JP4165554B2 - Board bonding equipment - Google Patents

Board bonding equipment Download PDF

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JP4165554B2
JP4165554B2 JP2005310638A JP2005310638A JP4165554B2 JP 4165554 B2 JP4165554 B2 JP 4165554B2 JP 2005310638 A JP2005310638 A JP 2005310638A JP 2005310638 A JP2005310638 A JP 2005310638A JP 4165554 B2 JP4165554 B2 JP 4165554B2
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substrate
chamber
substrates
carriage
state
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JP2007121474A (en
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一雄 高橋
幸徳 中山
立春 山本
正行 斉藤
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Hitachi Plant Technologies Ltd
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Description

本発明は基板貼合装置に係り、特に真空チャンバ内で貼り合わせる基板同士をそれぞれ保持して対向させ、間隔を狭めて貼り合せる液晶表示パネルなどの組立に好適な基板貼合装置に関する。   The present invention relates to a substrate bonding apparatus, and more particularly to a substrate bonding apparatus suitable for assembling a liquid crystal display panel or the like in which substrates to be bonded in a vacuum chamber are held and opposed to each other and bonded at a reduced interval.

液晶表示パネルの製造には、透明電極や薄膜トランジスタアレイを設けた2枚のガラス基板を数μm程度の極めて接近した間隔をもって基板の周縁部に設けた接着剤(以下、シール剤ともいう)で貼り合せ(以後、貼り合せ後の基板をセルと呼ぶ)、それによって形成される空間に液晶を封止する工程がある。   In manufacturing a liquid crystal display panel, two glass substrates provided with a transparent electrode and a thin film transistor array are attached with an adhesive (hereinafter also referred to as a sealing agent) provided on the peripheral edge of the substrate with a very close distance of about several μm. There is a process of bonding (hereinafter, the substrate after bonding is referred to as a cell) and sealing the liquid crystal in the space formed thereby.

この液晶の封止には、注入口を設けないようにシール剤をクローズしたパターンに描画した一方の基板上に液晶を滴下しておいて、真空チャンバ内において他方の基板を一方の基板上に配置し、上下の基板を接近させて貼り合せる方法などがある。この真空チャンバ内に基板を搬入・搬出するために予備室を設け、真空チャンバ内を予備室と同じ雰囲気にして基板の出し入れを行うことが特許文献1に開示されている。   To seal the liquid crystal, liquid crystal is dropped on one substrate drawn in a pattern in which a sealing agent is closed so as not to provide an injection port, and the other substrate is placed on one substrate in a vacuum chamber. There is a method of arranging and bonding the upper and lower substrates close to each other. Patent Document 1 discloses that a preliminary chamber is provided for loading / unloading a substrate into / from the vacuum chamber, and the substrate is loaded / removed in the same atmosphere as the preliminary chamber.

特開2001−305563号公報JP 2001-305563 A

上記従来技術では、基板の出し入れの際に予備室と真空チャンバ内を同じ雰囲気にするために、大気状態から真空状態にするまでに時間がかかり、基板の生産性を上げるためにはネックとなっている。また、特許文献1では基板の搬送をコロの上に基板を搭載して搬送するようにしているが、基板を傷つける恐れや、基板がコロ上移動することで摩擦により、塵埃が発生する恐れもある。また基板を搬入する場合に、1枚づつしか搬入できないために、貼り合せ室まで大気状態に戻す必要があった。また、貼り合せる基板サイズが1m×1mを超える基板を用いる用になってきており、上テーブルに水平に保持することも困難になりつつある。   In the above-described prior art, in order to make the preliminary chamber and the vacuum chamber the same atmosphere when the substrate is taken in and out, it takes time to change from the atmospheric state to the vacuum state, and this becomes a bottleneck to increase the productivity of the substrate. ing. Further, in Patent Document 1, the substrate is transported by mounting the substrate on a roller. However, there is a risk that the substrate may be damaged or dust may be generated due to friction due to the substrate moving on the roller. is there. Further, when the substrates are carried in, only one can be carried in at a time, so that it has been necessary to return the atmosphere to the bonding chamber. In addition, it is becoming increasingly difficult to use a substrate having a substrate size exceeding 1 m × 1 m to be bonded and to hold it horizontally on the upper table.

それゆえ本発明の目的は、予備室から貼り合せ室に上下基板を同時に搬入できるようにして、かつ上テーブル面に撓みなく保持できるように構成して、基板の貼り合せを高精度かつ高速に行うことができ、生産性が高い基板貼合装置を提供することにある。   Therefore, the object of the present invention is to allow the upper and lower substrates to be carried simultaneously from the preliminary chamber to the bonding chamber and to be held on the upper table surface without bending, so that the bonding of the substrates can be performed with high accuracy and at high speed. An object of the present invention is to provide a substrate bonding apparatus that can be performed and has high productivity.

