形成孔2B側一部とで、浮き電極部7Bを構成している。それとともに結合用電極14Bには、浮き電極7Dを結合用電極の端部を一部共有するような配置で設けている。   The coupling electrode 14B is provided with a part of the floating electrode portion 7B having a shape extending over the resonance conductor forming hole 2B and the coupling electrode 14B. The part on the coupling electrode 14B side and the part on the resonance conductor forming hole 2B side constitute a floating electrode part 7B. At the same time, the coupling electrode 14B is provided with the floating electrode 7D so as to partially share the end of the coupling electrode.

また、結合用電極14Dには、共振導体形成孔2Aと結合用電極14Dとにまたがる形状である浮き電極部7Eの一部を設けている。この結合用電極14D側の一部と前記共振導体形成孔2A側の一部とで、浮き電極部7Eを構成している。   The coupling electrode 14D is provided with a part of the floating electrode portion 7E having a shape extending over the resonance conductor forming hole 2A and the coupling electrode 14D. The part on the coupling electrode 14D side and the part on the resonance conductor forming hole 2A side constitute a floating electrode part 7E.

当該実施形態におけるレーザーによる導体除去工程では、浮き電極部7A〜7Dを前記第1の実施形態の導体除去工程と同様に形成する。また浮き電極部7Eの導体除去工程では、誘電体フィルタ16を上下反転させ、開放部5Bが図6のレーザー発生装置13と対向するように配置し、前記第1の実施形態の導体除去工程と同様に形成する。   In the conductor removal step by laser in the embodiment, the floating electrode portions 7A to 7D are formed in the same manner as the conductor removal step in the first embodiment. In the conductor removal step of the floating electrode portion 7E, the dielectric filter 16 is turned upside down and the opening portion 5B is disposed so as to face the laser generator 13 of FIG. 6, and the conductor removal step of the first embodiment is performed. It forms similarly.

〈第3の実施形態〉
図8は、共振導体形成孔2A〜2Cの両端面に共に外導体4を形成し、共振導体形成孔内面に環状に設けた共振導体非形成部5A〜5Cを開放部とした共振器である。このような構成により誘電体フィルタ16は、4分の1波長フィルタとなっている。共振導体形成孔2Aにおいて、浮き電極部7Aを、開放部5Aと部分共有された形状としている。共振導体形成孔2Bにおいても、浮き電極絶縁部15Bを、開放部5Bと部分共有された形状としており、二つの浮き電極部7B、7Cを同時に形成している。共振導体形成孔2Cにおいては、浮き電極絶縁部15Cを、開放部5Cとは分離形成された形状としており、浮き電極部7D、7Eを同時に形成している。
<Third Embodiment>
FIG. 8 shows a resonator in which the outer conductor 4 is formed on both end surfaces of the resonant conductor forming holes 2A to 2C, and the resonant conductor non-formed portions 5A to 5C provided in an annular shape on the inner surface of the resonant conductor forming hole are open portions. . With this configuration, the dielectric filter 16 is a quarter wavelength filter. In the resonant conductor forming hole 2A, the floating electrode portion 7A has a shape partially shared with the open portion 5A. Also in the resonant conductor forming hole 2B, the floating electrode insulating portion 15B has a shape partially shared with the open portion 5B, and the two floating electrode portions 7B and 7C are formed at the same time. In the resonant conductor forming hole 2C, the floating electrode insulating portion 15C has a shape formed separately from the open portion 5C, and the floating electrode portions 7D and 7E are formed at the same time.

浮き電極部7B、7Cと浮き電極部7D、7Eのように、浮き電極の数を増やすことにより、1回の調整で目標特性に達しなくても追加調整を行うことができる。   By increasing the number of floating electrodes like the floating electrode portions 7B and 7C and the floating electrode portions 7D and 7E, additional adjustment can be performed without reaching the target characteristics by one adjustment.

当該実施形態におけるレーザーによる導体除去工程では、浮き電極部7A〜7Eを前記第1の実施形態の導体除去工程と同様に除去する。   In the conductor removal step by the laser in the embodiment, the floating electrode portions 7A to 7E are removed in the same manner as the conductor removal step in the first embodiment.

