JP4064420B2 - Manufacturing method of crystal unit - Google Patents

Manufacturing method of crystal unit Download PDF

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JP4064420B2
JP4064420B2 JP2005319565A JP2005319565A JP4064420B2 JP 4064420 B2 JP4064420 B2 JP 4064420B2 JP 2005319565 A JP2005319565 A JP 2005319565A JP 2005319565 A JP2005319565 A JP 2005319565A JP 4064420 B2 JP4064420 B2 JP 4064420B2
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crystal
reinforcing
wafer
crystal wafer
vibrator
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JP2006067631A (en
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昌裕 吉松
三十四 梅木
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Nihon Dempa Kogyo Co Ltd
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本発明は、高周波数用とする貼り合わせ型の水晶振動子の製造方法を技術分野とし、特に貼り合わせを直接接合とした水晶振動子の製造方法に関する。  The present invention relates to a manufacturing method of a bonded crystal unit for high frequency use, and more particularly to a manufacturing method of a crystal unit in which bonding is performed directly.

(発明の背景)水晶振動子は、周波数及び時間の基準源としての発振子やフィルタ素子として、通信機器を含む各種の電子機器に多く用いられている。近年では、通信周波数等の高周波数化に伴い、一般的に使用されるATカットとした水晶振動子(水晶片)の厚みが小さく加工される。なお、水晶振動子の振動周波数はATカットとした水晶片の厚みに反比例し、厚みが小さいほど振動周波数が高くなる。このようなものの一つに、補強板を設けて強度を高めたものがある。BACKGROUND OF THE INVENTION Quartz resonators are often used in various electronic devices including communication devices as oscillators and filter elements as frequency and time reference sources. In recent years, with the increase in communication frequency and the like, the thickness of a commonly used AT-cut crystal resonator (crystal piece) is processed to be small. Note that the vibration frequency of the crystal resonator is inversely proportional to the thickness of the crystal piece that is AT-cut. The smaller the thickness, the higher the vibration frequency. One of these is the one in which a reinforcing plate is provided to increase the strength.

(従来技術の説明)第7図及び第8図は一従来例(特許文献1参照)を説明する図で、第7図は水晶振動子の分解図、第8図は断面図である。
水晶振動子は、いずれもATカットとした振動子用水晶片1と補強板2とを貼着してなる。振動子用水晶片1は一主面に励振電極3及びこれから延出した引出電極4を有する。補強板2は貫通孔5を有する本体6と、貫通孔5に対面した一主面に励振電極3及び引出電極4を有する励振用電極板7とを一体化してなる。要は、振動子用水晶片1の他主面側をエアーギャップ方式(空間電界方式)とした励振形態とする。
(Description of Prior Art) FIGS. 7 and 8 are diagrams for explaining a conventional example (see Patent Document 1), FIG. 7 is an exploded view of a crystal resonator, and FIG. 8 is a sectional view.
The quartz crystal unit is formed by adhering a quartz crystal piece 1 and a reinforcing plate 2 each having an AT cut. The quartz crystal piece 1 for a vibrator has an excitation electrode 3 and an extraction electrode 4 extending therefrom on one main surface. The reinforcing plate 2 is formed by integrating a body 6 having a through-hole 5 and an excitation electrode plate 7 having an excitation electrode 3 and an extraction electrode 4 on one main surface facing the through-hole 5. In short, the other main surface side of the crystal piece 1 for vibrator is an excitation mode in which an air gap method (space electric field method) is used.

具体的には、先ず補強板2を形成する。次に、振動子用水晶片1の他主面に補強板2の開口側を貼着する。そして、貼着後に両主面を研磨して振動子用水晶片1を規定の厚みにする。最後に、振動子用水晶片1の一主面に励振電極3及び引出電極4を延出する。  Specifically, the reinforcing plate 2 is first formed. Next, the opening side of the reinforcing plate 2 is bonded to the other main surface of the crystal piece 1 for vibrator. And after sticking, both main surfaces are grind | polished and the quartz crystal piece 1 for vibrator | oscillators is set to prescribed thickness. Finally, the excitation electrode 3 and the extraction electrode 4 are extended on one main surface of the crystal piece 1 for vibrator.