上記目的を達成するため、本発明では、上下2枚の基板をそれぞれ搬入するための2段の基板載置台を有する基板搬入台車を有し、前記上下2枚の基板を搬入するとき、大気圧状態に設定され、前記上下2枚の基板を前記基板搬入台車に載置して搬出するとき、中真空状態に設定される第1チャンバン室と、前記中真空状態で前記第1チャンバ室から搬出される前記基板搬入台車での前記上下2枚の基板を受け取り、前記高真空状態で前記上下2枚の基板をそれぞれ保持する上テーブルと下テーブルとを有し、いずれか一方の前記テーブルを水平方向に移動して、前記上下2枚の基板の位置合せをし、上下いずれか一方の前記テーブルを上下に動作させて前記上下2枚の基板間隔を狭めて貼り合せを行う第2チャンバ室と、前記中真空状態で、前記第2チャンバ室で前記上下2枚の基板が貼り合わされてなる完成基板を第2チャンバ室から搬出する載置台を有する完成基板搬出台車を備え、大気状態で前記完成基板を室外に搬出する第3チャンバ室とを備え、前記中真空状態は、前記第2チャンバ室内で前記上下2枚の基板の前記貼り合わせを行なうときの高真空状態と前記大気圧状態との間の真空度の状態であり、前記基板搬入台車の前記上基板載置台には、前記上基板を搬送方向に基板中央部を前記上テーブル側に凸状態に湾曲させて保持する上基板湾曲保持機構を設け、前記第2チャンバ室で、前記上テーブルを前記上基板載置台での前記上基板に降下させることにより、前記上テーブルが前記上基板を吸着する構成とした。 In order to achieve the above object, according to the present invention, there is provided a substrate loading carriage having a two-stage substrate mounting table for loading the upper and lower two substrates , respectively , and when the upper and lower two substrates are loaded, It is set to a state, unloading the upper and lower substrates when unloaded is placed on the substrate carriages, a first Chanban chamber set in the medium vacuum state, from the first chamber compartment with the vacuum state receiving the upper and lower substrates in the substrate carriages being, and a upper table and a lower table for holding respectively the upper and lower substrates in the high vacuum state, either one of the horizontal table moves in the direction, the the alignment of upper and lower substrates, a second chamber compartment above or below by one of the tables is operated up and down perform bonding by narrowing the distance between the upper and lower substrates and, it said in a vacuum state Includes the finished substrate unloading carriage with a mounting table for unloading the second chamber compartment at the upper and lower sheets of the finished board substrate is by bonding a second chamber compartment, in atmospheric conditions, unloading the finished substrate outdoors And the intermediate vacuum state is a degree of vacuum between the high vacuum state and the atmospheric pressure state when the upper and lower two substrates are bonded together in the second chamber chamber. a state, on the substrate mounting table of the substrate carriages is provided with a substrate curved holding mechanism on which holds the substrate central portion in the conveying direction of the substrate is curved in a convex state on said table side, wherein The upper table is configured to adsorb the upper substrate by lowering the upper table to the upper substrate on the upper substrate mounting table in the second chamber chamber .

本発明の基板貼合装置によれば、搬送する上基板自体を搬送開始前から湾曲させて搬送し、その状態で上テーブルに受け渡せるために、基板を歪みなく上テーブルに吸着保持でき、かつ、貼り合せ用第2チャンバ室でも上下基板をほぼ同時にテーブルに受け渡せ、かつ、貼り合せ時に時間の最も必要とする大気圧から高真空状態にする真空排気時間を短時間で行うことができ、ために、製品のスループットが大幅に向上し、真空中での基板の貼り合せも高精度に行うことができる。   According to the substrate bonding apparatus of the present invention, the upper substrate to be transported is curved and transported before the start of transport, and can be transferred to the upper table in that state, so that the substrate can be sucked and held on the upper table without distortion, and In the second chamber for bonding, the upper and lower substrates can be transferred to the table almost simultaneously, and the evacuation time from the atmospheric pressure most required for bonding to the high vacuum state can be performed in a short time. Therefore, the throughput of the product is greatly improved, and the substrates can be bonded with high accuracy in a vacuum.

以下、本発明の基板貼合搬送システムの一実施例を図に基づいて説明する。
図1には各処理室の断面を示す。本発明になる基板貼合装置1は、基板を搬入する第1チャンバ室C1(前予備室)、第2チャンバ室C2(真空貼合室)、貼り合せた基板(液晶パネル)を搬出する第3チャンバ室C3(後予備室)を備えている。第1チャンバ室C1には2枚の基板(上基板30と下基板31)をそれぞれ第2チャンバ室C2内に搬入するために、上下基板搬入台車51が設けてある。また、第3チャンバ室C3には貼り合せの終わった基板を搬出するための搬出用搬送台車61が設けてある。さらに、第1チャンバ室C1の入口側に第1ドアバルブ2が、第1チャンバ室C1と第2チャンバ室C2の間には第1ゲートバルブ3が設けてある。同様に第2チャンバ室C2と第3チャンバ室C3との間には第2ゲートバルブ4が第3チャンバ室C3の出口側には第2ドアバルブ5が設けてある。
Hereinafter, one Example of the board | substrate bonding conveyance system of this invention is described based on figures.
FIG. 1 shows a cross section of each processing chamber. The substrate bonding apparatus 1 according to the present invention includes a first chamber chamber C1 (preliminary preparatory chamber), a second chamber chamber C2 (vacuum bonding chamber), and a bonded substrate (liquid crystal panel) for loading substrates. A three-chamber chamber C3 (rear spare chamber) is provided. In the first chamber chamber C1, an upper and lower substrate loading cart 51 is provided for loading two substrates (upper substrate 30 and lower substrate 31) into the second chamber chamber C2, respectively. The third chamber C3 is provided with an unloading carriage 61 for unloading the bonded substrates. Further, a first door valve 2 is provided on the inlet side of the first chamber chamber C1, and a first gate valve 3 is provided between the first chamber chamber C1 and the second chamber chamber C2. Similarly, a second gate valve 4 is provided between the second chamber chamber C2 and the third chamber chamber C3, and a second door valve 5 is provided on the outlet side of the third chamber chamber C3.

