JP4305095B2 - Immersion projection exposure apparatus equipped with an optical component cleaning mechanism and immersion optical component cleaning method - Google Patents

Immersion projection exposure apparatus equipped with an optical component cleaning mechanism and immersion optical component cleaning method Download PDF

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JP4305095B2
JP4305095B2 JP2003305749A JP2003305749A JP4305095B2 JP 4305095 B2 JP4305095 B2 JP 4305095B2 JP 2003305749 A JP2003305749 A JP 2003305749A JP 2003305749 A JP2003305749 A JP 2003305749A JP 4305095 B2 JP4305095 B2 JP 4305095B2
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optical component
liquid
cleaning
immersion
exposure apparatus
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JP2005079222A (en
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俊二 渡辺
忠彦 斉藤
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Description

本発明は、光学部品の洗浄機構を搭載した液浸投影露光装置及び液浸光学部品の接液面の残留汚染物質の洗浄除去方法に関する。   The present invention relates to an immersion projection exposure apparatus equipped with a cleaning mechanism for optical components and a method for cleaning and removing residual contaminants on the wetted surface of the immersion optical component.

半導体素子等を製造する際の次世代リソグラフィー装置として、光学部品と半導体素子との間を液体の媒体で満たして解像度を高めた液浸投影露光装置が有望である。   As a next-generation lithography apparatus for manufacturing a semiconductor element or the like, an immersion projection exposure apparatus in which the space between the optical component and the semiconductor element is filled with a liquid medium to increase the resolution is promising.

半導体露光装置の解像度Ｒは、光源波長λと開口数ＮＡ（投影レンズの明るさ）を用いて、下記の式で与えられる。   The resolution R of the semiconductor exposure apparatus is given by the following equation using the light source wavelength λ and the numerical aperture NA (the brightness of the projection lens).

Ｒ＝ｋ×λ/ＮＡ ・・・（１）
ここで、ｋはプロセス係数である。（１）式より、光源の波長λが短いほど、投影レンズの開口数ＮＡが大きいほど高い解像度Ｒが得られることがわかる。 R = k × λ / NA (1)
Here, k is a process coefficient. From equation (1), it can be seen that a higher resolution R is obtained as the wavelength λ of the light source is shorter and the numerical aperture NA of the projection lens is larger.

また、開口数ＮＡは、ＮＡ＝ｎ×sinθで与えられる。ここで、ｎは露光光が通過する媒質の屈折率であり、θは露光光が形成する角度である。通常の露光は大気中で行われるためｎ＝1である。これに対して液浸露光技術は、投影レンズとウェハの間に、屈折率 ｎが１よりも大きな液体媒体を満たす露光方式で、投影光学系のＮＡの定義において、ＮＡ＝ｎ×sinθの、ｎを拡大することになる。   The numerical aperture NA is given by NA = n × sin θ. Here, n is the refractive index of the medium through which the exposure light passes, and θ is the angle formed by the exposure light. Since normal exposure is performed in the atmosphere, n = 1. In contrast, the immersion exposure technique is an exposure method that fills a liquid medium having a refractive index n larger than 1 between the projection lens and the wafer. In the NA definition of the projection optical system, NA = n × sinθ, n will be expanded.

同一の露光光の光線入射角θでは、最小解像寸法を １／ｎ に縮小（改善）することができる（光学系ＮＡのｎ倍の拡大の効果）。一方、従来と同一のＮＡの場合、θを小さくできるため、焦点深度を ｎ倍に拡大（改善）することが可能になる。光源にＡｒＦレーザ（波長：１９３ｎｍ）を用いた露光では、投影レンズとウェハの間を屈折率１．４４の純水で満たす。   At the same incident light incident angle θ, the minimum resolution dimension can be reduced (improved) to 1 / n (the effect of enlarging the optical system NA by n times). On the other hand, in the case of the same NA as in the prior art, θ can be reduced, so that the depth of focus can be expanded (improved) n times. In exposure using an ArF laser (wavelength: 193 nm) as a light source, the space between the projection lens and the wafer is filled with pure water having a refractive index of 1.44.