このようなものでは、補強板2と一体化して振動子用水晶片1を研磨するので、振動子水晶片1を単独とした場合に比較し、取り扱いを容易にして作業時の破損等を防止する。例えば振動周波数を100MHzとすると振動子用水晶片1の厚みは約17μmとなり、高周波数になるほど効果を大とする。
特開平3−139912号公報 特開昭49−90497号公報 特開2000−269106号公報 特開2000−228618号公報
In such a case, since the vibrator crystal piece 1 is polished by being integrated with the reinforcing plate 2, it is easier to handle and prevents breakage during operation as compared with the case where the vibrator crystal piece 1 is used alone. . For example, when the vibration frequency is 100 MHz, the thickness of the crystal piece 1 for vibrator becomes about 17 μm, and the effect becomes larger as the frequency becomes higher.
JP-A-3-139912 JP 49-90497 JP 2000-269106 A JP 2000-228618 A

(従来技術の問題点)しかしながら、上記構成の水晶振動子では、基本的に接着剤等を用いた貼着による3層構造とするので、接合強度が小さいとともに製造を複雑にする問題があった。(Problems of the prior art) However, since the crystal resonator having the above-mentioned structure basically has a three-layer structure by sticking using an adhesive or the like, there is a problem that the bonding strength is low and the manufacturing is complicated. .

また、特許文献2では、振動子用水晶片1に金属又は非金属材をメッキや蒸着等によって被着した後に両主面を研磨し、その後中央部をエッチングして除去して外周に補強層8を設ける(第9図)。しかし、この場合は、メッキや蒸着等で補強層8を設けるので、接合強度がさらに小さくなる問題があった。なお、接合強度が小さいと、例えば研磨によって厚みを小さくする場合、その作業を困難とする。  Further, in Patent Document 2, both main surfaces are polished after depositing a metal or non-metallic material on the crystal piece 1 for vibrator by plating or vapor deposition, and then the central portion is removed by etching to remove the reinforcing layer 8 on the outer periphery. (FIG. 9). However, in this case, since the reinforcing layer 8 is provided by plating, vapor deposition, or the like, there is a problem that the bonding strength is further reduced. If the bonding strength is low, for example, when the thickness is reduced by polishing, the operation becomes difficult.

また、水晶板の一主面あるいは両主面側から中央部をエッチングして振動領域を形成したものもあるが(未図示)、このようなものでは振動領域の平面度及び平行度が損なわれる問題があった。  In addition, there is a quartz plate formed by etching the central portion from one main surface or both main surfaces of the quartz plate (not shown), but in such a case, the flatness and parallelism of the vibration region are impaired. There was a problem.

(発明の目的)本発明は、接合強度を高めて製造を容易にした水晶振動子の製造方法を提供することを目的とする。(Object of the Invention) An object of the present invention is to provide a method for manufacturing a crystal resonator which is easy to manufacture by increasing the bonding strength.

本発明は、特許請求の範囲(請求項1)に示したように、ATカットの振動子用水晶片とエッチングによる貫通孔が設けられた補強板とを接合してなる水晶振動子の製造方法において、いずれもATカットからなる振動子用水晶ウェハと複数の貫通孔がエッチングによって設けられた補強用水晶ウェハとを直接接合して、前記振動子用水晶ウェハの前記貫通孔と対向する両主面に励振電極を形成するとともに前記振動子用水晶ウェハ及び前記補強用水晶ウェハに前記励振電極と接続する引出電極を形成した後、前記振動子用水晶片と前記補強板とが接合した個々の水晶振動子に分割し、前記補強用水晶ウェハの引出電極は前記貫通孔を形成する際にエッチングの異方性によって生ずる前記補強用水晶ウェハのZ′軸に斜交する傾斜面に形成され、前記Z′軸は前記水晶振動子の長さ方向である製造方法とする。The present invention relates to a method of manufacturing a crystal unit comprising an AT-cut crystal unit for a crystal unit and a reinforcing plate provided with a through-hole formed by etching, as indicated in the claims (Claim 1). Both main surfaces facing the through-holes of the vibratory crystal wafer by directly bonding a crystal wafer for vibrators made of AT cut and a reinforcing crystal wafer having a plurality of through-holes formed by etching And forming an extraction electrode connected to the excitation electrode on the quartz crystal wafer for reinforcement and the quartz crystal wafer for reinforcement, and then the individual crystal oscillations in which the quartz crystal piece for the vibrator and the reinforcement plate are joined. dividing the child, is formed on the inclined surface extraction electrode is obliquely intersect the axis Z 'of the reinforcing crystal wafer produced by anisotropic etching in forming the through hole of the reinforcing crystal wafer , Wherein Z 'axis is a manufacturing method which is the length direction of the crystal oscillator.

