JP4164508B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4164508B2
JP4164508B2 JP2005291809A JP2005291809A JP4164508B2 JP 4164508 B2 JP4164508 B2 JP 4164508B2 JP 2005291809 A JP2005291809 A JP 2005291809A JP 2005291809 A JP2005291809 A JP 2005291809A JP 4164508 B2 JP4164508 B2 JP 4164508B2
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liquid
wafer
substrate
exposure
optical system
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Japanese (ja)
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JP2006093721A5 (enrdf_load_stackoverflow
JP2006093721A (ja
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一志 中野
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Canon Inc
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Canon Inc
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2005291809A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP4164508B2 (ja)

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JP2005291809A JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

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JP2005291809A JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

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JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Related Child Applications (1)

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JP2007248076A Division JP4533416B2 (ja) 2007-09-25 2007-09-25 露光装置およびデバイス製造方法

Publications (3)

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JP2006093721A JP2006093721A (ja) 2006-04-06
JP2006093721A5 JP2006093721A5 (enrdf_load_stackoverflow) 2007-08-23
JP4164508B2 true JP4164508B2 (ja) 2008-10-15

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JP (1) JP4164508B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4517354B2 (ja) * 2004-11-08 2010-08-04 株式会社ニコン 露光装置及びデバイス製造方法
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG10201407395SA (en) * 2006-08-31 2014-12-30 Nikon Corp Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
JP5177736B2 (ja) * 2006-11-01 2013-04-10 レーザーテック株式会社 マスク検査装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050085235A (ko) * 2002-12-10 2005-08-29 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101498405B1 (ko) * 2003-04-11 2015-03-04 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法

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JP2006093721A (ja) 2006-04-06

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