レンズ表面に純水など液体媒体の液滴が残留して乾燥すると、液体媒体に含まれる汚染物質が光学部品接液面に固着する。このいわゆる水シミ（またはウォータースポット）は、露光光の照度ムラとなり、ひいては回路焼付不良等を引き起こすこともある。そのため、水シミは完全に洗浄除去する必要があるが、残留液体が乾燥した後は除去し難くなるため、液滴の状態で拭いて除去するか、またはシミが残り難い液体に置換する必要がある。   When droplets of a liquid medium such as pure water remain on the lens surface and dry, the contaminant contained in the liquid medium adheres to the optical component wetted surface. This so-called water spot (or water spot) causes unevenness in the illuminance of the exposure light, which may cause circuit burn-in defects. For this reason, it is necessary to wash and remove water stains completely, but it is difficult to remove the residual liquid after it has dried, so it is necessary to wipe it off in the form of droplets or to replace it with a liquid that does not easily leave stains. is there.

本発明はかかる点に鑑み、液浸法を適用した露光装置において、露光終了後に光学部品の接液面から水シミ等汚染物質の洗浄機構を備えた投影露光装置を提供することを課題とする。また、本発明は、液浸光学部品洗浄方法を提供することを課題とする。   SUMMARY OF THE INVENTION In view of the above, an object of the present invention is to provide a projection exposure apparatus provided with a cleaning mechanism for contaminants such as water stains from the liquid contact surface of an optical component after completion of exposure in an exposure apparatus to which an immersion method is applied. . Another object of the present invention is to provide a method for cleaning an immersion optical component.

請求項１に記載の発明は、光学部品と露光対象物との間を液体媒体で満たして解像度を高めた液浸投影露光装置において、前記光学部品の接液面における前記液体媒体の残留液体を洗浄液体を用いて除去可能とし、前記液体媒体を供給する管路と前記洗浄液体を供給する管路は、一つの管路で結合されていることを特徴とする。 According to the first aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, residual liquid in the liquid medium on the liquid contact surface of the optical component is removed. The cleaning liquid can be removed, and the pipe for supplying the liquid medium and the pipe for supplying the cleaning liquid are connected by a single pipe .

請求項２に記載の発明は、光学部品と露光対象物との間を液体媒体で満たして解像度を高めた液浸投影露光装置において、前記光学部品の接液面の残留液体を洗浄除去する方法であって、露光終了後、前記光学部品と前記露光対象物の間にある前記液体媒体を洗浄液体に置換して該洗浄液体で満たすことによって前記液体媒体を除去する第一工程と、前記洗浄液体によって前記接液面を洗浄する第二工程と、前記洗浄液体を除去して前記接液面を乾燥させる第三工程とを有することを特徴とする。 According to a second aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, the residual liquid on the wetted surface of the optical component is cleaned and removed. A first step of removing the liquid medium after completion of exposure by replacing the liquid medium between the optical component and the exposure object with a cleaning liquid and filling the liquid medium with the cleaning liquid; It has the 2nd process of cleaning the said liquid-contact surface with a liquid, and the 3rd process of removing the said cleaning liquid and drying the said liquid-contact surface .

請求項１に記載の発明によれば、光学部品と露光対象物との間を液体媒体で満たして解像度を高めた液浸投影露光装置において、前記光学部品の接液面の残留液体を洗浄液体を用いて除去するので、光学部品の接液面の洗浄除去を自動的に行うことができる。したがって、光学部品の接液面の水シミ等を確実に除去できる。しかも、前記液体媒体を供給する管路と前記洗浄液体を供給する管路は、一つの管路で結合されているので、露光時に必要な管路の面積と洗浄時に必要な管路の面積を全体として抑えることができる。また、光学部品の接液面の洗浄除去を素早く行うことができる。 According to the first aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, the remaining liquid on the liquid contact surface of the optical component is washed with liquid. Therefore, the wetted surface of the optical component can be automatically cleaned and removed. Accordingly, it is possible to reliably remove water spots and the like on the liquid contact surface of the optical component. In addition, since the conduit for supplying the liquid medium and the conduit for supplying the cleaning liquid are coupled by a single conduit, the area of the conduit necessary for exposure and the area of the conduit necessary for cleaning can be reduced. It can be suppressed as a whole. In addition, it is possible to quickly clean and remove the liquid contact surface of the optical component.

請求項２に記載の発明は、光学部品と露光対象物との間を液体媒体で満たして解像度を高めた液浸投影露光装置において、前記光学部品の接液面の残留液体を洗浄除去する方法であって、露光終了後、前記光学部品と前記露光対象物の間にある前記液体媒体を洗浄液体に置換して該洗浄液体で満たすことによって前記液体媒体を除去する第一工程と、前記洗浄液体によって前記接液面を洗浄する第二工程と、前記洗浄液体を除去して前記接液面を乾燥させる第三工程とを有するので、光学部品の接液面の洗浄除去を、自動的に素早く確実に行うことができる。 According to a second aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, the residual liquid on the wetted surface of the optical component is cleaned and removed. A first step of removing the liquid medium after completion of exposure by replacing the liquid medium between the optical component and the exposure object with a cleaning liquid and filling the liquid medium with the cleaning liquid; Since there is a second step of cleaning the liquid contact surface with a liquid and a third step of removing the cleaning liquid and drying the liquid contact surface, cleaning and removal of the liquid contact surface of the optical component is automatically performed. It can be done quickly and reliably.