このような構成(製造方法)であれば、振動子用水晶ウェハと補強用ウェハとを直接接合するので、原子間的な接合となって基本的に接合強度を高める。また、補強用ウェハには予め貫通孔が設けられて振動子用水晶ウェハを直接接合する。したがって、例えば振動子用水晶ウェハと補強用ウェハとを接合した後、補強用ウェハに貫通孔を形成する場合に比較し、両者の界面に生ずる気泡が逃げやすく接合強度を高めて製造を容易にする。  With such a configuration (manufacturing method), the crystal wafer for vibrator and the reinforcing wafer are directly bonded, so that the bonding strength is basically increased by interatomic bonding. Further, the reinforcing wafer is provided with a through hole in advance, and the crystal wafer for vibrator is directly bonded. Therefore, for example, after bonding a crystal wafer for a vibrator and a reinforcing wafer and then forming a through hole in the reinforcing wafer, bubbles generated at the interface between the two can easily escape and increase the bonding strength to facilitate manufacture. To do.

また、前記補強用ウェハはATカットの補強用水晶ウェハであって、前記補強用水晶ウェハの引出電極は前記貫通孔を形成する際にエッチングによって生ずる前記補強用水晶ウェハのZ′軸に斜交する傾斜面に形成される(所謂エッチングの異方性)。これにより、引出電極を急斜面に形成する場合に比較して断線を防止できる。そして、ウェハ状態での傾斜面の位置が同一方向に形成されるので、例えば分割した後に引出電極を形成する場合に比較し、位置決め等の作業を不要にして電極形成を容易にする。 The reinforcing wafer is an AT-cut reinforcing crystal wafer, and the lead-out electrode of the reinforcing crystal wafer obliquely intersects the Z ′ axis of the reinforcing crystal wafer generated by etching when the through hole is formed. Formed on the inclined surface (so-called etching anisotropy). Thereby, disconnection can be prevented compared with the case where the extraction electrode is formed on a steep slope. And since the position of the inclined surface in the wafer state is formed in the same direction, for example, as compared with the case where the extraction electrode is formed after the division, an operation such as positioning is not required and the electrode formation is facilitated.

(第1実施形態)
第1図は本発明の第1実施形態である水晶振動子の製造方法を説明する図である。なお、前従来例図と同一部分には同番号を付与してその説明は簡略又は省略する。
(First embodiment)
FIG. 1 is a diagram for explaining a method for manufacturing a crystal resonator according to a first embodiment of the present invention. In addition, the same number is attached | subjected to the same part as a prior art example figure, and the description is abbreviate | omitted or abbreviate | omitted.

水晶振動子は例えば矩形状として、前述のように振動子用水晶片1と補強板2とからなる。この例では、振動子用水晶片1及び補強板2はいずれもATカットとする。ATカットは、第2図に示したように、結晶軸(XYZ)のY軸に対して、主面(YZ面)がX軸を中心としてZ軸からY軸方向に35度15分(即ち、主面に対する法線がY軸からZ軸方向に35度15分)傾斜した切断角度である。傾斜した新たな軸をY′軸及びZ′軸とする。  The quartz crystal resonator is, for example, rectangular, and includes the quartz crystal piece 1 and the reinforcing plate 2 as described above. In this example, the vibrator crystal piece 1 and the reinforcing plate 2 are both AT cuts. As shown in FIG. 2, the AT cut has a main surface (YZ plane) of 35 degrees 15 minutes from the Z axis to the Y axis centering on the X axis with respect to the Y axis of the crystal axis (XYZ) (that is, The cutting angle at which the normal to the main surface is inclined from the Y axis to the Z axis direction by 35 degrees 15 minutes). The new tilted axes are defined as the Y ′ axis and the Z ′ axis.