〈第4の実施形態〉
請求項5の誘電体フィルタをから構成される誘電体デュプレクサの構造例としては、1つの誘電体ブロックに第1〜第3の実施形態で示したフィルタを二組備えた誘電体デュプレクサであって、それぞれのフィルタを結合する一つの励振孔をもち、共有の入出力電極を含めて三つの入出力電極を備えた構造のものが挙げられる。このように誘電体デュプレクサを構成する場合も、第1〜第3の実施形態で示した方法により浮き電極部と浮き電極絶縁部を形成することにより、無負荷Q値の低下と調整精度の劣化とを抑制する。そのため通過周波数帯域の調整が容易にできる。
<Fourth Embodiment>
An example of the structure of a dielectric duplexer comprising the dielectric filter of claim 5 is a dielectric duplexer comprising two sets of filters shown in the first to third embodiments in one dielectric block. One having an excitation hole for coupling the respective filters and a structure having three input / output electrodes including a common input / output electrode can be mentioned. Even when the dielectric duplexer is configured as described above, the floating electrode portion and the floating electrode insulating portion are formed by the method described in the first to third embodiments, thereby reducing the no-load Q value and the adjustment accuracy. And suppress. As a result, the pass frequency band can be easily adjusted.

尚、上述の第1の実施形態と第2の実施形態とでは、共振導体形成孔を断面四角形状と断面円形状とのステップ孔として形成しているが、第3の実施形態のように単一断面形状の孔でもよい。また、断面形状は四角形状、円形状、楕円形状、もしくは長円形状でもよく、形を問わない。   In the first embodiment and the second embodiment described above, the resonant conductor forming hole is formed as a step hole having a quadrangular cross section and a circular cross section. However, as in the third embodiment, a single hole is formed. It may be a hole with a single cross-sectional shape. Further, the cross-sectional shape may be a quadrangular shape, a circular shape, an elliptical shape, or an oval shape, and the shape is not limited.

第1の実施形態に係る誘電体フィルタの外観斜視図である。1 is an external perspective view of a dielectric filter according to a first embodiment. 第1の実施形態に係る誘電体フィルタにおいて(A)は図1のB−B断面図で、(B)は図1の上側断面である。In the dielectric filter according to the first embodiment, (A) is a BB sectional view of FIG. 1, and (B) is an upper sectional view of FIG. 第1の実施形態に係る、浮き電極部と浮き電極絶縁部の拡大図であり、(A)は正面図、(B)は断面図である。It is an enlarged view of the floating electrode part and floating electrode insulation part which concern on 1st Embodiment, (A) is a front view, (B) is sectional drawing. 第1の実施形態に係る共振導体除去工程における外観図である。It is an external view in the resonance conductor removal process which concerns on 1st Embodiment. 第1の実施形態に係る共振導体除去工程におけるA−A断面図である。It is AA sectional drawing in the resonance conductor removal process which concerns on 1st Embodiment. 第1の実施形態に係る共振導体除去工程におけるB−B断面図である。It is BB sectional drawing in the resonance conductor removal process which concerns on 1st Embodiment. 第2の実施形態に係る誘電体フィルタの外観斜視図である。It is an external appearance perspective view of the dielectric filter which concerns on 2nd Embodiment. 第3の実施形態に係る誘電体フィルタの断面図である。It is sectional drawing of the dielectric material filter which concerns on 3rd Embodiment. 従来の誘電体共振器の外観斜視図である。It is an external appearance perspective view of the conventional dielectric resonator.

符号の説明Explanation of symbols

1−誘電体ブロック
2−共振導体形成孔
3−共振導体
4−外導体
5−開放部
6−入出力電極
7−浮き電極部
8−角
9−角
10−レーザー反射点
11−レーザー反射鏡
12−レーザー加工点
13−レーザー発生装置
14−結合用電極
15−浮き電極絶縁部
16−誘電体フィルタ
17−誘電体共振器
1-dielectric block 2-resonant conductor forming hole 3-resonant conductor 4-outer conductor 5-opening portion 6-input / output electrode 7-floating electrode portion 8-corner 9-corner 10-laser reflection point 11-laser reflector 12 -Laser processing point 13-Laser generator 14-Coupling electrode 15-Floating electrode insulator 16-Dielectric filter 17-Dielectric resonator

