JP4305095B2 - Immersion projection exposure apparatus equipped with an optical component cleaning mechanism and immersion optical component cleaning method - Google Patents

Immersion projection exposure apparatus equipped with an optical component cleaning mechanism and immersion optical component cleaning method Download PDF

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JP4305095B2
JP4305095B2 JP2003305749A JP2003305749A JP4305095B2 JP 4305095 B2 JP4305095 B2 JP 4305095B2 JP 2003305749 A JP2003305749 A JP 2003305749A JP 2003305749 A JP2003305749 A JP 2003305749A JP 4305095 B2 JP4305095 B2 JP 4305095B2
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optical component
liquid
cleaning
immersion
exposure apparatus
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JP2005079222A (en
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忠彦 斉藤
俊二 渡辺
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株式会社ニコン
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion

Description

  The present invention relates to an immersion projection exposure apparatus equipped with a cleaning mechanism for optical components and a method for cleaning and removing residual contaminants on the wetted surface of the immersion optical component.

  As a next-generation lithography apparatus for manufacturing a semiconductor element or the like, an immersion projection exposure apparatus in which the space between the optical component and the semiconductor element is filled with a liquid medium to increase the resolution is promising.

  The resolution R of the semiconductor exposure apparatus is given by the following equation using the light source wavelength λ and the numerical aperture NA (the brightness of the projection lens).

R = k × λ / NA (1)
Here, k is a process coefficient. From equation (1), it can be seen that a higher resolution R is obtained as the wavelength λ of the light source is shorter and the numerical aperture NA of the projection lens is larger.

  The numerical aperture NA is given by NA = n × sin θ. Here, n is the refractive index of the medium through which the exposure light passes, and θ is the angle formed by the exposure light. Since normal exposure is performed in the atmosphere, n = 1. In contrast, the immersion exposure technique is an exposure method that fills a liquid medium having a refractive index n larger than 1 between the projection lens and the wafer. In the NA definition of the projection optical system, NA = n × sinθ, n will be expanded.

  At the same incident light incident angle θ, the minimum resolution dimension can be reduced (improved) to 1 / n (the effect of enlarging the optical system NA by n times). On the other hand, in the case of the same NA as in the prior art, θ can be reduced, so that the depth of focus can be expanded (improved) n times. In exposure using an ArF laser (wavelength: 193 nm) as a light source, the space between the projection lens and the wafer is filled with pure water having a refractive index of 1.44.

  When droplets of a liquid medium such as pure water remain on the lens surface and dry, the contaminant contained in the liquid medium adheres to the optical component wetted surface. This so-called water spot (or water spot) causes unevenness in the illuminance of the exposure light, which may cause circuit burn-in defects. For this reason, it is necessary to wash and remove water stains completely, but it is difficult to remove the residual liquid after it has dried, so it is necessary to wipe it off in the form of droplets or to replace it with a liquid that does not easily leave stains. is there.

  SUMMARY OF THE INVENTION In view of the above, an object of the present invention is to provide a projection exposure apparatus provided with a cleaning mechanism for contaminants such as water stains from the liquid contact surface of an optical component after completion of exposure in an exposure apparatus to which an immersion method is applied. . Another object of the present invention is to provide a method for cleaning an immersion optical component.

According to the first aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, residual liquid in the liquid medium on the liquid contact surface of the optical component is removed. The cleaning liquid can be removed, and the pipe for supplying the liquid medium and the pipe for supplying the cleaning liquid are connected by a single pipe .

According to a second aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, the residual liquid on the wetted surface of the optical component is cleaned and removed. A first step of removing the liquid medium after completion of exposure by replacing the liquid medium between the optical component and the exposure object with a cleaning liquid and filling the liquid medium with the cleaning liquid; It has the 2nd process of cleaning the said liquid-contact surface with a liquid, and the 3rd process of removing the said cleaning liquid and drying the said liquid-contact surface .

