JP4157419B2 - 近視野光ヘッドの製造方法および製造装置 - Google Patents

近視野光ヘッドの製造方法および製造装置 Download PDF

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Publication number
JP4157419B2
JP4157419B2 JP2003129817A JP2003129817A JP4157419B2 JP 4157419 B2 JP4157419 B2 JP 4157419B2 JP 2003129817 A JP2003129817 A JP 2003129817A JP 2003129817 A JP2003129817 A JP 2003129817A JP 4157419 B2 JP4157419 B2 JP 4157419B2
Authority
JP
Japan
Prior art keywords
air bearing
optical head
base material
etching
field optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003129817A
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English (en)
Japanese (ja)
Other versions
JP2004071133A5 (enExample
JP2004071133A (ja
Inventor
雅一 平田
学 大海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP2003129817A priority Critical patent/JP4157419B2/ja
Priority to US10/452,533 priority patent/US7132055B2/en
Publication of JP2004071133A publication Critical patent/JP2004071133A/ja
Publication of JP2004071133A5 publication Critical patent/JP2004071133A5/ja
Priority to US11/583,179 priority patent/US8430991B2/en
Application granted granted Critical
Publication of JP4157419B2 publication Critical patent/JP4157419B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1387—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector using the near-field effect
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/122—Flying-type heads, e.g. analogous to Winchester type in magnetic recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/22—Apparatus or processes for the manufacture of optical heads, e.g. assembly

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Head (AREA)
JP2003129817A 2002-06-11 2003-05-08 近視野光ヘッドの製造方法および製造装置 Expired - Fee Related JP4157419B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003129817A JP4157419B2 (ja) 2002-06-11 2003-05-08 近視野光ヘッドの製造方法および製造装置
US10/452,533 US7132055B2 (en) 2002-06-11 2003-06-02 Method of producing near field optical head
US11/583,179 US8430991B2 (en) 2002-06-11 2006-10-19 Apparatus for producing near field optical head

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002169955 2002-06-11
JP2003129817A JP4157419B2 (ja) 2002-06-11 2003-05-08 近視野光ヘッドの製造方法および製造装置

Publications (3)

Publication Number Publication Date
JP2004071133A JP2004071133A (ja) 2004-03-04
JP2004071133A5 JP2004071133A5 (enExample) 2006-02-09
JP4157419B2 true JP4157419B2 (ja) 2008-10-01

Family

ID=29738357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003129817A Expired - Fee Related JP4157419B2 (ja) 2002-06-11 2003-05-08 近視野光ヘッドの製造方法および製造装置

Country Status (2)

Country Link
US (2) US7132055B2 (enExample)
JP (1) JP4157419B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4157419B2 (ja) * 2002-06-11 2008-10-01 セイコーインスツル株式会社 近視野光ヘッドの製造方法および製造装置
US20070259366A1 (en) * 2006-05-03 2007-11-08 Greg Lawrence Direct printing of patterned hydrophobic wells
JP4515420B2 (ja) * 2006-08-01 2010-07-28 セイコーインスツル株式会社 近接場光利用ヘッドの製造方法
CN106158681A (zh) * 2015-04-10 2016-11-23 中国科学院微电子研究所 一种用于制作肖特基二极管空气桥的腐蚀监控方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3953265A (en) * 1975-04-28 1976-04-27 International Business Machines Corporation Meniscus-contained method of handling fluids in the manufacture of semiconductor wafers
US4351706A (en) * 1980-03-27 1982-09-28 International Business Machines Corporation Electrochemically eroding semiconductor device
JP2509572B2 (ja) * 1985-08-19 1996-06-19 株式会社東芝 パタ−ン形成方法及び装置
HU199020B (en) * 1987-05-04 1989-12-28 Magyar Tudomanyos Akademia Method and apparatus for measuring the layer thickness of semiconductor layer structures
US5516399A (en) * 1994-06-30 1996-05-14 International Business Machines Corporation Contactless real-time in-situ monitoring of a chemical etching
US5838005A (en) * 1995-05-11 1998-11-17 The Regents Of The University Of California Use of focused ion and electron beams for fabricating a sensor on a probe tip used for scanning multiprobe microscopy and the like
JP3618896B2 (ja) * 1996-03-29 2005-02-09 キヤノン株式会社 微小開口を有するプローブの作製法とそれによるプローブ、並びに該プローブを用いた走査型近接場光顕微鏡と走査型トンネル顕微鏡との複合装置、および該プローブを用いた記録再生装置
US6411110B1 (en) * 1999-08-17 2002-06-25 Micron Technology, Inc. Apparatuses and methods for determining if protective coatings on semiconductor substrate holding devices have been compromised
US7032427B2 (en) * 2000-06-09 2006-04-25 Seiko Instruments Inc. Method for forming optical aperture, near-field optical head, method for fabricating near-field optical head, and information recording/reading apparatus
US6843880B2 (en) * 2002-05-24 2005-01-18 International Business Machines Corporation Enhanced endpoint detection for wet etch process control
JP4157419B2 (ja) * 2002-06-11 2008-10-01 セイコーインスツル株式会社 近視野光ヘッドの製造方法および製造装置

Also Published As

Publication number Publication date
US20070034336A1 (en) 2007-02-15
US8430991B2 (en) 2013-04-30
US20030234237A1 (en) 2003-12-25
US7132055B2 (en) 2006-11-07
JP2004071133A (ja) 2004-03-04

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