JP4194591B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4194591B2
JP4194591B2 JP2005291806A JP2005291806A JP4194591B2 JP 4194591 B2 JP4194591 B2 JP 4194591B2 JP 2005291806 A JP2005291806 A JP 2005291806A JP 2005291806 A JP2005291806 A JP 2005291806A JP 4194591 B2 JP4194591 B2 JP 4194591B2
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Prior art keywords
liquid
wafer
substrate
optical system
projection optical
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JP2006060248A5 (https=
JP2006060248A (ja
Inventor
一志 中野
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Canon Inc
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Canon Inc
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2005291806A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP4194591B2 (ja)

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JP2005291806A JP4194591B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

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JP2005291806A JP4194591B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

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JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Publications (3)

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JP2006060248A JP2006060248A (ja) 2006-03-02
JP2006060248A5 JP2006060248A5 (https=) 2007-08-16
JP4194591B2 true JP4194591B2 (ja) 2008-12-10

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Publication number Publication date
JP2006060248A (ja) 2006-03-02

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