JP4197776B2 - 光スキャナ - Google Patents
光スキャナ Download PDFInfo
- Publication number
- JP4197776B2 JP4197776B2 JP26127098A JP26127098A JP4197776B2 JP 4197776 B2 JP4197776 B2 JP 4197776B2 JP 26127098 A JP26127098 A JP 26127098A JP 26127098 A JP26127098 A JP 26127098A JP 4197776 B2 JP4197776 B2 JP 4197776B2
- Authority
- JP
- Japan
- Prior art keywords
- elastic member
- movable plate
- optical scanner
- wiring
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 122
- 238000001514 detection method Methods 0.000 claims description 42
- 238000006073 displacement reaction Methods 0.000 claims description 6
- 230000005489 elastic deformation Effects 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 description 82
- 239000004642 Polyimide Substances 0.000 description 79
- 239000010410 layer Substances 0.000 description 71
- 239000010408 film Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 22
- 238000004519 manufacturing process Methods 0.000 description 22
- 229910052710 silicon Inorganic materials 0.000 description 22
- 239000010703 silicon Substances 0.000 description 22
- 239000000758 substrate Substances 0.000 description 21
- 229910052581 Si3N4 Inorganic materials 0.000 description 20
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 20
- 238000010586 diagram Methods 0.000 description 16
- 230000004048 modification Effects 0.000 description 15
- 238000012986 modification Methods 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 230000000694 effects Effects 0.000 description 11
- 238000005530 etching Methods 0.000 description 11
- 238000005452 bending Methods 0.000 description 10
- 238000004088 simulation Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 230000007774 longterm Effects 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Images
Landscapes
- Mechanical Optical Scanning Systems (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26127098A JP4197776B2 (ja) | 1997-12-26 | 1998-09-16 | 光スキャナ |
| US09/213,062 US6188504B1 (en) | 1996-06-28 | 1998-12-16 | Optical scanner |
| US09/704,284 US6392776B1 (en) | 1996-06-28 | 2000-11-01 | Optical scanner |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9-358901 | 1997-12-26 | ||
| JP35890197 | 1997-12-26 | ||
| JP26127098A JP4197776B2 (ja) | 1997-12-26 | 1998-09-16 | 光スキャナ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11242180A JPH11242180A (ja) | 1999-09-07 |
| JPH11242180A5 JPH11242180A5 (enExample) | 2005-10-27 |
| JP4197776B2 true JP4197776B2 (ja) | 2008-12-17 |
Family
ID=26544993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26127098A Expired - Fee Related JP4197776B2 (ja) | 1996-06-28 | 1998-09-16 | 光スキャナ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4197776B2 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001228434A (ja) * | 1999-12-08 | 2001-08-24 | Nippon Signal Co Ltd:The | 電磁駆動型光走査装置 |
| US7064879B1 (en) | 2000-04-07 | 2006-06-20 | Microsoft Corporation | Magnetically actuated microelectrochemical systems actuator |
| WO2002008818A1 (en) * | 2000-07-24 | 2002-01-31 | Nhk Spring Co., Ltd. | Probe light scanning actuator |
| JP2002078368A (ja) * | 2000-08-28 | 2002-03-15 | Olympus Optical Co Ltd | アクチュエータ駆動装置 |
| JP2005099063A (ja) * | 2000-12-11 | 2005-04-14 | Miwa Engineering:Kk | 偏向アクチュエータ、光走査素子、及び受光走査素子 |
| JP2002307396A (ja) * | 2001-04-13 | 2002-10-23 | Olympus Optical Co Ltd | アクチュエータ |
| US6775039B2 (en) | 2001-07-13 | 2004-08-10 | Olympus Corporation | Driving circuit for an optical scanner |
| JP4890689B2 (ja) | 2001-07-24 | 2012-03-07 | オリンパス株式会社 | 三次元構造体の製造方法及び揺動体の製造方法 |
| US6865064B2 (en) | 2001-08-29 | 2005-03-08 | Olympus Corporation | Drive apparatus and drive method for electromagnetic drive actuator |
| JP4915092B2 (ja) * | 2005-12-22 | 2012-04-11 | 株式会社ニコン | 可変フィルタ装置及び投射型表示装置 |
| KR100773535B1 (ko) * | 2006-06-14 | 2007-11-05 | 삼성전기주식회사 | 맴스 디바이스 |
| JP4251206B2 (ja) | 2006-09-20 | 2009-04-08 | セイコーエプソン株式会社 | アクチュエータ、光スキャナおよび画像形成装置 |
| JP2008089502A (ja) * | 2006-10-04 | 2008-04-17 | Kagawa Univ | 自励発振駆動機構、センサおよびプローブ顕微鏡 |
| JP2010169948A (ja) * | 2009-01-23 | 2010-08-05 | Sumitomo Precision Prod Co Ltd | 光走査装置用揺動ミラー、揺動状態検出装置、及び、光走査装置 |
| JP6180074B2 (ja) * | 2011-08-30 | 2017-08-16 | 日本信号株式会社 | プレーナ型電磁アクチュエータ |
-
1998
- 1998-09-16 JP JP26127098A patent/JP4197776B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11242180A (ja) | 1999-09-07 |
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