以下、本発明の実施の形態について説明する。
［発明の実施の形態１］ Embodiments of the present invention will be described below.
Embodiment 1 of the Invention

以下、本発明の実施の形態１について、図１、図２を用いて説明する。 Hereinafter, Embodiment 1 of the present invention will be described with reference to FIG. 1 and FIG .

図１は、本発明の実施の形態１に係る光学部品の洗浄装置を備えた液浸投影露光装置の接液部分の概略図である。ここでは、液体媒体として純水１３を、又、洗浄液体としてプロパノール１５を用いた場合を例にして説明する。   FIG. 1 is a schematic view of a liquid contact portion of an immersion projection exposure apparatus including an optical component cleaning apparatus according to Embodiment 1 of the present invention. Here, a case where pure water 13 is used as the liquid medium and propanol 15 is used as the cleaning liquid will be described as an example.

図１に示すように、液浸投影露光装置１は、光学部品１２を有する投影光学系１１、ステージ３１、照明系（不示図）から構成される。照明系から照射された光によってマスクのパターンはステージ３１上に設置された露光対象物、例えばシリコンウエハー１４に投影露光される。   As shown in FIG. 1, the immersion projection exposure apparatus 1 includes a projection optical system 11 having an optical component 12, a stage 31, and an illumination system (not shown). The mask pattern is projected and exposed onto an exposure object such as a silicon wafer 14 placed on the stage 31 by light emitted from the illumination system.

液浸投影露光装置１には、液浸露光のための液体媒体供給タンク２１が備えられ、純水１３が管路２３ａを通って、光学部品１２とシリコンウエハー１４の間に供給される。また、液浸投影露光装置１には、洗浄のための洗浄液体供給タンク２２が備えられ、プロパノール１５が管路２３ａを通って、光学部品１２とシリコンウエハー１４の間に供給される。これら、洗浄液体供給タンク２２及び管路２３ａで、光学部品１２を洗浄するための洗浄液体を供給する手段が構成されている。   The immersion projection exposure apparatus 1 is provided with a liquid medium supply tank 21 for immersion exposure, and pure water 13 is supplied between the optical component 12 and the silicon wafer 14 through a conduit 23a. Further, the immersion projection exposure apparatus 1 is provided with a cleaning liquid supply tank 22 for cleaning, and propanol 15 is supplied between the optical component 12 and the silicon wafer 14 through a pipe line 23a. The cleaning liquid supply tank 22 and the pipe line 23a constitute means for supplying a cleaning liquid for cleaning the optical component 12.

液浸露光中は、光学部品１２とシリコンウエハー１４との間が、純水１３で満たされるように流量バルブ２１ａを調整して、液体媒体供給タンク２１から供給される流量を設定する。不要になった純水１３は、ステージ脇の排水溝３１ａへ排水される。   During the immersion exposure, the flow rate valve 21a is adjusted so that the space between the optical component 12 and the silicon wafer 14 is filled with the pure water 13, and the flow rate supplied from the liquid medium supply tank 21 is set. The pure water 13 that is no longer needed is drained into the drainage groove 31a on the side of the stage.

バルブ２１ａを閉じて、洗浄液体供給タンク２２のバルブ２２ａを開くと、プロパノール１５の供給が開始され、光学部品１２と露光対象物１４との間に残った水滴をプロパノール１５で洗い流すことがきる。ノズル２４から供給する乾燥窒素２５によって、プロパノール１５は完全に乾燥できる機構も備えている。これによって、洗浄液体を乾燥する手段が構成されている。   When the valve 21 a is closed and the valve 22 a of the cleaning liquid supply tank 22 is opened, the supply of the propanol 15 is started, and water droplets remaining between the optical component 12 and the exposure object 14 can be washed away with the propanol 15. The propanol 15 is also provided with a mechanism that allows the propanol 15 to be completely dried by dry nitrogen 25 supplied from the nozzle 24. This constitutes a means for drying the cleaning liquid.