According to the first aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, the remaining liquid on the liquid contact surface of the optical component is washed with liquid. Therefore, the wetted surface of the optical component can be automatically cleaned and removed. Accordingly, it is possible to reliably remove water spots and the like on the liquid contact surface of the optical component. In addition, since the conduit for supplying the liquid medium and the conduit for supplying the cleaning liquid are coupled by a single conduit, the area of the conduit necessary for exposure and the area of the conduit necessary for cleaning can be reduced. It can be suppressed as a whole. In addition, it is possible to quickly clean and remove the liquid contact surface of the optical component.

According to a second aspect of the present invention, in the immersion projection exposure apparatus in which the space between the optical component and the object to be exposed is filled with a liquid medium to increase the resolution, the residual liquid on the wetted surface of the optical component is cleaned and removed. A first step of removing the liquid medium after completion of exposure by replacing the liquid medium between the optical component and the exposure object with a cleaning liquid and filling the liquid medium with the cleaning liquid; Since there is a second step of cleaning the liquid contact surface with a liquid and a third step of removing the cleaning liquid and drying the liquid contact surface, cleaning and removal of the liquid contact surface of the optical component is automatically performed. It can be done quickly and reliably.

Embodiments of the present invention will be described below.
Embodiment 1 of the Invention

Hereinafter, Embodiment 1 of the present invention will be described with reference to FIG. 1 and FIG .

  FIG. 1 is a schematic view of a liquid contact portion of an immersion projection exposure apparatus including an optical component cleaning apparatus according to Embodiment 1 of the present invention. Here, a case where pure water 13 is used as the liquid medium and propanol 15 is used as the cleaning liquid will be described as an example.

  As shown in FIG. 1, the immersion projection exposure apparatus 1 includes a projection optical system 11 having an optical component 12, a stage 31, and an illumination system (not shown). The mask pattern is projected and exposed onto an exposure object such as a silicon wafer 14 placed on the stage 31 by light emitted from the illumination system.

  The immersion projection exposure apparatus 1 is provided with a liquid medium supply tank 21 for immersion exposure, and pure water 13 is supplied between the optical component 12 and the silicon wafer 14 through a conduit 23a. Further, the immersion projection exposure apparatus 1 is provided with a cleaning liquid supply tank 22 for cleaning, and propanol 15 is supplied between the optical component 12 and the silicon wafer 14 through a pipe line 23a. The cleaning liquid supply tank 22 and the pipe line 23a constitute means for supplying a cleaning liquid for cleaning the optical component 12.

  During the immersion exposure, the flow rate valve 21a is adjusted so that the space between the optical component 12 and the silicon wafer 14 is filled with the pure water 13, and the flow rate supplied from the liquid medium supply tank 21 is set. The pure water 13 that is no longer needed is drained into the drainage groove 31a on the side of the stage.

  When the valve 21 a is closed and the valve 22 a of the cleaning liquid supply tank 22 is opened, the supply of the propanol 15 is started, and water droplets remaining between the optical component 12 and the exposure object 14 can be washed away with the propanol 15. The propanol 15 is also provided with a mechanism that allows the propanol 15 to be completely dried by dry nitrogen 25 supplied from the nozzle 24. This constitutes a means for drying the cleaning liquid.