具体的には、先ず、いずれもATカットとした振動子用水晶ウェハ1Aと補強用水晶ウェハ2Aを直接接合する(第3図参照)。ここでは、補強用水晶ウェハ2Aには予め複数の貫通孔5がフッ酸等のエッチングによって形成される。この場合、補強用水晶ウェハ2Aは、一主面側の貫通孔5となる領域のみを露出して他をマスクする。  Specifically, first, the quartz crystal wafer 1A for vibrator and the quartz crystal wafer 2A for reinforcement, both of which are AT-cut, are directly bonded (see FIG. 3). Here, a plurality of through holes 5 are previously formed in the reinforcing crystal wafer 2A by etching with hydrofluoric acid or the like. In this case, the reinforcing crystal wafer 2A exposes only the region to be the through hole 5 on one main surface side and masks the other.

直接接合は振動子用水晶ウェハ1Aと補強用水晶ウェハ2Aとを鏡面研磨して親水化(OH基化)する。そして、主面同士を当接して加熱処理し、H2Oを除去することによってSi−O−Si結合とする。あるいは、一方を親水化(OH基化)して他方を疎水化(H基化)して加熱処理し、Si−Si結合とする「第4図(ab)、特許文献3参照」。  In direct bonding, the quartz crystal wafer 1A for vibrator and the quartz crystal wafer 2A for reinforcement are mirror-polished to make them hydrophilic (OH base). Then, the main surfaces are brought into contact with each other and heat-treated to remove H 2 O to form Si—O—Si bonds. Alternatively, one is hydrophilized (OH grouped) and the other is hydrophobized (H grouped) and heat-treated to form a Si—Si bond (see FIG. 4 (ab), Patent Document 3).

次に、両主面を研磨して振動子用水晶ウェハ1Aの厚みを小さくする。あるいは、鏡面研磨によって規定厚み内に加工された振動子用水晶ウェハ1Aをエッチングによって制御する。そして、蒸着等によって、振動子用水晶ウェハ1Aの両主面に複数の励振電極3及び引出電極4を形成する。但し、貫通孔5側の引出電極4は補強用水晶ウェハ2Aにも形成される。そして、振動子用水晶片1と貫通孔5を有する補強板2とが接合された各水晶振動子に個々に分割する。  Next, both main surfaces are polished to reduce the thickness of the crystal wafer 1A for vibrators. Alternatively, the vibratory crystal wafer 1A processed within a specified thickness by mirror polishing is controlled by etching. Then, a plurality of excitation electrodes 3 and extraction electrodes 4 are formed on both main surfaces of the crystal wafer 1A for vibrator by vapor deposition or the like. However, the extraction electrode 4 on the through-hole 5 side is also formed on the reinforcing crystal wafer 2A. Then, the crystal unit 1 and the reinforcing plate 2 having the through holes 5 are individually divided into crystal units.

このようなものでは、振動子用水晶ウェハ1Aと補強用水晶ウェハ2Aとを直接接合によって接続するので、原子間的な接合となって接合強度が高くなる。したがって、取り扱いを容易にするとともに、例えば接合後に研磨によって厚みを小さくする場合にはその作業を容易にする。そして、振動子用水晶片1と補強板2の二層とするので製造を単純化する。  In such a case, since the vibratory crystal wafer 1A and the reinforcing crystal wafer 2A are directly connected to each other, it becomes an atomic bond and the bonding strength is increased. Therefore, handling is facilitated and, for example, when the thickness is reduced by polishing after joining, the operation is facilitated. Since the vibrator crystal piece 1 and the reinforcing plate 2 are two layers, the manufacturing is simplified.

また、補強用水晶ウェハ2AをATカットとして一主面側からエッチングして貫通孔5を形成するので、エッチング速度即ちZ軸>>X軸>Y軸により、例えば長さ方向としたZ′軸方向の内側面の一方に表面を露出した傾斜面9を生じる。なお、幅方向(X軸方向)の内側面は急斜面となる。このことから、Z′軸方向の内側面の一方となる傾斜面9に引出電極4を延出することにより、例えば蒸着時の断線を防止できる(第1図及び第6図参照、特許文献4参照)。  Further, since the reinforcing crystal wafer 2A is etched from one main surface side as an AT cut to form the through-hole 5, the Z′-axis, for example, the length direction is set by the etching rate, that is, the Z-axis >> X-axis> Y-axis. An inclined surface 9 with a surface exposed is formed on one of the inner side surfaces in the direction. The inner surface in the width direction (X-axis direction) is a steep slope. From this, by extending the extraction electrode 4 to the inclined surface 9 that is one of the inner side surfaces in the Z′-axis direction, for example, disconnection during vapor deposition can be prevented (see FIGS. 1 and 6; Patent Document 4). reference).