さらに第1チャンバ室C1を減圧するための真空ポンプ6と、第1チャンバ室内にパージする窒素を供給するための窒素供給源20が接続されている。   Further, a vacuum pump 6 for depressurizing the first chamber chamber C1 and a nitrogen supply source 20 for supplying nitrogen to be purged into the first chamber chamber are connected.

第2チャンバ室C2には、下側基板31を載置する下テーブル8と上側基板30を吸着保持する上テーブル(加圧板)9が内部に設けてある。また第2チャンバ室C2の外側には第2チャンバ室内部を真空にするための真空ポンプ10とターボ分子ポンプ11とが設けてある。なお、ターボ分子ポンプ11の吸入側には第3ゲートバルブ21が設けてある。さらにまた、上下テーブルに負圧を供給して上下基板をそれぞれ吸着保持するためのテーブル吸着用の真空ポンプ12が設けてある。なお、それぞれのテーブル面には複数の吸着口が設けてありこの供給口に負圧を供給すること基板を吸着するものである。また、この第2チャンバ室C2にも窒素をパージするために窒素供給源20が接続されている。上テーブル9の下面側には高真空状態でも上基板30を吸着保持できるように、静電力または粘着力を作用させる保持チャック17が設けてある。同様に下テーブル8にも保持チャック18が設けてある。なお、下テーブル8に用いる保持チャック18に用いたものが粘着力を作用させるものの場合は、部分的に粘着力を作用させるように構成すればよい。さらに、下テーブル8側には搬送台車51から下基板31を受け取るために基板搬送台車の下段側の下基板載置面から突出する複数の受け取り爪を供えた基板リフタ19が設けてある。この基板リフタ19は、基板搬出台車61に貼り合わせ後の基板を受け渡すため、基板をテーブル面から離間させ、基板搬出台車61に設けてあるホーク状の基板受け取り部がテーブル面と基板間に挿入できるようにする機能も備えている。なお図1では、この基板リフタ19として1つの取り付け板に複数のサポートピンを設け、図示していない駆動装置で取り付け板を上下する構成のものを示している。   In the second chamber C2, a lower table 8 for placing the lower substrate 31 and an upper table (pressure plate) 9 for sucking and holding the upper substrate 30 are provided inside. Further, a vacuum pump 10 and a turbo molecular pump 11 are provided outside the second chamber chamber C2 for evacuating the second chamber chamber. A third gate valve 21 is provided on the suction side of the turbo molecular pump 11. Furthermore, a vacuum pump 12 for table suction is provided for supplying negative pressure to the upper and lower tables and holding the upper and lower substrates by suction. Each table surface is provided with a plurality of suction ports, and the substrate is sucked by supplying a negative pressure to the supply ports. A nitrogen supply source 20 is also connected to the second chamber chamber C2 in order to purge nitrogen. A holding chuck 17 for applying an electrostatic force or an adhesive force is provided on the lower surface side of the upper table 9 so that the upper substrate 30 can be sucked and held even in a high vacuum state. Similarly, a holding chuck 18 is provided on the lower table 8. In addition, what is necessary is just to comprise so that adhesive force may be acted partially when what was used for the holding chuck 18 used for the lower table 8 applies adhesive force. Further, on the lower table 8 side, in order to receive the lower substrate 31 from the transport carriage 51, a substrate lifter 19 provided with a plurality of receiving claws protruding from the lower substrate placement surface on the lower stage of the substrate transport carriage is provided. Since the substrate lifter 19 delivers the substrate after being bonded to the substrate carry-out carriage 61, the substrate is separated from the table surface, and the fork-shaped substrate receiving portion provided on the substrate carry-out carriage 61 is interposed between the table surface and the substrate. It also has a function to allow insertion. In FIG. 1, the substrate lifter 19 has a configuration in which a plurality of support pins are provided on one mounting plate, and the mounting plate is moved up and down by a driving device (not shown).

さらに、第3チャンバ室C3には貼り合せた基板を搬出する際に基板搬出用台車が備えてある。基板搬出台車61の基板受け取り部は図2に示すようにホーク状に形成してある。その駆動部等の構成は図2の基板搬入台車と略同じ構成としてある。また、第3チャンバ室C3内を負圧にするための真空ポンプ16が設けてある。さらに、第3チャンバ室C3内に窒素をパージするための窒素供給源20が接続されている。   Further, the third chamber chamber C3 is provided with a substrate carrying cart when carrying out the bonded substrates. The substrate receiving portion of the substrate carry-out carriage 61 is formed in a hawk shape as shown in FIG. The configuration of the drive unit and the like is substantially the same as that of the substrate carry-in cart in FIG. Further, a vacuum pump 16 is provided for making the inside of the third chamber C3 have a negative pressure. Further, a nitrogen supply source 20 for purging nitrogen is connected to the third chamber chamber C3.