図２は、本発明の実施の形態１に係る光学部品の洗浄手順図である。図２に示す手順のように、ステップ２１で露光が終了すると、ステップ２２で、光学部品１２と露光対象物であるシリコンウエハー１４の間にある純水１３をたとえばプロパノール１５に徐々に置換する。次に、ステップ２３で、プロパノール１５を数秒流し続けて光学部品１２の接液面１２ａを洗浄する。最後に、ステップ２４で、乾燥窒素２５を洗浄面に吹き付けて光学部品１２の接液面１２ａを乾燥させる。この方法によって、接液面１２ａから純水１３を除去して、洗浄液体を吹き付けるまでの時間が短縮化できるので、光学部品１２の接液面１２ａの水シミの洗浄除去がより確実に行われる。また、純水１３の除去とプロパノール１５による浸漬が同時に行われるため、プロパノール１５による洗浄前に接液面１２ａが空気に触れて乾燥してしまうことがない。
なお、プロパノール１５は、純水１３に比べて表面張力が小さいので、洗浄時に光学部品１２の一部のみにしかプロパノールが接触せず、接液面１２ａの洗浄が部分的にしか行なわれないおそれがある。そこで、光学部品１２の全体にプロパノール１５を張り付かせるために、光学部品１２と露光対象物（シリコンウエハー１４）の間隔は、プロパノール１５による液浸時には、純水１３による液浸時に比して狭くすることが望ましい。すなわち、純水１３を徐々にプロパノール１５に置換する際に、プロパノール１５による置換量に応じて、ステージ３１を調節して、徐々に光学部品１２と露光対象物（シリコンウエハー１４）の間隔を狭めていくとよい。このようにステージ３１を調節することによって、光学部品１２の接液面１２ａ全体に渡って、洗浄除去処理が確実に行われる。 FIG. 2 is a cleaning procedure diagram of the optical component according to Embodiment 1 of the present invention. When the exposure is completed in step 21 as in the procedure shown in FIG. 2, the pure water 13 between the optical component 12 and the silicon wafer 14 that is the exposure object is gradually replaced with, for example, propanol 15 in step 22. Next, in step 23, the propanol 15 is kept flowing for several seconds to clean the liquid contact surface 12a of the optical component 12. Finally, in step 24, dry nitrogen 25 is blown onto the cleaning surface to dry the liquid contact surface 12a of the optical component 12. By this method, the time required for removing the pure water 13 from the liquid contact surface 12a and spraying the cleaning liquid can be shortened, so that the water stain on the liquid contact surface 12a of the optical component 12 is more reliably cleaned and removed. . Moreover, since the removal of the pure water 13 and the immersion with the propanol 15 are performed at the same time, the wetted surface 12a does not come into contact with the air and is not dried before the cleaning with the propanol 15.
Since propanol 15 has a smaller surface tension than pure water 13, propanol contacts only a part of optical component 12 during cleaning, and there is a concern that cleaning of liquid contact surface 12a may be performed only partially. There is. Therefore, in order to attach the propanol 15 to the entire optical component 12, the distance between the optical component 12 and the object to be exposed (silicon wafer 14) is larger when immersed with propanol 15 than when immersed with pure water 13. It is desirable to make it narrow. That is, when the pure water 13 is gradually replaced with the propanol 15, the stage 31 is adjusted according to the amount of replacement with the propanol 15, and the distance between the optical component 12 and the object to be exposed (silicon wafer 14) is gradually narrowed. It is good to go. By adjusting the stage 31 in this way, the cleaning removal process is reliably performed over the entire liquid contact surface 12a of the optical component 12.

洗浄液体はここでは、プロパノール１５を例に説明したが、水に対する溶解度が高く、かつシミが残り難い、メタノール、エタノール、プロパノール、ブタノールなどのアルコール、またはアセトンなどのケトンが最適であり、これらを使用してもよい。 Here, propanol 15 has been described as an example of the cleaning liquid, but alcohol such as methanol, ethanol, propanol and butanol, or ketone such as acetone, which has high solubility in water and hardly retains stains, is optimal. May be used .

上述の実施の形態においては、投影光学系１１とシリコンウエハー１４との間を局所的に液体で満たす露光装置を採用しているが、特開平６−１２４８７３号公報に開示されているような露光対象の基板を保持したステージを液槽の中で移動させる液浸露光装置や、特開平１０−３０３１１４号公報に開示されるようなステージ上に所定の深さの液体槽を形成し、その中に基板を保持する液浸露光装置にも本発明を適用可能である。   In the above-described embodiment, an exposure apparatus that locally fills the space between the projection optical system 11 and the silicon wafer 14 with a liquid is employed. However, the exposure as disclosed in Japanese Patent Laid-Open No. 6-124873. An immersion exposure apparatus for moving a stage holding a target substrate in a liquid tank, or a liquid tank having a predetermined depth on a stage as disclosed in JP-A-10-303114, The present invention can also be applied to an immersion exposure apparatus that holds a substrate.