また、補強用水晶ウェハ2Aは予め貫通孔5が設けられて振動子用水晶ウェハ1Aを直接接合する。したがって、例えば振動子用水晶ウェハ1Aと補強用水晶ウェハ2Aとを接合した後、補強用水晶ウェハ2Aに貫通孔を形成する場合に比較し、両者の界面に生ずる気泡が逃げやすく接合強度を高められる。  Further, the reinforcing crystal wafer 2A is provided with a through-hole 5 in advance to directly bond the vibrator crystal wafer 1A. Therefore, for example, after bonding the crystal wafer for vibration 1A and the crystal wafer for reinforcement 2A and then forming a through hole in the crystal wafer for reinforcement 2A, bubbles generated at the interface between them are easily escaped and the bonding strength is increased. It is done.

そして、ここでは、特に振動子用水晶ウェハ1Aと補強用水晶ウェハ2Aを直接接合した時点で、励振電極3及び引出電極4を形成するので、個々に分割して形成する場合に比較し、傾斜面9の位置が一定方向になるので位置合わせ等を要することなく、製造を容易にする。  In this case, the excitation electrode 3 and the extraction electrode 4 are formed particularly when the crystal crystal wafer 1A for vibrator and the crystal wafer 2A for reinforcement are directly bonded. Since the position of the surface 9 is in a fixed direction, it is easy to manufacture without requiring alignment or the like.

(第2実施形態、参考
第6図は本発明の第2実施形態を説明する水晶振動子の断面図である。なお、前実施形態と同一部分の説明は省略又は簡略する。
(Second embodiment , reference )
FIG. 6 is a cross-sectional view of a crystal resonator illustrating a second embodiment of the present invention. In addition, description of the same part as the previous embodiment is omitted or simplified.

水晶振動子は、前述同様にATカットとした振動子用水晶片1と補強板2からなり、ここでは補強板2をガラス板とする。そして、振動子用水晶ウェハ1Aと補強用ガラスウェハとを直接接合して励振電極3及び引出電極4を形成した後、個々の水晶振動子に分割する(前第3図)。但し、前述同様に補強用ガラスウェハには一主面側の貫通孔5となる領域のみを露出して他をマスクする。  As described above, the quartz crystal resonator is composed of the quartz crystal piece 1 and the reinforcing plate 2 that are AT-cut. Here, the reinforcing plate 2 is a glass plate. Then, the vibratory crystal wafer 1A and the reinforcing glass wafer are directly joined to form the excitation electrode 3 and the extraction electrode 4, and then divided into individual crystal vibrators (previous FIG. 3). However, as described above, only the region to be the through-hole 5 on the one main surface side is exposed and masked on the reinforcing glass wafer.

このようなものでは、補強用ガラスウェハに貫通孔5となる領域のみを露出してエッチングするので、一主面側から他主面に向かって等方性の傾斜面が得られる。したがって、第1実施形態のように一方向のみならず、方向性に拘わらずいずれの箇所からでも引出電極4を導出しやすく、断線を防止できる。そして、また、補強用ガラスウェハは予め貫通孔5が設けられて振動子用水晶ウェハを直接接合するので、両者の界面に生ずる気泡が貫通孔から逃げやすく接合強度を高められる。なお、上記の各実施形態では、水晶振動子及び貫通孔5は矩形状としたが、例えば円板状であってもよい。  In such a thing, since only the area | region used as the through-hole 5 is exposed and etched in the glass wafer for reinforcement, an isotropic inclined surface is obtained toward the other main surface from one main surface side. Therefore, it is easy to lead out the extraction electrode 4 not only from one direction as in the first embodiment but from any position regardless of the directionality, and disconnection can be prevented. Further, since the reinforcing glass wafer is provided with the through holes 5 in advance to directly bond the crystal wafer for vibrators, bubbles generated at the interface between the two easily escape from the through holes, and the bonding strength is increased. In each of the above embodiments, the crystal resonator and the through hole 5 are rectangular, but may be, for example, a disk.