また、各チャンバ室にはそれぞれ圧力計P1〜P3が設けてあり、これらの圧力計の計測結果に基づいて、各真空ポンプ6,10,16や窒素パージ用の弁NV1〜NV3を動作させて真空状態を制御している。   Each chamber chamber is provided with pressure gauges P1 to P3. Based on the measurement results of these pressure gauges, the vacuum pumps 6, 10, 16 and the nitrogen purge valves NV1 to NV3 are operated. The vacuum state is controlled.

本実施例では、貼り合せを行う第2チャンバ室C2は、基板を搬出入する際も所定の真空度(約20KPa程度:以降中真空と称する))を維持するようにして、基板搬入後に第2チャンバ室C2を高真空(0.7Pa)に戻すように制御している。そのため、各第1及び第2ゲートバルブ3,4を開放する際には中真空度まで戻すようにしている。また、第2チャンバ室C2は、中真空にするときは常時窒素がパージすることで、大気中の水分の影響を受けないようにしている。   In this embodiment, the second chamber chamber C2 to be bonded is maintained at a predetermined degree of vacuum (about 20 KPa: hereinafter referred to as “medium vacuum”) even when the substrate is carried in and out. The two-chamber chamber C2 is controlled to return to a high vacuum (0.7 Pa). Therefore, when each of the first and second gate valves 3 and 4 is opened, it is returned to a medium vacuum level. Further, the second chamber chamber C2 is purged with nitrogen at all times when being in a medium vacuum so that it is not affected by moisture in the atmosphere.

また、上記のように各チャンバ室内の真空度を制御するために、各チャンバ室に設けた圧力計の計測値に基づいて、各チャンバ室内の排気、気体パージを行う。基板を第1チャンバC1内に搬入する時は当然のことながら第1チャンバ室内は大気圧として、第1チャンバ室C1から第2チャンバ室C2に搬入する際には所定の真空度(中真空)に維持される状態で行い、第2チャンバ室内で貼り合せを行う場合は、第2チャンバ室を高真空の状態とする。また、貼り合せの完了した基板を第2チャンバ室から第3チャンバ室に搬出するときは、第2、第3チャンバ室を中真空状態として、第3チャンバ室から貼り合せ基板を搬出するときは、第3チャンバ室を大気状態とするものである。   Further, in order to control the degree of vacuum in each chamber chamber as described above, exhaust and gas purge are performed in each chamber chamber based on the measurement value of the pressure gauge provided in each chamber chamber. Naturally, when the substrate is carried into the first chamber C1, the first chamber is at atmospheric pressure, and when the substrate is carried from the first chamber C1 to the second chamber C2, a predetermined degree of vacuum (medium vacuum) is obtained. When the bonding is performed in the second chamber chamber, the second chamber chamber is brought into a high vacuum state. In addition, when carrying out the bonded substrate from the second chamber chamber to the third chamber chamber, when carrying out the bonded substrate from the third chamber chamber with the second and third chamber chambers in an intermediate vacuum state. The third chamber chamber is brought into an atmospheric state.

次に、基板搬入台車による基板搬送の状況を、図2を用いて説明する。   Next, the state of substrate conveyance by the substrate carrying cart will be described with reference to FIG.

図2(a)には第1チャンバ室と第2チャンバ室の部分断面図を、(b)には基板搬入台車の拡大図を示す。基板搬入台車51は、上下2段に構成され、下段には下基板30を上段に上基板を載置して搬送する構成となっている。図に示すように、下段側は複数の片持ちの基板支え60で構成されている。また上段は、図のように上基板30を搬送方向に湾曲させて搬送できるように上基板湾曲保持機構を備えている。この上基板湾曲保持機構は、複数の基板エッジクランプ59と、台車中央部付近に搬送方向に対して直角方向に一列に、基板を上方に押し上げて支持する複数の基板支持機構58とから構成されている。さらに、上基板湾曲保持機構として上段側の搬送方向と直角方向の両端部側には湾曲状態の基板サイドサポート57が設けてある。   FIG. 2A is a partial cross-sectional view of the first chamber chamber and the second chamber chamber, and FIG. 2B is an enlarged view of the substrate carrying carriage. The substrate carry-in cart 51 is configured in two upper and lower stages, and the lower board 30 is placed on the upper stage and the upper board is placed on the upper stage and transported. As shown in the figure, the lower side is composed of a plurality of cantilevered substrate supports 60. The upper stage is provided with an upper substrate bending holding mechanism so that the upper substrate 30 can be bent and transferred in the transfer direction as shown in the figure. This upper substrate bending holding mechanism is composed of a plurality of substrate edge clamps 59 and a plurality of substrate support mechanisms 58 that support the substrate by pushing it up in a row in the direction perpendicular to the transport direction near the center of the carriage. ing. Further, a curved substrate side support 57 is provided on both end sides of the upper substrate in the direction perpendicular to the conveying direction as the upper substrate bending holding mechanism.