FIG. 2 is a cleaning procedure diagram of the optical component according to Embodiment 1 of the present invention. When the exposure is completed in step 21 as in the procedure shown in FIG. 2, the pure water 13 between the optical component 12 and the silicon wafer 14 that is the exposure object is gradually replaced with, for example, propanol 15 in step 22. Next, in step 23, the propanol 15 is kept flowing for several seconds to clean the liquid contact surface 12a of the optical component 12. Finally, in step 24, dry nitrogen 25 is blown onto the cleaning surface to dry the liquid contact surface 12a of the optical component 12. By this method, the time required for removing the pure water 13 from the liquid contact surface 12a and spraying the cleaning liquid can be shortened, so that the water stain on the liquid contact surface 12a of the optical component 12 is more reliably cleaned and removed. . Moreover, since the removal of the pure water 13 and the immersion with the propanol 15 are performed at the same time, the wetted surface 12a does not come into contact with the air and is not dried before the cleaning with the propanol 15.
Since propanol 15 has a smaller surface tension than pure water 13, propanol contacts only a part of optical component 12 during cleaning, and there is a concern that cleaning of liquid contact surface 12a may be performed only partially. There is. Therefore, in order to attach the propanol 15 to the entire optical component 12, the distance between the optical component 12 and the object to be exposed (silicon wafer 14) is larger when immersed with propanol 15 than when immersed with pure water 13. It is desirable to make it narrow. That is, when the pure water 13 is gradually replaced with the propanol 15, the stage 31 is adjusted according to the amount of replacement with the propanol 15, and the distance between the optical component 12 and the object to be exposed (silicon wafer 14) is gradually narrowed. It is good to go. By adjusting the stage 31 in this way, the cleaning removal process is reliably performed over the entire liquid contact surface 12a of the optical component 12.

Here, propanol 15 has been described as an example of the cleaning liquid, but alcohol such as methanol, ethanol, propanol and butanol, or ketone such as acetone, which has high solubility in water and hardly retains stains, is optimal. May be used .

  In the above-described embodiment, an exposure apparatus that locally fills the space between the projection optical system 11 and the silicon wafer 14 with a liquid is employed. However, the exposure as disclosed in Japanese Patent Laid-Open No. 6-124873. An immersion exposure apparatus for moving a stage holding a target substrate in a liquid tank, or a liquid tank having a predetermined depth on a stage as disclosed in JP-A-10-303114, The present invention can also be applied to an immersion exposure apparatus that holds a substrate.

  Further, according to the present invention, a substrate to be processed such as a wafer is separately placed as disclosed in JP-A-10-163099, JP-A-10-214783, JP-T 2000-505958, and the like. The present invention can also be applied to a twin stage type exposure apparatus having two stages that can move independently in the XY directions.

FIG. 1 is a schematic view of a liquid contact portion of an immersion projection exposure apparatus including an optical component cleaning apparatus according to Embodiment 1 of the present invention. FIG. 2 is a cleaning procedure diagram of the optical component according to the first embodiment .

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Projection exposure apparatus 11 Projection optical system 12 Optical component 12a Liquid contact surface 13 Pure water 14 Silicon wafer 21 Liquid medium supply tank 21a Valve 22 Cleaning liquid supply tank 22a Valve 23 Pipe line 24 Nozzle 25 Dry nitrogen 31 Stage 31a Drain groove 32 Wipe off Device 32a Wiping cloth

Claims (2)

  1. In an immersion projection exposure apparatus in which the space between an optical component and an exposure object is filled with a liquid medium to increase the resolution,
    The liquid remaining on the liquid contact surface of the optical component can be removed using a cleaning liquid ,
    An immersion projection exposure apparatus equipped with an optical component cleaning mechanism, wherein the conduit for supplying the liquid medium and the conduit for supplying the cleaning liquid are coupled together by a single conduit .
  2. In an immersion projection exposure apparatus in which a space between an optical component and an object to be exposed is filled with a liquid medium to increase resolution, the liquid remaining on the wetted surface of the optical component is cleaned and removed.
    A first step of removing the liquid medium by replacing the liquid medium between the optical component and the object to be exposed with a cleaning liquid after the exposure is completed, and filling the cleaning medium with the cleaning liquid;
    A second step of cleaning the wetted surface with the cleaning liquid;
    And a third step of drying the wetted surface by removing the cleaning liquid .
JP2003305749A 2003-08-29 2003-08-29 Immersion projection exposure apparatus equipped with an optical component cleaning mechanism and immersion optical component cleaning method Expired - Fee Related JP4305095B2 (en)

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