また、本発明は、特開平１０−１６３０９９号公報、特開平１０−２１４７８３号公報、特表２０００−５０５９５８号公報等に開示されているように、ウエハ等の被処理基板を別々に載置してＸＹ方向に独立に移動可能な２つのステージを備えたツインステージ形の露光装置にも適用できる。   Further, according to the present invention, a substrate to be processed such as a wafer is separately placed as disclosed in JP-A-10-163099, JP-A-10-214783, JP-T 2000-505958, and the like. The present invention can also be applied to a twin stage type exposure apparatus having two stages that can move independently in the XY directions.

図１は、本発明の実施の形態１に係る光学部品の洗浄装置を備えた液浸投影露光装置の接液部分の概略図である。FIG. 1 is a schematic view of a liquid contact portion of an immersion projection exposure apparatus including an optical component cleaning apparatus according to Embodiment 1 of the present invention. 図２は、同実施の形態１に係る光学部品の洗浄手順図である。 FIG. 2 is a cleaning procedure diagram of the optical component according to the first embodiment .

符号の説明Explanation of symbols

１ 投影露光装置
１１ 投影光学系
１２ 光学部品
１２ａ 接液面
１３ 純水
１４ シリコンウエハー
２１ 液体媒体供給タンク
２１ａ バルブ
２２ 洗浄液体供給タンク
２２ａ バルブ
２３ 管路
２４ ノズル
２５ 乾燥窒素
３１ ステージ
３１ａ 排水溝
３２ 拭き取り装置
３２ａ 拭き布
DESCRIPTION OF SYMBOLS 1 Projection exposure apparatus 11 Projection optical system 12 Optical component 12a Liquid contact surface 13 Pure water 14 Silicon wafer 21 Liquid medium supply tank 21a Valve 22 Cleaning liquid supply tank 22a Valve 23 Pipe line 24 Nozzle 25 Dry nitrogen 31 Stage 31a Drain groove 32 Wipe off Device 32a Wiping cloth

Claims (2)

光学部品と露光対象物との間を液体媒体で満たして解像度を高めた液浸投影露光装置において、
前記光学部品の接液面における前記液体媒体の残留液体を洗浄液体を用いて除去可能とし、
前記液体媒体を供給する管路と前記洗浄液体を供給する管路は、一つの管路で結合されていることを特徴とする光学部品の洗浄機構を備えた液浸投影露光装置。 In an immersion projection exposure apparatus in which the space between an optical component and an exposure object is filled with a liquid medium to increase the resolution,
The liquid remaining on the liquid contact surface of the optical component can be removed using a cleaning liquid ,
An immersion projection exposure apparatus equipped with an optical component cleaning mechanism, wherein the conduit for supplying the liquid medium and the conduit for supplying the cleaning liquid are coupled together by a single conduit . 光学部品と露光対象物との間を液体媒体で満たして解像度を高めた液浸投影露光装置において、前記光学部品の接液面の残留液体を洗浄除去する方法であって、
露光終了後、前記光学部品と前記露光対象物の間にある前記液体媒体を洗浄液体に置換して該洗浄液体で満たすことによって前記液体媒体を除去する第一工程と、
前記洗浄液体によって前記接液面を洗浄する第二工程と、
前記洗浄液体を除去して前記接液面を乾燥させる第三工程とを有することを特徴とする液浸光学部品洗浄方法。 In an immersion projection exposure apparatus in which a space between an optical component and an object to be exposed is filled with a liquid medium to increase resolution, the liquid remaining on the wetted surface of the optical component is cleaned and removed.
A first step of removing the liquid medium by replacing the liquid medium between the optical component and the object to be exposed with a cleaning liquid after the exposure is completed, and filling the cleaning medium with the cleaning liquid;
A second step of cleaning the wetted surface with the cleaning liquid;
And a third step of drying the wetted surface by removing the cleaning liquid .
JP2003305749A 2003-08-29 2003-08-29 Immersion projection exposure apparatus equipped with an optical component cleaning mechanism and immersion optical component cleaning method Expired - Fee Related JP4305095B2 (en)

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