この基板搬入台車51の両サイドにはリニアガイドの駆動部が設けてあり、第1チャンバ室内に設けたリニアガイド上を移動すると共に、台車下部に設けた複数の2連サポートローラ54により、台車は第1チャンバ室C1の設けたガイドレール55と第2チャンバ室に設けたガイドレール56上を移動できるように構成してある。すなわち、2連サポートローラ54の車輪間隔は第1ゲートバルブをレール無しで通過するため、ガイドレール55,56の間隔より長くしてある。   On both sides of the substrate carrying carriage 51, a linear guide drive unit is provided. The carriage is moved on the linear guide provided in the first chamber chamber, and the carriage is supported by a plurality of double support rollers 54 provided at the lower part of the carriage. Is configured to be movable on a guide rail 55 provided in the first chamber chamber C1 and a guide rail 56 provided in the second chamber chamber. That is, the distance between the wheels of the double support roller 54 is longer than the distance between the guide rails 55 and 56 in order to pass through the first gate valve without a rail.

また、図2では、第2チャンバ室内に設けた下テーブル21には、基板リフタ19として第1図の構成とは異なり、空圧シリンダとそれにより上下するサポートピンを複数設けた構成のものが示してある。   Further, in FIG. 2, the lower table 21 provided in the second chamber chamber has a structure in which a plurality of pneumatic cylinders and support pins that move up and down are provided as the substrate lifter 19 unlike the structure in FIG. It is shown.

前述のように基板搬入台車51を用いて第1チャンバ室から第2チャンバ室に搬入された下基板31は、下テーブル8に設けられた基板リフタ19により、下段の載置台より持ち上げられ、台車を移動後に、基板リフタ19を降下させることで、下テーブル面上に水平に載置することができる。また、下テーブル8には真空排気する過程及び基板貼り合せの過程で下基板が移動しないように、静電吸着機構、又は部分粘着機構が設けてありこれらの基板保持機構で下テーブル面に載置した基板が移動しないようにしている。
また、上段の載置台上に搬送方向の中央部が凸に湾曲状態で搬入された上基板30は、上テーブルを基板面まで降下するとその凸部から接触し吸引吸着される。このように、基板中央部から吸着保持することで基板が大きくなり撓みやすくても、テーブル面に撓みなく吸着保持できるものである。
As described above, the lower substrate 31 carried into the second chamber chamber from the first chamber chamber using the substrate loading cart 51 is lifted from the lower mounting table by the substrate lifter 19 provided on the lower table 8, After the movement, the substrate lifter 19 is lowered so that it can be placed horizontally on the lower table surface. Further, the lower table 8 is provided with an electrostatic adsorption mechanism or a partial adhesion mechanism so that the lower substrate does not move in the process of evacuating and bonding the substrates, and these substrate holding mechanisms are mounted on the lower table surface. The placed substrate is prevented from moving.
In addition, the upper substrate 30 that is carried on the upper stage mounting table with the central portion in the transport direction convexly curved comes into contact with and sucks and sucks from the convex portion when the upper table is lowered to the substrate surface. In this way, even if the substrate becomes large and easily bent by being sucked and held from the center of the substrate, it can be sucked and held on the table surface without being bent.

図3から図4に本貼り合せ装置による基板貼り合せ動作を説明するフローチャートを示す。
まず、第1チャンバ室C1の入口の第1ドアバルブ2を開放して、貼り合せる下基板31を室内に設けてある基板搬入台車51の下段の載置台に搭載する(ステップ100)。次に、上基板30を基板搬入台車51の上部の載置台に搭載する(ステップ101)。このとき、上基板は基板サイドサポート57上に乗せられ、その後、基板エッジクランプ59と複数の基板支持機構58とによって湾曲保持される。
3 to 4 are flowcharts for explaining the substrate bonding operation by the bonding apparatus.
First, the first door valve 2 at the entrance of the first chamber chamber C1 is opened, and the lower substrate 31 to be bonded is mounted on the lower mounting table of the substrate loading cart 51 provided in the room (step 100). Next, the upper substrate 30 is mounted on the mounting table above the substrate carry-in cart 51 (step 101). At this time, the upper substrate is placed on the substrate side support 57, and thereafter held curved by the substrate edge clamp 59 and the plurality of substrate support mechanisms 58.

基板搬入台車51上への上下基板の載置が完了すると、第1ドアバルブ2が閉じられる(ステップ102)。そして、真空ポンプ6を動作させ、弁LV1を開放することで、第1チャンバ室C1内を真空排気する(ステップ103)。そして、第1チャンバ室C1に設けてある圧力計P1が中真空状態になったかどうかを監視する(ステップ104)。中真空状態になった場合に、第1ゲートバルブ3を開放する(ステップ105)。なお、このとき、第2チャンバ室C2内は中真空の状態としてある。   When the placement of the upper and lower substrates on the substrate carry-in cart 51 is completed, the first door valve 2 is closed (step 102). Then, the vacuum pump 6 is operated to open the valve LV1, thereby evacuating the first chamber chamber C1 (step 103). Then, it is monitored whether or not the pressure gauge P1 provided in the first chamber C1 is in a medium vacuum state (step 104). When the medium vacuum state is reached, the first gate valve 3 is opened (step 105). At this time, the inside of the second chamber chamber C2 is in an intermediate vacuum state.

