JP4256518B2 - レーザ発振装置、露光装置及びデバイスの製造方法 - Google Patents

レーザ発振装置、露光装置及びデバイスの製造方法 Download PDF

Info

Publication number
JP4256518B2
JP4256518B2 JP05180799A JP5180799A JP4256518B2 JP 4256518 B2 JP4256518 B2 JP 4256518B2 JP 05180799 A JP05180799 A JP 05180799A JP 5180799 A JP5180799 A JP 5180799A JP 4256518 B2 JP4256518 B2 JP 4256518B2
Authority
JP
Japan
Prior art keywords
slot
microwave
laser oscillation
laser
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP05180799A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000252562A5 (enrdf_load_stackoverflow
JP2000252562A (ja
Inventor
忠弘 大見
昌樹 平山
壽邦 篠原
信義 田中
伸昌 鈴木
大 大沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP05180799A priority Critical patent/JP4256518B2/ja
Priority to DE60023964T priority patent/DE60023964T2/de
Priority to EP00300719A priority patent/EP1026796B1/en
Priority to US09/494,945 priority patent/US6829279B1/en
Publication of JP2000252562A publication Critical patent/JP2000252562A/ja
Publication of JP2000252562A5 publication Critical patent/JP2000252562A5/ja
Application granted granted Critical
Publication of JP4256518B2 publication Critical patent/JP4256518B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Lasers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP05180799A 1999-02-01 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法 Expired - Lifetime JP4256518B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP05180799A JP4256518B2 (ja) 1999-02-26 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法
DE60023964T DE60023964T2 (de) 1999-02-01 2000-01-31 Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren
EP00300719A EP1026796B1 (en) 1999-02-01 2000-01-31 Laser oscillating apparatus, exposure apparatus using the same, and device fabrication method
US09/494,945 US6829279B1 (en) 1999-02-01 2000-02-01 Laser oscillating apparatus, exposure apparatus using the same and device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05180799A JP4256518B2 (ja) 1999-02-26 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2000252562A JP2000252562A (ja) 2000-09-14
JP2000252562A5 JP2000252562A5 (enrdf_load_stackoverflow) 2006-04-13
JP4256518B2 true JP4256518B2 (ja) 2009-04-22

Family

ID=12897203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05180799A Expired - Lifetime JP4256518B2 (ja) 1999-02-01 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP4256518B2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3851842B2 (ja) * 2002-05-10 2006-11-29 ミツミ電機株式会社 アレーアンテナ

Also Published As

Publication number Publication date
JP2000252562A (ja) 2000-09-14

Similar Documents

Publication Publication Date Title
KR100349015B1 (ko) 엑시머레이저발진장치 및 방법, 엑시머레이저노광장치,그리고 레이저관
JP4970697B2 (ja) 高効率の光放射発生用の光マグネトロンおよび１／２λ誘起πモード動作
JP2002006096A (ja) 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
US6339634B1 (en) Soft x-ray light source device
EP1848004A2 (en) Extreme UV radiation focusing mirror and extreme UV radiation source device
US8216420B2 (en) Plasma processing apparatus
US6690702B1 (en) Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
KR20040007454A (ko) 극단 자외광 발생장치, 이를 사용한 노광장치 및 반도체제조방법
US6829279B1 (en) Laser oscillating apparatus, exposure apparatus using the same and device fabrication method
JP4256518B2 (ja) レーザ発振装置、露光装置及びデバイスの製造方法
EP1032097B1 (en) Laser oscillating apparatus
JP4256520B2 (ja) レーザ発振装置、露光装置及びデバイスの製造方法
JP4204689B2 (ja) レーザ発振装置、露光装置及びデバイスの製造方法
JP4303350B2 (ja) レーザ発振装置、露光装置及びデバイスの製造方法
JPH10163547A (ja) 連続発光エキシマレーザ発振装置及び発振方法、露光装置並びにレーザ管
JP4256519B2 (ja) レーザ発振装置、露光装置及びデバイスの製造方法
JP4295855B2 (ja) レーザ発振装置、露光装置及びデバイスの製造方法
JP4302810B2 (ja) レーザ発振装置、露光装置及びデバイスの製造方法
JP2000252563A (ja) レーザ発振装置、露光装置及びデバイスの製造方法
JPH10106927A (ja) 露光装置及びデバイス製造方法
JPH10163553A (ja) 連続発光エキシマレーザ発振装置及び発振方法、露光装置並びにレーザ管
JPH11354862A (ja) エキシマレーザ発振装置及び発振方法、露光装置並びにレーザ管
JPH11204857A (ja) エキシマレーザ発振装置及び発振方法、露光装置並びにレーザ管
KR20040020585A (ko) 플라즈마 반응기를 이용한 극자외선 발생 장치 및 방법
JPH03211817A (ja) 露光装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060224

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060224

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080902

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080916

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081114

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090106

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090130

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120206

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130206

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140206

Year of fee payment: 5

EXPY Cancellation because of completion of term