Claims (6)

内面に共振導体を形成した共振導体形成孔を誘電体ブロックに設け、該誘電体ブロックの外面に外導体を形成し、前記共振導体形成孔の少なくとも一方の開口部付近に、前記共振導体の端部に隣接して前記端部を開放端にする開放部を設けてなる誘電体共振器において、
前記共振導体から電気的に絶縁された浮き電極部と、該浮き電極部を周回して形成された浮き電極絶縁部とが前記共振導体と前記開放部とで囲まれていて、
前記開放部と前記浮き電極絶縁部とがそれぞれの一部を共有している誘電体共振器。
A resonant conductor forming hole having a resonant conductor formed on the inner surface is provided in the dielectric block, an outer conductor is formed on the outer surface of the dielectric block, and an end of the resonant conductor is formed in the vicinity of at least one opening of the resonant conductor forming hole. In a dielectric resonator provided with an open part adjacent to the part and having the open end as an end ,
Wherein the floating electrode unit electrically insulated from the resonance conductor, a floating electrode insulating portion formed orbiting the該浮-out electrode portion and is surrounded by said resonant conductor and the opening portion,
A dielectric resonator in which the open portion and the floating electrode insulating portion share a part thereof .
内面に共振導体を形成した共振導体形成孔を誘電体ブロックに設け、該誘電体ブロックの外面に外導体を形成し、前記共振導体形成孔の少なくとも一方の開口部付近に、前記共振導体の端部に隣接して前記端部を開放端にする開放部を設けてなる誘電体共振器において、
前記共振導体から電気的に絶縁された浮き電極部と、該浮き電極部を周回して形成された浮き電極絶縁部とが前記開放部付近の共振導体で囲まれていて、
前記開放部と前記浮き電極絶縁部とが分離形成されている誘電体共振器。
A resonant conductor forming hole having a resonant conductor formed on the inner surface is provided in the dielectric block, an outer conductor is formed on the outer surface of the dielectric block, and an end of the resonant conductor is formed in the vicinity of at least one opening of the resonant conductor forming hole. In a dielectric resonator provided with an open part adjacent to the part and having the open end as an end ,
A floating electrode portion electrically insulated from said resonant conductor, a floating electrode insulating portion formed orbiting the該浮-out electrode portion, is surrounded by resonant conductor near the open portion,
A dielectric resonator in which the open portion and the floating electrode insulating portion are separately formed .
1つの前記共振導体形成孔に設けられた前記開放部の付近に、2以上の前記浮き電極部を備えたことを特徴とする、請求項1または2に記載の誘電体共振器。 3. The dielectric resonator according to claim 1, wherein two or more floating electrode portions are provided in the vicinity of the open portion provided in one of the resonance conductor forming holes. 請求項1〜3のいずれかに記載の誘電体共振器と該誘電体共振器に結合する入出力手段とを備えた誘電体フィルタ。A dielectric filter comprising the dielectric resonator according to claim 1 and input / output means coupled to the dielectric resonator. 請求項4に記載の誘電体フィルタの製造方法であって、
前記共振導体の形成領域内に前記浮き電極絶縁部を形成することにより、前記共振導体から分離して前記浮き電極部を設ける共振導体除去工程によって、フィルタ特性を定めることを特徴とする誘電体フィルタの製造方法。
It is a manufacturing method of the dielectric filter according to claim 4 ,
A dielectric filter characterized in that, by forming the floating electrode insulating portion in a region where the resonant conductor is formed, a filter characteristic is determined by a resonant conductor removing step in which the floating electrode portion is provided separately from the resonant conductor. Manufacturing method.
前記共振導体除去工程が、前記浮き電極絶縁部のレーザー加工による導体の除去工程である、請求項5に記載の誘電体フィルタの製造方法。The method for manufacturing a dielectric filter according to claim 5 , wherein the resonant conductor removing step is a step of removing a conductor by laser processing of the floating electrode insulating portion.
JP2006528381A 2004-06-24 2005-04-27 Dielectric resonator, dielectric filter, and method of manufacturing dielectric filter Expired - Fee Related JP4310469B2 (en)

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