JP4048535B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4048535B2
JP4048535B2 JP2002321263A JP2002321263A JP4048535B2 JP 4048535 B2 JP4048535 B2 JP 4048535B2 JP 2002321263 A JP2002321263 A JP 2002321263A JP 2002321263 A JP2002321263 A JP 2002321263A JP 4048535 B2 JP4048535 B2 JP 4048535B2
Authority
JP
Japan
Prior art keywords
group
carbon atoms
acid
resist composition
positive resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002321263A
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English (en)
Japanese (ja)
Other versions
JP2004157244A5 (https=
JP2004157244A (ja
Inventor
元 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002321263A priority Critical patent/JP4048535B2/ja
Priority to US10/694,171 priority patent/US7214733B2/en
Publication of JP2004157244A publication Critical patent/JP2004157244A/ja
Publication of JP2004157244A5 publication Critical patent/JP2004157244A5/ja
Application granted granted Critical
Publication of JP4048535B2 publication Critical patent/JP4048535B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0033—Additives activating the degradation of the macromolecular compound

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2002321263A 2002-11-05 2002-11-05 ポジ型レジスト組成物 Expired - Fee Related JP4048535B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002321263A JP4048535B2 (ja) 2002-11-05 2002-11-05 ポジ型レジスト組成物
US10/694,171 US7214733B2 (en) 2002-11-05 2003-10-28 Positive type resist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002321263A JP4048535B2 (ja) 2002-11-05 2002-11-05 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004157244A JP2004157244A (ja) 2004-06-03
JP2004157244A5 JP2004157244A5 (https=) 2005-09-22
JP4048535B2 true JP4048535B2 (ja) 2008-02-20

Family

ID=32171311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002321263A Expired - Fee Related JP4048535B2 (ja) 2002-11-05 2002-11-05 ポジ型レジスト組成物

Country Status (2)

Country Link
US (1) US7214733B2 (https=)
JP (1) JP4048535B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4260772B2 (ja) * 2003-01-31 2009-04-30 東京応化工業株式会社 レジスト組成物の評価方法
US7189491B2 (en) * 2003-12-11 2007-03-13 Az Electronic Materials Usa Corp. Photoresist composition for deep UV and process thereof
JP4368282B2 (ja) * 2004-09-24 2009-11-18 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP5314990B2 (ja) * 2008-10-07 2013-10-16 東京応化工業株式会社 液浸露光用レジスト組成物およびレジストパターン形成方法
JP5723626B2 (ja) * 2010-02-19 2015-05-27 富士フイルム株式会社 パターン形成方法、化学増幅型レジスト組成物及びレジスト膜

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000023292A (ko) * 1998-09-22 2000-04-25 카나가와 치히로 레지스트 재료 및 패턴 형성 방법
JP4131062B2 (ja) 1998-09-25 2008-08-13 信越化学工業株式会社 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法
EP1085003A1 (en) * 1999-03-31 2001-03-21 DAICEL CHEMICAL INDUSTRIES, Ltd. High-purity 1,3-propanediol derivative solvent, process for producing the same, and use thereof
US6479211B1 (en) * 1999-05-26 2002-11-12 Fuji Photo Film Co., Ltd. Positive photoresist composition for far ultraviolet exposure
US6692897B2 (en) * 2000-07-12 2004-02-17 Fuji Photo Film Co., Ltd. Positive resist composition
TW588058B (en) * 2000-09-07 2004-05-21 Shinetsu Chemical Co Polymers, resist compositions and patterning process
KR100571452B1 (ko) * 2001-06-15 2006-04-17 신에쓰 가가꾸 고교 가부시끼가이샤 고분자 화합물, 레지스트 재료 및 패턴 형성 방법

Also Published As

Publication number Publication date
US20040087694A1 (en) 2004-05-06
JP2004157244A (ja) 2004-06-03
US7214733B2 (en) 2007-05-08

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