第1ゲートバルブ3が開放されると、基板搬入台車51が移動を開始し、第2チャンバ室内の上下テーブル8,9の位置に搬入台車上に載置した上下基板30,31が位置するまで移動する(ステップ106)。上下テーブル8,9の位置に上下基板が達すると、下テーブル8から基板リフタ19が上昇し、下基板31を基板搬入台車51の載置面から離間させる(ステップ107)。また、同時に、上テーブル9が降下して上基板とわずかに離れた位置で停止し、上基板の湾曲している頂点部分から吸引してテーブル面に吸い上げる。そして、上基板端部に向って順次吸引吸着して、上テーブル面に上基板を吸引吸着する(ステップ108)。このとき、上テーブル9は上基板を吸引しながら降下させ、この降下動作に連動して、基板エッジクランプ59と基板支持機構58を基板凸形状から水平になるように変位させながら吸着受け渡しすることも可能である。   When the first gate valve 3 is opened, the substrate carrying carriage 51 starts to move until the upper and lower substrates 30 and 31 placed on the carrying carriage are positioned at the positions of the upper and lower tables 8 and 9 in the second chamber chamber. Move (step 106). When the upper and lower substrates reach the positions of the upper and lower tables 8 and 9, the substrate lifter 19 is lifted from the lower table 8, and the lower substrate 31 is separated from the mounting surface of the substrate loading carriage 51 (step 107). At the same time, the upper table 9 descends and stops at a position slightly separated from the upper substrate, and is sucked from the curved apex portion of the upper substrate and sucked up to the table surface. Then, the upper substrate is sucked and sucked sequentially toward the upper substrate end, and the upper substrate is sucked and sucked on the upper table surface (step 108). At this time, the upper table 9 is lowered while sucking the upper substrate, and in conjunction with the lowering operation, the substrate edge clamp 59 and the substrate support mechanism 58 are sucked and delivered while being displaced from the convex shape of the substrate. Is also possible.

その後、基板搬入台車51を第1チャンバ室C1に戻す(ステップ109)。基板搬入台車51が第1チャンバ室内に戻ると第1ゲートバルブを閉じる(ステップ110)。
なお、上テーブル9に上基板の吸引吸着が完了すると、上基板に設けた静電吸着機構、又は粘着吸着機構を動作させて、第2チャンバ室が高真空状態になって、吸引吸着力が小さくなっても上基板がした基板上に落下しないようにしている(ステップ111)。本フローチャートでは、便宜上第1ゲートバルブ閉の後に、静電吸着機構を動作させるようにしているが、前述のように、吸引吸着による基板吸上げが完了すると静電吸着機構を動作させてよい。
Thereafter, the substrate carrying carriage 51 is returned to the first chamber chamber C1 (step 109). When the substrate carriage 51 returns to the first chamber, the first gate valve is closed (step 110).
When the upper substrate 9 has been sucked and sucked by the upper substrate, the electrostatic chucking mechanism or the adhesive sucking mechanism provided on the upper substrate is operated to bring the second chamber chamber into a high vacuum state, and the sucking and sucking force is increased. Even if it becomes smaller, the upper substrate is prevented from falling onto the substrate (step 111). In this flowchart, the electrostatic chucking mechanism is operated after the first gate valve is closed for convenience. However, as described above, the electrostatic chucking mechanism may be operated when the substrate suction by the suction chucking is completed.

なお、粘着保持機構を用いる場合は、上テーブル面に粘着保持機構が設けてある場合は、吸引吸着と同時に粘着保持が働くために、何等操作を行う必要はない。ただし、貼り合せ完了時は、粘着保持されている面と基板面とを離間させるために、粘着機構を剥がすための機構を上テーブルに設けておく必要がある。   In the case of using the adhesive holding mechanism, if the adhesive holding mechanism is provided on the upper table surface, since the adhesive holding works simultaneously with the suction adsorption, no operation is required. However, when the bonding is completed, it is necessary to provide a mechanism for removing the adhesive mechanism on the upper table in order to separate the adhesively held surface and the substrate surface.

第1ゲートバルブ3が閉じられると、上下基板の位置合せを行った後に、真空ポンプ10及びターボ分子ポンプ11を動作させて、第2チャンバ室C2内を高真空状態となるまで真空排気する(図4のステップ112)。第2チャンバ室C2内が高真空状態となる(ステップ113)と、上下基板の精密位置合せを行った後に、上下いずれか一方のテーブルを他方のテーブルに近づける方向に移動させること基板の貼り合せを開始する(ステップ114)。この貼り合せの過程で、上下基板の間隔を計測するか又は加圧力を計測して加圧完了か否かを判断すると共に、加圧途中でも、基板の位置ずれを計測し、位置補正を行うようにしている。   When the first gate valve 3 is closed, the upper and lower substrates are aligned, and then the vacuum pump 10 and the turbo molecular pump 11 are operated to evacuate the second chamber chamber C2 to a high vacuum state ( Step 112 in FIG. When the inside of the second chamber C2 is in a high vacuum state (step 113), the upper and lower substrates are precisely aligned, and then either the upper or lower table is moved in a direction approaching the other table. Is started (step 114). In this bonding process, the distance between the upper and lower substrates is measured or the applied pressure is measured to determine whether or not the pressurization is completed, and the positional deviation of the substrate is measured and corrected even during the pressurization. I am doing so.

