JP4212555B2 - 薄板製造方法、薄板製造装置および下地板 - Google Patents
薄板製造方法、薄板製造装置および下地板 Download PDFInfo
- Publication number
- JP4212555B2 JP4212555B2 JP2004517274A JP2004517274A JP4212555B2 JP 4212555 B2 JP4212555 B2 JP 4212555B2 JP 2004517274 A JP2004517274 A JP 2004517274A JP 2004517274 A JP2004517274 A JP 2004517274A JP 4212555 B2 JP4212555 B2 JP 4212555B2
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- thin plate
- plate
- manufacturing
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002191158 | 2002-06-28 | ||
JP2002191158 | 2002-06-28 | ||
PCT/JP2003/008055 WO2004003263A1 (fr) | 2002-06-28 | 2003-06-25 | Procede de production de plaques minces, appareil de production de plaques minces et plaque de base |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2004003263A1 JPWO2004003263A1 (ja) | 2005-10-27 |
JP4212555B2 true JP4212555B2 (ja) | 2009-01-21 |
Family
ID=29996912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004517274A Expired - Fee Related JP4212555B2 (ja) | 2002-06-28 | 2003-06-25 | 薄板製造方法、薄板製造装置および下地板 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4212555B2 (fr) |
AU (1) | AU2003244060A1 (fr) |
TW (1) | TWI279460B (fr) |
WO (1) | WO2004003263A1 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7747702B2 (en) | 1998-09-22 | 2010-06-29 | Avocent Huntsville Corporation | System and method for accessing and operating personal computers remotely |
US7818367B2 (en) | 1995-08-25 | 2010-10-19 | Avocent Redmond Corp. | Computer interconnection system |
USRE44814E1 (en) | 1992-10-23 | 2014-03-18 | Avocent Huntsville Corporation | System and method for remote monitoring and operation of personal computers |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014001886A1 (fr) | 2012-06-27 | 2014-01-03 | Rgs Development B.V. | Film de matériau semi-conducteur polycristallin, procédé de fabrication de celui-ci et moules d'orientation/surfusion pour celui-ci, et dispositif électronique |
WO2014001888A1 (fr) | 2012-06-27 | 2014-01-03 | Rgs Development B.V. | Film de matériau semi-conducteur polycristallin, procédé de fabrication de celui-ci et moules de surfusion pour celui-ci, et dispositif électronique |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4121697B2 (ja) * | 1999-12-27 | 2008-07-23 | シャープ株式会社 | 結晶シートの製造方法およびその製造装置 |
JP4451556B2 (ja) * | 2000-09-08 | 2010-04-14 | シャープ株式会社 | シリコンリボン製造装置及びそれによるシリコンリボンを用いた太陽電池 |
JP4039057B2 (ja) * | 2001-12-27 | 2008-01-30 | 神鋼電機株式会社 | 析出用基板 |
-
2003
- 2003-06-25 WO PCT/JP2003/008055 patent/WO2004003263A1/fr active Application Filing
- 2003-06-25 AU AU2003244060A patent/AU2003244060A1/en not_active Abandoned
- 2003-06-25 JP JP2004517274A patent/JP4212555B2/ja not_active Expired - Fee Related
- 2003-06-27 TW TW092117644A patent/TWI279460B/zh not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE44814E1 (en) | 1992-10-23 | 2014-03-18 | Avocent Huntsville Corporation | System and method for remote monitoring and operation of personal computers |
US7818367B2 (en) | 1995-08-25 | 2010-10-19 | Avocent Redmond Corp. | Computer interconnection system |
US7747702B2 (en) | 1998-09-22 | 2010-06-29 | Avocent Huntsville Corporation | System and method for accessing and operating personal computers remotely |
Also Published As
Publication number | Publication date |
---|---|
WO2004003263A1 (fr) | 2004-01-08 |
TWI279460B (en) | 2007-04-21 |
TW200407468A (en) | 2004-05-16 |
JPWO2004003263A1 (ja) | 2005-10-27 |
AU2003244060A1 (en) | 2004-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5032168B2 (ja) | バルク基板中の結晶欠陥を顕在化する方法 | |
US7281334B2 (en) | Mechanical scribing apparatus with controlling force of a scribing cutter | |
US6596075B2 (en) | Method of producing a crystal sheet, apparatus for use in producing the same, and solar cell | |
JP4839836B2 (ja) | シリコンエピタキシャルウェーハの製造方法 | |
TWI391540B (zh) | 擋板晶圓與用於其上之隨機定向多晶矽 | |
JP4212555B2 (ja) | 薄板製造方法、薄板製造装置および下地板 | |
CN1307653A (zh) | 基本无生长缺陷的外延硅片 | |
US9926646B2 (en) | Method for growing B-Ga2O3-based single crystal | |
JP5143292B2 (ja) | シリカガラスルツボ | |
JP4105158B2 (ja) | 薄板製造方法および薄板製造装置 | |
CN108315721B (zh) | 成膜机台及成膜制程调整基板偏转量的方法 | |
CN103521463A (zh) | 一种基于光致发光的太阳能硅片分选系统及方法 | |
JP6734150B2 (ja) | 多結晶シリコン柱 | |
JP2004149324A (ja) | 多結晶シリコンロッド及びその製造方法、並びにそのロッドの製造に使用されるシリコン芯材 | |
JP2003142407A (ja) | 薄膜成長装置用のリフトピン、その形成方法およびリフトピン頭部 | |
Belouet | Growth of silicon ribbons by the RAD process | |
CN103367535B (zh) | 薄膜太阳电池的槽加工工具、方法及槽加工装置 | |
CN214937960U (zh) | 石英玻璃坩埚 | |
CN114082729B (zh) | 一种外延炉反应腔的清洗系统、方法、设备和存储介质 | |
JP2003197547A (ja) | シリコンエピタキシャルウェーハの製造方法 | |
JP2003054932A (ja) | 半導体基板の製造装置、半導体基板およびその製造方法ならびに太陽電池 | |
CN117410224A (zh) | 斜面刻蚀设备的晶圆定位机构、斜面刻蚀设备及晶圆的传片方法 | |
CN2765322Y (zh) | 晶圆基座 | |
CN116924828A (zh) | 一种降低陶瓷基板打孔产生裂纹的方法 | |
JP2008120640A (ja) | 薄板製造装置および薄板製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050810 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080715 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080901 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20081021 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20081028 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111107 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111107 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121107 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121107 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131107 Year of fee payment: 5 |
|
LAPS | Cancellation because of no payment of annual fees |