本発明の第1実施形態を説明する水晶振動子の断面図である。It is sectional drawing of the crystal oscillator explaining 1st Embodiment of this invention. 本発明の第1実施形態を説明するATカット水晶板の切断方位図である。It is a cutting direction figure of an AT cut quartz plate explaining a 1st embodiment of the present invention. 本発明の第1実施形態を説明する振動子用水晶ウェハと補強用水晶ウェハとの接合図である。FIG. 3 is a bonding diagram of a vibratory crystal wafer and a reinforcing crystal wafer for explaining the first embodiment of the present invention. 本発明の第1実施形態を説明する直接接合の模式図である。It is a schematic diagram of the direct joining explaining 1st Embodiment of this invention. 本発明の第1実施形態を説明する補強板の図である。It is a figure of the reinforcement board explaining 1st Embodiment of this invention. 本発明の第2実施形態を説明する水晶振動子の断面図である。It is sectional drawing of the crystal oscillator explaining 2nd Embodiment of this invention. 従来例を説明する水晶振動子の分解図である。It is an exploded view of a crystal resonator explaining a conventional example. 従来例を説明する水晶振動子の断面図である。It is sectional drawing of the crystal oscillator explaining a prior art example. 従来例を説明する振動子用水晶片の断面図である。It is sectional drawing of the crystal piece for vibrator | oscillators which demonstrates a prior art example.

符号の説明Explanation of symbols

1 振動子用水晶片、2 補強板、3 励振電極、4 引出電極、5 貫通孔、6 補強板本体、7 励振用電極板、8 補強層、9 傾斜面.  DESCRIPTION OF SYMBOLS 1 Crystal piece for vibrators, 2 Reinforcement plate, 3 Excitation electrode, 4 Extraction electrode, 5 Through-hole, 6 Reinforcement plate main body, 7 Excitation electrode plate, 8 Reinforcement layer, 9 Inclined surface.

Claims (1)

ATカットの振動子用水晶片とエッチングによる貫通孔が設けられた補強板とを接合してなる水晶振動子の製造方法において、いずれもATカットからなる振動子用水晶ウェハと複数の貫通孔がエッチングによって設けられた補強用水晶ウェハとを直接接合して、前記振動子用水晶ウェハの前記貫通孔と対向する両主面に励振電極を形成するとともに前記振動子用水晶ウェハ及び前記補強用水晶ウェハに前記励振電極と接続する引出電極を形成した後、前記振動子用水晶片と前記補強板とが接合した個々の水晶振動子に分割し、前記補強用水晶ウェハの引出電極は前記貫通孔を形成する際にエッチングの異方性によって生ずる前記補強用水晶ウェハのZ′軸に斜交する傾斜面に形成され、前記Z′軸は前記水晶振動子の長さ方向であることを特徴とする水晶振動子の製造方法。In a crystal resonator manufacturing method in which an AT-cut crystal piece for crystal and a reinforcing plate provided with a through-hole by etching are joined, the crystal wafer for crystal made of AT-cut and a plurality of through-holes are etched a reinforcing crystal wafer which is provided joined directly by the vibrator crystal wafer and said reinforcing crystal wafer so as to form the excitation electrodes on both principal surfaces of the through hole facing the vibrator crystal wafer After forming an extraction electrode to be connected to the excitation electrode, the crystal unit for crystal and the reinforcing plate are divided into individual crystal units bonded to each other, and the extraction electrode of the reinforcing crystal wafer forms the through hole. 'formed on the inclined surface obliquely intersect the axis, the Z' wherein Z of reinforcing crystal wafer produced by anisotropic etching when the shaft is the length direction of the crystal oscillator The method for manufacturing a quartz oscillator and butterflies.
JP2005319565A 2005-11-02 2005-11-02 Manufacturing method of crystal unit Expired - Fee Related JP4064420B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100398296C (en) * 2002-07-04 2008-07-02 有限会社三岛技研 Metal mold for connected product and method of molding the product

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100398296C (en) * 2002-07-04 2008-07-02 有限会社三岛技研 Metal mold for connected product and method of molding the product

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