そして、加圧が完了すると、第2チャンバ室内に窒素供給源20から窒素をパージして、中真空圧にするために、弁NV2を開放する。そして、中真空状態になると、両基板の仮止め用接着剤にUV光を照射して、仮止めして、第2チャンバ室内での貼り合せを完了する(ステップ115)。次に、第2ゲートバルブ4を開いて第3チャンバ室に基板移動が可能にする(ステップ116)。なお、第2ゲートバルブ4を開く前には、第3チャンバ室内の圧は中真空に減圧されている。第2ゲートバルブが開くと、基板リフタ19が上昇して、貼り合せ基板が下テーブル8面から離間される。当然のことながら、このときまでに、上側テーブル9は上基板面から離間されている。第2ゲートバルブ4が開くと基板搬出台車61が第2チャンバ室に移動を開始し、貼り合せ基板下面に基板搬出台車61先端のホーク状の部分が基板リフタ19のサポートピンを避けるように挿入され、その後、基板リフタ19を下げることで基板が基板搬出台車61に受け渡される。基板搬出台車61に基板が受け渡されると、基板搬出台車61は第2チャンバ室から第3チャンバ室に移動される(ステップ117)。   When the pressurization is completed, the valve NV2 is opened in order to purge the nitrogen from the nitrogen supply source 20 into the second chamber chamber to obtain a medium vacuum pressure. Then, when the medium vacuum state is reached, UV light is irradiated to the temporary fixing adhesive of both substrates to temporarily fix them, and the bonding in the second chamber chamber is completed (step 115). Next, the second gate valve 4 is opened so that the substrate can be moved to the third chamber (step 116). Note that, before the second gate valve 4 is opened, the pressure in the third chamber is reduced to a medium vacuum. When the second gate valve is opened, the substrate lifter 19 is raised, and the bonded substrate is separated from the lower table 8 surface. Naturally, by this time, the upper table 9 has been separated from the upper substrate surface. When the second gate valve 4 is opened, the substrate carry-out carriage 61 starts moving to the second chamber chamber, and the fork-like portion at the tip of the substrate carry-out carriage 61 is inserted on the lower surface of the bonded substrate so as to avoid the support pins of the substrate lifter 19. Then, the substrate is transferred to the substrate carry-out carriage 61 by lowering the substrate lifter 19. When the substrate is delivered to the substrate carry-out carriage 61, the substrate carry-out carriage 61 is moved from the second chamber chamber to the third chamber chamber (step 117).

第3チャンバ室に基板搬出台車61が戻ると、第2ゲートバルブ4が閉じられ、第3チャンバ室内が大気圧に戻される(ステップ119)。第3チャンバ室を大気開放することで貼り合せ基板には大気圧が加わり、最終加圧状態となる。ここで、シール剤にUV光を照射してシール剤を硬化させる。そして、完成した基板を第3チャンバ室から搬出する(ステップ120)。   When the substrate carry-out carriage 61 returns to the third chamber chamber, the second gate valve 4 is closed, and the third chamber chamber is returned to atmospheric pressure (step 119). By opening the third chamber chamber to the atmosphere, atmospheric pressure is applied to the bonded substrate and a final pressure state is reached. Here, the sealing agent is cured by irradiating the sealing agent with UV light. Then, the completed substrate is unloaded from the third chamber chamber (step 120).

また上記ステップ111の後、第1チャンバ室は大気圧に戻され、次に貼り合せる上下基板を、基板搬入台車上に搭載し、第1チャンバ室内を中真空状態まで減圧する作業が進められる。第3チャンバ室に貼り合せ基板が搬送され、第2ゲートバルブが閉じられると、第1チャンバ室の基板搬入台車51に次の貼り合せの上下基板が準備できていれば、第1ゲートバルブ105開動作(ステップ105)から始めることができ、組み立て時間を大幅に短縮することができる。   In addition, after the above step 111, the first chamber chamber is returned to atmospheric pressure, and the upper and lower substrates to be bonded next are mounted on the substrate carry-in carriage, and the operation of depressurizing the first chamber chamber to the medium vacuum state is advanced. When the bonded substrate is transferred to the third chamber and the second gate valve is closed, if the upper and lower substrates for the next bonding are prepared in the substrate loading carriage 51 of the first chamber, the first gate valve 105 is prepared. Starting from the opening operation (step 105), the assembly time can be significantly reduced.

本発明の一実施形態になる基板貼合装置の構成を示す断面図である。It is sectional drawing which shows the structure of the board | substrate bonding apparatus which becomes one Embodiment of this invention. 図1の部分断面図と基板搬送台車の拡大図である。It is the fragmentary sectional view of FIG. 1, and the enlarged view of a board | substrate conveyance trolley. 図1の基板貼合装置における動作のフローチャート図である。It is a flowchart figure of the operation | movement in the board | substrate bonding apparatus of FIG. 図1の基板貼合装置における動作のフローチャートの続きを示す図である。It is a figure which shows the continuation of the flowchart of the operation | movement in the board | substrate bonding apparatus of FIG.

