JP2004157244A5 - - Google Patents
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- Publication number
- JP2004157244A5 JP2004157244A5 JP2002321263A JP2002321263A JP2004157244A5 JP 2004157244 A5 JP2004157244 A5 JP 2004157244A5 JP 2002321263 A JP2002321263 A JP 2002321263A JP 2002321263 A JP2002321263 A JP 2002321263A JP 2004157244 A5 JP2004157244 A5 JP 2004157244A5
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- positive resist
- composition according
- group
- propylene glycol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002321263A JP4048535B2 (ja) | 2002-11-05 | 2002-11-05 | ポジ型レジスト組成物 |
| US10/694,171 US7214733B2 (en) | 2002-11-05 | 2003-10-28 | Positive type resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002321263A JP4048535B2 (ja) | 2002-11-05 | 2002-11-05 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004157244A JP2004157244A (ja) | 2004-06-03 |
| JP2004157244A5 true JP2004157244A5 (https=) | 2005-09-22 |
| JP4048535B2 JP4048535B2 (ja) | 2008-02-20 |
Family
ID=32171311
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002321263A Expired - Fee Related JP4048535B2 (ja) | 2002-11-05 | 2002-11-05 | ポジ型レジスト組成物 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7214733B2 (https=) |
| JP (1) | JP4048535B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4260772B2 (ja) * | 2003-01-31 | 2009-04-30 | 東京応化工業株式会社 | レジスト組成物の評価方法 |
| US7189491B2 (en) * | 2003-12-11 | 2007-03-13 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
| JP4368282B2 (ja) * | 2004-09-24 | 2009-11-18 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP5314990B2 (ja) * | 2008-10-07 | 2013-10-16 | 東京応化工業株式会社 | 液浸露光用レジスト組成物およびレジストパターン形成方法 |
| JP5723626B2 (ja) * | 2010-02-19 | 2015-05-27 | 富士フイルム株式会社 | パターン形成方法、化学増幅型レジスト組成物及びレジスト膜 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000023292A (ko) * | 1998-09-22 | 2000-04-25 | 카나가와 치히로 | 레지스트 재료 및 패턴 형성 방법 |
| JP4131062B2 (ja) | 1998-09-25 | 2008-08-13 | 信越化学工業株式会社 | 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法 |
| EP1085003A1 (en) * | 1999-03-31 | 2001-03-21 | DAICEL CHEMICAL INDUSTRIES, Ltd. | High-purity 1,3-propanediol derivative solvent, process for producing the same, and use thereof |
| US6479211B1 (en) * | 1999-05-26 | 2002-11-12 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
| US6692897B2 (en) * | 2000-07-12 | 2004-02-17 | Fuji Photo Film Co., Ltd. | Positive resist composition |
| TW588058B (en) * | 2000-09-07 | 2004-05-21 | Shinetsu Chemical Co | Polymers, resist compositions and patterning process |
| KR100571452B1 (ko) * | 2001-06-15 | 2006-04-17 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 고분자 화합물, 레지스트 재료 및 패턴 형성 방법 |
-
2002
- 2002-11-05 JP JP2002321263A patent/JP4048535B2/ja not_active Expired - Fee Related
-
2003
- 2003-10-28 US US10/694,171 patent/US7214733B2/en not_active Expired - Lifetime