符号の説明Explanation of symbols

1…基板貼合装置、C1…第1チャンバ室、C2…第2チャンバ室(貼り合せ室)、C3…第3チャンバ室、P1〜P3…圧力計、2…第1ドアバルブ、3…第1ゲートバルブ、4…第2ゲートバルブ、5…第2ドアバルブ、6…第1室用真空ポンプ、8…下テーブル、9…上テーブル、10…第2室用真空ポンプ、11…ターボ分子ポンプ、30…上基板、31…下基板、51…基板搬入台車、58…基板支持機構、59…基板エッジクランプ、61…基板搬出台車。
DESCRIPTION OF SYMBOLS 1 ... Board | substrate bonding apparatus, C1 ... 1st chamber chamber, C2 ... 2nd chamber chamber (bonding chamber), C3 ... 3rd chamber chamber, P1-P3 ... Pressure gauge, 2 ... 1st door valve, 3 ... 1st Gate valve, 4 ... 2nd gate valve, 5 ... 2nd door valve, 6 ... Vacuum pump for 1st chamber, 8 ... Lower table, 9 ... Upper table, 10 ... Vacuum pump for 2nd chamber, 11 ... Turbo molecular pump, 30 ... Upper substrate, 31 ... Lower substrate, 51 ... Substrate loading cart, 58 ... Substrate support mechanism, 59 ... Substrate edge clamp, 61 ... Substrate carrying cart.

Claims (2)

上下2枚の基板をそれぞれ搬入するための2段の基板載置台を有する基板搬入台車を有し、前記上下2枚の基板を搬入するとき、大気圧状態に設定され、前記上下2枚の基板を前記基板搬入台車に載置して搬出するとき、中真空状態に設定される第1チャンバン室と
前記中真空状態で前記第1チャンバ室から搬出される前記基板搬入台車での前記上下2枚の基板を受け取り、前記高真空状態で前記上下2枚の基板をそれぞれ保持する上テーブルと下テーブルとを有し、いずれか一方の前記テーブルを水平方向に移動して、前記上下2枚の基板の位置合せをし、上下いずれか一方の前記テーブルを上下に動作させて前記上下2枚の基板間隔を狭めて貼り合せを行う第2チャンバ室と、
前記中真空状態で、前記第2チャンバ室で前記上下2枚の基板が貼り合わされてなる完成基板を第2チャンバ室から搬出する載置台を有する完成基板搬出台車を備え、大気状態で前記完成基板を室外に搬出する第3チャンバ室と
を備え、
前記中真空状態は、前記第2チャンバ室内で前記上下2枚の基板の前記貼り合わせを行なうときの高真空状態と前記大気圧状態との間の真空度の状態であり、
前記基板搬入台車の前記上基板載置台には、前記上基板を搬送方向に基板中央部を前記上テーブル側に凸状態に湾曲させて保持する上基板湾曲保持機構を設け、前記第2チャンバ室で、前記上テーブルを前記上基板載置台での前記上基板に降下させることにより、前記上テーブルが前記上基板を吸着する
こと特徴とする基板貼合装置。
A substrate carrying carriage having a two-stage substrate placing table for carrying the upper and lower two substrates , respectively , and when the upper and lower two substrates are carried, the atmospheric pressure state is set; A first chamber chamber that is set to an intermediate vacuum state when the substrate is placed on the substrate carrying cart and unloaded ,
Receiving the upper and lower substrates in the substrate carriages carried out of the first chamber chamber in a vacuum state in the, the upper table and the lower table for holding respectively the upper and lower substrates in the high vacuum state has, by moving either one of the tables in the horizontal direction, the aforementioned alignment of the upper and lower substrates, upper and lower one of the tables is operated above and below the upper and lower substrates A second chamber chamber for laminating the gaps, and
Under vacuum in the, with the completed substrate unloading carriage with a mounting table for unloading the second chamber compartment at the upper and lower sheets of the finished board substrate is by bonding a second chamber compartment, at ambient conditions, the complete A third chamber chamber for carrying the substrate out of the room,
The medium vacuum state is a state of a degree of vacuum between a high vacuum state and the atmospheric pressure state when the two substrates are bonded together in the second chamber chamber,
Wherein the said substrate mounting table of a substrate carriages, the substrate central portion in the conveying direction on a substrate provided with a substrate curved holding mechanism on hold by curved in a convex state on said table side, wherein the second chamber compartment Then, the upper table attracts the upper substrate by lowering the upper table onto the upper substrate on the upper substrate mounting table .
請求項1に記載の基板貼合装置において、
前記各チャンバ室を仕切るゲートバルブを前記基板搬入台車や前記完成基板搬出台車が通過するため、前記基板搬入台車や前記完成基板搬出台車に2連鎖ポートローラとガイドレールを用いたことを特徴とする基板貼合装置。
In the board | substrate bonding apparatus of Claim 1,
Since the substrate carry-in carriage and the completed substrate carry-out carriage pass through the gate valves that partition the chamber chambers , two chain port rollers and guide rails are used for the substrate carry-in carriage and the completed substrate carry-out carriage. Substrate pasting device.
JP2005310638A 2005-10-26 2005-10-26 Board bonding equipment Expired - Fee Related JP4165554B2 (en)

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JP5104257B2 (en) 2007-12-03 2012-12-19 株式会社日立プラントテクノロジー Substrate bonding system
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